CN217369450U

CN217369450U - Cleaning rack for processing semiconductor element

Info

Publication number: CN217369450U
Application number: CN202220614384.6U
Authority: CN
Inventors: 徐宏进
Original assignee: Yangzhou Guorun Semiconductor Technology Co ltd
Current assignee: Yangzhou Guorun Semiconductor Technology Co ltd
Priority date: 2022-03-21
Filing date: 2022-03-21
Publication date: 2022-09-06
Anticipated expiration: 2032-03-21

Abstract

The utility model relates to a semiconductor element technical field specifically discloses a wash rack for semiconductor element processing, including the mount, mount top fixed mounting has the back shaft, and the outside fixed mounting of back shaft has the dead lever, and the outside fixed mounting of dead lever has the ring frame, and ring frame inner wall fixed mounting has first recess seat, and the ring frame inner wall runs through installs the slide bar, and slide bar bottom fixed mounting has the second recess seat. The utility model discloses a first recess seat that the ring frame inner wall set up, second recess seat and spring can carry out the centre gripping fast to semiconductor brilliant plectane fixed, the motor can regularly drive back shaft rotating and set for the angle, when the ring frame that accompanies semiconductor brilliant plectane rotates to first distance sensor dead ahead, can open the water pump automatically, two shower heads can wash the two sides of semiconductor brilliant plectane, when the inside no semiconductor element of ring frame, first distance sensor can not detect the object, the water pump is closed state, avoid the water resource to take place extravagantly.

Description

Cleaning rack for processing semiconductor element

Technical Field

The utility model relates to a semiconductor element technical field specifically is a wash rack for semiconductor element processing.

Background

The conductivity of a semiconductor element is between a good electric conductor and an insulator, the semiconductor material mostly adopts silicon, germanium or gallium arsenide, specific functions can be completed through the special electric characteristics of the semiconductor material, along with the popularization of chips, the volume of a plurality of processors is greatly reduced, the portability is greatly improved, the chips and parts on the chips are mostly made of the semiconductor material, wherein a semiconductor wafer plate needs to be cleaned before an electric element is assembled, and therefore, a cleaning frame for processing the semiconductor element is provided.

The cleaning frame for processing the semiconductor element comprises a cleaning cavity, wherein the cleaning cavity is of a closed box type cavity structure, an opening and closing door is arranged on the front face of the cleaning cavity, a cleaning frame body is fixedly arranged in the cleaning cavity, a quadrilateral fixing frame is arranged on the cleaning frame body, a first clamping block and a second clamping block are arranged on the quadrilateral fixing frame and used for fixing the semiconductor element, the cleaning cavity is located on the upper side and the lower side of the quadrilateral fixing frame and is tiled along the horizontal direction to form an upper cleaning pipe and a lower cleaning pipe, and a C-shaped clamping groove of the first clamping block and the second clamping block is arranged in a longitudinally penetrating mode.

In the process of implementing the present invention, the inventor finds that at least the following problems in the prior art are not solved; above-mentioned device carries out spacing fixed through the mode of bolt to the semiconductor board, and is fixed although stable, but the process of dismouting is comparatively troublesome to when the semiconductor board washes and finishes the back and changes another semiconductor board, need the manual work to close and wash the structure, will open again afterwards and wash the mode, so not only inefficiency, it is comparatively troublesome moreover.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a wash rack for semiconductor element processing has solved the problem that proposes among the background art.

In order to achieve the above object, the utility model provides a following technical scheme: the utility model provides a wash rack for semiconductor element processing, including the mount, mount top fixed mounting has the back shaft, the outside fixed mounting of back shaft has the dead lever, the outside fixed mounting of dead lever has the ring frame, ring frame inner wall fixed mounting has first recess seat, the ring frame inner wall runs through and installs the slide bar, slide bar bottom fixed mounting has second recess seat, the outside fixed mounting of mount has motor and water pump, mount bottom fixed mounting has first support frame, the equal fixed mounting in first support frame inner wall both sides has the shower head, first support frame inner wall fixed mounting has first distance sensor, the outside fixed mounting of mount has the second support frame, the equal fixed mounting in second support frame inner wall both sides has the fan, the outside fixed mounting of fan has second distance sensor.

As an optimized implementation mode of the utility model, the spring is installed to slide bar outside inlay, and the spring is located between ring frame and the second recess seat.

As an optimized embodiment of the utility model, the tee bend body is installed to the output intercommunication of water pump, and the tee bend body is connected with the shower head intercommunication.

As a preferred embodiment of the present invention, a motor shaft of the motor is connected to an outside of the support shaft.

As a preferred embodiment of the utility model, the fan is unanimous with the mounting height of back shaft.

Compared with the prior art, the beneficial effects of the utility model are as follows:

1. the utility model discloses a first recess seat that the ring frame inner wall set up, second recess seat and spring can carry out the centre gripping fast to semiconductor brilliant plectane fixed, the motor can regularly drive back shaft rotating and set for the angle, when the ring frame that accompanies semiconductor brilliant plectane rotates to first distance sensor dead ahead, can open the water pump automatically, two shower heads can wash the two sides of semiconductor brilliant plectane, when the inside no semiconductor element of ring frame, first distance sensor can not detect the object, the water pump is closed state, avoid the water resource to take place extravagantly.

2. The utility model discloses a when accompany the ring frame of the brilliant plectane of semiconductor and rotate to second distance sensor dead ahead, can open the fan automatically, two fans can air-dry the operation to the brilliant plectane outside of semiconductor after wasing, guarantee the aridity of the brilliant plectane of semiconductor, and when the ring frame is inside does not have semiconductor element, the second distance sensor can not detect the object, and the fan is the off-state, avoids the electric energy to take place extravagantly.

Drawings

Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:

FIG. 1 is a front view of a cleaning rack for semiconductor device processing according to the present invention;

FIG. 2 is a schematic view of the inner structure of a ring frame of a cleaning rack for semiconductor device processing according to the present invention;

FIG. 3 is a side view of a cleaning rack for semiconductor device processing in accordance with the present invention;

fig. 4 is a schematic structural diagram of a second supporting frame of a cleaning rack for processing semiconductor devices according to the present invention.

In the figure: 1. a fixed mount; 2. a shower head; 3. a first distance sensor; 4. a support shaft; 5. a first groove seat; 6. a ring frame; 7. fixing the rod; 8. a fan; 9. a second support frame; 10. a second groove seat; 11. a slide bar; 12. a spring; 13. a motor; 14. a first support frame; 15. a three-way pipe body; 16. a water pump; 17. a second distance sensor.

Detailed Description

As shown in fig. 1-4, the utility model provides a technical solution: the utility model provides a wash rack for semiconductor element processing, including mount 1, 1 top fixed mounting of mount has

back shaft

4, 4 outside fixed mounting of back shaft has

dead lever

7, 7 outside fixed mounting of dead lever has

ring frame

6, 6 inner wall fixed mounting of ring frame has

first recess seat

5, 6 inner walls of ring frame run through and install slide bar 11, slide bar 11 bottom fixed mounting has second recess seat 10, 1 outside fixed mounting of mount has motor 13 and water pump 16, 1 bottom fixed mounting of mount has

first support frame

14, 14 inner wall both sides of first support frame all fixed mounting have

shower head

2, 14 inner wall fixed mounting of first support frame have first distance sensor 3, 1 outside fixed mounting of mount has

second support frame

9, 9 inner wall both sides of second support frame all fixed mounting have

fan

8, 8 outside fixed mounting of fan has second distance sensor 17.

In this embodiment, as shown in fig. 1 and 2, the supporting shaft 4 can be driven to rotate by the motor 13 for a set angle, when the ring frame 6 with the semiconductor wafer plate is rotated to the front of the first distance sensor 3, the water pump 16 can be automatically turned on, water is sprayed out from the two spray heads 2 through the three-way pipe 15, the two spray heads 2 can flush the two sides of the semiconductor wafer plate, when no semiconductor element is in the ring frame 6, the first distance sensor 3 cannot detect an object, the water pump 16 is turned off, waste of water resources is avoided, the cleaned semiconductor wafer plate can be rotated along with the rotation of the ring frame 6, when the ring frame 6 with the semiconductor wafer plate is rotated to the front of the second distance sensor 17, the fan 8 can be automatically turned on, the two fans 8 can perform air drying operation on the outside of the cleaned semiconductor wafer plate, and dryness of the semiconductor wafer plate is ensured, when no semiconductor element is arranged in the ring frame 6, the second distance sensor 17 cannot detect an object, and the fan 8 is in a closed state, so that the waste of electric energy is avoided.

In this embodiment, a spring 12 is mounted on the outside of the sliding rod 11, the spring 12 is located between the ring frame 6 and the second recess seat 10, the semiconductor wafer plate is placed between the second recess seat 10 and the first recess seat 5, the second recess seat 10 is released, and the semiconductor wafer plate can be clamped by the resilience of the spring 12.

In this embodiment, three-way pipe body 15 is installed in the output intercommunication of water pump 16, and three-way pipe body 15 is connected with shower head 2 intercommunication, opens water pump 16, and moisture is spout from two shower heads 2 through three-way pipe body 15, and two shower heads 2 can wash the two sides of semiconductor wafer board.

In this embodiment, a motor shaft of the motor 13 is connected to an outside of the supporting shaft 4, and the motor 13 can drive the supporting shaft 4 to rotate by a predetermined angle.

In this embodiment, the mounting heights of the fans 8 and the supporting shaft 4 are the same, and the two fans 8 can perform air drying operation on the outside of the cleaned semiconductor wafer plate, so as to ensure the dryness of the semiconductor wafer plate.

The working principle is as follows: the distance between the second groove seat 10 and the first groove seat 5 can be increased by pressing the second groove seat 10, at the moment, the spring 12 is in a compressed state, the semiconductor wafer plate is placed between the second groove seat 10 and the first groove seat 5, the second groove seat 10 is loosened, the semiconductor wafer plate can be clamped by the resilience force of the spring 12, the support shaft 4 can be driven by the motor 13 to rotate for a set angle, when the ring frame 6 with the semiconductor wafer plate is rotated to the front of the first distance sensor 3, the water pump 16 can be automatically started, water is sprayed out from the two spray heads 2 through the three-way pipe body 15, the two spray heads 2 can wash two sides of the semiconductor wafer plate, when no semiconductor element is arranged in the ring frame 6, the first distance sensor 3 cannot detect the object, the water pump 16 is automatically closed, the cleaned semiconductor wafer plate can rotate along with the rotation of the ring frame 6, when the ring frame 6 with the semiconductor wafer plate is rotated to the front of the second distance sensor 17, can open fan 8 automatically, two fans 8 can carry out the air-dry operation to the semiconductor crystal round plate outside after the washing, guarantee the aridity of semiconductor crystal round plate, and when no semiconductor element when ring frame 6 is inside, second distance sensor 17 can not detect the object, and fan 8 self-closing.

Claims

1. A wash rack for semiconductor component processing, including mount (1), characterized by: the top of the fixing frame (1) is fixedly provided with a supporting shaft (4), the outside of the supporting shaft (4) is fixedly provided with a fixed rod (7), the outside of the fixed rod (7) is fixedly provided with a ring frame (6), the inner wall of the ring frame (6) is fixedly provided with a first groove seat (5), the inner wall of the ring frame (6) is provided with a sliding rod (11) in a penetrating way, the bottom of the sliding rod (11) is fixedly provided with a second groove seat (10), the outside of the fixing frame (1) is fixedly provided with a motor (13) and a water pump (16), the bottom of the fixing frame (1) is fixedly provided with a first supporting frame (14), both sides of the inner wall of the first supporting frame (14) are fixedly provided with spray heads (2), the inner wall of the first supporting frame (14) is fixedly provided with a first distance sensor (3), the outside of the fixing frame (1) is fixedly provided with a second supporting frame (9), the fan (8) is fixedly mounted on two sides of the inner wall of the second supporting frame (9), and a second distance sensor (17) is fixedly mounted outside the fan (8).

2. A cleaning rack for semiconductor component processing according to claim 1, wherein: the spring (12) is mounted on the outer portion of the sliding rod (11) in an embedded mode, and the spring (12) is located between the ring frame (6) and the second groove seat (10).

3. A cleaning rack for semiconductor component processing according to claim 1, wherein: the output end of the water pump (16) is communicated with and provided with a three-way pipe body (15), and the three-way pipe body (15) is communicated and connected with the spray header (2).

4. A cleaning rack for semiconductor component processing according to claim 1, wherein: and a motor shaft of the motor (13) is connected with the outside of the supporting shaft (4).

5. A cleaning rack for semiconductor component processing according to claim 1, wherein: the fan (8) is consistent with the mounting height of the supporting shaft (4).