CN216980520U

CN216980520U - Wafer conveying device of etching machine

Info

Publication number: CN216980520U
Application number: CN202122835151.7U
Authority: CN
Inventors: 游忠伦
Original assignee: Individual
Current assignee: Individual
Priority date: 2021-11-18
Filing date: 2021-11-18
Publication date: 2022-07-15
Anticipated expiration: 2031-11-18

Abstract

The utility model provides a wafer conveying device of an etching machine. The etching machine wafer conveying device comprises an operation table; the rotary table is rotatably arranged at the top of the operating table; the three through holes are symmetrically formed in the rotary table; the two support frames are symmetrically and slidably mounted in the through holes and can slide in the vertical and horizontal directions in the through holes; the blanking hole is formed in the operating platform; the collecting shell is fixedly arranged at the bottom of the operating platform and corresponds to the blanking hole; the feeding shell is fixedly installed at the top of the operating platform, and the rotary disc extends into the feeding shell. The wafer conveying device of the etching machine provided by the utility model has the advantages of integrating feeding and discharging, being strong in continuity and high in efficiency, and meanwhile, being capable of realizing centralized feeding and discharging so as to reduce the contact with the external environment.

Description

Wafer conveying device of etching machine

Technical Field

The utility model relates to the technical field of semiconductors, in particular to a wafer conveying device of an etching machine.

Background

When semiconductor production, need carry out the sculpture through the sculpture, when the sculpture machine sculpture, generally convey the wafer to the sculpture machine in through passing the piece device, at present, pass the piece device and work in the environment of vacuum, however, because traditional pass the piece device and can not concentrate on material loading and unloading, need frequent and vacuum environment outside contact, and then need be continuous to do vacuum treatment to its operational environment, inefficiency, and the energy consumption is high.

Therefore, a new wafer conveying device of an etching machine is needed to solve the technical problems.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide the wafer conveying device of the etching machine, which integrates feeding and discharging, has strong continuity and high efficiency, and can simultaneously realize centralized feeding and discharging so as to reduce the contact with the external environment.

In order to solve the technical problem, the wafer conveying device of the etching machine provided by the utility model comprises: an operation table; the rotary table is rotatably arranged at the top of the operating table; the three through holes are symmetrically formed in the rotary table; the two support frames are symmetrically and slidably mounted in the through holes and can slide in the vertical and horizontal directions in the through holes; the blanking hole is formed in the operating platform; the collecting shell is fixedly arranged at the bottom of the operating platform and corresponds to the blanking hole; the feeding shell is fixedly installed at the top of the operating platform, and the rotary table extends into the feeding shell; the fixed frame is fixedly arranged at the top of the operating platform; the pushing cylinder is fixedly arranged on the fixing frame; and the clamp is fixedly arranged on the output shaft of the material pushing cylinder.

Preferably, a motor is fixedly installed at the bottom of the operating platform, and an output shaft of the motor is fixedly connected with the rotating disc.

Preferably, the sliding hole has been seted up on the inner wall of through-hole, slidable mounting has the casing in the sliding hole, fixed mounting has the guide bar in the casing, the support frame extends to in the casing with guide bar sliding connection, sliding sleeve is equipped with first spring on the guide bar, the both ends of first spring respectively with the inner wall and the support frame fixed connection of casing.

Preferably, fixed mounting has first wedge on the support frame, slidable mounting has the second wedge in the casing, second wedge and first wedge sliding connection, be equipped with the second spring in the casing, the both ends of second spring respectively with guide bar and second wedge fixed connection.

Preferably, slidable mounting has first push rod on the casing, fixed mounting has the sloping block on the operation panel, the sloping block is located one side of unloading hole, and sloping block and first push rod looks adaptation.

Preferably, the bottom symmetry slidable mounting of carousel has three second push rod, the top of second push rod extend to corresponding sliding hole and with casing fixed connection, the slip cap is equipped with the third spring on the second push rod, the both ends of third spring respectively with sliding hole's inner wall and casing fixed connection.

Preferably, an arc-shaped groove is formed in the operating platform, the arc-shaped groove is matched with the second push rod, and an inclined plane is arranged in the arc-shaped groove.

Compared with the prior art, the wafer conveying device of the etching machine provided by the utility model has the following beneficial effects:

the utility model provides a wafer conveying device of an etching machine, wherein two support frames are symmetrically and slidably arranged in a through hole, and the support frames can slide in the through hole along the vertical direction and the horizontal direction, so that a wafer can be supported, the depth of the through hole can be changed, loading is realized, and meanwhile, the support frames can be opened far away from each other, and unloading is realized; the material pushing cylinder is fixedly arranged on the fixing frame, the clamp is fixedly arranged on an output shaft of the material pushing cylinder, and wafers can be sent into the etching machine.

Drawings

FIG. 1 is a perspective view of a portion of the structure of the present invention;

FIG. 2 is a perspective exploded view of FIG. 1;

FIG. 3 is a top cross-sectional structural view of the present invention;

FIG. 4 is an enlarged view of portion A of FIG. 3;

fig. 5 is a schematic cross-sectional structure of the present invention.

Reference numbers in the figures: 1. an operation table; 2. a turntable; 3. a through hole; 4. a support frame; 5. a blanking hole; 6. collecting the shells; 7. feeding a shell; 8. a fixed mount; 9. a material pushing cylinder; 10. a clamp; 11. a motor; 12. a slide hole; 13. a housing; 14. a guide bar; 15. a first spring; 16. a first wedge block; 17. a second wedge block; 18. a second spring; 19. a first push rod; 20. a sloping block; 21. a second push rod; 22. a third spring; 23. an arc-shaped groove.

Detailed Description

The utility model is further described below with reference to the drawings and the embodiments.

Referring to fig. 1-5, the wafer conveying device of the etching machine includes: an operation table 1; the rotary table 2 is rotatably arranged at the top of the operating table 1; the three through holes 3 are symmetrically formed in the turntable 2; the two support frames 4 are symmetrically and slidably mounted in the through hole 3, and the support frames 4 can slide in the through hole 3 along the vertical and horizontal directions; the blanking hole 5 is formed in the operating platform 1; the collecting shell 6 is fixedly arranged at the bottom of the operating platform 1, and the collecting shell 6 corresponds to the blanking hole 5; the feeding shell 7 is fixedly installed at the top of the operating platform 1, and the rotary table 2 extends into the feeding shell 7; the fixing frame 8 is fixedly arranged at the top of the operating platform 1; the material pushing cylinder 9 is fixedly arranged on the fixing frame 8; the fixture 10 is fixedly installed on an output shaft of the material pushing cylinder 9, feeding and discharging can be conducted, raw materials and finished products can be collected in a centralized mode through the collecting shell 6 and the feeding shell 7, and contact with the external environment is reduced.

The bottom fixed mounting of operation panel 1 has motor 11, motor 11's output shaft and carousel 2 fixed connection can rotate by carousel 2, and then can material loading and unloading in succession, improve the processing unloading.

Slide opening 12 has been seted up on the inner wall of through-hole 3, slidable mounting has casing 13 in slide opening 12, fixed mounting has guide bar 14 in the casing 13, support frame 4 extends to casing 13 in with 14 sliding connection of guide bar, sliding sleeve is equipped with first spring 15 on the guide bar 14, the both ends of first spring 15 respectively with casing 13's inner wall and 4 fixed connection of support frame. Can make two support frames 4 move away from each other, and then make the wafer can cross through-hole 3 and realize the unloading.

Fixed mounting has first wedge 16 on support frame 4, slidable mounting has second wedge 17 in the casing 13, second wedge 17 and first wedge 16 sliding connection, be equipped with second spring 18 in the casing 13, the both ends of second spring 18 respectively with guide bar 14 and second wedge 17 fixed connection. There is first push rod 19 on the casing 13 slidable mounting, fixed mounting has sloping block 20 on the operation panel 1, sloping block 20 is located one side of unloading hole 5, and sloping block 20 and first push rod 19 looks adaptation. Can make two support frames 4 keep away from each other and move and carousel 2 rotation production interlock, need not to reset power, energy-concerving and environment-protective, and the degree of adaptation is high.

The bottom symmetry slidable mounting of carousel 2 has three second push rod 21, the top of second push rod 21 extend to in the sliding hole 12 that corresponds and with casing 13 fixed connection, the sliding sleeve is equipped with third spring 22 on the second push rod 21, the both ends of third spring 22 respectively with the inner wall and the casing 13 fixed connection of sliding hole 12. An arc-shaped groove 23 is formed in the operating platform 1, the arc-shaped groove 23 is matched with the second push rod 21, and an inclined plane is arranged in the arc-shaped groove 23. The support frame 4 moves downwards through the rotation of the turntable 2, so that the wafers in the feeding shell 7 can enter the through holes 3, and feeding is realized.

The working principle of the wafer conveying device of the etching machine provided by the utility model is as follows:

in the device, the upper surface of a support frame 4 is level with the upper surface of a turntable 2 in a normal state;

when the feeding device is used, wafers to be processed are stacked in the feeding shell 7, the motor 11 is started to enable the rotary table 2 to rotate, the rotary table 2 drives the through holes 3 to move, when the through holes 3 move to the position below the feeding shell 7, the supporting frames 4 move downwards, and then the wafers in the feeding shell 7 fall onto the supporting frames 4 in the through holes 3 and can be conveyed along with the rotation of the rotary table 2; after the wafer is conveyed to a designated position, the wafer can enter an etching machine through a material pushing cylinder 9 and a clamp 10; when the through hole 3 moves to correspond to the blanking hole 5, the two support frames 4 move away from each other, so that the wafer can fall into the collection shell 6 from the blanking hole 5 and can be transported in a centralized manner;

when the through hole 3 moves to the lower part of the feeding shell 7, the second push rod 21 enters the arc-shaped groove 23 under the action of the third spring 22, and then the shell 13 moves downwards and drives the support frame 4 to move downwards;

when the through hole 3 moves to correspond to the blanking hole 5, the inclined block 20 extrudes the first push rod 19, the first push rod 19 drives the second wedge-shaped block 17 to move, the second wedge-shaped block 17 drives the two first wedge-shaped blocks 16 to move away from each other, and then the two support frames 4 move away from each other.

the utility model provides a wafer conveying device of an etching machine, wherein two support frames 4 are symmetrically and slidably arranged in a through hole 3, the support frames 4 can slide in the through hole 3 along the vertical and horizontal directions, wafers can be supported, the depth of the through hole 3 can be changed, loading is realized, and meanwhile, the support frames 4 can be opened far away from each other, so that unloading is realized; the material pushing cylinder 9 is fixedly arranged on the fixing frame 8, and the clamp 10 is fixedly arranged on an output shaft of the material pushing cylinder 9 and can convey wafers into the etching machine.

The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all modifications of equivalent structures and equivalent processes, which are made by using the contents of the present specification and the accompanying drawings, or directly or indirectly applied to other related technical fields, are included in the scope of the present invention.

Claims

1. The utility model provides an etching machine passes piece device which characterized in that includes:

an operation table;

the rotary table is rotatably arranged at the top of the operating table;

the three through holes are symmetrically formed in the rotary table;

the two support frames are symmetrically and slidably mounted in the through holes and can slide in the vertical and horizontal directions in the through holes;

the blanking hole is formed in the operating platform;

the collecting shell is fixedly arranged at the bottom of the operating platform and corresponds to the blanking hole;

the feeding shell is fixedly mounted at the top of the operating platform, and the turntable extends into the feeding shell;

the fixed frame is fixedly arranged at the top of the operating platform;

the pushing cylinder is fixedly arranged on the fixing frame;

and the clamp is fixedly arranged on the output shaft of the material pushing cylinder.

2. The etching machine wafer conveying device according to claim 1, wherein a motor is fixedly mounted at the bottom of the operating platform, and an output shaft of the motor is fixedly connected with the rotating disc.

3. The etching machine wafer conveying device according to claim 2, wherein a sliding hole is formed in an inner wall of the through hole, a housing is slidably mounted in the sliding hole, a guide rod is fixedly mounted in the housing, the support frame extends into the housing and is slidably connected with the guide rod, a first spring is slidably sleeved on the guide rod, and two ends of the first spring are fixedly connected with the inner wall of the housing and the support frame respectively.

4. The wafer conveying device of the etching machine as claimed in claim 3, wherein a first wedge block is fixedly mounted on the support frame, a second wedge block is slidably mounted in the housing, the second wedge block is slidably connected with the first wedge block, a second spring is arranged in the housing, and two ends of the second spring are fixedly connected with the guide rod and the second wedge block respectively.

5. The etching machine wafer conveying device according to claim 4, wherein a first push rod is slidably mounted on the housing, an inclined block is fixedly mounted on the operating platform and located on one side of the blanking hole, and the inclined block is matched with the first push rod.

6. The etching machine wafer conveying device according to any one of claims 2 to 5, wherein three second push rods are symmetrically and slidably mounted at the bottom of the rotary table, the top ends of the second push rods extend into corresponding sliding holes and are fixedly connected with the shell, third springs are slidably sleeved on the second push rods, and two ends of each third spring are fixedly connected with the inner wall of each sliding hole and the shell respectively.

7. The etching machine wafer conveying device according to claim 6, wherein an arc-shaped groove is formed in the operating platform, the arc-shaped groove is matched with the second push rod, and an inclined surface is arranged in the arc-shaped groove.