CN218037684U

CN218037684U - Photoresist decompression drying device

Info

Publication number: CN218037684U
Application number: CN202222213370.6U
Authority: CN
Inventors: 王志祥
Original assignee: Huanggang Steinben New Material Technology Co ltd
Current assignee: Huanggang Steinben New Material Technology Co ltd
Priority date: 2022-08-22
Filing date: 2022-08-22
Publication date: 2022-12-13
Anticipated expiration: 2032-08-22

Abstract

The utility model relates to a photoresist decompression drying device, which comprises a box body and a vacuum component; the box body is provided with a drying cavity, a drying platform is transversely arranged in the drying cavity and used for placing a substrate coated with photoresist on the surface, and two opposite inner side walls of the drying cavity are respectively provided with a heating structure positioned above the drying platform; the vacuum component comprises a vacuum pump arranged outside the drying cavity and a vacuum pipeline communicated with the vacuum pump, and one end of the vacuum pipeline, far away from the vacuum pump, extends into the drying cavity and is positioned above the middle part of the drying platform. The utility model discloses make the photoresist solvent composition at base plate middle part and the photoresist solvent composition of side, heating structure can the relatively balanced evaporation under the cooperation of vacuum pipeline, also make the photoresist on the base plate can evenly dry. In addition, the arrangement of the heating structure also enables photoresist solvent liquid drops suspended in the air of the drying cavity to be further vaporized, so that the photoresist solvent liquid drops can be conveniently discharged through a vacuum pipeline, and the evaporation and discharge efficiency of solvent components is improved.

Description

Photoresist decompression drying device

Technical Field

The utility model relates to a dry technical field of base plate especially relates to a photoresist decompression drying device.

Background

In the process of manufacturing a substrate of a TFT-LCD (Thin Film Transistor-Liquid Crystal Display, abbreviated as a Thin Film Transistor Liquid Crystal Display), vacuum drying (VCD) is an important process. Vacuum drying under reduced pressure is a process of drying a substrate coated with a coating solution of a film layer such as a photoresist under reduced pressure to cure the film layer. The complete photoetching process completes the definition of precise pattern on the substrate through three main steps of photoresist coating process, exposure process and developing process. In the decompression drying process after the coating process, the substrate coated with the photoresist is arranged in the sealed cavity, and the sealed cavity is vacuumized, so that the photoresist solvent reaches the saturated vapor pressure and is quickly volatilized, and the volatilized vapor is further pumped away along with the airflow, thereby achieving the purpose of preliminarily drying the photoresist.

For example, patent CN 103903959A discloses a reduced pressure drying apparatus and a reduced pressure drying method, in which an exhaust port is provided at a side end of a lower chamber in order to prevent liquid droplets generated by rapid pressure recovery from affecting a substrate yield. However, when the substrate is vacuumized, the airflow above the substrate moves from the middle to the two sides, so that the influence of the airflow on the middle area is small, the phenomenon of insufficient drying of the photoresist in the middle area is caused easily, the developing precision is reduced, the uniformity of the characteristic line width of the product cannot meet the requirement, and the display effect of the display panel is influenced.

SUMMERY OF THE UTILITY MODEL

In view of the above, it is desirable to provide a photoresist decompression drying apparatus, which is used to solve the technical problem in the prior art that the photoresist is prone to drying non-uniformly.

The utility model provides a photoresist decompression drying device, this photoresist decompression drying device includes:

the box body is provided with a drying cavity, a drying platform is transversely arranged in the drying cavity and used for placing a substrate coated with photoresist on the surface, and two opposite inner side walls of the drying cavity are respectively provided with a heating structure positioned above the drying platform; and the number of the first and second groups,

and the vacuum assembly comprises a vacuum pump arranged outside the drying cavity and a vacuum pipeline communicated with the vacuum pump, and one end of the vacuum pipeline, which is far away from the vacuum pump, extends into the drying cavity and is positioned above the middle part of the drying platform.

Optionally, the drying platform is provided in plurality at intervals along the vertical direction.

Optionally, the drying chambers are sequentially partitioned by the plurality of drying platforms along the vertical direction to form a plurality of sub-chambers;

the two opposite inner side walls of each sub-chamber are respectively provided with the heating structures corresponding to the drying platforms, and each heating structure is arranged above the corresponding drying platform;

the vacuum pipeline include with the trunk line that the vacuum pump is linked together, and a plurality of with the branch pipeline that the trunk line is linked together, the trunk line is located outside the drying chamber, it is a plurality of branch pipeline and a plurality of divide the cavity one-to-one, and each the branch pipeline is kept away from the one end of trunk line stretches into to corresponding divide in the cavity to be located the correspondence the middle part top of drying platform.

Optionally, the drying chamber is provided with an inner side wall of the heating structure, and the inner side wall is obliquely arranged from top to bottom along a direction away from the opposite inner side wall.

Optionally, the inclination angle of the inner side wall of the drying cavity provided with the heating structure is alpha, and the inclination angle is larger than or equal to 50 degrees and smaller than or equal to 60 degrees.

Optionally, the photoresist decompression drying device further comprises a sensor arranged in the drying chamber and a warning light electrically connected with the sensor and located outside the box body, wherein the sensor is used for monitoring the temperature and humidity in the drying chamber.

Optionally, the box body further has an installation cavity located below the drying cavity, and the vacuum pump is disposed in the installation cavity.

Optionally, the bottom of the box body is provided with a plurality of rollers.

Optionally, the box includes the main part, and two are the relative door bodies that set up, the drying chamber form in the main part, and be located two relative both sides between the heating structure are the opening setting, two the door body with two openings one-to-one of drying chamber sets up, wherein, each the door body is located around the ascending axis rotation lid in vertical direction the opening part that the drying chamber corresponds.

Optionally, one of the drying platform and the inner side wall of the drying cavity, where the heating structure is arranged, is provided with a slide rail, and the other is provided with a slide groove, and the slide rail and the slide groove are arranged in an extending manner along the depth direction of the drying cavity; and/or the presence of a gas in the gas,

the door body is provided with a transparent window.

Compared with the prior art, the utility model provides a photoresist decompression drying device is when using, places the base plate that has the coating to have the photoresist on dry platform, because the heating structure sets up at the both sides wall that dry chamber is relative to press from both sides dry platform in the middle of, vacuum pipe one end is located dry platform's middle part top simultaneously. Thus, the air flows at the two sides of the substrate flow to the middle of the vacuum pipeline, the air flow velocity at the middle part of the substrate is relatively high, and the air flow velocity at the side end is relatively low, so that the photoresist solvent component at the middle part of the substrate is driven by the air flow to evaporate the opposite side end quickly; meanwhile, as the heating structures are positioned at two sides of the substrate, the photoresist solvent components at the side end of the substrate are evaporated relatively quickly to the middle part under the influence of temperature through temperature rise. Therefore, the photoresist solvent component in the middle of the substrate and the photoresist solvent component at the side end can be relatively and uniformly evaporated under the matching of the heating structure and the vacuum pipeline, and the photoresist on the substrate can be uniformly dried. In addition, the setting of heating structure also makes the photoresist solvent liquid drop that suspends in the dry chamber air can further vaporize, is convenient for discharge through the vacuum tube, improves solvent composition evaporation discharge efficiency, avoids the condition that the liquid drop appears in the dry chamber when repressing, and then guarantees photoresist drying quality to guarantee the development precision.

The foregoing description is only an overview of the technical solutions of the present invention, and in order to make the technical means of the present invention more clearly understood, and to implement the technical means according to the content of the description, the preferred embodiments of the present invention are described in detail below with reference to the accompanying drawings. The following examples and the accompanying drawings illustrate specific embodiments of the present invention.

Drawings

The accompanying drawings, which are included to provide a further understanding of the invention and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the invention and together with the description serve to explain the invention without undue limitation to the invention. In the drawings:

FIG. 1 is a schematic structural diagram of a photoresist decompression drying device according to a first embodiment of the present invention;

FIG. 2 is a schematic structural diagram of the photoresist decompression drying device of FIG. 1 without a door body;

FIG. 3 is a schematic perspective view of the photoresist decompression drying apparatus (vacuum assembly not shown) of FIG. 2;

FIG. 4 is a schematic cross-sectional view of a second embodiment of a photoresist decompression drying apparatus provided by the present invention;

FIG. 5 is an enlarged schematic view at A in FIG. 2;

fig. 6 is a schematic partial cross-sectional view of the drying deck and the inner wall of the drying chamber in fig. 2.

Description of reference numerals:

100-photoresist decompression drying device, 1-box body, 1 a-drying cavity, 1a 1-sub-cavity, 1a 2-sliding chute, 1 b-mounting cavity, 12-drying platform, 121-sliding rail, 13-heating structure, 14-roller, 15-main body, 16-door body, 161-transparent window, 2-vacuum component, 21-vacuum pipeline, 211-main pipeline, 212-branch pipeline, 3-air supply pipeline, 4-sensor and 5-warning lamp.

Detailed Description

The following detailed description of the preferred embodiments of the invention, which is to be read in connection with the accompanying drawings, forms a part of this application, and together with the embodiments of the invention, serve to explain the principles of the invention and not to limit its scope.

Referring to fig. 1 to 3, the photoresist decompression drying apparatus 100 includes a chamber 1 and a vacuum assembly 2; the box body 1 is provided with a drying cavity 1a, a drying platform 12 is transversely arranged in the drying cavity 1a, the drying platform 12 is used for placing a substrate coated with photoresist on the surface, and two opposite inner side walls of the drying cavity 1a are respectively provided with a heating structure 13 positioned above the drying platform 12; the vacuum assembly 2 includes a vacuum pump (not shown) disposed outside the drying chamber 1a, and a vacuum pipe 21 communicated with the vacuum pump, wherein one end of the vacuum pipe 21 far from the vacuum pump extends into the drying chamber 1a and is located above the middle portion of the drying platform 12.

The utility model provides a photoresist decompression drying device 100 is when using, places the base plate that has the coating to have the photoresist on drying platform 12, because heating structure 13 sets up at the relative both sides wall of dry chamber 1a to establish drying platform 12 clamp in the middle of, vacuum pipe 21 one end is located drying platform 12's middle part top simultaneously. Thus, the air flows at the two sides of the substrate flow to the middle into the vacuum pipeline 21, the air flow velocity at the middle part of the substrate is relatively fast, and the air flow velocity at the side end is relatively slow, so that the photoresist solvent component at the middle part of the substrate is driven by the air flow to evaporate the opposite side end quickly; meanwhile, as the heating structures 13 are positioned at two sides of the substrate, the photoresist solvent components at the side ends of the substrate are evaporated faster relative to the middle part under the influence of temperature through temperature rise. Therefore, the photoresist solvent component in the middle of the substrate and the photoresist solvent component at the side end can be relatively uniformly evaporated under the matching of the heating structure 13 and the vacuum pipeline 21, and the photoresist on the substrate can be uniformly dried. In addition, the arrangement of the heating structure 13 also enables photoresist solvent liquid drops suspended in the air of the drying cavity 1a to be further vaporized, so that the photoresist solvent liquid drops are conveniently discharged through the vacuum pipeline 21, the evaporation and discharge efficiency of solvent components is improved, the condition of liquid drops in the drying cavity 1a during repressing is avoided, and the drying quality of the photoresist is further ensured, so that the developing precision is ensured.

It should be noted that, in the present embodiment, the heating structure 13 adopts an electric heating sheet form to heat the upper portions of the two corresponding side ends of the drying platform 12, wherein the specific structure of the electric heating sheet is the prior art, and is not described herein again. In addition, in this embodiment, the photoresist decompression drying apparatus 100 further includes a gas supply pipeline 3 communicating with the drying chamber 1a, and a gas supply tank (not shown) provided outside the box body 1 and communicating with the gas supply pipeline 3, the gas supply tank being configured to supply an inert gas, such as nitrogen, into the drying chamber 1a via the gas supply pipeline to restore the gas pressure in the drying chamber 1a.

Further, in order to improve the drying efficiency of the present device, in the present embodiment, the drying platform 12 is provided in plurality at intervals along the vertical direction. Thus, the number of substrates that can be dried simultaneously is increased to improve drying efficiency. It should be noted that, in an embodiment, each drying platform 12 does not separate the drying cavity 1a, and one end of the vacuum pipe 21 extending into the drying cavity 1a is located above the middle of the drying platform 12 at the top end; meanwhile, heating structures 13 are correspondingly arranged above two sides of each drying platform 12, wherein the heating power of the heating structures 13 corresponding to each drying platform 12 is sequentially reduced from top to bottom, so that in practical application, substrates with gradually reduced photoresist coating amount are sequentially placed in each drying platform 12 from top to bottom, and the energy utilization rate is improved.

Specifically, in the present embodiment, the drying chambers 1a are sequentially partitioned in the vertical direction by the plurality of drying platforms 12 to form a plurality of subchambers 1a1; two opposite inner side walls of each sub-chamber 1a1 are respectively provided with a heating structure 13 corresponding to the drying platform 12, and each heating structure 13 is arranged above the corresponding drying platform 12; vacuum pipe 21 includes the trunk line 211 that is linked together with the vacuum pump, and a plurality of branch pipes 212 that are linked together with trunk line 211, and outside trunk line 211 was located dry chamber 1a, a plurality of branch pipes 212 and a plurality of branch chamber 1a1 one-to-one, and each branch pipe 212 kept away from the one end of trunk line 211 and stretched into to the branch chamber 1a1 that corresponds to be located the middle part top of the dry platform 12 that corresponds. In the scheme, the sub-chambers 1a1 are not affected by each other and can be independently dried, so that the photoresist is dried more stably and reliably, and the drying quality is improved. In the present embodiment, each of the branch pipes 212 is provided with a control valve for controlling opening and closing of the pipe.

Further, to improve the drying efficiency of the heating structure 13, in an embodiment, the inner side wall of the drying chamber 1a provided with the heating structure 13 is inclined from top to bottom in a direction away from the opposite inner side wall. Therefore, the projection area of the heat-understanding structure on the drying platform 12 is enlarged, that is, the area of the heating structure 13 capable of being heated by radiation is enlarged, and the drying efficiency is further improved. Meanwhile, the cavity of the drying cavity 1a is arranged gradually reduced from bottom to top, so that the airflow can be accelerated to flow, and the evaporated solvent components are effectively discharged.

It can be understood that when the inclination angle of the inner sidewall provided with the heating structure 13 is too small, a dead angle with poor air flow effect is easily formed at the connection position of the drying platform 12 and the inner sidewall; and when the inclination angle of the inner side wall provided with the heating structure 13 is too large, the heating framework can not obtain the temperature rise drying effect of the included angle. And when the inclination that dry chamber 1a was equipped with heating structure 13's inside wall was alpha, satisfied when alpha is not less than 50 and is not less than 60, can be when guaranteeing the air flow effect of dry platform 12 and inside wall junction, improve heating structure 13's drying effect.

In addition, referring to fig. 4, when a plurality of drying platforms 12 are provided, and each drying platform 12 partitions the drying cavity 1a to form sub-cavities 1a1, the inner side wall of each sub-cavity 1a1, on which the heating structure 13 is provided, is also inclined from top to bottom in a direction away from the opposite inner side wall, and the inclination angle is α, which satisfies that α is greater than or equal to 50 ° and less than or equal to 60 °.

Further, referring to fig. 2 and 5, the photoresist decompression drying device 100 further includes a sensor 4 disposed in the drying chamber 1a, and a warning light 5 electrically connected to the sensor 4 and located outside the box body 1, wherein the sensor 4 is used for monitoring the temperature and humidity in the drying chamber 1a. The cooperation real time monitoring drying chamber 1a temperature and humidity that this scheme passes through sensor 4 and warning light 5 avoids the abnormal conditions to take place, guarantees to stabilize dry. Meanwhile, the drying process can be judged according to the humidity condition, and convenience is improved.

Further, the box body 1 is also provided with a mounting cavity 1b positioned below the drying cavity 1a, and the vacuum pump is arranged in the mounting cavity 1 b. Similarly, an air supply tank is also provided in the mounting chamber 1 b. This scheme is through setting up the vacuum pump in box 1, realizes the integration setting of device. Specifically, the bottom of the case 1 is provided with a plurality of rollers 14. So, be convenient for mobile device to improve the convenience. In addition, in this embodiment, the top of the box 1 is further provided with a plurality of hanging rings.

Further, the box 1 includes main part 15, and two door bodies 16 that are relative setting, and drying chamber 1a forms in main part 15, and the both sides that are located between two relative heating structure 13 are the opening setting, and two door bodies 16 set up with two openings one-to-one of drying chamber 1a, and wherein, the opening part that drying chamber 1a corresponds is located to each door body 16 around the ascending axis rotation lid of vertical direction. This scheme sets up two and is relative door bodies 16 that set up for it is more convenient to deposit and withdraw the base plate, also is convenient for clear up drying chamber 1a simultaneously.

Furthermore, in this embodiment, one of the inner side walls of the drying platform 12 and the drying cavity 1a where the heating structure 13 is disposed is provided with a slide rail, and the other is provided with a slide groove, the slide rail and the slide groove are extended along the depth direction of the drying cavity 1a, so as to take out the drying platform 12 from the drying cavity 1a for cleaning, so as to ensure the flatness of the drying platform 12, and avoid the substrate from being obliquely placed on the drying platform 12. Specifically, referring to fig. 6, in the present embodiment, the two ends of the drying platform 12 corresponding to the two heating structures 13 are provided with slide rails 121, and the inner side wall of the drying cavity 1a is provided with a chute 1a2. In addition, in this embodiment, the door body 16 is provided with a transparent window 161, so that an operator can check the drying condition in the drying chamber 1a in real time, and the drying quality is further ensured. Wherein the transparent window 161 is made of glass.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention should be covered by the present invention.

Claims

1. A photoresist decompression drying device is characterized by comprising:

2. The photoresist decompression drying device according to claim 1, wherein the drying platform is provided in plurality at intervals in a vertical direction.

3. The photoresist decompression drying device according to claim 2, wherein the drying chambers are sequentially partitioned by a plurality of drying platforms along a vertical direction to form a plurality of sub-chambers;

the two opposite inner side walls of each sub-cavity are respectively provided with the heating structures corresponding to the drying platforms, and each heating structure is arranged above the corresponding drying platform;

4. The photoresist decompression drying apparatus according to claim 1, wherein the inner side wall of the drying chamber provided with the heating structure is inclined from top to bottom in a direction away from the opposite inner side wall.

5. The photoresist decompression drying device according to claim 4, wherein the inclination angle of the inner side wall of the drying chamber provided with the heating structure is α, which satisfies 50 ° < α > 60 °.

6. The photoresist decompression drying device according to claim 1, further comprising a sensor disposed in the drying chamber and a warning light electrically connected to the sensor and located outside the cabinet, wherein the sensor is configured to monitor temperature and humidity in the drying chamber.

7. The photoresist decompression drying device according to claim 1, wherein the box body further has a mounting chamber located below the drying chamber, and the vacuum pump is disposed in the mounting chamber.

8. The photoresist decompression drying device according to claim 7, wherein the bottom of the box is provided with a plurality of rollers.

9. The photoresist decompression drying device according to claim 1, wherein the box body comprises a main body and two door bodies arranged oppositely, the drying chamber is formed in the main body, two sides between the two opposite heating structures are arranged in an opening manner, the two door bodies and the two openings of the drying chamber are arranged in a one-to-one correspondence manner, and each door body is rotatably covered on the corresponding opening of the drying chamber around an axis in the vertical direction.

10. The photoresist decompression drying device according to claim 9, wherein one of the inner side walls of the drying platform and the drying cavity provided with the heating structure is provided with a slide rail, the other one is provided with a slide groove, and the slide rail and the slide groove extend along a depth direction of the drying cavity; and/or the presence of a gas in the atmosphere,

the door body is provided with a transparent window.