CN218018116U

CN218018116U - Multifunctional test tool for coated wafer

Info

Publication number: CN218018116U
Application number: CN202222224687.XU
Authority: CN
Inventors: 刘畅; 甄西合; 刘伟; 徐超; 朱逢旭; 熊加丽
Original assignee: Henan Yubo Technology Co ltd
Current assignee: Henan Yubo Technology Co ltd
Priority date: 2022-08-24
Filing date: 2022-08-24
Publication date: 2022-12-13
Anticipated expiration: 2032-08-24

Abstract

The utility model discloses a multifunctional test tool for a coated wafer, which comprises a rotary chassis with a rotatable angle, wherein the surface of the rotary chassis is provided with an adjusting platform moving along an X axis, the adjusting platform is provided with a first self-locking screw, the adjusting platform is provided with two guide posts, a lower limiting beam and an upper limiting beam are arranged between the two guide posts, the lower limiting beam and the upper limiting beam can move along the axial direction of the guide posts, the middle part of the lower limiting beam is provided with a lower support part, the upper limiting beam is provided with an upper pressing part, and the corresponding surfaces of the upper pressing part and the lower support part are provided with limiting grooves and are matched with and fix the wafer; and a second self-locking screw is arranged on the lower limiting beam, and a third self-locking screw is arranged on the upper limiting beam. The utility model discloses contactless wafer surface reduces the injury to conveniently adjust the wafer position, improve efficiency of software testing.

Description

Multifunctional test tool for coated wafer

Technical Field

The utility model relates to an optical testing technical field, concretely relates to multi-functional test fixture of coating film wafer.

Background

In recent years, infrared detection and sensors are becoming more integrated and miniaturized. The processing technology of the lens or the filter element required by the sensor is gradually changed from the traditional mode of directly processing materials such as silicon, germanium, sapphire, fluoride and the like to the mode of forming a small lens or a window slice into the mode of cutting, processing and forming after coating a film on a complete wafer. When a wafer is coated, the spectrum of the wafer is generally compared with that of a wafer with a small wafer mounted in a furnace.

The plating-accompanying sheet is generally smaller in size and is not uniform in thickness than the wafer. Even if the plating accompanying sheet is prepared by scratching small pieces from the wafer, the spectrum conditions of all parts on the plating wafer cannot be completely reflected due to the position difference of the plating accompanying sheet in the plating cavity, and the spectrum uniformity test of all points on the plating wafer cannot be helped.

However, at present, no testing tool specific to the wafer is equipped in the spectroscopic equipment. When the spectrum is tested, the film-coated wafer needs to be directly inserted into the metal snap spring or the double-sided adhesive tape is adhered to the window of the test grating, so that the surface of the film-coated wafer is easily scratched and damaged, and the surface smoothness of the film-coated wafer exceeds the standard and cannot be used continuously.

Therefore, when a single-point spectrum test and a spectrum uniformity test are performed on a film-coated wafer, a tool which can stably fix wafers of various sizes (different diameters and thicknesses) and cannot damage the surface smoothness of the wafers is urgently needed.

Disclosure of Invention

The utility model aims to solve the technical problem and provide a coating film wafer multifunctional test frock, contactless wafer surface reduces the injury to conveniently adjust the wafer position, improve efficiency of software testing.

In order to solve the technical problem, the utility model provides a multifunctional test tool for a coated wafer, which comprises a rotating chassis with a rotatable angle, wherein the surface of the rotating chassis is provided with an adjusting platform moving along an X axis, the adjusting platform is provided with a first self-locking screw, the adjusting platform is provided with two guide posts, the guide posts are arranged along a Y axis direction, a lower limiting beam and an upper limiting beam are arranged between the two guide posts, the lower limiting beam and the upper limiting beam can move along the axial direction of the guide posts, the middle part of the lower limiting beam is provided with a lower support part, the upper limiting beam is provided with an upper pressing part, and the corresponding surfaces of the upper pressing part and the lower support part are provided with limiting grooves and are matched with and fix the wafer;

and a second self-locking screw is arranged on the lower limiting beam, and a third self-locking screw is arranged on the upper limiting beam.

Furthermore, the rotating chassis comprises a fixed bottom plate and a rotating platform, a rotating groove is formed in the middle of the fixed bottom plate, the rotating platform is arranged in the rotating groove, a C-shaped limiting ring is arranged on the upper portion of the rotating platform and fixedly connected with the fixed bottom plate, and a locking screw for limiting the rotation of the rotating platform is further arranged on the C-shaped limiting ring.

Furthermore, an angle identification line is arranged on the fixed bottom plate, a rotation angle scale is arranged on the rotating platform, and the rotation angle scale is matched with the angle identification line to determine the rotation angle of the rotating platform.

Furthermore, a sliding block is arranged at the bottom of the adjusting platform, the sliding block is arranged on a guide rail, and the guide rail is fixed on the rotating platform.

Furthermore, the guide post is cylindrical, and the lower limiting beam and the guide post and the upper limiting beam and the guide post are connected through guide sleeves.

Furthermore, the second self-locking screw and the third self-locking screw penetrate through the corresponding guide sleeves to be abutted against the guide columns, and the surfaces of the guide columns corresponding to the second self-locking screw and the third self-locking screw are set to be planes.

Furthermore, the lower limiting beam and the upper limiting beam are arranged in a tangent mode with the surfaces of the corresponding guide sleeves.

Furthermore, a silica gel pad is arranged in the limiting groove.

Further, a height adjusting plate is arranged on the side surface of the lower support.

Furthermore, the tops of the two guide posts are provided with limiting connection top plates.

The utility model has the advantages that:

1. the upper pressing part and the lower supporting part are matched to fix the wafer, so that the contact position is only the periphery of the wafer, the surface of the wafer is not damaged, and the quality of the wafer is ensured;

2. through the adjustment platform that can remove along the X axle and the cooperation of the lower spacing roof beam that can remove along the Y axle direction and last spacing roof beam for the wafer can carry out the diaxon in a plane and remove, guarantees that position control before detecting is convenient fast.

3. Adopt rotatory chassis for adjust the platform and can rotate, spectrometer incident angle when can changing the detection according to turned angle satisfies different detection demands and uses a multiple functional.

4. The lower limiting beam and the upper limiting beam can move along the guide column, and the distance between the lower limiting beam and the upper limiting beam can be adjusted, so that wafers of different sizes can be clamped, and the application range is wide.

Drawings

Fig. 1 is a schematic view of the overall structure of the present invention;

FIG. 2 is a schematic view of the wafer mounting structure of the present invention;

FIG. 3 is a schematic structural view after the rotation angle of the present invention during the test;

fig. 4 is a schematic structural diagram of the present invention for fixing a small-sized wafer.

Detailed Description

The present invention is further described with reference to the following drawings and specific embodiments so that those skilled in the art can better understand the present invention and can implement the present invention, but the embodiments are not to be construed as limiting the present invention.

Referring to fig. 1 to 3, an embodiment of the multifunctional testing tool for a film-coated wafer of the present invention includes a rotation chassis 1 capable of rotating an angle for angle adjustment, an adjustment platform 2 moving along an X axis is disposed on a surface of the rotation chassis, a first self-locking screw 3 is disposed on the adjustment platform, the adjustment platform is locked by the first self-locking screw after moving in place, two guide posts 4 are disposed on the adjustment platform, the guide posts are disposed along a Y axis direction, a lower limit beam 5 and an upper limit beam 6 are disposed between the two guide posts, the lower limit beam and the upper limit beam are movable along the guide post axial direction, i.e., can move along the Y axis direction, a lower support 7 is disposed in a middle of the lower limit beam, an upper press portion 8 is disposed on the upper limit beam, a limit groove 9 is disposed on a surface corresponding to the upper press portion and the lower support, a bottom edge of the wafer is clamped into the limit groove of the lower support, a top edge of the wafer is clamped into the limit groove of the upper press portion, the upper press portion and the lower support portion exert a limit effect on the wafer in both radial and axial directions, thereby achieving a fixing effect; and a second self-locking screw 10 is also arranged on the lower limiting beam and can fix the relative position between the lower limiting beam and the guide column, and a third self-locking screw 11 is arranged on the upper limiting beam and can fix the relative position between the upper limiting beam and the guide column.

Specifically, when the spectrometer is used, the first self-locking screw is in a locked state, the second self-locking screw can be in an unlocked state, the third self-locking screw is locked, the upper limit amount is fixed at the top of the guide column, the wafer is taken out of the wafer frame and does not touch the surface of the wafer when taken out, the bottom of the wafer is inserted into the limit groove of the lower support part, the third self-locking screw is opened, the third self-locking screw is held by hand to drive the upper limit beam to move downwards, the upper pressure part is clamped on the upper part of the wafer through the limit groove, the upper pressure part and the lower support part are matched to fix the wafer, the weight of the upper pressure part and the weight of the upper limit beam are pressed on the wafer, the primary fixing effect can be achieved, the wafer does not fall after the hand is released, the spectrometer is opened, the positioning light point of the spectrometer appears on the wafer, the position of the wafer is adjusted according to the positioning light point, and the test can be carried out after the adjustment is finished; during adjustment, when the wafer is large, as shown in fig. 1, the light spot position meets the requirement in the Y-axis direction and does not meet the requirement in the X-axis direction, the second self-locking screw and the third self-locking screw are locked, then the first self-locking screw is loosened, the first self-locking screw is held by hand to move along the X-axis direction until the light spot position requirement is met, then the first self-locking screw is locked, and then the test is carried out. During adjustment, when the wafer is small, the light spot position does not meet the requirements in the Y-axis direction and the X-axis direction, the first self-locking screw is loosened, the lower limiting beam is lifted, the lower limiting beam moves in the Y-axis direction, meanwhile, force is applied to the lower limiting beam in the X-axis direction, the lower limiting beam moves in the X-axis direction, namely, the lower limiting beam moves in two circumferential directions simultaneously until the light spot meets the requirements, then, the first self-locking screw and the second self-locking screw are locked, the third self-locking screw is locked after locking, adjustment is completed, and the test is carried out as shown in fig. 4.

Because during the test, there is the angle problem of penetrating, for example when needing 30 degrees incident angles, direct rotation rotating chassis, angle regulation can, the simple operation satisfies the test requirement. Specifically, the rotating chassis comprises a fixed base plate 12 and a rotating platform 13, a rotating groove is formed in the middle of the fixed base plate, the rotating platform is arranged in the rotating groove, a C-shaped limiting ring 14 is arranged on the upper portion of the rotating platform and fixedly connected with the fixed base plate, a locking screw 15 for limiting the rotating of the rotating platform is further arranged on the C-shaped limiting ring, and the locking screw is locked after the angle is adjusted in place. The C-shaped limiting ring and the rotating groove limit the rotating platform, the structure is simple, the preparation cost is low, and the overall thickness can be effectively reduced, so that the requirement on the height of the inner space of the spectrometer is met, and the rotating platform is matched for use. And angle marking lines are arranged on the fixed bottom plate, a rotation angle scale is arranged on the rotating platform, the rotation angle scale is matched with the angle marking lines to determine the rotation angle of the rotating platform, the adjustment is visual, and the difficulty is small.

The bottom of the adjusting platform is provided with a sliding block, the sliding block is arranged on a guide rail 16, and the guide rail is fixed on the rotating platform and slides stably and reliably. The guide posts are cylindrical, the lower limiting beam and the guide posts and the upper limiting beam and the guide posts are connected through guide sleeves 19, and lifting and sliding are smooth. The second self-locking screw and the third self-locking screw all pass through the guide sleeve and the guide post butt that correspond, and the guide post surface that second self-locking screw and third self-locking screw correspond sets up to the plane, and the fastening is effectual to when the indentation scheduling problem appears in the guide post performance after the fastening, can not lead to the fact the interference to going up and down. When the lower limiting beam and the upper limiting beam are fixed with the corresponding guide sleeves, the lower limiting beam and the upper limiting beam are selected to be arranged in a tangent mode with the surfaces of the guide sleeves, so that the lower limiting beam and the upper limiting beam are arranged on one side, interference with the guide columns can be avoided when a wafer is installed, and the whole size can be reduced.

In order to further protect the wafer, a silica gel pad is arranged in the limiting groove, so that the inner wall of the limiting groove is prevented from scratching the surface of the wafer. In order to facilitate the lifting movement of the lower limiting beam, a height adjusting plate 17 is arranged on the side surface of the lower supporting part, so that the hand-held operation is facilitated. And the top parts of the two guide posts are provided with limiting connecting top plates 18, so that the guide posts can be fixed in position, and the upper limiting beams are limited from being separated.

This application still sets up the quantity of splenium into 2, and the symmetry sets up, and two splenums and a cooperation of holding in the palm portion down form three point positioning mechanism, and is fixed effectual. And be formed with the space of dodging between two upper pressure portions, when putting great wafer, place wafer bottom earlier on lower support portion, press at the top of wafer with a finger afterwards, spacing roof beam removal in another hand operation, until upper pressure portion pushes down the wafer, after the location, this finger is located dodge the space, do not take out the finger afterwards can, convenient operation.

In summary, the test tool can effectively solve the problem of damage caused by touching the surface of the wafer, is convenient to operate and adjust the position, has a simple structure, is low in preparation cost, and meets the use requirements.

The above embodiments are only used to illustrate the technical solution of the present invention, and not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may be modified or some technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention in its corresponding aspects.

Claims

1. The multifunctional testing tool for the coated wafer is characterized by comprising a rotating chassis capable of rotating by an angle, wherein an adjusting platform moving along an X axis is arranged on the surface of the rotating chassis, a first self-locking screw is arranged on the adjusting platform, two guide posts are arranged on the adjusting platform and arranged along a Y axis direction, a lower limiting beam and an upper limiting beam are arranged between the two guide posts, the lower limiting beam and the upper limiting beam can move along the axial direction of the guide posts, a lower support part is arranged in the middle of the lower limiting beam, an upper pressing part is arranged on the upper limiting beam, and limiting grooves are arranged on the surfaces corresponding to the upper pressing part and the lower support part and are matched with and used for fixing the wafer;

2. The multifunctional testing tool for coated wafers as claimed in claim 1, wherein the rotating base comprises a fixed base plate and a rotating platform, a rotating groove is formed in the middle of the fixed base plate, the rotating platform is arranged in the rotating groove, a C-shaped limiting ring is arranged on the upper portion of the rotating platform, the C-shaped limiting ring is fixedly connected with the fixed base plate, and a locking screw for limiting the rotation of the rotating platform is further arranged on the C-shaped limiting ring.

3. The multifunctional testing tool for coated wafers as claimed in claim 2, wherein the fixed base plate is provided with angle identification lines, the rotating platform is provided with rotation angle scales, and the rotation angle scales and the angle identification lines are matched to determine the rotation angle of the rotating platform.

4. The multifunctional test tool for coated wafers as set forth in claim 2, wherein a slider is disposed at the bottom of the adjusting platform, the slider is disposed on a guide rail, and the guide rail is fixed on the rotating platform.

5. The multifunctional test tool for coated wafers as set forth in claim 1, wherein the guide posts are cylindrical, and the lower limit beam and the guide posts and the upper limit beam and the guide posts are connected through guide sleeves.

6. The multifunctional test tool for coated wafers as set forth in claim 5, wherein the second self-locking screw and the third self-locking screw are both abutted against the guide post through corresponding guide sleeves, and the surfaces of the guide posts corresponding to the second self-locking screw and the third self-locking screw are set to be flat.

7. The multifunctional test tool for coated wafers as set forth in claim 5, wherein the lower and upper limiting beams are arranged tangentially to the corresponding surfaces of the guide sleeves.

8. The multifunctional test tool for coated wafers as set forth in claim 1, wherein a silica gel pad is disposed in the limiting groove.

9. The multifunctional testing tool for coated wafers as claimed in claim 1, wherein a height adjusting plate is disposed on the side surface of the lower support.

10. The multifunctional test tool for coated wafers as set forth in claim 1, wherein top plates are connected to the top of the two guide posts in a limiting manner.