CN217247351U - Purification system of acidic raw materials for preparing etching solution - Google Patents
Purification system of acidic raw materials for preparing etching solution Download PDFInfo
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- CN217247351U CN217247351U CN202220123312.1U CN202220123312U CN217247351U CN 217247351 U CN217247351 U CN 217247351U CN 202220123312 U CN202220123312 U CN 202220123312U CN 217247351 U CN217247351 U CN 217247351U
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Abstract
The utility model discloses a configuration etching solution is with purification system of acid raw materials relates to etching solution raw materials purification technical field. The utility model discloses a first head tank, second head tank and nanofiltration device, still include the strip tower, multistage evaporating pot and heat exchanger, through first defeated material tetrafluoro pipe fixed connection between the bottom surface of first head tank and the upper end side of strip tower, through second defeated material tetrafluoro pipe fixed connection between the bottom surface of strip tower and the upper end side of multistage evaporating pot, the top surface of multistage evaporating pot and heat exchanger's feed end pass through third defeated material tetrafluoro pipe fixed connection, through fourth defeated material tetrafluoro pipe fixed connection between heat exchanger's discharge end and the upper end side of second head tank, through fifth defeated material tetrafluoro pipe fixed connection between the bottom surface of second head tank and nanofiltration device's the feed end. The utility model discloses a purification mode is abundant, and purification is effectual, and whole practicality is strong, and the acidizing fluid storage device in this device is anticorrosive effectual simultaneously, long service life.
Description
Technical Field
The utility model belongs to the technical field of the etching solution raw materials purification, especially, relate to a configuration etching solution is with purification system of acid raw materials.
Background
The semiconductor industry includes printed circuit boards, photovoltaics, liquid crystal panels, integrated circuits and the like, in the industrial process flow, common electronic chemicals comprise ammonia water, sulfuric acid, hydrogen peroxide, hydrogen chloride, hydrogen fluoride, ammonium fluoride, fluorine-containing etching solution and the like, and the related electronic chemicals are mainly used in a wet type process workshop in the integrated circuit to carry out wet type process technology, such as photoresistance removing, wet type etching and wet type chemical cleaning, which are the most common processes in the wet type process workshop technology, so the electronic chemicals are also called as wet type chemicals;
in the above industries, because of different industrial product specifications and related processes, the purity of the corresponding electronic chemicals is different, the grade of the highest purity of the electronic chemicals is applied to chip integrated circuits, large-sized integrated circuits (such as 12-inch chips) and the like in the semiconductor industry, the purity of the electronic chemicals, wherein the most important technical indexes are trace metal content and particle number, respectively, the trace metal content is less than 50ppt, the particle number per milliliter is greater than or equal to 0.1 micrometer and not more than 100, the particle diameter in the current industrial grade reaction solution of hydrogen chloride, hydrogen fluoride and nitric acid is greater than 200 nanometers, meanwhile, the particle concentration in the reaction solution is greater than 100 per milliliter, which does not meet the technical indexes, therefore, when the etching solution is configured, the hydrogen chloride, hydrogen fluoride and nitric acid must be purified to ensure that the particle diameter of the prepared etching solution is less than 100 nanometers, meanwhile, the number of the particles is less than 100 particles per milliliter;
however, the existing acid solution purification system for preparing the etching solution still has the following defects in practical use:
1. the existing acid liquid purification system for preparing the etching solution has the problems of unsatisfactory purification effect and single purification process;
2. when the existing acid liquor purification system for etching solution configuration is used, the service life of a storage tank is low because the inner wall of the storage tank for storing the acid liquor is easy to corrode because the acid liquor needs to be heated;
therefore, there is a need for improvement of the prior art to solve the above technical problems.
Disclosure of Invention
An object of the utility model is to provide a configuration etching solution is with purification system of acid feedstock has solved etching solution configuration and has had the unsatisfactory and hold up tank that is used for storing up acid of purification effect in the use of reality of purification system and easily appear corroding the problem.
In order to solve the technical problem, the utility model discloses a realize through following technical scheme:
the utility model relates to a configuration etching solution is with purification system of acid feedstock, including first head tank, second head tank and nanofiltration device, still include strip tower, multistage evaporating pot and heat exchanger, through first defeated material tetrafluoro pipe fixed connection between the bottom surface of first head tank and the upper end side of strip tower, through second defeated material tetrafluoro pipe fixed connection between the bottom surface of strip tower and the upper end side of multistage evaporating pot, the top surface of multistage evaporating pot and the feed end of heat exchanger pass through third defeated material tetrafluoro pipe fixed connection, pass through fourth defeated material tetrafluoro pipe fixed connection between the discharge end of heat exchanger and the upper end side of second head tank, pass through fifth defeated material tetrafluoro pipe fixed connection between the bottom surface of second head tank and the feed end of nanofiltration device;
cooling cavities are formed in the inner side walls of the first raw material tank and the second raw material tank, and heat conduction rings are arranged on the inner side walls of the cooling cavities along the vertical direction in an array manner;
through U-shaped tetrafluoride pipe intercommunication between the cooling chamber of first head tank and second head tank, and all install first solenoid valve on the both ends of U-shaped tetrafluoride pipe, the middle part intercommunication of U-shaped tetrafluoride pipe is provided with second condensation tetrafluoride pipe, a side lower extreme position department of first head tank and second head tank all is provided with the first condenser pipe with cooling chamber intercommunication.
Further, the side upper end position of first head tank is fixedly connected with feeding tetrafluoro pipe still, fixedly connected with ejection of compact tetrafluoro pipe is served in the discharge of nanometer filter equipment, fixed mounting has the second solenoid valve on the ejection of compact tetrafluoro pipe.
Furthermore, a third electromagnetic valve, a first water pump and a serpentine heater are sequentially arranged on the first material conveying tetrafluoride pipe from one side close to the first raw material tank.
Further, fixedly connected with tetrafluoro of giving vent to anger on the top surface of strip tower, fixedly connected with tetrafluoro of admitting air on the lower extreme side of strip tower simultaneously, fixedly mounted has the fourth solenoid valve on the tetrafluoro of giving vent to anger, and fixedly mounted has the fifth solenoid valve on the tetrafluoro of admitting air simultaneously.
Furthermore, a second water pump and a sixth electromagnetic valve are sequentially arranged on the second material conveying tetrafluoride pipe from one side close to the stripping tower.
Furthermore, a seventh electromagnetic valve is fixedly installed on the third material conveying tetrafluoride pipe, and a third water pump is fixedly installed on the fourth material conveying tetrafluoride pipe.
Furthermore, an eighth electromagnetic valve and a fourth water pump are sequentially arranged on the fifth material conveying tetrafluoride pipe from one side close to the second raw material tank.
The utility model discloses following beneficial effect has:
1. the utility model discloses in after the acidizing fluid in the first head tank carries out the one-level purification in the strip tower, carrying out the secondary purification through the multistage evaporating pot, but the content of greatly reduced organic salt and inorganic salt, organic pollutant and granule utilizes the high accurate etching solution formula of this system configuration, can be applied to 12 inches chip integrated circuit products, it is single to have solved current acidizing fluid purification system purification mode for the etching solution configuration, proposes the unsatisfactory problem of effect.
2. The utility model provides a cooling chamber setting in first head tank and the second head tank, in the use of reality, the condensation gas gets into through the second condensation tetrafluoro pipe on the U-shaped tetrafluoro pipe, then flows whole cooling chamber, finally discharges from the first condensation tetrafluoro pipe of cooling chamber lower extreme, realizes cooling down from the lateral wall of first head tank and second head tank, can effectively reduce the acidizing fluid to the degree of corrosion of inside, improves the life of first head tank and second head tank.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a left side view of the structure of FIG. 1 in accordance with the present invention;
fig. 3 is a vertical cross-sectional view of the first material tank and the second material tank of the present invention.
In the drawings, the components represented by the respective reference numerals are listed below:
1. a first raw material tank; 2. a stripping column; 3. a multi-section evaporating pot; 4. a heat exchanger; 5. a second feed tank; 6. a nanofiltration device; 7. a U-shaped tetrafluoride tube; 8. a first material conveying tetrafluoride pipe; 9. a second material conveying tetrafluoride pipe; 10. a third material conveying tetrafluoride pipe; 11. a fourth material conveying tetrafluoride pipe; 12. a fifth material conveying tetrafluoride pipe; 13. a cooling chamber; 14. a heat conducting ring; 15. a first condensation tetrafluoro pipe; 101. a feeding tetrafluoride pipe; 201. an air inlet tetrafluoro pipe; 202. a fifth solenoid valve; 203. an air outlet tetrafluoro pipe; 204. a fourth solenoid valve; 601. discharging the tetrafluoro pipe; 602. a second solenoid valve; 701. a first solenoid valve; 702. a second condensation tetrafluoride pipe; 801. a first water pump; 802. a third electromagnetic valve; 803. a serpentine heater; 901. A second water pump; 902. a sixth electromagnetic valve; 1001. a seventh electromagnetic valve; 1101. a third water pump; 1201. A fourth water pump; 1202. an eighth solenoid valve.
Detailed Description
The technical solution in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.
Referring to fig. 1-2, the present invention relates to a purification system for preparing acidic raw material for etching solution, comprising a first raw material tank 1, a second raw material tank 5, a nano-filtration device 6, a stripping tower 2, the device comprises a multi-section evaporating pot 3 and a heat exchanger 4, wherein the bottom surface of a first raw material pot 1 is fixedly connected with one side surface of the upper end of a stripping tower 2 through a first material conveying tetrafluoride pipe 8, the bottom surface of the stripping tower 2 is fixedly connected with one side surface of the upper end of the multi-section evaporating pot 3 through a second material conveying tetrafluoride pipe 9, the top surface of the multi-section evaporating pot 3 is fixedly connected with the feed end of the heat exchanger 4 through a third material conveying tetrafluoride pipe 10, the discharge end of the heat exchanger 4 is fixedly connected with one side surface of the upper end of a second raw material pot 5 through a fourth material conveying tetrafluoride pipe 11, and the bottom surface of the second raw material pot 5 is fixedly connected with the feed end of a nano-filtration device 6 through a fifth material conveying tetrafluoride pipe 12;
the upper end of the side surface of the first raw material tank 1 is fixedly connected with a feeding tetrafluoride pipe 101, the feeding tetrafluoride pipe 101 is used for feeding acid liquid which is not proposed, the discharging end of the nanofiltration device 6 is fixedly connected with a discharging tetrafluoride pipe 601, a second electromagnetic valve 602 is fixedly installed on the discharging tetrafluoride pipe 601, the discharging tetrafluoride pipe 601 is used for discharging purified acid liquid, the second electromagnetic valve 602 can control the connection and disconnection of the discharging tetrafluoride pipe 601, and the discharging tetrafluoride pipe 601 is matched with an acid mixing tank in actual use;
a third electromagnetic valve 802, a first water pump 801 and a snake-shaped heater 803 are sequentially arranged on the first material conveying tetrafluoride pipe 8 from one side close to the first raw material tank 1, the snake-shaped heater 803 is used for heating acid liquid flowing through, and the third electromagnetic valve 802 is used for controlling the connection and disconnection of the first material conveying tetrafluoride pipe 8;
the top surface of the stripping tower 2 is fixedly connected with an air outlet tetrafluoride pipe 203, the air outlet tetrafluoride pipe 203 is used for discharging gas, and in practical use, an acid gas purification device can be externally connected to realize purification of the discharged gas, meanwhile, the side surface of the lower end of the stripping tower 2 is fixedly connected with an air inlet tetrafluoride pipe 201, the air inlet tetrafluoride pipe 201 is used for blowing gas into the stripping tower 2, a fourth electromagnetic valve 204 is fixedly arranged on the air outlet tetrafluoride pipe 203, the fourth electromagnetic valve 204 is used for controlling on-off of the air outlet tetrafluoride pipe 203, meanwhile, a fifth electromagnetic valve 202 is fixedly arranged on the air inlet tetrafluoride pipe 201, and the fifth electromagnetic valve 202 is used for controlling on-off of the air inlet tetrafluoride pipe 201;
a second water pump 901 and a sixth electromagnetic valve 902 are sequentially arranged on the second material conveying tetrafluoride pipe 9 from one side close to the stripping tower 2, and the sixth electromagnetic valve 902 is used for controlling the on-off of the second material conveying tetrafluoride pipe 9;
a seventh electromagnetic valve 1001 is fixedly installed on the third material conveying tetrafluoro pipe 10, the seventh electromagnetic valve 1001 is used for controlling the on-off of the third material conveying tetrafluoro pipe 10, and a third water pump 1101 is fixedly installed on the fourth material conveying tetrafluoro pipe 11;
an eighth electromagnetic valve 1202 and a fourth water pump 1201 are sequentially arranged on the fifth material conveying tetrafluoro pipe 12 from one side close to the second raw material tank 5, and the eighth electromagnetic valve 1202 is used for controlling the on-off of the fifth material conveying tetrafluoro pipe 12;
when the device is used, a worker firstly stores acid liquor to be extracted in a first raw material tank 1, the acid liquor in the first raw material tank 1 enters a stripping tower 2 through a first material conveying tetrafluoro pipe 8 to be primarily purified through the operation of a first water pump 801, the primarily purified acid liquor enters a multi-section evaporation tank 3 through a second material conveying tetrafluoro pipe 9 to be secondarily concentrated and purified under the operation of a second water pump 901, concentrated acid steam enters a heat exchanger 4 through a third material conveying tetrafluoro pipe 10 to be cooled and liquefied, the concentrated acid steam is pumped into a second raw material tank 5 through a fourth material conveying tetrafluoro pipe 11 to be secondarily stored under the operation of a third water pump 1101, the acid liquor in the second raw material tank 5 is finally pumped into a nano-filtration device 6 through a fifth material conveying tetrafluoro pipe 12 to be filtered under the operation of a fourth water pump 1201, and the filtered acid liquor is discharged through a material tetrafluoro discharge pipe 601, entering a mixed acid process;
in addition, all electrical components of the device are connected with the controller through wires in actual use, and centralized processing by workers is facilitated.
As shown in fig. 2-3, cooling cavities 13 are respectively formed in the side walls of the first material tank 1 and the second material tank 5, and heat conduction rings 14 are respectively arranged on the side walls of the first material tank 1 and the second material tank 5 inside the cooling cavities 13 in an array manner along the vertical direction, and the heat conduction rings 14 are arranged to facilitate heat conduction and improve heat exchange efficiency;
the cooling cavities 13 of the first raw material tank 1 and the second raw material tank 5 are communicated through the U-shaped tetrafluoride tube 7, the two ends of the U-shaped tetrafluoride tube 7 are respectively provided with a first electromagnetic valve 701, the first electromagnetic valves 701 are used for controlling the connection and disconnection of the U-shaped tetrafluoride tube 7, the middle of the U-shaped tetrafluoride tube 7 is communicated with a second condensation tetrafluoride tube 702, the lower end positions of one side surfaces of the first raw material tank 1 and the second raw material tank 5 are respectively provided with a first condensation tetrafluoride tube 15 communicated with the cooling cavities 13, and the second condensation tetrafluoride tube 702 and the first condensation tetrafluoride tube 15 are both connected with a condenser to realize the circulation of condensed gas;
when the arrangement is used, the condensed gas enters the U-shaped tetrafluoride pipe 7 through the second condensed tetrafluoride pipe 702, and enters the cooling cavity 13 of the first raw material tank 1 or/and the second raw material tank 5 as required, and the condensed gas entering the cooling cavity 13 flows through the cooling cavity 13 and is finally discharged from the first condensed tetrafluoride pipe 15.
The above is only the preferred embodiment of the present invention, and the present invention is not limited thereto, any technical solutions recorded in the foregoing embodiments are modified, and some technical features thereof are replaced with equivalent ones, and any modification, equivalent replacement, and improvement made thereby all belong to the protection scope of the present invention.
Claims (7)
1. The utility model provides a configuration etching solution is with purification system of acid raw materials, includes first head tank (1), second head tank (5) and nanofiltration device (6), its characterized in that: the device is characterized by further comprising a stripping tower (2), a plurality of sections of evaporating tanks (3) and a heat exchanger (4), wherein the bottom surface of the first raw material tank (1) is fixedly connected with one side surface of the upper end of the stripping tower (2) through a first material conveying tetrafluoride pipe (8), the bottom surface of the stripping tower (2) is fixedly connected with one side surface of the upper end of the plurality of sections of evaporating tanks (3) through a second material conveying tetrafluoride pipe (9), the top surface of the plurality of sections of evaporating tanks (3) is fixedly connected with the feed end of the heat exchanger (4) through a third material conveying tetrafluoride pipe (10), the discharge end of the heat exchanger (4) is fixedly connected with one side surface of the upper end of the second raw material tank (5) through a fourth material conveying tetrafluoride pipe (11), and the bottom surface of the second raw material tank (5) is fixedly connected with the feed end of the nano filtering device (6) through a fifth material conveying tetrafluoride pipe (12);
cooling cavities (13) are respectively arranged in the side walls of the first raw material tank (1) and the second raw material tank (5), and heat conduction rings (14) are respectively arranged on the side walls of the first raw material tank (1) and the second raw material tank (5) at the inner sides of the cooling cavities (13) in an array manner along the vertical direction;
through U-shaped tetrafluoro pipe (7) intercommunication between cooling chamber (13) of first head tank (1) and second head tank (5), and all install first solenoid valve (701) on the both ends of U-shaped tetrafluoro pipe (7), the middle part intercommunication of U-shaped tetrafluoro pipe (7) is provided with second condensation tetrafluoro pipe (702), a side lower extreme position department of first head tank (1) and second head tank (5) all is provided with first condensation tetrafluoro pipe (15) with cooling chamber (13) intercommunication.
2. The purification system for acidic raw material configured for etching solution according to claim 1, wherein a feeding tetrafluoro pipe (101) is further fixedly connected to an upper end position of a side surface of the first raw material tank (1), a discharging tetrafluoro pipe (601) is fixedly connected to a discharging end of the nano-filtration device (6), and a second electromagnetic valve (602) is fixedly installed on the discharging tetrafluoro pipe (601).
3. The system for purifying acidic raw material for preparing etching solution as claimed in claim 2, wherein said first material transporting tetrafluoride pipe (8) is provided with a third electromagnetic valve (802), a first water pump (801) and a serpentine heater (803) in sequence from a side close to the first raw material tank (1).
4. The purification system for preparing acidic raw material for etching solution according to claim 3, wherein the top surface of the stripping tower (2) is fixedly connected with an outlet tetrafluoride tube (203), the side surface of the lower end of the stripping tower (2) is fixedly connected with an inlet tetrafluoride tube (201), the outlet tetrafluoride tube (203) is fixedly provided with a fourth electromagnetic valve (204), and the inlet tetrafluoride tube (201) is fixedly provided with a fifth electromagnetic valve (202).
5. The system for purifying acidic raw material for preparing etching solution as claimed in claim 4, wherein the second water pump (901) and the sixth electromagnetic valve (902) are sequentially disposed on the second material transporting tetrafluoride pipe (9) from a side close to the stripping column (2).
6. The system for purifying acidic raw material for preparing etching solution as claimed in claim 5, wherein a seventh electromagnetic valve (1001) is fixedly installed on the third material transporting tetrafluoride pipe (10), and a third water pump (1101) is fixedly installed on the fourth material transporting tetrafluoride pipe (11).
7. The system for purifying acidic raw material for preparing etching solution as claimed in claim 6, wherein said fifth transporting tetrafluoro pipe (12) is provided with an eighth solenoid valve (1202) and a fourth water pump (1201) in sequence from a side close to the second raw material tank (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220123312.1U CN217247351U (en) | 2022-01-18 | 2022-01-18 | Purification system of acidic raw materials for preparing etching solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220123312.1U CN217247351U (en) | 2022-01-18 | 2022-01-18 | Purification system of acidic raw materials for preparing etching solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217247351U true CN217247351U (en) | 2022-08-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220123312.1U Active CN217247351U (en) | 2022-01-18 | 2022-01-18 | Purification system of acidic raw materials for preparing etching solution |
Country Status (1)
| Country | Link |
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| CN (1) | CN217247351U (en) |
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2022
- 2022-01-18 CN CN202220123312.1U patent/CN217247351U/en active Active
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