CN217797656U - Cleaning equipment before quartz wafer processing - Google Patents
Cleaning equipment before quartz wafer processing Download PDFInfo
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- CN217797656U CN217797656U CN202221758825.6U CN202221758825U CN217797656U CN 217797656 U CN217797656 U CN 217797656U CN 202221758825 U CN202221758825 U CN 202221758825U CN 217797656 U CN217797656 U CN 217797656U
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Abstract
The utility model relates to a quartz wafer processing technology field just discloses a cleaning equipment before quartz wafer processing, including belt cleaning device, its characterized in that: the inside of belt cleaning device is equipped with drying device, drying device includes the motor, the output fixedly connected with bracing piece of motor, the outer fixed surface of bracing piece is connected with the baffle, the lower extreme middle part fixedly connected with heating plate of baffle, the below of baffle is equipped with the expansion plate, the inside of expansion plate is equipped with electric telescopic handle. This cleaning equipment before quartz wafer processing is used for driving the bracing piece rotatory through being provided with the motor, and the bracing piece is used for supporting and drives the baffle and rotate, through being provided with baffle and expansion plate, reduces heating space, reaches quick drying's effect, and electric telescopic handle is used for driving the expansion plate flexible, reaches quick drying's effect.
Description
Technical Field
The utility model relates to a quartz wafer processing technology field specifically is a cleaning equipment before quartz wafer processing.
Background
According to the quartz wafer cleaning equipment before processing disclosed in the Chinese patent publication No. CN214078090U, the cleaning equipment with higher cleaning efficiency is provided, water after washing is filtered and recovered by arranging the water return mechanism, and the quartz wafer is washed again through the water passing pipeline, so that the effect of higher cleaning efficiency is achieved. When the quartz crystal wafer washing machine is used daily, the quartz crystal wafer is washed, an operator is required to carry the quartz crystal wafer to be placed into the dryer to dry the quartz crystal wafer, and time and labor are wasted.
Therefore, the quartz wafer cleaning device before processing is provided to achieve the effect of integrating washing and drying.
SUMMERY OF THE UTILITY MODEL
Technical problem to be solved
The utility model provides a not enough to prior art, the utility model provides a cleaning equipment before quartz wafer processing possesses the advantage of wasing the integration of drying, has solved the problem of carrying the extravagant manpower after the washing that mentions among the above-mentioned background art.
(II) technical scheme
In order to achieve the above object, the utility model provides a following technical scheme: a cleaning device before quartz wafer processing comprises a cleaning device, wherein a drying device is arranged inside the cleaning device;
through being provided with belt cleaning device, wash quartz wafer, simultaneously, to water resource reuse, avoid extravagant, through being provided with drying device, be convenient for dry quartz wafer after washing, need not carry, use manpower sparingly, reach the effect of washing stoving integration.
The cleaning device comprises a box body, a water tank is fixedly connected to the upper end of the box body, a water inlet pipe is fixedly communicated with the lower end of the water tank, a spray head is fixedly communicated with the lower end of the water inlet pipe, a support is fixedly connected to the middle of the box body, a placing disc is arranged at the upper end of the support, a collecting box is fixedly connected to the bottom end inside the box body, a water pump is arranged at the bottom end of the collecting box, a guide pipe is fixedly connected to the right end of the water pump, and the other end of the guide pipe is fixedly communicated with the upper end of the water tank;
the box plays spacing effect, the water tank is used for storing water resource, the inlet tube is used for connecting the shower nozzle, make things convenient for transmission water, the shower nozzle is used for spraying to quartz wafer and washes, the support plays the supporting role to placing the dish, it plays to place quartz wafer and filterable effect to place the dish, collect the box and be used for collecting the water after washing, water pump and pipe are convenient for will make used again to be defeated into the water tank in, reach reuse, the effect of water economy resource.
Drying device includes the motor, the output fixedly connected with bracing piece of motor, the outer fixed surface of bracing piece is connected with the baffle, the lower extreme middle part fixedly connected with heating plate of baffle, the below of baffle is equipped with the expansion plate, the inside of expansion plate is equipped with electric telescopic handle.
The motor is used for driving the bracing piece rotatory, and the bracing piece is used for supporting and drives the baffle and rotate, through being provided with baffle and expansion plate, reduces heating space, reaches rapid draing's effect, and electric telescopic handle is used for driving the expansion plate flexible, reaches rapid draing's effect.
Preferably, the front end of the box body is hinged with a cabinet door, and the outer surface of the cabinet door is fixedly connected with a sealing ring.
The cabinet door is convenient for take quartz crystal piece, and the sealing washer that the surface of cabinet door set up is used for sealed between cabinet door and the box, avoids the water that washes to ooze.
Preferably, the water inlet pipe penetrates through the box body and extends to the inside of the box body, and the outer surface of the lower end of the water inlet pipe is fixedly connected with the electromagnetic valve.
The electromagnetic valve is used for controlling the water flow conveyed by the water inlet pipe.
Preferably, the placing plate comprises a ferrule, a bump is fixedly connected to the outer surface of the upper end of the ferrule, a first filter screen is fixedly connected to the lower end of the ferrule, a bottom plate is connected to the lower end of the ferrule in a threaded manner, a second filter screen is fixedly connected to the bottom end of the bottom plate, and the bump is located on the upper surface of the support.
The lasso plays spacing effect, and the lug is located the upper end of support, plays the effect of support, and filter screen one is used for filtering the powder on quartz chip surface, and bottom plate and lasso threaded connection conveniently dismantle, and the second filter screen is used for filtering the water after washing, through double-deck filtration, reaches the effect of rinsing clean quartz chip and recycle water.
Preferably, the guide pipe penetrates through the box body and extends to the outer end of the guide pipe, and the upper end of the water tank is provided with a water inlet.
The pipe is used for carrying the water after filtering, and the water inlet that the water tank upper end set up conveniently carries out the moisturizing to the water tank.
Preferably, the rear end of motor and box fixed connection, the axostylus axostyle of motor runs through the box and extends to the inside of box, the both ends of bracing piece all are connected with the box rotation.
Preferably, the right end and the box fixed connection of expansion plate, electric telescopic handle's one end and box fixed connection, electric telescopic handle's the other end and the inside left side wall fixed connection of expansion plate.
The expansion of the expansion plate is controlled through the electric expansion rod.
Compared with the prior art, the utility model provides a cleaning equipment before quartz wafer processing possesses following beneficial effect:
1. this cleaning equipment before quartz wafer processing is used for driving the bracing piece rotatory through being provided with the motor, and the bracing piece is used for supporting and drives the baffle and rotate, through being provided with baffle and expansion plate, reduces heating space, reaches quick drying's effect, and electric telescopic handle is used for driving the expansion plate flexible, reaches quick drying's effect.
2. This cleaning equipment before quartz wafer processing, play spacing effect through being provided with the box, the water tank is used for storing water resource, the inlet tube is used for connecting the shower nozzle, make things convenient for transmission water, the shower nozzle is used for spraying quartz wafer and washes, the support plays the supporting role to placing the dish, it plays to place quartz wafer and filterable effect to place the dish, it is used for collecting the water after washing to collect the box, water pump and pipe are convenient for will make used again can be defeated into the water tank in, reach reuse, the effect of water resource is saved.
Drawings
FIG. 1 is a perspective view of the present invention;
FIG. 2 is a schematic sectional view of the structure of the present invention;
FIG. 3 is a schematic sectional view of the structure placing tray of the present invention;
fig. 4 is a schematic sectional view of the structure expansion plate of the present invention.
Wherein: 1. a cleaning device; 101. a box body; 102. a water tank; 103. a water inlet pipe; 104. a spray head; 105. an electromagnetic valve; 106. a support; 107. placing a tray; 1070. a ferrule; 1071. a bump; 1072. a first filter screen; 1073. a base plate; 1074. a second filter screen; 108. a collection box; 109. a water pump; 110. a conduit; 111. a cabinet door; 2. a drying device; 201. a motor; 202. a support bar; 203. a baffle plate; 204. a heating plate; 205. a retractable plate; 206. an electric telescopic rod.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
Referring to fig. 1-4, a cleaning apparatus for quartz wafer before processing includes a cleaning device 1, a drying device 2 is disposed inside the cleaning device 1;
through the technical scheme, through being provided with belt cleaning device 1, wash quartz wafer, simultaneously, to water resource reuse, avoid extravagant, through being provided with drying device 2, be convenient for dry quartz wafer after washing, need not carry, use manpower sparingly, reach the effect of washing stoving integration.
The cleaning device 1 comprises a box body 101, a water tank 102 is fixedly connected to the upper end of the box body 101, a water inlet pipe 103 is fixedly communicated with the lower end of the water tank 102, a spray head 104 is fixedly communicated with the lower end of the water inlet pipe 103, a support 106 is fixedly connected to the middle of the box body 101, a placing disc 107 is arranged at the upper end of the support 106, a collecting box 108 is fixedly connected to the bottom end inside the box body 101, a water pump 109 is arranged at the bottom end of the collecting box 108, a guide pipe 110 is fixedly connected to the right end of the water pump 109, and the other end of the guide pipe 110 is fixedly communicated with the upper end of the water tank 102;
through above-mentioned technical scheme, box 101 plays spacing effect, water tank 102 is used for storing the water resource, inlet tube 103 is used for connecting shower nozzle 104, convenient transmission water, shower nozzle 104 is used for spraying quartz wafer and washes, support 106 plays the supporting role to placing set 107, place set 107 and play and place quartz wafer and filterable effect, it is used for collecting the water after washing to collect box 108, water pump 109 and pipe 110 are convenient for will make used again to be defeated into water tank 102 in, reach reuse, the effect of water economy resource.
The front end of the box body 101 is hinged with a cabinet door 111, and the outer surface of the cabinet door 111 is fixedly connected with a sealing ring. The cabinet door 111 is convenient for taking the quartz crystal wafers, and the sealing ring arranged on the outer surface of the cabinet door 111 is used for sealing between the cabinet door 111 and the box body 101, so that the leakage of flushing water is avoided.
The water inlet pipe 103 penetrates the box body 101 and extends into the box body 101, and the outer surface of the lower end of the water inlet pipe 103 is fixedly connected with the electromagnetic valve 105. The solenoid valve 105 is used to control the water flow delivered by the water inlet pipe 103.
The placing plate 107 comprises a ferrule 1070, a bump 1071 is fixedly connected to the outer surface of the upper end of the ferrule 1070, a first filter screen 1072 is fixedly connected to the lower end of the ferrule 1070, a bottom plate 1073 is threadedly connected to the lower end of the ferrule 1070, a second filter screen 1074 is fixedly connected to the bottom end of the bottom plate 1073, and the bump 1071 is located on the upper surface of the support 106. The ring 1070 plays a role in limiting, the bump 1071 is positioned at the upper end of the support 106 and plays a role in supporting, the first filter screen 1072 is used for filtering powder on the surface of the quartz wafer, the bottom plate 1073 is in threaded connection with the ring 1070 and is convenient to detach, the second filter screen 1074 is used for filtering water after flushing, and the effects of flushing the quartz wafer and recycling the water are achieved through double-layer filtering.
The conduit 110 penetrates the tank body 101 and extends to the outer end of the conduit 110, and the upper end of the water tank 102 is provided with a water inlet. The conduit 110 is used for conveying filtered water, and a water inlet arranged at the upper end of the water tank 102 is convenient for replenishing the water tank 102.
The rear end of motor 201 and box 101 fixed connection, the axostylus axostyle of motor 201 runs through box 101 and extends to the inside of box 101, and the both ends of bracing piece 202 all are connected with box 101 rotation.
The right end and the box 101 fixed connection of expansion plate 205, the one end and the box 101 fixed connection of electric telescopic handle 206, the other end and the inside left side wall fixed connection of expansion plate 205 of electric telescopic handle 206.
The telescopic plate 205 is controlled to extend and retract by an electric telescopic rod 206.
When the quartz crystal cleaning device is used, a quartz crystal wafer is placed on the first filter screen 1072, the placing disc 107 is placed on the support 106, the quartz crystal wafer is supported through the bump 1071, the cabinet door 111 is closed, the electromagnetic valve 105 is opened, water in the water tank 102 enters the spray head 104 through the water inlet pipe 103 to spray the quartz crystal wafer, powder on the surface of the quartz crystal wafer is filtered through the first filter screen 1072, washed water is filtered through the second filter screen 1074, the filtered clean water falls into the collecting box 108, the water pump 109 is started, and the water in the collecting box 108 enters the water tank 102 again through the guide pipe 110;
after the washing is finished, the motor 201 is started, the motor 201 drives the supporting rod 202 and the baffle 203 to rotate, the heating sheet 204 and the electric telescopic rod 206 are started, and the electric telescopic rod 206 drives the expansion plate 205 to extend, so that the expansion plate 205 and the baffle 203 form a smaller heating space, and the rapid drying is facilitated.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. A quartz wafer cleaning equipment before processing comprises a cleaning device (1), and is characterized in that: a drying device (2) is arranged in the cleaning device (1);
the cleaning device (1) comprises a box body (101), a water tank (102) is fixedly connected to the upper end of the box body (101), a water inlet pipe (103) is fixedly communicated with the lower end of the water tank (102), a spray head (104) is fixedly communicated with the lower end of the water inlet pipe (103), a support (106) is fixedly connected to the middle of the box body (101), a placing disc (107) is arranged at the upper end of the support (106), a collecting box (108) is fixedly connected to the bottom end inside the box body (101), a water pump (109) is arranged at the bottom end of the collecting box (108), a guide pipe (110) is fixedly connected to the right end of the water pump (109), and the other end of the guide pipe (110) is fixedly communicated with the upper end of the water tank (102);
drying device (2) include motor (201), output fixedly connected with bracing piece (202) of motor (201), the outer fixed surface of bracing piece (202) is connected with baffle (203), the lower extreme middle part fixedly connected with heating plate (204) of baffle (203), the below of baffle (203) is equipped with expansion plate (205), the inside of expansion plate (205) is equipped with electric telescopic handle (206).
2. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the front end of the box body (101) is hinged with a cabinet door (111), and a sealing ring is fixedly connected to the outer surface of the cabinet door (111).
3. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the water inlet pipe (103) penetrates through the box body (101) and extends to the inside of the box body (101), and the outer surface of the lower end of the water inlet pipe (103) is fixedly connected with the electromagnetic valve (105).
4. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the placing plate (107) comprises a ferrule (1070), a bump (1071) is fixedly connected to the outer surface of the upper end of the ferrule (1070), a first filter screen (1072) is fixedly connected to the lower end of the ferrule (1070), a bottom plate (1073) is in threaded connection with the lower end of the ferrule (1070), a second filter screen (1074) is fixedly connected to the bottom end of the bottom plate (1073), and the bump (1071) is located on the upper surface of the support (106).
5. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the guide pipe (110) penetrates through the box body (101) and extends to the outer end of the guide pipe (110), and a water inlet is formed in the upper end of the water tank (102).
6. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the rear end of the motor (201) is fixedly connected with the box body (101), a shaft rod of the motor (201) penetrates through the box body (101) and extends into the box body (101), and two ends of the supporting rod (202) are rotatably connected with the box body (101).
7. A quartz wafer pre-process cleaning apparatus as set forth in claim 1 wherein: the right-hand member and box (101) fixed connection of expansion plate (205), the one end and box (101) fixed connection of electric telescopic handle (206), the other end and the inside left side wall fixed connection of expansion plate (205) of electric telescopic handle (206).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221758825.6U CN217797656U (en) | 2022-07-10 | 2022-07-10 | Cleaning equipment before quartz wafer processing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221758825.6U CN217797656U (en) | 2022-07-10 | 2022-07-10 | Cleaning equipment before quartz wafer processing |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217797656U true CN217797656U (en) | 2022-11-15 |
Family
ID=83963334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221758825.6U Active CN217797656U (en) | 2022-07-10 | 2022-07-10 | Cleaning equipment before quartz wafer processing |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217797656U (en) |
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2022
- 2022-07-10 CN CN202221758825.6U patent/CN217797656U/en active Active
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