CN217628637U - Pretreatment device for copper strip special for semiconductor separator - Google Patents
Pretreatment device for copper strip special for semiconductor separator Download PDFInfo
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- CN217628637U CN217628637U CN202220473420.1U CN202220473420U CN217628637U CN 217628637 U CN217628637 U CN 217628637U CN 202220473420 U CN202220473420 U CN 202220473420U CN 217628637 U CN217628637 U CN 217628637U
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- pickling
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- rapid draing
- copper strip
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Abstract
The utility model provides a pretreatment device of a copper strip special for a semiconductor separator, which comprises a pickling tank, a washing tank and a quick drying chamber, wherein an pickling roller is arranged in the pickling tank, and a cleaning cotton cloth is arranged between the pickling roller and a guide roller group; a washing tank is arranged on the right side of the pickling tank, a pair of cleaning and acid removing rollers are arranged in the washing tank, a plurality of water spraying ports are formed in the outer surfaces of the cleaning and acid removing rollers and communicated with shafts of the cleaning and acid removing rollers, a sponge layer is wrapped and fixed on the outer surface of the cleaning and acid removing rollers, and a water removing sponge is arranged on the right side of the cleaning and acid removing rollers; wash basin right side is equipped with the rapid draing room, has the spiral baffle in the rapid draing room, and both ends are the toper about the rapid draing room, and rapid draing room left side toper lower extreme is equipped with the air intake, and rapid draing room right side toper upper end is equipped with the air exit. The utility model discloses can accurate control pickle's composition, concentration, clear away the pickle more thoroughly, copper strips drying process is efficient, effectively improves the performance, the quality of copper strips after the pickling.
Description
Technical Field
The utility model belongs to the technical field of copper strips processing machinery, a preceding processing apparatus of special copper strips of semiconductor separator is related to.
Background
The copper strip is a metal element, is mainly used for producing electric appliance elements, lamp caps, battery caps, buttons, sealing elements and connectors, and is mainly used as an electric conduction, heat conduction and corrosion resistance device. Such as electric components, switches, gaskets, electric vacuum devices, radiators, conductive base materials, automobile water tanks, radiating fins, cylinder plates and other parts.
Acid washing: the method of removing impurities such as oil stains, oxide scales, rust on the surface of a metal using an acid solution is called pickling. Is a method for cleaning metal surfaces. The article is generally immersed in an aqueous solution of sulfuric acid or the like to remove a thin film of oxide or the like on the metal surface. The method is a pretreatment or intermediate treatment of processes such as electroplating, enamel, rolling and the like. The surface of the copper strip after acid pickling treatment is clean and bright, and the corrosion resistance of the copper strip can be effectively improved.
Nowadays, with the development of society, copper strips are widely applied to some high-precision semiconductors and components, and in order to not influence the service performance of the semiconductors and the components, the control on the components, the concentration and the like of a copper strip pickling solution is relatively strict. If the copper strip is not completely removed by the residual pickling solution, other parts in the semiconductor are also corroded. Meanwhile, according to different purposes of semiconductors and components, other metals such as nickel plating, silver plating, tin plating and the like need to be plated on the copper strip in the following process, and the quality of the metal plating layer can be affected by the residue and incomplete drying of the pickling solution on the copper strip. However, the existing equipment has the problems of poor control of the components and concentration of the pickling solution, incomplete cleaning of the pickling solution, low copper strip drying efficiency and the like. Therefore, there is a need for an improved copper strip pretreatment apparatus.
SUMMERY OF THE UTILITY MODEL
The utility model aims at having the above-mentioned problem to current technique, provided a pretreatment device of the special copper strips of semiconductor separator, solved above-mentioned existence problem.
The purpose of the utility model can be realized by the following technical proposal: a pretreatment device for a copper strip special for a semiconductor separator comprises a pickling tank, a washing tank and a quick drying chamber, wherein an pickling roller is arranged in the pickling tank, the lower end of the pickling roller is soaked in pickling liquid, a guide roller set is arranged on the left side of the pickling roller, a guide roller set is arranged on the right side of the pickling roller, and cleaning cotton cloth is arranged between the pickling roller and the guide roller set;
the pickling tank is characterized in that a washing tank is arranged on the right side of the pickling tank, an inlet I is formed in the left side of the washing tank, an outlet I is formed in the right side of the washing tank, a pair of cleaning and acid removing rollers are arranged in the washing tank, shafts of the cleaning and acid removing rollers are hollow, the cleaning and acid removing rollers are connected with a water inlet pipe through the shafts, a plurality of water spray nozzles are formed in the outer surfaces of the cleaning and acid removing rollers and communicated with the shafts of the cleaning and acid removing rollers, a sponge layer is wrapped and fixed on the outer surfaces of the cleaning and acid removing rollers, and a water removing sponge is arranged on the right side of the cleaning and acid removing rollers;
wash basin right side is equipped with the rapid draing room, open in the rapid draing room left side has import two, and open in the rapid draing room right side has export two, has the spiral baffle in the rapid draing room, and both ends are the toper about the rapid draing room, and rapid draing room left side toper lower extreme is equipped with the air intake, and rapid draing room right side toper upper end is equipped with the air exit, and the rapid draing room left side is equipped with backing roll one, and the rapid draing room right side is equipped with backing roll two.
The copper strip penetrates through the lower end of the pickling roller and is soaked in the pickling solution for pickling treatment, and the cleaning cotton cloth is used for preliminarily removing the impurities such as the redundant pickling solution, oil stains, oxide scales and rusty materials on the copper strip. The cleaning acid removal roller is used for removing and neutralizing residual pickling solution on the copper strip, and the water removal sponge is used for further removing impurities such as pickling solution, oil stain, oxide skin, rusty substance and the like and carrying out primary drying treatment on the copper strip. Have the spiral baffle in the rapid draing room, the dry wind that blows out from the air intake advances along spiral baffle, can prolong the time that dry wind stayed in the drying chamber and the length that passes through for dry wind more fully with the steam contact on the copper strips, last steam rises and goes out from the air exit, makes the drying more thoroughly, efficiency is higher.
Preferably, the sponge layer and the water removal sponge are made of low-density polyether non-absorbent sponge. The sponge layer is made of low-density polyether non-absorbent sponge, dirt such as oil stain, rust and oxide skin on the copper strip can be effectively removed, neutralized pickling solution can be effectively removed, and the water removal sponge is made of low-density polyether non-absorbent sponge, so that residual water on the copper strip can be effectively wiped.
Preferably, a drain pipe is arranged at the bottom of the washing pool, and a first electromagnetic valve is arranged on the drain pipe. The bottom of the washing pool is connected with wastewater from the cleaning acid removing roller, and when the wastewater in the washing pool reaches a certain degree, the wastewater can be discharged to a special wastewater pipeline in time through a solenoid valve and a water discharge pipe.
Preferably, a ph detector is arranged in the pickling tank. The ph detector can monitor the concentration of the pickling solution in real time, and timely, effectively and accurately adjust the pickling solution for copper strips with different components and different purposes.
Preferably, an acid liquor supply tank is arranged on the left side of the pickling tank and is connected with the pickling tank through a supply pipe, and a second electromagnetic valve is arranged on the supply pipe. The acid liquor supply tank can be used for supplementing water to copper strips with different components and different purposes according to acid washing liquid information on the ph detector, the concentration of the acid washing liquid is increased through the second electromagnetic valve, and the acid washing liquid can be supplemented in time when the acid washing liquid is reduced.
Preferably, the right side of the pickling tank is connected with a balance water supply pipe, and the balance water supply pipe is provided with a third electromagnetic valve. The balanced water supply pipe can supplement water for copper strips with different components and different purposes according to the pickling solution information on the ph detector, and is used for adjusting the concentration of the balanced pickling solution.
Preferably, a baffle is arranged between the cleaning and acid-removing roller and the water-removing sponge, and a material passing hole is formed in the baffle. The water and the dewatering sponge of the neutralized pickling solution sprayed by the cleaning and deacidifying roller are separated by the baffle plate, so that the subsequent treatment is prevented from being polluted by the pickling solution.
Preferably, the thickness of the sponge layer is 1-3mm greater than the height of the water spray nozzle. The water jet can spray neutralizing water with alkalescence, the sponge layer has certain elasticity, and the sponge layer can be tightly attached to the copper strip and scrape the copper strip, so that the neutralizing water can be more uniform and thoroughly neutralize the pickling solution on the copper strip, and the copper strip is prevented from being in contact with the water jet to scrape the copper strip.
Compared with the prior art, the utility model has the advantages of it is following:
1. the control of the components and the concentration of the pickling solution is more determined;
2. after the copper strip is washed by acid, the acid washing liquid is removed more thoroughly without residue;
3. after the copper strip is acid-washed, the copper strip is dried more quickly and thoroughly;
4. the cleaning agent can thoroughly clean impurities such as oil stain, oxide skin and rusty substance on the copper strip, and effectively improve the performance and quality of the copper strip after pickling.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention.
FIG. 2 is a schematic sectional view of the cleaning and acid-removing roll.
In the figure, 1, a pickling bath; 11. an acid leaching roller; 12. acid washing solution; 13. a guide roller set; 14. a guide-out roller set; 15. cleaning cotton cloth; 16. a ph detector; 17. an acid liquor supply tank; 18. a supply pipe; 181. a second electromagnetic valve; 19. a balanced feed pipe; 191. a third electromagnetic valve; 2. a water washing pool; 21. an inlet I; 22. an outlet I; 23. cleaning the acid removing roller; 231. a water jet; 232. a sponge layer; 24. a water inlet pipe; 25. dewatering sponge; 26. a drain pipe; 261. a first electromagnetic valve; 27. a baffle plate; 271. a material passing hole; 3. a rapid drying chamber; 31. an inlet II; 32. an outlet II; 33. a spiral partition plate; 34. an air inlet; 35. an air outlet; 4. a first supporting roller; 5. and supporting the roller II.
Detailed Description
The following are specific embodiments of the present invention and the accompanying drawings are used to further describe the technical solution of the present invention, but the present invention is not limited to these embodiments.
As shown in fig. 1 and fig. 2, a pretreatment device for a copper strip special for a semiconductor separator comprises a pickling tank 1, a rinsing tank 2 and a quick drying chamber 3, wherein an pickling roller 11 is arranged in the pickling tank 1, the lower end of the pickling roller 11 is soaked in a pickling solution 12, a guide roller set 13 is arranged on the left side of the pickling roller 11, a guide roller set 14 is arranged on the right side of the pickling roller 11, and a cleaning cotton cloth 15 is arranged between the pickling roller 11 and the guide roller set 14;
the pickling tank 1 is characterized in that a washing tank 2 is arranged on the right side of the pickling tank 1, an inlet 21 is formed in the left side of the washing tank 2, an outlet 22 is formed in the right side of the washing tank 2, a pair of washing and acid removing rollers 23 are arranged in the washing tank 2, shafts of the washing and acid removing rollers 23 are hollow, the shafts of the washing and acid removing rollers 23 are connected with a water inlet pipe 24, a plurality of water spray ports 231 are formed in the outer surface of the washing and acid removing rollers 23, the water spray ports 231 are communicated with the shafts of the washing and acid removing rollers 23, a sponge layer 232 is wrapped and fixed on the outer surface of the washing and acid removing rollers 23, and a water removing sponge 25 is arranged on the right side of the washing and acid removing rollers 23;
2 right sides in washing pond are equipped with rapid draing room 3, open in 3 left sides in rapid draing room has two 31 imports, and open in 3 right sides in rapid draing room has two 32 exports, has spiral baffle 33 in the rapid draing room 3, and both ends are the toper about rapid draing room 3, and 3 left side toper lower extremes in rapid draing room are equipped with air intake 34, and 3 right side toper upper ends in rapid draing room are equipped with air exit 35, and 3 left sides in rapid draing room are equipped with backing roll one 4, and the rapid draing room right side is equipped with backing roll two 5.
The sponge layer 232 and the water removal sponge 25 are made of low-density polyether non-absorbent sponge.
And a drain pipe 26 is arranged at the bottom of the washing pool 2, and a first electromagnetic valve 261 is arranged on the drain pipe 26.
A ph detector 16 is arranged in the pickling tank 1.
An acid liquor supply tank 17 is arranged on the left side of the pickling tank 1, the acid liquor supply tank 17 is connected with the pickling tank 1 through a supply pipe 18, and a second electromagnetic valve 181 is arranged on the supply pipe 18.
The right side of the pickling tank 1 is connected with a balance water supply pipe 19, and the balance water supply pipe 19 is provided with a third electromagnetic valve 191.
A baffle 27 is arranged between the cleaning and deacidification roller 23 and the dewatering sponge 25, and a material passing hole 271 is formed in the baffle 27.
The thickness of the sponge layer 232 is 1-3mm greater than the height of the water spray 231.
The utility model discloses the theory of operation: the copper strips at first gets into pickling bath 1 from the left side, pass from pickling roller 11 lower extreme through guide roll set 13 and soak and carry out the pickling in pickle 12 and handle, clean through clean cotton 15 afterwards, rethread derivation roll set 14, get into rinsing bath 2 from import one 21, remove the pickle through washing deacidification roller 23 and handle the back, behind material passing hole 271 on baffle 27, through the dewatering processing of dewatering sponge 25, go out from export one 22 and get into quick drying chamber 3 internal drying process after through backing roll one 4, go out from export two 32 at last and accomplish whole processes through backing roll two 5.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications, additions and substitutions may be made by those skilled in the art to the specific embodiments described without departing from the spirit of the invention or exceeding the scope of the invention as defined in the accompanying claims.
Claims (8)
1. A pretreatment device of a copper strip special for a semiconductor separator is characterized by comprising a pickling tank, a washing tank and a quick drying chamber, wherein an pickling roller is arranged in the pickling tank, the lower end of the pickling roller is soaked in pickling liquid, a guide roller set is arranged on the left side of the pickling roller, a guide roller set is arranged on the right side of the pickling roller, and a cleaning cotton cloth is arranged between the pickling roller and the guide roller set;
the pickling tank is characterized in that a washing tank is arranged on the right side of the pickling tank, an inlet I is formed in the left side of the washing tank, an outlet I is formed in the right side of the washing tank, a pair of cleaning and acid removing rollers are arranged in the washing tank, shafts of the cleaning and acid removing rollers are hollow, the cleaning and acid removing rollers are connected with a water inlet pipe through the shafts, a plurality of water spray nozzles are formed in the outer surfaces of the cleaning and acid removing rollers and communicated with the shafts of the cleaning and acid removing rollers, a sponge layer is wrapped and fixed on the outer surfaces of the cleaning and acid removing rollers, and a water removing sponge is arranged on the right side of the cleaning and acid removing rollers;
washing pond right side is equipped with the rapid draing room, open in rapid draing room left side has import two, and open in rapid draing room right side has export two, has spiral baffle in the rapid draing room, and both ends are the toper about the rapid draing room, and rapid draing room left side toper lower extreme is equipped with the air intake, and rapid draing room right side toper upper end is equipped with the air exit, and the rapid draing room left side is equipped with backing roll one, and the rapid draing room right side is equipped with backing roll two.
2. The pretreatment device of the copper strip specially used for the semiconductor separator according to claim 1, wherein the sponge layer and the water removal sponge are made of low-density polyether non-absorbent sponge.
3. The pretreatment device for the copper strip special for the semiconductor separator according to claim 1, wherein a drain pipe is arranged at the bottom of the rinsing bath, and a first electromagnetic valve is arranged on the drain pipe.
4. The pretreatment device for the copper strip special for the semiconductor separator according to claim 1, wherein a ph detector is arranged in the pickling tank.
5. The pretreatment device for the copper strip specially used for the semiconductor separator as claimed in claim 4, wherein an acid liquor supply tank is arranged at the left side of the pickling tank, the acid liquor supply tank is connected with the pickling tank through a supply pipe, and a second electromagnetic valve is arranged on the supply pipe.
6. The pretreatment device for the copper strip specially used for the semiconductor separator as claimed in claim 5, wherein a balance water supply pipe is connected to the right side of the pickling tank, and a third electromagnetic valve is arranged on the balance water supply pipe.
7. The pretreatment device for the copper strip specially used for the semiconductor separator according to claim 1, wherein a baffle is arranged between the cleaning acid removal roller and the water removal sponge, and a material passing hole is formed in the baffle.
8. The pretreatment device of the copper strip specially used for the semiconductor separator as claimed in claim 1, wherein the thickness of the sponge layer is 1-3mm greater than the height of the water jet.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220473420.1U CN217628637U (en) | 2022-03-04 | 2022-03-04 | Pretreatment device for copper strip special for semiconductor separator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220473420.1U CN217628637U (en) | 2022-03-04 | 2022-03-04 | Pretreatment device for copper strip special for semiconductor separator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217628637U true CN217628637U (en) | 2022-10-21 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220473420.1U Active CN217628637U (en) | 2022-03-04 | 2022-03-04 | Pretreatment device for copper strip special for semiconductor separator |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217628637U (en) |
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2022
- 2022-03-04 CN CN202220473420.1U patent/CN217628637U/en active Active
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