CN216864333U - Acid corrosion cleaning equipment capable of preventing acid mist from overflowing - Google Patents

Abstract

The utility model relates to the technical field of metal surface treatment, in particular to acid etching cleaning equipment for preventing acid mist from overflowing, which comprises a device body and a working chamber, wherein the device body is provided with a feeding port and a discharging port; the acid etching tank is provided with a tank cover body to form an independent closed chamber for two-layer sealing so as to prevent strong acid mist from overflowing; and the second manipulator assembly in the closed chamber swings up and down and is subjected to acid etching after receiving the workpiece sent by the first manipulator assembly, the closed chamber is completely closed in the process, and the concentrated acid mist in the closed chamber is pumped out through an independent exhaust pipe of the closed chamber before the workpiece is taken out after the acid etching is finished. The closed chamber can be turned upwards backwards, so that the operations of maintenance, cleaning of the tank body and the like are facilitated. The utility model can effectively prevent the acid mist from overflowing when the workpiece is subjected to acid etching treatment, thereby improving the running stability of the equipment and prolonging the service life of the equipment.

Description

Acid corrosion cleaning equipment capable of preventing acid mist from overflowing

Technical Field

The utility model relates to the technical field of metal surface treatment, in particular to acid etching cleaning equipment for preventing acid mist from overflowing.

Background

Acid etching of metal surfaces is a common treatment process in many industries and is used not only for manufacturing but also for material or equipment cleaning. When the traditional acid etching treatment equipment works, harmful gas is often diffused in a working area, and the gas is overflowed from an acid etching groove to form acid mist to be dissolved into air, so that the traditional acid etching treatment equipment not only causes great harm to human bodies, but also obviously reduces the service life of equipment parts.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide acid etching cleaning equipment for preventing acid mist from overflowing, and the technical problem is solved.

The technical problem solved by the utility model can be realized by adopting the following technical scheme:

an acid etching cleaning device for preventing acid mist from overflowing comprises a device body, wherein the device body is provided with a feeding port and a discharging port, the device body comprises a working chamber, the working chamber is of a closed structure, the feeding port and the discharging port are both communicated with an inner cavity of the working chamber, a safety door is arranged at the communicated position of the feeding port and the discharging port, and the safety door can be opened during feeding and discharging;

a cleaning tank assembly is arranged in the inner cavity of the working chamber, a first manipulator assembly is arranged on one side of the cleaning tank assembly, and a workpiece conveyed into the inner cavity of the working chamber from the feeding port is transferred through the first manipulator assembly and conveyed into the cleaning tank assembly for cleaning;

the cleaning tank assembly comprises an acid etching tank, a second manipulator assembly is arranged on one side of the acid etching tank, the second manipulator assembly is used for receiving and taking a workpiece sent by the first manipulator assembly and then carrying out acid etching treatment, and during acid etching treatment, the second manipulator enables the workpiece to swing up and down, so that the action of lifting and lowering the workpiece in the acid etching tank during manual operation is simulated, and the workpiece is enabled to move up and down frequently in cleaning liquid contained in the acid etching tank;

a tank cover body is arranged outside the acid etching tank, and the tank cover body covers the acid etching tank and the second manipulator assembly to form a two-layer closed chamber of the acid etching tank;

an openable cover top cover is arranged at the top of the groove cover body, and after the groove cover body is opened, an opening at the top of the groove cover body is exposed, so that a first manipulator component can conveniently move downwards to pick and place workpieces in an inner cavity of the groove cover body;

the working chamber is provided with a first air exhaust assembly, and the first air exhaust assembly is communicated with the inner cavity of the working chamber.

According to the utility model, the closed operation of acid etching cleaning operation is realized by arranging the device body, the working area is isolated by the working chamber, the workpiece is conveyed in the working chamber through the first manipulator assembly, the workpiece is subjected to acid etching treatment in the acid etching groove through the second manipulator assembly, and the working chamber is ventilated through the first air exhaust assembly, so that the content of corrosive gas in the air in the working chamber is reduced, and the working part in the working chamber is ensured to have a better working environment.

The acid etching tank is provided with an openable tank top cover, and after the tank top cover is closed, the liquid in the acid etching tank is prevented from volatilizing corrosive gas, so that other structural components, such as a second mechanical arm component and the like, are prevented from being corroded.

And a second air exhaust assembly is arranged outside the working chamber and is communicated with the inner cavity of the two-layer sealed chamber of the pickling tank.

The first manipulator assembly comprises a walking part, a lifting part and a grabbing part;

the grabbing part is connected with the lifting part and used for picking and placing workpieces;

the lifting part is connected with the walking part and can do reciprocating linear movement in the vertical direction along the walking part, and the lifting part drives the grabbing part to lift together when moving;

the walking part is arranged on a walking track and can do reciprocating linear movement along the walking track in the horizontal direction.

The second manipulator assembly comprises a storage seat and a lifting mechanism connected with the storage seat, and after the lifting mechanism drives the storage seat to lift, workpieces on the storage seat are immersed in liquid in an acid etching groove below the storage seat;

the lowest lifting position of the article placing seat is positioned above the liquid level surface of the acid etching groove.

The second manipulator assembly is made of PTFE (polytetrafluoroethylene) or PVDF (polyvinylidene fluoride).

The cleaning tank assembly comprises a rinsing tank, wherein the rinsing tank is positioned on one side of the acid etching tank and is used for rinsing the workpiece treated in the acid etching tank.

The cleaning tank assembly comprises at least two acid etching tanks, and the second manipulator assembly is arranged in each acid etching tank;

the rinsing tank is provided on one side of any one of the acid etching tanks.

According to the utility model, a plurality of acid etching grooves and corresponding rinsing grooves are arranged in the working chamber, so that a plurality of processes of the workpiece treatment process are realized, and a plurality of cleaning processes of the workpiece from thickness to fineness are realized.

The cleaning tank assembly includes an ultrasonic cleaning tank positioned between the rinse tank and the discharge port.

The cleaning tank assembly comprises a hot air drying tank, and the hot air drying tank is located between the ultrasonic cleaning tank and the discharge hole.

Has the advantages that: by adopting the technical scheme, the acid etching treatment process of the workpiece to be treated has a plurality of safety measures for preventing the acid mist from overflowing, the working area can be isolated by the working chamber in the feeding and discharging link, the acid mist in the working chamber can be timely removed by matching with the first air exhaust assembly, the working area can be isolated by the tank top cover of the acid etching tank and the cover top cover of the tank cover body in the process that the workpiece enters and exits the acid etching tank, and the air exchange of the inner cavity of the tank cover body is realized by matching with the second air exhaust assembly.

Drawings

FIG. 1 is a schematic structural diagram of the present invention;

fig. 2 is a partial structural schematic diagram of fig. 1.

Detailed Description

In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the utility model easy to understand, the utility model is further described with the specific drawings. It is noted that the terms "first," "second," "third," "fourth," and the like (if any) in the description and in the claims of the utility model are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It will be appreciated that the data so used may be interchanged under appropriate circumstances such that the embodiments described herein may be practiced otherwise than as specifically illustrated or described herein. Furthermore, the terms "comprises" or "comprising," and any variations thereof, are intended to cover non-exclusive inclusions, such that a product or apparatus that comprises a list of elements or units is not necessarily limited to those elements or units expressly listed, but may include other elements or units not expressly listed or inherent to such product or apparatus.

Referring to fig. 1 and 2, an acid etching cleaning apparatus for preventing acid mist from overflowing comprises an apparatus body including a working chamber 100, on which a feeding port 101 and a discharging port 102 are provided. The working chamber 100 is of a closed structure, the feeding port 101 and the discharging port 102 are both communicated with an inner cavity of the working chamber 100, and a safety door can be arranged at the communication position of the working chamber to seal the working chamber when feeding or discharging is not needed.

A cleaning tank assembly is arranged in the inner cavity of the working chamber 100, a first manipulator assembly 210 is arranged on one side of the cleaning tank assembly, and workpieces conveyed into the inner cavity of the working chamber 100 from the feeding port 101 are transferred through the first manipulator assembly 210 and are conveyed into the cleaning tank assembly for cleaning;

the cleaning tank assembly comprises an acid etching tank 301, a second manipulator assembly is arranged on one side of the acid etching tank 301, the second manipulator assembly is used for carrying out acid etching treatment after receiving a workpiece sent by the first manipulator assembly 210, and during acid etching treatment, the second manipulator assembly enables the workpiece to swing up and down, so that the action of lifting and lowering the workpiece in the acid etching tank 301 during manual operation is simulated, and the workpiece is enabled to move up and down frequently in cleaning liquid contained in the acid etching tank 301;

a tank cover body 400 is arranged outside the acid etching tank 301, and the tank cover body 400 covers the acid etching tank 301 and the second manipulator assembly to form a two-layer closed chamber of the acid etching tank, so that the second manipulator assembly is positioned in an inner cavity of the closed chamber; the top of the tank enclosure 400 is provided with an enclosure top cover 401, and the enclosure top cover 401 can be opened or closed at the top of the tank enclosure. After the workpiece picking mechanism is opened, the workpiece picking mechanism can expose the opening at the top of the groove cover body, so that the first manipulator assembly 210 can conveniently pick and place the workpiece on the second manipulator assembly after extending into the inner cavity of the first manipulator assembly;

the working chamber 100 is externally provided with a first air-extracting component 501, and the first air-extracting component 501 is communicated with the inner cavity of the working chamber 100. To provide uniform pumping, multiple access points may be provided along the length of the chamber 100 to connect the first pumping assembly 501. The access point is arranged on the top wall of the working chamber.

It should be noted that the working chamber can be constructed by using galvanized steel sheets to cooperate with transparent corrosion-resistant materials, for example, the working chamber is divided into an upper structure and a lower structure, the lower structure is surrounded by the galvanized steel sheets, the upper structure made of glass and other materials is covered on the lower structure, and openings for feeding and discharging are arranged on the lower structure.

The tank cover body 400 may be made of a transparent material, such as transparent acrylic, transparent glass, or transparent PVC.

In some embodiments, the cover top cover is arranged in a push-pull folding-up structure, and the push-pull folding-up structure can be arranged as follows: as shown in fig. 2, the cover top 401 includes a top assembly including a sliding plate and a rotating plate, which are rotatably coupled. One side of the rotating plate is rotatably connected with one side of the top opening of the chute cover body 400, and the other side of the rotating plate is rotatably connected with one side of the sliding plate, and the other side of the sliding plate can slide along the plane where the top opening of the chute cover body is located.

In some preferred embodiments, the symmetrical sides of the top opening of the chute cover body (the left side and the right side of the top opening of the chute cover body in the structure shown in fig. 2) are respectively connected with a top cover assembly, the top cover assemblies on the two sides work simultaneously, the opening of the cover top cover can realize the effect of a 'split door', and the design sizes of the rotating plate and the sliding plate can be effectively controlled in some application scenes with large sizes of the top opening of the cover body.

In other preferred embodiments, the same top cover assembly comprises a rotating plate and a plurality of sliding plates, the left side of the top opening of the connecting groove cover body is rotated by the left side of the rotating plate, the right side of the rotating plate is rotatably connected with the left side of the first-stage sliding plate, the front side and the rear side of the top opening of the connecting groove cover body are slidably connected with the right side of the first-stage sliding plate, meanwhile, the left side of the second-stage sliding plate on the right side of the first-stage sliding plate is also connected with the right side of the first-stage sliding plate, the right side of the second-stage sliding plate is rotated to be connected with the left side of the subsequent third-stage sliding plate, after the arrangement, the subsequent sliding plates are connected step by step, and therefore the same top cover assembly can be opened, and the opening of the connecting groove cover body is opened under the condition that the whole plate surface is folded to be smaller in height.

In some of the preferred embodiments, the slot cover is provided in an upturned configuration of the overall cover structure. For example, one side of the tank cover body is connected with the mounting base thereof through a hinge, and the mounting base comprises the ground on one side of the acid etching tank, or a mounting bracket mounted on the ground, or the tank edge of the acid etching tank, or a bracket fixedly connected to the outer wall of the acid etching tank.

It should be noted that the opening arrangement of the slot top cover in the present application may be the same as the cover top cover.

In some embodiments, as shown in fig. 2, a tank top cover 3011 is disposed on the acid etching tank 301, and the opening and closing of the tank top cover 3011 controls the opening and closing of the opening of the acid etching tank 301. Therefore, the tank top cover 3011 can be set to open only when the workpiece needs to enter the acid etching tank 301, and after the acid etching treatment is finished, the workpiece is taken out from the acid etching tank by the second manipulator assembly and then closed, so that the corrosive gas volatilized from the acid etching tank can be effectively prevented from diffusing to other areas, and the corrosion to other structural components can be avoided.

In some embodiments, as shown in fig. 1 and 2, a second pumping assembly 502 is disposed outside the working chamber 100, and the second pumping assembly 502 is communicated with the inner cavity of the tank cover 400. As shown in FIG. 2, the sidewall of the tank cover 400 is opened and then connected to the exhaust line of the second exhaust assembly 502, so as to exhaust the corrosive gas in the tank cover 400 from the inner cavity of the tank cover.

In some embodiments, as shown in fig. 1, 2, the first robot assembly 210 includes a walking section, a lifting section, and a grasping section; the grabbing part is connected with the lifting part and used for picking and placing the workpiece 900; the lifting part is connected with the traveling part and can do reciprocating linear movement in the vertical direction along the traveling part, and the lifting part drives the grabbing part to lift together when moving; the walking part is arranged on a walking track and can do reciprocating linear movement along the walking track in the horizontal direction.

Specifically, the first manipulator assembly may be arranged as follows: the gripping part is provided with a clamping jaw 2101 capable of gripping a workpiece, and the clamping jaw 2101 is connected with the lifting part after being fixed by a fixing frame;

the lifting part is provided with a lifting bracket for fixing a fixing frame of the clamping jaws 2101 and a lifting rail 2102 vertically arranged on the walking part, and the lifting bracket is connected with the lifting rail 2102 in a sliding manner, so that the lifting bracket is lifted and lowered along the lifting rail 2102 in the vertical direction;

the traveling part is provided with a vertical column 2103, a lifting track 2102 of the lifting part is arranged on the vertical column 2103, a roller (not shown in the figure) is arranged at the bottom of the vertical column 2103, a ground rail (not shown in the figure) is arranged at one side of the cleaning tank assembly to be used as the traveling track, and the roller is arranged on the ground rail and can perform reciprocating linear movement in the horizontal direction along the ground rail.

In addition, in order to make the traveling action of the traveling part smooth, a top rail (not shown) may be provided above the traveling part as another traveling rail, the top rail and the bottom rail may be parallel to each other, the respective tank bodies in the cleaning tank assembly may be sequentially provided along the same straight line, and the top rail and the bottom rail may be provided parallel to each other.

In some embodiments, as shown in fig. 2, the second robot assembly includes a storage seat 221 and a lifting mechanism 222 connected to the storage seat 221, and after the lifting mechanism 222 drives the storage seat 221 to lift, a workpiece on the storage seat 221 (in the structure shown in fig. 2, the workpiece is not placed on the storage seat 221) is immersed in the liquid in the acid etching tank 301 located below the storage seat 221;

the lowest position of the holder 221 is located above the liquid level of the acid etching tank 301. As shown in fig. 2, a workpiece 900 is provided with a suspension member, and a gripping jaw 2101 of the first robot assembly grips the suspension member to pick up and transfer the workpiece 900; the second robot assembly has a supporter 221 for supporting both ends of the suspension member, so that the supported workpiece 900 is located below the supporter 221. When the second manipulator assembly works and moves the object placing seat 221 up and down, the object placing seat 221 is always ensured to be positioned above the liquid level surface of the acid etching groove 301, and meanwhile, the workpiece 900 can be immersed under the liquid level surface, so that the acid etching operation can be completed, and the object placing seat is prevented from being immersed in corrosive liquid.

In some preferred embodiments, the lifting mechanism 222 has two lifting rails parallel to each other and vertically disposed at a certain distance, and the object holder 221 is slidably connected to the two lifting rails and linearly reciprocates thereon in an up-and-down direction.

In some embodiments, the second robot assembly employs a robot assembly made of PTFE (polytetrafluoroethylene) or PVDF (polyvinylidene fluoride).

The PTFE polytetrafluoroethylene is a high molecular polymer obtained by polymerizing tetrafluoroethylene as a monomer, and is white wax-like and translucent; the high-temperature-resistant and high-temperature-resistant steel has excellent heat resistance and cold resistance, can be used at the temperature of minus 180-260 ℃ for a long time, and has excellent acid and alkali resistance, so that a structural part made of the high-temperature-resistant and high-temperature-resistant steel can work in a high-corrosion working environment for a long time.

PVDF (polyvinylidene fluoride) is a vinylidene fluoride homopolymer or a copolymer of vinylidene fluoride and other small amount of fluorine-containing vinyl monomers, has the characteristics of fluororesin and general resin, has good chemical corrosion resistance, high temperature resistance, oxidation resistance, weather resistance and ray radiation resistance, and also has special properties such as piezoelectricity, dielectricity and pyroelectricity, and also belongs to a type with extremely high strength and excellent corrosion resistance in fluoroplastics, so that the PVDF polyvinylidene fluoride is suitable for being used as a material for manufacturing a second manipulator component which needs to work in a high-corrosion environment for a long time in the application.

In the present invention, the second robot assembly is a part closest to the acid etching bath with respect to the first robot assembly, and is continuously located in the closed space filled with the corrosive gas during the acid etching operation, so that the respective component structures of the second robot assembly are made of PTFE or PVDF material, thereby enabling the second robot assembly to operate for a long time in the vicinity of the acid etching bath.

In some embodiments, as shown in figure 1, the cleaning tank assembly includes a rinse tank 302, the rinse tank 302 being located on one side of the acid tank 301 for rinsing the treated workpieces in the acid tank 301.

In some embodiments, the cleaning tank assembly includes at least two acid etching tanks, each acid etching tank having a second robot assembly disposed therein; a rinsing tank is provided on one side of each of the acid etching tanks.

For example, FIG. 1 shows a configuration in which the cleaning tank assembly is further provided with a second acid tank 301-1, in combination with a second rinse tank 302-1.

According to the utility model, a plurality of acid etching tanks and corresponding rinsing tanks are arranged in the working chamber, so that a plurality of processes of the workpiece treatment process are realized, and a plurality of cleaning processes of the workpiece from thickness to fineness are realized.

In some embodiments, as shown in FIG. 1, the cleaning tank assembly includes an ultrasonic cleaning tank 303, the ultrasonic cleaning tank 303 being located between the rinse tank 301 and the spout 102.

In some embodiments, as shown in fig. 1, the cleaning tank assembly includes a hot air drying tank 304, the hot air drying tank 304 being located between the ultrasonic cleaning tank 303 and the discharge port 102.

In some embodiments, a waste liquid collecting tank (not shown) may be disposed below any acid etching tank for collecting waste liquid of the overflowing corrosive liquid.

When the utility model works, the method can be carried out according to the following steps:

1) a workpiece to be processed is fed into the working chamber from the feeding port;

2) the first mechanical arm component moves to a workpiece, the clamping jaw descends to grab and lift the workpiece to a certain height, and then the workpiece is translated to the acid etching groove (when a plurality of acid etching grooves are arranged, a certain acid etching groove can be selected to be used as first acid etching treatment);

3) the cover top cover of the tank cover body of the acid etching tank is opened, and the first manipulator assembly enables the workpiece to descend and then places the workpiece on the object placing seat of the second manipulator assembly;

4) the first manipulator assembly leaves the acid etching tank, the cover top cover is closed, and the tank top cover is opened;

5) the second manipulator assembly descends the workpiece and then immerses the workpiece below the liquid level surface of the acid etching tank;

6) the second manipulator component swings up and down to carry out acid etching cleaning treatment on the workpiece;

7) after cleaning, lifting the article placing seat of the second manipulator assembly, then lifting the workpiece out of the liquid in the tank, and closing the top cover of the tank; and (5) exhausting by an exhaust pipe.

8) After air draft is finished, the cover top cover is opened, the first mechanical arm component takes the workpiece away from the second mechanical arm component and sends the workpiece to a rinsing tank for rinsing treatment;

9) after rinsing, the first manipulator assembly transfers the workpiece into a subsequent cleaning tank for corresponding cleaning or treatment (including ultrasonic cleaning and hot air drying);

10) and after the operation is finished, the first mechanical arm component sends the workpiece to the discharge hole.

In the above-described embodiment, when a plurality of etching tanks and corresponding rinsing tanks are provided, a multi-step cleaning in which etching- > rinsing is performed in a cycle may be performed sequentially.

In summary, the device body is arranged to realize closed operation of acid etching cleaning operation, the working chamber is used for isolating the working area, the workpiece is conveyed in the working chamber through the first mechanical arm assembly, the workpiece is subjected to acid etching treatment in the acid etching groove through the second mechanical arm assembly, and the working chamber is ventilated through the first air exhaust assembly, so that the content of corrosive gas in the air in the working chamber is reduced, and the working parts in the working chamber have a better working environment.

In addition, the first air exhaust assembly and the second air exhaust assembly can be made of pipelines with different pipe diameters, and the pipeline material needs to have better corrosion resistance, such as a PVC pipe or a CPVC pipe. The two air pumping assemblies can share the same air pump, and are provided with independent valves arranged on each pipeline to independently control the first air pumping assembly and the second air pumping assembly. Or the two air extraction assemblies are respectively connected with an independent air extractor matched with the two air extraction assemblies.

The cover top cover and the groove top cover can both adopt an automatic opening structure, for example, when the cover top cover is set to be an automatic door structure, the cover top cover and the groove top cover can be connected through a driving mechanism such as a motor and a driving connecting rod and the like and drive a sliding plate in a top cover component of the cover top cover to make the sliding plate linearly reciprocate along the edge of the opening at the top of the groove cover body. The motor drives the mechanical part to make reciprocating linear movement in the linear groove, which is the prior art, such as an electrically driven screw rod, a linear guide rail and the like, and therefore, the details are not described herein.

The foregoing shows and describes the general principles and broad features of the present invention and advantages thereof. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the utility model as claimed. The scope of the utility model is defined by the appended claims and equivalents thereof.

Claims (10)

1. An acid etching cleaning device for preventing acid mist from overflowing comprises a device body, wherein the device body is provided with a feeding port and a discharging port, and is characterized in that the device body comprises a working chamber, the working chamber is of a closed structure, and the feeding port and the discharging port are both communicated with an inner cavity of the working chamber;

a cleaning tank assembly is arranged in an inner cavity of the working chamber, and a first manipulator assembly is arranged on one side of the cleaning tank assembly;

the cleaning tank assembly comprises an acid etching tank, a second manipulator assembly is arranged on one side of the acid etching tank, and the second manipulator assembly is used for receiving and taking the workpiece sent by the first manipulator assembly and then carrying out acid etching treatment;

a tank cover body is arranged outside the acid etching tank, and covers the acid etching tank and the second manipulator assembly to form a two-layer closed chamber of the acid etching tank;

the top of the tank cover body is provided with an openable cover top cover;

the working chamber is provided with a first air exhaust assembly, and the first air exhaust assembly is communicated with the inner cavity of the working chamber.

2. The apparatus for acid etching cleaning of claim 1, wherein a cover top is provided on the acid etching tank.

3. The acid etching cleaning equipment for preventing the acid mist from overflowing as claimed in claim 1, wherein a second air pumping assembly is arranged outside the working chamber, and the second air pumping assembly is communicated with the inner cavity of the two-layer closed chamber of the acid pickling tank.

4. The acid etching cleaning equipment for preventing the acid mist from overflowing as claimed in claim 1, wherein the first manipulator assembly comprises a walking part, a lifting part and a grabbing part, the grabbing part is connected with the lifting part, the lifting part is connected with the walking part and can perform reciprocating linear movement in a vertical direction along the walking part, and the walking part is arranged on a walking track and can perform reciprocating linear movement in a horizontal direction along the walking track.

5. The apparatus of claim 1, wherein the second robot assembly comprises a holder and a lifting mechanism connected to the holder, and the lowest position of the holder is above the liquid level of the acid etching tank.

6. The acid etching cleaning device for preventing the acid mist from overflowing as claimed in claim 5, wherein the second manipulator assembly is a manipulator assembly made of PTFE or PVDF.

7. The acid etching cleaning apparatus for preventing acid mist from overflowing as claimed in any one of claims 1 to 6, wherein the cleaning tank assembly comprises a rinsing tank, and the rinsing tank is positioned at one side of the acid etching tank.

8. The apparatus of claim 7, wherein the cleaning tank assembly comprises at least two acid etching tanks, and a second robot assembly is disposed in each acid etching tank;

the rinsing tank is provided on one side of any one of the acid etching tanks.

9. The acid etching cleaning apparatus for preventing acid mist from overflowing of claim 8, wherein the cleaning tank assembly comprises an ultrasonic cleaning tank, and the ultrasonic cleaning tank is positioned between the rinsing tank and the discharge port.

10. The apparatus of claim 9, wherein the cleaning tank assembly comprises a hot air drying tank, and the hot air drying tank is located between the ultrasonic cleaning tank and the discharge port.

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