CN216958047U

CN216958047U - Solar cell

Info

Publication number: CN216958047U
Application number: CN202122924921.5U
Authority: CN
Inventors: 周小红; 陈林森; 苏晓东; 邹帅; 浦东林
Original assignee: Suzhou University; SVG Tech Group Co Ltd
Current assignee: Suzhou University; SVG Tech Group Co Ltd
Priority date: 2021-11-26
Filing date: 2021-11-26
Publication date: 2022-07-12
Anticipated expiration: 2031-11-26

Abstract

The utility model provides a solar cell. The solar cell includes: a solar cell module; an electrode thin film attached on one side surface of the solar cell module, the electrode thin film including: the solar cell module comprises a transparent base layer, a transparent imprinting layer and a conductive material layer formed in the transparent imprinting layer or on one side surface of the transparent imprinting layer, wherein the conductive material layer is electrically connected with the solar cell module to form an electrode of the solar cell module; and the electrode film and the solar cell module are laminated and attached. The solar cell thus obtained has high transmittance and high photoelectric conversion efficiency.

Description

Solar cell

[ technical field ] A method for producing a semiconductor device

The utility model relates to the technical field of solar cells, in particular to a solar cell.

[ background of the utility model ]

With the increasing exhaustion of traditional energy sources and the increasing severity of environmental pollution problems, photovoltaic power generation technology is receiving more and more attention and is considered as an important renewable clean energy source. The photovoltaic industry aims to improve the photoelectric conversion efficiency of the photovoltaic cell and reduce the power generation cost, so that the photovoltaic cell has competitiveness compared with the traditional power grid power generation cost.

At present, the front surface electrode of the industrialized crystalline silicon solar cell forms a patterned silver grid line by utilizing a screen printing silver (Ag) paste and a sintering process or an electroplating process. Although the screen printing paste and sintering process is simple in process and high in productivity, the screen printing yield is influenced by the characteristics of the screen and the conductive paste, the screen blocking condition may occur, and the quality of the electrode is influenced. Meanwhile, the line width of the screen printing electrode is in the range of 30-100 μm, and further reduction is difficult. The electrode with thicker line width has two defects: the first disadvantage is that the consumption of the conductive paste is large, which results in high cost; the second disadvantage is that the surface electrode covers a silicon wafer greatly, which affects the photoelectric conversion efficiency of the cell. Therefore, how to reduce the line width of the surface electrode, reduce the consumption of the conductive paste and improve the light receiving area of the battery has important value. The surface electrode formed by the electroplating process needs to be subjected to glue coating, exposure, etching and electroplating, the process is complex, the cost is high, the environment is not protected, and copper (Cu) is easy to oxidize.

Therefore, a new technical solution is needed to solve the above problems.

[ Utility model ] content

An object of the present invention is to provide a solar cell having high transmittance and high photoelectric conversion efficiency, which can be easily mass-produced, and which is low in cost.

According to an aspect of the present invention, there is provided a solar cell including: a solar cell module; an electrode thin film attached on one side surface of the solar cell module, the electrode thin film including: the solar cell module comprises a transparent base layer, a transparent imprinting layer and a conductive material layer formed in the transparent imprinting layer or on one side surface of the transparent imprinting layer, wherein the conductive material layer is electrically connected with the solar cell module to form an electrode of the solar cell module; and the electrode film and the solar cell module are laminated and attached.

Compared with the prior art, the heterojunction solar cell provided by the embodiment of the utility model takes the conductive material layer formed on the electrode thin film as the electrode of the solar cell, and the width of the electrode can be greatly reduced, the transmittance of the solar cell is improved, and the consumption of the conductive material layer is reduced.

[ description of the drawings ]

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise. Wherein:

FIG. 1 is a schematic diagram of a layer structure of a solar cell according to an embodiment of the utility model;

FIG. 2 is a schematic view of a layer structure of an electrode film according to an embodiment of the present invention;

FIG. 3 is a schematic diagram of an electrode recess structure according to an embodiment of the present invention;

FIG. 4 is a schematic view of another layer structure of an electrode thin film according to an embodiment of the present invention;

FIG. 5 is a schematic view of a further layer structure of an electrode film according to an embodiment of the present invention;

FIG. 6 is a schematic flow chart of a method of fabricating a solar cell in accordance with an embodiment of the present invention;

fig. 7 is a view showing an example of lamination of the electrode thin film and the solar cell module in fig. 6;

FIG. 8 is a schematic flow chart of a method for manufacturing an electrode thin film according to an embodiment of the present invention;

FIG. 9 is a schematic diagram of a process for preparing an electrode thin film according to an embodiment of the present invention;

FIG. 10 is a schematic flow chart of a method for manufacturing an electrode thin film according to another embodiment of the present invention;

FIG. 11 is a schematic diagram of a process for preparing an electrode thin film according to an embodiment of the present invention.

[ detailed description ] embodiments

In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.

Reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic may be included in at least one implementation of the utility model. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Unless otherwise specified, the terms connected, and connected as used herein mean electrically connected, directly or indirectly.

In the description of the present invention, it is to be understood that the terms "upper", "lower", "left", "right", "top", "bottom", "inner", "outer", and the like, are used in the orientations and positional relationships indicated in the drawings only for the convenience of description and simplicity of description, and do not indicate or imply that the device or element so indicated must have a particular orientation, be constructed in a particular orientation, and be operated in a particular manner, and thus, are not to be construed as limiting the present invention. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise. Herein, "and/or" includes and/or, such as a and/or B includes a, or B, or both a and B.

In the present invention, the terms "connected," "coupled," and the like are to be construed broadly unless otherwise explicitly specified or limited; for example, they may be connected directly or indirectly through an intermediate. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.

The utility model provides an improved solar cell which has high transmittance and high photoelectric conversion efficiency, can be conveniently produced in batches and has low cost.

The solar cell in the embodiment of the utility model is a novel heterojunction solar cell. Fig. 1 is a schematic view of a layer structure of a solar cell according to an embodiment of the utility model. As shown in fig. 1, the solar cell includes a solar cell module 200, and an electrode film 100 attached to one surface of the solar cell module 200, wherein the electrode film 100 includes: a transparent base layer 110, a transparent imprinting layer 120, and a conductive material layer 130 formed in the transparent imprinting layer 120 or on one side surface of the transparent imprinting layer 120, wherein the conductive material layer 130 is electrically connected to the solar cell module 200 to form an electrode of the solar cell module; wherein the electrode film 100 and the solar cell module 200 are laminated and attached.

In the present embodiment, the solar cell module 200 includes at least one cell set for converting solar energy into electric energy. One side surface of the solar cell module 200 may be a Transparent Conductive Oxide (TCO) layer, and the TCO layer of the solar cell module 200 and the transparent imprinting layer 120 of the electrode film 100 may be laminated by heating, so that the conductive material layer 130 is electrically connected to the TCO layer of the solar cell module 200.

It is understood that the transparent imprinting layer 120 and the solar cell module 200 can be bonded by pressure lamination, and the conductive material layer 130 and the solar cell module 200 are electrically connected.

Meanwhile, the transparent base layer 110 may be a PET (polyethylene terephthalate) layer.

In some embodiments, transparent imprinting layer 120 may be a single-layer structure or a multi-layer structure, e.g., transparent imprinting layer 120 may include: the hot-melt adhesive layer, here, can be a polyester-based layer, a layer of ethylene and its copolymers (EVA, EEA, EAA, EVAL), a polyurethane-based layer, a polyamide-based layer, a polyolefin-based layer and/or a styrene-based layer.

After the conductive material layer 130 is formed in the transparent imprinting layer 120 or on one side surface of the transparent imprinting layer 120, since the transparent imprinting layer 120 is a hot melt adhesive layer, the transparent imprinting layer 120 and the solar cell module 200 can be directly bonded by a heating lamination bonding method, and the conductive material layer 130 formed in the transparent imprinting layer 120 or on one side surface of the transparent imprinting layer 120 is electrically connected to the solar cell module 200.

In some embodiments, the conductive material layer 130 is a conductive metal material layer; preferably, the metal material used for the conductive material layer is copper, silver, gold, or the like.

The solar cell of the embodiment takes the conductive material layer formed on the electrode film as the electrode of the solar cell, and the width of the electrode can be greatly reduced, the transmittance of the solar cell is improved, and the material consumption of the conductive material layer is reduced at the same time by manufacturing the electrode on the electrode film; further, the electrodes of the solar cell are directly formed by heating, laminating and bonding the independently prepared electrode film 100 and the solar cell module 200, and thus, the yield and efficiency are high, and the operation is easy.

In some embodiments, the thickness of the electrode thin film 100 is in the range of 50 μm to 200 μm, wherein the thickness of the transparent base layer 110 is preferably in the range of 0 μm to 100 μm, and the thickness of the transparent imprinting layer 120 is preferably in the range of 50 μm to 100 μm.

Fig. 2 is a schematic view of a layer structure of an electrode film 100 according to an embodiment of the present invention. As shown in fig. 2, an electrode groove 1201 is formed in the transparent imprinting layer 120 by imprinting, and the conductive material layer 130 is formed in the electrode groove 1201.

Specifically, an electrode groove 1201 and a conductive material layer 130 formed in the electrode groove 1201 are formed on one side surface of the transparent imprinting layer 120 close to the solar cell module 200. The conductive material layer 130 is electrically connected to one side of the solar cell module 200 to form an electrode of the solar cell module 200.

In some embodiments, the transparent base layer is a flexible transparent material layer, including a PET layer; the transparent imprinting layer is a glue layer and comprises a hot melt glue layer.

For example, in the case that the transparent base layer 110 is a PET (polyethylene terephthalate) layer, and the transparent imprinting layer is an EVA (ethylene vinyl acetate) glue layer, the transparent imprinting layer 120 may be imprinted by using a roll plate, wherein the roll plate is engraved with a predetermined pattern having a protrusion structure corresponding to the electrode grooves; then, a conductive paste is filled into the electrode groove 1201, and finally the conductive material layer 130 is formed within the electrode groove 1201.

Preferably, the electrode grooves have a width ranging from 2 μm to 50 μm and a depth ranging from 2 μm to 40 μm. Accordingly, since the conductive material layer is formed in the electrode groove, the depth of the conductive material layer does not exceed the depth of the electrode groove, and the width of the conductive material layer does not exceed the width of the electrode groove.

For example, taking the width of the electrode recess as 15 μm and the depth as 20 μm as an example, accordingly, the depth of the conductive material layer is not more than 15 μm and the width of the conductive material layer is not more than 20 μm. Here, by controlling the width and depth of the conductive groove, the depth and width of the conductive material layer can be correspondingly controlled, so that the limitation on the width and depth of the electrode of the solar cell is realized, the transmittance of the solar cell can be further improved, and the consumption of the conductive material layer is reduced.

Preferably, the transparent imprinting layer 120 is an EVA glue layer.

Fig. 3 is a schematic structural diagram of an electrode recess 1201 according to an embodiment of the present invention. As shown in fig. 3, electrode grooves 1201 include at least one first electrode groove set 1201a and at least one second electrode groove set 1201b, where each first electrode groove set 1201a includes at least one first electrode groove 12011 and each second electrode groove set 1201b includes at least one second electrode groove 12012.

In the present embodiment, the electrode grooves 1201 are distributed in a grid shape.

Preferably, the first electrode grooves 12011 and the second electrode grooves 12012 are arranged in a mesh structure, the first electrode grooves 12011 and the second electrode grooves 12012 are communicated with each other, and the first electrode grooves 12011 and the second electrode grooves 12012 are formed on the transparent imprinting layer 120 by imprinting. All the first electrode grooves 12011 are parallel to each other, all the second electrode grooves 12012 are parallel to each other, and a first included angle is formed between the first electrode grooves 12011 and the second electrode grooves 12012. Preferably, the first included angle is 90 degrees.

Further, the distance between adjacent first electrode groove groups 1201a is a first distance d1, the distance between adjacent second electrode groove groups 1201b is a second distance d2, the distance between adjacent first electrode grooves 12011 in the same first electrode groove group 1201a is a third distance d3, and the distance between adjacent second electrode grooves 12012 in the same second electrode groove group 1201b is a fourth distance d 4. Preferably, the first distance is greater than the third distance and the second distance is greater than the fourth distance.

In some embodiments, the width of each of the first electrode grooves 12011 and the second electrode grooves 12012 ranges from 2 μm to 50 μm, and the depth of each of the first electrode grooves and the second electrode grooves ranges from 2 μm to 40 μm.

Preferably, the width w1 of the first electrode groove 12011 is greater than the width w2 of the second electrode groove 12012. For example, the width of the first electrode groove 12011 is 15 μm, and the width of the second electrode groove 12012 is 10 μm. In some embodiments, the transparent imprinting layer 120 may also be a multilayer structure.

Accordingly, the conductive material layer 130 has a structure corresponding to the electrode recess 1201, including: the first conductive electrode and the second conductive electrode are arranged in a mesh structure, and are communicated with each other, and the first conductive electrode and the second conductive electrode are formed on the transparent imprinting layer 120 by filling conductive paste once.

Fig. 4 is a schematic view of another layer structure of the electrode film 100 according to the embodiment of the utility model. As shown in fig. 4, the transparent imprinting layer 120 includes: a first transparent imprint layer 1202 and a second transparent imprint layer 1203, wherein, along a direction away from the transparent base layer 110, the second transparent imprint layer 1203 is disposed outside the first transparent imprint layer 1202. Here, the first transparent imprint layer 1202 and the second transparent imprint layer 1203 may be different material layers. For example, the first transparent imprinting layer 1202 is an EVA glue layer, and the second transparent imprinting layer 1203 is a UV (ultraviolet sensitive) glue layer; for another example, the first transparent imprinting layer 1202 is a UV glue layer, and the second transparent imprinting layer 1203 is an EVA glue layer.

Further, when the transparent imprinting layer 120 has a two-layer structure, the electrode grooves 1201 penetrate through the second transparent imprinting layer 1203.

Fig. 5 is a schematic view of another layer structure of the electrode film 100 according to the embodiment of the present invention. As shown in fig. 5, the conductive material layer 130 is formed on one side surface of the transparent imprinting layer 120 by transfer printing.

In some embodiments, the conductive material layer 130 is formed on a substrate layer in advance, and the conductive material layer 130 is transferred from the substrate layer to one side surface of the transparent imprinting layer 120 through a transfer process, so that the conductive material layer 130 is attached to and protrudes from one side surface of the transparent imprinting layer 120.

Preferably, the conductive material layer 130 has a width ranging from 2 μm to 50 μm and a depth ranging from 2 μm to 40 μm.

In some embodiments, the base layer and the transparent imprinting layer 120 are different material layers. Illustratively, the base layer is a PET layer and a UV glue layer in a stacked arrangement, and the transparent imprinting layer 120 is an EVA glue layer.

In some embodiments, after the solar cell module 200 and the electrode film 100 are laminated, the conductive material layer 130 may be partially or completely recessed into the transparent imprinting layer 120. Preferably, the layer of conductive material 130 is entirely recessed into the transparent imprint layer 120.

Fig. 6 is a schematic flow chart of a method for manufacturing a solar cell according to an embodiment of the utility model. As shown in fig. 6, the method for manufacturing a solar cell includes:

in step 310, a solar cell module is provided.

At step 320, an electrode film is provided. Wherein the electrode thin film includes: the transparent substrate, the transparent imprinting layer and the conductive material layer are formed in the transparent imprinting layer or on one side surface of the transparent imprinting layer;

and 330, laminating and adhering the electrode film and the solar cell module together so that the conductive material layer is electrically connected with the solar cell module to form an electrode of the solar cell module.

In step 310, the solar cell module 200 includes at least one cell set for converting solar energy into electric energy. One side surface of the solar cell module 200 may be a Transparent Conductive Oxide (TCO) layer.

In step 320, the transparent base layer 110 of the electrode film may be a PET (polyethylene terephthalate) layer; the transparent imprinting layer 120 may be a single layer structure or a multi-layer structure, e.g., the transparent imprinting layer 120 may comprise: a hot melt adhesive layer, wherein the hot melt adhesive layer can be a polyester layer, an ethylene and ethylene copolymer (EVA, EEA, EAA, EVAL) layer, a polyurethane layer, a polyamide layer, a polyolefin layer and/or a styrene layer; the conductive material layer 130 is a conductive metal material layer; preferably, the layer of conductive material is a layer of copper, silver and/or gold.

In step 330, the TCO layer of the solar cell module 200 and the conductive material layer of the transparent imprinting layer 120 are disposed opposite to each other, and the conductive material layer 130 is electrically connected to the TCO layer of the solar cell module 200 by heating lamination. In one example, as shown in fig. 7, the electrode film 100 and the solar cell module 200 are laminated together by heating.

Finally, a solar cell as shown in fig. 1 may be prepared by the above-described preparation method, the solar cell including: a solar cell module 200, an electrode thin film 100 attached on one side surface of the solar cell module 200, the electrode thin film 100 including: a transparent base layer 110, a transparent imprinting layer 120, and a conductive material layer 130 formed in the transparent imprinting layer 120 or on one side surface of the transparent imprinting layer 120, wherein the conductive material layer 130 is electrically connected to the solar cell module 200 to form an electrode of the solar cell module; wherein, the electrode film 100 and the solar cell module 200 are laminated and attached.

Fig. 8 is a schematic flow chart of a method for manufacturing an electrode thin film according to an embodiment of the present invention, and fig. 9 is a schematic view of a process for manufacturing an electrode thin film according to an embodiment of the present invention. As shown in fig. 8 and 9, the step 320 includes:

step 3201, providing a transparent base layer, as shown in fig. 9 (a);

step 3202, forming a transparent imprint layer on the transparent base layer, as shown in fig. 9 (b);

step 3203, embossing electrode grooves on the transparent embossing layer, as shown in fig. 9 (c);

step 3204, a conductive paste is filled into the electrode grooves to form the conductive material layer, as shown in fig. 9 (d).

In step 3202, a transparent imprinting layer may be formed on the transparent base layer by coating a gum. For example, an EVA glue layer is formed on a transparent base layer by coating EVA glue.

In step 3203, the transparent imprinting layer may be imprinted by using a roll plate engraved with a predetermined pattern to form electrode grooves, wherein the predetermined pattern on the roll plate has a protruding structure corresponding to the electrode grooves.

Preferably, the electrode grooves have a width ranging from 2 μm to 50 μm and a depth ranging from 2 μm to 40 μm.

In step 3204, the conductive paste may be directly filled in the electrode groove to form a conductive material layer, or a small amount of low-temperature conductive paste may be filled in the electrode groove first, and then metal growth is performed, so as to form a conductive material layer in the electrode groove finally.

Here, the conductive paste may be a silver paste, a copper paste, a gold paste, or the like.

In this embodiment, the width and the depth of the electrode groove can be directly controlled to correspondingly control the depth and the width of the conductive material layer, so that the limitation on the width and the depth of the electrode of the solar cell is realized, the transmittance of the solar cell can be further improved, and the consumption of the conductive material layer can be reduced.

In some embodiments, in step 3202, a multi-layer structure may also be formed by sequentially coating multiple layers of gum on the transparent base layer such that the transparent impression layer forms a multi-layer structure. For example, firstly, coating EVA adhesive on a transparent base layer to form an EVA adhesive layer; and then, coating UV glue on the EVA glue layer to form a UV glue layer.

It will be appreciated that the transparent embossed layer may also be formed as a multi-layer structure by sequentially coating different or the same colloidal layers on the transparent base layer, according to the requirements of the actual application.

Finally, the electrode thin film as shown in fig. 2 or fig. 4 can be prepared by the above-described preparation method.

Fig. 10 is a schematic flow chart of a method for manufacturing an electrode thin film according to an embodiment of the present invention in another embodiment, and fig. 11 is another schematic flow chart of a process for manufacturing an electrode thin film according to an embodiment of the present invention. As shown in fig. 10 and 11, the step 320 may further include:

step 3201', a base layer is provided, wherein the base layer may be a PET layer, or alternatively, the base layer may be a PET layer and a UV glue layer which are stacked. Such as a base layer 910 shown in fig. 11 (a).

Step 3202', embossing a transfer groove on the base layer; a transfer groove 9101 as shown in (b) of fig. 11.

Specifically, the transparent imprinting layer may be imprinted by using a roll plate engraved with a predetermined pattern, so as to form a transfer groove, wherein the predetermined pattern on the roll plate has a protruding structure corresponding to the transfer groove.

Step 3203', forming a conductive material layer in the transfer groove; such as the conductive material layer 130 of fig. 11 (c).

Specifically, silver paste may be filled in the transfer groove, or a small amount of low-temperature silver paste may be filled first, followed by further metal growth, and finally, the conductive material layer is formed.

Step 3204', please refer to fig. 11 (d), the conductive material layer is transferred to a side surface of the transparent substrate layer; namely, one side of the substrate layer where the conductive material layer is located is covered on the transparent imprinting layer, the whole conductive material layer is transferred to one side surface of the transparent imprinting layer through curing and demolding, and finally, the conductive material layer is formed on one side surface of the transparent imprinting layer.

Step 3205', the base layer is peeled. The electrode thin film shown in fig. 11 (e) is finally obtained.

In some embodiments, the transfer grooves include at least one first transfer groove set and at least one second transfer groove set, wherein each first transfer groove set includes at least one first transfer groove and each second transfer groove set includes at least one second transfer groove.

Preferably, the first transfer grooves and the second transfer grooves are arranged in a net structure, wherein all the first transfer grooves are parallel to each other, all the second transfer grooves are parallel to each other, and a first included angle is formed between the first transfer grooves and the second transfer grooves. Preferably, the first included angle is 90 degrees.

Further, the distance between adjacent first transfer groove groups is a first distance, the distance between adjacent second transfer groove groups is a second distance, the distance between adjacent first transfer grooves is a third distance, and the distance between adjacent second transfer grooves is a fourth distance. Preferably, the first distance is greater than the third distance and the second distance is greater than the fourth distance.

In some embodiments, the width of the first and second transfer grooves ranges from 2 μm to 50 μm, and the depth of the first and second transfer grooves ranges from 2 μm to 40 μm.

Finally, an electrode thin film as shown in fig. 5 can be prepared by the above-described preparation method.

In the manufacturing process of the electrode film, the electroforming process can be adopted for surface electrode growth, and water is recycled in the cleaning process, so that the method is suitable for continuous production and water recycling without discharge.

In the description herein, references to the description of the term "one embodiment," "some embodiments," "an example," "a specific example" or "some examples" or the like are intended to mean that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the utility model. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, various embodiments or examples described in this specification can be combined and combined by one skilled in the art.

While embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and not to be construed as limiting the present invention, and that changes, modifications and variations may be made therein by those of ordinary skill in the art within the scope of the present invention.

Claims

1. A solar cell, comprising:

a solar cell module;

an electrode thin film attached on one side surface of the solar cell module, the electrode thin film including: the solar cell module comprises a transparent base layer, a transparent imprinting layer and a conductive material layer formed in the transparent imprinting layer or on one side surface of the transparent imprinting layer, wherein the conductive material layer is electrically connected with the solar cell module to form an electrode of the solar cell module;

and the electrode film and the solar cell module are laminated and attached.

2. The solar cell according to claim 1, wherein an electrode groove is formed in the transparent imprint layer by imprinting, and the conductive material layer is formed in the electrode groove.

3. The solar cell of claim 2, wherein the electrode grooves have a width in a range of 2 μm to 50 μm and a depth in a range of 2 μm to 40 μm.

4. The solar cell of claim 2, wherein the electrode grooves are distributed in a grid pattern.

5. The solar cell according to claim 1, wherein the conductive material layer is formed on one side surface of the transparent base layer by transfer printing.

6. The solar cell according to any one of claims 1 to 5,

the transparent base layer is a flexible transparent material layer and comprises a PET layer;

the transparent imprinting layer is an adhesive layer and comprises a hot melt adhesive layer.

7. The solar cell according to any one of claims 1 to 5, wherein the solar cell module and the transparent printed layer of the electrode film are laminated together, so that the conductive material layer is electrically connected with the solar cell module.

8. The solar cell according to claim 1, wherein the thickness of the electrode thin film is in a range of 50 μm to 200 μm.

9. The solar cell of claim 8, wherein the transparent base layer has a thickness in a range of 0 μ ι η to 100 μ ι η and the transparent imprint layer has a thickness in a range of 50 μ ι η to 100 μ ι η.

10. The solar cell of claim 1, wherein the transparent imprint layer is a single-layer structure or a multi-layer structure.