CN218424374U

CN218424374U - Multifunctional wafer single-chip type cleaning machine

Info

Publication number: CN218424374U
Application number: CN202221541443.8U
Authority: CN
Inventors: 徐竹林
Original assignee: Hualin Kona Jiangsu Semiconductor Equipment Co ltd
Current assignee: Hualin Kona Jiangsu Semiconductor Equipment Co ltd
Priority date: 2022-06-20
Filing date: 2022-06-20
Publication date: 2023-02-03
Anticipated expiration: 2032-06-20

Abstract

The utility model relates to a cleaning machine technical field just discloses a multi-functional wafer monolithic formula cleaning machine, including base and purge chamber, the upper right end of base is connected with the box, the inside bottom of box is provided with the washing water tank, turn right from a left side and set gradually first filling pipeline and second filling pipeline in the upper right end of washing water tank, the one end of first filling pipeline and second filling pipeline is provided with first filler and second filler respectively. The utility model discloses a set up heating wire, fan, drying chamber, cylinder, drain pipe, catch basin, first filling pipe way, second filling pipe way, first filling mouth and second filling mouth, utilize the mutually supporting effect between them to can realize carrying out drying process to the wafer after wasing, and can collect the sewage after wasing, can separately annotate two kinds of raw materials components in the washing liquid in addition, mutual noninterference, functional strong.

Description

Multifunctional wafer single-chip type cleaning machine

Technical Field

The utility model relates to a cleaning machine technical field specifically is a multi-functional wafer monolithic formula cleaning machine.

Background

When cleaning wafers, a single wafer cleaning machine is used, and although there are many types of single wafer cleaning machines, the requirements of users still cannot be met.

When the existing wafer single-chip type cleaning machine is used, the cleaned wafer cannot be dried, the cleaned sewage cannot be collected, two raw material components in the cleaning solution cannot be separately filled, so that mutual interference is caused, only the cleaning function is provided, and the function is single, so that the multifunctional wafer single-chip type cleaning machine is urgently needed to solve the defects.

SUMMERY OF THE UTILITY MODEL

The utility model provides a be not enough to prior art, the utility model provides a multi-functional wafer monolithic formula cleaning machine has solved current wafer monolithic formula cleaning machine, when using, can't carry out drying process to the wafer after wasing, and can not collect the sewage after wasing, can not separately annotate two kinds of raw materials components in the washing liquid in addition, leads to mutual interference, only has cleaning function for functional single problem.

The utility model provides a following technical scheme: the utility model provides a multi-functional wafer monolithic formula cleaning machine, includes base and purge chamber, the upper right end of base is connected with the box, the inside bottom of box is provided with the washing water tank, the upper right end of washing water tank has set gradually first filling pipeline and second filling pipeline from a left side to the right side, the one end of first filling pipeline and second filling pipeline is provided with first filler and second filler respectively, the upper left side of box is provided with the purge chamber, the inside top of purge chamber is connected with the spray line directly below through the bracing piece, the upper left end of washing water tank passes the lateral wall of box and purge chamber through pipeline and is linked together with the one end of inside spray line, the lower right end of spray line is connected with the subchannel, one side of subchannel is connected with the washing nozzle, the bottom of spray line is connected with the cylinder by middle department, the lower extreme of cylinder is connected with the drying chamber, the inside bottom of purge chamber is provided with the catch basin, the inboard bottom of catch basin is provided with a supporting bench, the upper end of supporting bench face is provided with the washing mesa, the inside top of drying chamber is provided with the water pump, the water tank is provided with the water pump through the water pump on the water tank, the water pump is connected with the front end face of the water pump of the water tank, the water pump is connected with the control panel of the water pump, the water tank is connected with the water pump on the water tank, the water pump is connected with the bearing block before the water pump, the water pump is connected with the water pump.

Preferably, the inlet ends of the first filling port and the second filling port are both provided with pistons.

Preferably, the number of the sub-runners and the number of the cleaning nozzles are two, and the sub-runners and the cleaning nozzles are arranged in a left-right axial symmetry mode relative to the spraying pipeline.

Preferably, the number of the cylinders is two, and the two cylinders are arranged in a left-right axial symmetry manner relative to the drying chamber.

Preferably, the cleaning table is in a supporting grid structure.

Preferably, the lower end of the drain pipe passes through the bottom of the washing chamber and extends outward.

Compared with the prior art, the utility model discloses possess following beneficial effect:

the utility model discloses a set up heating wire, fan, drying chamber, cylinder, drain pipe, catch basin, first filling pipe way, second filling pipe way, first filler and second filler, utilize the mutually supporting effect between them to can realize carrying out drying process to the wafer after wasing, and can collect the sewage after wasing, can separately annotate two kinds of raw materials components in the washing liquid in addition, mutual noninterference, functional strong.

Drawings

Other features, objects and advantages of the present application will become more apparent upon reading of the detailed description of non-limiting embodiments made with reference to the following drawings:

fig. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of the appearance structure of the present invention;

fig. 3 is a schematic view of the internal structure of the drying chamber of the present invention.

In the figure: 1. a base; 2. a box body; 3. cleaning the water tank; 4. a second fill line; 5. a first fill line; 6. a second filling port; 7. a first fill port; 8. a delivery conduit; 9. a spray pipe; 10. a support bar; 11. a shunt channel; 12. cleaning the nozzle; 13. a cleaning chamber; 14. a cylinder; 15. a drying chamber; 16. cleaning the table top; 17. a support table; 18. a water collecting tank; 19. a drain pipe; 20. a bearing block; 21. a control panel; 22. a chamber door; 23. a fan; 24. an electric heating wire.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. The drawings are only for illustrative purposes and are only schematic and non-limiting, and certain elements of the drawings may be omitted, enlarged or reduced to avoid the size of the actual product, so as to better illustrate the detailed description of the invention, and it is understood that some known structures, elements and descriptions thereof in the drawings may be omitted.

In the description of the present invention, it should be noted that, unless explicitly stated or limited otherwise, the terms "disposed" and "connected" should be interpreted broadly, and may be, for example, a fixed connection, a movable connection, a detachable connection, or an integrated connection, a mechanical connection, an electrical connection, a direct connection, an indirect connection through an intermediate medium, or a communication between two elements. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.

Referring to fig. 1-3, a multifunctional wafer single-wafer type cleaning machine comprises a base 1 and a cleaning chamber 13, wherein the right upper end of the base 1 is connected with a tank 2, the bottom end inside the tank 2 is provided with a cleaning water tank 3, the right upper end of the cleaning water tank 3 is sequentially provided with a first filling pipe 5 and a second filling pipe 4 from left to right, one end of the first filling pipe 5 and one end of the second filling pipe 4 are respectively provided with a first filling port 7 and a second filling port 6, the left upper side of the tank 2 is provided with the cleaning chamber 13, the top end inside the cleaning chamber 13 is connected with a spraying pipe 9 right below through a support rod 10, the left upper end of the cleaning water tank 3 passes through the side walls of the tank 2 and the cleaning chamber 13 through a conveying pipe 8 and is communicated with one end of the spraying pipe 9 inside, the right lower end of the spraying pipe 9 is connected with a branch flow passage 11, one side of the branch flow passage 11 is connected with a cleaning nozzle 12, the bottom of the spraying pipeline 9 is connected with an air cylinder 14 near the middle, the lower end of the air cylinder 14 is connected with a drying chamber 15, the inner bottom of the cleaning chamber 13 is provided with a water collecting tank 18, the inner bottom of the water collecting tank 18 is provided with a supporting table 17, the upper end of the supporting table 17 is provided with a cleaning table surface 16, the inner top of the drying chamber 15 is provided with a fan 23, the inner part of the drying chamber 15 is provided with an electric heating wire 24 which is positioned under the fan 23, the front end surface of the cleaning chamber 13 is connected with a chamber door 22 through a plurality of hinge parts, the front end surface of the cleaning water tank 3 is embedded with a control panel 21, the conveying pipeline 8 is provided with a water conveying pump, the left lower end of the water collecting tank 18 is provided with a water discharging pipe 19, and by utilizing the mutual cooperation effect between the water collecting tank and the water conveying tank, the cleaned sewage can be collected, and in addition, two raw material components in the cleaning liquid can be separately filled, mutual noninterference, functional strong, the bottom of purge chamber 13 is connected with the upper left end of base 1 through bearing block 20, the entry end of first filler 7 and second filler 6 all is provided with the piston, the quantity of subchannel 11 and cleaning nozzle 12 all sets up to two, and all be about spray piping 9 and control axisymmetric setting, the quantity of cylinder 14 sets up to two, two cylinders 14 are the bilateral symmetry setting about drying chamber 15, wash mesa 16 for supporting grid structure, the lower extreme of drain pipe 19 passes the bottom of purge chamber 13 and outwards extends.

The utility model discloses a theory of operation and use flow: firstly, a door 22 is opened through a hinge, a wafer to be cleaned is placed on the upper surface of a cleaning table 16, then the door 22 is closed, at this time, a water delivery pump on a delivery pipeline 8 is started, cleaning liquid in a cleaning water tank 3 is delivered to a spraying pipeline 9 through the delivery pipeline 8, and finally the cleaning liquid is sprayed to the wafer on the cleaning table 16 through a cleaning nozzle 12 on a branch pipeline 11, so that the wafer is cleaned, the cleaned sewage flows to a water collecting tank 18 to be collected, and is finally discharged through a drain pipe 19 at the bottom, when the wafer is dried after the cleaning is completed, two cylinders 14 are started to drive a drying chamber 15 to reach a specified height, then a fan 23 and a heating wire 24 are started, heat generated when the heating wire 24 works is blown to the cleaned wafer through the fan 23 to be dried, and finally the door 22 is opened to be taken out, when raw material components in two cleaning liquids need to be filled, pistons on a first filling port 7 and a second filling port 6 are opened, and the raw material components are filled into the cleaning water tank 3 through the first filling pipe 5 and the second filling pipe 4.

It is noted that, in this document, relational terms such as first and second, and the like are used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A multifunctional wafer single-chip type cleaning machine comprises a base (1) and a cleaning chamber (13), and is characterized in that: the cleaning device is characterized in that the upper right end of the base (1) is connected with a box body (2), the bottom inside the box body (2) is provided with a cleaning water tank (3), the upper right end of the cleaning water tank (3) is sequentially provided with a first filling pipeline (5) and a second filling pipeline (4) from left to right, one ends of the first filling pipeline (5) and the second filling pipeline (4) are respectively provided with a first filling port (7) and a second filling port (6), the upper left side of the box body (2) is provided with a cleaning chamber (13), the top inside of the cleaning chamber (13) is connected with the spraying pipeline (9) right below through a support rod (10), the upper left end of the cleaning water tank (3) penetrates through the side walls of the box body (2) and the cleaning chamber (13) through a conveying pipeline (8) and is communicated with one end of the spraying pipeline (9) inside, the lower right end of the spraying pipeline (9) is connected with a sub-flow channel (11), one side of the sub-flow-channel (11) is connected with a cleaning nozzle (12), the bottom of the spraying pipeline (9) is connected with a cylinder (14), the bottom of the cylinder (14), the drying chamber (18) is provided with a water collecting tank (18), and the inner side of the drying chamber (18) is provided with a collecting tank (17), the upper end of brace table (17) is provided with washs mesa (16), the inside top of drying chamber (15) is provided with fan (23), the inside of drying chamber (15) is provided with heating wire (24) under being located fan (23), the preceding terminal surface of washroom (13) is connected with room door (22) through a plurality of hinge spare, it is equipped with control panel (21) to inlay on the preceding terminal surface of washing water tank (3), install the water delivery pump on pipeline (8), the left lower extreme of catch basin (18) is provided with drain pipe (19), the bottom of washroom (13) is connected with the upper left end of base (1) through bearing block (20).

2. The multi-function wafer single wafer cleaning machine as recited in claim 1, wherein: and pistons are arranged at the inlet ends of the first filling port (7) and the second filling port (6).

3. The multi-function wafer single wafer cleaning machine of claim 1, wherein: the number of the sub-runners (11) and the number of the cleaning nozzles (12) are both set to be two, and the sub-runners and the cleaning nozzles are arranged in a left-right axial symmetry mode relative to the spraying pipeline (9).

4. The multi-function wafer single wafer cleaning machine of claim 1, wherein: the number of the air cylinders (14) is two, and the two air cylinders (14) are arranged in a left-right axial symmetry mode relative to the drying chamber (15).

5. The multi-function wafer single wafer cleaning machine of claim 1, wherein: the cleaning table top (16) is of a supporting grid structure.

6. The multi-function wafer single wafer cleaning machine of claim 1, wherein: the lower end of the drain pipe (19) penetrates the bottom of the cleaning chamber (13) and extends outwards.