CN218471929U

CN218471929U - Motion platform and semiconductor manufacturing equipment

Info

Publication number: CN218471929U
Application number: CN202222434578.0U
Authority: CN
Inventors: 郑耀青; 王是壹; 刘思思; 刘泉磊; 王策; 张有君; 信召举
Original assignee: Beijing U Precision Tech Co Ltd
Current assignee: Hangzhou Tianrui Precision Technology Co ltd; Beijing U Precision Tech Co Ltd
Priority date: 2022-09-14
Filing date: 2022-09-14
Publication date: 2023-02-10
Anticipated expiration: 2032-09-14

Abstract

The utility model provides a motion platform and semiconductor manufacturing equipment relates to semiconductor technology field. The motion platform comprises a base, a lifting driving piece and a rotating mechanism, wherein the rotating mechanism comprises a mounting base, a rotating driving piece and a rotating base, the mounting base comprises a mounting bottom plate, an inner ring cylinder and an outer ring cylinder, the rotating base comprises a top plate and an annular supporting body, the annular supporting body is rotatably sleeved on the inner ring cylinder, the bottom end of the annular supporting body is rotatably connected to the mounting bottom plate, a first mounting cavity is defined between the annular supporting body and the outer ring cylinder, the rotating driving piece is mounted in the first mounting cavity, and the rotating driving end of the rotating driving piece is connected with the annular supporting body; the lifting driving piece is installed on the base, and a lifting driving end of the lifting driving piece is connected with the installation base. The semiconductor manufacturing apparatus includes a substrate and the above-described motion stage. The installation stability and the position accuracy of swivel seat are all higher in this motion platform, can ensure the motion platform to the high accuracy drive of base.

Description

Motion platform and semiconductor manufacturing equipment

Technical Field

The utility model relates to the field of semiconductor technology, particularly, relate to a motion platform and semiconductor manufacturing equipment.

Background

With the continuous improvement of the integration level of integrated circuit devices, the precision requirement of the semiconductor processing process is continuously improved, for example, in semiconductor manufacturing equipment, a substrate serving as a workpiece table needs to be borne by a motion platform, and the motion platform can adjust the circumferential angle and the vertical height of the substrate, so that a workpiece to be processed on the substrate reaches a target position for processing. However, the rotating seat for circumferential angle adjustment in the existing motion platform is generally only rotatably connected to the base cylinder through suspension of the bearing, the bearing needs to bear the weight of the rotating seat, a substrate arranged at the top of the rotating seat and a workpiece to be machined, the mounting stability of the rotating seat is poor, the rotating seat is easy to deviate or even sink in the using process, and the position adjustment precision of the motion platform on the substrate is reduced or even the rotating seat cannot be used.

SUMMERY OF THE UTILITY MODEL

The utility model aims at providing a motion platform and semiconductor manufacturing equipment to the roating seat that solves current motion platform squints easily or sinks even, leads to the motion platform to reduce the technical problem that can't use even to the position control precision of base plate.

In order to solve the problems, the utility model provides a motion platform, which comprises a base, a lifting driving piece and a rotating mechanism, wherein the rotating mechanism comprises a mounting base, a rotating driving piece and a rotating seat, the mounting base comprises a mounting bottom plate, an inner ring cylinder arranged at the center of the mounting bottom plate and an outer ring cylinder arranged at the edge of the mounting bottom plate in an enclosing manner, the rotating seat comprises a top plate and an annular supporting body connected to the bottom of the top plate, the annular supporting body is rotatably sleeved on the inner ring cylinder, the bottom end of the annular supporting body is rotatably connected to the mounting bottom plate, a first mounting cavity is defined between the annular supporting body and the outer ring cylinder, the rotating driving piece is mounted in the first mounting cavity, and the rotating driving end of the rotating driving piece is connected with the annular supporting body;

the lifting driving piece is installed on the base, and a lifting driving end of the lifting driving piece is connected with the installation base.

Optionally, an annular guide table is fixedly connected to the bottom end of the annular support body coaxially, an annular guide groove is formed in the top surface of the mounting bottom plate, and the annular guide table is rotatably clamped in the annular guide groove.

Optionally, a bearing is sleeved between the annular support body and the inner ring cylinder, the top plate is annular, an area of the top plate extending out of the inner wall of the annular support body is an upper limit portion, and a top end surface of an outer ring of the bearing abuts against the upper limit portion; the annular guide table extends out of the inner wall of the annular support body, the area is a lower limiting part, and the bottom end face of the outer ring of the bearing is abutted to the lower limiting part.

Optionally, the top plate blocks a top port of the first installation cavity.

Optionally, the mounting base plate, the inner ring cylinder and the outer ring cylinder are integrally formed;

and/or the top plate and the annular supporting body are integrally formed.

Optionally, the motion platform further includes a rotary grating, the annular support body includes an upper support section and a lower support section from top to bottom, the lower support section is recessed relative to the upper support section, an area of the first installation cavity corresponding to the upper support section is an upper cavity, an area of the first installation cavity corresponding to the lower support section is a lower cavity, a circular grating ruler of the rotary grating is located in the upper cavity and is installed on the top plate or the upper support section, and the rotary driving member is located in the lower cavity; the outer ring barrel is provided with a notch, and a rotary reading head of the rotary grating is arranged in the notch and corresponds to the circular grating ruler.

Optionally, motion platform still includes four gravity compensation pieces, the horizontal cross section profile of outer loop barrel lateral wall is the rectangle, the horizontal cross section profile of outer loop barrel inside wall is circular, four bights of outer loop barrel all are equipped with notch holding tank down, four gravity compensation piece one-to-one holds in four in the holding tank, just the top of gravity compensation piece with corresponding the tank bottom of holding tank is connected, the bottom with the base is connected.

Optionally, the base includes the loading board and encloses and locate the side wall board of loading board, rotary mechanism is located in the space that the side wall board encloses, just the outer loop barrel with enclose into the second installation cavity between the side wall board, the outside rigid coupling of outer loop barrel has a connecting plate, the lift driving piece is located the second installation cavity just the lift drive end of lift driving piece with it connects to push up the connecting plate.

Optionally, the bearing plate is a rectangular plate, the side wall plate comprises four plate bodies which correspond to four side edges of the bearing plate one by one, and of the four plate bodies, two oppositely arranged plate bodies are first plate bodies, the other two plate bodies are second plate bodies, the thickness of the first plate body is greater than that of the second plate bodies, and a lifting guide assembly is connected between the first plate body and the outer ring cylinder body; the second installation cavity with the corresponding region of second plate body is the lift installing zone, the lift driving piece is two sets of, and is two sets of the lift driving piece one-to-one installs in two the lift installing zone.

Optionally, one of the first plate body and the bearing plate are integrally formed, and the other of the first plate body and the bearing plate is detachably connected.

The utility model also provides a semiconductor manufacturing equipment, including base plate and above-mentioned motion platform, the base plate install in motion platform's roof.

The utility model provides an among the rotary mechanism of motion platform, the roating seat is used for the mounting substrate as whole motion platform's drive end, rotary driving spare is used for driving the roating seat as rotary power source and rotates, the mounting base is used for mounting roating seat and rotary driving spare, wherein, the roof of roating seat is used for connecting the base plate as a top backup pad, the loop support body of roof bottom cup joints with the inner ring barrel rotation of mounting base, and the bottom of loop support body rotates with the mounting plate of mounting base to be connected, then in the rotatory in-process of rotary driving spare drive loop support body, the inner ring barrel can carry out the primary guide spacing to the rotation stroke of loop support body, the connection of mounting plate and loop support body bottom can carry out the secondary guide spacing to its rotation stroke, thereby improve the rotational position accuracy of loop support body and roof, correspondingly improve rotary position accuracy of rotary mechanism; meanwhile, the annular supporting body is supported between the mounting bottom plate and the top plate, the whole mounting bottom plate can upwards stably support the top plate through the annular supporting body, so that the stability of the top plate in the vertical direction is effectively ensured, the bearing stability of semiconductor materials such as wafers and the like and the normal use of a motion platform behind the top plate mounting base plate are ensured, and the situation that the rotary seat is poor in mounting stability in the vertical direction and easily deviates or even sinks is reduced.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the embodiments or the prior art descriptions will be briefly described below, it is obvious that the drawings in the following description are only embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the provided drawings without creative efforts.

Fig. 1 is an isometric view of a motion platform provided by the present invention;

fig. 2 is an exploded view of the motion platform provided by the present invention;

fig. 3 is a top view of the motion platform provided by the present invention;

FIG. 4 isbase:Sub>A cross-sectional view taken along line A-A of FIG. 3;

FIG. 5 is a cross-sectional view taken along line B-B of FIG. 3;

fig. 6 is a front view of the motion platform provided by the present invention;

FIG. 7 is a cross-sectional view taken in the direction F-F of FIG. 6;

fig. 8 is a sectional view taken along the direction J-J in fig. 7.

Description of the reference numerals:

100-a base; 110-a carrier plate; 120-side coaming; 121-a first plate body; 122-a second plate body; 200-a lifting drive member; 300-a rotation mechanism; 310-a mounting base; 311-mounting a base plate; 312-inner ring cylinder; 3121-a limit end cap; 3122-a limit step; 313-outer ring cylinder; 3131-a notch; 3132-a holding tank; 320-a rotary drive; 321-a ring-shaped motor stator; 322-ring motor mover; 330-a rotating seat; 331-a top plate; 3311-upper stopper portion; 332-a ring support; 3321-upper support section; 3322-lower support section; 340-annular guide table; 341-lower limit portion; 350-a bearing; 360-rotating the grating; 361-circular grating ruler; 362-rotating the reading head; 370-a gravity compensation element; 380-top connecting plate; 400-a lifting guide assembly; 500-lifting the reading head; 910-a first mounting cavity; 920-a second mounting cavity; 921-lifting installation area; 922-guide installation area.

Detailed Description

In order to make the aforementioned objects, features and advantages of the present invention more comprehensible, embodiments accompanied with figures are described in detail below. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

The embodiment provides a moving platform, as shown in fig. 1 and fig. 2, including a base 100, a lifting driving element 200, and a rotating mechanism 300, where the rotating mechanism 300 includes a mounting base 310, a rotating driving element 320, and a rotating base 330, the mounting base 310 includes a mounting base plate 311, an inner ring cylinder 312 disposed at the center of the mounting base plate 311, and an outer ring cylinder 313 surrounded at the edge of the mounting base plate 311, the rotating base 330 includes a top plate 331 and a ring support 332 connected to the bottom of the top plate 331, the ring support 332 is rotatably sleeved on the inner ring cylinder 312, the bottom end of the ring support 332 is rotatably connected to the mounting base plate 311, a first mounting cavity 910 is surrounded between the ring support 332 and the outer ring cylinder 313, the rotating driving element 320 is mounted in the first mounting cavity 910, and a rotating driving end of the rotating driving element 320 is connected to the ring support 332; the lifting driving member 200 is installed on the base 100, and the lifting driving end of the lifting driving member 200 is connected to the installation base 310.

The present embodiment also provides a semiconductor manufacturing apparatus including a base plate and the above-described motion stage, the base plate being mounted on the top plate 331 of the motion stage.

The motion platform and the semiconductor manufacturing equipment provided by the embodiment are provided, wherein the semiconductor manufacturing equipment comprises a substrate for bearing a semiconductor workpiece to be processed such as a wafer and the motion platform; the motion platform includes a rotation mechanism 300 for connecting the substrate and driving the substrate to rotate circumferentially, a lifting driving member 200 for driving the rotation mechanism 300 to lift and lower the substrate to move, and a base 100 for carrying and mounting the lifting driving member 200 and the rotation mechanism 300. Specifically, in the rotating mechanism 300, the rotating base 330 is used as a driving end of the whole moving platform to mount a substrate, the rotating driving element 320 is used as a rotating power source to drive the rotating base 330 to rotate, and the mounting base 310 is used to mount the rotating base 330 and the rotating driving element 320, wherein the top plate 331 of the rotating base 330 is used as a top supporting plate to connect with the substrate, the ring supporting body 332 at the bottom of the top plate 331 is rotatably sleeved with the inner ring cylinder 312 of the mounting base 310, and the bottom end of the ring supporting body 332 is rotatably connected with the mounting bottom plate 311 of the mounting base 310, so that when the rotating driving element 320 drives the ring supporting body 332 to rotate, the inner ring cylinder 312 can perform primary guiding and limiting on the rotating stroke of the ring supporting body 332, and the connection between the mounting bottom plate 311 and the bottom end of the ring supporting body 332 can perform secondary guiding and limiting on the rotating stroke, thereby improving the accuracy of the rotating positions of the ring supporting body 332 and the top plate 331, and correspondingly improving the accuracy of the rotating position of the rotating mechanism 300; meanwhile, the ring support 332 is supported between the mounting bottom plate 311 and the top plate 331, and the entire mounting bottom plate 311 can stably support the top plate 331 upwards through the ring support 332, so that the stability of the top plate 331 in the vertical direction is effectively ensured, the bearing stability of the top plate 331 for semiconductor materials such as wafers and the like and the normal use of a motion platform after a substrate is mounted on the top plate 331 are ensured, and the occurrence of the situation that the rotary base 330 is poor in mounting stability in the vertical direction and is easy to shift or even sink is reduced.

When the lifting driving piece 200 is used, the lifting driving piece 200 operates to drive the mounting base 310 to lift, so that the whole rotating mechanism 300 and the substrate are driven to lift, and therefore lifting driving of a semiconductor workpiece to be machined on the substrate is achieved; the rotary driving member 320 operates to drive the annular supporting body 332 to rotate, so as to drive the rotating base 330 and the substrate to rotate, thereby realizing the rotary driving of the workpiece to be processed on the substrate, and further completing the height position adjustment and circumferential angle adjustment of the workpiece to be processed on the semiconductor with high precision and high stability.

The rotary driving member 320 of the rotary mechanism 300 is located in the first installation cavity 910 enclosed by the outer ring cylinder 313 and the annular supporting body 332, and the outer ring cylinder 313 can block and protect the rotary driving member 320, so as to reduce collision damage to the rotary mechanism 300 during disassembly, assembly and transportation. Preferably, the top plate 331 blocks a top end opening of the first installation cavity 910, and the first installation cavity 910 enclosed by the top plate 331, the outer ring cylinder 313, the installation bottom plate 311 and the annular support body 332 is approximately a closed cavity, so as to further reduce occurrence of external impact or dust pollution on the rotary driving member 320, and accordingly further ensure normal operation of the rotary driving member 320.

Specifically, as shown in fig. 2 and 4, the rotary driving element 320 may be a rotary motor, a ring-shaped motor stator 321 of the rotary motor is mounted on the ring inner wall of the outer ring cylinder 313, a ring-shaped motor mover 322 is mounted on the ring outer wall of the ring-shaped supporting body 332, and the ring-shaped motor stator 321 interacts with the ring-shaped motor mover 322 to make the ring-shaped motor mover 322 rotate circumferentially, so as to drive the ring-shaped supporting body 332 to rotate.

Preferably, in this embodiment, the mounting bottom plate 311, the inner ring cylinder 312 and the outer ring cylinder 313 may be integrally formed, and the mounting base 310 is integrally formed, so that the processing convenience, the supporting strength, the relative position accuracy of the mounting bottom plate 311, the inner ring cylinder 312 and the outer ring cylinder 313 are higher, and the supporting stability and the rotation guiding accuracy of the rotating base 330 are higher. Similarly, the top plate 331 and the ring support 332 of the rotating base 330 may also be integrally formed, so as to improve the processing convenience of the rotating base 330 and the relative position accuracy of the top plate 331 and the ring support 332, and further improve the support stability of the ring support 332 for the top plate 331.

Optionally, in this embodiment, as shown in fig. 4, an annular guide table 340 is coaxially and fixedly connected to the bottom end of the annular support body 332, an annular guide groove is formed in the top surface of the mounting base plate 311, and the annular guide table 340 is rotatably clamped in the annular guide groove. In a specific form where the bottom end of the ring support 332 is rotatably connected to the mounting base plate 311, on one hand, the ring guide 340 is supported between the mounting base plate 311 and the bottom end of the ring support 332, so that the mounting base plate 311 can rigidly support the top plate 331 through the ring guide 340 and the ring support 332 to ensure the stability of the top plate 331 in the up-down direction; on the other hand, in the process that the annular support body 332 is driven to rotate by the rotary driving member 320, the annular guide groove can guide and limit the rotation stroke of the annular guide table 340, and further guide and limit the rotation strokes of the annular support body 332 and the top plate 331, so that the accuracy of the rotation position of the top plate 331 is improved.

Specifically, in the present embodiment, as shown in fig. 4, a bearing 350 is sleeved between the annular support body 332 and the inner annular cylinder 312, the top plate 331 is annular, a region of the top plate 331 extending out of the inner wall of the annular support body 332 is an upper positioning portion 3311, and a top end surface of an outer ring of the bearing 350 abuts against the upper positioning portion 3311; the region of the annular guide table 340 extending beyond the inner wall of the annular support 332 is a lower limit portion 341, and the bottom end surface of the outer ring of the bearing 350 abuts against the lower limit portion 341. On the one hand, the annular support body 332 and the inner ring cylinder 312 are rotatably sleeved through the bearing 350, and the rotating resistance of the annular support body 332 relative to the inner ring cylinder 312 is greatly reduced, so that on the basis of guiding and limiting the rotating stroke of the annular support body 332 by the inner ring cylinder 312, the rotating smoothness of the annular support body 332 and the rotating seat 330 is improved, the circumferential angle adjusting accuracy of the rotating seat 330 and the moving platform is correspondingly improved, and the driving load of the rotary driving piece 320 is reduced. On the other hand, the top plate 331 is used for connecting the substrate and also can be used as an upper end cover of the outer ring of the bearing 350, similarly, the annular guide table 340 is used for rotatably connecting with the mounting base 100 and also can be used as a lower end cover of the outer ring of the bearing 350, the top plate 331 and the annular guide table 340 have strong functionality, and the structure of the rotating mechanism 300 is correspondingly simpler.

In this embodiment, as shown in fig. 4, the bottom of the inner ring cylinder 312 protrudes outward to form a limiting step 3122, and the bottom end surface of the inner ring of the bearing 350 abuts against the limiting step 3122; the top of the inner ring cylinder 312 is detachably and fixedly connected with a limit end cover 3121, and the top end surface of the inner ring of the bearing 350 is abutted against the limit end cover 3121. The limit step 3122 serves as a lower end cover of the inner ring of the bearing 350, and the limit end cover 3121 serves as an upper end cover of the inner ring of the bearing 350 to axially limit the inner ring of the bearing 350, so as to improve the stability of the bearing 350 installed between the inner ring cylinder 312 and the ring supporter 332.

In this embodiment, as shown in fig. 4, the moving platform further includes a rotary grating 360, the annular support 332 includes an upper support section 3321 and a lower support section 3322 from top to bottom, the lower support section 3322 is recessed relative to the upper support section 3321, a region of the first installation cavity 910 corresponding to the upper support section 3321 is an upper cavity, a region of the first installation cavity 910 corresponding to the lower support section 3322 is a lower cavity, the circular grating ruler 361 of the rotary grating 360 is located in the upper cavity and is installed on the top plate 331 or the upper support section 3321, and the rotary driving member 320 is located in the lower cavity; the outer ring cylinder 313 has a notch 3131, and the rotary reading head 362 of the rotary grating 360 is mounted in the notch 3131 and corresponds to the circular grating ruler 361. A concave groove is formed between the upper support section 3321 and the top plate 331, the shape and size of the concave groove are matched with those of the circular grating ruler 361, and the circular grating ruler 361 is embedded in the concave groove, so that the integral shape uniformity formed after the circular grating ruler 361 is connected with the rotating base 330 is improved; the lower support section 3322 is recessed with respect to the upper support section 3321 to increase the receiving volume of the lower support section 3322 and the outer cylinder 313 enclosing a lower cavity to ensure the installation of the rotary driving member 320. During the use, rotatory driving piece 320 drive roating seat 330 drives circle grating chi 361 and follows its synchronous revolution, and rotatory reading head 362 discerns the rotation angle of circle grating chi 361 to with rotation angle signal feedback to controller, the controller correspondingly controls opening of rotatory driving piece 320 and stops, carries out circumference angle modulation to the base plate with high accuracy, fast response ground.

Similarly, as shown in fig. 2 and 5, the motion platform may further include a lifting grating, the lifting reading head 500 of the lifting grating is installed on the base 100, and the lifting grating ruler is installed on the outer wall of the outer ring cylinder 313, so that in the process that the lifting driving member 200 drives the rotation mechanism 300 to lift, the lifting reading head 500 identifies the lifting grating and feeds a lifting signal back to the controller, and the controller correspondingly controls the start and stop of the lifting driving member 200 to perform height position adjustment on the substrate with high precision and fast response.

Optionally, in this embodiment, as shown in fig. 2 and 3, the motion platform further includes four gravity compensation members 370, a horizontal cross-sectional profile of an outer sidewall of the outer ring cylinder 313 is rectangular, and a horizontal cross-sectional profile of an inner sidewall of the outer ring cylinder 313 is circular, as shown in fig. 8, four corners of the outer ring cylinder 313 are each provided with a receiving groove 3132 with a notch facing downward, the four gravity compensation members 370 are received in the four receiving grooves 3132 in a one-to-one correspondence manner, and a top end of each gravity compensation member 370 is connected to a groove bottom of the corresponding receiving groove 3132, and a bottom end of each gravity compensation member 370 is connected to the base 100. Firstly, the weight of the rotating mechanism 300 can be compensated by installing the gravity compensation member 370, so that the lifting driving load of the lifting driving member 200 is reduced, the reaction speed and accuracy of the lifting driving member 200 are correspondingly improved, and the reaction speed and position driving accuracy of the operation platform are improved; specifically, the gravity compensation member 370 may be a magnetic spring. Secondly, the outer side wall of the outer ring cylinder 313 is a rectangular body, and the inner side wall of the outer ring cylinder 313 is a cylinder, so that on one hand, the outer wall of the outer ring cylinder 313 serving as the whole rotating mechanism 300 is regular in shape, and the processing and mounting convenience and accuracy are higher; on the other hand, the accommodating grooves 3132 are formed at four corners of the outer cylinder 313 to accommodate the gravity compensators 370, so that the outer cylinder 313 can be more fully utilized, and the four gravity compensators 370 support four angles of the outer cylinder 313, thereby improving the balance of gravity compensation.

In this embodiment, as shown in fig. 1, fig. 2 and fig. 6, the base 100 includes a bearing plate 110 and a side wall plate 120 surrounding the bearing plate 110, as shown in fig. 5, the rotating mechanism 300 is located in a space surrounded by the side wall plate 120, a second mounting cavity 920 is surrounded between the outer ring cylinder 313 and the side wall plate 120, a top connecting plate 380 is fixedly connected to an outer side of the outer ring cylinder 313, the lifting driving member 200 is located in the second mounting cavity 920, and a lifting driving end of the lifting driving member 200 is connected to the top connecting plate 380. When the lifting driving element 200 is in a retraction state, the rotating mechanism 300 is integrally nested in a space surrounded by the base 100, so that the structure of the moving platform is more compact and the occupied space is smaller; the lifting driving member 200 is located in the second installation cavity 920 enclosed between the rotating mechanism 300 and the side wall plate 120 of the base 100, and the lifting driving of the whole lifting mechanism is realized through the top connection plate 380.

Specifically, in this embodiment, as shown in fig. 7, the bearing plate 110 is a rectangular plate, the side enclosing plate 120 includes four plate bodies corresponding to four side edges of the bearing plate 110 one by one, and among the four plate bodies, two of the plate bodies that are arranged oppositely are first plate bodies 121, the other two plate bodies are second plate bodies 122, the thickness of the first plate body 121 is greater than that of the second plate bodies 122, and the lifting guide assembly 400 is connected between the first plate body 121 and the outer ring cylinder 313; the corresponding region of second installation cavity 920 and second plate body 122 is lift installing zone 921, and lift driving piece 200 is two sets of, and two sets of lift driving pieces 200 one-to-one are installed in two lift installing zones 921. The bearing plate 110 is a rectangular plate with a regular shape, and the two first plate bodies 121 and the two second plate bodies 122 are arranged on four straight edges of the bearing plate 110 in a surrounding manner in a one-to-one correspondence manner, so that the overall appearance of the motion platform and the base 100 are correspondingly rectangular bodies with a regular shape, and the installation convenience and the installation position accuracy of the motion platform can be ensured to some extent. Guide mounting areas 922 are formed between the first plate body 121 and the corresponding outer ring walls of the outer ring cylinder 313, lifting guide assemblies 400 are mounted in the two guide mounting areas 922, one of guide rail members and guide groove members, which are in sliding connection with each other, of the lifting guide assemblies 400 is connected to the first plate body 121, the thickness of the first plate body 121 is set to be thicker, so that the first plate body 121 can stably fix the lifting guide assemblies 400, and the lifting stroke of the lifting mechanism can be effectively limited through the lifting guide assemblies 400; a lifting installation area 921 is formed between the second plate body 122 and the corresponding outer ring wall of the outer ring cylinder 313, the lifting driving piece 200 is installed in the lifting installation area 921, and the lifting driving piece 200 is not required to be supported, fixed and the like by the second plate body 122 due to the use of the lifting driving piece 200, the thickness of the second plate body 122 is small, the space of the lifting installation area 921 is correspondingly increased, the installation of the lifting driving piece 200 is ensured, and the limitation of the installation space on the volume of the lifting driving piece 200 is reduced.

Specifically, as shown in fig. 7, the outer wall of the outer ring cylinder 313 is a rectangular body, the side wall plate 120 is a rectangular frame, four side walls of the outer ring cylinder 313 and the side wall of the outer ring cylinder 313 are parallel to each other in a one-to-one correspondence manner, the first plate body 121 and the corresponding side wall of the outer ring cylinder 313 enclose a guide installation area 922, two lifting guide assemblies 400 are installed in the guide installation area 922, and the two lifting guide assemblies 400 are arranged at intervals along the extending direction of the guide installation area 922; specifically, the lift guide assembly 400 may employ cross-roller ramps. A lifting installation area 921 is defined by the second plate body 122 and the corresponding side wall of the outer ring cylinder body 313, the width of the lifting installation area 921 is larger than that of the guide installation area 922, two lifting driving pieces 200 are installed in the lifting installation area 921, and the two lifting driving pieces 200 are arranged at intervals along the extension direction of the lifting installation area 921; specifically, the lift driving member 200 may be a voice coil motor.

Alternatively, in this embodiment, as shown in fig. 2 and fig. 4, one of the first plate bodies 121 is integrally formed with the supporting plate 110, and the other first plate body 121 is detachably connected with the supporting plate 110. One of the first plate 121 and the bearing plate 110 are integrally formed, so that the first plate 121 and the bearing plate 110 are higher in connection firmness and position accuracy, and the two are not required to be assembled during assembly, so that the base 100 is higher in assembly convenience; in addition, three sides of the bearing plate 110 are open, and the lifting driving member 200, the lifting guide assembly 400, the lifting reading head 500 and the like can be installed on the bearing plate 110 through the three open sides, so that the convenience in installation of each component can be ensured.

Finally, it should also be noted that, in this document, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrases "comprising one of 8230; \8230;" 8230; "does not exclude the presence of additional like elements in a process, method, article, or apparatus that comprises the element.

The previous description of the disclosed embodiments is provided to enable any person skilled in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be applied to other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A motion platform is characterized by comprising a base (100), a lifting driving piece (200) and a rotating mechanism (300), wherein the rotating mechanism (300) comprises a mounting base (310), a rotating driving piece (320) and a rotating seat (330), the mounting base (310) comprises a mounting bottom plate (311), an inner ring cylinder (312) arranged at the center of the mounting bottom plate (311) and an outer ring cylinder (313) arranged at the edge of the mounting bottom plate (311) in a surrounding manner, the rotating seat (330) comprises a top plate (331) and a ring support body (332) connected to the bottom of the top plate (331), the ring support body (332) is rotatably sleeved on the inner ring cylinder (312), the bottom end of the ring support body (332) is rotatably connected to the mounting bottom plate (311), a first mounting cavity (910) is formed between the ring support body (332) and the outer ring cylinder (313), the rotating driving piece (320) is mounted in the first mounting cavity (910), and the rotating driving end of the rotating driving piece (320) is connected with the ring support body (332);

the lifting driving piece (200) is installed on the base (100), and a lifting driving end of the lifting driving piece (200) is connected with the installation base (310).

2. The motion platform according to claim 1, characterized in that the bottom end of the ring-shaped support body (332) is coaxially and fixedly connected with a ring-shaped guide table (340), the top surface of the mounting base plate (311) is provided with a ring-shaped guide groove, and the ring-shaped guide table (340) is rotatably clamped in the ring-shaped guide groove.

3. The motion platform of claim 2, wherein a bearing (350) is sleeved between the ring-shaped support body (332) and the inner-ring cylinder body (312), the top plate (331) is ring-shaped, and a region of the top plate (331) extending out of the inner wall of the ring-shaped support body (332) is an upper limit portion (3311), and a top end face of an outer ring of the bearing (350) abuts against the upper limit portion (3311); the region of the annular guide table (340) extending out of the inner wall of the annular support body (332) is a lower limit part (341), and the bottom end surface of the outer ring of the bearing (350) is abutted against the lower limit part (341).

4. The motion platform of claim 1, wherein the top plate (331) closes off a top port of the first mounting cavity (910).

5. The motion platform of claim 1, wherein the mounting base plate (311), the inner ring cylinder (312), and the outer ring cylinder (313) are integrally formed;

and/or the top plate (331) is integrally formed with the ring-shaped support body (332).

6. The motion platform according to any one of claims 1 to 5, further comprising a rotary grating (360), wherein the ring support (332) comprises an upper support section (3321) and a lower support section (3322) from top to bottom, the lower support section (3322) is recessed relative to the upper support section (3321), the first installation cavity (910) corresponds to the upper support section (3321) and an area corresponding to the lower support section (3322) is an upper cavity, the circular grating scale (361) of the rotary grating (360) is located in the upper cavity and is installed on the top plate (331) or the upper support section (3321), and the rotary driving member (320) is located in the lower cavity; the outer ring cylinder (313) is provided with a notch (3131), and a rotary reading head (362) of the rotary grating (360) is arranged in the notch (3131) and corresponds to the circular grating ruler (361).

7. The motion platform according to any one of claims 1 to 5, further comprising four gravity compensators (370), wherein the outer sidewall of the outer ring cylinder (313) has a rectangular horizontal cross-sectional profile, the inner sidewall of the outer ring cylinder (313) has a circular horizontal cross-sectional profile, four corners of the outer ring cylinder (313) are each provided with a receiving groove (3132) with a downward notch, the four gravity compensators (370) are received in the four receiving grooves (3132) in a one-to-one correspondence, and the top end of each gravity compensator (370) is connected to the bottom of the corresponding receiving groove (3132) and the bottom end of each gravity compensator is connected to the base (100).

8. The motion platform according to any one of claims 1 to 5, wherein the base (100) comprises a bearing plate (110) and a side enclosing plate (120) enclosing the bearing plate (110), the rotating mechanism (300) is located in a space enclosed by the side enclosing plate (120), a second mounting cavity (920) is enclosed between the outer ring cylinder (313) and the side enclosing plate (120), a top connecting plate (380) is fixedly connected to the outer side of the outer ring cylinder (313), the lifting driving member (200) is located in the second mounting cavity (920), and the lifting driving end of the lifting driving member (200) is connected to the top connecting plate (380).

9. The motion platform according to claim 8, wherein the bearing plate (110) is a rectangular plate, the side enclosing plate (120) comprises four plate bodies corresponding to four side edges of the bearing plate (110) one by one, and of the four plate bodies, two oppositely arranged plate bodies are first plate bodies (121), the other two plate bodies are second plate bodies (122), the thickness of the first plate body (121) is greater than that of the second plate bodies (122), and a lifting guide assembly (400) is connected between the first plate body (121) and the outer ring cylinder (313); the second installation cavity (920) with the corresponding region of second plate body (122) is lift installing zone (921), lift driving piece (200) are two sets of, two sets of lift driving piece (200) one-to-one install in two lift installing zone (921).

10. The motion platform of claim 9, wherein one of the first plate bodies (121) is integrally formed with the carrier plate (110), and the other of the first plate bodies (121) is detachably connected to the carrier plate (110).

11. A semiconductor manufacturing apparatus comprising a base plate and the motion platform of any of claims 1-10, the base plate being mounted to a top plate (331) of the motion platform.