CN217938437U - Posterior tooth immediate implant and implant assembly - Google Patents

Posterior tooth immediate implant and implant assembly Download PDF

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Publication number
CN217938437U
CN217938437U CN202221994683.3U CN202221994683U CN217938437U CN 217938437 U CN217938437 U CN 217938437U CN 202221994683 U CN202221994683 U CN 202221994683U CN 217938437 U CN217938437 U CN 217938437U
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implant
head
thread
platform
immediate
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邹多宏
郑吉驷
白果
杨驰
张志愿
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Ninth Peoples Hospital Shanghai Jiaotong University School of Medicine
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Ninth Peoples Hospital Shanghai Jiaotong University School of Medicine
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Abstract

The application relates to the technical field of dental implantation, in particular to a posterior tooth immediate implant and an implant assembly. The posterior tooth immediate implant comprises an implant head part and an implant platform part which are connected, wherein the implant head part comprises a large thread section, and small threads are respectively arranged between every two adjacent threads of the large thread section; the thread depth of the large thread section is greater than that of the small thread; the length-diameter ratio of the head part of the implant is 6-9:6-9; the diameter of planting body platform portion reduces from being close to planting body head to the one end diameter of keeping away from the planting body head gradually, the one end that planting body head was kept away from to planting body platform portion still is equipped with the fluting, the notched periphery is equipped with the platform and shifts the district. The dental extraction socket can be filled while the stability of the initial stage is ensured, bone grafting is avoided, and the dental extraction socket can be loaded instantly, so that the operation is simplified, the cost of a patient is saved, the long-term stability of the implant is maintained, and the implantation complications are reduced.

Description

Posterior tooth immediate implant and implant assembly
Technical Field
The application relates to the technical field of dental implantation, in particular to a posterior tooth immediate implant and an implant assembly.
Background
The dental implantation restoration is the preferred restoration method for patients with dental loss, the number of dental implantation is huge every year in China, in 2020, official statistics is more than 400 ten thousand, and the market value is nearly 45 hundred million. Because the posterior area is in close proximity to the maxillary sinus or lower alveolar nerve canal, how to accomplish immediate implantation in the case of insufficient bone mass has been a challenge for the implanting physician. Clinically, teeth in the posterior dental area cannot be reserved due to various reasons and need to be pulled out. There is currently a lack in the market of dedicated implant assemblies for immediate implantation in the posterior dental area. Therefore, the research and development of the special implant component for immediate planting in the posterior dental area has important clinical significance and social value.
SUMMERY OF THE UTILITY MODEL
In view of the above disadvantages of the prior art, the present application is directed to a posterior tooth immediate implant and an implant assembly to solve the problems of the prior art.
In order to achieve the above and other related objects, the present application provides, in one aspect, a posterior immediate implant, including an implant head and an implant platform connected to each other, the implant head including a large thread section, and small threads respectively disposed between adjacent threads of the large thread section; the thread depth of the large thread section is greater than that of the small thread; the length-diameter ratio of the head part of the implant is 6-9:6-9; the diameter of planting body platform portion reduces from being close to the planting body head to the one end diameter of keeping away from the planting body head gradually, the one end that planting body head was kept away from to planting body platform portion still is equipped with the fluting, grooved periphery is equipped with the platform and shifts the district.
In some embodiments of the present application, an angle γ between a generatrix of the implant table part and the bottom surface of the implant head part is an acute angle.
In some embodiments of the present application, the implant platform portion is a truncated cone; the included angle gamma between the bus of the implant platform part and the bottom surface of the implant head part is 20-80 degrees.
In some embodiments of the present application, the stage transfer area is a ring structure having a ring width of 0.2mm to 0.5mm.
In some embodiments of the present application, the outer surface of the implant platform is a smooth arcuate surface.
In some embodiments of the present application, the implant head is a conical body, and the outer diameter of the implant head gradually increases from one end far away from the implant platform part to one end close to the implant platform part; the one end that the planting body platform portion was kept away from to the planting body head is equipped with the pointed end.
In some embodiments of the present application, the thread depth between adjacent threads of the large thread segments is equal.
In some embodiments of the present application, the thread pitch between adjacent threads of the large thread segments is equal.
In some embodiments of the present application, the thread thickness is equal between adjacent threads of the large thread segments.
In some embodiments of the present application, the angle between the working surface of each thread in the macro-thread segment and its radial direction along the implant head is α,5 ° α 30 °.
In some embodiments of the present application, the angle between the working face of each of the small threads and its radial direction along the implant head is β,5 ° ≦ β ≦ 30 °.
In some embodiments of the present application, the thread extension direction of the small thread coincides with the thread extension direction of the large thread segment.
In some embodiments of the present application, the thread thickness of the large thread segments is greater than the thread thickness of the small threads.
In some embodiments of the present application, the aspect ratio of the implant platform section is 1-4:5-8.8.
In some embodiments of the present application, the diameter of the end of the implant platform distal to the implant head is 5mm to 8.4mm.
In some embodiments of the present application, the diameter of the end of the implant platform portion proximal to the implant head portion is 5.5mm to 8.8mm.
In some embodiments of the present application, the material of the immediate posterior dental implant is grade five titanium.
In some embodiments of the present application, the surface of the immediate posterior dental implant is provided with an oxide film layer.
In some embodiments of the present application, the implant head is provided with a flute; the chip groove extends along the axial direction of the head of the implant.
Another aspect of the present application provides an implant assembly, comprising the immediate posterior tooth implant, and further comprising an abutment connected to the immediate posterior tooth implant.
Compared with the prior art, the beneficial effects of this application do:
1. this application sets up little screw thread between the screw thread of big screw thread section, and little screw thread reinforcing implant cutting power and self tapping do benefit to and implant fast to can effectively reduce the friction heat production, avoid bone burn and osteonecrosis, reduce the planting failure rate, and effectively increase the implant surface area, increase bone implant contact area.
2. The diameter of the implant platform part is designed to be gradually reduced from one end close to the head part of the implant to one end far away from the head part of the implant; the implant platform part realizes the adduction of a certain degree, so that when the implant is implanted, the bone beside the implant platform part is not extruded, and the formation of new bone is facilitated.
3. The implant is an ultra-wide implant, so that the initial stability of the implant can be ensured, and the bone grafting operation is avoided. The length of the implant is reduced, but the diameter is increased, so that the effective surface area of the implant is generally ensured, osseointegration can be effectively completed, the success rate of implantation is improved, the operation is simple and convenient, the operation wound is reduced, the operation cost is saved, and great social and economic benefits are achieved.
4. The utility model provides a still be equipped with the platform on the planting body platform portion and shift the district, after the base station is installed through the fluting in planting body platform portion, can form certain space between platform shift district and the base station and for bone combination portion, do benefit to the planting body bone combination, the planting body implants back bone can slowly grow into bone combination portion, does benefit to planting body platform portion bone combination.
5. The implant platform part of the application is provided with all smooth neck rings, so that the probability of peri-implant inflammation complications is reduced.
Drawings
Fig. 1 is a front view schematically showing the structure of the immediate tooth implant according to the present invention.
Fig. 2 is a left side view structure diagram of the immediate tooth implant according to the present application.
Fig. 3 is a perspective view of the implant immediately after tooth implantation according to the present invention.
Fig. 4 is a schematic top view of the implant immediately after the application.
Fig. 5 is a bottom view of the instant implant of the present application.
Element numbers in the figures of the present application:
1. implant head
101. Large thread segment
102. Small screw thread
103. Tip end
2. Implant platform part
201. Slotting
202. Platform transfer area
3. Chip groove
Detailed Description
In the description of the present application, it should be noted that the structures, the ratios, the sizes, and the like shown in the drawings attached to the present application are only used for matching the disclosure of the present application, so as to be understood and read by those skilled in the art, and are not used for limiting the conditions that the present application can be implemented, so that the present application has no technical significance, and any modifications of the structures, changes of the ratio relationships, or adjustments of the sizes, without affecting the efficacy and the achievable purpose of the present application, should still fall within the scope of the technical content disclosed in the present application. While the terms "central," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like refer to orientations or positional relationships illustrated in the drawings, which are used for convenience to describe the present application and to simplify description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and are therefore not to be considered limiting of the present application. Furthermore, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
In the description of the present application, it should be noted that, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, a fixed connection, a detachable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In addition, in the description of the present application, "a plurality" means two or more unless otherwise specified.
As shown in fig. 1 to 5, in one aspect, the present embodiment provides a posterior immediate implant, including an implant head portion 1 and an implant platform portion 2, which are connected, where the implant head portion 1 includes a large thread segment 101, and small threads 102 are respectively disposed between adjacent threads of the large thread segment 101; the thread depth of the large thread segments 101 is greater than the thread depth of the small threads 102; the length-diameter ratio of the implant head 1 is 6-9:6-9; the diameter of the implant platform part 2 is gradually reduced from the part close to the head part 1 of the implant to the part far away from the head part 1 of the implant; the one end that planting body platform portion 2 kept away from the planting body head still is equipped with fluting 201, the periphery of fluting 201 is equipped with platform and shifts district 202. In this application, big screw thread section 101 is convenient for cut and snatch when implanting, does benefit to quick implantation, improves the initial stage stability of planting body, reduces and plants the failure rate. The small threads 102 are arranged among the threads of the large thread section 101, the small threads 102 enhance the cutting force and the self-tapping performance of the implant, are beneficial to quick implantation, can effectively reduce friction heat generation, avoid bone burn and bone necrosis, reduce the implantation failure rate, effectively increase the surface area of the implant and increase the contact area of the bone implant. In addition, the diameter of the implant platform part 2 is designed to be gradually reduced from one end close to the head part 1 of the implant to one end far away from the head part 1 of the implant; the implant platform part 2 is retracted to a certain degree, so that when the implant is implanted, the bone beside the implant platform is not extruded, and formation of new bone is facilitated. Considering that the implant of the application can be planted only by being specially used for posterior teeth, if the implant can be planted, on one hand, the implant needs to be short because the maxillary sinus is arranged above the maxilla and the neural tube is arranged below the mandible; on the other hand, considering that the implant needs to obtain a certain initial stability, in order to increase the surface area of the implant, the diameter of the implant needs to be 6-9mm. Therefore, considering comprehensively, in the present application, the length-diameter ratio of the implant head 1 is 6-9:6-9. Still be equipped with platform on implant platform portion 2 and shift district 202, after installing the base station through fluting 201 at implant platform portion, platform shifts and can form certain space between district 202 and the base station and for bone combination portion, does benefit to the bone combination of implant, and the bone can slowly grow into bone combination portion after the implant is implanted, does benefit to 2 bone combinations of implant platform portion.
In the posterior tooth immediate implant provided by the embodiment of the present application, as shown in fig. 1, an included angle γ between a generatrix of the implant platform portion 2 and a bottom surface of the implant head portion 1 is an acute angle. In one embodiment, the implant platform portion 2 is in the shape of a truncated cone; the included angle gamma between the bus of the implant platform part 2 and the bottom surface of the implant head part 1 is 20-80 degrees.
In the posterior immediate implant provided by the embodiment of the present application, as shown in fig. 3, the slot 201 may be regarded as a slot 201 formed from the center to the periphery of one end of the implant platform portion 2 away from the implant head portion 1, and the remaining portion is a platform transfer area 202. The platform transfer area 202 is of an annular structure, and the annular width is 0.2 mm-0.5 mm.
In the immediate implant for posterior teeth provided by the embodiment of the application, as shown in fig. 1 to 3, the outer surface of the implant platform part 2 is a smooth arc surface. Tooth planting body at once after this application has whole smooth arc surface owing to planting body platform portion, so exposes the smooth surface outside the bone, contacts with the soft tissue, avoids the bacterial plaque to pile up on the planting body that exposes.
In the immediate-posterior-tooth implant provided by the embodiment of the application, the immediate-load implant has deep threads, large threads, strong self-tapping property and large initial stability (> 35 Ncm), and the used material is five-grade titanium. The head 1 of the implant is of a solid structure.
In the immediate posterior tooth implant provided by the embodiment of the present application, as shown in fig. 1 to 3, the implant head 1 is a conical body, and the outer diameter of the implant head 1 gradually increases from one end far away from the implant platform part 2 to one end close to the implant platform part 2; the end of the implant head 1 far away from the implant platform part 2 is provided with a tip 103. The tip 103 of the implant head 1 is cutting capable.
In the posterior immediate implant provided by the embodiment of the present application, as shown in fig. 1 to 2, the thread depth between adjacent threads of the large thread segment 101 is equal. The thread depth refers to the thread height of each thread in large thread segment 101. In one embodiment, the thread depth of the large thread segment 101 is 1-3mm.
In the posterior immediate implant provided by the embodiments of the present application, as shown in fig. 1 to 2, the thread pitch between adjacent threads of the large thread segment 101 is equal. The pitch of the major thread segments 101 refers to the distance between the adjacent 2 threads in the axial direction of the implant head 1. In one embodiment, the thread pitch of the large thread segment 101 is 2-3 mm.
In the posterior immediate implant provided by the embodiment of the present application, as shown in fig. 1 to 2, the thread thickness between adjacent threads of the large thread segment 101 is equal. The thread thickness of the large thread segment 101 means the thickness of each thread outer side surface of each thread in the large thread segment 101 in the axial direction of the implant head 1. In one embodiment, the thread thickness of the large thread segment 101 is 0.2-0.6 mm.
In the immediate posterior implant provided by the embodiment of the application, as shown in fig. 1, the included angle between the working surface of each thread in the large thread section 101 and the radial direction of the large thread section along the head 1 of the implant is alpha, and alpha is more than or equal to 5 degrees and less than or equal to 30 degrees. Such a design facilitates implant implantation and reduces frictional heating. In some embodiments, 5 ≦ α ≦ 10 °, or 10 ≦ α ≦ 30 °, and the like.
In the immediate posterior implant provided by the embodiment of the present application, as shown in fig. 1 to 2, a small thread 102 is provided between adjacent threads of a large thread section 101, and the thread depth of the small thread 102 refers to the thread height of the thread of the small thread 102. In one embodiment, the small thread 102 has a thread depth of 0.2mm to 0.5mm.
In the immediate back-tooth implant provided by the embodiment of the present application, the thread thickness of the small thread 102 refers to the thickness of each thread outer side of the small thread 102 in the axial direction of the implant head 1. The thread thickness of the large thread segments 101 is greater than the thread thickness of the small threads 102. The thread thickness of the small thread 102 is 0.1-0.3mm.
In the posterior immediate implant provided by the embodiment of the application, the pitch between the adjacent large threads and small threads 102 is 1-1.5 mm.
Further, as shown in fig. 1, the working surface of each of the small threads 102 forms an angle β with the radial direction of the implant head 1, wherein β is greater than or equal to 5 ° and less than or equal to 30 °. Such a design facilitates implant implantation and reduces frictional heat generation. In some embodiments, 5 ≦ β ≦ 10 °, or 10 ≦ β ≦ 30 °, and the like.
In the immediate posterior dental implant provided by the embodiment of the present application, as shown in fig. 1 to 3, a head 1 of the implant is provided with a flute 3. The flutes 3 extend in the axial direction of the implant head 1. The flutes 3 extend in the axial direction of the implant head 1. Furthermore, the large thread section 101 is provided with a chip groove 3. The chip groove 3 extends along the axial direction from one end of the large thread section 101 far away from the implant platform part 2 to the large thread section 101 close to the implant platform part 2. Such design makes at the implant implantation in-process, collects cancellous bone, reduces pressure, avoids the heat production, does benefit to vascularization bone formation, has certain anti-rotation of adversity simultaneously. In one embodiment, the depth of the chip grooves 3 is 1.2-2.0 mm. The diameter is 4.1-9mm. The length is 6-9mm.
In the immediate posterior dental implant provided by the embodiment of the present application, the implant head 1 is a cone. The implant head 1 and the implant platform 2 have the same outer diameter at their connection.
In the posterior tooth implant special for implantation provided by the embodiment of the application, the length of the head part 1 is 6-9mm, and the diameter of the head part 1 is 7-9mm, 6-9mm and the like.
In the special implant can be planted to posterior teeth that the embodiment of this application provided, the draw ratio of implant platform portion 2 is 1-4:5-8.8. The length of the implant platform part 2 is 1-4 mm, and the diameter is 5-8.8mm.
In some embodiments of the present application, the length of the implant platform portion 2 may be 1-4 mm, 1-2mm, or 2-4 mm, etc.
In some embodiments of the present application, the diameter of the end of the implant platform 2 remote from the implant head 1 is 5mm-8.4mm. In some embodiments, the diameter of the end of the implant platform 2 distal to the implant head 1 may be 5mm-6mm, 6mm-7mm, 7mm-8.4mm, etc.
In some embodiments of the present application, the diameter of the implant platform portion 2 near the end of the implant head portion 1 is 5.5mm-8.8mm. In some embodiments, the diameter of the implant platform portion 2 near the end of the implant head portion 1 may be 5.5mm-8.8mm, 5.5mm-6.5mm, 6.5mm-7.5mm, or 7.5mm-8.8mm, etc.
In the posterior tooth implant provided by the embodiment of the application, the length of the implant can be set according to actual needs, for example, the length can be 6mm to 9mm. More specifically, the diameter may be 6mm, 8mm, 10mm, or the like.
In the posterior tooth implant provided by the embodiment of the application, the diameter of the implant can be set according to actual needs, and can be 6mm-9mm, for example. More specifically, the diameters are divided into 6.0mm, 7.0mm, 8.0mm and 9.0mm to meet the requirements of different parts and bone mass.
In the implant special for immediate planting of posterior teeth, provided by the embodiment of the application, the surface of the implant for immediate planting of posterior teeth is provided with the oxide film layer. The oxidation film layer is obtained by carrying out anodic oxidation treatment on the surface of the immediate implant of the posterior teeth. The specific anodizing method may be a method of the prior art.
Another aspect of the present application provides an implant assembly including the immediate posterior implant provided in the first aspect of the present application, and further including an abutment (not shown) connected to the immediate posterior implant. The abutment is generally a portion of the implant assembly exposed to the outside of the mucosa, and provides support, retention, and stabilization to the artificial denture of its upper structure. The abutment and the immediate posterior implant may be generally connected by an implant platform 2. Wherein, the base station can be a composite base station in the prior art.
In general, in the embodiment of the present application, the end of the implant platform portion 2 away from the implant head portion 1 is a hollow inner hexagonal structure with the slot 201, and is connected with the abutment as an inner hexagonal connection.
The clinical concrete use of the immediate tooth implant after the application is explained as follows:
clinically, according to the needs of planting immediately, select the suitable length and platform height's implant. The piece of cloth is spread in conventionality anesthesia, the disinfection, the operation district exposes the area of need extracting teeth, cut the dental crown, divide the root, the root is extracted to the wicresoft, conventional planting tooth is equipped with the hole (the hole is equipped with to palatal side, ensure that the implant is implanted after, implant and buccal side bone wall interval >2 mm), confirm suitable high implant with the tour nurse, demolish planting extranal packing by the tour nurse, take out and open aseptic plastic envelope carefully and pack, the implant that will be equipped with aseptic inlayer packing meets with planting cell-phone head carefully, avoid being contaminated. Carefully implant the implant, the implant platform 2 is 1-2mm lower than the buccal bone surface, install the healing cap, suture and close the operation area.
To sum up, the posterior tooth immediate implant and the implant assembly provided by the embodiment of the application can fill the tooth extraction socket while ensuring the initial stability, avoid bone grafting, and can carry out immediate load, so that the operation is simplified, the cost of a patient is saved, the long-term stability of the implant is maintained, and the implantation complications are reduced. In particular, the following advantages are provided:
1. this application sets up little screw thread 102 between the screw thread of big screw thread section 101, and little screw thread 102 reinforcing implant cutting power and self tapping do benefit to and implant fast to can effectively reduce the friction heat production, avoid bone burn and osteonecrosis, reduce the planting failure rate, and effectively increase the implant surface area, increase bone implant contact area.
2. The diameter of the implant platform part 2 is designed to be gradually reduced from one end close to the head part 1 of the implant to one end far away from the head part 1 of the implant; the implant platform part 2 realizes the adduction to a certain degree, so that when the implant is planted, the bone beside the implant platform does not have extrusion, and the formation of a new bone is facilitated.
3. The implant is an ultra-wide implant, so that the initial stability of the implant can be ensured, and the bone grafting operation is avoided. The length of the implant is reduced, but the diameter is increased, so that the effective surface area of the implant is ensured, osseointegration can be effectively completed, the success rate of implantation is improved, the operation is simple and convenient, the operation wound is reduced, the operation cost is saved, and great social and economic benefits are achieved.
4. The utility model provides a still be equipped with platform transfer district 202 on implant platform portion 2, after installing the base station through fluting 201 in implant platform portion, can form certain space between platform transfer district 202 and the base station and for bone joint portion, do benefit to the implant bone and combine, implant implantation back bone can slowly grow into bone joint portion, do benefit to 2 bone joint portions of implant platform portion.
5. The implant platform part of the application is provided with all smooth neck rings, so that the probability of peri-implant inflammation complications is reduced.
In conclusion, the present application effectively overcomes various disadvantages in the prior art and has high industrial utilization value.
The above embodiments are merely illustrative of the principles and utilities of the present application and are not intended to limit the present application. Any person skilled in the art can modify or change the above-described embodiments without departing from the spirit and scope of the present application. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical concepts disclosed in the present application shall be covered by the claims of the present application.

Claims (10)

1. The posterior tooth immediate implant is characterized by comprising an implant head part (1) and an implant platform part (2) which are connected, wherein the implant head part (1) comprises a large thread section (101), and small threads (102) are respectively arranged between every two adjacent threads of the large thread section (101); the thread depth of the large thread section (101) is greater than that of the small thread (102); the length-diameter ratio of the implant head (1) is 6-9:6-9; the diameter of planting body platform portion (2) reduces from being close to planting body head (1) to the one end diameter of keeping away from planting body head (1) gradually, the one end that planting body head was kept away from in planting body platform portion (2) still is equipped with fluting (201), the periphery of fluting (201) is equipped with platform transfer district (202).
2. The immediate posterior dental implant according to claim 1, wherein the generatrix of the implant platform part (2) forms an acute angle with the bottom surface of the implant head part (1).
3. The immediate posterior dental implant according to claim 2, wherein the implant platform portion (2) is frustoconical; the included angle gamma between the bus of the implant platform part (2) and the bottom surface of the implant head part (1) is 20-80 degrees.
4. The immediate posterior implant of claim 1, wherein said platform transfer zone (202) is an annular structure having an annular width of 0.2mm to 0.5mm;
and/or the outer surface of the implant platform part (2) is a smooth arc surface.
5. The immediate posterior dental implant according to claim 1, wherein the implant head (1) is a cone-shaped body, the outer diameter of the implant head (1) gradually increasing from the end away from the implant platform (2) to the end close to the implant platform (2); one end of the implant head (1) far away from the implant platform part (2) is provided with a tip (103).
6. The immediate posterior implant of claim 1, wherein the thread depth between adjacent threads of said large thread segment (101) is equal;
and/or the thread pitch between adjacent threads of the large thread segments (101) is equal;
and/or the thread thickness between adjacent threads of the large thread segments (101) is equal;
and/or the included angle between the working surface of each thread in the large thread section (101) and the radial direction of the large thread section along the implant head (1) is alpha, and alpha is more than or equal to 5 degrees and less than or equal to 30 degrees.
7. The immediate posterior implant according to claim 1, wherein the angle between the working surface of each of said small threads (102) and the radial direction thereof along the head (1) of the implant is β,5 ° ≦ β ≦ 30 °;
and/or the thread extension direction of the small thread (102) is consistent with the thread extension direction of the large thread section (101);
and/or the thread thickness of the large thread section (101) is larger than the thread thickness of the small thread (102).
8. Posterior immediate implant according to claim 1, characterized by the fact that the implant platform (2) has a length to diameter ratio of 1-4:5-8.8;
and/or the diameter of one end of the implant platform part (2) far away from the implant head part (1) is 5-8.4 mm;
and/or the diameter of one end of the implant platform part (2) close to the implant head part (1) is 5.5mm-8.8mm;
and/or the material of the immediate implant of the posterior tooth is five-grade titanium;
and/or an oxide film layer is arranged on the surface of the immediate implant of the posterior teeth.
9. Immediate posterior implant according to claim 1, wherein the head (1) of the implant is provided with flutes (3); the chip groove (3) extends along the axial direction of the implant head (1).
10. An implant set comprising a posterior immediate implant as claimed in any one of claims 1 to 9, further comprising an abutment connected to the posterior immediate implant.
CN202221994683.3U 2022-07-29 2022-07-29 Posterior tooth immediate implant and implant assembly Active CN217938437U (en)

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CN202221994683.3U CN217938437U (en) 2022-07-29 2022-07-29 Posterior tooth immediate implant and implant assembly

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Application Number Priority Date Filing Date Title
CN202221994683.3U CN217938437U (en) 2022-07-29 2022-07-29 Posterior tooth immediate implant and implant assembly

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116158875A (en) * 2022-12-28 2023-05-26 山东大学 Novel dental implant

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116158875A (en) * 2022-12-28 2023-05-26 山东大学 Novel dental implant

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