CN218232549U

CN218232549U - Vacuum evaporation device

Info

Publication number: CN218232549U
Application number: CN202222225058.9U
Authority: CN
Inventors: 张伟思; 樊子健; 左超; 杨秉君
Original assignee: Ulvac Inc
Current assignee: Ulvac Inc
Priority date: 2022-08-24
Filing date: 2022-08-24
Publication date: 2023-01-06
Anticipated expiration: 2032-08-24

Abstract

The utility model belongs to the technical field of the coating by vaporization, a vacuum evaporation device is disclosed. The vacuum evaporation device comprises a cavity, a main baffle, at least two auxiliary baffles and a baffle assembly, wherein at least two evaporation sources are arranged in the cavity and are used for coating films on a substrate to be evaporated, and the evaporation sources are symmetrically distributed along the central axis of the substrate to be evaporated; the main baffle is arranged close to the substrate to be evaporated, and the main baffle can selectively shield an evaporation channel between the evaporation source and the substrate to be evaporated; the auxiliary baffles are arranged in one-to-one correspondence with the evaporation sources and are arranged above the evaporation sources, and the auxiliary baffles can selectively shield evaporation channels between the evaporation sources and the substrate to be evaporated; the baffle subassembly is located between main baffle and the vice baffle, and the baffle subassembly includes the first baffle of two at least parallels and the setting of staggering, and the baffle subassembly can selectively shelter from the coating by vaporization passageway, and the baffle subassembly is equipped with the conducting hole. The utility model provides a vacuum evaporation device can prolong vacuum evaporation device's the time of continuous operation.

Description

Vacuum evaporation device

Technical Field

The utility model relates to an evaporation coating technique field especially relates to a vacuum evaporation coating device.

Background

Organic thin film electroluminescent display devices (OLEDs), which are an emerging technology for organic semiconductor materials to emit light under the action of an electric field, have been rapidly developed in recent years. The OLED and Si-OLED display products (such as mobile phone screens or VR glasses) have the advantages of low energy consumption, high definition, ultrathin property, high color saturation, self-luminescence and the like, so that the OLED and Si-OLED display products become one of the mainstream trends of the development of future display products.

In large and medium-sized evaporation equipment, as for a point evaporation source (such as a crucible) vacuum coating equipment with high controllability, a partitioned protective shielding plate is usually used at a target substrate and other parts inside the equipment to limit an evaporation target area and prevent pollution of materials along with continuous heating evaporation of evaporation materials in the evaporation process. Along with the continuous progress of incessant long-time evaporation, the inside protection shielding plate of equipment can appear falling the sediment or sheltering from evaporation source particle injection route circumstances such as, in order to avoid the emergence of above-mentioned circumstances, need in good time pause evaporation, break the vacuum after waiting for the crucible cooling, clearance and change vacuum apparatus internal baffle and part have reduced the efficiency and the material utilization ratio of device preparation from this.

In addition, when the device which applies independent light emitting of RGB pixels is subjected to evaporation, a mask plate is needed to be used for separately evaporating each light emitting layer of RGB, during evaporation, the mask plate is arranged between the substrate and the evaporation source, and the evaporation material passes through the holes in the mask plate and moves to the target substrate. In the coating by vaporization process, often can appear because of the directive property of mask plate to evaporation source is not enough (if mask plate opening size restriction or mask plate on adhere to more particulate matter etc.), lead to the coating by vaporization effect relatively poor, or the problem that the deposit more evaporation source particle leads to the life-span to reduce on the mask plate.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a vacuum evaporation device aims at prolonging vacuum evaporation device's continuous operation's time, improves the operating efficiency.

To achieve the purpose, the utility model adopts the following technical proposal:

a vacuum evaporation device includes:

the evaporation source is used for coating a film on a substrate to be evaporated, and the evaporation sources are symmetrically distributed along the central axis of the substrate to be evaporated;

the main baffle is arranged close to the substrate to be evaporated, and can selectively shield an evaporation channel between the evaporation source and the substrate to be evaporated;

the auxiliary baffles are arranged in one-to-one correspondence with the evaporation sources and are arranged above the evaporation sources, and the auxiliary baffles can selectively shield the evaporation channels;

the baffle subassembly, the baffle subassembly is located the main board with between the vice baffle, the baffle subassembly includes the first baffle of two at least parallels and staggered arrangement, the baffle subassembly can selectively shelter from the coating by vaporization passageway, the baffle subassembly is equipped with the conducting hole.

Optionally, the vacuum evaporation device further comprises a monitoring piece, and the monitoring piece is used for measuring the evaporation speed in real time.

Optionally, the number of the monitoring pieces is at least two, the monitoring pieces are arranged in one-to-one correspondence with the evaporation sources, and the monitoring pieces and the auxiliary baffle or the first baffle form a detection channel.

Optionally, the monitoring piece is detachably arranged on the cavity.

Optionally, the baffle assembly is disposed proximate to the secondary baffle.

Optionally, the main baffle, the auxiliary baffle and the baffle assembly are detachably arranged on the cavity.

Optionally, the main baffle is disposed coaxially with the substrate to be evaporated.

Optionally, the main baffle can rotate relative to the substrate to be evaporated to shield the evaporation channel.

Optionally, the sub-baffle and the baffle assembly are rotatable relative to the evaporation source to block the evaporation channel.

Optionally, the number of the first baffles is 2-5.

The utility model has the advantages that: the utility model provides a vacuum evaporation device, through setting up two at least evaporation sources, the evaporation source is along the central axis symmetric distribution of treating the coating by vaporization base plate, and every evaporation source can treat the different regions of coating by vaporization base plate to carry out the coating by vaporization, when the coating by vaporization, can set up the coating by vaporization order of evaporation source according to the coating by vaporization needs, and different evaporation sources also can set up different evaporation materials for treating the different regions coating by vaporization of coating by vaporization base plate different functions's film; by arranging the baffle plate assembly, the baffle plate assembly comprises at least two first baffle plates which are arranged in parallel, when the service life of the auxiliary baffle plates reaches the limit, the baffle plate assembly can replace the auxiliary baffle plates to shield evaporation materials of the evaporation source, and when the service life of one first baffle plate reaches the limit, the other first baffle plate can be replaced to shield the evaporation materials, so that the continuous operation time of the vacuum evaporation device is prolonged, the pollution in the cavity caused by the failure of the auxiliary baffle plates is prevented, the cleaning and replacing times of the cavity are reduced, the service life of the vacuum evaporation device is prolonged, and the operation efficiency is improved; the baffle plate assembly is provided with the through hole, when a product needing a mask plate is subjected to evaporation, the through hole enables an evaporation route of an evaporation material to be concentrated in a specific area, the evaporation process has higher directivity, and then a microcosmic film forming range (such as film forming of a PDL (pixel definition layer)) of a film forming area is controlled, redundant evaporation source particles are prevented from being attached to the mask plate, the service life of the mask plate is prolonged, and the continuous operation time of a vacuum evaporation device is prolonged.

Drawings

Fig. 1 is a schematic structural diagram of a vacuum evaporation apparatus according to an embodiment of the present invention;

fig. 2 is a schematic structural diagram of a vacuum evaporation apparatus according to another embodiment of the present invention;

fig. 3 is a schematic structural diagram of a vacuum evaporation device for evaporation by using a mask according to an embodiment of the present invention;

fig. 4 is a schematic structural diagram of a via hole according to an embodiment of the present invention;

fig. 5 is a schematic structural diagram of a via hole according to another embodiment of the present invention;

fig. 6 is a schematic structural diagram of a via hole according to another embodiment of the present invention.

In the figure:

100. a vacuum evaporation device; 200. a substrate to be evaporated;

1. an evaporation source; 2. an evaporation channel; 3. a main baffle; 4. an auxiliary baffle plate; 51. a first baffle; 511. a via hole; 6. a monitoring member; 7. a mask plate; 8. and (4) a bracket.

Detailed Description

The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.

In the description of the present invention, unless otherwise explicitly specified or limited, the terms "connected", "connected" and "fixed" are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; can be mechanically or electrically connected; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In the present application, unless expressly stated or limited otherwise, the recitation of a first feature "on" or "under" a second feature may include the recitation of the first and second features being in direct contact, and may also include the recitation of the first and second features not being in direct contact, but being in contact with another feature between them. Also, the first feature being "on," "above" and "over" the second feature includes the first feature being directly on and obliquely above the second feature, or merely indicating that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature includes the first feature being directly under and obliquely below the second feature, or simply meaning that the first feature is at a lesser elevation than the second feature.

In the description of the present embodiment, the terms "upper", "lower", "right", and the like are used based on the orientations and positional relationships shown in the drawings, and are only for convenience of description and simplification of operation, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus should not be construed as limiting the present invention. Furthermore, the terms "first" and "second" are used only for descriptive purposes and are not intended to have a special meaning.

As shown in fig. 1 and 2, the present embodiment provides a vacuum evaporation apparatus 100 for vacuum evaporation coating of an organic display device (e.g., AMOLED or Si-OLED), the vacuum evaporation apparatus 100 including a chamber, a main shutter 3, at least two sub-shutters 4, and a shutter assembly.

Specifically, as shown in fig. 1 to 6, at least two evaporation sources 1 are disposed in the cavity, the evaporation sources 1 are used for coating a film on the substrate 200 to be evaporated, and the evaporation sources 1 are symmetrically distributed along the central axis of the substrate 200 to be evaporated; the main baffle 3 is arranged close to the substrate 200 to be evaporated, and the main baffle 3 can selectively shield the evaporation channel 2 between the evaporation source 1 and the substrate 200 to be evaporated; the auxiliary baffles 4 are arranged corresponding to the evaporation sources 1 one by one, the auxiliary baffles 4 are arranged above the evaporation sources 1, and the auxiliary baffles 4 can selectively shield the evaporation channels 2 between the evaporation sources 1 and the substrate 200 to be evaporated; the baffle assembly is arranged between the main baffle 3 and the auxiliary baffle 4, the baffle assembly comprises at least two first baffles 51 which are parallel and staggered, the baffle assembly can selectively shield the evaporation channel 2 between the evaporation source 1 and the substrate 200 to be evaporated, and the baffle assembly is provided with a through hole 511.

The utility model provides a vacuum evaporation device 100, through setting up two at least evaporation sources 1, evaporation source 1 is along the central axis symmetric distribution of treating evaporation coating base plate 200, and every evaporation source 1 can treat the different areas of evaporation coating base plate 200 to evaporate by vaporization, when evaporating by vaporization, can set up the evaporation sequence of evaporation source 1 according to the evaporation coating needs; different evaporation sources 1 can also be provided with different evaporation materials for evaporating films with different functions in different areas of the substrate 200 to be evaporated; by arranging the baffle plate assembly, the baffle plate assembly comprises at least two first baffle plates 51 which are arranged in parallel and staggered, in the continuous operation process of the vacuum evaporation device 100, when the service life of the auxiliary baffle plate 4 reaches the limit, the baffle plate assembly can replace the auxiliary baffle plate 4 to shield evaporation materials of the evaporation source 1, and when the service life of one first baffle plate 51 reaches the limit, the other first baffle plate 51 can be replaced to shield the evaporation materials, and the like, so that the continuous operation time of the vacuum evaporation device 100 is prolonged, and the operation efficiency is improved; the baffle plate assembly is provided with a through hole 511, when the substrate 200 to be evaporated, which needs to use the mask plate 7, is subjected to evaporation, the through hole 511 can enable an evaporation route of an evaporation material to be concentrated in a specific area, and can further control a microscopic film forming range (such as a film forming of a pixel definition layer PDL) of a film forming area by controlling the direction of particles emitted by the evaporation source 1, so that the evaporation process has higher directivity, redundant evaporation source particles are prevented from being attached to the mask plate 7, the service life of the mask plate 7 is prolonged, and the continuous operation time of a vacuum evaporation device is further prolonged.

It should be noted that, during actual processing and manufacturing, some first baffles 51 are provided with the through holes 511, the rest first baffles 51 are not provided with the through holes 511, and the first baffles 51 provided with the through holes 511 are applied to vapor deposition of the substrate to be vapor deposited 200 which needs to use the mask plate 7; the first shutter 51 without the via holes 511 is applied to evaporation of the substrate to be evaporated 200 without using the mask 7.

Illustratively, when the substrate 200 to be vapor-deposited does not need to be vapor-deposited by using the mask 7, the evaporation material is blocked by using the first baffle 51 without the through holes 511, for example, when a first substrate 200 to be vapor-deposited is coated, the main baffle 3, the auxiliary baffle 4 and the baffle assembly are all in an open state, after the vapor deposition is completed, the main baffle 3 and the auxiliary baffle 4 are both closed, a second substrate 200 to be vapor-deposited enters the vacuum vapor deposition device 100, the main baffle 3 and the auxiliary baffle 4 are opened, the second substrate 200 to be vapor-deposited is subjected to a film coating treatment, after the vapor deposition is completed, the main baffle 3 and the auxiliary baffle 4 are both closed, when the life of the auxiliary baffle 4 reaches a limit, the auxiliary baffle 4 is always in an open state, when the vapor deposition is performed again, the main baffle and the first baffle 51 without the through holes 511 are closed to block the evaporation material, the continuous operation time of the vacuum vapor deposition device 100 is prolonged, the contamination in the cavity due to the failure of the auxiliary baffle 4 is prevented, the cleaning and the replacement times of the cavity are reduced, the service life of the vacuum vapor deposition device 100 is prolonged, and the operation efficiency is improved.

Illustratively, as shown in fig. 3, each of the four first baffles 51 is provided with a through hole 511, when the substrate 200 to be vapor-deposited needs to be vapor-deposited by using the mask 7, the first baffle 51 provided with the through hole 511 is used to shield evaporation materials, during vapor deposition, the first baffle 51 provided with the through hole 511 is closed, the evaporation materials sequentially pass through the through hole 511 and the hole on the mask 7 to be vapor-deposited on the substrate 200 to be vapor-deposited, the through hole 511 enables the vapor deposition channel of the evaporation materials to have directivity, and the region of the first baffle 51 not provided with the through hole 511 can prevent redundant evaporation source particles from attaching to the mask 7, so that the service life of the mask 7 is prolonged, the continuous operation time of the vacuum vapor deposition device 100 is further prolonged, and the operation efficiency is improved. Through hole 511 mask 7 through hole 511

Optionally, the vacuum evaporation device 100 further comprises a monitoring member 6, and the monitoring member 6 is used for measuring the evaporation speed in real time.

Optionally, there are at least two monitoring pieces 6, the monitoring pieces 6 are disposed in one-to-one correspondence with the evaporation sources 1, and the monitoring pieces 6 and the auxiliary baffle 4 or the first baffle 51 form a detection channel, which is beneficial to accurately recording the evaporation speed of each evaporation source 1, and improves the evaporation reliability.

Optionally, the monitoring member 6 is detachably disposed on the cavity. This kind of setting is convenient for carry out the dismouting to monitoring 6. In this embodiment, the monitoring member 6 is a sensor. In other embodiments, the specific type of monitoring member 6 can be set by one skilled in the art according to actual needs.

Optionally, the baffle assembly is disposed close to the sub-baffle 4 to effectively avoid the area of the evaporation material in the vacuum evaporation device 100 from being diffused due to the longer increase of the movement path of the evaporation material, thereby improving the shielding effect.

In order to replace the baffle plates conveniently, the main baffle plate 3, the auxiliary baffle plate 4 and the baffle plate assembly can be detachably arranged on the cavity. Illustratively, the main baffle 3, the auxiliary baffle 4 and the baffle assembly are arranged on the inner wall of the cavity through a support rod 8, and the main baffle 3, the auxiliary baffle 4 and the baffle assembly are connected with the support rod 8 through fasteners. In this embodiment, the fasteners are screws. In other embodiments, the type of fastener can be set by one skilled in the art according to actual needs.

In order to improve the shielding effect, the main baffle 3 is coaxially arranged with the substrate 200 to be evaporated.

Alternatively, the main shutter 3 can be rotated relative to the substrate 200 to be evaporated to block the evaporation passage 2, and the sub-shutter 4 and the shutter assembly can be rotated relative to the evaporation source 1 to block the evaporation passage 2. In other embodiments, the rotation may be replaced by flipping, and the selective shielding is not limited herein. In addition, this vacuum evaporation device still includes support 8, and support 8 is used for fixed main baffle 3, vice baffle 4 and baffle subassembly, and the technical personnel in the art can set up according to actual need, do not do the specific limitation here yet.

Preferably, the number of the first barrier 51 is 2 to 5. In this embodiment, the number of the first shutter 51 is 3. In other embodiments, a person skilled in the art can set the number range of the first baffle 51 according to actual needs.

Alternatively, as shown in fig. 4 to 6, the center line of the through hole 511 coincides with the axis of the first baffle plate 51, or the center line of the through hole 511 may not coincide with the axis of the first baffle plate 51. A person skilled in the art can set the position of the through hole 511 in the first barrier 51 according to a specific position of evaporation, the size of the through hole 511 can be set according to the size of the hole of the mask 7, and the through hole 511 can be slightly larger than the hole.

It is obvious that the above embodiments of the present invention are only examples for clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Numerous obvious variations, rearrangements, and substitutions will now occur to those skilled in the art without departing from the scope of the invention. This need not be, nor should it be exhaustive of all embodiments. Any modification, equivalent replacement or improvement made within the spirit and principle of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. A vacuum evaporation apparatus, comprising:

the evaporation source (1) is used for coating a film on a substrate (200) to be evaporated, and the evaporation sources (1) are symmetrically distributed along the central axis of the substrate (200) to be evaporated;

the main baffle plate (3) is arranged close to the substrate (200) to be evaporated, and the main baffle plate (3) can selectively shield an evaporation channel (2) between the evaporation source (1) and the substrate (200) to be evaporated;

the evaporation source (1) is provided with at least two auxiliary baffles (4), the auxiliary baffles (4) are arranged in one-to-one correspondence with the evaporation source (1), the auxiliary baffles (4) are arranged above the evaporation source (1), and the auxiliary baffles (4) can selectively shield the evaporation channel (2);

the baffle subassembly, the baffle subassembly is located main baffle (3) with between vice baffle (4), the baffle subassembly includes at least two parallels and stagger first baffle (51) of setting, the baffle subassembly can selectively shelter from evaporation plating passageway (2), the baffle subassembly is equipped with conducting hole (511).

2. Vacuum evaporation device according to claim 1, characterized in that the vacuum evaporation device (100) further comprises a monitoring member (6), the monitoring member (6) being used to measure the evaporation rate in real time.

3. A vacuum evaporation apparatus according to claim 2, wherein the number of the monitoring members (6) is at least two, the monitoring members (6) are provided in one-to-one correspondence with the evaporation sources (1), and the monitoring members (6) form detection channels with the sub-shutter (4) or the first shutter (51).

4. Vacuum evaporation device according to claim 2, wherein the monitoring member (6) is detachably disposed on the chamber.

5. Vacuum evaporation device according to claim 1, wherein the baffle assembly is arranged close to the secondary baffle (4).

6. The vacuum evaporation device according to claim 1, wherein the main baffle (3), the auxiliary baffle (4) and the baffle assembly are detachably arranged on the chamber.

7. Vacuum evaporation device according to claim 1, characterized in that the main shutter (3) is arranged coaxially with the substrate (200) to be evaporated.

8. Vacuum evaporation device according to claim 1, wherein the main shutter (3) is rotatable with respect to the substrate (200) to be evaporated to shield the evaporation channels (2).

9. Vacuum evaporation device according to claim 1, wherein the sub-shutter (4) and the shutter assembly are rotatable relative to the evaporation source (1) to block the evaporation channel (2).

10. A vacuum evaporation apparatus according to claim 1, wherein the number of the first shutter (51) is 2 to 5.