CN218458715U

CN218458715U - Bubble filtering system of wafer etching equipment

Info

Publication number: CN218458715U
Application number: CN202222225304.0U
Authority: CN
Inventors: 袁林涛; 陈焰斌; 刘慧超
Original assignee: Hangzhou Fuxin Semiconductor Co Ltd
Current assignee: Hangzhou Fuxin Semiconductor Co Ltd
Priority date: 2022-08-23
Filing date: 2022-08-23
Publication date: 2023-02-10
Anticipated expiration: 2032-08-23

Abstract

The application provides a wafer etching equipment bubble filtration system includes: liquid supply channel, bubble filter, liquid outlet channel and flowmeter. The liquid supply channel is used for supplying liquid medicine containing bubbles. The bubble filter comprises a sealing box body and a filter layer, the filter layer is arranged in the sealing box body, the sealing box body is provided with a liquid medicine inlet, a liquid medicine outlet and an exhaust outlet, the liquid medicine inlet is connected to the liquid supply channel, the filter layer isolates the liquid medicine outlet and the exhaust outlet so as to enable the liquid medicine to flow out from the liquid medicine outlet and enable bubbles to be discharged from the exhaust outlet. One end of the liquid outlet channel is connected with the liquid medicine outlet. The flowmeter is arranged in the liquid outlet channel and is used for measuring the flow of the liquid medicine flowing through the liquid outlet channel. The problem that bubbles appear in the wafer etching equipment and lead to flowmeter monitoring and alarming is solved.

Description

Bubble filtering system of wafer etching equipment

Technical Field

The utility model relates to a wafer etching equipment field especially relates to wafer etching equipment bubble filtration system.

Background

In the wafer wet etching process, etching liquid medicine flows out of etching equipment and is sprayed on the surface of a wafer, and the wafer is cleaned and etched. Bubbles (such as ammonia hydrate bubbles and hydrogen peroxide bubbles, the bubbles are formed by enclosing gas such as ammonia hydrate or hydrogen peroxide into a spherical cavity with a larger spherical diameter rather than gas) are easily formed in a pipeline of the etching equipment by the liquid medicine, and the bubbles easily cause a flow meter to monitor and alarm after flow timing, so that the wafer operation process is interrupted, the quality of a wafer product is finally influenced, and the wafer product is possibly scrapped seriously. The prior art does not have a device for filtering out bubbles in the liquid medicine flowing to the flow meter.

SUMMERY OF THE UTILITY MODEL

To the not enough of prior art, this application provides a wafer etching equipment bubble filtration system, includes: liquid supply channel, bubble filter, liquid outlet channel and flowmeter. The liquid supply channel is used for supplying liquid medicine containing bubbles. The bubble filter comprises a sealing box body and a filter layer, wherein the filter layer is arranged in the sealing box body, the sealing box body is provided with a liquid medicine inlet, a liquid medicine outlet and an exhaust outlet, the liquid medicine inlet is connected to the liquid supply channel, the filter layer separates the liquid medicine outlet from the exhaust outlet so as to allow the liquid medicine to flow out of the liquid medicine outlet and allow the bubbles to be discharged from the exhaust outlet. One end of the liquid outlet channel is connected with the liquid medicine outlet. The flowmeter is arranged in the liquid outlet channel and is used for measuring the flow of the liquid medicine flowing through the liquid outlet channel.

Preferably, the liquid supply channel is a pipe.

Preferably, the filter layer is a filter channel, one end of the filter layer is connected with the liquid medicine inlet, and the other end of the filter layer is connected with the exhaust outlet.

Preferably, the sealed box body is a sealed cylinder body.

Preferably, the sealed box body is vertically arranged.

Preferably, the axis of the filter layer and the axis of the sealed box are substantially parallel.

Preferably, the liquid medicine inlet is arranged at the bottom of the sealed box body, and the exhaust outlet is arranged at the top of the sealed box body.

Preferably, the filtration layer is a permeable membrane.

Preferably, the bubble filtering system of the wafer etching equipment further comprises a liquid supply device, one end of the liquid supply device is connected with the liquid supply channel, and liquid medicine containing bubbles is stored in the liquid supply device.

Preferably, the bubble filtering system of the wafer etching equipment further comprises an exhaust channel, one end of the exhaust channel is connected with the exhaust outlet, the other end of the exhaust channel is connected with the liquid supply device, and the exhaust channel is used for discharging and conveying the bubbles to the liquid supply device.

The beneficial effect of this application lies in: through set up the bubble filter between liquid supply channel and liquid outlet channel to set up liquid medicine import, liquid medicine export and exhaust outlet on seal box, set up the filter layer in seal box, liquid medicine import is connected in liquid supply channel, and the filter layer keeps apart liquid medicine export and exhaust outlet, so that lets the liquid medicine flow from the liquid medicine export, and let the bubble discharge from exhaust outlet. Because one end of the liquid outlet channel is connected with the liquid medicine outlet, the other end of the liquid outlet channel is connected with the flow meter, and the bubbles in the liquid medicine flowing out of the liquid outlet channel are filtered by the filter layer, the liquid medicine flowing to the flow meter does not contain bubbles any more, and the flow meter monitoring alarm caused by the bubbles passing through the flow meter is avoided.

The foregoing description is only an overview of the technical solutions of the present application, and in order to make the technical solutions of the present application more clear and clear, and to implement the technical solutions according to the content of the description, the present application will be described in detail with reference to the following preferred embodiments of the present application and the accompanying drawings.

Drawings

FIG. 1 is a schematic view of a bubble filtering system of a wafer etching apparatus according to an embodiment of the present disclosure;

FIG. 2 is an exploded view of a bubble filtration system of a wafer etching apparatus according to an embodiment of the present disclosure;

FIG. 3 is a front cross-sectional view of a bubble filter according to an embodiment of the present application;

FIG. 4 isbase:Sub>A cross-sectional view taken along line A-A of FIG. 3, in accordance with an embodiment of the present application.

Description of reference numerals:

1. liquid supply channel

2. Bubble filter

20. Sealed box

200. Liquid medicine inlet

201. Liquid medicine outlet

202. Exhaust outlet

21. Filter layer

3. Liquid outlet channel

4. Flow meter

5. Air bubble

6. Medicinal liquid

7. Liquid supply device

8. Exhaust passage

9. Wafer

Detailed Description

The following description of the embodiments of the present application is provided for illustrative purposes, and other advantages and capabilities of the present application will become apparent to those skilled in the art from the present disclosure.

It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings. In order to make the technical solutions better understood by those skilled in the art, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only partial embodiments of the present application, but not all embodiments. All other embodiments obtained by a person of ordinary skill in the art based on the embodiments of the present application without making any creative effort shall fall within the protection scope of the present application.

It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the accompanying drawings are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. Moreover, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover non-exclusive inclusions, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

Referring to fig. 1 and fig. 2, an embodiment of a bubble filtering system of a wafer etching apparatus includes: a liquid supply channel 1, a bubble filter 2, a liquid outlet channel 3 and a flowmeter 4. The liquid supply channel 1 and the liquid outlet channel 3 may be pipes, such as PVC (Polyvinyl chloride) pipes or PFA (fusible polytetrafluoroethylene) pipes. The liquid supply passage 1 is used to supply the liquid medicine 6 containing the bubbles 5. The bubble filter 2 comprises a sealed box body 20 and a filter layer 21, the filter layer 21 is arranged in the sealed box body 20, the sealed box body 20 is provided with a liquid medicine inlet 200, a liquid medicine outlet 201 and an exhaust outlet 202, the liquid medicine inlet 200 is connected to the liquid supply channel 1, and the filter layer 21 separates the liquid medicine outlet 201 from the exhaust outlet 202 so as to allow the liquid medicine 6 to flow out of the liquid medicine outlet 201 and allow the bubbles 5 to be exhausted from the exhaust outlet 202. One end of the liquid outlet channel 3 is connected with a liquid medicine outlet 201. The outlet channel 3 can be connected with the liquid medicine outlet 201 by a screw connection. The flow meter 4 is disposed in the liquid outlet channel 3, and the flow meter 4 is used for measuring the flow rate of the liquid medicine 6 flowing through the liquid outlet channel 3. The chemical liquid 6 is sprayed on the wafer 9 after flowing out of the flow meter 4.

By arranging the bubble filter 2 between the liquid supply channel 1 and the liquid outlet channel 3 and arranging the liquid medicine inlet 200, the liquid medicine outlet 201 and the exhaust outlet 202 on the sealed box body 20, the filter layer 21 is arranged in the sealed box body 20, the liquid medicine inlet 200 is connected with the liquid supply channel 1, and the filter layer 21 separates the liquid medicine outlet 201 from the exhaust outlet 202, so that the liquid medicine 6 flows out from the liquid medicine outlet 201 and the bubbles 5 are discharged from the exhaust outlet 202. Because one end of the liquid outlet channel 3 is connected with the liquid medicine outlet 201, the flow meter 4 is arranged on the liquid outlet channel 3, and the air bubbles 5 in the liquid medicine 6 flowing out of the liquid outlet channel 3 are filtered by the filter layer 21, the liquid medicine 6 flowing to the flow meter 4 does not contain the air bubbles 5 any more, and the monitoring and alarming of the flow meter 4 caused by the air bubbles 5 passing through the flow meter 4 are avoided.

Referring to fig. 3 and 4, preferably, the filter layer 21 is a filter channel, one end of which is connected to the liquid medicine inlet 200, and the other end of the filter layer 21 is connected to the exhaust outlet 202. The filter 21 may be connected to the liquid medicine inlet 200 and the exhaust outlet 202 by gluing, welding, or the like. The filter layer 21 is a filter channel, one end of the filter layer 21 is connected with the liquid medicine inlet 200, the other end of the filter layer 21 is connected with the exhaust outlet 202, the liquid medicine 6 can penetrate through the side surface of the filter layer 21 and the air bubbles 5 can be exhausted from the exhaust outlet 202, so that the air bubbles 5 only flow in the filter channel and cannot reach other positions in the sealed box body 20, and the air bubbles 5 are prevented from freely reaching other positions in the sealed box body 20. If the bubbles 5 reach other positions inside the sealed box 20 and are not discharged in time, the pressure inside the sealed box 20 rises due to the accumulation of the bubbles 5, and the pressure in each pipeline communicated with the sealed box 20 rises, which affects the normal flow of the liquid medicine 6.

Referring to fig. 3 and 4 together, the sealed box 20 is preferably a sealed cylinder. For example, the sealed housing 20 may be a cylindrical sealed cylinder.

Referring to fig. 3 and 4 together, preferably, the sealed box 20 is arranged vertically, and the axis of the filter layer 21 is substantially parallel to the axis of the sealed box 20. The liquid medicine inlet 200 is disposed at the bottom of the hermetic container 20, and the exhaust outlet 202 is disposed at the top of the hermetic container 20. Because the sealed box body 20 is vertically arranged, the axis of the filter layer 21 is approximately parallel to the axis of the sealed box body 20, the liquid medicine inlet 200 is arranged at the bottom of the sealed box body 20, and the exhaust outlet 202 is arranged at the top of the sealed box body 20, the air bubbles 5 in the liquid medicine 6 are less obstructed by the filter layer 21 in the process of rising to the exhaust outlet 202 because the buoyancy of the air bubbles is larger than the gravity of the air bubbles, and the exhaust of the air bubbles 5 can be accelerated.

Preferably, the filter layer 21 is a permeable membrane. The permeable membrane may be cotton fabric, wool fabric, silk fabric, synthetic fiber fabric, glass fiber fabric, filter paper, filter felt, filter pad, etc., as long as the pore diameter is smaller than the sphere diameter of the air bubbles 5.

Referring to fig. 1 and fig. 2, preferably, the bubble filtering system of the wafer etching apparatus further includes a liquid supply device 7 and an exhaust channel 8, one end of the liquid supply device 7 is connected to the liquid supply channel 1, and the liquid supply device 7 stores a liquid medicine 6 containing bubbles 5. One end of the exhaust channel 8 is connected with the exhaust outlet 202, the other end of the exhaust channel 8 is connected with the liquid supply device 7, and the exhaust channel 8 is used for discharging and conveying the bubbles 5 to the liquid supply device 7. The liquid supply means 7 may be a liquid supply tank and the gas discharge passage 8 may be a pipe, such as a PVC (Polyvinyl chloride) pipe or a PFA (fusible polytetrafluoroethylene) pipe. One end of the exhaust channel 8 is connected with the exhaust outlet 202, and the other end of the exhaust channel 8 is connected with the liquid supply device 7, so that the air bubbles 5 exhausted from the air bubble filter 2 can enter the liquid supply device 7 through the exhaust channel 8, and the pressure of the upper space of the liquid medicine 6 can be increased by the air bubbles 5 entering the liquid supply device 7, and the liquid medicine 6 can flow out of the liquid supply device 7 conveniently. The air bubbles 5 can enter the air discharge channel 8 in a mode of being the whole air bubbles 5, and can also enter the air discharged after the air bubbles 5 are burst.

The bubble filtering system of the wafer etching apparatus provided in the embodiments of the present application is described in detail above, and a person skilled in the art may change the embodiments and the application scope according to the ideas of the embodiments of the present application. In summary, the present disclosure should not be construed as limiting the present application, and all equivalent modifications and changes made according to the spirit and technical ideas of the present application should be covered by the claims of the present application.

Claims

1. A bubble filtering system of a wafer etching device is characterized by comprising:

a liquid supply passage (1) for supplying a liquid medicine (6) containing bubbles (5);

the bubble filter (2) comprises a sealed box body (20) and a filter layer (21), the filter layer (21) is arranged in the sealed box body (20), the sealed box body (20) is provided with a liquid medicine inlet (200), a liquid medicine outlet (201) and an exhaust outlet (202), the liquid medicine inlet (200) is connected to the liquid supply channel (1), and the filter layer (21) separates the liquid medicine outlet (201) from the exhaust outlet (202) so that the liquid medicine (6) flows out of the liquid medicine outlet (201) and the bubbles (5) are discharged from the exhaust outlet (202);

a liquid outlet channel (3), one end of which is connected with the liquid medicine outlet (201); and

and the flowmeter (4) is arranged in the liquid outlet channel (3), and the flowmeter (4) is used for measuring the flow of the liquid medicine flowing through the liquid outlet channel (3).

2. The wafer etching equipment bubble filtering system of claim 1, wherein the liquid supply channel (1) is a pipe.

3. The wafer etching equipment bubble filtering system of claim 1, wherein the filtering layer (21) is a filtering channel, one end of the filtering layer is connected with the liquid medicine inlet (200), and the other end of the filtering layer (21) is connected with the exhaust outlet (202).

4. The wafer etching equipment bubble filtering system of claim 3, wherein the sealed box body (20) is a sealed cylinder body.

5. The wafer etching equipment bubble filtering system of claim 4, wherein the sealed box body (20) is vertically arranged.

6. The wafer etching equipment bubble filtering system of claim 5, wherein the axis of the filtering layer (21) and the axis of the sealed box body (20) are approximately parallel.

7. The wafer etching equipment bubble filtering system of claim 6, wherein the liquid medicine inlet (200) is arranged at the bottom of the sealed box body (20), and the exhaust outlet (202) is arranged at the top of the sealed box body (20).

8. The wafer etching equipment bubble filtering system of claim 1, wherein the filtering layer (21) is a permeable membrane.

9. The wafer etching equipment bubble filtering system according to any one of claims 1 to 8, further comprising a liquid supply device (7), one end of which is connected to the liquid supply channel (1), wherein the liquid supply device (7) stores liquid medicine containing bubbles (5).

10. The bubble filtering system of the wafer etching equipment as claimed in claim 9, further comprising an exhaust channel (8), one end of which is connected to the exhaust outlet (202), the other end of the exhaust channel (8) is connected to the liquid supply device (7), and the exhaust channel (8) is used for exhausting and conveying the bubbles (5) to the liquid supply device (7).