CN217646059U - CVD reaction control device of double-filter bin system - Google Patents
CVD reaction control device of double-filter bin system Download PDFInfo
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- CN217646059U CN217646059U CN202220539745.5U CN202220539745U CN217646059U CN 217646059 U CN217646059 U CN 217646059U CN 202220539745 U CN202220539745 U CN 202220539745U CN 217646059 U CN217646059 U CN 217646059U
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Abstract
The utility model relates to a CVD reaction control device of two filtration storehouse systems, including filtering storehouse an and filtering storehouse b, the inlet end of filtering the storehouse passes through the tee bend pipeline and is connected with the reacting chamber exhaust end, the exhaust end passes through tee bend pipeline and first vacuum pump connection, the internal filter of installing respectively in the storehouse between inside inlet end and the exhaust end, there are second vacuum pump and high-pressure gas device through tee bend pipeline connection respectively on the internal filter of storehouse between the exhaust end and the storehouse of crossing, install pressure measurement on the body of storehouse around the filter respectively, be equipped with the valve on the tee bend between each part simultaneously. The pressure of each part is detected and compared with the pressure of each part to match with the switch of the valve, so that the filter is switched and cleaned, the switching time and the cleaning process are optimized, the pressure change of the reaction chamber is minimized, and the reaction is ensured to be carried out for a long time. The reaction in the reaction chamber is effectively controlled, and the generation of reaction impurities such as inclusions, voids and pores is minimized, so that a high-quality product can be manufactured.
Description
Technical Field
The utility model belongs to the technical field of the constant voltage control of reacting chamber in the CVD reaction, concretely relates to CVD reaction control device of two filtration storehouse systems.
Background
In a conventional CVD reaction, the pressure of the main valve is adjusted by using a vacuum pump and the main valve, thereby controlling the pressure and flow rate in the reaction chamber and allowing the reaction to proceed normally. And releasing the reacted gas or particles into the atmosphere through a vacuum pump or discharging the reacted gas or particles through a tail gas treatment device. However, when the reaction occurs and proceeds for a long time, particles that do not participate in the chemical reaction are generated, and are filtered by interposing a filtering device between the reaction chamber and the vacuum pump, thereby protecting the vacuum pump and maintaining the efficiency and life of the vacuum pump for a long time. In this case, if the amount of unreacted particles is too large and the reaction time is too long, which is generally more than 100 hours, the filter is clogged, so that the pressure or the flow rate of the reaction gas cannot be maintained stably during the reaction. Therefore, how to keep the pressure or the flow rate of the reaction gas stable during the reaction is a problem to be solved in the CVD reaction.
Disclosure of Invention
The utility model aims at providing a CVD reaction control device of a double-filter bin system, which solves the problem that a filter is easy to block when the CVD reaction is carried out for a long time; the problem that the system cannot be efficiently operated for a long time due to the change of pressure or gas flow velocity in the reaction chamber, so that high-quality products cannot be manufactured is solved.
The utility model adopts the technical proposal that:
the utility model relates to a two CVD reaction control device who crosses filter bin system, including the reaction chamber, it has the exhaust port to open on the reaction chamber is close to the bottom storehouse body, the exhaust port passes through a tee bend pipeline with the inlet end of crossing filter bin an and cross filter bin b respectively, the exhaust end of crossing filter bin an and cross filter bin b is connected through a tee bend pipeline with first vacuum pump inlet end, filter bin an and cross filter bin b internal filter of installing respectively in storehouse, the filter is installed between inlet end and exhaust end, it has the interface of ventilating to open on the storehouse body between filter and the exhaust end, the interface of ventilating respectively has two on filter bin an and cross filter bin b, it has an interface of ventilating to pass through a tee bend pipeline with second vacuum pump inlet end to cross filter bin a and cross filter bin b and go up respective another interface of ventilating and the one end of high-pressure gas pipeline and be connected through a tee bend pipeline, high-pressure gas device is connected to the high-pressure gas pipeline other end.
The utility model is characterized in that:
an air inlet valve a and an air inlet valve b are respectively arranged between the air inlet ends of the filter bin a and the filter bin b and the three-way pipeline, an exhaust valve a and an exhaust valve b are respectively arranged between the exhaust ends of the filter bin a and the filter bin b and the three-way pipeline, and a vacuum pump main valve is arranged between the air inlet end of the first vacuum pump and the three-way pipeline.
A first valve and a second valve are respectively arranged between one pair of ventilation interfaces and the three-way pipeline, the ventilation interfaces are connected with a second vacuum pump, a third valve and a fourth valve are respectively arranged between the other pair of ventilation interfaces and the three-way pipeline, and the ventilation interfaces are connected with a high-pressure gas device.
A first pressure detection device and a second pressure detection device are respectively installed on the front cabin body and the rear cabin body of a filter in the filter cabin a, a third pressure detection device and a fourth pressure detection device are respectively installed on the front cabin body and the rear cabin body of the filter in the filter cabin b, a reaction chamber pressure detection device is installed on the reaction chamber cabin body, and a main valve pressure detection device is installed on a pipeline on the air inlet side of a main valve of a vacuum pump.
The vacuum pump main valve, the air inlet valve a, the air inlet valve b, the exhaust valve a, the exhaust valve b, the first valve, the second valve, the third valve and the fourth valve are respectively connected with a PLC system control end.
The main valve pressure detection device, the reaction chamber pressure detection device, the first pressure detection device, the second pressure detection device, the third pressure detection device and the fourth pressure detection device are electrically connected with the signal input end of the PLC system.
The utility model has the advantages that:
the pressure detection devices are arranged on the front and rear bin bodies of the filter to accurately detect the pressure in the front and rear bin bodies of the filter, and the opening and closing sequence and time of the valve of the filter bin are adjusted according to the pressure difference of the front and rear bin bodies of the filter bin, so that the stability of the pressure and the flow speed in the reaction chamber is improved; the pressure of the filter bin in a clean state is adjusted according to the measurement data of the pressure detection device, the CVD reaction process is stabilized, the normal operation of the reaction is ensured, and unnecessary waste is reduced; the PLC control device ensures that the system can run efficiently and fully automatically for a long time under stable reaction conditions, thereby improving the quality of products.
Drawings
FIG. 1 is a schematic view of the overall structure of a CVD reaction control device of a double-filter bin system according to the present invention;
FIG. 2 is a schematic view of a dual-filter chamber structure of a CVD reaction control device of a dual-filter chamber system according to the present invention;
FIG. 3 is a schematic view showing a structure of a conventional CVD reaction apparatus according to the prior art;
FIG. 4 is a schematic view showing the structure of a conventional CVD reaction apparatus with a filter according to the prior art.
In the figure, 1, a filter cabin a,2, a filter cabin b,3, a reaction chamber, 4, a first vacuum pump, 5, a second vacuum pump, 6, a high-pressure gas pipeline, 7, a main valve pressure detection device, 8, a filter, 9, a main valve of the vacuum pump, 10, an air inlet valve a,11, an air inlet valve b,12, an exhaust valve a,13, an exhaust valve b,14, a first valve, 15, a second valve, 16, a third valve, 17, a fourth valve, 18, a reaction chamber pressure detection device, 19, a first pressure detection device, 20, a second pressure detection device, 21, a third pressure detection device, 22 and a fourth pressure detection device are arranged.
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings and specific embodiments.
The utility model relates to a CVD reaction control device of two filter storehouse systems, as shown in figure 1, including reaction chamber 3, reaction chamber 3 is close to and opens exhaust port on the bottom storehouse body, exhaust port is connected through a tee bend pipeline with the inlet end of filtering storehouse an 1 and filtering storehouse b2 respectively, the exhaust end of filtering storehouse an 1 and filtering storehouse b2 is connected through a tee bend pipeline with first vacuum pump 4 inlet end, filter storehouse an 1 and filtering storehouse b2 are internal to install filter 8 respectively in the storehouse, filter 8 installs between inlet end and exhaust end, it has the interface of ventilating to open on the storehouse body between filter 8 and the exhaust end, the interface of ventilating respectively has two on filtering storehouse an 1 and filtering storehouse b2, respectively have a ventilation interface and second vacuum pump 5 inlet end to be connected through a tee bend pipeline on filtering storehouse an 1 and filtering storehouse b2, filter storehouse an another ventilation interface on 1 and filtering storehouse b2 respectively and high-pressure gas pipeline 6's one end through a tee bend pipeline connection, high-pressure gas device is connected through high-pressure gas pipeline 6, high-pressure gas device provides clean working gas and stops the filter 8.
Each valve of a constant pressure control device in a CVD reaction control device of the double-filter bin system is shown in figure 1, a vacuum pump main valve 9 is arranged between the air inlet end of a first vacuum pump 4 and a three-way pipeline, an air inlet valve a10 and an air inlet valve b11 are respectively arranged between the air inlet ends of a filter bin a1 and a filter bin b2 and the three-way pipeline, and an exhaust valve a12 and an exhaust valve b13 are respectively arranged between the exhaust ends of the filter bin a1 and the filter bin b2 and the three-way pipeline; a first valve 14 and a second valve 15 are respectively installed at the ventilation interfaces of the three-way pipeline connected with the second vacuum pump 5, which are close to the filter bin a1 and the filter bin b2, and a third valve 16 and a fourth valve 17 are respectively installed at the ventilation interfaces of the three-way pipeline connected with the high-pressure gas device, which are close to the filter bin a1 and the filter bin b2.
And simultaneously, the utility model discloses in filter storehouse a1 in the filter 8 around install first pressure measurement device 19 and second pressure measurement device 20 on the storehouse body respectively, filter storehouse b2 in the filter 8 before, install third pressure measurement device 21 and fourth pressure measurement device 22 on the storehouse body in the back respectively, on the 3 storehouse bodies of reaction chamber install reaction chamber pressure measurement device 18, install main valve pressure measurement device 7 on the vacuum pump main valve 9 side of admitting air pipeline.
Wherein, the utility model provides a main valve pressure detection device 7 is digital manometer and pointer pressure table, and main valve pressure detection device 7, reaction chamber pressure detection device 18, first pressure detection device 19, second pressure detection device 20, third pressure detection device 21, fourth pressure detection device 22 are connected with the signal input part electricity of PLC system, and is same, wherein vacuum pump main valve 9, admission valve a10, admission valve b11, discharge valve a12, discharge valve b13, first valve 14, second valve 15, third valve 16 and fourth valve 17 are connected with PLC system control end respectively.
The utility model relates to a two filter storehouse structural schematic diagrams among CVD reaction control device of two filter storehouse systems are shown in fig. 2, the two filter storehouses of configuration among the constant voltage control device in the CVD system, carry out filtration operation in turn, two filter storehouses are as shown in fig. 2 filter storehouse a1 work earlier, then filter storehouse b2 is in clear state, if filter storehouse b2 work, then filter storehouse a 1's admission valve a10 and air outlet valve a12 are in the closed condition, and filter 8 is by high-pressure gas cleanness and keep clean state, filter 8 blocks up in storehouse b2, close filter storehouse b 2's admission valve b11 and air outlet valve b13, open the admission valve a10 and the air outlet valve a12 of filter storehouse a1, filter storehouse a1 in filter 8 of clean state begin work. At this time, the inlet valve b11 and the outlet valve b13 are closed, and the filter 8 in the filter house b2 is cleaned using high-pressure gas. And simultaneously, the utility model discloses before filter 8 in filter bin a1 and the filter bin b2 shown in fig. 1, install first pressure measurement device 19 on the storehouse body of back, second pressure measurement device 20, third pressure measurement device 21, fourth pressure measurement device 22, main valve pressure measurement device 7 is installed to vacuum pump main valve 9 side of admitting air, install reaction chamber pressure measurement device 18 on the reaction chamber 3 simultaneously, can real-time accurate grasp the pressure variation condition at each position through above-mentioned pressure measurement device, and above-mentioned pressure measurement device all is connected with automatic control system with valve switch, can carry out the optimization configuration to the order and the time of opening and closing the filter bin valve, improve the stability of reaction.
The conventional CVD reactor is shown in fig. 3, and controls the pressure and flow rate in the reaction chamber 3 by adjusting the pressure of the main valve using the first vacuum pump 4 and the vacuum pump main valve 9. Compared with the utility model discloses, the utility model discloses as shown in fig. 1 the exhaust end of reacting chamber 3 has set up filtration system to the pipeline between the first vacuum pump 4, and this filtration system can filter the particulate matter that does not participate in chemical reaction, is used for protecting the vacuum pump to keep the efficiency and the life-span of vacuum pump for a long time.
Conventional CVD reactor with filter 8 as shown in fig. 4, the conventional CVD reactor with filter 8 is used to protect the first vacuum pump 4 by filtering out particles that do not participate in the chemical reaction by interposing a filter between the reaction chamber 3 and the first vacuum pump 4. Compared with the utility model discloses, the utility model discloses as shown in fig. 1 adopt two filter storehouse structures, the two filter storehouses of configuration carry out filtration operation in turn to keep pressure and the flow in the reaction invariable, the two filter storehouse structures of configuration carry out filtration operation in turn, with keep pressure and the flow in the reaction invariable.
The utility model relates to a two effects of filtering the effect of constant voltage controlling means essential element respectively as follows in the CVD reaction controlling means of storehouse system:
filtration storehouse a1 and filtration storehouse b2: as shown in fig. 1, the filter bin a1 and the filter bin b2 are connected with a reaction chamber 3 through a gas inlet end of a three-way pipe section, a gas outlet end of the filter bin is connected with a first vacuum pump 4, a filter 8 is arranged in the bin body, a pressure detection device is also arranged on the bin body, a second vacuum pump 5 and a high-pressure gas device are also connected on the bin body through a three-way pipe, and the filter bin a1 and the filter bin b2 can work alternately under the control of a valve between pipelines so as to keep the pressure and the flow in the reaction constant, and the long-time operation of the system can be ensured even if a large amount of unreacted particles exist in the reaction process;
and (3) a filter 8: the filter 8 is respectively arranged in the filter cabin a1 and the filter cabin b2, is positioned between the air inlet end and the air outlet end, and is used for filtering particles which do not participate in chemical reaction, protecting the vacuum pump, and keeping the efficiency and the service life of the vacuum pump for a long time.
A pressure detection device: the main valve pressure detecting device 7 is used for detecting the pressure of the air inlet side of the vacuum main valve, and the reaction chamber pressure detecting device 18 is used for detecting the internal pressure of the reaction chamber 3, wherein the first pressure detecting device 19, the second pressure detecting device 20, the third pressure detecting device 21 and the fourth pressure detecting device 22 are installed on the front and rear cabin bodies of the filter 8 in the filter cabin a1 and the filter cabin b2, and are used for measuring the pressure in the front and rear cabin bodies of the filter 8 in the filter cabin a1 and the filter cabin b2, and judging whether the filter 8 is blocked or not according to the pressure difference value in the front and rear cabin bodies, the pressure difference value represents the blocking degree of the filter 8, in other words, the larger the pressure difference value is, the larger the blocking degree of the filter 8 is, therefore, the larger the difference value is, whether the filter path switching of the filter cabin a1 and the filter cabin b2 is carried out or not is determined according to the comparison of the pressure difference value and the set value, and meanwhile, the pressure detecting device uploads the detected data to the PLC control system for accurate control.
Second vacuum pump 5: after switching the filtration path, the filter 8 which is out of operation is cleaned using a high pressure gas jet which causes the pressure in the filtration compartment to increase, in which case the second vacuum pump 5 can adjust the pressure in the filtration compartment to a suitable value, at which time the first valve 14 and the second valve 15 must be in an open state in preparation for the next filtration switch, thereby reducing the variation in pressure in the reaction chamber 3 due to the pressure difference, all of which are regulated according to the pressure difference across the filtration compartment.
The utility model relates to a two CVD reaction control device who crosses filter bin system still relates to a constant voltage control method its operating procedure as follows:
step 1: determining the optimal pressure change range of the reaction chamber 3 according to the vacuum degree parameter value and the temperature parameter value of the CVD reaction;
step 2: determining the pressure difference set value Px of the front and the rear cabin bodies of the filter 8 according to the optimal pressure change range;
and step 3: detecting pressure values of front and rear cabin bodies of the filter 8 as Pa1 and Pa2 according to a first pressure detection device 19 and a second pressure detection device 20, detecting actual pressure difference values of the front and rear cabin bodies of the filter 8 in a filtering cabin a1 as Pav, wherein Pav = Pa1-Pa2, detecting pressure values of the front and rear cabin bodies of the filter 8 as Pb1 and Pab2 according to a third pressure detection device 21 and a fourth pressure detection device 22, and detecting actual pressure difference values of the front and rear cabin bodies of the filter 8 in a filtering cabin b2 as Pbv, wherein Pbv = Pb1-Pab2;
and 4, step 4: comparing the actual pressure difference value in the step (3) with the pressure difference set value in the step (2), if the actual pressure difference value is smaller than a set value Px, continuing the reaction, and if the actual pressure difference value is larger than the set value Px, controlling a valve switch to switch a filtering path by the PLC system;
and 5: cleaning the switched filter bin through a high-pressure gas device, and adjusting the pressure of the filter bin in a preparation state to be a set value;
and 6: and (5) repeating the process from the step 3to the step 5.
The switching step of the filtering path described in the step 4 is specifically as follows:
step 4.1: the filtration path is switched from filtration silo a 1to filtration silo b2.
Step 4.1.1: the main valve 9 of the vacuum pump is adjusted to keep the pressure of the reaction chamber 3 constant;
step 4.1.2: the filtering path is a filtering chamber a1, the checking air inlet valve a10 and the checking air outlet valve a12 are both opened, and the checking air inlet valve b11 and the checking air outlet valve b13 of the filtering chamber b2 are closed;
step 4.1.3: detecting the pressures of the front and the rear cabin bodies of the filter 8 according to a first pressure detection device 19 and a second pressure detection device 20, and when the pressure difference Pa1-Pa2 between the front and the rear of the filter 8 in the filter cabin a1 is greater than a set value Px, switching the filtering path from the filter cabin a 1to the filter cabin b2;
step 4.1.4: the valve operation sequence firstly opens the air inlet valve b11 of the filter bin b2, opens the exhaust valve b13 after 5-10 seconds, simultaneously closes the air inlet valve a10 and the exhaust valve a12 of the filter bin a1, and the filter bin b2 starts to work;
step 4.1.5: the filtering bin a1 stops working and is in a standby state;
step 4.1.6: the third valve 16 is opened to clean the filter 8 in the filter bin a1 by using a high-pressure gas device, then the first valve 14 is opened to ensure that the pressure in the front bin and the rear bin of the filter 8 in the filter bin a1 is the same as the pressure in the reaction chamber 3, and then the first valve 14 and the third valve 16 are closed and in a standby state until the filter bin b2 is blocked and then the filter bin a1 is switched.
When the air inlet valve a10 and the air outlet valve a12 are opened, the pressures of the front and rear cabin bodies of the filter 8 in the filter cabin a1 can be optimized to find the value with the minimum influence on the pressure of the reaction chamber 3, so that the pressure change of the pressure of the reaction chamber 3 is reduced to the maximum extent, and the influence of the pressure change on the CVD process is reduced to the minimum.
Step 4.2: the filtration path is switched from filtration silo b 2to filtration silo a1.
Step 4.2.1: the main valve 9 of the vacuum pump is adjusted to keep the pressure of the reaction chamber 3 constant;
step 4.2.2: the filtering path is the filtering chamber b2, the checking inlet valve b11 and the exhaust valve b13 are both opened, the checking inlet valve a10 and the exhaust valve a12 of the filtering chamber a1 are closed and the next switching of the filtering path is ready;
step 4.2.3: the front and back pressure of the filter 8 is detected by the third pressure detection device 21 and the fourth pressure detection device 22, when the pressure difference of the filter 8 in the filter bin b2 begins to increase, and when the pressure difference Pb1-Pb2 is greater than a set value Px, the filtering path is switched from the filter bin b 2to the filter bin a1;
step 4.2.4: the valve operation sequence firstly opens the air inlet valve a10 of the filter cabin a1, opens the exhaust valve a12 after 5-10 seconds, simultaneously closes the air inlet valve b11 and the exhaust valve b13 of the filter cabin b2, and the filter cabin a1 starts to work;
step 4.2.5: the filtering bin b2 stops working and is in a standby state;
step 4.2.6: the fourth valve 17 is opened to clean the filter 8 in the filter bin b2 by using a high-pressure gas device, then the pressure in the front bin and the pressure in the rear bin of the filter 8 in the filter bin b2 are enabled to be the same as the pressure in the reaction chamber 3 by opening the second valve 15, then the second valve 15 and the fourth valve 17 are closed and in a standby state until the filter bin a1 is blocked, and then the filter bin b2 is switched.
When the air inlet valve b11 and the air outlet valve b13 are opened, the pressures of the front and the back cabin bodies of the filter 8 in the filter cabin b2 can be optimized to find the value with the minimum influence on the pressure of the reaction chamber 3, thereby reducing the pressure change of the pressure of the reaction chamber 3to the maximum extent and reducing the influence of the pressure change on the CVD process to the minimum.
The utility model relates to a CVD reaction control device of two filtration storehouse systems can accurate detection reaction chamber 3 pressure through reaction chamber pressure detection device 18, can accurate detection filter 8 in storehouse a1 through first pressure detection device 19 and second pressure detection device 20 before, back storehouse body pressure, can accurate detection filter 8 in storehouse b1 through first pressure detection device 19 and second pressure detection device 20 before, back storehouse body pressure and main valve pressure detection device 7 detect the 9 side pipeline pressures that admit air of vacuum pump main valve, pass to PLC control system on the numerical value that each pressure detection device detected, PLC control system rethread valve's adjustment makes 3 pressure stability in reaction chamber keep at optimum numerical value.
When the above processes are continuously operated by the PLC, all the processes are automatically adjusted, the magnitude of the internal pressure of each apparatus, the opening and closing sequence of the valves and the opening and closing time intervals of the valves can be adjusted, and the filter 8 is not clogged, thereby ensuring that the CVD process can be continued for 1000 hours. In the above working process, parameters for maintaining the optimum reaction conditions are obtained by changing a plurality of variables and applied to each process flow, so that the pressure and gas flow rate changes in the reaction process can be stabilized, and a stable high-quality CVD reaction product can be finally obtained, according to the above contents, the present invention adopts the following two embodiments:
example 1: znS is manufactured by CVD process.
The ZnS material produced by the CVD process is usually subjected to CVD reaction under the conditions of a vacuum degree of 10-60torr and a temperature range of 600 to 760 ℃, and the reaction expression is as follows:
H 2 S+Zn→ZnS+H 2
step 1: determining the optimal pressure change range of the reaction chamber 3 according to the vacuum degree parameter value and the temperature parameter value of the CVD reaction;
the reaction conditions are as follows: vacuum 20torr, temperature 700 ℃.
Under the above conditions, the pressure change of the reaction chamber 3 was kept as much as possible within the range (± 0.1 torr);
here, by comparing each parameter under the above reaction conditions, the following optimum conditions for maintaining the degree of vacuum of the reaction chamber 3 at 20torr were obtained.
Step 2: determining a pressure difference set value Px =2torr of the front and rear cabin bodies of the filter 8 according to the optimal pressure change range;
generally, if the pressure difference value is larger, i.e., the pressure difference setting is greater than or equal to 2torr, the instantaneous pressure change of the reaction chamber 3 will exceed 0.2torr; the smaller the differential pressure value, that is, the differential pressure is set to 1torr or less, the smaller the instantaneous pressure change range of the reaction chamber 3. If the pressure difference is too small, the switching of the filter path should be completed in a short time, i.e. within 5 minutes, and the filter 8, which is out of service, is cleaned and then enters the preparation stage, which typically takes 10 minutes. When the pressure in the reaction chamber 3 is minimized, the maximum pressure difference obtained is 2torr, which takes 15 minutes.
And step 3: detecting the pressure values of the front cabin body and the rear cabin body of the filter 8 as Pa1 and Pa2 according to a first pressure detection device 19 and a second pressure detection device 20, detecting the actual pressure difference value of the front cabin body and the rear cabin body of the filter 8 in a filter cabin a1 as Pa1-Pa2, detecting the pressure values of the front cabin body and the rear cabin body of the filter 8 as Pb1 and Pab2 according to a third pressure detection device 21 and a fourth pressure detection device 22, and detecting the actual pressure difference value of the front cabin body and the rear cabin body of the filter 8 in a filter cabin b2 as Pb1-Pb2;
and 4, step 4: comparing the actual pressure difference value in the step (3) with the pressure difference set value in the step (2), and if the actual pressure difference value is smaller than a set value Px, continuing the reaction, and not regulating and controlling the PLC system; and if the actual pressure difference value is larger than the set value Px, the PLC system controls the valve switch to switch the filtering path.
The sequence of valve opening and closing is as described above, but 5 seconds are required after the inlet valve a10 or the inlet valve b11 of the filter bin in the ready state is opened, then the exhaust valve a12 or the exhaust valve b13 of the filter bin is opened, the exhaust valve a12 or the exhaust valve b13 of the filter 8 shell in operation is closed, then the inlet valve a10 or the inlet valve b11 of the filter bin in operation is closed, and the pressure of the reaction chamber 3 is kept stable after 3 seconds.
And 5: cleaning the switched filter bin through a high-pressure gas device, and adjusting the pressure of the filter bin in a preparation state to be a set value;
after the high-pressure gas device is cleaned, the pressure of the filter bin in the preparation state is adjusted according to the detection value of the main valve pressure detection device 7, and if the pressure of the filter bin in the preparation state is lower than 20.5torr, the pressure of the instantaneous reaction chamber 3 switched to the filter bin is reduced by 0.2orr or more; if the pressure of the filtration silo in the ready state is higher than 20.5torr, the pressure of the reaction chamber 3 in the moment of switching to the filtration silo is increased by 0.2torr or more, and therefore, after cleaning the filtration silo, the pressure of the filtration silo in the ready state is suitably 20.5 torr.
Example 2: cdS is manufactured with a CVD process.
The CdS material manufactured by using the CVD process generally has the CVD reaction under the conditions of vacuum degree of 60-100torr and temperature range of 550-650 ℃, and the reaction expression is as follows:
H 2 S+Cd→Cd+H 2
step 1: determining the optimal pressure change range of the reaction chamber 3 according to the vacuum degree parameter value and the temperature parameter value of the CVD reaction;
the reaction conditions are as follows: the vacuum degree is 80torr, and the temperature is 600 ℃.
Under the above conditions, the pressure change of the reaction chamber 3 was kept in the range of (+ -0.3 torr) as much as possible.
Here, by comparing each parameter under the above reaction conditions, the following optimum conditions for maintaining the degree of vacuum of the reaction chamber 3 at 80torr were obtained.
And 2, step: and determining a pressure difference set value Px =2torr of the front and rear cabin bodies of the filter 8 according to the optimal pressure change range:
generally, if the pressure difference value is larger, i.e. the pressure difference setting is greater than or equal to 3torr, the instantaneous pressure change of the reaction chamber 3 will exceed 0.4torr; the smaller the differential pressure value, i.e., the differential pressure setting is less than or equal to 2torr, the smaller the instantaneous pressure change of the reaction chamber 3. If the pressure difference is too small, the switching of the filter path should be completed in a short time, i.e. within 5 minutes, and the filter 8, which is out of service, is cleaned and then enters the preparation phase, which usually takes 10 minutes. When the pressure in the reaction chamber 3 is minimized, the maximum pressure difference obtained is 3torr, which takes 15 minutes.
And step 3: detecting the pressure values of the front cabin body and the rear cabin body of the filter 8 as Pa1 and Pa2 according to a first pressure detection device 19 and a second pressure detection device 20, detecting the actual pressure difference value of the front cabin body and the rear cabin body of the filter 8 in a filter cabin a1 as Pav = Pa1-Pa2, detecting the pressure values of the front cabin body and the rear cabin body of the filter 8 as Pb1 and Pab2 according to a third pressure detection device 21 and a fourth pressure detection device 22, and detecting the actual pressure difference value of the front cabin body and the rear cabin body of the filter 8 in a filter cabin b2 as Pbv = Pb1-Pb2;
and 4, step 4: and (3) comparing the actual pressure difference value in the step (3) with the pressure difference set value in the step (2), if the actual pressure difference value is smaller than a set value Px, continuing the reaction, and if the actual pressure difference value is larger than the set value Px, controlling a valve switch to switch the filtering path by the PLC system.
The sequence of valve opening and closing is as described above, but 5 seconds after opening the inlet valve a10 or the inlet valve b11 of the filter bin in the ready state, the exhaust valve a12 or the exhaust valve b13 of the filter bin is opened, the exhaust valve a12 or the exhaust valve b13 of the filter bin in operation is closed, then the inlet valve a10 or the inlet valve b11 of the filter bin in operation is closed, and the pressure of the reaction chamber 3 is kept stable after 5 seconds.
And 5: the filter bin after will switching is cleaned through the high-pressure gas device to the filter bin pressure of adjustment readiness is for setting for numerical value size:
after the high-pressure gas device is cleaned, the pressure of the filter bin in the preparation state is adjusted according to the detection value of the main valve pressure detection device 7, and if the pressure of the filter bin in the preparation state is lower than 81torr, the pressure of the instantaneous reaction chamber 3 switched to the filter bin is reduced by 4orr or more; if the pressure of the filtration silo in the ready state is higher than 81torr, the pressure of the reaction chamber 3 in the moment of switching to the filtration silo is increased by 4torr or more, and therefore, it is appropriate that the pressure of the filtration silo in the ready state is 81torr after cleaning the filtration silo.
The utility model relates to a two CVD reaction control device who crosses filter bin system, its beneficial effect lies in:
the front and rear bin bodies of the filter 8 in the filter bin a1 are respectively provided with a first pressure detection device 19 and a second pressure detection device 20, the front and rear bin bodies of the filter 8 in the filter bin b2 are respectively provided with a third pressure detection device 21 and a fourth pressure detection device 22 to accurately detect the pressure in the front and rear bin bodies of the filter 8, and the opening and closing sequence and time of a valve of the filter bin are adjusted according to the pressure, so that the stability of the pressure and the flow speed in the reaction chamber 3 is improved; the pressure of the filter bin in a clean state is adjusted according to the measurement data of the pressure detection device, the CVD reaction process in the reaction chamber 3 is stabilized, the normal operation of the reaction is ensured, and unnecessary waste is reduced; the PLC control device enables the system to run fully automatically for a long time under stable reaction conditions in a high-efficiency manner, so that the production quality of products is improved.
Claims (5)
1. The CVD reaction control device of the double-filter bin system is characterized by comprising a reaction chamber (3), wherein an exhaust port is formed in the reaction chamber (3) close to a bottom bin body, the exhaust port is respectively connected with the air inlet ends of a filter bin a (1) and a filter bin b (2) through a three-way pipeline, the exhaust ends of the filter bin a (1) and the filter bin b (2) are connected with the air inlet end of a first vacuum pump (4) through a three-way pipeline, filters (8) are respectively installed in the filter bin a (1) and the filter bin b (2), the filters (8) are installed between the air inlet end and the exhaust end, a ventilation interface is formed in a bin body between the filters (8) and the exhaust end, the ventilation interfaces are respectively arranged on the filter bin a (1) and the filter bin b (2), a ventilation interface is respectively arranged on the filter bin a (1) and the filter bin b (2) and is connected with the air inlet end of a second vacuum pump (5) through a three-way pipeline, the other ventilation interface is respectively connected with one high-pressure gas pipeline (6), and the other end of the filter bin a (1) and the filter bin b (2) is connected with a high-pressure gas pipeline.
2. The CVD reaction control device of a double-filter bin system according to claim 1, wherein an air inlet valve a (10) and an air inlet valve b (11) are respectively installed between the air inlet ends of the filter bin a (1) and the filter bin b (2) and a three-way pipeline, an air outlet valve a (12) and an air outlet valve b (13) are respectively installed between the air outlet ends of the filter bin a (1) and the filter bin b (2) and the three-way pipeline, and a vacuum pump main valve (9) is installed between the air inlet end of the first vacuum pump (4) and the three-way pipeline;
and the vacuum pump main valve (9), the air inlet valve a (10), the air inlet valve b (11), the exhaust valve a (12) and the exhaust valve b (13) are respectively connected with a control end of the PLC system.
3. The CVD reaction control device of a double-filter bin system according to claim 1, wherein a first valve (14) and a second valve (15) are respectively installed between one pair of the aeration interfaces and the tee pipeline, the aeration interfaces are connected with a second vacuum pump (5), a third valve (16) and a fourth valve (17) are respectively installed between the other pair of the aeration interfaces and the tee pipeline, and the aeration interfaces are connected with a high-pressure gas device;
the first valve (14), the second valve (15), the third valve (16) and the fourth valve (17) are respectively connected with the control end of the PLC system.
4. The CVD reaction control device of a double-filter bin system according to claim 2, wherein a first pressure detection device (19) and a second pressure detection device (20) are respectively installed on the front and rear bin bodies of the filter (8) in the filter bin a (1), a third pressure detection device (21) and a fourth pressure detection device (22) are respectively installed on the front and rear bin bodies of the filter (8) in the filter bin b (2), a reaction chamber pressure detection device (18) is installed on the bin body of the reaction chamber (3), and a main valve pressure detection device (7) is installed on the air inlet side pipeline of the vacuum pump main valve (9).
5. The CVD reaction control device of a double-filter bin system according to claim 4, wherein the main valve pressure detection device (7), the reaction chamber pressure detection device (18), the first pressure detection device (19), the second pressure detection device (20), the third pressure detection device (21) and the fourth pressure detection device (22) are electrically connected with a signal input end of a PLC system.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117180879A (en) * | 2023-11-06 | 2023-12-08 | 内蒙古森鼎环保节能股份有限公司 | Rare earth processing dust collecting equipment |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN117180879A (en) * | 2023-11-06 | 2023-12-08 | 内蒙古森鼎环保节能股份有限公司 | Rare earth processing dust collecting equipment |
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