CN218446214U - Galvanometer leveling device and laser processing equipment - Google Patents
Galvanometer leveling device and laser processing equipment Download PDFInfo
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- CN218446214U CN218446214U CN202222481423.2U CN202222481423U CN218446214U CN 218446214 U CN218446214 U CN 218446214U CN 202222481423 U CN202222481423 U CN 202222481423U CN 218446214 U CN218446214 U CN 218446214U
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- 230000001105 regulatory effect Effects 0.000 claims description 5
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- 230000009286 beneficial effect Effects 0.000 description 2
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Abstract
The application provides a mirror levelling device and laser beam machining equipment shake, shakes the mirror levelling device and includes: a supporting seat; the angle adjusting platform is arranged on the supporting seat; the mounting seat is arranged on the angle adjusting platform, the mounting seat is provided with a mounting surface for mounting the vibrating mirror, and the angle adjusting platform is used for driving the mounting seat to deflect relative to the workbench surface; and at least three groups of pilot lamp modules, every group pilot lamp module includes the light source subassembly, light path adjusting part and speculum, and the light source subassembly passes through the light path adjusting part to be fixed on the mount pad for launch towards table surface's incident beam, speculum demountable installation is on table surface or installation face, is used for reflecting incident beam, and light path adjusting part is used for driving the relative installation face of light source subassembly and deflects, adjusts with the depth of parallelism between the plane that realizes the light source subassembly place and the installation face. The application provides a mirror levelling device shakes realizes that the depth of parallelism between mirror and the table surface adjusts, improves the machining precision.
Description
Technical Field
The application belongs to the technical field of laser processing, and particularly relates to a galvanometer leveling device and laser processing equipment.
Background
Laser processing is widely applied to various industries due to the advantages of high processing quality, high processing speed and the like. The galvanometer is used as a device for controlling a laser scanning path of laser processing equipment, and plays an important role in laser processing precision.
However, after the galvanometer in the related art is installed on equipment, the parallelism between the galvanometer and the processing table top cannot be adjusted, and further, the processing precision is low.
SUMMERY OF THE UTILITY MODEL
The application aims to provide a mirror levelling device shakes can adjust the depth of parallelism between mirror and the processing mesa of shaking.
In order to achieve the purpose, the technical scheme adopted by the application is as follows: provided is a galvanometer leveling device, comprising:
a supporting seat;
an angle adjusting table; the support seat is arranged on the support seat;
the mounting base is arranged on the angle adjusting platform and is provided with a mounting surface for mounting the galvanometer, and the angle adjusting platform is used for driving the mounting base to deflect relative to the working table surface so as to realize the parallelism adjustment between the galvanometer and the working table surface; and the number of the first and second groups,
at least three groups of pilot lamp modules, every group the pilot lamp module includes light source subassembly, light path adjusting part and speculum, the light source subassembly passes through light path adjusting part fixes on the mount pad for launch towards table surface's incident beam, speculum demountable installation in table surface or on the installation face, be used for with incident beam reflects, light path adjusting part is used for driving the light source subassembly is relative the installation face deflects, in order to realize the plane at light source subassembly place with depth of parallelism between the installation face is adjusted.
Further, the optical path adjusting assembly includes:
the adjusting seat is arranged on the mounting seat;
the light source assembly is connected to the adjusting seat through the fixing piece; and (c) a second step of,
the adjusting piece is adjustably connected with the adjusting seat, and the free end of the adjusting piece extends out of the adjusting seat and abuts against the light source assembly, so that the light source assembly can deflect by taking the fixing piece as a deflection center.
Furthermore, the regulating part includes a plurality ofly, and a plurality ofly the regulating part interval sets up in adjust on the seat.
Furthermore, a first through hole is formed in the adjusting seat, a connecting hole is formed in the light source assembly, and the fixing piece penetrates through the first through hole and is fixedly connected with the connecting hole.
Furthermore, the adjusting seat is provided with an adjusting hole, the adjusting piece is adjustably installed in the adjusting hole, and the free end of the adjusting piece extends out in different lengths through the matching of the adjusting piece and the adjusting hole.
Further, the mounting base comprises a mounting plate and a vertical plate, the mounting plate is provided with the mounting surface, the vertical plate is arranged on one side, deviating from the mounting surface, of the mounting plate, and the light path adjusting component is arranged on the vertical plate.
Furthermore, the mounting plate and the vertical plate are respectively provided with a light through groove for the incident light beam emitted by the light source assembly to pass through.
Furthermore, the reflector is attached to the mounting surface or the working table surface in a sticking mode.
The application still provides a laser beam machining equipment, include table surface, shake the mirror and as above shake the mirror levelling device, shake the mirror set up in on the installation face, table surface set up in the mount pad orientation one side of the mirror that shakes.
Furthermore, the laser processing equipment also comprises a lifting mechanism, and the vibrating mirror leveling device is arranged on the lifting mechanism and driven by the lifting mechanism to move along the direction close to or far away from the working table surface.
The application provides a mirror levelling device and laser beam machining equipment's beneficial effect lies in: this application shakes mirror levelling device, through setting up the mount pad in angle adjustment bench, and add three at least group pilot lamp modules of group on the mount pad, the pilot lamp module includes the light source subassembly, light path adjusting part and speculum, can drive the relative installation face of light source subassembly through light path adjusting part and deflect, thereby realized the depth of parallelism between light source subassembly and the installation face and adjusted, can drive the relative table surface of mount pad through angle adjustment bench simultaneously and deflect, and then realize shaking the depth of parallelism between mirror and the table surface and adjust, and the machining precision is improved. And utilize the speculum demountable installation on table surface or installation face, whether coincide through the incident beam of observing light source subassembly transmission and the reflected light beam of speculum reflection, can directly judge whether the plane that the light source subassembly was located is parallel with installation face or table surface to whether can directly perceivedly judge to shake between mirror and the table surface parallel, and adjust simple and conveniently, can effectively improve work efficiency.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
Fig. 1 is a schematic perspective view of a galvanometer leveling device provided in an embodiment of the present application;
fig. 2 is an exploded schematic view of a galvanometer leveling device provided in an embodiment of the present application;
fig. 3 is a schematic partial structural view of a galvanometer leveling device provided in an embodiment of the present application;
fig. 4 is a schematic structural diagram of a mounting seat and an indicator light module provided in the embodiment of the present application;
FIG. 5 is a schematic diagram of the exploded structure of FIG. 4;
fig. 6 is a schematic perspective view of a laser processing apparatus according to an embodiment of the present disclosure, in which a reflector is disposed on a mounting surface;
fig. 7 is a schematic perspective view of a laser processing apparatus according to an embodiment of the present application, in which a mirror is disposed on a work table.
Wherein, in the figures, the respective reference numerals:
100. a galvanometer leveling device; 10. a supporting seat; 20. an angle adjusting table; 30. a mounting seat; 31. a mounting surface; 32. mounting a plate; 33. a vertical plate; 34. a light-transmitting groove; 40. an indicator light module; 41. a light source assembly; 411. an incident beam; 42. an optical path adjusting component; 421. an adjusting seat; 422. a fixing member; 423. an adjustment member; 43. a mirror; 431. reflecting the light beam; 50. the plane where each indicator light module is located; 200. a galvanometer; 300. a work table; 400. a lifting mechanism.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like, refer to an orientation or positional relationship illustrated in the drawings for convenience in describing the present application and to simplify description, and do not indicate or imply that the referenced device or element must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be construed as limiting the present application.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
Referring to fig. 1, 2 and 6 together, the leveling device 100 of the galvanometer 200 provided by the present application will be described. The present application discloses a galvanometer 200 leveling device 100, including a supporting base 10, an angle adjusting platform 20, a mounting base 30 and at least three sets of indicator light modules 40. The angle adjusting table 20 is disposed on the support base 10. The mount 30 is provided on the angle adjusting table 20. The mount 30 has a mounting surface 31 for mounting the galvanometer 200. The angle adjusting table 20 is used for driving the mounting base 30 to deflect relative to the working table 300, so as to adjust the parallelism between the galvanometer 200 and the working table 300.
The basic principle that a plane can be determined by using three points is utilized, and the plane where each indicator lamp module 40 is located can be determined by arranging at least three groups of indicator lamp modules 40. It should be understood that the number of indicator light modules 40 may include three or more sets.
As shown in fig. 2, 3, and 6 to 7, each set of indicator light modules 40 includes a light source assembly 41, a light path adjusting assembly 42, and a reflector 43, wherein the light source assembly 41 is fixed on the mounting base 30 through the light path adjusting assembly 42 for emitting an incident light beam 411 toward the work table 300. The mirror 43 is removably mounted to the countertop 300 or the mounting surface 31 for reflecting the incident beam 411. The optical path adjusting component 42 is used for driving the light source components 41 to deflect relative to the mounting surface 31, so that the parallelism between the plane 50 where each light source component is located and the mounting surface 31 is adjusted, and further the parallelism between the plane where each light source component 41 is located and the galvanometer 200 is adjusted.
As shown in fig. 6, when the reflector 43 is mounted on the mounting surface 31, it is possible to visually determine whether the plane 50 on which each light source assembly is located is parallel to the mounting surface 31 by observing whether the incident light beam 411 emitted by each light source assembly 41 overlaps with the reflected light beam 431 reflected by the reflector 43 on the mounting surface 31. When the incident light beam 411 emitted by each light source assembly 41 coincides with the reflected light beam 431 reflected by the reflector 43 on the mounting surface 31, the plane 50 where each light source assembly is located is parallel to the mounting surface 31. If the incident light beams 411 emitted by each light source assembly 41 do not coincide with the reflected light beams 431 reflected by the reflector 43 on the mounting surface 31, the light path adjusting assembly 42 can drive the light source assembly 41 to deflect relative to the mounting surface 31 until the incident light beams 411 emitted by each light source assembly 41 coincide with the reflected light beams 431 reflected by the reflector 43 on the mounting surface 31.
As shown in fig. 7, when the reflector 43 is mounted on the work bench 300, it is observed whether the incident light beam 411 emitted by each light source assembly 41 overlaps the reflected light beam 431 reflected by the reflector 43 on the work bench 300, so that it can be intuitively determined whether the plane 50 where each light source assembly is located is parallel to the work bench 300. When the incident light beam 411 emitted by each light source assembly 41 coincides with the reflected light beam 431 reflected by the reflector 43 on the work bench 300, the plane 50 where each light source assembly is located is parallel to the work bench 300. If the incident beam 411 emitted by each light source assembly 41 is not coincident with the reflected beam 431 reflected by the reflector 43 on the worktable 300, the angle adjusting table 20 can drive the mounting base 30 to deflect relative to the worktable 300, and at this time, the light source assemblies 41 synchronously deflect until the incident beam 411 emitted by each light source assembly 41 is coincident with the reflected beam 431 reflected by the reflector 43 on the worktable 300. The plane 50 of each light source assembly is parallel to the mounting surface 31 and the working platform 300, so that the mounting surface 31 is parallel to the working platform 300, that is, the vibrating mirror 200 is parallel to the working platform 300.
The adjustment process of the galvanometer 200 leveling device 100 of the present application is as follows:
when it is necessary to adjust the parallelism between the galvanometer mirror 200 and the work surface 300, first, as shown in fig. 6, the reflecting mirror 43 is placed on the mounting surface 31, and whether the incident beam 411 emitted by each light source assembly 41 coincides with the reflected beam 431 reflected by the reflecting mirror 43 on the mounting surface 31 is observed. If the incident light beams 411 emitted by each light source assembly 41 do not coincide with the reflected light beams 431 reflected by the reflector 43 on the mounting surface 31, the light path adjusting assembly 42 can drive the light source assembly 41 to deflect relative to the mounting surface 31 until the incident light beams 411 emitted by each light source assembly 41 coincide with the reflected light beams 431 reflected by the reflector 43 on the mounting surface 31, and at this time, the plane 50 where each light source assembly is located is parallel to the mounting surface 31.
Next, as shown in fig. 7, the reflecting mirror 43 is placed on the table top 300, and whether the incident light beam 411 emitted from each light source assembly 41 overlaps the reflected light beam 431 reflected by the reflecting mirror 43 on the table top 300 is observed. If the incident beam 411 emitted by each light source assembly 41 is not coincident with the reflected beam 431 reflected by the reflector 43 on the work table 300, the angle adjusting table 20 can drive the mounting base 30 to deflect relative to the work table 300, at this time, the light source assemblies 41 synchronously deflect until the incident beam 411 emitted by each light source assembly 41 is coincident with the reflected beam 431 reflected by the reflector 43 on the work table 300, at this time, the plane 50 where each light source assembly is located is parallel to the work table 300, and because the plane 50 where each light source assembly is located is parallel to the mounting surface 31 at the same time, it can be obtained that the mounting surface 31 is parallel to the work table 300, that is, the vibration mirror 200 is parallel to the work table 300.
The application provides a mirror 200 levelling device 100 shakes, through setting up mount pad 30 on angle adjustment platform 20, and add three at least group pilot lamp modules 40 of group on mount pad 30, pilot lamp module 40 includes light source subassembly 41, light path adjusting part 42 and speculum 43, can drive light source subassembly 41 and deflect installation face 31 relatively through light path adjusting part 42, thereby realized that the depth of parallelism between light source subassembly 41 and the installation face 31 is adjusted, can drive mount pad 30 and deflect table surface 300 relatively through angle adjustment platform 20 simultaneously, and then realize that the depth of parallelism between mirror 200 and the table surface 300 shakes and adjust, and the machining precision is improved. And the reflector 43 is detachably mounted on the working table 300 or the mounting surface 31, and whether the plane where the light source assembly 41 is located is parallel to the mounting surface 31 or the working table 300 can be directly judged by observing whether the incident light beam 411 emitted by the light source assembly 41 is superposed with the reflected light beam 431 reflected by the reflector 43, so that whether the vibrating mirror 200 is parallel to the working table 300 can be intuitively judged, the adjustment is simple and convenient, and the working efficiency can be effectively improved.
Referring to fig. 4 to 5, the optical path adjusting assembly 42 may include an adjusting seat 421, a fixing member 422, and an adjusting member 423. The adjusting seat 421 is disposed on the mounting seat 30. The light source assembly 41 is connected to the adjusting seat 421 through a fixing member 422. The adjusting member 423 is adjustably connected to the adjusting seat 421, and a free end of the adjusting member 423 extends out of the adjusting seat 421 and abuts against the light source assembly 41, so that the light source assembly 41 can deflect with the fixing member 422 as a deflection center. Through adjusting the adjusting piece 423, the light source assembly 41 can deflect by taking the fixing piece 422 as a deflection center, and then the parallelism adjustment between the plane where the light source assembly 41 is located and the mounting surface 31 is realized.
Referring to fig. 4 to 5, the adjusting member 423 may include a plurality of adjusting members 423 disposed on the adjusting base 421 at intervals. Through setting up a plurality of regulating parts 423 to adjustable light source subassembly 41 of different positions department and the distance of adjusting between the seat 421 realize the plane degree of light source subassembly 41 and adjust more accurately. Specifically, in one of the embodiments of the present application, the adjusting members 423 may be provided in two. Of course, the number of the adjusting members 423 is not limited thereto, for example, in other embodiments of the present application, the adjusting members 423 may be provided more, for example, three, four, etc.
Referring to fig. 4 to 5, the adjusting base 421 may have a first through hole (not shown), the light source assembly 41 may have a connecting hole (not shown), and the fixing member 422 passes through the first through hole and is connected and fixed with the connecting hole. The light source assembly 41 can be fixed on the adjusting seat 421 by the cooperation of the fixing member 422 and the connecting hole. Specifically, in one embodiment of the present application, the fixing element 422 may be a fixing screw, and the connecting hole may be a threaded hole.
Referring to fig. 4 to 5, the adjusting seat 421 may be provided with an adjusting hole (not shown), the adjusting member 423 is adjustably installed in the adjusting hole, and the protruding length of the free end of the adjusting member 423 is adjusted by the cooperation between the adjusting member 423 and the adjusting hole, so as to adjust the flatness of the light source assembly 41. Specifically, in one of the embodiments of the present application, the adjusting member 423 may be an adjusting screw, and the adjusting screw can be rotated to adjust the extending length of the free end of the adjusting screw, so that the adjustment is very simple and convenient.
Referring to fig. 3, the mounting base 30 may include a mounting plate 32 and a vertical plate 33, wherein the mounting plate 32 has the mounting surface 31. The vertical plate 33 is disposed on a side of the mounting plate 32 away from the mounting surface 31, and the light path adjusting component 42 is disposed on the vertical plate 33. By disposing the optical path adjusting member 42 on the vertical plate 33, it can improve the structural stability.
Referring to fig. 4 to 5, the mounting plate 32 and the vertical plate 33 may be respectively provided with a light-passing groove 34 for passing an incident light beam 411 emitted by the light source assembly 41. By the arrangement of the light-passing groove 34, the blocking of the incident light beam 411 emitted from the light source assembly 41 can be avoided.
Referring to fig. 6 to 7, the reflector 43 can be adhered to the mounting surface 31 or the work bench 300 by adhesion, and the installation is simple and convenient. Of course, the reflector 43 may be fixed to the mounting surface 31 or the work surface 300 by other means, such as by screws.
The light source assembly 41 may be a laser, and the light source assembly 41 may also be other types of light source assemblies 41, which is not limited herein.
Referring to fig. 6 to 7, the present application further provides a laser processing apparatus, which includes a worktable 300, a galvanometer 200, and the galvanometer 200 leveling device 100 in any of the embodiments described above. The galvanometer mirror 200 is disposed on the mounting surface 31, and the table surface 300 is disposed on a side of the mounting base 30 facing the galvanometer mirror 200. Since the laser processing apparatus includes the vibration mirror 200 leveling device 100 in any of the above embodiments, the laser processing apparatus has the beneficial effects brought by the vibration mirror 200 leveling device 100 in any of the above embodiments, and details are not repeated herein.
Referring to fig. 6 to 7, the laser processing apparatus may further include a lifting mechanism 400, and the galvanometer 200 leveling device 100 is disposed on the lifting mechanism 400 and driven by the lifting mechanism 400 to move in a direction close to or away from the worktable 300. By arranging the lifting mechanism 400, the galvanometer 200 can move along the direction close to or far away from the worktable 300, so that the galvanometer 200 can be conveniently processed.
The above description is only a preferred embodiment of the present application and should not be taken as limiting the present application, and any modifications, equivalents, improvements, etc. made within the spirit and principle of the present application should be included in the protection scope of the present application.
Claims (10)
1. The utility model provides a galvanometer levelling device which characterized in that: the method comprises the following steps:
a supporting base;
an angle adjusting table; the support seat is arranged on the support seat;
the mounting base is arranged on the angle adjusting platform and is provided with a mounting surface for mounting the galvanometer, and the angle adjusting platform is used for driving the mounting base to deflect relative to the working table surface so as to realize the parallelism adjustment between the galvanometer and the working table surface; and the number of the first and second groups,
at least three groups of pilot lamp modules, every group the pilot lamp module includes light source subassembly, light path adjusting part and speculum, the light source subassembly passes through light path adjusting part fixes on the mount pad for launch towards table surface's incident beam, speculum demountable installation in table surface or on the installation face, be used for with incident beam reflects, light path adjusting part is used for driving the light source subassembly is relative the installation face deflects, in order to realize the plane at light source subassembly place with depth of parallelism between the installation face is adjusted.
2. The galvanometer leveling device of claim 1, wherein: the optical path adjusting member includes:
the adjusting seat is arranged on the mounting seat;
the light source assembly is connected to the adjusting seat through the fixing piece; and the number of the first and second groups,
the adjusting piece is adjustably connected with the adjusting seat, and the free end of the adjusting piece extends out of the adjusting seat and abuts against the light source assembly, so that the light source assembly can deflect by taking the fixing piece as a deflection center.
3. The galvanometer leveling device of claim 2, wherein: the regulating part includes a plurality ofly, and is a plurality of the regulating part interval set up in adjust on the seat.
4. The galvanometer leveling device of claim 2, wherein: the adjusting seat is provided with a first through hole, the light source assembly is provided with a connecting hole, and the fixing piece penetrates through the first through hole and is fixedly connected with the connecting hole.
5. The galvanometer leveling device of claim 2, wherein: the adjusting seat is provided with an adjusting hole, the adjusting piece is adjustably installed in the adjusting hole, and the free end of the adjusting piece extends out in different lengths through the matching of the adjusting piece and the adjusting hole.
6. A galvanometer leveling device according to any of claims 1-5, wherein: the mounting seat comprises a mounting plate and a vertical plate, the mounting plate is provided with the mounting surface, the vertical plate is arranged on one side, deviating from the mounting surface, of the mounting plate, and the light path adjusting component is arranged on the vertical plate.
7. The galvanometer leveling device of claim 6, wherein: and the mounting plate and the vertical plate are respectively provided with a light through groove for the incident light beams emitted by the light source component to pass through.
8. The galvanometer leveling device of any one of claims 1-5, wherein: the reflector is attached to the mounting surface or the working table surface in a sticking mode.
9. A laser processing apparatus characterized by: the vibration mirror leveling device comprises a working table surface, a vibration mirror and the vibration mirror leveling device according to any one of claims 1 to 8, wherein the vibration mirror is arranged on the installation surface, and the working table surface is arranged on one side, facing the vibration mirror, of the installation seat.
10. The laser machining apparatus of claim 9, wherein: the laser processing equipment further comprises a lifting mechanism, and the vibrating mirror leveling device is arranged on the lifting mechanism and driven by the lifting mechanism to move along the direction close to or far away from the working table surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222481423.2U CN218446214U (en) | 2022-09-19 | 2022-09-19 | Galvanometer leveling device and laser processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222481423.2U CN218446214U (en) | 2022-09-19 | 2022-09-19 | Galvanometer leveling device and laser processing equipment |
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| Publication Number | Publication Date |
|---|---|
| CN218446214U true CN218446214U (en) | 2023-02-03 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222481423.2U Active CN218446214U (en) | 2022-09-19 | 2022-09-19 | Galvanometer leveling device and laser processing equipment |
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| Country | Link |
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| CN (1) | CN218446214U (en) |
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Effective date of registration: 20231117 Address after: 518000 Building 401, Building 4, Chongqing Road, Han's Laser Industrial Park, Heping Community, Fuyong Street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: SHENZHEN HAN'S SCANNER S&T Co.,Ltd. Address before: No.9988, Shennan Avenue, Nanshan District, Shenzhen City, Guangdong Province Patentee before: HAN'S LASER TECHNOLOGY INDUSTRY GROUP Co.,Ltd. Patentee before: SHENZHEN HAN'S SCANNER S&T Co.,Ltd. |