CN216812063U - Vacuum maintaining device of industrial cleaning machine system - Google Patents

Vacuum maintaining device of industrial cleaning machine system Download PDF

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Publication number
CN216812063U
CN216812063U CN202121765276.0U CN202121765276U CN216812063U CN 216812063 U CN216812063 U CN 216812063U CN 202121765276 U CN202121765276 U CN 202121765276U CN 216812063 U CN216812063 U CN 216812063U
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China
Prior art keywords
buffer tank
vacuum pump
liquid ring
ring vacuum
liquid
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CN202121765276.0U
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Chinese (zh)
Inventor
张捷
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Ecoclean Machinery Shanghai Co ltd
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Ecoclean Machinery Shanghai Co ltd
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Abstract

The utility model relates to a vacuum maintaining device of an industrial cleaning machine system, which comprises: buffer tank, liquid ring vacuum pump, fluid infusion hand valve and system's interface, the system's interface with the entry linkage of liquid ring vacuum pump, the export of liquid ring vacuum pump with the entry linkage at buffer tank top, the fluid infusion mouth of liquid ring vacuum pump passes through the fluid infusion hand valve with the sub-unit connection of buffer tank, the inside of buffer tank is provided with cooling coil. The utility model can indirectly control the refrigerating capacity by controlling the liquid level, has higher condensing efficiency, reduces the solvent discharge, can automatically control the starting and stopping of the refrigerating equipment according to the temperature and reduces the energy consumption.

Description

Vacuum maintaining device of industrial cleaning machine system
Technical Field
The utility model relates to the field of industrial cleaning machines, in particular to a vacuum maintaining device of an industrial cleaning machine system.
Background
In the prior art, a system vacuum maintaining device of an industrial cleaning machine cannot condense and recycle solvent gas in the system, so that air is polluted and explosion risks exist. On the one hand, the system vacuum maintaining device with the drying and condensing device is high in cost, and on the other hand, the refrigerating capacity cannot be automatically controlled through the state of equipment.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to a vacuum maintenance device for an industrial cleaning machine system to solve at least one of the above problems.
To solve the above technical problems, as an aspect of the present invention, there is provided an industrial cleaning machine system vacuum maintaining apparatus, comprising: buffer tank, liquid ring vacuum pump, fluid infusion hand valve and system's interface, the system's interface with the entry linkage of liquid ring vacuum pump, the export of liquid ring vacuum pump with the entry linkage at buffer tank top, the fluid infusion mouth of liquid ring vacuum pump passes through the fluid infusion hand valve with the sub-unit connection of buffer tank, the inside of buffer tank is provided with cooling coil.
Preferably, a first overflow port of the buffer tank is connected with a second overflow port, the mounting height of the second overflow port is lower than that of the first overflow port, a side outlet of the second overflow port is connected with a water separator interface, and the mounting height of the top of the cooling coil is flush with that of the first overflow port.
Preferably, the level of the first overflow port is higher than the installation height of the liquid ring vacuum pump.
Preferably, an outlet below the second overflow port is connected with a first end of a three-way pipeline through a liquid level control valve, a second end of the three-way pipeline is connected with the buffer tank, and a third end of the three-way pipeline is connected with a liquid discharge hand valve of the buffer tank.
Preferably, a regulating valve for mixing air is arranged on a pipeline between a liquid supplementing port of the liquid ring vacuum pump and the liquid supplementing hand valve, the mounting height of the regulating valve is higher than that of the buffer tank and the liquid ring vacuum pump, and the regulating valve is connected with an atmosphere communication port.
Preferably, a liquid ring vacuum pump liquid discharging hand valve is arranged on a pipeline between the liquid supplementing hand valve and the regulating valve.
Preferably, the system interface is connected to the inlet of the liquid ring vacuum pump through a suction valve.
Preferably, a temperature sensor is further arranged inside the buffer tank.
By adopting the technical scheme, the refrigeration capacity can be indirectly controlled by controlling the liquid level, the condensation efficiency is higher, the solvent emission is reduced, the refrigeration equipment can be automatically controlled to be started or stopped according to the temperature, and the energy consumption is reduced.
Drawings
Fig. 1 schematically shows a structural principle of the present invention.
Reference numbers in the figures: 1. a buffer tank; 2. a temperature sensor; 3. a cooling coil; 4. a three-way pipeline; 5. a second overflow port; 6. a liquid level control valve; 7. a first overflow port; 8. adjusting a valve; 9. a liquid ring vacuum pump; 10. an inlet; 11. a suction valve; 12. an atmosphere communication port; 13. a system interface; 14. a liquid ring vacuum pump liquid discharge hand valve; 15. a buffer tank liquid discharge hand valve; 16. a liquid supplementing hand valve; 17. a water separator interface.
Detailed Description
Embodiments of the utility model will be described in detail below with reference to the drawings, but the utility model can be implemented in many different ways as defined and covered by the claims.
In one aspect of the utility model, a system vacuum maintaining device of an industrial cleaning machine, in particular to a system vacuum maintaining device of an industrial cleaning machine with flammable and volatile solvent as a medium is provided. Wherein, the solvent can be modified ethanol or hydrocarbon solvent, the utility model is suitable for removing oil or debris on parts produced in large scale, such as: a machined gear; machining a cutter; a stamping part and the like can be used in a solvent type industrial cleaning machine to reduce the pressure in the cleaning machine and recover and prevent solvent from overflowing.
The vacuum maintaining device of the industrial cleaning machine system comprises: buffer tank 1, liquid ring vacuum pump 9, fluid infusion hand valve 16 and system interface 13, system interface 13 with the entry linkage of liquid ring vacuum pump 9, the export of liquid ring vacuum pump 9 with the entry 10 at buffer tank 1 top is connected, the fluid infusion mouth of liquid ring vacuum pump 9 passes through fluid infusion hand valve 16 with the sub-unit connection of buffer tank 1, the inside of buffer tank 1 is provided with cooling coil 3.
Preferably, a first overflow port 7 of the buffer tank 1 is connected with a second overflow port 5, the installation height of the second overflow port 5 is lower than that of the first overflow port 7, a side outlet of the second overflow port 5 is connected with a water separator interface 17, and the installation height of the top of the cooling coil 3 is flush with that of the first overflow port 7.
Preferably, the level of the first overflow outlet 7 is higher than the installation height of the liquid ring vacuum pump 9.
Preferably, an outlet below the second overflow port 5 is connected with a first end of a three-way pipeline 4 through a liquid level control valve 6, a second end of the three-way pipeline 4 is connected with the buffer tank 1, and a third end of the three-way pipeline 4 is connected with a buffer tank liquid discharge hand valve 15.
Preferably, a regulating valve 8 for mixing air is arranged on a pipeline between the liquid supplementing port of the liquid ring vacuum pump 9 and the liquid supplementing hand valve 16, the installation height of the regulating valve 8 is higher than that of the buffer tank 1 and the liquid ring vacuum pump 9, and the regulating valve 8 is connected with an atmosphere communication port 12.
Preferably, a liquid ring vacuum pump drainage hand valve 14 is arranged on a pipeline between the liquid supplementing hand valve 16 and the regulating valve 8.
Preferably, the system interface 13 is connected to the inlet of the liquid ring vacuum pump 9 via a suction valve 11.
Preferably, a temperature sensor 2 is further disposed inside the buffer tank 1.
In the utility model, a first overflow port 7 is reserved at the upper part of the buffer tank 1, and the horizontal height of the first overflow port 7 is higher than the installation height of the liquid ring vacuum pump 9. The first overflow port 7 is connected with the second overflow port 5 through a pipeline, and the installation height of the second overflow port 5 is lower than that of the first overflow port 7. The side outlet of the second overflow port 5 is connected with a water separator connector 17, the lower outlet of the second overflow port 5 is connected with a liquid level control valve 6, and the other side connector of the liquid level control valve 6 is connected with a three-way pipeline 4. The upper connector of the three-way pipeline 4 is connected with the lower part of the buffer tank 1, and the lower connector is connected with the liquid discharge hand valve 15 of the buffer tank. Buffer tank 1 internally mounted has temperature sensor 2 and cooling coil 3, and the top mounting height of cooling coil 3 flushes with first overflow mouth 7. The inlet of the liquid ring vacuum pump 9 is connected to a system interface 13 via a suction valve 11. The outlet of the liquid ring vacuum pump 9 is connected with the inlet 10 at the top of the buffer tank. The liquid supplementing port of the liquid ring vacuum pump 9 is connected with the lower part of the buffer tank 1 through a liquid supplementing hand valve 16. The liquid supplementing pipeline is provided with an adjusting valve 8 for mixing air. The regulating valve 8 is higher than the buffer tank 1 and the liquid ring vacuum pump 9 in installation height and is connected with an atmosphere communicating port 12. The liquid ring vacuum pump liquid discharge hand valve 14 is installed between the liquid ring vacuum pump 9 and the liquid ring vacuum pump liquid supplement hand valve 16, and is used for discharging liquid in the liquid ring vacuum pump 9 when the liquid ring vacuum pump needs maintenance.
When the device is used for the first time, solvent is added into the buffer tank 1 and the liquid ring vacuum pump 9 until the solvent overflows from the first overflow port 7, the liquid supplementing hand valve 16 of the liquid ring vacuum pump is opened, and the liquid discharging hand valve 15 of the buffer tank and the liquid discharging hand valve 14 of the liquid ring vacuum pump are closed. After the system is started, the cooling coil 3 starts to refrigerate. And when the temperature of the solvent detected by the buffer tank temperature sensor 2 is lower than 20 ℃, starting the liquid ring vacuum pump 9. After the liquid ring vacuum pump 9 is started, the mixing ratio of air and solvent is adjusted by the adjusting valve 8, and the test liquid ring vacuum pump 9 works in the optimal state.
When the system does not need to reduce the pressure, the suction valve 11 is closed, the liquid level control valve 6 is opened, the liquid in the buffer tank 1 is discharged from the second overflow port 5, the liquid level is reduced, and part of the cooling coil 3 is exposed.
When the system pressure needs to be reduced, the suction valve 11 is opened, and the liquid ring vacuum pump 9 pumps the air containing the solvent in the system out through the system interface 13 and discharges the air from the buffer tank inlet 10 to the buffer tank 1. The liquid level control valve 6 is closed, the solvent gas discharged into the buffer tank 1 is rapidly condensed, the solvent liquid level in the buffer tank 1 is gradually increased and then discharged through the first overflow port 7, and the dried air is discharged into the atmosphere through the water separator interface 17.
By adopting the technical scheme, the refrigeration capacity can be indirectly controlled by controlling the liquid level, the condensation efficiency is higher, the solvent discharge is reduced, the refrigeration equipment can be automatically controlled to start and stop according to the temperature, and the energy consumption is reduced.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (8)

1. An industrial cleaning machine system vacuum maintenance device, comprising: buffer tank (1), liquid ring vacuum pump (9), fluid infusion hand valve (16) and system interface (13), system interface (13) with the entry linkage of liquid ring vacuum pump (9), the export of liquid ring vacuum pump (9) with entry (10) at buffer tank (1) top are connected, the fluid infusion mouth of liquid ring vacuum pump (9) passes through fluid infusion hand valve (16) with the sub-unit connection of buffer tank (1), the inside of buffer tank (1) is provided with cooling coil (3).
2. The vacuum maintaining device of the industrial cleaning machine system according to claim 1, characterized in that the first overflow port (7) of the buffer tank (1) is connected with the second overflow port (5), the second overflow port (5) is installed at a lower height than the first overflow port (7), the side outlet of the second overflow port (5) is connected with the water separator interface (17), and the top installation height of the cooling coil (3) is flush with the first overflow port (7).
3. The industrial washer system vacuum maintenance device of claim 2, characterized in that the level of the first overflow port (7) is higher than the installation height of the liquid ring vacuum pump (9).
4. The vacuum maintaining device of industrial cleaning machine system according to claim 2, characterized in that the lower outlet of the second overflow port (5) is connected with the first end of a three-way pipeline (4) through a liquid level control valve (6), the second end of the three-way pipeline (4) is connected with the buffer tank (1), and the third end of the three-way pipeline (4) is connected with a buffer tank drainage hand valve (15).
5. The vacuum maintaining device of the industrial cleaning machine system according to claim 1, characterized in that a regulating valve (8) for mixing air is arranged on a pipeline between the liquid supplementing port of the liquid ring vacuum pump (9) and the liquid supplementing hand valve (16), the regulating valve (8) is installed at a higher height than the buffer tank (1) and the liquid ring vacuum pump (9), and the regulating valve (8) is connected with an atmosphere communication port (12).
6. The vacuum maintaining device of industrial cleaning machine system according to claim 5, characterized in that a liquid ring vacuum pump drainage hand valve (14) is arranged on the pipeline between the liquid supplementing hand valve (16) and the regulating valve (8).
7. The industrial washer system vacuum maintenance device according to claim 1, characterized in that the system interface (13) is connected with the inlet of the liquid ring vacuum pump (9) through a suction valve (11).
8. The industrial washer system vacuum maintenance device according to claim 1, characterized in that the interior of the buffer tank (1) is further provided with a temperature sensor (2).
CN202121765276.0U 2021-07-30 2021-07-30 Vacuum maintaining device of industrial cleaning machine system Active CN216812063U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121765276.0U CN216812063U (en) 2021-07-30 2021-07-30 Vacuum maintaining device of industrial cleaning machine system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121765276.0U CN216812063U (en) 2021-07-30 2021-07-30 Vacuum maintaining device of industrial cleaning machine system

Publications (1)

Publication Number Publication Date
CN216812063U true CN216812063U (en) 2022-06-24

Family

ID=82039345

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202121765276.0U Active CN216812063U (en) 2021-07-30 2021-07-30 Vacuum maintaining device of industrial cleaning machine system

Country Status (1)

Country Link
CN (1) CN216812063U (en)

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