CN217639560U - Particle beam current testing device - Google Patents

Abstract

The application discloses particle beam current testing arrangement includes: a beam detecting section, wherein the beam detecting section includes: a scintillator layer and a CCD layer, and wherein the scintillator layer is disposed above the CCD layer with a gap disposed therebetween; the scintillator layer converts beam signals of the particle beams into optical signals and transmits the optical signals to the CCD layer; and the CCD layer converts the optical signal into an electrical signal and forms a two-dimensional distribution map of the beam spot of the particle beam.

Description

Particle beam current testing device

Technical Field

The present application relates to the field of charged particle beam testing, and more particularly, to a particle beam testing apparatus.

Background

Charged particle beam devices generally include particle beam devices and electron beam devices. The charged particle beam apparatus includes: electron microscope and ion microscope. Charged particle beam devices play a great role in the fields of material science, life science, semiconductor industry, and the like. Charged particle beam devices include a charged particle source, and online quality inspection of the charged particle source is essential to the design and production of the charged particle source during the manufacturing and development of the charged particle beam device.

However, the conventional faraday cup can only measure the current value of the beam spot of a whole particle beam, and cannot detect the characteristics of the uniformity of the beam spot of the particle beam, the beam density of the particle beam or the half opening angle of the particle beam. Therefore, no clear guidance is provided for the design and production of charged particle sources.

Aiming at the technical problems that the existing testing method in the prior art can only measure the current value of the particle beam and cannot detect the uniformity of the particle beam spot, so that the design and the production of the particle source cannot be helped, an effective solution is not provided at present.

SUMMERY OF THE UTILITY MODEL

The utility model provides a particle beam current testing arrangement to solve the current test method that exists among the prior art at least and can only measure the current value of particle beam current, can't detect the homogeneity of particle beam spot, thereby can't provide the technical problem of help for the design and the production of particle source.

According to an aspect of the present application, there is provided a particle beam current testing apparatus, comprising: a beam detecting section, wherein the beam detecting section includes: a scintillator layer and a CCD layer, and wherein the scintillator layer is disposed above the CCD layer with a gap disposed therebetween; the scintillator layer converts beam signals of particle beams serving as a test object into optical signals and transmits the optical signals to the CCD layer; and the CCD layer converts the optical signal into an electric signal and forms a two-dimensional distribution diagram of the particle beam.

Optionally, the beam current detection part further includes: the light source comprises a scintillator layer, a light-shielding layer and a light-shielding layer, wherein the light-shielding layer is arranged above the scintillator layer, and a certain gap is arranged between the light-shielding layer and the scintillator layer; and a plurality of first diaphragm holes are arranged on the diaphragm layer at equal intervals, and the sizes of the first diaphragm holes are the same.

Optionally, the current measuring component, wherein the current measuring component comprises: the Faraday cup comprises a current limiting diaphragm and a Faraday cup, wherein the current limiting diaphragm is arranged above the Faraday cup; and the current-limiting diaphragm is provided with a second diaphragm hole, and the size of the second diaphragm hole is the same as that of the first diaphragm hole.

Optionally, the method further comprises: and the mobile platform is arranged below the beam current detection part and the current measurement part and is used for driving the beam current detection part and the current measurement part to move.

Optionally, the method further comprises: and the reference source is arranged above the beam current detection part and the current measurement part and respectively emits electron beams to the beam current detection part and the current measurement part.

Optionally, the reference source comprises: the electron source is arranged above the porous diaphragm and provides stable electron beam current; the multi-hole diaphragm is arranged between the electron source and the compression mirror, can move transversely, and has different aperture sizes; and a compression mirror for controlling the density of the electron beam stream.

Optionally, the reference source further comprises: the collimating diaphragm and the limiting diaphragm are arranged between the compression mirror and the limiting diaphragm and are used for collimating the electron beams; and a limiting diaphragm for adjusting the diameter of the beam spot of the electron beam.

Optionally, one end of the CCD layer is connected to a CCD readout circuit for amplifying the electrical signal of the CCD layer and filtering noise.

The utility model discloses be provided with the beam current detection part, the beam current detection part includes scintillator layer and CCD layer. The scintillator layer converts a beam signal of a particle beam as a test object into an optical signal. The CCD layer converts the optical signal into an electric signal, and forms a two-dimensional distribution map of a beam spot of a particle beam as a test object. And because the beam spot on the two-dimensional distribution map can be received by a plurality of pixels, the operator can obtain the uniformity of the beam spot according to the two-dimensional distribution map. Therefore, the technical effect of detecting the uniformity of the beam spot of the particle beam is achieved through the product structure. The technical problem that the existing testing method in the prior art can only measure the current value of the particle beam and cannot detect the uniformity of the particle beam spot, so that the design and production of the particle source cannot be helped is solved.

The above and other objects, advantages and features of the present invention will become more apparent to those skilled in the art from the following detailed description of specific embodiments thereof, taken in conjunction with the accompanying drawings.

Drawings

Some specific embodiments of the present application will be described in detail hereinafter by way of illustration and not limitation with reference to the accompanying drawings. The same reference numbers in the drawings identify the same or similar elements or components. Those skilled in the art will appreciate that the drawings are not necessarily drawn to scale. In the drawings:

fig. 1 is a schematic diagram of a beam detection component according to one embodiment of the present application;

FIG. 2 is a schematic diagram of a particle beam current testing apparatus according to an embodiment of the present application;

FIG. 3 is a top view of a diaphragm layer according to one embodiment of the present application;

FIG. 4 is a two-dimensional distribution of a single particle beam spot passing through a certain first diaphragm aperture 131 of the diaphragm layer 130 according to one embodiment of the present application;

FIG. 5 is a two-dimensional distribution plot of a plurality of single particle beam spots of equal area size according to an embodiment of the present application

FIG. 6 is a front view of a current measurement component according to one embodiment of the present application;

fig. 7 is a schematic diagram of rough measurement of a particle beam current as a test object in advance according to an embodiment of the present application;

FIG. 8 is a schematic illustration of a particle beam as a test object being tested according to an embodiment of the present application;

FIG. 9 is a schematic illustration of calibrating CCD layer readings using a reference source according to one embodiment of the present application; and

FIG. 10 is a schematic diagram of a reference source according to one embodiment of the present application.

Detailed Description

It should be noted that, in the present invention, the embodiments and features of the embodiments may be combined with each other without conflict. The present invention will be described in detail below with reference to the accompanying drawings in conjunction with embodiments.

In order to make the technical solution of the present invention better understood, the technical solution of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts shall belong to the protection scope of the present invention.

It should be noted that the terms "first," "second," and the like in the description and claims of the present invention and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the terms so used are interchangeable under appropriate circumstances for describing embodiments of the invention herein. Moreover, the terms "comprises," "comprising," and "having," and any variations thereof, are intended to cover a non-exclusive inclusion, such that a process, method, system, article, or apparatus that comprises a list of steps or elements is not necessarily limited to those steps or elements expressly listed, but may include other steps or elements not expressly listed or inherent to such process, method, article, or apparatus.

It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, and it should be understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of stated features, steps, operations, devices, components, and/or combinations thereof, unless the context clearly indicates otherwise.

Fig. 1 is a schematic diagram of a beam detection section 10 according to an embodiment of the present application. Referring to fig. 1, the particle beam current testing apparatus includes: a beam detecting section 10, wherein the beam detecting section 10 includes: a scintillator layer 110 and a CCD layer 120, and wherein the scintillator layer 110 is disposed above the CCD layer 120 with a certain gap provided between the scintillator layer 110 and the CCD layer 120; the scintillator layer 110 converts a beam signal of a particle beam as a test object into an optical signal, and transmits the optical signal to the CCD layer 120; and the CCD layer 120 converts the optical signal into an electrical signal and forms a two-dimensional distribution map of the beam spot of the particle beam.

As mentioned in the background, charged particle beam devices include a charged particle source, and online quality inspection of the charged particle source during manufacturing and development of the charged particle beam device is essential to the design and production of the charged particle source. However, the conventional faraday cup can only measure the current value of the beam spot of a whole particle beam, and cannot detect the characteristics of the uniformity of the beam spot of the particle beam, the beam density of the particle beam, the half-field angle of the particle beam and the like. Therefore, no clear guidance is provided for the design and production of charged particle sources.

In view of the above technical problems, the present embodiment provides a particle beam current testing apparatus. The particle beam testing apparatus includes a beam detecting part 10, and the beam detecting part 10 includes a scintillator layer 110 and a CCD layer 120. The scintillator layer 110 is disposed above the CCD layer 120, and a certain interval is provided between the scintillator layer 110 and the CCD layer 120. Among them, the scintillator layer 110 can convert a beam signal of a particle beam into an optical signal, and the CCD layer can convert the optical signal into an electrical signal, and can realize image acquisition, image transmission, and image display.

An operator places a particle beam source as a test object above the scintillator layer 110, and emits a particle beam current from the particle beam source toward the scintillator layer 110. When the particle beam is irradiated onto the scintillator layer 110, the scintillator layer 110 converts a beam signal of the particle beam into a light signal. When the optical signal of the particle beam is irradiated onto the CCD layer 120, the CCD layer 120 converts the optical signal of the particle beam into an electrical signal of the particle beam. Further, since the optical signal of the particle beam can be received by a plurality of pixels on the CCD layer 120 when irradiated onto the CCD layer 120, a two-dimensional distribution map of the particle beam spot can be formed on the CCD layer 120. The operator can observe the distribution trend and uniformity of the beam spot of the particle beam according to the two-dimensional distribution diagram.

Therefore, the technical effect of detecting the uniformity of the beam spot of the particle beam is achieved through the product structure. The technical problem that the existing testing method can only measure the current value of the particle beam and cannot detect the uniformity of the beam spot of the particle beam, so that the design and production of a particle source cannot be helped is solved.

Optionally, the beam detection part 10 further includes: a diaphragm layer 130, wherein the diaphragm layer 130 is disposed above the scintillator layer 110, and a certain gap is disposed between the diaphragm layer 130 and the scintillator layer 110; and the diaphragm layer 130 is provided with a plurality of first diaphragm holes 131 at equal intervals, and the plurality of first diaphragm holes 131 are the same size.

In particular, fig. 2 is a schematic diagram of a particle beam current testing apparatus according to an embodiment of the present application;

FIG. 3 is a top view of the stop layer 130 according to one embodiment of the present application; fig. 4 is a two-dimensional distribution of a single particle beam spot passing through a certain first diaphragm aperture 131 of the diaphragm layer 130 according to an embodiment of the present application. As shown in fig. 2, 3, and 4, a diaphragm layer 130 is further provided above the scintillator layer 110, and a certain gap is provided between the diaphragm layer 130 and the scintillator layer 110. The diaphragm layer 130 is formed of a plurality of first diaphragm holes 131, and the plurality of first diaphragm holes 131 have the same aperture size and the intervals between the first diaphragm holes 131 are equal.

FIG. 5 is a two-dimensional distribution plot of a plurality of single particle beam spots of equal area size, according to an embodiment of the present application. Referring to fig. 5, the operator places a particle beam source as a test object above the beam detecting part 10 and emits a particle beam to the beam detecting part 10 from the particle beam source. When a particle beam emitted from the particle beam source is irradiated onto the uppermost diaphragm layer 130, the particle beam is divided into a plurality of single particle beams having the same diameter by the plurality of first diaphragm holes 131 of the diaphragm layer 130. The single particle beam is a particle beam formed after passing through the single first aperture 131. After the plurality of single particle beam beams with the same diameter and size pass through the scintillator layer 110, a two-dimensional distribution map of a plurality of single particle beam spots with the same area and size is displayed on the CCD layer 120. The single particle beam spot is a particle beam spot displayed on the CCD layer 120 after passing through the single first diaphragm hole 131.

Therefore, the technical effect of dividing the particle beam into a plurality of single particle beam beams with the same diameter is achieved through the product structure.

Optionally, the method further includes: a current measuring part 20, wherein the current measuring part 20 includes: a current limiting diaphragm 210 and a faraday cup 220, and wherein the current limiting diaphragm 210 is disposed above the faraday cup 220; and the current limiting diaphragm 210 is provided with a second diaphragm hole 211, and the size of the second diaphragm hole 211 is the same as that of the first diaphragm hole 131.

Specifically, FIG. 6 is a front view of a current measurement component 20 according to one embodiment of the present application; fig. 7 is a schematic diagram of rough measurement of a particle beam current emitted from a particle source as a test object in advance according to an embodiment of the present application. Referring to fig. 6 and 7, the current measuring part 20 includes a current limiting diaphragm 210 and a faraday cup 220. The current limiting diaphragm 210 is disposed above the faraday cup 220. The current limiting diaphragm 210 is provided with a second diaphragm hole 211, and the aperture size of the second diaphragm hole 211 is the same as the aperture size of the first diaphragm hole 131 of the diaphragm layer 130. And wherein the faraday cup 220 is used to measure a current value of the particle beam current, and the faraday cup 220 is biased with 60V.

For example, an operator needs to calibrate a particle beam test apparatus before measuring the current value of a certain particle beam. Before calibrating the particle beam current testing device, the particle beam current needs to be roughly tested to determine the approximate range of the current value of the particle beam current. And adjusts the size of the electron beam emitted from the reference source 40 according to the range of the current value of the particle beam.

Therefore, the technical effect of providing help for the calibration of the particle beam current testing device is achieved through the product structure.

Optionally, the method further comprises: and the moving platform 30, wherein the moving platform 30 is arranged below the beam current detection part 10 and the current measurement part 20, and is used for driving the beam current detection part 10 and the current measurement part 20 to move.

Specifically, referring to fig. 2, the particle beam current testing apparatus further includes a moving platform 30. The moving platform 30 is disposed below the beam detecting unit 10 and the current measuring unit 20.

When the particle beam current needs to be roughly measured, the moving platform 30 moves the current measuring component 20 to be right below the particle beam current, and the current value of the particle beam current is measured by the current measuring component 20; when the uniformity of the particle beam is required to be detected, the moving platform 30 moves the beam detection part 10 to a position right below the particle beam, and the beam detection part detects the uniformity of the particle beam.

Therefore, the technical effect that the beam current detection part 10 and the current measurement part 20 can be borne and the beam current detection part 10 and the current measurement part 20 are driven to move is achieved through the product structure.

Optionally, the method further comprises: and a reference source 40, wherein the reference source 40 is disposed above the beam current detecting part 10 and the current measuring part 20, and emits the electron beam current to the beam current detecting part 10 and the current measuring part 20, respectively.

Specifically, fig. 8 is a schematic diagram of a test of a particle beam as a test object according to an embodiment of the present application. FIG. 9 is a schematic illustration of the calibration of the CCD layer 120 readings using a reference source 40 according to one embodiment of the present application; FIG. 10 is a schematic diagram of a reference source 40 according to one embodiment of the present application. Referring to fig. 9 and 10, a reference source 40 is further provided above the beam current detecting part 10 and the current measuring part 20. The reference source 40 can emit the electron beam to the beam detecting part 10 and the current measuring part 20, respectively.

Referring to fig. 8, when an operator needs to read a current value of a particle beam and observe uniformity of a beam spot of the particle beam using the particle beam test apparatus, the particle beam test apparatus needs to be calibrated in advance. The method for calibrating the particle beam current testing device comprises the following steps: the operator places the reference source 40 directly above the current measuring part 20, and the reference source 40 emits the electron beam current toward the current measuring part 20. The moving platform 30 is adjusted in accordance with the range of the current value of the particle beam obtained when the particle beam is roughly measured, and the current value of the particle beam measured by the current measuring unit 20 is recorded.

After the current value of the electron beam is measured, the beam detection part 10 is moved to the position right below the reference source 40 by using the moving platform 30, and the reference source 40 emits the electron beam to the beam detection part 10. Since the aperture size of the first diaphragm hole 131 of the diaphragm layer 130 is the same as the aperture size of the second diaphragm hole 211 of the current limiting diaphragm 210, the two-dimensional measurement data of the single-particle beam spot irradiated onto the CCD layer 120 corresponds to the current value of the electron beam measured by the current measuring part 20. Wherein, the particle beam passes through the single first diaphragm aperture 131 to form a single particle beam spot on the CCD layer 120, and the two-dimensional measurement data may be a pixel value of the single particle beam spot on the CCD layer 120.

The operator can obtain a relationship curve of the current value and the two-dimensional measurement data by appropriately adjusting the magnitude of the current value of the electron beam emitted from the reference source 40 and repeating the above operation. The current value of the particle beam can be measured by using the relationship curve.

For example, if the operator needs to measure the beam current value of the particle beam emitted from a particle beam source and also needs to observe the uniformity of the beam spot of the particle beam, the beam detection unit 10 is moved below the particle beam source. And receives a particle beam emitted from a particle beam source, which is capable of forming a plurality of single particle beam spots on the CCD layer 120 through the plurality of first diaphragm holes 131. The operator can observe the uniformity of the beam spot of the particle beam according to the two-dimensional distribution diagram of the plurality of single-particle beam spots, and can obtain the beam current value of the particle beam according to the relation curve of the current value-two-dimensional measurement data and the obtained two-dimensional measurement data.

As another example, referring to FIG. 5, the pixel value of each hole on the grid corresponds to a particular gray scale information. For example, normalizing a value x between 0 and 1, so that a fitting function between the beam value and the normalized value x can be obtained: y = kx + b. y represents the beam flow value of one hole on the grid. The beam value of the aperture of each multi-aperture stop 420 is equal to the sum of the beam values of each aperture on the grid. The beam current value of the particle beam is equal to the superposition of the beam current values of the plurality of diaphragm apertures of the multi-aperture diaphragm 420. Therefore, the distribution of the beam current of the particle beam can be further determined according to the magnitude of the current value of each hole on the grid.

Therefore, the technical effects of rapidly measuring the beam current value of the particle beam and further determining the distribution of the particle beam current can be achieved through the product structure.

Optionally, the reference source 40 comprises: the electron source 410, the multi-aperture stop 420 and the compression mirror 430, wherein the electron source 410 is arranged above the multi-aperture stop 420 and provides a stable electron beam current; the multi-aperture stop 420 is disposed between the electron source 410 and the compression mirror 430, the multi-aperture stop 420 is capable of lateral movement, and the apertures of the multi-aperture stop 420 are different in size; and a compression mirror 430 for controlling the density of the electron beam stream.

Specifically, referring to fig. 9, the reference source 40 further includes an electron source 410, an aperture 420, and a compression mirror 430. The electron source 410 is disposed above the aperture stop 420, and the electron source 410 is capable of emitting an electron beam current. The multi-aperture diaphragm 420 is disposed between the electron source 410 and the compression mirror 430, the multi-aperture diaphragm 420 is provided with a plurality of diaphragm apertures different in aperture size, and the multi-aperture diaphragm 420 is capable of lateral movement. When the multi-aperture diaphragm 420 moves in the transverse direction, the aperture size of the diaphragm hole is different, and the field angle of the electron beam passing through the diaphragm hole is also different. A compression mirror 430 is further disposed below the multi-aperture stop 420, and a coil is installed inside the compression mirror 430, and the coil can drive the compression mirror 430 to move, so that the compression mirror 430 can control the density of the electron beam flow.

Therefore, the technical effects of adjusting the size of the electron beam, the field angle of the electron beam and the density of the electron beam can be achieved through the product structure.

Optionally, the reference source 40 further comprises: a collimating diaphragm 440 and a limiting diaphragm 450, wherein the collimating diaphragm 440 is disposed between the compression mirror 430 and the limiting diaphragm 450 for collimating the electron beam; and a limiting diaphragm 450 for adjusting the diameter of the beam spot of the electron beam.

Specifically, referring to FIG. 9, the reference source 40 further includes a collimating diaphragm 440 and a limiting diaphragm 450. The collimating aperture 440 is mainly used to collimate the electron beam. The limiting diaphragm 450 is mainly used to control the diameter of the beam spot of the electron beam.

Therefore, the technical effects of collimating the electron beam and controlling the diameter of the electron beam spot are achieved through the product structure.

Optionally, one end of the CCD layer 120 is connected to the CCD readout circuit 50, wherein the CCD readout circuit 50 is used to amplify the electrical signal of the CCD layer 120 and filter noise.

The utility model discloses be provided with the beam current detection part, the beam current detection part includes scintillator layer and CCD layer. The scintillator layer converts a beam signal of a particle beam as a test object into an optical signal. The CCD layer converts the optical signal into an electric signal, and forms a two-dimensional distribution map of a beam spot of a particle beam as a test object. And because the beam spot of the particle beam on the two-dimensional distribution map can be received by a plurality of pixels, the operator can obtain the uniformity of the beam spot of the particle beam according to the two-dimensional distribution map. Therefore, the technical effect of detecting the uniformity of the beam spot of the particle beam is achieved through the product structure. The technical problem that the existing testing method in the prior art can only measure the current value of the particle beam and cannot detect the uniformity of the particle beam spot, so that the design and production of the particle source cannot be helped is solved.

Unless specifically stated otherwise, the relative arrangement of the components and steps, the numerical expressions, and numerical values set forth in these embodiments do not limit the scope of the present invention. Meanwhile, it should be understood that the sizes of the respective portions shown in the drawings are not drawn in an actual proportional relationship for the convenience of description. Techniques, methods, and apparatus known to those of ordinary skill in the relevant art may not be discussed in detail but are intended to be part of the specification where appropriate. In all examples shown and discussed herein, any particular value should be construed as merely illustrative, and not limiting. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, further discussion thereof is not required in subsequent figures.

For ease of description, spatially relative terms such as "over … …", "over … …", "over … …", "over", etc. may be used herein to describe the spatial positional relationship of one device or feature to another device or feature as shown in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if a device in the figures is turned over, devices described as "above" or "on" other devices or configurations would then be oriented "below" or "under" the other devices or configurations. Thus, the exemplary term "above … …" may include both orientations of "above … …" and "below … …". The device may be otherwise variously oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.

In the description of the present invention, it should be understood that the orientation or positional relationship indicated by the orientation words such as "front, back, up, down, left, right", "horizontal, vertical, horizontal" and "top, bottom" etc. are usually based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplification of description, and in the case of not making a contrary explanation, these orientation words do not indicate and imply that the device or element referred to must have a specific orientation or be constructed and operated in a specific orientation, and therefore, should not be interpreted as limiting the scope of the present invention; the terms "inner and outer" refer to the inner and outer relative to the profile of the respective component itself.

The above description is only for the preferred embodiment of the present application, but the scope of the present application is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present application should be covered within the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.

Claims (8)

1. A particle beam current measuring device, comprising: a beam detecting section (10), wherein

The beam detection unit (10) includes: a scintillator layer (110) and a CCD layer (120), and wherein

The scintillator layer (110) is arranged above the CCD layer (120), and a certain gap is arranged between the scintillator layer (110) and the CCD layer (120);

the scintillator layer (110) converts a beam signal of a particle beam into an optical signal and transmits the optical signal to the CCD layer (120); and

the CCD layer (120) converts the optical signal into an electrical signal and forms a two-dimensional distribution map of the particle beam spot.

2. The particle beam current testing apparatus as claimed in claim 1, wherein said current detecting part (10) further comprises: an aperture layer (130), wherein

The diaphragm layer (130) is arranged above the scintillator layer (110), and a certain gap is arranged between the diaphragm layer (130) and the scintillator layer (110); and

the diaphragm layer (130) is provided with a plurality of first diaphragm holes (131) at equal intervals, and the sizes of the first diaphragm holes (131) are the same.

3. The particle beam current testing apparatus according to claim 2, further comprising: a current measuring part (20), wherein

The current measuring part (20) includes: a current limiting diaphragm (210) and a Faraday cup (220), and wherein

The current limiting diaphragm (210) is arranged above the Faraday cup (220); and

the current limiting diaphragm (210) is provided with a second diaphragm hole (211), and the size of the second diaphragm hole (211) is the same as that of the first diaphragm hole (131).

4. The particle beam current testing apparatus according to claim 3, further comprising: a mobile platform (30), wherein

The mobile platform (30) is arranged below the beam current detection component (10) and the current measurement component (20) and is used for driving the beam current detection component (10) and the current measurement component (20) to move.

5. The particle beam current testing apparatus according to claim 3, further comprising: a reference source (40), wherein

The reference source (40) is arranged above the beam current detection part (10) and the current measurement part (20), and emits electron beam current to the beam current detection part (10) and the current measurement part (20) respectively.

6. The particle beam current testing apparatus as claimed in claim 5, wherein the reference source (40) comprises: an electron source (410), an aperture (420) and a compression mirror (430), wherein

The electron source (410) is arranged above the porous diaphragm (420) and provides stable electron beam current;

the multi-aperture diaphragm (420) is arranged between the electron source (410) and the compression mirror (430), the multi-aperture diaphragm (420) is laterally movable, and the apertures of the multi-aperture diaphragm (420) are different in size; and

the compression mirror (430) is used to control the density of the electron beam stream.

7. The particle beam current testing apparatus as defined in claim 6, wherein the reference source (40) further comprises: a collimating diaphragm (440) and a limiting diaphragm (450), wherein

The collimating diaphragm (440) is disposed between the compression mirror (430) and the limiting diaphragm (450) for collimating the electron beam; and

the limiting diaphragm (450) is used for adjusting the diameter of the beam spot of the electron beam.

8. Particle beam testing device according to claim 1, wherein one end of the CCD layer (120) is connected to a CCD readout circuit (50), wherein the CCD readout circuit (50) is adapted to amplify the electrical signals of the CCD layer (120) and to filter noise.

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