CN217733250U - Integrative coating equipment of plane cathode target pump - Google Patents
Integrative coating equipment of plane cathode target pump Download PDFInfo
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- CN217733250U CN217733250U CN202221209985.5U CN202221209985U CN217733250U CN 217733250 U CN217733250 U CN 217733250U CN 202221209985 U CN202221209985 U CN 202221209985U CN 217733250 U CN217733250 U CN 217733250U
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Abstract
The utility model discloses an integrative coating equipment of plane negative pole target pump, include: a vacuum chamber; the cathode target pump integrated device is arranged at the top of the vacuum chamber and is provided with a cathode target mounting part, a vacuum mechanism and a cooling mechanism; and the cathode target is arranged on the cathode target installation part and is positioned in the vacuum chamber. The utility model discloses be in the same place vacuum mechanism, cooling body are integrated, and the negative pole target installation department is also integrated together simultaneously, is about to the structure integration of two traditional apron together, corresponding also only need set up an apron can, optimized the structural component, the width of vacuum chamber can reduce, and then the volume of evacuation can reduce, can reduce the energy consumption to help reducing the quantity setting of molecular pump, reduction in production cost.
Description
Technical Field
The utility model relates to the technical field of vacuum coating, in particular to an integrative coating equipment of plane cathode target pump.
Background
Vacuum magnetron sputtering coating is particularly suitable for reactive deposition coating, and the magnetron sputtering process has the main advantages that reactive or non-reactive coating processes can be used for depositing film layers of the materials, and the composition, the thickness, the uniformity, the mechanical properties and the like of the film layers can be well controlled. Referring to fig. 6, the vacuum magnetron sputtering coating apparatus is provided with a vacuum chamber 100, a planar cathode body, a molecular pump, a cooling pipeline, a planar cathode cover plate 101 and a molecular pump cover plate 102 are arranged at the upper end of the vacuum chamber 100, the planar cathode cover plate 101 and the molecular pump cover plate 102 are distributed at the top of the vacuum chamber 100 side by side, the planar cathode body contains a target material and is suspended below the planar cathode cover plate 101 for completing a coating process, the molecular pump and the cooling pipeline are covered by the molecular pump cover plate 102, the molecular pump is used for maintaining the vacuum degree of the vacuum chamber, and the cooling pipeline is used for cooling and cooling. The conventional structure arrangement results in large equipment size and large whole occupied area, and the vacuum chamber 100 needs to simultaneously meet the installation of the planar cathode cover plate 101 and the molecular pump cover plate 102, so the whole volume is large and the energy consumption for vacuum pumping is high.
SUMMERY OF THE UTILITY MODEL
The utility model discloses aim at solving one of the technical problem that exists among the prior art at least. Therefore, the utility model provides an integrative coating equipment of plane negative pole target pump has less equipment size, and area obtains optimizing.
According to the utility model discloses integrative coating equipment of plane negative pole target pump, include:
a vacuum chamber;
the cathode target and pump integrated device is arranged at the top of the vacuum chamber and is provided with a cathode target installation part, a vacuum mechanism and a cooling mechanism, the cathode target installation part is positioned at the bottom of the cathode target and pump integrated device, the vacuum mechanism is used for vacuumizing the vacuum chamber, and the cooling mechanism is used for dissipating heat of the cathode target;
and the cathode target is arranged on the cathode target installation part and is positioned in the vacuum chamber.
According to the utility model discloses integrative filming equipment of plane negative pole target pump has following beneficial effect at least:
adopt above-mentioned structure to set up the utility model discloses, with vacuum mechanism, cooling body integration together, the negative pole target installation department is also integrated together simultaneously, is about to the structure integration of two traditional apron together, corresponding also only need set up an apron can, optimized the structural component, the width of vacuum chamber can reduce, and then the volume of evacuation can reduce, can reduce the energy consumption to help reducing the quantity setting of molecular pump, reduction in production cost.
According to some embodiments of the invention, the cathode target pump integrated device is provided with a cathode cover plate, the vacuum mechanism and at least a part of the cooling mechanism are both located in an area covered by the cathode cover plate.
According to some embodiments of the utility model, the bottom of negative pole apron is provided with the downward invasion the guard plate of vacuum chamber, the negative pole target installation department is including setting up the mounting hole that hangs of guard plate lower extreme position, the negative pole target passes through hang the hoist and mount of mounting hole and be in the guard plate lower extreme.
According to some embodiments of the utility model, the negative pole apron is formed with first cavity, the guard plate be formed with the isolated second cavity of first cavity, the extraction opening has been seted up to the lateral wall of second cavity, vacuum mechanism is including installing molecular pump in the first cavity, molecular pump's induction port intercommunication the second cavity, cooling body is including setting up circulating line in the second cavity.
According to some embodiments of the utility model, vacuum mechanism follows the length direction of vacuum chamber is provided with many the molecular pump, simultaneously vacuum mechanism is in be provided with the vacuum in the first chamber and be responsible for, the vacuum is responsible for and connects each the vacuum branch pipe of molecular pump gas vent.
According to some embodiments of the utility model, first cavity is provided with the polylith reinforcing plate along length direction, the length direction of reinforcing plate with the width direction of first cavity is unanimous and is connected two lateral walls and the roof of first cavity, simultaneously the reinforcing plate upwards extends to the top of negative pole apron forms the lug, the reinforcing plate be provided with the pipeline installation structure of vacuum person in charge adaptation is used for the installation the vacuum person in charge.
According to some embodiments of the utility model, the bottom of negative pole apron is provided with the bottom plate, in order to pass through the bottom plate cooperation forms first cavity with the second cavity, the outside level extension in week of bottom plate is formed with the round cushion cap, the top of vacuum chamber seted up with the cathode target installing port of guard plate adaptation, the top of guard plate with be provided with the inclined plane of mutually supporting between the lateral wall of cathode target installing port.
According to some embodiments of the utility model, the cathode target is plane cathode target and the laminating setting is in the lower terminal surface of guard plate, the circulating line laminating the bottom of guard plate sets up, the level of extraction opening is higher than the circulating line.
According to the utility model discloses a some embodiments, cooling body is provided with a laminating the heat-conducting plate of the bottom of guard plate, the heat-conducting plate is followed many water courses have been seted up to the length direction and the width direction of vacuum chamber, and pass through the water course forms that crosses circulating line, the up end of heat-conducting plate is provided with heat conduction fin.
According to some embodiments of the utility model, the upper end of heat-conducting plate is provided with the connection the quick-operation joint of water course.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The invention will be further described with reference to the following drawings and examples, in which:
fig. 1 is a schematic view of a shaft-side structure of the present invention;
FIG. 2 is a schematic view of a guard plate;
FIG. 3 is a schematic view of the position and size of the cathode cover plate and the guard plate;
FIG. 4 is a schematic view of an internal structure of the cathode cover plate;
fig. 5 is a schematic view of an overall structure of the present invention;
fig. 6 is a schematic diagram of a conventional structure.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the drawings are exemplary only for the purpose of explaining the present invention, and should not be construed as limiting the present invention.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper and lower directions, is the orientation or positional relationship shown on the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and therefore should not be construed as limiting the present invention.
In the description of the present invention, a plurality means two or more. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless there is an explicit limitation, the words such as setting, installation, connection, etc. should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above words in combination with the specific contents of the technical solution.
The utility model relates to an integrative coating equipment of plane negative pole target pump of embodiment, include:
a vacuum chamber;
the cathode target pump integrated device is arranged at the top of the vacuum chamber and is provided with a cathode target installation part, a vacuum mechanism and a cooling mechanism, the cathode target installation part is positioned at the bottom of the cathode target pump integrated device, the vacuum mechanism is used for vacuumizing the vacuum chamber, and the cooling mechanism is used for radiating the cathode target;
and the cathode target is arranged on the cathode target installation part and is positioned in the vacuum chamber.
Adopt above-mentioned structure to set up the utility model discloses, with vacuum mechanism, cooling body integration together, the negative pole target installation department is also integrated together simultaneously, is about to the structure integration of two traditional apron together, corresponding also only need set up an apron can, optimized the structural component, the width of vacuum chamber can reduce, and then the volume of evacuation can reduce, can reduce the energy consumption to help reducing the quantity setting of molecular pump 206, reduction in production cost.
Referring to fig. 1 to 5, it can be understood that the cathode target pump integrated apparatus is provided with only a cathode cover plate 200, and the vacuum mechanism and at least a part of the cooling mechanism are located in the area covered by the cathode cover plate 200. Compared with the two conventional cover plates, the vacuum mechanism and the cooling mechanism are integrated in the cathode cover plate 200 in the present embodiment, so that the requirement for the installation space of the vacuum chamber can be reduced, for example, the requirement for the top width of the vacuum chamber can be reduced, and therefore, the volume of the vacuum chamber can be reduced, and the energy consumption for vacuum pumping is further reduced. Meanwhile, the production and assembly efficiency of the planar cathode target pump integrated coating equipment can be improved.
Referring to fig. 1 to 5, it can be understood that the bottom of the cathode cap plate 200 is provided with a protection plate 300 intruding downward into the vacuum chamber, and the cathode target mounting part includes a hanging mounting hole 302 provided at a lower end position of the protection plate 300, and the cathode target is hung at the lower end of the protection plate 300 through the hanging mounting hole 302. The present embodiment intrudes into the vacuum chamber through the protection plate 300, which facilitates the installation of the cathode target, so that the cathode target is suspended in the vacuum chamber.
Based on the arrangement of the protection plate 300, referring to fig. 5, it can be understood that the cathode cover plate 200 is formed with a first cavity, the protection plate 300 is formed with a second cavity isolated from the first cavity, the side wall of the second cavity is provided with the pumping hole 301, the vacuum mechanism includes the molecular pump 206 installed in the first cavity, the air suction port of the molecular pump 206 is communicated with the second cavity, and the cooling mechanism includes a circulation pipeline arranged in the second cavity. The second chamber formed by the shield plate 300 in this embodiment is an intrusion vacuum chamber, so that a plurality of pumping ports 301 can be opened, and the molecular pump 206 pumps vacuum to the vacuum chamber through the pumping ports 301. Meanwhile, the circulating pipeline can be arranged by utilizing the shielding and protecting effect of the protection plate 300, and the cooling of the cathode target and the protection of the circulating pipeline are both considered.
Referring to fig. 5, it can be understood that the vacuum mechanism is provided with a plurality of molecular pumps 206 along the length direction of the vacuum chamber, while the vacuum mechanism is provided with a main vacuum pipe 204 along the length direction of the vacuum chamber within the first chamber, the main vacuum pipe 204 connecting the vacuum branch pipes 205 of the exhaust ports of each of the molecular pumps 206. One end of the main vacuum pipe 204 extends outside the first chamber for evacuation. Each molecular pump 206 is connected through a vacuum branch pipe 205 and then discharged through a vacuum main pipe 204, which is beneficial to optimizing the structural layout. The size of the vacuum branch pipe 205 is matched with the size of an exhaust port of the molecular pump 206 and is vertically arranged between the molecular pump 206 and the vacuum main pipe 204, the vacuum main pipe 204 extends horizontally, and the pipe diameter of the vacuum main pipe 204 is larger than that of the vacuum branch pipe 205, so that the exhaust efficiency is ensured.
Because the apron structure is generally made a whole and hoists to install the top of vacuum chamber, the utility model discloses in with two traditional apron structures set together, weight must increase, in view of this, refer to fig. 4 and 5, it can be understood that, first cavity is provided with polylith reinforcing plate 203 along length direction, the length direction of reinforcing plate 203 is unanimous with the width direction of first cavity and is connected two lateral walls and the roof of first cavity, reinforcing plate 203 upwards extends to the top of cathode cover 200 and forms lug 201 simultaneously, reinforcing plate 203 is provided with the pipeline installation structure who is responsible for 204 adaptation with the vacuum for install vacuum and be responsible for 204. The setting of reinforcing plate 203 is passed through to this embodiment, can improve the overall structure intensity of cathode cover plate 200, and the intensity of reinforcing lug 201 can effectively avoid hoist and mount process cathode cover plate 200 to take place to warp simultaneously. The main vacuum pipe 204 is attached to the reinforcing plate 203, and the main vacuum pipe 204 can be fixed to the top of the first chamber, thereby providing a sufficient space for installing the molecular pump 206 and ensuring the stability of the attachment of the main vacuum pipe 204.
Referring to fig. 5, it can be understood that a bottom plate is disposed at the bottom of the cathode cover plate 200 to form a first chamber and a second chamber through the bottom plate, a circle of bearing platform 202 is formed by extending the periphery of the bottom plate outwards and horizontally, a cathode target mounting opening adapted to the protection plate 300 is formed at the top of the vacuum chamber, and mutually matching inclined planes are disposed between the top of the protection plate 300 and the side wall of the cathode target mounting opening. When the device is hoisted, the installation and pre-positioning of the cathode target pump integrated device can be realized by utilizing the inclined plane, and the installation can be finished by connecting and fixing through connecting structures such as bolts between the bearing platform 202 and the vacuum chamber.
Referring to fig. 5, it can be understood that the cathode target is a planar cathode target and is attached to the lower end surface of the protection plate 300, the circulation duct is attached to the bottom of the protection plate 300, and the horizontal height of the pumping hole 301 is higher than that of the circulation duct. The embodiment can ensure the cooling effect of the circulating pipeline on the cathode target material, and can avoid the circulating pipeline from blocking the air suction port 301.
Referring to fig. 5, it can be understood that the cooling mechanism is provided with a heat conducting plate 303 attached to the bottom of the protection plate 300, the heat conducting plate 303 is provided with a plurality of water channels along the length direction and the width direction of the vacuum chamber, and the water channels are joined to form a circulation pipe, and the upper end surface of the heat conducting plate 303 is provided with heat conducting fins. Meanwhile, the upper end of the heat conducting plate 303 is provided with a quick connector connected with a water channel. The bottom of protection plate 300 is laminated through heat-conducting plate 303 to this embodiment, and the negative pole target is plane negative pole target simultaneously, also laminates the bottom of protection plate 300, can effectively dispel the heat to the negative pole target. The arrangement of the heat conduction fins is helpful for ensuring the temperature of the second chamber by using cooling water, and the heat dissipation effect is improved. Meanwhile, the heat dissipation can be assisted by the air flow of the air pumping opening 301 and the molecular pump 206, so that the heat dissipation effect is improved.
It should be noted that the present invention does not make any improvement on other structures of the vacuum chamber or other functional structures of the coating apparatus integrated with the planar cathode target pump, such as the anode arrangement, and such structures can be arranged according to the related art and will not be described herein too much.
The embodiments of the present invention have been described in detail with reference to the drawings, but the present invention is not limited to the above embodiments, and various changes can be made without departing from the spirit of the present invention within the knowledge of those skilled in the art.
Claims (10)
1. Integrative coating equipment of plane cathode target pump which characterized in that includes:
a vacuum chamber;
the cathode target and pump integrated device is arranged at the top of the vacuum chamber and is provided with a cathode target installation part, a vacuum mechanism and a cooling mechanism, the cathode target installation part is positioned at the bottom of the cathode target and pump integrated device, the vacuum mechanism is used for vacuumizing the vacuum chamber, and the cooling mechanism is used for dissipating heat of the cathode target;
and the cathode target is arranged on the cathode target installation part and is positioned in the vacuum chamber.
2. The apparatus according to claim 1, wherein the cathode-target-pump integrated apparatus is provided with a cathode cover plate, and the vacuum mechanism and at least a part of the cooling mechanism are located in an area covered by the cathode cover plate.
3. The apparatus for integrally coating a planar cathode target according to claim 2, wherein a protection plate is disposed at a bottom of the cathode cover plate and downwardly intrudes into the vacuum chamber, the cathode target mounting portion comprises a hanging mounting hole disposed at a lower end of the protection plate, and the cathode target is hung at a lower end of the protection plate through the hanging mounting hole.
4. The apparatus according to claim 3, wherein the cathode cover plate is formed with a first chamber, the protection plate is formed with a second chamber isolated from the first chamber, a suction opening is opened on a sidewall of the second chamber, the vacuum mechanism comprises a molecular pump installed in the first chamber, a suction opening of the molecular pump communicates with the second chamber, and the cooling mechanism comprises a circulation pipe disposed in the second chamber.
5. The apparatus of claim 4, wherein the vacuum mechanism comprises a plurality of molecular pumps along the length of the vacuum chamber, and a main vacuum pipe connected to a vacuum branch pipe of each of the molecular pump exhaust ports is disposed in the first chamber.
6. The apparatus according to claim 5, wherein the first chamber has a plurality of reinforcing plates disposed along a length direction, the reinforcing plates have a length direction corresponding to a width direction of the first chamber and are connected to two sidewalls and a top wall of the first chamber, the reinforcing plates extend upward above the cathode cover plate and form lifting lugs, and the reinforcing plates have a pipe installation structure adapted to the main vacuum pipe for installing the main vacuum pipe.
7. The apparatus according to any one of claims 4 to 6, wherein a bottom plate is disposed at the bottom of the cathode cover plate to form the first chamber and the second chamber by the bottom plate, a circle of bearing platform is formed by the circumferential side of the bottom plate extending horizontally outwards, a cathode target mounting opening adapted to the protection plate is opened at the top of the vacuum chamber, and a mutually matched inclined surface is disposed between the top of the protection plate and the side wall of the cathode target mounting opening.
8. The apparatus according to any one of claims 4 to 6, wherein the cathode target is a planar cathode target and is attached to the lower end surface of the protection plate, the circulation pipe is attached to the bottom of the protection plate, and the horizontal height of the pumping port is higher than that of the circulation pipe.
9. The apparatus according to any one of claims 4 to 6, wherein the cooling mechanism is provided with a heat conducting plate attached to the bottom of the protective plate, the heat conducting plate is provided with a plurality of water passages along the length direction and the width direction of the vacuum chamber, the water passages are intersected to form the circulating pipe, and the upper end surface of the heat conducting plate is provided with heat conducting fins.
10. The apparatus for integrally coating a flat cathode target according to claim 9, wherein a quick coupling for connecting the water passage is provided at an upper end of the heat conductive plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221209985.5U CN217733250U (en) | 2022-05-19 | 2022-05-19 | Integrative coating equipment of plane cathode target pump |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202221209985.5U CN217733250U (en) | 2022-05-19 | 2022-05-19 | Integrative coating equipment of plane cathode target pump |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217733250U true CN217733250U (en) | 2022-11-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202221209985.5U Active CN217733250U (en) | 2022-05-19 | 2022-05-19 | Integrative coating equipment of plane cathode target pump |
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| Country | Link |
|---|---|
| CN (1) | CN217733250U (en) |
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2022
- 2022-05-19 CN CN202221209985.5U patent/CN217733250U/en active Active
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