CN216657519U - Flatness repairing device of ceramic disc for silicon carbide wafer - Google Patents
Flatness repairing device of ceramic disc for silicon carbide wafer Download PDFInfo
- Publication number
- CN216657519U CN216657519U CN202123111341.0U CN202123111341U CN216657519U CN 216657519 U CN216657519 U CN 216657519U CN 202123111341 U CN202123111341 U CN 202123111341U CN 216657519 U CN216657519 U CN 216657519U
- Authority
- CN
- China
- Prior art keywords
- fixed mounting
- polishing
- silicon carbide
- base
- fixed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
Abstract
The utility model relates to the technical field of silicon carbide wafers, in particular to a flatness repairing device of a ceramic disc for the silicon carbide wafer, which comprises a base, an adjusting and supporting mechanism, a fixed rotating mechanism, a polishing repairing mechanism, a polishing solution feeding mechanism and a detection observing mechanism, wherein the adjusting and supporting mechanism is fixedly arranged at the top of the base, the polishing head is fixedly arranged at the bottom of a rotating shaft by arranging the polishing repairing mechanism and the fixed rotating mechanism, the ceramic disc is fixedly arranged at the top of a fixed frame, a turntable is opened to drive the ceramic disc to rotate, placing grooves at the top of the ceramic disc are in one-to-one correspondence with the polishing head, a push rod is opened to drive an installing plate to move downwards until the polishing head is contacted with the placing grooves at the top of the ceramic disc, then a servo motor is opened to drive the rotating shaft and the polishing head to rotate, so that the polishing head polishes and repairs the inside of the placing grooves, the repair of the ceramic disc can be more accurate.
Description
Technical Field
The utility model relates to the technical field of ceramic disks for silicon carbide wafers, in particular to a flatness repairing device of a ceramic disk for a silicon carbide wafer.
Background
The silicon carbide wafer has the main application fields of LED solid illumination and high-frequency devices, the material has the excellent characteristics of forbidden band which is several times higher than that of the traditional silicon, such as drift velocity, breakdown voltage, heat conductivity, high temperature resistance and the like, and has irreplaceable advantages in the electronic application fields of high temperature, high pressure, high frequency, high power, photoelectricity, radiation resistance, microwave performance and the like and the extreme environment application of aerospace, military industry, nuclear energy and the like.
The prosthetic devices who uses at present restores a plurality of standing grooves of ceramic dish when can't be more convenient when using, and current prosthetic devices is omitting to gap department very easily when polishing the restoration, can't reach absolute level and smooth in the standing groove, and it is not convenient enough to use.
Accordingly, there is a need to devise a flatness repairing apparatus for a ceramic disk for a silicon carbide wafer that solves one or more of the above problems.
SUMMERY OF THE UTILITY MODEL
In order to solve one or more problems in the prior art, the utility model provides a flatness repairing device of a ceramic disc for a silicon carbide wafer.
The technical scheme adopted by the utility model to achieve the aim is as follows: the flatness repairing device of the ceramic disc for the silicon carbide wafer comprises a base, an adjusting and supporting mechanism, a fixing and rotating mechanism, a polishing repairing mechanism, a polishing solution feeding mechanism and a detection observing mechanism, wherein the adjusting and supporting mechanism is fixedly arranged at the top of the base, the fixing and rotating mechanism is fixedly arranged at one side of the top of the base, the ceramic disc is placed at the top of the fixing and rotating mechanism, the polishing repairing mechanism is fixedly arranged at one side of the top of the adjusting and supporting mechanism, the polishing repairing mechanism comprises a cylinder, a push rod fixedly arranged at the output end of the cylinder, a mounting plate fixedly arranged at the bottom of the push rod, a plurality of servo motors respectively fixedly arranged at two sides of the top of the mounting plate, a plurality of rotating shafts respectively fixedly arranged at the output ends of the servo motors and a plurality of polishing heads respectively fixedly arranged at the bottom ends of the rotating shafts, the polishing solution feeding mechanism is arranged at one side of the top of the adjusting and supporting mechanism, the detection observation mechanism is fixedly arranged on one side of the top of the base.
Preferably, adjust supporting mechanism and include support frame, rotatory piece, slide bar, slider and roof, support frame fixed mounting is in base top one side, rotatory piece fixed mounting is on the support frame top, slide bar fixed mounting is at rotatory piece top, the slider cover is established in the slide bar outside, roof fixed mounting is in slider one side.
Preferably, the adjusting and supporting mechanism further comprises two lifting rods respectively fixedly mounted on two sides of the bottom of the top plate, two lifting sleeves respectively mounted on the outer sides of the two lifting rods in a matched manner, two fixing feet respectively fixedly mounted on the bottoms of the two lifting sleeves, a plurality of limiting holes respectively formed in one side of the two lifting rods, and two limiting rods respectively mounted on the inner sides of the plurality of limiting holes in a matched manner.
Preferably, the fixed rotating mechanism comprises a rotary table, a fixed frame, four clamping plates fixedly arranged on two sides of the top of the fixed frame respectively and four anti-slip pads fixedly arranged on the inner sides of the four clamping plates respectively, the rotary table is fixedly arranged on one side of the top of the base, and the fixed frame is fixedly arranged on the top of the rotary table.
Preferably, polishing solution feed mechanism is including holding jar, shunt tubes, a plurality of liquid outlet and a plurality of drip mouth of difference fixed mounting in a plurality of liquid outlet bottoms of seting up respectively in the mounting panel both sides, hold jar fixed mounting in roof top one side, shunt tubes fixed connection holds jar one side.
Preferably, it includes connecting plate, lead screw slip table, electric lift loop bar, bracing piece and camera to detect observation mechanism, connecting plate fixed mounting is in base top one side, lead screw slip table fixed mounting is at the connecting plate top, electric lift loop bar fixed mounting is at the sliding block top of lead screw slip table, bracing piece fixed mounting is in the flexible end one side of electric lift loop bar, camera fixed mounting is in bracing piece one side.
The utility model has the beneficial effects that:
one is as follows: the polishing head is fixedly arranged at the bottom of the rotating shaft through the polishing repair mechanism and the fixed rotating mechanism, the ceramic disc is fixedly arranged at the top of the fixed frame, the turntable is opened to drive the ceramic disc to rotate, the placing grooves at the top of the ceramic disc correspond to the polishing heads one by one, the push rod is opened to drive the mounting plate to move downwards until the polishing heads are contacted with the placing grooves at the top of the ceramic disc, and the servo motor is opened to drive the rotating shaft and the polishing heads to rotate, so that the polishing heads polish and repair the inside of the placing grooves, the ceramic disc can be repaired more accurately, the repair dead corners are prevented from being generated in the repair process, the flatness inside of the placing grooves is influenced, the repair effect of the device is effectively improved, and the turntable, the fixed frame, the clamping plate and the anti-skid pad can fix and limit the ceramic disc more conveniently, meanwhile, the angle of the ceramic disc can be adjusted more conveniently by arranging the rotary table, so that the repairing accuracy of the device is ensured;
the second step is as follows: according to the utility model, by arranging the detection observation mechanism, after the ceramic disc is repaired, the camera is opened to enable the camera to observe and detect the surface of the ceramic disc, and then the lead screw sliding table is opened to enable the sliding block of the lead screw sliding table to drive the camera to move back and forth, so that the position of the camera can be moved more conveniently, a worker can comprehensively observe the surface of the ceramic disc, the flatness of the ceramic disc can be monitored more conveniently, and the detection observation mechanism is convenient for subsequent fine repair and more convenient to use.
Drawings
FIG. 1 is a schematic perspective view of the present invention;
FIG. 2 is a schematic structural view of a fixed rotation mechanism of the present invention;
FIG. 3 is a schematic view of the detecting and observing mechanism of the present invention;
fig. 4 is an enlarged schematic view of a portion a in fig. 1 according to the present invention.
Description of reference numerals: 1. a base; 2. adjusting the support mechanism; 21. a support frame; 22. rotating the block; 23. a slide bar; 24. a slider; 25. a top plate; 26. a lifting rod; 27. a lifting sleeve; 28. a fixing leg; 29. a limiting hole; 210. a limiting rod; 3. a fixed rotation mechanism; 31. a turntable; 32. a fixed mount; 33. a splint; 34. a non-slip mat; 4. a ceramic pan; 5. a polishing repair mechanism; 51. a cylinder; 52. a push rod; 53. mounting a plate; 54. a servo motor; 55. a rotating shaft; 56. a polishing head; 6. a polishing solution feeding mechanism; 61. a holding tank; 62. a shunt tube; 63. a liquid outlet; 64. a drip nozzle; 7. a detection observation mechanism; 71. a connecting plate; 72. a screw rod sliding table; 73. an electric lifting loop bar; 74. a support bar; 75. a camera is provided.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. This invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
As shown in FIGS. 1 to 4, the utility model provides a flatness repairing device for a ceramic disc for a silicon carbide wafer, which comprises a base 1, an adjusting and supporting mechanism 2, a fixed rotating mechanism 3, a polishing repairing mechanism 5, a polishing solution feeding mechanism 6 and a detection observing mechanism 7, wherein the adjusting and supporting mechanism 2 is fixedly arranged at the top of the base 1, the fixed rotating mechanism 3 is fixedly arranged at one side of the top of the base 1, the ceramic disc 4 is placed at the top of the fixed rotating mechanism 3, the polishing repairing mechanism 5 is fixedly arranged at one side of the top of the adjusting and supporting mechanism 2, the polishing repairing mechanism 5 comprises an air cylinder 51, a push rod 52 fixedly arranged at the output end of the air cylinder 51, an installation plate 53 fixedly arranged at the bottom of the push rod 52, a plurality of servo motors 54 fixedly arranged at two sides of the top of the installation plate 53 respectively, a plurality of rotating shafts 55 fixedly arranged at the output ends of the servo motors 54 respectively, and a plurality of polishing heads 56 fixedly arranged at the bottom ends of the rotating shafts 55 respectively, polishing solution feed mechanism 6 sets up in regulation supporting mechanism 2 top one side, detects observation mechanism 7 fixed mounting in base 1 top one side.
The above-described specific embodiment: fix mounting rubbing head 56 in pivot 55 bottom, fix mounting ceramic dish 4 at mount 32 top, reopen revolving stage 31 and make revolving stage 31 drive ceramic dish 4 and rotate, make the standing groove at ceramic dish 4 top and rubbing head 56 one-to-one, reopen push rod 52 and make push rod 52 drive mounting panel 53 move down, until rubbing head 56 contacts with the standing groove at ceramic dish 4 top, reopen servo motor 54 and make servo motor 54 drive pivot 55 and rubbing head 56 and rotate, thereby make rubbing head 56 polish the inside polishing restoration of standing groove, can be to the more accurate of restoration of ceramic dish 4, prevent to restore the in-process and produce the restoration dead angle, influence the inside roughness of standing groove, effectual hoisting device's restoration effect.
It is specific, adjust supporting mechanism 2 and include support frame 21, rotatory piece 22, slide bar 23, slider 24 and roof 25, support frame 21 fixed mounting is in 1 top one side of base, rotatory piece 22 fixed mounting is on the support frame 21 top, slide bar 23 fixed mounting is at rotatory piece 22 top, 24 covers of slider are established in the slide bar 23 outside, roof 25 fixed mounting is in 24 one side of slider, through being provided with support frame 21, rotatory piece 22, slide bar 23, slider 24 and roof 25, can be more convenient highly adjust roof 25, so as to adapt to different in service behavior, simultaneously can be more convenient after the device uses the completion with roof 25 rotatory to one side, thereby maintain 1 top of base, it is more convenient to use.
Concretely, adjust supporting mechanism 2 and still include two lifters 26 of fixed mounting in roof 25 bottom both sides respectively, two cooperate the lift cover 27 of installing in two lifters 26 outsides respectively, two fixed feet 28 of fixed mounting in two lift cover 27 bottoms respectively, a plurality of spacing holes 29 of seting up respectively in two lifters 26 one sides and two cooperate the gag lever post 210 of installing in a plurality of spacing holes 29 inboards respectively, through being provided with lifter 26, lift cover 27, fixed feet 28, spacing holes 29 and gag lever post 210, can be more convenient support roof 25, ensure the holistic stability of device, lifter 26 and lift cover 27's setting simultaneously, can be more convenient adjust along with the altitude mixture control of roof 25, it is more convenient to use.
Concretely, fixed rotary mechanism 3 includes revolving stage 31, mount 32, four splint 33 and four slipmats 34 of difference fixed mounting in four splint 33 inboards of fixed mounting 32 top both sides respectively, revolving stage 31 fixed mounting is in 1 top one side of base, mount 32 fixed mounting is at revolving stage 31 top, through being provided with revolving stage 31, mount 32, splint 33 and slipmat 34, can be more convenient fix spacingly to ceramic dish 4, the angle to ceramic dish 4 that can be more convenient is adjusted in the setting of revolving stage 31 simultaneously, ensure the prosthetic accuracy nature of device.
Specifically, polishing solution feed mechanism 6 is including holding jar 61, shunt tubes 62, a plurality of liquid outlet 63 and a plurality of drip nozzle 64 of difference fixed mounting in a plurality of liquid outlet 63 bottoms of seting up respectively in the mounting panel 53 both sides, hold jar 61 fixed mounting in roof 25 top one side, shunt tubes 62 fixed connection is in holding jar 61 one side, hold jar 61 through being provided with, shunt tubes 62, liquid outlet 63 and drip nozzle 64, can be more convenient carry out automatic feeding to the polishing solution, need not the manual work and carry out the dropping liquid, the flow of control material loading that can be better, use more accurate.
It is specific, it includes connecting plate 71 to detect observation mechanism 7, lead screw slip table 72, electric lift loop bar 73, bracing piece 74 and camera 75, connecting plate 71 fixed mounting is in 1 top one side of base, lead screw slip table 72 fixed mounting is at connecting plate 71 top, electric lift loop bar 73 fixed mounting is at the sliding block top of lead screw slip table 72, bracing piece 74 fixed mounting is in the flexible end one side of electric lift loop bar 73, camera 75 fixed mounting is in bracing piece 74 one side, through being provided with connecting plate 71, lead screw slip table 72, electric lift loop bar 73, bracing piece 74 and camera 75, can be comprehensive observe ceramic dish 4 surface, the roughness to ceramic dish 4 that is more convenient monitors, so that subsequent meticulous restoration, it is more convenient to use.
In summary, the present invention includes: firstly, an external power supply is switched on, the lifting sleeve 27 is contracted upwards, the top plate 25 is pulled to drive the rotating block 22 to rotate, the top plate 25 is deviated to one side, the ceramic discs 4 are fixedly arranged on the top of the fixed frame 32, the top plate 25 is restored to the original position, the lifting rod 26 and the lifting sleeve 27 are fixed, the turntable 31 is opened to drive the ceramic discs 4 to rotate, the placing grooves on the tops of the ceramic discs 4 are in one-to-one correspondence with the polishing heads 56, then the valve is opened to drop the polishing liquid in the containing tank 61 on the tops of the ceramic discs 4 through the dropping nozzle 64, the push rod 52 is opened to drive the mounting plate 53 to move downwards until the polishing heads 56 are in contact with the placing grooves on the tops of the ceramic discs 4, the servo motor 54 is opened to drive the rotating shaft 55 and the polishing heads 56 to rotate, and then the polishing heads 56 polish and repair the interiors of the placing grooves, open camera 75 at last and make camera 75 observe the detection to ceramic dish 4 surface, open lead screw slip table 72 again and make the sliding block of lead screw slip table 72 drive camera 75 and carry out the round trip movement, can be more convenient move the position of camera 75, make that the staff can be comprehensive observe ceramic dish 4 surface, wherein the model of revolving stage 31 is: DG60-5, the model of the cylinder 51 is: YS-NZ100-12A, the type of the servo motor 54 is as follows: YE2-132S-4, the model of lead screw slip table 72 is: PKH40, the model of electric lift loop bar 73 is: the model of the XYDHA24-800, the camera 75 is: YGS-020.
The above-described embodiments are merely illustrative of one or more embodiments of the present invention, and the description is specific and detailed, but not restrictive of the scope of the utility model. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (6)
1. A flatness repairing device of a ceramic disc for a silicon carbide wafer comprises a base (1) and is characterized in that: still include regulation supporting mechanism (2), fixed rotary mechanism (3), polishing repair mechanism (5), polish feed mechanism (6) and detect observation mechanism (7), regulation supporting mechanism (2) fixed mounting is at base (1) top, fixed rotary mechanism (3) fixed mounting is in base (1) top one side, ceramic dish (4) have been placed at fixed rotary mechanism (3) top, polishing repair mechanism (5) fixed mounting is in regulation supporting mechanism (2) top one side, polishing repair mechanism (5) including cylinder (51), push rod (52) of fixed mounting at the output of cylinder (51), fixed mounting are at mounting panel (53) of push rod (52) bottom, a plurality of servo motor (54) of fixed mounting respectively in mounting panel (53) top both sides, a plurality of pivot (55) and a plurality of pivot (55) of fixed mounting respectively at the output of a plurality of servo motor (54) respectively fixed mounting are in a plurality of pivots (55) ) Polishing head (56) of bottom, polishing solution feed mechanism (6) set up in regulation supporting mechanism (2) top one side, detect observation mechanism (7) fixed mounting in base (1) top one side.
2. The flatness repairing apparatus of a ceramic disk for a silicon carbide wafer according to claim 1, wherein: adjusting supporting mechanism (2) and including support frame (21), rotatory piece (22), slide bar (23), slider (24) and roof (25), support frame (21) fixed mounting is in base (1) top one side, rotatory piece (22) fixed mounting is on support frame (21) top, slide bar (23) fixed mounting is at rotatory piece (22) top, slide bar (24) cover is established in the slide bar (23) outside, roof (25) fixed mounting is in slider (24) one side.
3. The flatness repairing apparatus of a ceramic disk for a silicon carbide wafer according to claim 1, wherein: the adjusting and supporting mechanism (2) further comprises two lifting rods (26) which are respectively fixedly installed on two sides of the bottom of the top plate (25), two lifting sleeves (27) which are respectively installed on the outer sides of the two lifting rods (26) in a matched mode, two fixing feet (28) which are respectively fixedly installed on the bottoms of the two lifting sleeves (27), a plurality of limiting holes (29) which are respectively formed in one side of the two lifting rods (26) and two limiting rods (210) which are respectively installed on the inner sides of the limiting holes (29) in a matched mode.
4. The flatness repairing apparatus of a ceramic disk for a silicon carbide wafer according to claim 1, wherein: fixed rotary mechanism (3) include revolving stage (31), mount (32), four splint (33) and four slipmat (34) of fixed mounting respectively at four splint (33) inboards of fixed mounting (32) top both sides, revolving stage (31) fixed mounting is in base (1) top one side, mount (32) fixed mounting is at revolving stage (31) top.
5. The flatness repairing apparatus of a ceramic disk for a silicon carbide wafer according to claim 2, wherein: polishing solution feed mechanism (6) are including holding jar (61), shunt tubes (62), a plurality of liquid outlet (63) and a plurality of drip mouth (64) of fixed mounting respectively in a plurality of liquid outlet (63) bottom of seting up respectively in mounting panel (53) both sides, hold jar (61) fixed mounting in roof (25) top one side, shunt tubes (62) fixed connection holds jar (61) one side.
6. The flatness repairing apparatus of a ceramic disk for a silicon carbide wafer according to claim 1, wherein: detect observation mechanism (7) including connecting plate (71), lead screw slip table (72), electric lift loop bar (73), bracing piece (74) and camera (75), connecting plate (71) fixed mounting is in base (1) top one side, lead screw slip table (72) fixed mounting is at connecting plate (71) top, electric lift loop bar (73) fixed mounting is at the sliding block top of lead screw slip table (72), bracing piece (74) fixed mounting is in the flexible end one side of electric lift loop bar (73), camera (75) fixed mounting is in bracing piece (74) one side.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123111341.0U CN216657519U (en) | 2021-12-13 | 2021-12-13 | Flatness repairing device of ceramic disc for silicon carbide wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123111341.0U CN216657519U (en) | 2021-12-13 | 2021-12-13 | Flatness repairing device of ceramic disc for silicon carbide wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216657519U true CN216657519U (en) | 2022-06-03 |
Family
ID=81794805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202123111341.0U Active CN216657519U (en) | 2021-12-13 | 2021-12-13 | Flatness repairing device of ceramic disc for silicon carbide wafer |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216657519U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115431154A (en) * | 2022-08-30 | 2022-12-06 | 安徽胜利精密制造科技有限公司 | Glass double-side polishing process for processing display screen assembly |
| CN115592550A (en) * | 2022-12-14 | 2023-01-13 | 杭州中欣晶圆半导体股份有限公司（Cn） | Pumping device for wafer polishing and pumping method thereof |
| CN116441853A (en) * | 2023-06-08 | 2023-07-18 | 苏州笑聪电气设备有限公司 | Surface restoration processing device for processing electric control cabinet |
-
2021
- 2021-12-13 CN CN202123111341.0U patent/CN216657519U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115431154A (en) * | 2022-08-30 | 2022-12-06 | 安徽胜利精密制造科技有限公司 | Glass double-side polishing process for processing display screen assembly |
| CN115431154B (en) * | 2022-08-30 | 2023-08-01 | 安徽胜利精密制造科技有限公司 | Glass double-sided polishing process for processing display screen assembly |
| CN115592550A (en) * | 2022-12-14 | 2023-01-13 | 杭州中欣晶圆半导体股份有限公司（Cn） | Pumping device for wafer polishing and pumping method thereof |
| CN116441853A (en) * | 2023-06-08 | 2023-07-18 | 苏州笑聪电气设备有限公司 | Surface restoration processing device for processing electric control cabinet |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN216657519U (en) | Flatness repairing device of ceramic disc for silicon carbide wafer | |
| TWI283451B (en) | Probe apparatus for temperature control of the examined body and probe examining method | |
| US20150270146A1 (en) | Substrate processing apparatus and substrate processing method | |
| EP1970161A1 (en) | Polishing head testing with movable pedestal | |
| TW201521117A (en) | Device and method for loading and unloading quartz reaction tube to and from semiconductor diffusion equipment | |
| CN101645410A (en) | Apparatus for holding semiconductor wafers | |
| CN205364174U (en) | Trimming machine automatic centering carousel | |
| CN209755137U (en) | maintenance support device for automatic instrument | |
| TW202017099A (en) | Carrier table for clamping substrate capable of driving the substrate to rotate without causing abrasion and pollution on the front and back sides of the substrate | |
| WO2015174375A1 (en) | Polishing table replacement apparatus, method for replacing polishing table, and device for replacing constituent part of semiconductor device production apparatus | |
| CN110907313B (en) | Full-automatic intelligent hydrodynamic viscosity measuring device and method | |
| CN114260139B (en) | Semiconductor wafer processing is with even mucilage binding of high efficiency device | |
| CN217484429U (en) | Electronic component detection device with isolation function | |
| CN108581426A (en) | One kind tears lid arrangement open and tears convering system open automatically automatically | |
| CN216622212U (en) | Device for detecting micropipe defects of corroded silicon carbide wafer | |
| CN218825151U (en) | Hot plate pin needle mounting structure convenient to height adjustment | |
| CN217955838U (en) | Automatic lifting and rotating device for wafer processing | |
| CN216504265U (en) | Polishing device for silicon carbide wafer | |
| CN218098831U (en) | High-strength detection lamp for monocrystalline silicon | |
| CN220233149U (en) | High-low temperature wafer probe platform card dish | |
| CN214895454U (en) | Probe platform for semiconductor detection | |
| CN219813027U (en) | Rail structure of driving device for tunnel furnace | |
| CN216514107U (en) | Coating device of silicon carbide single crystal wafer | |
| CN218066991U (en) | Spring thermal state fatigue testing machine | |
| US7063992B2 (en) | Semiconductor substrate surface preparation using high temperature convection heating |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |