CN202246314U - Water treatment system for polycrystalline silicon production - Google Patents
Water treatment system for polycrystalline silicon production Download PDFInfo
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- CN202246314U CN202246314U CN2011203411483U CN201120341148U CN202246314U CN 202246314 U CN202246314 U CN 202246314U CN 2011203411483 U CN2011203411483 U CN 2011203411483U CN 201120341148 U CN201120341148 U CN 201120341148U CN 202246314 U CN202246314 U CN 202246314U
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- water
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- reverse osmosis
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- polysilicon
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Abstract
The utility model provides a water treatment system for polycrystalline silicon production. The water treatment system for polycrystalline silicon production comprises a raw water pretreatment device, a security filter, a reverse osmosis device, an EDI (electrodeionization) device, an ultraviolet sterilization device, a precise filter and a CDI (continuous electrodeionization) device which are successively communicated. By using the water treatment system for polycrystalline silicon production, and carbon dioxide, residual trace ions, bacteria and the like in raw water can be effectively removed through the raw water pretreatment device, the reverse osmosis device, the ultraviolet sterilization device, the precise filter, the EDI device and the like which are sequentially communicated, so as to obtain water meeting the polycrystalline silicon production, wherein the effluent rate is high, and impurities are less. The water treatment system for polycrystalline silicon production is simple to operate and stable to run and is environmentally-friendly, and concentrated water can be refluxed and utilized, thereby improving the water utilization rate, saving water resources and reducing the production cost of the water for the polycrystalline silicon production.
Description
Technical field
The utility model belongs to water purification treatment technology field, concrete relates to a kind of production of polysilicon water processing system.
Background technology
In the production process of polysilicon (as the early stage production; Section; Clean) need a large amount of water, and the requirement of institute's water is wanted, but existing production of polysilicon water contains detrimental impurity such as a spot of foreign organic matter, salt ion; Have a strong impact on production of polysilicon efficient, reduced output and quality.For example, the residual chlorine ion can have a strong impact on the polysilicon speed of response in the existing production of polysilicon water, and its production efficiency is reduced.
In addition, in the treating processes of existing production of polysilicon water, the dense water that relevant device is produced directly discharges, and so not only causes the harm to environment, and has wasted water resources, has increased the production cost of polysilicon.
The utility model content
The utility model technical problem to be solved is to overcome the defective of prior art, provides a kind of simple to operate, stable, and the ultrapure water impurity after the processing is few, the production of polysilicon water processing system that water use efficiency is high.
In order to realize above-mentioned utility model purpose, the technical scheme of the utility model is following:
A kind of production of polysilicon water processing system comprises the former water pre-treatment means, security personnel's strainer, reverse osmosis unit, EDI device, ultraviolet sterilization apparatus, accurate filter and the CDI device that are communicated with successively.
Preferably; Above-mentioned reverse osmosis unit comprises one-level HPP, first-stage reverse osmosis device, first-stage reverse osmosis water tank, secondary HPP, two-pass reverse osmosis device and the two-pass reverse osmosis water tank that is communicated with successively; Said one-level HPP is communicated with said security personnel's strainer, and said two-pass reverse osmosis water tank is communicated with said EDI device.
Further preferably, the dense water out of above-mentioned EDI device is communicated with the water inlet of first-stage reverse osmosis water tank.
Further preferably, the dense water out of above-mentioned CDI device is communicated with the water inlet of first-stage reverse osmosis water tank.
Further preferably, the water outlet of above-mentioned one-level HPP and/or secondary HPP also is provided with the electronic valve of opening slowly.
Further preferably, above-mentioned production of polysilicon water processing system also comprises raw water box and the raw water pump that is communicated with successively, and said raw water pump is communicated with said former water pre-treatment means.
Further preferably, the dense water out of above-mentioned two-pass reverse osmosis device is communicated with the water inlet of said raw water box.
Further preferably, above-mentioned production of polysilicon water processing system also comprises first interchanger, and said first interchanger is communicated with between said former water pre-treatment means and security personnel's strainer.
Particularly, above-mentioned former water pre-treatment means comprises more medium filter, the charcoal filter that is communicated with successively, and said charcoal filter is communicated with said first interchanger, and said more medium filter is communicated with said raw water pump.
Preferably, above-mentioned production of polysilicon water processing system comprises that also second interchanger, the TOC that are communicated with successively remove device, polishing mixes bed and ultimate filter.
Above-mentioned production of polysilicon water processing system is communicated with through former water pre-treatment means, reverse osmosis unit, ultraviolet sterilization apparatus, accurate filter, EDI device etc. successively; Effectively remove the carbonic acid gas in the former water, remaining micro ion, bacterium etc.; Acquisition meets the production of polysilicon water; Water rate is high, and impurity is few.This production of polysilicon water processing system is simple to operate, stable, and the concentrate recirculation utilization has improved water use efficiency, has practiced thrift water resources, and environmental protection has reduced the production cost of production of polysilicon water.
Description of drawings
Fig. 1 is a kind of preferred structure synoptic diagram of the utility model embodiment production of polysilicon water processing system;
Fig. 2 is the another kind of preferred structure synoptic diagram of the utility model embodiment production of polysilicon water processing system.
Embodiment
Clearer for technical problem, technical scheme and beneficial effect that the utility model will be solved, below in conjunction with embodiment, the utility model is further elaborated.Should be appreciated that specific embodiment described herein only in order to explanation the utility model, and be not used in qualification the utility model.
It is a kind of simple to operate, stable that the utility model embodiment provides, and the ultrapure water impurity after the processing is few, the production of polysilicon water processing system that water use efficiency is high.Like Fig. 1, shown in Figure 2, this production of polysilicon water processing system comprises former water pre-treatment means 3, security personnel's strainer 5, reverse osmosis unit 6, EDI device 7, ultraviolet sterilization apparatus 8, accurate filter 9 and the CDI device 10 that is communicated with successively.Like this; This production of polysilicon water processing system is communicated with through devices such as former water pre-treatment means 3, security personnel's strainer 5, reverse osmosis unit 6, EDI device 7, ultraviolet sterilization apparatus 8, accurate filters 9 successively; Effectively remove the carbonic acid gas in the former water, remaining micro ion, bacterium etc.; Acquisition meets the production of polysilicon water, and water rate is high, and impurity is few.This production of polysilicon water processing system is simple to operate, stable, the concentrate recirculation utilization, and water use efficiency is high, has practiced thrift water resources, and environmental protection has reduced the production cost of production of polysilicon water.Wherein, former water pre-treatment means 3 can preliminaryly be removed suspended substance, granule foreign and the colourity that is contained in the former water, and has guaranteed the security of security personnel's strainers 5; 5 pairs of further purifying treatment of former water of security personnel's strainer through rough handling, the security and the working efficiency of assurance reverse osmosis unit 6 guarantee the steady running of system; Reverse osmosis unit 3 can be dissolved in salt in the former water by effective elimination; Ultraviolet sterilization apparatus 8 effectively kills and removes the impurity such as mikrobe in the former water; EDI device 7 can effectively be removed former water intermediate ion after reverse osmosis unit 3 is handled with CDI device 10, and the resulting ultrapure water after CDI device 10 is handled can directly be introduced in the production of polysilicon workshop and produce utilization.
Preferably; As shown in Figure 1; As an embodiment of the utility model, above-mentioned reverse osmosis unit 6 comprises one-level HPP 61, first-stage reverse osmosis device 62, first-stage reverse osmosis water tank 63, secondary HPP 64, two-pass reverse osmosis device 65 and the two-pass reverse osmosis water tank 66 that is communicated with successively.Wherein, One-level HPP 61 is communicated with security personnel's strainer 5; Two-pass reverse osmosis water tank 66 is communicated with EDI device 7; The dense water out of EDI device 7 and CDI device 10 is communicated with the water inlet of first-stage reverse osmosis water tank 62 respectively, handles the ultrapure water that is produced through CDI device 10 and delivers to the production of polysilicon workshop through first ultrapure water tank 11, the first ultrapure water pump 12 that the water outlet with CDI device 10 is communicated with successively, and is as shown in Figure 1.This reverse osmosis unit 6 adopts the two-pass reverse osmosis system, can effectively remove salinity in the former water after security personnel's strainer 5 is handled.The dense water that first-stage reverse osmosis device 62 is produced can be introduced dense water storage pool or dense water tank, be used for former water pre-treatment means 3 backwash, afforest, flush the toilet or the like.The dense water that two-pass reverse osmosis device 65 is produced is preferably introduced the utilization that refluxes in the former water pre-treatment means 3, to improve the utilization ratio of this production of polysilicon water processing system to former water, has practiced thrift water resources, environmental protection.One-level HPP 61 is respectively first-stage reverse osmosis device 62 with secondary HPP 64, two-pass reverse osmosis device 65 provides required r-o-hydraulic pressure, improves reverse osmosis efficiency.Water level in first-stage reverse osmosis water tank 63 and the effective regulating tank of two-pass reverse osmosis water tank 66 abilities, the works better of assurance one-level HPP 61 and secondary HPP 64.
Further preferably, as shown in Figure 1 in above-mentioned preferred embodiment, the dense water out of EDI device 7 and CDI device 10 is communicated with the water inlet of first-stage reverse osmosis water tank 63 respectively.Like this; The concentrate recirculation that produces through EDI device 7 and CDI device 10, and through the desalination of devices such as two-pass reverse osmosis device 65, EDI device 7, deionized processing is able to recycle; Improved the utilization ratio of this production of polysilicon water processing system to former water; Practiced thrift water resources, environmental protection has reduced the production cost of production of polysilicon water.Certainly, also can be communicated with the water inlet of first-stage reverse osmosis water tank 63 respectively according to the dense water out of practical condition with the arbitrary device in EDI device 7 and the CDI device 10.
Further preferably; In above-mentioned preferred embodiment; As shown in Figure 1, above-mentioned production of polysilicon water processing system also comprises raw water box 1, raw water pump 2 and first interchanger 4 that is communicated with successively, and former water pre-treatment means 3 comprises more medium filter 31, the charcoal filter 32 that is communicated with successively.Wherein, raw water pump 2 is communicated with more medium filter 31 in the former water pre-treatment means 3, and charcoal filter 32 is communicated with first interchanger 4, security personnel's strainer 5 successively.This raw water pump 2 provides required hydraulic pressure for former water pre-treatment means 3.At this moment; Mix with former water in the concentrate recirculation that two-pass reverse osmosis device 65 in the above-mentioned preferred embodiment is produced to this raw water box 1; Send in the former water pre-treatment means 3 through raw water pump 2 again and carry out purifying treatment again, thereby further improved the utilization ratio of this production of polysilicon water processing system water.The former water of these more medium filter 31 ability rough purifications is removed the suspended substance that contains, granule foreign in the former water; Charcoal filter 32 can further adsorb and filter the impurity in the former water, makes the former water after charcoal filter 32 filters satisfy the water quality requirement of security personnel's strainer 5 fully, reduces the load of security personnel's strainer 5, guarantees the working efficiency of security personnel's strainer 5.This first interchanger 4 can be controlled at the temperature of waste water certain scope, the producing water ratio (the particularly lower situation of ambient air temperature) of help ensuring public security strainer 5 and reverse osmosis unit 3.Former water after charcoal filter 32 filters filters through security personnel's strainer 5, to the further purifying treatment of water, guarantees the security and the working efficiency of reverse osmosis unit 6.
Further preferably, as shown in Figure 1 in above-mentioned preferred embodiment, the water outlet of one-level HPP 61 and/or secondary HPP 64 also is provided with the electronic valve (not shown) of opening slowly.This electronic valve of opening slowly can reduce the impact of HPP startup back to reverse osmosis membrane in first-stage reverse osmosis device 62 and the two-pass reverse osmosis device 65 effectively; Minimizing is to the damage of reverse osmosis membrane; Prolong the work-ing life of this reverse osmosis unit 6, satisfied the needs of different times simultaneously.
Preferably; As shown in Figure 2; As another embodiment of the utility model, above-mentioned production of polysilicon water processing system comprises also that successively second interchanger 15, the TOC that are communicated with remove device 16, polishing mixes bed 17 and ultimate filter 18 except the whole devices that contain a last embodiment.This second interchanger 15 can be controlled at certain scope through the temperature that CDI device 10 is handled the ultrapure water of gained, helps the producing water ratio that TOC removes device 16 and the mixed bed 17 of polishing.TOC removes device 16, polishing mixes bed 17 and ultimate filter 18 further purifies ultrapure water; Improve ultrapure water water quality; Satisfying in the polysilicon production process demand, can directly cause the production of polysilicon workshop through the ultrapure water of ultimate filter 18 filtration treatment to the higher operation of water quality requirement.In addition; In the present embodiment; Also can between CDI device 10 and second interchanger 15, be communicated with second ultrapure water tank 13, the second ultrapure water pump 14 successively, this second ultrapure water pump 14 is that second interchanger 15, TOC remove device 16, polishing mixes bed 17 and ultimate filter 18 provides required hydraulic pressure.In order further to improve this super pure water, can also the water outlet of ultimate filter 18 be communicated with the water inlet of the second ultrapure water tank 13, make the ultrapure water further purifying treatment that refluxes.In addition; In the above-described embodiments; Can offer the water exit of ultrapure water at the water outlet place of the water outlet place of CDI device 10 and ultimate filter 18 simultaneously; Wherein, in the water exit of offering ultrapure water at the water outlet place of CDI device 10 successively with first ultrapure water tank 11, the first ultrapure water pump 12, as shown in Figure 2.
In above-mentioned each embodiment, the production of polysilicon water processing system preferably also is furnished with the robot control system(RCS) (not shown), and this robot control system(RCS) comprises Long-distance Control and control setting on the spot; A whole set of robot control system(RCS) is through the control of IPC remote centralized; Consider the security of system operation simultaneously, Long-distance Control is provided with priority control with control on the spot, and control has precedence over Long-distance Control on the spot; System's setting is transfinited and fault alarm; Can not meet the demands or equipment can be reported to the police when breaking down automatically in a certain parameter of system, notify the Purified Water Station maintenance personnel in time equipment to be carried out repair and maintenance, equipment is put into operation with this; Data for system's operation are carried out record completely, for the maintenance of equipment later on provides strong foundation.
In above-mentioned each embodiment; The pattern that the cleaning of devices such as first-stage reverse osmosis device 62 in EDI device 7, ultraviolet sterilization apparatus 8, the reverse osmosis unit 6 and two-pass reverse osmosis device 65 all preferably adopts segmentation to clean; Avoid the secondary pollution in the cleaning process, and do not influenced water production rate basically.The reverse osmosis unit 6 preferred independent fast jet water pump patterns of flushing automatically that adopt; Not only in operational process, can carry out effectively low pressure and mass flow surface washing automatically, and before system starts, the film group carried out automatic vent the film group; Reduce the damage of film; When out of service, system is carried out dense water metathetical operator scheme in system automatically, the product water of first-stage reverse osmosis device 62 and two-pass reverse osmosis device 65 has all been installed effective rupture disk (not shown); Adopt dual overvoltage protection simultaneously; Applying pressure detects and the supporting hypertonia of SV (not shown), the device of automatically unloading, prevent since the film that mishandle causes damage (since can go here and there can and requirement cause).All adopt the corresponding pattern of single group at reverse osmosis unit 6 and relevant auxiliary facility thereof, HPP, reverse osmosis membrane group and correlator list configuration set are complete, are convenient to system's control, oneself's supervision and test.
In above-mentioned each embodiment; Raw water pump 2, the first ultrapure water pump 11 and second ultrapure water pump 14 preferred GRUNDFOS and the LOWARA brand water pumps of adopting; One-level HPP 61 and the secondary HPP 64 preferred multistage water pumps of vertical stainless steel that adopt; First-stage reverse osmosis device 62 is selected U.S. Hydranautics PROC10 and CPA3-LD reverse osmosis membrane for use with the reverse osmosis membrane in the two-pass reverse osmosis device 65; EDI device 7 is preferably selected the IONPURE brand of U.S.'s import for use, and ultrapure water equipment component UV185, UV254 select the best U.S. import Aquafine brand in the world for use.The manufacturing mode that the 5 preferred employings of security personnel's strainer are opened soon; In design and manufacturing processed, adopt the pattern of fast-assembling; Making it can be more convenient, faster more renew cartridge, saved the replacing time in addition; All preferably be provided with nitrogen seal device in the above-mentioned first ultrapure water tank 11 and the second ultrapure water tank 13, air-isolation pollutes effectively.Adopt pipe connection between each device; The pipeline that connects each device is preferably chosen according to the pressurized difference flexibly; Mix the clean-pvc tubing that the pipeline that is communicated with each device between the bed 17 preferably adopts the ultrapure water system like EDI device 7 to polishing; The pipeline that is communicated with reverse osmosis unit 6 preferably adopts stainless steel pipe, and the classification of pipeline material is employed in to be satisfied under the situation that process system requires, and has taken into account economy, the reasonableness of production of polysilicon water processing system; Reduce this production of polysilicon water processing system cost, practiced thrift investment.
The above is merely the preferred embodiment of the utility model; Not in order to restriction the utility model; Any modification of being done within all spirit and principles at the utility model, be equal to replacement and improvement etc., all should be included within the protection domain of the utility model.
Claims (10)
1. a production of polysilicon water processing system comprises the former water pre-treatment means, security personnel's strainer, reverse osmosis unit, EDI device, ultraviolet sterilization apparatus, accurate filter and the CDI device that are communicated with successively.
2. production of polysilicon water processing system as claimed in claim 1; It is characterized in that; Said reverse osmosis unit comprises one-level HPP, first-stage reverse osmosis device, first-stage reverse osmosis water tank, secondary HPP, two-pass reverse osmosis device and the two-pass reverse osmosis water tank that is communicated with successively; Said one-level HPP is communicated with said security personnel's strainer, and said two-pass reverse osmosis water tank is communicated with said EDI device.
3. production of polysilicon water processing system as claimed in claim 2 is characterized in that, the dense water out of said EDI device is communicated with the water inlet of first-stage reverse osmosis water tank.
4. production of polysilicon water processing system as claimed in claim 2 is characterized in that, the dense water out of said CDI device is communicated with the water inlet of first-stage reverse osmosis water tank.
5. production of polysilicon water processing system as claimed in claim 2 is characterized in that, the water outlet of said one-level HPP and/or secondary HPP also is provided with the electronic valve of opening slowly.
6. production of polysilicon water processing system as claimed in claim 2 is characterized in that, also comprises the raw water box and the raw water pump that are communicated with successively, and said raw water pump is communicated with said former water pre-treatment means.
7. production of polysilicon water processing system as claimed in claim 6 is characterized in that, the dense water out of said two-pass reverse osmosis device is communicated with the water inlet of said raw water box.
8. production of polysilicon water processing system as claimed in claim 6 is characterized in that, also comprises first interchanger, and said first interchanger is communicated with between said former water pre-treatment means and security personnel's strainer.
9. production of polysilicon water processing system as claimed in claim 8; It is characterized in that; Said former water pre-treatment means comprises more medium filter, the charcoal filter that is communicated with successively; Said charcoal filter is communicated with said first interchanger, and said more medium filter is communicated with said raw water pump.
10. production of polysilicon water processing system as claimed in claim 1 is characterized in that, comprises that also second interchanger, the TOC that are communicated with successively remove device, polishing mixes bed and ultimate filter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203411483U CN202246314U (en) | 2011-09-13 | 2011-09-13 | Water treatment system for polycrystalline silicon production |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011203411483U CN202246314U (en) | 2011-09-13 | 2011-09-13 | Water treatment system for polycrystalline silicon production |
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| Publication Number | Publication Date |
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| CN202246314U true CN202246314U (en) | 2012-05-30 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN2011203411483U Expired - Fee Related CN202246314U (en) | 2011-09-13 | 2011-09-13 | Water treatment system for polycrystalline silicon production |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103408152A (en) * | 2013-07-24 | 2013-11-27 | 天津开发区实力技术工程有限公司 | Multistage purification system of high purity water |
| CN104843914A (en) * | 2014-02-14 | 2015-08-19 | 上海康雷分析仪器有限公司 | Large-capacity integrated pure water supply system for laboratory |
| CN106277510A (en) * | 2015-05-28 | 2017-01-04 | 内蒙古盾安光伏科技有限公司 | Sewage treatment process and system |
| WO2018069674A1 (en) * | 2016-10-13 | 2018-04-19 | VWS (UK) Limited | Method and apparatus for providing ultrapure water |
-
2011
- 2011-09-13 CN CN2011203411483U patent/CN202246314U/en not_active Expired - Fee Related
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103408152A (en) * | 2013-07-24 | 2013-11-27 | 天津开发区实力技术工程有限公司 | Multistage purification system of high purity water |
| CN104843914A (en) * | 2014-02-14 | 2015-08-19 | 上海康雷分析仪器有限公司 | Large-capacity integrated pure water supply system for laboratory |
| CN104843914B (en) * | 2014-02-14 | 2017-02-15 | 上海康雷分析仪器有限公司 | Large-capacity integrated pure water supply system for laboratory |
| CN106277510A (en) * | 2015-05-28 | 2017-01-04 | 内蒙古盾安光伏科技有限公司 | Sewage treatment process and system |
| CN106277510B (en) * | 2015-05-28 | 2019-04-05 | 内蒙古盾安光伏科技有限公司 | Sewage treatment process and system |
| WO2018069674A1 (en) * | 2016-10-13 | 2018-04-19 | VWS (UK) Limited | Method and apparatus for providing ultrapure water |
| US10961144B2 (en) | 2016-10-13 | 2021-03-30 | Vws (Uk) Ltd. | Method and apparatus for providing ultrapure water |
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Legal Events
| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C56 | Change in the name or address of the patentee |
Owner name: SHENZHEN HEADWATER ENVIRONMENTAL TECHNOLOGIES CO., Free format text: FORMER NAME: SHENZHEN HEADWATER WATER TECHNOLOGIES CO., LTD. |
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| CP03 | Change of name, title or address |
Address after: 518000 Guangdong, Shenzhen, Henggang, Longgang street, Po Po Road, 30-1 building, No. A Patentee after: SHENZHEN HEADWATER ENVIRONMENTAL TECHNOLOGIES CO., LTD. Address before: 518000 Hengtong Industrial Park, A building, 30-1 Jin Pu Road, Shenzhen street, Bei Bei community, Henggang street, Longgang District, Guangdong, China Patentee before: Shenzhen Headwater Water Technologies Co., Ltd. |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120530 Termination date: 20190913 |
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| CF01 | Termination of patent right due to non-payment of annual fee |