CN217239411U - Automatic photoresist changing system - Google Patents
Automatic photoresist changing system Download PDFInfo
- Publication number
- CN217239411U CN217239411U CN202221115371.0U CN202221115371U CN217239411U CN 217239411 U CN217239411 U CN 217239411U CN 202221115371 U CN202221115371 U CN 202221115371U CN 217239411 U CN217239411 U CN 217239411U
- Authority
- CN
- China
- Prior art keywords
- photoresist
- storage module
- sensor
- module
- pipeline
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The utility model relates to a wafer packaging equipment field especially relates to a photoresist automatic glue changing system, through each parts cooperation in the system, has improved the photoresist and has traded the efficiency of gluing row bubble, removes artifical degree height, can reduce the influence that artifical maloperation brought, guarantees that follow-up encapsulation link goes on smoothly; the glue storage module, the buffer storage module and the glue outlet module are sequentially arranged along the glue outlet direction; the glue storage module is communicated with the buffer storage module; the buffer storage module is communicated with the glue discharging module; a waste discharge and collection module is arranged at the downstream of the buffer storage module; the buffer storage module is communicated with the waste discharge collection module; a flushing pipeline is communicated in the glue storage module, and flushing gas is conveyed in the flushing pipeline under pressure; the system also comprises a first control valve, a second control valve, a first sensor, a second sensor and a third sensor which are in signal connection with the central controller.
Description
Technical Field
The utility model relates to a wafer encapsulation equipment field especially relates to an automatic glue system that trades of photoresist.
Background
Photoresist coating is a key process in a semiconductor packaging photoetching process, when photoresist is coated, a photoresist pump in a photoresist changing system pumps out photoresist in a photoresist storage module for coating, when the photoresist in the photoresist storage module is evacuated, the photoresist changing system needs to be manually closed, switches are sequentially opened for bubble discharging operation after the photoresist storage module is changed, and the switches are sequentially closed after the bubble discharging is finished, so that the process is complicated. Meanwhile, the contact time between the photoresist in the photoresist storage module and air is increased, so that bubbles in the photoresist are increased, the subsequent coating quality of the photoresist is affected by the increase of the bubbles, the packaging yield is affected, and if the manual operation is failed during the replacement of the photoresist, the serious result that the photoresist storage module is broken due to air pollution of a photoresist path or even air pressure backflow is possibly caused.
SUMMERY OF THE UTILITY MODEL
To the not enough that exists among the prior art, the utility model provides an automatic system of trading glue of photoresist passes through each parts cooperation in the system, has improved the efficiency that the photoresist traded the row's of gluing bubble, and it is high to remove artifical degree, can reduce the influence that artifical maloperation brought, guarantees that follow-up encapsulation link goes on smoothly.
According to an embodiment of the utility model, an automatic photoresist changing system comprises a photoresist storage module, a buffer storage module and a photoresist discharging module which are arranged in sequence along the photoresist discharging direction;
the glue storage module is communicated with the buffer storage module through a first communication pipeline; the buffer storage module is communicated with the glue discharging module through a second communication pipeline;
a waste discharge and collection module is arranged at the downstream of the buffer storage module; the buffer storage module is communicated with the waste discharge and collection module through a third communication pipeline;
a flushing pipeline is communicated in the glue storage module, and flushing gas is conveyed in the flushing pipeline under pressure; the flushing pipeline is communicated with the waste discharge and collection module through a first communication pipeline and a third communication pipeline;
a first control valve and a second control valve are respectively arranged on the flushing pipeline and the third communicating pipeline; a first sensor, a second sensor and a third sensor are respectively arranged in the first communicating pipeline, the buffer storage module and the second communicating pipeline;
the system also comprises a central controller; and the first control valve, the second control valve, the first sensor, the second sensor and the third sensor are in signal connection with the central controller respectively.
Preferably, the first control valve and the second control valve are pneumatic control valves.
Preferably, the first sensor and the third sensor are flow sensors or liquid level sensors.
Preferably, the second sensor is a liquid level sensor.
Preferably, the glue discharging module is a vacuum pump.
Preferably, a filter is arranged at the downstream of the glue discharging module along the glue discharging direction.
Preferably, the buffer storage module is a buffer bottle, and the first communication pipeline extends into the buffer bottle and is tightly attached to the inner wall of the buffer bottle.
Preferably, the central controller is further connected with an alarm prompting lamp through signals.
Preferably, a touch display screen is arranged on the central controller.
Preferably, a switch controller is arranged on the central controller; the switch controller is in signal connection with the flushing pipeline.
Compared with the prior art, the utility model discloses following beneficial effect has:
in the bubble removing process after the photoresist is replaced, the components participating in the work are unified and coordinated by using the central controller, so that the cooperativity of the work of the components is high, and the work efficiency is improved; the central controller is used for unified coordination, so that automation and manual removal can be effectively realized, abnormal operation which is possibly caused when each component is operated step by manually discharging bubbles is avoided, bubbles in photoresist are effectively reduced, and the smooth proceeding of a subsequent packaging link is ensured.
Drawings
Fig. 1 is a schematic diagram of a system structure of an automatic photoresist changing system provided by the present invention;
FIG. 2 is a schematic view of a normal photoresist discharging status of the automatic photoresist changing system according to the present invention;
FIG. 3 is a schematic diagram illustrating the working condition of the evacuated state of the glue bottle of the automatic glue-changing system for photoresist according to the present invention;
FIG. 4 is a schematic view of a working condition of the automatic photoresist changing system after a new photoresist bottle is replaced;
fig. 5 is a schematic view of the working condition of the ventilating and bubble-discharging state of the photoresist automatic photoresist changing system.
In the above drawings:
1. a glue storage module; 2. a buffer storage module; 21. a second sensor; 3. a waste collection module; 4. a glue discharging module; 5. a filter;
6. a central controller; 61. a touch display screen; 62. an alarm indicator light; 63. a switch controller;
7. flushing the pipeline; 71. a first control valve;
8. a first communication line; 81. a first sensor;
9. a third communication line; 91. a second control valve; 92. a third sensor;
10. a second communication line.
Detailed Description
The technical solution of the present invention will be further explained with reference to the accompanying drawings and embodiments.
An automatic photoresist changing system comprises a photoresist storage module 1, a buffer storage module 2 and a photoresist discharging module 4 which are sequentially arranged along a photoresist discharging direction; in the utility model, the glue storage module 1 is a glue bottle, which comprises a bottle cap and a bottle body, the bottle cap is detachably connected with the bottle body, the bottle body is used for storing photoresist, the bottle cap is used for inserting a pipeline, and the bottle body is covered by the cap for sealing; the buffer storage module 2 is a buffer bottle and is used for buffering the pressure of a subsequent pump body to play a role in regulation;
the photoresist storage module 1 is communicated with the buffer storage module 2 through a first communication pipeline 8, and the first communication pipeline 8 is tightly attached to the inner wall of the buffer bottle, so that bubbles mixed in photoresist due to falling of the photoresist can be effectively reduced; the buffer storage module 2 is communicated with the glue discharging module 4 through a second communication pipeline 10; when the photoresist is normally discharged under the requirement of the packaging process, the photoresist is powered by the photoresist discharging module 4, passes through the photoresist storage module 1, the first communicating pipeline 8 and the buffer storage module 2 until reaching the photoresist discharging module 4, and is then conveyed to a subsequent packaging working section by the photoresist discharging module 4;
a waste discharge collection module 3 is arranged at the downstream of the buffer storage module 2; the buffer storage module 2 is communicated with the waste collection module 3 through a third communication pipeline 9, in the embodiment, the waste collection module 3 is a box body, a vacuum pump is arranged in the box body and communicated with the third communication pipeline 9, and the box body is used for collecting waste after the subsequent flushing pipeline 7 flushes, and a part of photoresist and a plurality of impurities associated with the waste photoresist, and certainly, the waste photoresist in the photoresist bottle can be pumped into the box body to be discarded when the photoresist in the photoresist bottle needs to be discarded;
a flushing pipeline 7 is communicated with the inside of the glue storage module 1, flushing gas is conveyed in the flushing pipeline 7 under pressure, in the embodiment, the flushing gas is nitrogen, and the nitrogen has the characteristics of small adsorption heat and easiness in pumping away, occupies adsorption positions of other gases, reduces adsorption of other gases, pumps away the nitrogen, and realizes cleaning; the flushing pipeline 7 is communicated with the waste discharge and collection module 3 through a first communication pipeline 8 and a third communication pipeline 9; when the photoresist in the existing glue bottle is used up, the old empty glue bottle is manually replaced, a new glue bottle is installed, and as part of air enters the new glue bottle (a small amount of air enters the connecting pipeline) when the glue bottle is replaced, bubbles in the photoresist are increased, so that the flushing of flushing gas into the system is to discharge the bubbles in the newly replaced glue bottle and the connecting pipeline, and the subsequent packaging process is ensured to be carried out stably;
a first control valve 71 and a second control valve 91 are respectively arranged on the flushing pipeline 7 and the third communicating pipeline 9, and the first control valve 71 and the second control valve 91 are pneumatic control valves and are used for controlling the opening and closing of flushing gas in corresponding pipelines; a first sensor 81, a second sensor 21 and a third sensor 92 are respectively arranged in the first communicating pipeline 8, the buffer storage module 2 and the second communicating pipeline 10, and the sensors are used for sensing whether photoresist flows in the corresponding pipelines;
also includes a central controller 6; the first control valve 71, the second control valve 91, the first sensor 81, the second sensor 21 and the third sensor 92 are respectively in signal connection with the central controller 6, wherein the central controller 6 controls the opening and closing of the first control valve 71 and the second control valve 91 through PLC signals; and the central controller 6 displays whether the photoresist flows normally in the corresponding pipes by receiving the sensing signals of the first sensor 81, the second sensor 21 and the third sensor 92.
The first sensor 81 and the third sensor 92 are flow sensors or liquid level sensors, and the first sensor 81 and the third sensor 92 are disposed in the pipeline, so that the flow sensors or the liquid level sensors can be selected, and the liquid level sensors are selected in this embodiment.
The second sensor 21 is a liquid level sensor, and since the second sensor 21 is disposed in the buffer bottle, the flow sensor is not suitable, and therefore the second sensor 21 is disposed at a position close to the top of the bottle body.
The photoresist discharging module 4 is a vacuum pump and provides power for the photoresist to flow along the photoresist discharging transportation direction (i.e. to the packaging working section).
Along a glue outlet direction, a filter 5 is arranged at the downstream of the glue outlet module 4, in the embodiment, the filter 5 is a bag filter 5, also called a disposable filter 5, so that the loss of a filter medium is small, a filter element does not need to be replaced, and a hose can be directly connected for filtering.
The central controller 6 is further connected with an alarm indicator 62 through a signal, and the alarm indicator 62 lights up to warn when the first sensor 81, the second sensor 21 and the third sensor 92 do not detect the flowing of the photoresist in the corresponding pipeline.
The central controller 6 is provided with a touch display screen 61 for changing and adjusting parameters such as the opening time, the interval opening time, and the delay time of the first control valve 71 and the second control valve 91, and may also display the pressure of the first control valve 71 and the second control valve 91 and the signal feedback states of the first sensor 81, the second sensor 21, and the third sensor 92.
The central controller 6 is provided with a switch controller 63; the switch controller 63 is in signal connection with the flushing pipeline 7 and is used for controlling the opening and closing of the flushing pipeline 7.
The working mode of the utility model is introduced as follows:
the normal glue-out state of the system is shown in figure 2: the photoresist in the photoresist bottle is pumped out by the photoresist discharging module 4, passes through the first communicating pipeline 8 and the buffer storage module 2, is filtered by the photoresist discharging module 4 and the filter 5, and is conveyed to a packaging working section;
after a period of operation, the photoresist in the bottle has been evacuated, as shown in fig. 3: there is not the photoresist in first communication line 8, and first sensor 81 feeds back the warning, and warning light 62 lights, reminds the staff to need to trade the gluey bottle, and when the liquid level of photoresist dropped below second sensor 21 at buffer storage module 2, second sensor 21 also fed back the warning, and the staff must change the gluey bottle immediately this moment, consequently stops out gluey module 4 and the collection module of wasting discharge 3, as shown in fig. 4 after the new gluey bottle of renewal.
After the new rubber bottle is replaced, as shown in fig. 5, flushing and bubble discharging are started, a worker opens the second control valve 91, opens the first control valve 71, then presses down the controller 63, the flushing pipeline 7 starts to introduce nitrogen into the new rubber bottle, the nitrogen first performs a pressurization function, photoresist in the rubber bottle is pressed into the buffer storage module 2 through the first communication pipeline 8 by air pressure, the air pressure in the buffer storage module 2 is gradually increased, gas in the buffer storage module 2 is discharged from the waste discharge collection module 3 until the first sensor 81, the second sensor 21 and the third sensor 92 all display photoresist flowing, flushing and bubble discharging can be finished, the worker stops conveying nitrogen by using the switch controller 63, closes the first control valve 71, closes the second control valve 91 and finishes flushing, and then the system returns to a normal working state, the cycle proceeds as shown in fig. 2.
Finally, it is noted that the above embodiments are only used for illustrating the technical solutions of the present invention and not for limiting, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solutions of the present invention can be modified or replaced by equivalents without departing from the spirit and scope of the technical solutions of the present invention, which should be covered by the scope of the claims of the present invention.
Claims (10)
1. An automatic photoresist changing system is characterized by comprising a photoresist storage module, a buffer storage module and a photoresist discharging module which are sequentially arranged along a photoresist discharging direction;
the glue storage module is communicated with the buffer storage module through a first communication pipeline; the buffer storage module is communicated with the glue outlet module through a second communication pipeline;
a waste discharge and collection module is arranged at the downstream of the buffer storage module; the buffer storage module is communicated with the waste discharge and collection module through a third communication pipeline;
a flushing pipeline is communicated in the glue storage module, and flushing gas is conveyed in the flushing pipeline under pressure; the flushing pipeline is communicated with the waste discharge and collection module through a first communication pipeline and a third communication pipeline;
a first control valve and a second control valve are respectively arranged on the flushing pipeline and the third communicating pipeline; a first sensor, a second sensor and a third sensor are respectively arranged in the first communicating pipeline, the buffer storage module and the second communicating pipeline;
the system also comprises a central controller; and the first control valve, the second control valve, the first sensor, the second sensor and the third sensor are in signal connection with the central controller respectively.
2. The automatic photoresist changing system according to claim 1, wherein the first control valve and the second control valve are pneumatic control valves.
3. The system of claim 1, wherein the first sensor and the third sensor are flow sensors or level sensors.
4. The system of claim 2, wherein the second sensor is a level sensor.
5. The automatic photoresist changing system of claim 1, wherein the photoresist discharging module is a vacuum pump.
6. The automatic photoresist changing system according to claim 1 or 5, wherein a filter is disposed downstream of the photoresist discharging module along the photoresist discharging direction.
7. The system as claimed in claim 1, wherein the buffer storage module is a buffer bottle, and the first connecting pipe extends into the buffer bottle and is tightly attached to the inner wall of the buffer bottle.
8. The automatic photoresist changing system according to claim 1, wherein the central controller is further connected with an alarm lamp by signals.
9. The automatic photoresist changing system according to claim 1, wherein a touch display screen is disposed on the central controller.
10. The automatic photoresist changing system according to claim 1, wherein a switch controller is provided on the central controller; the switch controller is in signal connection with the flushing pipeline.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202221115371.0U CN217239411U (en) | 2022-05-09 | 2022-05-09 | Automatic photoresist changing system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202221115371.0U CN217239411U (en) | 2022-05-09 | 2022-05-09 | Automatic photoresist changing system |
Publications (1)
Publication Number | Publication Date |
---|---|
CN217239411U true CN217239411U (en) | 2022-08-19 |
Family
ID=82822834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202221115371.0U Active CN217239411U (en) | 2022-05-09 | 2022-05-09 | Automatic photoresist changing system |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN217239411U (en) |
-
2022
- 2022-05-09 CN CN202221115371.0U patent/CN217239411U/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN206474009U (en) | Absorbent charcoal adsorber and charcoal absorption desorption system | |
CN114229479B (en) | Lithium battery lithium salt full-automatic pneumatic conveying system | |
CN110081310A (en) | Online solar control film coating system silane busbar connector and its air supplying operation method | |
CN217239411U (en) | Automatic photoresist changing system | |
CN110118115A (en) | A kind of urea pump detection prosthetic device and detection restorative procedure | |
CN111043014A (en) | Air compression station system and control method thereof | |
US20060196819A1 (en) | External pressure hollow fibre membrane separation system | |
CN116672822A (en) | Gas-liquid separation pressurizing pry, mixing pry and filter screen self-flushing method | |
CN216413026U (en) | Automatic liquid supply gas-liquid separation liquid medicine reflux system | |
CN217939431U (en) | Energy-conserving liquefied natural gas filter equipment | |
CA2038697A1 (en) | Process and device for spraying a liquid intermittently, especially a lubricant suspension to be sprayed under high pressure | |
CN206785620U (en) | Basket type filter and glue supply filter | |
CN109368838A (en) | Microfiltration systems water treatment technology | |
CN210033577U (en) | Urea pump detects prosthetic devices | |
CN211649839U (en) | Double-path automatic oil inlet device driven by compressed air | |
CN211255364U (en) | Split type reverse osmosis filter core device and purifier | |
CN111365555A (en) | Gas collection and exhaust system for fluid treatment and water treatment system | |
CN221054809U (en) | Liquid material exhaust duct | |
CN215508255U (en) | Two-fluid cleaning system | |
CN205644103U (en) | Water blowing and vacuumizing integrated equipment | |
CN220063588U (en) | Water quality on-line monitoring mechanism | |
KR101266886B1 (en) | Apparatus for providing photoresists | |
CN218471176U (en) | Tobacco material winnowing system | |
CN221157948U (en) | Slurry conveying pipeline blockage removing device based on pneumatic back blowing pipeline | |
CN211725024U (en) | Blowing off-line system of dust remover |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CB03 | Change of inventor or designer information |
Inventor after: Chen Yang Inventor after: Liang Xinfu Inventor after: Fang Jian Inventor after: Wu Ming Inventor before: Chen Zhen Inventor before: Liang Xinfu Inventor before: Fang Jian Inventor before: Wu Ming |
|
CB03 | Change of inventor or designer information |