CN217251099U - Wet process self-cleaning device - Google Patents
Wet process self-cleaning device Download PDFInfo
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- CN217251099U CN217251099U CN202220609201.1U CN202220609201U CN217251099U CN 217251099 U CN217251099 U CN 217251099U CN 202220609201 U CN202220609201 U CN 202220609201U CN 217251099 U CN217251099 U CN 217251099U
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- distribution board
- lifter plate
- sets
- base
- roof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model discloses a wet process self-cleaning device, it includes: base, washing tank, lifter plate, roof, carousel, carrier, gas distribution board and liquid distribution board, the symmetry is provided with two rows of stands on the base, the roof sets up the top at the stand, the lifter plate sets up between roof and base, be provided with the lift drive device who is connected with the lifter plate on the roof, the washing tank sets up on the base and is located the below of lifter plate, be provided with the rotary driving device of directional washing tank downwards on the lifter plate, the carousel sets up in rotary driving device bottom and is located the washing tank top, carrier annular array sets up on the carousel, gas distribution board and liquid distribution board set up in the lifter plate bottom surface and are located the top of carrier, gas distribution board bottom interval is provided with the air nozzle, liquid distribution board bottom interval is provided with the atomizer. Wet process self-cleaning device, promoted cleaning performance and efficiency, the cost is reduced.
Description
Technical Field
The utility model relates to a semiconductor production facility field especially relates to a wet process self-cleaning device.
Background
In the production process of semiconductor workpieces, pollutants are inevitably left on the surfaces of the workpieces, and in order to avoid the pollutants from influencing the performance of the workpieces, the semiconductor workpieces need to be cleaned.
In the prior art, in the process of cleaning a semiconductor workpiece, the final step is cleaning with ultrapure water. Ultrapure water is easily polluted by residual cleaning agents on semiconductor workpieces in a cleaning tank, the actual cleaning effect is influenced, the ultrapure water needs to be frequently replaced, the production efficiency is greatly influenced, the production cost is increased, and the improvement is needed.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a wet process self-cleaning device promotes the cleaning efficiency, reduces the consumption of ultrapure water.
To achieve the purpose, the utility model adopts the following technical proposal:
a wet process automatic cleaning device comprising: base, washing tank, lifter plate, roof, carousel, carrier, gas distribution board and liquid distribution board, the symmetry is provided with two rows of stands on the base, the roof sets up the top at the stand, the lifter plate sets up between roof and base, be provided with the lift drive device who is connected with the lifter plate on the roof, the washing tank sets up on the base and is located the below of lifter plate, be provided with the rotary driving device of directional washing tank downwards on the lifter plate, the carousel sets up in rotary driving device bottom and is located the washing tank top, carrier annular array sets up on the carousel, gas distribution board and liquid distribution board set up in the lifter plate bottom surface and are located the top of carrier, gas distribution board bottom interval is provided with the air nozzle, liquid distribution board bottom interval is provided with the atomizer.
Wherein, be provided with the guiding hole that corresponds with the stand on the lifter plate.
Wherein, the rotary driving device adopts a motor or a rotary cylinder.
Wherein, be provided with the work piece constant head tank on the carrier.
The lifting driving device adopts a hydraulic cylinder or a telescopic cylinder.
And side guard plates which extend upwards and are connected with the corresponding sides of the top plate are respectively arranged on two sides of the base.
The utility model has the advantages that: the utility model provides a wet process self-cleaning device, the carousel has been designed very much, gas distribution board and cloth liquid board, decline through the carousel, dip the semiconductor work piece in carrier and the carrier in the washing tank, wash through the ultrapure water in the washing tank, then rise, break away from the ultrapure water in the washing tank, and it is rotatory, utilize gas distribution board and cloth liquid board blowout air current and clean atomizing ultrapure water simultaneously, then close the cloth liquid board, continue to carry out the drying through gas distribution board blowout air current, make and remain solution thoroughly on the semiconductor work piece and clear away, cleaning performance and efficiency have been promoted, and need not frequently to change the ultrapure water in the washing tank, the cost is reduced.
Drawings
Fig. 1 is a schematic structural diagram of the present invention;
fig. 2 is a schematic view of the structure of the lifting plate of fig. 1 after it is lowered.
Detailed Description
The technical solution of the present invention is further described by the specific embodiment with reference to fig. 1 to fig. 2.
The wet automatic cleaning apparatus shown in fig. 1 includes: base 1, washing tank 2, lifter plate 8, roof 10, carousel 3, carrier 4, gas distribution board 5 and cloth liquid board 6, the symmetry is provided with two rows of stands 9 on the base 1, roof 10 sets up at the top of stand 9, can carry out the fixed of roof 10 through the screw, sound construction.
The lifter plate 8 is arranged between the top plate 10 and the base 1, in this embodiment, the lifter plate 8 is provided with a guide hole corresponding to the upright post 9, and the lifting stability of the lifter plate 8 is improved through the cooperation of the guide hole and the upright post 9.
The top plate 10 is provided with a lifting driving device 11 connected to the lifting plate 8, and as shown in fig. 2, the lifting plate 8 is lowered by extending the lifting driving device 11. The lifting driving device 11 can adopt a hydraulic cylinder or a telescopic cylinder, and is controlled by an electromagnetic valve, so that the telescopic operation is flexible.
The cleaning tank 2 is arranged on the base 1 and located below the lifting plate 8, and ultrapure water is injected into the cleaning tank 2, so that semiconductor workpieces can be conveniently cleaned. The lifting plate 8 is provided with a rotation driving device 12 pointing to the cleaning tank 2 downwards, the turntable 3 is arranged at the bottom of the rotation driving device 12 and located above the cleaning tank 2, in this embodiment, the rotation driving device 12 adopts a motor or a rotating cylinder, and can perform rotation driving of the turntable 3.
The carrier 4 is arranged on the turntable 3 in an annular array mode, the carrier 4 is provided with a workpiece positioning groove, a plurality of semiconductor workpieces can be installed and positioned at the same time, and cleaning efficiency is improved. Gas distribution board 5 and cloth liquid board 6 set up 8 bottom surfaces in the lifter plate and lie in the top of carrier 4, in this embodiment, 5 bottom intervals of gas distribution board are provided with air nozzle 14, and the external compressed gas supply pipe of gas distribution board 5 opens the valve of compressed gas supply pipe, can blow away the remaining solution in semiconductor workpiece surface through the downward blowout air current of air nozzle 14, carries out rapid draing.
The liquid distribution plate 6 bottom interval is provided with atomizer 13, and atomizer 13 external ultrapure water supply pipe opens the valve on the ultrapure water supply pipe, atomizes new ultrapure water and sprays on semiconductor workpiece surface, carries out the washing of remaining pollutant and contaminated ultrapure water, promotes the cleaning efficiency, in addition, need not frequently to change the ultrapure water in washing tank 2, the cost is reduced.
Finally, the ultrapure water supply pipeline externally connected with the liquid distribution plate 6 is closed, and the air flow is continuously sprayed out through the air nozzle 14 for drying, so that the residual solution on the semiconductor workpiece is thoroughly removed. In order to avoid the problem of splashing of the solution in the cleaning process, two sides of the base 1 are respectively provided with a side protection plate 7 which extends upwards and is connected with the corresponding side of the top plate 10 to protect the two sides.
The above description is only for the preferred embodiment of the present invention, and for those skilled in the art, there are variations on the detailed description and the application scope according to the idea of the present invention, and the content of the description should not be construed as a limitation to the present invention.
Claims (6)
1. A wet process automatic cleaning device, characterized by comprising: base, washing tank, lifter plate, roof, carousel, carrier, gas distribution board and liquid distribution board, the symmetry is provided with two rows of stands on the base, the roof sets up the top at the stand, the lifter plate sets up between roof and base, be provided with the lift drive device who is connected with the lifter plate on the roof, the washing tank sets up on the base and is located the below of lifter plate, be provided with the rotary driving device of directional washing tank downwards on the lifter plate, the carousel sets up in rotary driving device bottom and is located the washing tank top, carrier annular array sets up on the carousel, gas distribution board and liquid distribution board set up in the lifter plate bottom surface and are located the top of carrier, gas distribution board bottom interval is provided with the air nozzle, liquid distribution board bottom interval is provided with the atomizer.
2. The wet automatic cleaning device according to claim 1, wherein the lifting plate is provided with a guide hole corresponding to the column.
3. The wet automatic cleaning device according to claim 1, wherein the rotation driving device employs a motor or a rotary cylinder.
4. The wet automatic cleaning device according to claim 1, wherein a workpiece positioning groove is provided on the carrier.
5. The wet automatic cleaning device according to claim 1, wherein the lifting driving device adopts a hydraulic cylinder or a telescopic cylinder.
6. The wet automatic cleaning device according to claim 1, wherein side guard plates extending upward and connected to corresponding sides of the top plate are respectively provided on both sides of the base.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220609201.1U CN217251099U (en) | 2022-03-21 | 2022-03-21 | Wet process self-cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220609201.1U CN217251099U (en) | 2022-03-21 | 2022-03-21 | Wet process self-cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217251099U true CN217251099U (en) | 2022-08-23 |
Family
ID=82869746
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220609201.1U Active CN217251099U (en) | 2022-03-21 | 2022-03-21 | Wet process self-cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217251099U (en) |
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2022
- 2022-03-21 CN CN202220609201.1U patent/CN217251099U/en active Active
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