CN217932417U - Novel TMAH developer solution regeneration and concentration management system - Google Patents

Abstract

The utility model relates to a novel TMAH developer solution regeneration and concentration management system, which comprises a recovery barrel groove A, a recovery barrel groove B, a concentration adjustment barrel groove A and a concentration adjustment barrel groove B, wherein the top inlets of the recovery barrel groove A and the recovery barrel groove B are respectively connected with a processing device and a nanofiltration adsorption system through pipelines, the bottoms of the recovery barrel groove A and the recovery barrel groove B are connected with the inlets of a delivery pump A and a delivery pump B through pipelines, and the outlets of the delivery pumps are connected to the nanofiltration adsorption system through pipelines; the liquid inlets at the tops of the concentration adjusting barrel tank A and the concentration adjusting barrel tank B are respectively connected with a nanofiltration adsorption system and a supply barrel tank through pipelines, the liquid outlet at the bottom of the concentration adjusting barrel tank is connected with inlets of a supply pump A, a supply pump B and a supply pump C through pipelines, and the outlet of the supply pump is connected with a TAMH2.38% mixing valve box through a pipeline; the utility model discloses use and filter the adsorption technology, and the electron level chemicals grade of retrieving is higher, can satisfy the requirement of panel factory manufacture product to developer solution regeneration and concentration.

Description

Novel TMAH developer solution regeneration and concentration management system

[ technical field ]

The utility model belongs to the technical field of the developer solution processing procedure and specifically relates to a novel TMAH developer solution regeneration and concentration management system.

[ background art ]

With the needs of social development and the influence of international environment, domestic TFT LCD/AMOLED companies are increasing. 2.38% of TMAH developer is a chemical solution which is necessary to be used in the panel factory manufacturing process and is used in a large amount. The developing waste liquid of the processed product after exposure and development contains optical progenitor agent and low-concentration metal ions, the waste liquid treatment cost is high, and the environment is polluted. Therefore, in order to save cost, reduce pollution, recycle, save energy and reduce consumption, improve product quality, production yield and raw material use efficiency, the recovery and utilization of 2.38% of TMAH developer by technologies such as NF photoresist removal, resin adsorption and desorption, purification and the like are required. At present, H2SO4 or HCL is used for electrolysis in the regeneration of a developing solution recovery system in the market, H2 or CL2 is generated, and the safety risk is high.

[ contents of utility model ]

The utility model aims at solving foretell not enough and provide a novel TMAH developer solution regeneration and concentration management system, use the filtration adsorption technique, can not have the safety risk, and the electronic grade chemical grade of retrieving is higher, can satisfy the requirement of panel factory process product to developer solution regeneration and concentration.

The system comprises a recovery barrel groove A16, a recovery barrel groove B17, a concentration adjustment barrel groove A19 and a concentration adjustment barrel groove B20, wherein liquid inlets at the tops of the recovery barrel groove A16 and the recovery barrel groove B17 are respectively connected with processing equipment through a first pipeline 101 and a second pipeline 102, and are connected with a nanofiltration adsorption system 27 through a third pipeline 103, a fourth pipeline 104, a fifth pipeline 105 and a sixth pipeline 106, the bottoms of the recovery barrel groove A16 and the recovery barrel groove B17 are connected with inlets of a delivery pump A1 and a delivery pump B2 through a pipeline 107, and outlets of the delivery pump A1 and the delivery pump B2 are connected with an inlet of the nanofiltration adsorption system 27 through an eighth pipeline 108; the concentration adjusting barrel tank A19 and the concentration adjusting barrel tank B20 are respectively connected with the nanofiltration adsorption system 27 through a pipeline nine 201 and a pipeline ten 202 at top liquid inlets thereof, and connected with the supply barrel tank 22 through a pipeline eleven 203 and a pipeline twelve 204 at bottom liquid outlets thereof, the concentration adjusting barrel tank A19 and the concentration adjusting barrel tank B20 are respectively connected with the supply pump A7, the supply pump B8 and the supply pump C9 through a pipeline thirteen 205 and a pipeline fourteen 206 at bottom liquid inlets thereof, and the supply pump A7, the supply pump B8 and the supply pump C9 are respectively connected with the TAMH2.38% mixing valve box 35 through a pipeline fifteen 207 and a pipeline sixteen 208 at outlets thereof.

Further, the TAMH2.38% mixing valve box 35 is connected with the concentration detection system unit, the concentration detection system unit ii, the concentration detection system unit iii, the concentration detection system unit iv and the concentration detection system unit iv through the pipe seventeen 209, the pipe eighteen 210, the pipe nineteen 211, the pipe twenty 212 and the pipe twenty-one 213 respectively to perform concentration detection, and then enters the manufacturing equipment.

Further, a liquid inlet at the top of the supply barrel tank 22 is connected with a plant chemical VMB valve box through a pipeline twenty-two 301, 25% of the TMAH is delivered to the supply barrel tank 22 from the plant chemical VMB valve box through a pipeline twenty-two 301, a liquid outlet at the bottom of the supply barrel tank 22 is respectively connected with inlets of a dilution pump A12, a dilution pump B10 and a dilution pump C11 through a pipeline twenty-three 302, outlets of the dilution pump A12, the dilution pump B10 and the dilution pump C11 are respectively connected with a dilution barrel tank B24, a dilution barrel tank A23, a concentration adjustment barrel tank A19, a concentration adjustment barrel tank B20 and a TMAH25% supply valve box 36 through a pipeline twenty-four 303, a pipeline twenty-five 304, a pipeline twenty-six 305, a pipeline twenty-seven 306 and a pipeline twenty-eight 307, and the TMAH25% supply valve box 36 is respectively connected with a concentration detection system I, a concentration detection system II, a concentration detection system III, a concentration detection system IV and a concentration detection system V through a pipeline twenty-nine 308, a pipeline thirty-309, a pipeline thirty-one 310, a pipeline thirty-two 311 and a pipeline thirty-three 312 to carry out concentration detection and enter processing equipment.

Further, other liquid inlets at the tops of the dilution barrel tank a23 and the dilution barrel tank B24 are respectively connected with a dimw pipeline thirty-four 401 and a dimw pipeline thirty-five 402, liquid outlets at the bottoms of the dilution barrel tank a23 and the dilution barrel tank B24 are respectively connected with inlets of a supply pump D13, a supply pump E14 and a supply pump F15 through a pipeline thirty-six 403 and a pipeline thirty-seven 404, outlets of the supply pump D13, the supply pump E14 and the supply pump F15 are respectively connected with an inlet of a TAMH2.38% supply valve box 37 through a pipeline thirty-eight 405 and a pipeline thirty-nine 406 through a filter three 34, and the TAMH2.38% supply valve box 37 is respectively connected with a concentration detection system, a concentration detection system two, a concentration detection system three, a concentration detection system four and a concentration detection system five through a pipeline forty 407, a pipeline forty-408, a pipeline forty-two-408, a pipeline forty-thirty-410 and a pipeline forty 411 to perform concentration detection and enter the processing equipment.

Further, the conveying pump A1, the conveying pump B2, the supply pump A7, the supply pump B8, the supply pump C9, the supply pump D13, the supply pump E14, the supply pump F15, the dilution pump a12, the dilution pump B10, and the dilution pump C11 are respectively connected to a PLC control unit through lines.

Further, the DIW pure water enters a dilution barrel tank A23 and a dilution barrel tank B24 through a pipeline thirty-four 401 and a pipeline thirty-five 402 respectively, the dilution barrel tank A23 and the dilution barrel tank B24 are connected with a concentration meter four 32 and a concentration meter five 33 respectively, and concentration is measured in a circulating mode through the concentration meter four 32 and the concentration meter five 33.

Furthermore, the concentration adjustment barrel tank a19, the concentration adjustment barrel tank B20 and the supply barrel tank 22 are respectively connected with a first concentration meter 28, a second concentration meter 29 and a third concentration meter 31, and the concentrations are measured through the first concentration meter 28, the second concentration meter 29 and the third concentration meter 31, the first concentration meter 28 and the second concentration meter 29 are respectively connected with a second filter 30, and the liquid outlet end of the second filter 30 is connected to a TAMH2.38% mixing valve box 35.

Further, outlets of the delivery pump A1 and the delivery pump B2 are connected with a first filter 26, a circulation port of the first filter 26 is connected with a circulation pump A3 and a circulation pump B4, an outlet of the first filter 26 is connected with a liquid inlet at the top of the waste photoresist barrel tank 18 through a waste liquid pump 25, and liquid outlets at the bottom of the waste photoresist barrel tank 18 are respectively connected with a PR pump A5 and a PR pump B6.

Further, leakage detectors are mounted at the bottoms of the recovery barrel tank a16, the recovery barrel tank B17, the waste photoresist barrel tank 18, the concentration adjustment barrel tank a19, the concentration adjustment barrel tank B20, the supply barrel tank 22, the dilution barrel tank a23 and the dilution barrel tank B24.

Compared with the prior art, the utility model, mainly supply to TMAH2.38% dilution vat (Mixing Tank) after receiving the 25% TMAH stoste that CCSS factory Service end supplied, the concentration adjustment vat (Service Tank) after NF filters of the waste liquid that processing procedure development process equipment discharged, supply to processing procedure development process equipment vat through DCS, the waste liquid that its processing procedure development process equipment discharged discharges to DRS TMAH2.38% waste liquid collecting vat, carry to the concentration adjustment Tank after NF on-line processing is accomplished, directly supply to processing procedure development process equipment and reuse after the concentration adjustment is accomplished; the TMAH developer solution regeneration and concentration management system recycles 2.38% of the TMAH developer solution by technologies of NF photoresist removal, resin adsorption desorption, purification and the like, thereby meeting the requirements of panel factory process products on the regeneration and concentration of the developer solution; to sum up, TMAH PDRS developer solution regeneration and concentration management system use the filtration adsorption technique, can not have the safety risk, and the electron level chemicals grade of retrieving is higher, is worth popularizing and applying.

[ description of the drawings ]

Fig. 1 is a first schematic block diagram of the present invention;

FIG. 2 is a second schematic block diagram of the present invention;

in the figure: 1. a transfer pump A2, a transfer pump B3, a circulation pump A4, a circulation pump B5, a PR pump A6, a PR pump B7, a supply pump A8, a supply pump B9, a supply pump C10, a dilution pump B11, a dilution pump C12, a dilution pump a 13, a supply pump D14, a supply pump E15, a supply pump F16, a recovery tank a 17, a recovery tank B18, a waste photoresist tank 19, a concentration adjustment tank a 20, a concentration adjustment tank B21, a backwash tank 22, a supply tank 23, a dilution tank a 24, a dilution tank B25, a waste liquid pump 26, a filter one 27, a nanofiltration adsorption system 28, a concentration meter one 29, a concentration meter two 30, a filter two 31, a concentration meter three 32, a concentration meter four 33, a concentration meter five 34, a filter three 35, a TAMH2.38% mixing valve box 36, a TMAH25% supply valve box 37, a TAMH2.38% supply valve box 101, conduit one 102, conduit two 103, conduit three 104, conduit four 105, conduit five 106, conduit six 107, conduit seven 108, conduit eight 201, conduit nine 202, conduit ten 203, conduit eleven 204, conduit twelve 205, conduit thirteen 206, conduit fourteen 207, conduit fifteen 208, conduit sixteen 209, conduit seventeen 210, conduit eighteen 211, conduit nineteen 212, conduit twenty 213, conduit twenty-one 301, conduit twenty-two 302, conduit twenty-three 303, conduit twenty-four 304, conduit twenty-five 305, conduit twenty-six 306, conduit twenty-seven 307, conduit twenty-eight 308, conduit twenty-nine 309, conduit thirty 310, conduit thirty-one 311, conduit thirty-two 312, conduit thirty-three 401, conduit thirty-four 402, thirty-five conduits 403, thirty-six conduits 404, thirty-seven conduits 405, thirty-eight conduits 406, thirty-nine conduits 407, forty-408 conduits forty-409, forty-two conduits 410, forty-three conduits 411, forty-four conduits 412, forty-five conduits.

[ detailed description of the invention ]

As shown in attached drawings 1 and 2, the utility model relates to a TFT LCD/AMOLED TMAH PDRS developer solution regeneration and concentration management system technical field, specifically speaking is a novel TMAH PDRS developer solution regeneration and concentration management system, this system includes TMAH2.38% recovery barrel groove A16 (i.e. Receive TANK A), TMAH2.38% recovery barrel groove B17 (i.e. Receive TANK B), delivery pump A, delivery pump B, backwash barrel groove 21 (i.e. CIP TANK), circulating pump A, circulating pump B, waste liquid pump; a waste photoresist barrel TANK 18 (PR TANK), a PR pump A and a PR pump B; a TMAH2.38% concentration adjustment TANK a19 (i.e., service TANK a), a TMAH2.38% concentration adjustment TANK B20 (i.e., service TANK B), a supply pump a, a supply pump B, and a supply pump C; TMAH25% TANK, a dilution pump A, a dilution pump B and a dilution pump C; TMAH2.38% dilution TANK a23 (i.e., mixing TANK a), TMAH2.38% dilution TANK B24 (i.e., mixing TANK B), supply pump D, supply pump E, supply pump F; the concentration detection system is DCS-1, the concentration detection system is DCS-2, the concentration detection system is DCS-3, the concentration detection system is DCS-4 and the concentration detection system is DCS-5.

Wherein, the liquid inlets at the top parts of the recovery barrel tank A16 and the recovery barrel tank B17 are respectively connected with the processing equipment through a first pipeline 101 and a second pipeline 102, and are connected with a nanofiltration adsorption system 27 (NF cabin) through a third pipeline 103, a fourth pipeline 104, a fifth pipeline 105 and a sixth pipeline 106, and the nanofiltration adsorption system 27 is a system for filtering through a Nanofiltration (NF) membrane; the bottoms of the recovery barrel tank A16 and the recovery barrel tank B17 are connected with the inlets of a delivery pump A1 and a delivery pump B2 through a pipeline 107, and the outlets of the delivery pump A1 and the delivery pump B2 are connected with the inlet of a nanofiltration adsorption system 27 through a pipeline eight 108 so as to enter the nanofiltration adsorption system 27 for treatment; the liquid inlets at the tops of the concentration adjusting barrel TANK A19 and the concentration adjusting barrel TANK B20 are respectively connected with a nanofiltration adsorption system 27 through a pipeline nine 201 and a pipeline ten 202, and are connected with a TMAH25% TANK supply barrel TANK 22 through a pipeline eleven 203 and a pipeline twelve 204; the outlets at the bottoms of the concentration adjusting barrel tank a19 and the concentration adjusting barrel tank B20 are connected with the inlets of the supply pump A7, the supply pump B8 and the supply pump C9 through a thirteen 205 and a fourteen 206 pipeline, and the outlets of the supply pump A7, the supply pump B8 and the supply pump C9 are connected with a TAMH2.38% mixing valve box 35 (i.e., a Service VMB) through a fifteen 207 pipeline and a sixteen 208 pipeline; the TAMH2.38% mixing valve box 35 respectively enters a concentration detection system DCS-1, a concentration detection system DCS-2, a concentration detection system TriDCS-3, a concentration detection system TetraDCS-4 and a concentration detection system Penta DCS-5 through a pipeline seventeen 209, a pipeline eighteen 210, a pipeline nineteen 211, a pipeline twenty 212 and a pipeline twenty-one 213 to carry out concentration detection and enter the process equipment.

The inlet at the top of the TAMH25% TANK Supply TANK 22 is connected with the VMB valve box of the plant chemicals through a pipe twenty-two 301, namely, the VMB valve box of the plant chemicals is connected with the TANK, TMAH25% is delivered to the Supply TANK 22 from the VMB valve box of the plant chemicals through a pipe twenty-two 301, the outlet at the bottom of the TAMH25% TANK Supply TANK 22 is respectively connected with the inlets of a dilution pump A12, a dilution pump B10 and a dilution pump C11 through a pipe twenty-three 302, outlets of a dilution pump A12, a dilution pump B10 and a dilution pump C11 are respectively connected with a TMAH2.38% Mixing TANK dilution barrel TANK B24, a TMAH2.38% Mixing TANK dilution barrel TANK A23, a TMAH2.38% Service TANK concentration adjustment barrel TANK A19, a TMAH2.38% Service TANK concentration adjustment barrel TANK B20 and a TMAH25% Supply valve box 36 (namely TMAH25% Supply VMB) through pipelines twenty nine 308, thirty 309, thirty eleven 310, thirty twelve 311 and thirty thirteen 312, and are respectively connected with a concentration detection system unified DCS-1, a concentration detection system twenty-2, a concentration detection system thirty-3, a concentration detection system quadruple DCS-4 and a concentration detection system quintuplet DCS-5 to carry out concentration detection and enter manufacturing equipment through pipelines twenty four 303, twenty five 304, twenty six 305, twenty seven 306 and twenty eight 307.

Other liquid inlets at the tops of the Mixing TANK dilution barrel TANK A23 and the Mixing TANK dilution barrel TANK B24 are respectively connected with a DIW pipeline thirty-four 401 and a DIW pipeline thirty-five 402, liquid outlets at the bottoms of the Mixing TANK dilution barrel TANK A23 and the Mixing TANK dilution barrel B24 are respectively connected with inlets of a Supply pump D13, a Supply pump E14 and a Supply pump F15 through pipelines thirty-six 403 and thirty-seventeen 404, outlets of the Supply pump D13, the Supply pump E14 and the Supply pump F15 are respectively connected with a Supply valve box 37 (i.e. a Supply VMB) of TAMH2.38% through a pipeline thirty-eight 405 and a pipeline thirty-nine 406, and the pipeline thirty-nine DCS 411 enters a concentration detection system unified-1, a concentration detection system two-2, a concentration detection system three DCS-3, a concentration detection system four-4 and a concentration detection system five-5 through a pipeline forty 407, and a DCS 2.38% DCS VMB enters a concentration detection system to perform a manufacturing process detection; the outlets of the supply pumps D13, E14, F15 enter the NF Flush through the pipe forty-five 412.

The conveying pump A1, the conveying pump B2, the supply pump A7, the supply pump B8, the supply pump C9, the supply pump D13, the supply pump E14, the supply pump F15, the dilution pump A12, the dilution pump B10 and the dilution pump C11 are respectively connected with a PLC control unit through lines.

DIW pure water respectively enters a dilution barrel groove A23 and a dilution barrel groove B24 through a pipeline thirty-four 401 and a pipeline thirty-five 402, the dilution barrel groove A23 and the dilution barrel groove B24 are respectively connected with a concentration meter four 32 and a concentration meter five 33, and concentration is circularly measured through the concentration meter four 32 and the concentration meter five 33; the concentration adjusting barrel tank A19, the concentration adjusting barrel tank B20 and the supply barrel tank 22 are respectively connected with a first concentration meter 28, a second concentration meter 29 and a third concentration meter 31, the concentrations are measured through the first concentration meter 28, the second concentration meter 29 and the third concentration meter 31, the first concentration meter 28 and the second concentration meter 29 are respectively connected with a second filter 30, and the liquid outlet end of the second filter 30 is connected to a TAMH2.38% mixing valve box 35; outlets of the conveying pump A1 and the conveying pump B2 are connected with a first filter 26, a circulation port of the first filter 26 is connected with a circulation pump A3 and a circulation pump B4, an outlet of the first filter 26 is connected with a liquid inlet at the top of the waste photoresist barrel tank 18 through a waste liquid pump 25, and a liquid outlet at the bottom of the waste photoresist barrel tank 18 is respectively connected with a PR pump A5 and a PR pump B6; leakage detectors are arranged at the bottoms of the recovery barrel tank A16, the recovery barrel tank B17, the waste photoresist barrel tank 18, the concentration adjusting barrel tank A19, the concentration adjusting barrel tank B20, the supply barrel tank 22, the dilution barrel tank A23 and the dilution barrel tank B24, an SCADA monitoring system can be installed, the functions of continuously monitoring the operation state, data monitoring, historical recording and the like of the system can be continuously monitored, and all the systems can run for 24 hours in a full-automatic mode.

The invention will be further described with reference to the following specific examples:

in a first aspect: the TMAH25% supply system receives 25% TMAH stock solution supplied by a CCSS plant Service end, supplies the TMAH stock solution to a TMAH2.38% dilution Tank (Mixing Tank), and supplies the waste solution discharged by the process development process equipment to the process development process equipment Tank through a concentration adjustment Tank (Service Tank) after NF filtration.

In the first case, 25% TMAH is delivered from the service chemical VMB valve box to 25% Supply TANK via conduit twenty-two 301. When the liquid level of TMAH2.38% TANK A and TMAH2.38% TANK B is lower than L, TMAH25% passes through a pipeline twenty-three 302, a dilution pump A (12) (9) or a dilution pump B (10) or a dilution pump C (11), a pipeline twenty-four 303 and a pipeline twenty-five 304 from TMAH25% Supply TANK, and DIW pure water passes through a pipeline thirty-four 401 and a pipeline thirty-five 402 and respectively enters MAH2.38% TANK A and TMAH2.38% TANK for dilution, and the circulation measurement is carried out through a concentration meter 4# and a concentration meter 5 #. When the manufacturing equipment sends an acid requiring signal to the TMAH2.38% Dilution & Supply Unit through the PLC control Unit after the measurement is qualified, TMAH2.38% passes through the TMAH2.38% Mixing TANK through a pipeline thirty-six 403 or a pipeline thirty-seven 404, a Supply pump D (13) or a Supply pump E (14) or a Supply pump F (15), a filter 3# (34), a pipeline thirty-eight (405), a pipeline thirty-nine (406), TMAH2.38% Supply VMB, a pipeline forty (407), a pipeline forty-four (408), a pipeline forty-two (409), a pipeline forty-three (410), and a pipeline forty-four (411) respectively enter DCS-1, DCS-2, DCS-3, DCS-4 and DCS-5 concentration management systems to be adjusted and then enter the manufacturing development equipment. Enters CIP TANK through another pipeline forty-five (412), and the NF carries out Flush on the NF when in need.

In the second case: when TMAH2.38% Service TANK A (19) and TMAH2.38% Service TANK B (20) send fluid replacement signals through the PLC control Unit, TMAH25% passes through the TMAH25% Supply TANK through the pipeline twenty-three 302, the dilution pump A (12) (9) or the dilution pump B (10) or the dilution pump C (11), the pipeline twenty-six 305 and the pipeline twenty-seven 306, respectively enters the TMAH2.38% Service TANK A (19) and the TMAH2.38% Service TANK B (20), cycle measurement is carried out, after the measurement is qualified, when the manufacturing equipment sends an acidity signal to the TMAH2.38% Service Supply Unit through the PLC control Unit, the TMAH2.38% is sent to the manufacturing development equipment through the TMAH2.38% Service TANK through the pipeline thirteen 205 or fourteen 206, the Supply pump A (7) or the Supply pump B (8) or the Supply pump C (9), the filter 2# (30), the pipeline fifteen (207), the pipeline sixteen (208), the TMAH2.38% Service VMB, the pipeline seventeen (209), the pipeline eighteen (210), the pipeline nineteen (211), the pipeline twenty (212), and the pipeline twenty-one (213) respectively enter the DCS-1, the DCS-2, the DCS-3, the DCS-4 and the DCS-5 concentration management systems to be adjusted.

In the third situation, when the process equipment is controlled by a PLC to send an acidity signal to TMAH25% Supply Unit, TMAH25% Supply TANK passes through a pipeline twenty-three 302, a dilution pump A (12) (9) or a dilution pump B (10) or a dilution pump C (11), a pipeline twenty-eight (307), TMAH25% Supply VMB, a pipeline twenty-nine (308), a pipeline thirty-one (309), a pipeline thirty-one (310), a pipeline thirty-two (311), and a pipeline thirty-three (312) respectively enters DCS-1, DCS-2, DCS-3, DCS-4, DCS-5 concentration management system to be adjusted, and then enters the process development equipment.

In a second aspect: and the TMAH2.38% recovery system is used for discharging the waste liquid discharged by the process development process equipment to a DRS TMAH2.38% waste liquid collecting tank, conveying the waste liquid to a concentration adjusting tank after the on-line treatment of NF, and directly supplying the waste liquid to the process development process equipment for reuse after the concentration adjustment is finished.

In a third aspect: TMAH2.38% supply system, wherein TMAH25% stock solution is diluted by water and then supplied to a cleaning tank of the process developing solution process equipment through DCS;

in the fourth aspect, the DCS concentration detection system management content: temperature, TMAH concentration, PR concentration, CO3 concentration. Wherein, the concentration of TMAH 2.38%: 2.38% ± 0.005%; the concentration of CO 3: less than or equal to 1Abs +/-50 ppm; PR concentration: less than or equal to 1Abs plus or minus 0.01Abs; temperature: 23 ℃ plus or minus 0.5 ℃.

To sum up, the utility model provides a novel TMAH PDRS developing solution regeneration and concentration management system, which mainly receives 25% TMAH stock solution supplied by CCSS plant Service end and supplies the TMAH stock solution to TMAH2.38% dilution Tank (Mixing Tank), concentration adjustment Tank (Service Tank) after NF filtering waste liquid discharged by process development process equipment, and supplies the waste liquid to the process development process equipment Tank through DCS; and discharging the waste liquid discharged by the process development process equipment to a DRS TMAH2.38% waste liquid collecting tank, carrying out NF on-line treatment, conveying the treated waste liquid to a concentration adjusting tank, and directly supplying the treated waste liquid to the process development process equipment for reuse after the concentration adjustment is finished. The system recycles 2.38% of TMAH developer solution by NF photoresist liquid removal, resin adsorption desorption, purification and other technologies, and can meet the requirements of panel factory products on developer solution regeneration and concentration.

The present invention is not limited by the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be equivalent replacement modes, and are all included in the protection scope of the present invention.

Claims (9)

1. The utility model provides a novel TMAH developer solution regeneration and concentration management system, includes retrieves vat groove A (16), retrieves vat groove B (17), concentration adjustment vat groove A (19) and concentration adjustment vat groove B (20), its characterized in that: liquid inlets at the tops of the recovery barrel tank A (16) and the recovery barrel tank B (17) are respectively connected with process equipment through a first pipeline (101) and a second pipeline (102), and are connected with a nanofiltration adsorption system (27) through a third pipeline (103), a fourth pipeline (104), a fifth pipeline (105) and a sixth pipeline (106), the bottoms of the recovery barrel tank A (16) and the recovery barrel tank B (17) are connected with inlets of a conveying pump A (1) and a conveying pump B (2) through a pipeline (107), and outlets of the conveying pump A (1) and the conveying pump B (2) are connected to an inlet of the nanofiltration adsorption system (27) through an eighth pipeline (108); the concentration adjusting barrel tank A (19) and the concentration adjusting barrel tank B (20) are respectively connected with a nanofiltration adsorption system (27) through a pipeline nine (201) and a pipeline ten (202) and are connected with a supply barrel tank (22) through a pipeline eleven (203) and a pipeline twelve (204), liquid outlets at the bottoms of the concentration adjusting barrel tank A (19) and the concentration adjusting barrel tank B (20) are connected with inlets of a supply pump A (7), a supply pump B (8) and a supply pump C (9) through a pipeline thirteen (205) and a pipeline fourteen (206), and outlets of the supply pump A (7), the supply pump B (8) and the supply pump C (9) are connected with a TAMH2.38% mixing valve box (35) through a pipeline fifteen (207) and a pipeline sixteen (208).

2. The system for regeneration and concentration management of TMAH developer according to claim 1, wherein: the TAMH2.38% mixing valve box (35) is respectively connected with a concentration detection system I, a concentration detection system II, a concentration detection system III, a concentration detection system IV and a concentration detection system V through a pipeline seventeen (209), a pipeline eighteen (210), a pipeline nineteen (211), a pipeline twenty (212) and a pipeline twenty-one (213) to carry out concentration detection and enter the processing equipment.

3. The system for regeneration and concentration management of TMAH developer according to claim 1, wherein: the system comprises a supply barrel groove (22), a dilution pump A (12), a dilution pump B (10) and a dilution pump C (11) inlet, wherein a liquid inlet at the top of the supply barrel groove (22) is connected with a VMB valve box of the plant chemicals through a pipeline twenty-two (301), 25% of the TMAH is conveyed to the supply barrel groove (22) from the VMB valve box of the plant chemicals through a pipeline twenty-two (301), a liquid outlet at the bottom of the supply barrel groove (22) is connected with a dilution pump A (12), a dilution pump B (10) and a dilution pump C (11) inlet through a pipeline twenty-three (302), a pipeline twenty-five (304), a pipeline twenty-six (305), a pipeline twenty-seven (306) and a pipeline twenty-eight (307) are connected with a dilution barrel groove B (24), a dilution barrel groove A (23), a concentration adjustment barrel groove A (19), a concentration adjustment barrel groove B (20) and a TMAH25% supply valve box (36), and the 25% of the TMAH supply valve box (36) enters a concentration detection system, a concentration detection system and a detection system.

4. The system for regeneration and concentration management of TMAH developer according to claim 3, wherein: other liquid inlets at the tops of the dilution barrel tank A (23) and the dilution barrel tank B (24) are respectively connected with a DIW pipeline thirty-four (401) and a DIW pipeline thirty-five (402), liquid outlets at the bottoms of the dilution barrel tank A (23) and the dilution barrel tank B (24) are respectively connected with inlets of a supply pump D (13), a supply pump E (14) and a supply pump F (15) through a pipeline thirty-six (403) and a pipeline thirty-seven (404), outlets of the supply pump D (13), the supply pump E (14) and the supply pump F (15) are respectively connected with a TAMH2.38% supply valve box (37) through a pipeline thirty-eight (405) and a pipeline thirty-nine (406) through a filter three (34), and the TAMH2.38% supply valve box (37) is respectively connected with a concentration detection system unification, a concentration detection system two, a concentration detection system three, a concentration detection system four and a concentration detection system five concentration detection system enter the equipment through a concentration detection system.

5. The system for regeneration and concentration management of TMAH developer according to claim 4, wherein: the conveying pump A (1), the conveying pump B (2), the supply pump A (7), the supply pump B (8), the supply pump C (9), the supply pump D (13), the supply pump E (14), the supply pump F (15), the dilution pump A (12), the dilution pump B (10) and the dilution pump C (11) are respectively connected with the PLC control unit through lines.

6. The system for regeneration and concentration management of TMAH developer according to claim 4, wherein: DIW pure water respectively enters a dilution barrel groove A (23) and a dilution barrel groove B (24) through a thirty-four pipeline (401) and a thirty-five pipeline (402), the dilution barrel groove A (23) and the dilution barrel groove B (24) are respectively connected with a concentration meter four (32) and a concentration meter five (33), and concentration is circularly measured through the concentration meter four (32) and the concentration meter five (33).

7. The system for regeneration and concentration management of TMAH developer according to claim 4, wherein: the concentration adjusting barrel tank A (19), the concentration adjusting barrel tank B (20) and the supply barrel tank (22) are respectively connected with a first concentration meter (28), a second concentration meter (29) and a third concentration meter (31), the concentration is measured through the first concentration meter (28), the second concentration meter (29) and the third concentration meter (31), the first concentration meter (28) and the second concentration meter (29) are respectively connected with a second filter (30), and the liquid outlet end of the second filter (30) is connected to a TAMH2.38% mixing valve box (35).

8. The system of claim 4, wherein: the outlet of the conveying pump A (1) and the outlet of the conveying pump B (2) are connected with a first filter (26), the first filter (26) is connected with a circulating pump A (3) and a circulating pump B (4) through a circulating port, the outlet of the first filter (26) is connected with a liquid inlet at the top of a waste photoresist barrel tank (18) through a waste liquid pump (25), and a liquid outlet at the bottom of the waste photoresist barrel tank (18) is respectively connected with a PR pump A (5) and a PR pump B (6).

9. The system of claim 8, wherein: leakage detectors are arranged at the bottoms of the recovery barrel groove A (16), the recovery barrel groove B (17), the waste photoresist barrel groove (18), the concentration adjusting barrel groove A (19), the concentration adjusting barrel groove B (20), the supply barrel groove (22), the dilution barrel groove A (23) and the dilution barrel groove B (24).

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