CN216935973U

CN216935973U - Nitrogen trifluoride preparation device

Info

Publication number: CN216935973U
Application number: CN202220242912.XU
Authority: CN
Inventors: 崔同超; 达布力干; 郭宏; 窦兆丁; 吴凯; 潘波; 马雷
Original assignee: Wulancha Bunanda Microelectronic Materials Co ltd
Current assignee: Nanda Optoelectronics Ulanqab Co ltd
Priority date: 2022-01-29
Filing date: 2022-01-29
Publication date: 2022-07-12
Anticipated expiration: 2032-01-29

Abstract

The utility model belongs to the field of nitrogen trifluoride production equipment, and particularly relates to a nitrogen trifluoride preparation device which comprises a plasma generator, a plasma reactor, a bag-type dust remover, an induced draft fan and a gas collecting tank, wherein the plasma generator is connected with the plasma reactor, a top cover is arranged at the top of the plasma reactor, a silicon tetrafluoride inlet and a nitrogen inlet penetrate through the top cover, a condensing sleeve is arranged on the outer side wall of the plasma reactor, a cold medium inlet and a cold medium outlet are arranged on the condensing sleeve, a discharge port is arranged at the bottom of the plasma reactor, a discharge valve is arranged on the discharge port, a material conveying pipe is connected between the discharge port and the bag-type dust remover, an air suction pipe is connected between the bag-type dust remover and the induced draft fan, and the induced draft fan is connected with the gas collecting tank through an exhaust pipe. The utility model has the advantages of lower production cost, higher safety and fewer byproducts.

Description

Nitrogen trifluoride preparation device

Technical Field

The utility model relates to a nitrogen trifluoride preparation device, and belongs to the field of nitrogen trifluoride production equipment.

Background

The chemical formula of nitrogen trifluoride is NF₃The gas is colorless, odorless and stable at normal temperature, is a strong oxidant, is widely applied to the fields of high-energy laser, semiconductor technology, chemical vapor deposition and the like, and has a very wide application prospect.

Currently, there are two general methods for preparing nitrogen trifluoride: a chemical synthesis method for preparing nitrogen trifluoride by using NH3 and F2 as raw materials has high reactivity and strong toxicity and corrosivity of F2, so the method has high danger and more reaction byproducts; the other electrolytic preparation method is an electrolytic bath electrolytic preparation method taking NH4F-xHF as a raw material, and the production cost is higher.

SUMMERY OF THE UTILITY MODEL

According to the defects in the prior art, the technical problems to be solved by the utility model are as follows: provides a nitrogen trifluoride preparation device with lower production cost, higher safety and less byproducts.

The utility model relates to a nitrogen trifluoride preparation device which comprises a plasma generator, a plasma reactor, a bag-type dust remover, an induced draft fan and a gas collecting tank, wherein the plasma generator is connected with the plasma reactor, the top of the plasma reactor is provided with a top cover, a silicon tetrafluoride inlet and a nitrogen inlet penetrate through the top cover, the outer side wall of the plasma reactor is provided with a condensing sleeve, the condensing sleeve is provided with a cold medium inlet and a cold medium outlet, the bottom of the plasma reactor is provided with a discharge hole, a discharge valve is arranged on the discharge hole, a material conveying pipe is connected between the discharge hole and the gas inlet of the bag-type dust remover, a gas suction pipe is connected between the gas outlet of the bag-type dust remover and the gas inlet of the induced draft fan, and the gas outlet of the induced draft fan is connected with the gas collecting tank through a gas exhaust pipe.

Be equipped with the evacuation mouth on foretell top cap, can carry out the evacuation to the system, prevent air interference, effectively improve nitrogen trifluoride purity.

The cold medium inlet is positioned at the lower end of the condensing sleeve, and the cold medium outlet is positioned at the upper end of the condensing sleeve, so that the cooling effect is better.

Compared with the prior art, the utility model has the beneficial effects that:

according to the nitrogen trifluoride preparation device, silicon tetrafluoride and nitrogen react to generate silicon nitride solid and nitrogen trifluoride gas, and the silicon tetrafluoride can be a byproduct of a phosphate fertilizer production enterprise, so that the silicon tetrafluoride is convenient to obtain and low in production cost; moreover, the reaction is stable, and the safety is higher; and the product only contains silicon nitride solid and nitrogen trifluoride gas, and the by-product is less.

Drawings

Fig. 1 is a schematic structural view of the present invention.

In the figure: 1. a plasma generator; 2. a vacuum pumping port; 3. a silicon tetrafluoride inlet; 4. a nitrogen inlet; 5. a top cover; 6. a cold medium outlet; 7. a plasma reactor; 8. a discharge valve; 9. a discharge port; 10. a condensing sleeve; 11. a cold medium inlet; 12. a delivery pipe; 13. a bag-type dust collector; 14. an air intake duct; 15. an induced draft fan; 16. an exhaust pipe; 17. a gas collection tank.

Detailed Description

Embodiments of the utility model are further described below with reference to the accompanying drawings:

as shown in FIG. 1, the apparatus for preparing nitrogen trifluoride according to the present invention comprises a plasma generator 1, a plasma reactor 7, sack cleaner 13, draught fan 15 and gas collection tank 17, plasma reactor 7 is connected to plasma generator 1, the top of plasma reactor 7 is equipped with top cap 5, it has silicon tetrafluoride import 3 and nitrogen gas import 4 to run through on top cap 5, be equipped with condensing jacket 10 on plasma reactor 7's the lateral wall, be equipped with cold medium import 11 and cold medium export 6 on the condensing jacket 10, plasma reactor 7's bottom is equipped with discharge gate 9, be equipped with bleeder valve 8 on the discharge gate 9, be connected with conveying pipeline 12 between discharge gate 9 and sack cleaner 13's the air inlet, be connected with breathing pipe 14 between sack cleaner 13's the gas outlet and draught fan 15's the air inlet, be connected through blast pipe 16 between draught fan 15's the gas outlet and the gas collection tank 17.

In a preferred embodiment: the top cover 5 is provided with the vacuumizing port 2, so that the system can be vacuumized, air interference is prevented, and the purity of nitrogen trifluoride is effectively improved; the cold medium inlet 11 is positioned at the lower end of the condensing sleeve 10, and the cold medium outlet 6 is positioned at the upper end of the condensing sleeve 10, so that the cooling effect is better.

During the use, silicon tetrafluoride gas and nitrogen gas are respectively added into a plasma reactor 7 through a silicon tetrafluoride inlet 3 and a nitrogen gas inlet 4, the plasma reactor 7 is filled with nitrogen plasma by a plasma generator 1, the nitrogen plasma reacts with the introduced silicon tetrafluoride gas to generate silicon nitride solid and nitrogen trifluoride gas, a condensing sleeve 10 can rapidly cool the plasma reactor 7 to prevent the generated nitrogen trifluoride and the silicon nitride from reacting with each other at high temperature to regenerate the silicon tetrafluoride, a discharge valve 8 is opened, the silicon nitride solid and the nitrogen trifluoride gas enter a bag-type dust remover 13 through a feed pipe 12 under the action of a draught fan 15, the silicon nitride solid is discharged from a solid outlet of the bag-type dust remover 13, and the nitrogen trifluoride gas is conveyed into a gas collecting tank 17 through an air suction pipe 14 and an exhaust pipe 16 to complete the collection.

Claims

1. A nitrogen trifluoride production apparatus characterized by comprising: comprises a plasma generator (1), a plasma reactor (7), a bag-type dust collector (13), an induced draft fan (15) and a gas collecting tank (17), wherein the plasma generator (1) is connected with the plasma reactor (7), a top cover (5) is arranged at the top of the plasma reactor (7), a silicon tetrafluoride inlet (3) and a nitrogen inlet (4) penetrate through the top cover (5), a condensing sleeve (10) is arranged on the outer side wall of the plasma reactor (7), a cold medium inlet (11) and a cold medium outlet (6) are arranged on the condensing sleeve (10), a discharge port (9) is arranged at the bottom of the plasma reactor (7), a discharge valve (8) is arranged on the discharge port (9), a material conveying pipe (12) is connected between the discharge port (9) and the gas inlet of the bag-type dust collector (13), and a gas suction pipe (14) is connected between the gas outlet of the bag-type dust collector (13) and the gas inlet of the induced draft fan (15), the gas outlet of the induced draft fan (15) is connected with the gas collecting tank (17) through an exhaust pipe (16).

2. The apparatus for producing nitrogen trifluoride according to claim 1, wherein: the top cover (5) is provided with a vacuum pumping port (2).

3. The nitrogen trifluoride production apparatus according to claim 1 or 2, wherein: the cold medium inlet (11) is positioned at the lower end of the condensing sleeve (10), and the cold medium outlet (6) is positioned at the upper end of the condensing sleeve (10).