CN217719538U - Automatic wafer handling system - Google Patents

Abstract

The utility model relates to a wafer transport field, concretely relates to automatic wafer handling system, including the propelling movement arm, support the shovel, push away the mechanism fast and hold the case, support shovel fixed mounting on the propelling movement arm, still include slowly pushing away and rise mechanism and horizontal calibrator, slowly push away and rise mechanism fixed mounting in the bottom of pushing away fast and rise mechanism, be used for upwards promoting the propelling movement arm and then the secondary motion, horizontal calibrator fixed mounting is on holding the case, this automatic wafer handling system, drive through setting up slowly pushing away and rise the mechanism and support the shovel and carry out the secondary and go up and down, need not use lift platform, directly use fixed platform can, avoid taking place the wearing and tearing error, and set up horizontal calibrator through the side that holds the case, the workman can detect the support shovel at any time, when the slope range of supporting the shovel reaches the default, the workman need change it, and horizontal calibrator is when not using, horizontal calibrator can withdraw the side that holds the case, avoid influencing the work of manipulator.

Description

Automatic wafer handling system

Technical Field

The utility model relates to a wafer transport field, concretely relates to automatic wafer handling system.

Background

When carrying the inspection to the wafer, need use the manipulator to carry, nevertheless because the manipulator rises, and carry the wafer on the check out test set after, still need use the lift platform upwards to promote the wafer upwards, make the wafer with support and separate between the shovel, the rethread manipulator withdraws, and go up and down through the platform, under the long-term service behavior, the high wearing and tearing error that can take place of lift, the workman can only change lift platform, the cost is increased, and when supporting the wafer through supporting the shovel, long-term the back of using, it can take place the slope to support the shovel, nevertheless when the range of slope is not obvious, the workman often can neglect to support the shovel and change.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide an automatic wafer handling system.

To achieve the purpose, the utility model adopts the following technical proposal:

the utility model provides an automatic wafer handling system, including the propelling movement arm, support the shovel, push away the mechanism fast and hold the case, support shovel fixed mounting on the propelling movement arm, the propelling movement arm is used for horizontal propelling movement to support the shovel, make and support the shovel and drive the wafer and move, propelling movement arm fixed mounting is in pushing away the mechanism fast, it is used for the level to upwards carry the propelling movement arm to push away the mechanism fast, and push away quick mechanism fixed mounting fast and hold the incasement, still include slowly push away lift mechanism and horizontal calibrator, slowly push away lift mechanism fixed mounting in the bottom of pushing away the mechanism fast, be used for upwards promoting the propelling movement arm and then the secondary motion, horizontal calibrator fixed mounting is on holding the case, a bending for judging whether support shovel takes place.

Further, quick push-up mechanism is including extending the stylobate, draw the lift cylinder, the guide holder, guide pillar and mounting panel, guide holder fixed mounting is at the inboard top that holds the case, guide pillar and guide holder sliding connection, mounting panel fixed mounting is in the bottom of guide pillar, slowly push up mechanism fixed mounting is on the mounting panel, extend stylobate fixed mounting on the delivery end of slowly pushing up the mechanism, make slowly push up the mechanism during operation, can upwards promote and extend the stylobate, draw the lift cylinder fixed mounting at the inner edge top that holds the case, the output and the mounting panel fixed connection that draw the lift cylinder, push arm fixed mounting is on extending the stylobate.

Furthermore, slowly push away and rise the mechanism and be electric putter, slowly push away and rise the mechanism and pass through mount pad fixed mounting on the mounting panel, slowly push away the output and extend pylon fixed connection that rise the mechanism.

Further, horizontal calibrator includes rotating support, fixed plate, commentaries on classics board and shifting board, rotates support fixed mounting on the outer wall that holds the case for supply the shifting board to rotate and retrieve the side that holds the case, fixed plate fixed mounting rotates on rotating the support, changes the one end of board and rotates with the one end of fixed plate to be connected, and shifting board slidable installs on changeing the board.

Further, the bottom of slide plate is provided with the slider, and the slider is inserted and is established in changeing the board, has seted up on changeing the board and has supplied the gliding bar spout of slider, and the bottom of slider is provided with and is used for spacing limiting plate.

Furthermore, the bottom of the rotating plate is provided with a rotating shaft, the rotating shaft is connected with the fixed plate in a rotating mode, the bottom of the rotating plate is further provided with a heightening ring, the heightening ring is sleeved on the rotating shaft, and the heightening ring is located between the rotating plate and the fixed plate.

Further, the rotation support includes the swivel mount, horizontal bull stick and vertical bull stick, swivel mount fixed mounting is on the outer wall that holds the case, the one end and the swivel mount of horizontal bull stick rotate to be connected, the other end rotates with vertical bull stick to be connected, be provided with first limiting plate on the swivel mount, be provided with on the horizontal bull stick with first limiting plate complex first rotate to support the board, can't take place to continue to rotate when making the horizontal bull stick rotate the horizontality, be provided with the second limiting plate on the horizontal bull stick, be provided with on the vertical bull stick and rotate to support the board with second limiting plate complex second, make vertical bull stick can't take place to continue to rotate when rotating the vertical state, fixed plate fixed mounting is at the top that rotates the support.

The utility model has the advantages that: this automatic wafer handling system, drive through setting up slow push-and-lift mechanism and support the shovel and carry out the secondary and go up and down, need not use and use lift platform, directly use fixed platform can, avoid taking place the wearing and tearing error, and set up the horizontal calibrator through the side holding the case, the workman can detect the support shovel at any time, when the slope range that supports the shovel reaches the default, the workman need change it, and the horizontal calibrator is when not using, the horizontal calibrator can withdraw the side that holds the case, avoid influencing the work of manipulator.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings required to be used in the embodiments of the present invention will be briefly described below.

Fig. 1 is a schematic perspective view of the present invention;

FIG. 2 is a schematic view of the three-dimensional structure of the removal container of the present invention;

FIG. 3 is a schematic perspective view of a horizontal calibrator;

FIG. 4 is an exploded view of a portion of the horizontal aligner;

in the figure: 1. a push arm; 2. a supporting shovel; 3. a fast push-up mechanism; 3a, extending a column base; 3b, pulling up the cylinder; 3c, a guide seat; 3d, guide pillars; 3e, mounting a plate; 4. a slow pushing and lifting mechanism; 5. an accommodating box; 6. a horizontal calibrator; 6a, rotating the support; 6a1, transposition; 6a2, a horizontal rotating rod; 6a3, a vertical rotating rod; 6b, a fixing plate; 6c, rotating the plate; 6d, a sliding plate; 6e, a sliding block; 6f, increasing the ring.

Detailed Description

The technical solution of the present invention is further explained by the following embodiments with reference to the accompanying drawings.

Wherein the showings are for the purpose of illustration only and not for the purpose of limiting the same, the same is shown by way of illustration only and not in the form of limitation; for a better understanding of the embodiments of the present invention, some parts of the drawings may be omitted, enlarged or reduced, and do not represent the size of an actual product.

Referring to fig. 1 to 4, the automatic wafer handling system includes a pushing arm 1, a supporting shovel 2, a fast pushing and lifting mechanism 3 and a containing box 5, the supporting shovel 2 is fixedly installed on the pushing arm 1, the pushing arm 1 is used for horizontally pushing and supporting the shovel 2, so that the supporting shovel 2 drives a wafer to move, the pushing arm 1 is fixedly installed on the fast pushing and lifting mechanism 3, the fast pushing and lifting mechanism 3 is used for horizontally and upwards conveying the pushing arm 1, the fast pushing and lifting mechanism 3 is fixedly installed in the containing box 5, the automatic wafer handling system further includes a slow pushing and lifting mechanism 4 and a horizontal calibrator 6, the slow pushing and lifting mechanism 4 is fixedly installed at the bottom of the fast pushing and lifting mechanism 3 and used for upwards pushing the pushing arm 1 to move again, the horizontal calibrator 6 is fixedly installed on the containing box 5 and used for judging whether the supporting shovel 2 bends.

Fast mechanism 3 that promotes is including extending the stylobate 3a, draw and rise cylinder 3b, guide holder 3c, guide pillar 3d and mounting panel 3e, guide holder 3c fixed mounting is at the inboard top that holds case 5, guide pillar 3d and guide holder 3c sliding connection, mounting panel 3e fixed mounting is in the bottom of guide pillar 3d, slowly push away and rise 4 fixed mounting of mechanism on mounting panel 3e, extend stylobate 3a fixed mounting on the transport end that slowly pushes away and rise 4, make slowly push away and rise 4 during operation, can upwards promote and extend stylobate 3a, draw and rise cylinder 3b fixed mounting at the inner edge top that holds case 5, the output and the mounting panel 3e fixed connection that draw and rise cylinder 3b, push arm 1 fixed mounting is on extending stylobate 3 a. The pulling cylinder 3b is controlled to work through the controller, the pulling cylinder 3b upwards pulls the mounting plate 3e, the mounting plate 3e upwards drives the slow pushing and lifting mechanism 4 to move quickly, the slow pushing and lifting mechanism 4 drives the fast pushing and lifting mechanism 3 to move upwards, the slow pushing and lifting mechanism 4 drives the extension column platform 3a to move upwards, the extension column platform 3a drives the pushing arm 1 to move upwards, after the fast pushing and lifting mechanism 3 finishes lifting, the slow pushing and lifting mechanism 4 is controlled to lift through the controller, the support shovel 2 upwards moves again, after the wafer is pushed onto the detection equipment, the slow pushing and lifting mechanism 4 is controlled to descend through the controller, the support shovel 2 is driven to descend through the slow pushing and lifting mechanism 4, and the wafer is placed on the detection equipment.

The slow pushing and lifting mechanism 4 is an electric push rod, the slow pushing and lifting mechanism 4 is fixedly installed on the installation plate 3e through an installation seat, and the output end of the slow pushing and lifting mechanism 4 is fixedly connected with the extension column base 3 a. Slowly push away through controller control and rise mechanism 4 and carry out work, slowly push away and rise mechanism 4 and will slowly upwards promote extension pylon 3a and move, support shovel 2 will rise, otherwise, slowly push away and rise 4 reverse work of mechanism, will make extension pylon 3a descend for support shovel 2 descends, need not set up lift platform on check out test set and support the wafer, only need set up fixed platform can.

The horizontal calibrator 6 comprises a rotating support 6a, a fixed plate 6b, a rotating plate 6c and a sliding plate 6d, wherein the rotating support 6a is fixedly arranged on the outer wall of the accommodating box 5 and used for enabling the sliding plate 6d to rotate and withdraw the side face of the accommodating box 5, the fixed plate 6b is fixedly arranged on the rotating support 6a, one end of the rotating plate 6c is rotatably connected with one end of the fixed plate 6b, and the sliding plate 6d is slidably arranged on the rotating plate 6 c. Through rotating support 6a for fixed plate 6b can rotate into the horizontality, for the detection of slide plate 6d provides the platform, when not detecting, because gravity, horizontal calibrator 6 will hang down in the side that holds case 5, avoids bumping with push arm 1.

The bottom of slide 6d is provided with slider 6e, and slider 6e inserts and establishes in changeing board 6c, has seted up the gliding bar spout that supplies slider 6e on changeing board 6c, and the bottom of slider 6e is provided with and is used for spacing limiting plate. Through setting up slider 6e and limiting plate, make slide 6d can slide on changeing board 6c, carry out the level to supporting shovel 2 and examine time measuring, through promoting slide 6d, make slide 6 d's tip and the outer fringe contact of supporting shovel 2, rethread workman promotes slide 6d, make slide 6d slide and rotate, and this in-process, slide 6 d's tip and the outer fringe that supports shovel 2 keep in contact, if the tip that takes place slide 6d and the outer fringe contactless that supports shovel 2, so just can judge that support shovel 2 has taken place the bending, at this moment, just, need the workman to change supporting shovel 2.

The bottom of commentaries on classics board 6c is provided with the pivot, and the pivot rotates with fixed plate 6b to be connected, and the bottom of commentaries on classics board 6c still is provided with increases ring 6f, increases ring 6f cover and establishes in the pivot, increases ring 6f and is located between commentaries on classics board 6c and fixed plate 6 b. Through setting up increase ring 6f, will make to leave the clearance between commentaries on classics board 6c and the fixed plate 6b, when changeing board 6c and rotating fixed plate 6b top, the limiting plate of slider 6e bottom can not bump with fixed plate 6 b.

Rotating support 6a includes swivel mount 6a1, horizontal bull stick 6a2 and vertical bull stick 6a3, swivel mount 6a1 fixed mounting is on the outer wall that holds case 5, horizontal bull stick 6a 2's one end rotates with swivel mount 6a1 to be connected, the other end rotates with vertical bull stick 6a3 to be connected, be provided with first limiting plate on the swivel mount 6a1, be provided with on the horizontal bull stick 6a2 with first limiting plate complex first rotation support plate, make horizontal bull stick 6a2 can't take place when rotating the horizontality and continue to rotate, be provided with the second limiting plate on the horizontal bull stick 6a2, be provided with on the vertical bull stick 6a3 and rotate support plate with second limiting plate complex second, make vertical bull stick 6a3 can't take place when rotating the vertical state and continue to rotate, fixed plate 6b fixed mounting is at the top that rotates support 6 a. Through workman upwards stimulates vertical bull stick 6a3, make vertical bull stick 6a3 will drive horizontal bull stick 6a2 and move, rethread first limiting plate and the cooperation of first rotation support the board, will make horizontal bull stick 6a2 can't take place when rotating the horizontality and continue to rotate, support the board cooperation through second limiting plate and second rotation, when making vertical bull stick 6a3 rotate into vertical state, vertical bull stick 6a3 can't continue to rotate, when vertical bull stick 6a3 rotates into vertical state, fixed plate 6b will rotate into the level, for the detection of slide 6d provides the platform, otherwise, when the workman loosens vertical bull stick 6a3, because gravity, horizontal bull stick 6a2 and vertical bull stick 6a3 will reset.

Claims (7)

1. Automatic wafer handling system, including propelling movement arm (1), support shovel (2), push away high mechanism (3) fast and hold case (5), support shovel (2) fixed mounting on propelling movement arm (1), propelling movement arm (1) is used for horizontal propelling movement to support shovel (2), make and support shovel (2) drive the wafer and move, propelling movement arm (1) fixed mounting is on pushing away high mechanism (3) fast, it upwards carries propelling movement arm (1) to push away high mechanism (3) fast, and push away high mechanism (3) fixed mounting fast and hold case (5) in, a serial communication port, still include slow pushing away high mechanism (4) and horizontal calibrator (6), slow pushing away high mechanism (4) fixed mounting is in the bottom of pushing away high mechanism (3) fast, be used for upwards pushing away propelling movement arm (1) and then the secondary motion, horizontal calibrator (6) fixed mounting is on holding case (5), be used for judging the bending that supports shovel (2) and whether take place.

2. The automated wafer handling system of claim 1, wherein the fast pushing mechanism (3) comprises an extension pedestal (3 a), a pulling cylinder (3 b), a guide base (3 c), a guide pillar (3 d) and a mounting plate (3 e), the guide base (3 c) is fixedly mounted on the top of the inner side of the accommodating box (5), the guide pillar (3 d) is slidably connected with the guide base (3 c), the mounting plate (3 e) is fixedly mounted on the bottom of the guide pillar (3 d), the slow pushing mechanism (4) is fixedly mounted on the mounting plate (3 e), the extension pedestal (3 a) is fixedly mounted on the conveying end of the slow pushing mechanism (4), so that when the slow pushing mechanism (4) works, the extension pedestal (3 a) can be pushed upwards, the pulling cylinder (3 b) is fixedly mounted on the top of the inner edge of the accommodating box (5), the output end of the pulling cylinder (3 b) is fixedly connected with the mounting plate (3 e), and the pushing arm (1) is fixedly mounted on the extension pedestal (3 a).

3. The automated wafer handling system of claim 2, wherein the slow pushing and lifting mechanism (4) is an electric push rod, the slow pushing and lifting mechanism (4) is fixedly mounted on the mounting plate (3 e) through a mounting seat, and an output end of the slow pushing and lifting mechanism (4) is fixedly connected with the extension pillar (3 a).

4. The automatic wafer handling system according to claim 1, wherein the horizontal aligner (6) comprises a rotating support (6 a), a fixed plate (6 b), a rotating plate (6 c) and a sliding plate (6 d), the rotating support (6 a) is fixedly installed on the outer wall of the accommodating box (5) and is used for allowing the sliding plate (6 d) to rotate and retract to the side surface of the accommodating box (5), the fixed plate (6 b) is fixedly installed on the rotating support (6 a), one end of the rotating plate (6 c) is rotatably connected with one end of the fixed plate (6 b), and the sliding plate (6 d) is slidably installed on the rotating plate (6 c).

5. The automatic wafer handling system according to claim 4, wherein a sliding block (6 e) is disposed at the bottom of the sliding plate (6 d), the sliding block (6 e) is inserted into the rotating plate (6 c), a strip-shaped sliding slot for the sliding block (6 e) to slide is disposed on the rotating plate (6 c), and a limiting plate for limiting is disposed at the bottom of the sliding block (6 e).

6. The automated wafer handling system of claim 5, wherein the bottom of the rotating plate (6 c) is provided with a rotating shaft, the rotating shaft is rotatably connected with the fixed plate (6 b), the bottom of the rotating plate (6 c) is further provided with a heightening ring (6 f), the heightening ring (6 f) is sleeved on the rotating shaft, and the heightening ring (6 f) is located between the rotating plate (6 c) and the fixed plate (6 b).

7. The automatic wafer handling system according to claim 6, wherein the rotary support (6 a) comprises a rotary seat (6 a 1), a horizontal rotary rod (6 a 2) and a vertical rotary rod (6 a 3), the rotary seat (6 a 1) is fixedly mounted on the outer wall of the accommodating box (5), one end of the horizontal rotary rod (6 a 2) is rotatably connected with the rotary seat (6 a 1), the other end of the horizontal rotary rod is rotatably connected with the vertical rotary rod (6 a 3), a first limiting plate is arranged on the rotary seat (6 a 1), a first rotary resisting plate matched with the first limiting plate is arranged on the horizontal rotary rod (6 a 2), so that the horizontal rotary rod (6 a 2) cannot rotate continuously when rotating to the horizontal state, a second limiting plate is arranged on the horizontal rotary rod (6 a 2), a second rotary resisting plate matched with the second limiting plate is arranged on the vertical rotary rod (6 a 3), so that the vertical rotary rod (6 a 3) cannot rotate continuously when rotating to the vertical state, and the fixing plate (6 b) is fixedly mounted on the top of the rotary support (6 a).

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