CN218416826U

CN218416826U - Wet etching device

Info

Publication number: CN218416826U
Application number: CN202222711510.2U
Authority: CN
Inventors: 王丹宇; 李泰亨; 白晓鹏; 赵方方; 王泽�; 陈红波; 董童威
Original assignee: Yi'an Aifu Wuhan Technology Co ltd
Current assignee: Yi'an Aifu Wuhan Technology Co ltd
Priority date: 2022-10-14
Filing date: 2022-10-14
Publication date: 2023-01-31
Anticipated expiration: 2032-10-14

Abstract

The utility model belongs to the technical field of etching, and provides a wet etching device, which comprises a shell, an etching part, a displacement part and a substrate mounting rack, wherein the displacement part and the substrate mounting rack are sequentially mounted inside the shell from top to bottom and are connected with the inner wall of the shell; the etching component is connected with the displacement component, the substrate is mounted on the substrate mounting frame and positioned below the etching component, and the etching component is driven by the displacement component to transversely reciprocate to etch the substrate; one end of the substrate inclines towards the bottom of the shell. The utility model discloses the one end of base plate is to casing bottom slope, is favorable to unnecessary etching solution in time to follow the base plate surface outflow, prevents that the etching solution from gathering at the excessive etching of base plate surface, causes the etching inhomogeneous, influences the base plate quality.

Description

Wet etching device

Technical Field

The utility model relates to an etching technical field especially relates to a wet etching device.

Background

In the prior art, in the process of manufacturing a liquid crystal panel, etching is required to form film layers with different patterns on a glass substrate, and particularly, wet etching is used to pattern a certain layer on a glass plate in an etching cavity.

The existing wet etching mode mainly uses horizontal etching, for example, the utility model with the patent number of CN210444589U, the substrate horizontally moves through the conveyer belt, and the circuit etching is realized by spraying the liquid medicine on the substrate, because the liquid medicine sprayed on the substrate can form a pool effect on the surface of the circuit board due to poor fluidity, the substrate is excessively etched or the etching uniformity is insufficient, and the abnormal problem of circuit short circuit is generated, so that the wet etching device for preventing the liquid medicine from accumulating on the substrate is needed.

SUMMERY OF THE UTILITY MODEL

In view of this, the present invention provides a wet etching apparatus for preventing the liquid medicine from accumulating on the surface of the substrate.

The technical scheme of the utility model is realized like this: the utility model provides a wet etching device, which comprises a shell, an etching part, a displacement part and a substrate mounting rack, wherein the displacement part and the substrate mounting rack are sequentially mounted inside the shell from top to bottom and are connected with the inner wall of the shell; the etching component is connected with the displacement component, the substrate is mounted on the substrate mounting frame, the substrate is positioned below the etching component, and the etching component is driven by the displacement component to transversely reciprocate and spray etching liquid to etch the substrate; one end of the substrate inclines towards the bottom of the shell.

On the basis of the above technical scheme, preferably, the displacement part comprises a slide rail, a slide block and a driving device, two ends of the slide rail are respectively connected with two inner side surfaces of the shell body which are opposite to each other, the slide block is connected with the slide rail in a sliding manner, the etching part is connected with the slide block, the driving device is connected with the shell body, a driving end of the driving device is connected with the slide block, and the driving device drives the slide block to transversely reciprocate along the slide rail, so that the etching part is driven to move, and the substrate is etched.

On the basis of the technical scheme, preferably, one end of the sliding rail inclines towards the bottom of the shell, and the inclination angle of the sliding rail is the same as that of the substrate.

On the basis of the above technical solution, preferably, the inclination angle of the slide rail and the base plate is 1-10 °.

On the basis of above technical scheme, it is preferred, the etching part includes that shower nozzle, etching solution hold case, the pump body, infusion pipeline and coupling hose, inside the casing was located to etching solution hold case, and was located the base plate mounting bracket below, the one end and the etching solution of infusion pipeline hold the case and be connected, and the other end is connected with the casing top, set up the pump body on the infusion pipeline, coupling hose's one end and infusion pipeline are close to the one end intercommunication of casing, and the other end vertically runs through the slider to be connected with the shower nozzle, the pump body and coupling hose intercommunication, the shower nozzle sprays etching solution towards the base plate direction.

On the basis of above technical scheme, preferentially, the base plate mounting bracket includes two installation poles, and two inner sides that the both ends of two installation poles are mutually parallel with the casing respectively are connected, and just all are parallel with the slide rail, the base plate is placed at two installation pole top surfaces.

On the basis of the above technical solution, preferably, the top surface of the mounting rod is provided with a first cushion pad.

On the basis of the technical scheme, preferably, the two mounting rods are respectively provided with a limiting part for limiting the sliding of the substrate, and the limiting part is positioned at one end of the substrate close to the bottom of the shell.

On the basis of the above technical solution, preferably, the limiting component includes a sliding part and a fastening screw, the mounting rod penetrates through the sliding part, and the fastening screw penetrates through the sliding part and abuts against the mounting rod to fixedly connect the sliding part and the mounting rod; one end of the substrate close to the bottom of the shell abuts against the sliding part.

In addition to the above technical solution, preferably, a second cushion pad is mounted on a side of the slider close to the substrate.

The utility model discloses a wet etching device has following beneficial effect for prior art:

(1) The utility model discloses the one end of base plate is to casing bottom slope for the base plate is the slope of certain angle, is favorable to unnecessary etching solution in time to follow the base plate surface and flows out, prevents that etching solution from gathering at the base plate surface excess etching, and it is inhomogeneous to cause the etching, influences the base plate quality.

(2) The utility model discloses a displacement device, etching part are at base plate top reciprocating motion, increase the etching homogeneity.

(3) Through set up spacing part on the installation pole at base plate mounting bracket, avoid because of too big slip of base plate inclination to installation pole least significant end, influence the etching.

(4) By providing the mounting bar with a slider and a fastening screw, it is possible to accommodate substrates of different sizes.

(5) Through set up first blotter and second blotter on installation pole and slider, can cushion the base plate, avoid the base plate to damage.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the description below are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.

FIG. 1 is a schematic diagram of the internal structure of the wet etching apparatus of the present invention;

FIG. 2 is a top view of the wet etching apparatus of the present invention;

FIG. 3 is an enlarged view of portion A of FIG. 1;

FIG. 4 is an enlarged view of portion B of FIG. 1;

FIG. 5 is an enlarged view of portion C of FIG. 1;

FIG. 6 is an enlarged view of section D of FIG. 2;

FIG. 7 is a longitudinal cross-sectional view of the slider;

fig. 8 is a longitudinal sectional view of the stopper member.

In the figure, 1-shell, 2-etching component, 3-displacement component, 4-substrate mounting rack, 5-substrate, 31-slide rail, 32-slide block, 321-first through hole, 33-driving device, 21-spray head, 22-etching solution containing box, 23-pump body, 24-infusion pipeline, 25-connecting hose, 41-mounting rod, 6-first buffer cushion, 7-limiting component, 71-sliding component, 711-second through hole, 72-fastening screw, 8-second buffer cushion, 11-sliding chute, 9-connecting rod, 10-pull rod, 211-communicating part and 212-sector part.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work all belong to the protection scope of the present invention.

In the description of the present invention, it should be understood that the terms "upper end", "lower end", "tail end", "left and right", "top", "bottom", etc. indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the equipment or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, unless otherwise specified, "a plurality" means two or more

As shown in fig. 1, with reference to fig. 2-8, the wet etching apparatus of the present invention comprises a housing 1, an etching component 2, a displacement component 3, and a substrate mounting bracket 4, wherein the displacement component 3 and the substrate mounting bracket 4 are sequentially mounted inside the housing 1 from top to bottom and connected to the inner wall of the housing 1; the etching component 2 is connected with the displacement component 3 and can move under the action of the displacement component 3, the substrate 5 is arranged on the substrate mounting rack 4, the substrate 5 is positioned below the etching component 2, the etching component 2 is driven by the displacement component 3 to transversely reciprocate, and etching liquid is sprayed out to etch the substrate 5; one end of the substrate 5 is inclined toward the bottom of the housing 1.

The housing 1 serves to house and protect the etching member 2, the displacement member 3, and the substrate mounting bracket 4.

The etching member 2 is used to eject an etching solution to etch the substrate 5.

The displacement member 3 is used for controlling the displacement position of the etching member 2 so that the etching member 2 is always positioned right above the substrate 5, and controlling the etching member 2 to reciprocate laterally to perform uniform etching on the substrate 5.

The substrate 5 is inclined to allow the etching solution to flow out of the substrate surface immediately after the etching operation, thereby preventing the accumulation of the etching solution and excessive etching.

In a specific embodiment, as shown in fig. 4 and 6, the displacement component 3 includes a slide rail 31, a slider 32 and a driving device 33, two ends of the slide rail 31 are respectively connected to two opposite inner side surfaces of the housing 1, the slide rail 31 is located right above the substrate mounting frame 4, the slider 32 is provided with a first through hole 321, the slide rail 31 penetrates through the slider 32, the slider 32 is slidably connected to the slide rail 31, the etching component 2 is connected to the slider 32, the driving device 33 is connected to the housing 1, and a driving end of the driving device 33 is connected to the slider 32, the driving device 33 drives the slider 32 to reciprocate transversely along the slide rail 31, thereby driving the etching component 2 to reciprocate, and uniformly etching the substrate 5.

In a specific embodiment, the driving device 33 may be driven by a motor or an air cylinder, the air cylinder is used for starting the driving device 33, and the driving device 33 is a telescopic air cylinder.

In the embodiment, one end of the slide rail 31 is inclined towards the bottom of the housing 1, and the inclination angle of the slide rail 31 is the same as the inclination angle of the substrate 5. The purpose of this arrangement is to keep the same distance from the surface of the substrate as the etching member 2 reciprocates, ensuring uniformity of etching.

In a specific embodiment, the inclination angle of the slide rail 31 and the substrate 5 is 1-10 °, so that the etching solution can flow out from the lower end of the substrate 5, and the etching solution is prevented from collecting on the surface of the substrate.

In a specific embodiment, as shown in fig. 1 and 2, the etching component 2 includes a nozzle 21, an etching solution containing box 22, a pump body 23, a liquid conveying pipeline 24 and a connecting hose 25, the etching solution containing box 22 is used for containing etching solution, is arranged inside the housing 1 and is located below the substrate mounting rack 4, and facilitates the inflow of the etching solution flowing out of the surface of the substrate 5; one end of a liquid conveying pipeline 24 is connected and communicated with the etching solution containing box 22, the other end of the liquid conveying pipeline is connected with the inner top of the shell 1, a pump body 23 is arranged on the liquid conveying pipeline 24, one end of a connecting hose 25 is communicated with one end, close to the top of the shell 1, of the liquid conveying pipeline 24, the other end of the connecting hose longitudinally penetrates through a sliding block 32 and is connected with a spray head 21, and the spray head 21 is located below the sliding block 32 and sprays etching solution towards the direction of the substrate 5.

In the embodiment, since the nozzle 21 is moved along the slide rail 31, the length of the connection hose 25 is sufficient for the nozzle 21 to reach both ends of the mounting frame 4 to accommodate substrates 5 of different sizes.

Specifically, the connecting hose 25 and the liquid conveying pipe 24 are both made of acid and alkali resistant pipes to avoid corrosion by the etching solution.

The nozzle 21 is connected to the connection hose 25, and the nozzle 21 is slidably connected to the slider 32, is positioned on the side of the slider 32 close to the substrate, and ejects the etching solution toward the substrate 5.

In the specific embodiment, the spraying direction of the spray head 21 is perpendicular to the plane of the substrate 5, so as to ensure the uniformity of spraying.

In a specific embodiment, as shown in fig. 7, the nozzle 21 includes a communicating portion 211 and a sector portion 212, one end of the communicating portion 211 communicates with the connecting hose 24, one end communicates with the sector portion 212, and the communicating portion 211 is connected with the slider 32, the communicating portion 211 is tubular, the length direction of the communicating portion 211 is perpendicular to the plane of the substrate 5, and the sector portion 212 is 60 °, so that the impact force applied to the substrate can be reduced, and the nozzle can spray more uniformly.

In a specific embodiment, the substrate mounting bracket 4 includes two mounting rods 41, two ends of the two mounting rods 41 are respectively connected to two inner sides of the housing 1, the two mounting rods 41 are parallel to each other and are parallel to the sliding rail 31, and the substrate 5 is placed on top surfaces of the two mounting rods 41.

The mounting rod 41 is arranged in parallel with the slide rail 31, so that the distance between the spray head 21 and the substrate 5 is always consistent when the spray head reciprocates along the slide rail 31, and the etching uniformity is ensured.

In a specific embodiment, as shown in fig. 3, a first buffer pad 6 is mounted on the top surface of the mounting rod 41, and the first buffer pad 6 is disposed on the contact surface of the mounting rod 41 and the substrate 5 to provide a buffer function, so as to protect the substrate and prevent the mounting rod 41 from damaging the bottom of the substrate 5.

In a specific embodiment, the two mounting rods 41 are each provided with a limiting member 7 for limiting the sliding of the substrate 5, and the limiting member 7 is located at one end of the substrate 5 close to the bottom of the housing 1. Since the mounting rod 41 is provided obliquely, the stopper 7 is provided to prevent the substrate 5 from slipping.

In a specific embodiment, as shown in fig. 3 and 8, the limiting component 7 includes a sliding component 71 and a fastening screw 72, the mounting rod 41 penetrates through the sliding component 71, and the fastening screw 72 penetrates through the sliding component 71 and abuts against the mounting rod 41 to fixedly connect the sliding component 71 and the mounting rod 41; one end of the substrate 5 close to the bottom of the housing 1 abuts against the sliding member 71. Specifically, the sliding member 71 can slide along the mounting rod 41, and the position of the sliding member 71 on the mounting rod 41 can be adjusted by tightening the screw 72 to accommodate substrates 5 of different sizes.

In a specific embodiment, the cross section of the mounting rod 41 is rectangular, and the sliding member 71 is a rectangular block and is provided with a rectangular second through hole 711 for the mounting rod 41 to pass through.

In a specific embodiment, a second buffer pad 8 is installed on a side of the sliding member 71 close to the substrate 5 to perform a buffering function, so as to protect the substrate and prevent the sliding member 71 from damaging the side of the substrate 5.

In a specific embodiment, the limiting member 7 may be disposed only at one end of the substrate 5 near the bottom of the housing 1, or may be disposed at two ends of the substrate 5 along the length direction of the mounting rod 41, so as to increase stability.

In a specific embodiment, in order to facilitate taking and placing of the substrate 5, the substrate mounting frame 4 is slidably mounted on the inner wall of the housing 1, specifically, as shown in fig. 5, two opposite inner walls of the housing are provided with sliding grooves 11, two ends of the two mounting rods 41 extend into the two sliding grooves 11 and can slide along the sliding grooves 11, a connecting rod 9 is arranged between the two mounting rods 41 to connect the two mounting rods 41, and the two connecting rods 9 are two and are respectively close to two ends of the two mounting rods 41.

In a specific embodiment, in order to facilitate pulling out the substrate mounting bracket 4, a pull rod 10 is further provided, the pull rod 10 is connected to one of the mounting rods 41, and the substrate mounting bracket 4 can be pulled out from the inside of the housing 1 by pulling the pull rod 10, so as to facilitate taking and placing the substrate 5.

The principle of the utility model is that: before etching, the etching solution is filled into the etching solution containing box 22, the substrate 5 is placed on the surface of the mounting rod 41, then the fastening screw 72 is adopted to fix the sliding part 71 and the mounting rod 41, and the substrate 5 is abutted against the sliding part 71 to prevent the substrate 5 from sliding. During etching, the drive unit 33 is turned on to reciprocate the head 21 along the slide rail 31, thereby performing etching operation. After etching is finished, the pull rod 10 is pulled to pull out the substrate mounting frame 4 along the sliding groove 11, and then the substrate 5 is taken down to finish etching operation.

The above description is only a preferred embodiment of the present invention, and should not be taken as limiting the invention, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A wet etching device comprises a shell (1), an etching part (2), a displacement part (3) and a substrate mounting rack (4), wherein the displacement part (3) and the substrate mounting rack (4) are sequentially mounted in the shell (1) from top to bottom and are connected with the inner wall of the shell (1);

the etching part (2) is connected with the displacement part (3), the substrate (5) is installed on the substrate installation frame (4), the substrate (5) is located below the etching part (2), the etching part (2) is driven by the displacement part (3) to transversely reciprocate, and etching liquid is sprayed out to etch the substrate (5); the method is characterized in that: one end of the substrate (5) inclines towards the bottom of the shell (1).

2. A wet etching apparatus as claimed in claim 1, wherein: the displacement part (3) comprises a sliding rail (31), a sliding block (32) and a driving device (33), two opposite inner side faces of the two ends of the sliding rail (31) are connected with the shell (1) respectively, the sliding block (32) is connected with the sliding rail (31) in a sliding mode, the etching part (2) is connected with the sliding block (32), the driving device (33) is connected with the shell (1), the driving end of the driving device (33) is connected with the sliding block (32), and the driving device (33) drives the sliding block (32) to transversely reciprocate along the sliding rail (31), so that the etching part (2) is driven to move and the substrate (5) is etched.

3. A wet etching apparatus as claimed in claim 2, wherein: one end of the sliding rail (31) inclines towards the bottom of the shell (1), and the inclination angle of the sliding rail (31) is the same as that of the substrate (5).

4. A wet etching apparatus as claimed in claim 3, wherein: the inclination angle of the slide rail (31) and the base plate (5) is 1-10 degrees.

5. A wet etching apparatus as claimed in claim 2, wherein: etching part (2) hold case (22), the pump body (23), infusion pipeline (24) and coupling hose (25) including shower nozzle (21), etching solution, inside casing (1) was located in etching solution holding case (22), and was located base plate mounting bracket (4) below, the one end and the etching solution of infusion pipeline (24) hold case (22) and are connected, and the other end is connected with casing (1) top, set up pump body (23) on infusion pipeline (24), the one end and the infusion pipeline (24) of coupling hose (25) are close to the one end intercommunication of casing (1), and the other end vertically runs through slider (32) to be connected with shower nozzle (21), shower nozzle (21) are towards base plate (5) direction injection etching solution.

6. A wet etching apparatus as claimed in claim 3, wherein: the base plate mounting frame (4) comprises two mounting rods (41), two ends of the two mounting rods (41) are connected with two opposite inner side faces of the shell (1) respectively, the two mounting rods (41) are parallel to each other and are parallel to the sliding rail (31), and the base plate (5) is placed on the top faces of the two mounting rods (41).

7. A wet etching apparatus as claimed in claim 6, wherein: the top surface of the mounting rod (41) is provided with a first cushion pad (6).

8. A wet etching apparatus as claimed in claim 6, wherein: two installation poles (41) are all installed limiting parts (7) for limiting the sliding of the base plate (5), and the limiting parts (7) are located at one end, close to the bottom of the shell (1), of the base plate (5).

9. A wet etching apparatus as claimed in claim 8, wherein: the limiting component (7) comprises a sliding part (71) and a fastening screw (72), the mounting rod (41) penetrates through the sliding part (71), the fastening screw (72) penetrates through the sliding part (71) and abuts against the mounting rod (41), and the sliding part (71) is fixedly connected with the mounting rod (41); one end of the base plate (5) close to the bottom of the shell (1) abuts against the sliding piece (71).

10. A wet etching apparatus as claimed in claim 9, wherein: and a second buffer pad (8) is arranged on one side of the sliding part (71) close to the substrate (5).