CN216614827U - Plasma film plating machine - Google Patents
Plasma film plating machine Download PDFInfo
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- CN216614827U CN216614827U CN202220041227.0U CN202220041227U CN216614827U CN 216614827 U CN216614827 U CN 216614827U CN 202220041227 U CN202220041227 U CN 202220041227U CN 216614827 U CN216614827 U CN 216614827U
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Abstract
The utility model relates to a plasma film coating machine, which comprises an octagonal cylindrical machine body, wherein eight functional panels are uniformly arranged on the side part of the octagonal cylindrical machine body along the circumferential direction, the eight functional panels and the octagonal cylindrical machine body can enclose a vacuum chamber for coating, and the eight functional panels are opposite in pairs to form four groups of functional panels, wherein the first group of functional panels are two opposite plate type PVD film coating sources respectively provided with an external control magnetic field, the second group of functional panels are a radio frequency emission inductive coupling plasma source and a plasma parameter measurement window opposite to the radio frequency emission inductive coupling plasma source, the third group of functional panels are two opposite direct current arc sputtering target sources respectively provided with an external control magnetic field, and the fourth group of functional panels are an air exhaust panel and an observation window opposite to the air exhaust panel. The plasma film plating machine is provided with eight functional panels, so that a plasma film plating chamber has more reasonable structure, complete functions and higher efficiency, and various plasma parameter films of plated materials and accurate control of plasma parameters are realized.
Description
Technical Field
The utility model relates to the field of film plating machines, in particular to a plasma film plating machine.
Background
At present, magnetic fields of magnetron sputtering and electric arc sputtering in a vacuum coating machine are local magnetic fields, ion components after sputtering ionization cannot be diffused remotely, the ion components are more difficult to penetrate through the space of a whole vacuum chamber and are mostly concentrated near a target material, the utilization rate of ionized ions is low, the coating quality is influenced, and the production efficiency is low.
SUMMERY OF THE UTILITY MODEL
In order to make up for the defects of the prior art, the utility model provides the plasma coating machine which is provided with eight functional panels, so that the plasma coating chamber has more reasonable structure, most complete functions and higher efficiency, and the accurate control of various plasma parameter films and plasma parameters of the coated materials is realized.
The technical scheme adopted by the utility model for solving the technical problems is as follows:
a plasma film plating machine comprises an octagonal cylindrical machine body, wherein eight functional panels are uniformly arranged on the side portion of the octagonal cylindrical machine body along the circumferential direction, the eight functional panels and the octagonal cylindrical machine body can enclose a vacuum chamber for film plating, the eight functional panels are opposite in pairs to form four groups of functional panels, the first group of functional panels are two opposite plate type PVD film plating sources respectively provided with an external control magnetic field, the second group of functional panels are a radio frequency emission inductive coupling plasma source and a plasma parameter measurement window opposite to the radio frequency emission inductive coupling plasma source, the third group of functional panels are two opposite direct current arc sputtering target sources respectively provided with an external control magnetic field, and the fourth group of functional panels are an air exhaust panel and an observation window opposite to the air exhaust panel;
the external control magnetic fields of the two plate type PVD coating sources penetrate through the inside of the vacuum chamber to form a first N-S-level attraction magnetic field configuration, the external control magnetic fields of the two direct current arc sputtering target sources penetrate through the inside of the vacuum chamber to form a second N-S-level attraction magnetic field configuration, and the first magnetic field configuration and the second magnetic field configuration are perpendicular to each other to form a composite magnetic field constraint configuration.
The coating machine adopts an octagonal cross section design, and compared with the existing cylinder design, a planar sputtering target and a rectangular radio frequency antenna are easier to mount on each panel; compared with the existing square design, the design is more approximate to a circle, so that the space utilization rate is high, and the installation of the rotating frame is facilitated.
Because the second group of functional panels are provided with the inductively coupled plasma source emitting radio frequency, when the composite coating function of PECVD (plasma chemical vapor deposition) and PVD (physical vapor deposition) is realized, the magnetic lines of the external control magnetic field of the first group of functional panels and the magnetic lines of the external control magnetic field of the third group of functional panels form oppositely-pulled magnetic potential shapes respectively so as to realize the remote transmission of radio frequency, the plasma ionization rate of the vacuum chamber is higher, and the plasma distribution of the chamber is more uniform. The plasma parameter measurement window is provided with the window and the measuring instrument is arranged to realize the measurement of some plasma parameters, so that the accurate control of the coating process is facilitated.
Furthermore, a coating rotary table is arranged at the center of the vacuum chamber and used for installing a coated material to realize rotary coating.
Furthermore, among the six function panels that first group function panel, second group function panel and third group function panel contained, arrange in that the three function panel of fourth group function panel homonymy can constitute an openable sealing door with partial octagon tube-shape organism, so set up, make things convenient for the loading and unloading of coating film revolving stage platform, wherein the sealing door can realize its and the sealed between the octagon tube-shape organism through the sealing strip.
Furthermore, the sealing door is locked through a door lock, and is convenient to open.
Furthermore, a water cooling channel is arranged in the door plate of the sealing door, and the water cooling channel is arranged for cooling due to the fact that current is large during film coating and the heating rod is arranged on the side face of the sealing door, so that the service life is prolonged.
Furthermore, a vertical pumping hole is formed in the pumping panel and used for vacuumizing the vacuum chamber.
Furthermore, the observation window is made of quartz glass, and the residual functional panel and the octagonal cylindrical machine body which enclose the vacuum chamber are made of stainless steel.
Furthermore, the magnetic field coil of the external control magnetic field is a rectangular magnetic field coil, and the requirement of a rectangular sputtering target is met.
Furthermore, the radio frequency of the inductively coupled plasma source is designed as a rectangular antenna.
By adopting the technical scheme, the utility model has the advantages that: this application coating machine has set up eight function panels, can make plasma coating chamber structure more reasonable, the function is complete, efficiency is higher, realizes being plated the accurate control of multiple plasma parameter membrane of material and plasma parameter.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a complex magnetic field confinement configuration formed by the first group of functional panels and the third group of functional panels in fig. 1.
In the figure, 1, an octagonal cylindrical machine body, 2, a vacuum chamber, 3, an external control magnetic field, 4, a plate type PVD coating source, 5, an inductively coupled plasma source, 6, a plasma parameter measuring window, 7, a direct current arc sputtering target source, 8, an air exhaust panel, 9, an observation window, 10, a coating turntable, 11, a sealing door, 12 and a door lock.
Detailed Description
In order to clearly explain the technical features of the present invention, the following detailed description of the present invention is provided with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application, however, the present application may be practiced in other ways than those described herein, and therefore the scope of the present application is not limited by the specific embodiments disclosed below.
In addition, in the description of the present application, it is to be understood that the terms "center", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", and the like, indicate orientations and positional relationships based on those shown in the drawings, are only for convenience of description and simplicity of description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present application. Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.
In this application, unless expressly stated or limited otherwise, the terms "mounted," "connected," "secured," and the like are to be construed broadly and can include, for example, fixed connections, removable connections, or integral parts; the connection can be mechanical connection, electrical connection or communication; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
In this application, unless expressly stated or limited otherwise, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through intervening media. In the description of the present specification, reference to the description of "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, the schematic representations of the terms used above are not necessarily intended to refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
As shown in fig. 1-2, in this embodiment, the plasma coater includes an octagonal tube-shaped body 1, the side of the octagonal tube-shaped body 1 is uniformly provided with eight functional panels along the circumferential direction, the eight functional panels and the octagonal tube-shaped body 1 can enclose a vacuum chamber 2 for coating, the eight functional panels are aligned in pairs to form four groups of functional panels, wherein the first group of functional panels are two plate PVD coating sources 4 with external control magnetic fields 3 respectively aligned with each other, the second group of functional panels are inductively coupled plasma sources 5 emitting radio frequency and plasma parameter measurement windows 6 aligned with the sources, the third group of functional panels are two direct current arc sputtering target sources 7 with external control magnetic fields 3 respectively aligned with each other, and the fourth group of functional panels are extraction panels 8 and observation windows 9 aligned with the sources;
the external control magnetic fields 3 of the two plate type PVD coating sources 4 penetrate through the inside of the vacuum chamber 2 to form a first N-S-level attracted magnetic field configuration, the external control magnetic fields 3 of the two direct current arc sputtering target sources 7 penetrate through the inside of the vacuum chamber 2 to form a second N-S-level attracted magnetic field configuration, and the first magnetic field configuration and the second magnetic field configuration are perpendicular to each other to form a composite magnetic field constraint configuration.
Further, a coating rotary table 10 is disposed at the center of the vacuum chamber 2 for mounting a material to be coated to realize rotary coating.
Furthermore, in the six functional panels included in the first group of functional panels, the second group of functional panels and the third group of functional panels, the three functional panels arranged on the same side of the fourth group of functional panels can form an openable sealing door 11 with a part of the octagonal barrel-shaped machine body, so that the coating rotating table 10 is convenient to assemble and disassemble, wherein the sealing door 11 can be sealed with the octagonal barrel-shaped machine body through a sealing strip, and is locked through a door lock 12 to be convenient to open; and a water cooling channel is also arranged in the door plate of the sealing door 11.
Furthermore, a vertical pumping hole is formed in the pumping panel 8 and used for vacuumizing the vacuum chamber 2.
Further, the observation window 9 is made of quartz glass, and the remaining functional panel and the octagonal tube-shaped body 1 enclosing the vacuum chamber 2 are made of stainless steel.
Furthermore, the magnetic field coil of the external control magnetic field 3 is a rectangular magnetic field coil, and the requirements of a rectangular sputtering target material are met.
The coating machine adopts an octagonal cross section design, and compared with the existing cylinder design, a planar sputtering target and a rectangular radio frequency antenna are easier to mount on each functional panel; compared with the existing square design, the design is more approximate to a circle, so that the space utilization rate is high, and the installation of the rotating frame is facilitated.
Because the second group of functional panels is provided with the inductively coupled plasma source 5 emitting radio frequency, when the composite coating function of PECVD (plasma chemical vapor deposition) and PVD (physical vapor deposition) is realized, magnetic lines of external control magnetic fields of the first group of functional panels and the third group of functional panels respectively form oppositely-pulled magnetic configurations, so that the remote transmission of radio frequency is realized, the plasma ionization rate of a vacuum chamber is higher, and the plasma distribution of the chamber is more uniform. The plasma parameter measurement window is provided with the window and the measuring instrument is arranged to realize the measurement of some plasma parameters, so that the accurate control of the coating process is facilitated.
The above-described embodiments should not be construed as limiting the scope of the utility model, and any alternative modifications or alterations to the embodiments of the present invention will be apparent to those skilled in the art.
The present invention is not described in detail, but is known to those skilled in the art.
Claims (8)
1. A plasma film plating machine is characterized by comprising an octagonal cylindrical machine body, wherein eight functional panels are uniformly arranged on the side portion of the octagonal cylindrical machine body along the circumferential direction, a vacuum chamber for film plating can be enclosed by the eight functional panels and the octagonal cylindrical machine body, the eight functional panels are opposite in pairs to form four groups of functional panels, wherein the first group of functional panels are two opposite plate type PVD film plating sources respectively provided with an external control magnetic field, the second group of functional panels are a radio frequency emission inductive coupling plasma source and a plasma parameter measurement window opposite to the radio frequency emission inductive coupling plasma source, the third group of functional panels are two opposite direct current arc sputtering target sources respectively provided with the external control magnetic field, and the fourth group of functional panels are an air exhaust panel and an observation window opposite to the air exhaust panel;
the external control magnetic fields of the two plate type PVD coating sources penetrate through the inside of the vacuum chamber to form a first N-S-level attraction magnetic field configuration, the external control magnetic fields of the two direct current arc sputtering target sources penetrate through the inside of the vacuum chamber to form a second N-S-level attraction magnetic field configuration, and the first magnetic field configuration and the second magnetic field configuration are perpendicular to each other to form a composite magnetic field constraint configuration.
2. The plasma coater of claim 1 wherein the vacuum chamber has a coating turntable located at the center thereof.
3. The plasma coater of claim 2 wherein three of the six functional panels of the first, second and third groups of functional panels disposed on the same side of the fourth group of functional panels are capable of forming an openable sealed door with a portion of the octagonal cylinder.
4. The plasma coater of claim 3 wherein the sealing door is locked by a door lock.
5. The plasma coating machine of claim 3 wherein the door panels of the sealing doors have water cooling channels therein.
6. The plasma coating machine of claim 1 wherein vertical pumping ports are provided on the pumping panel.
7. The plasma coater of claim 1 wherein the viewing window is made of quartz glass and the remaining functional panels and octagonal barrel housing that define the vacuum chamber are made of stainless steel.
8. The plasma coater of claim 1 wherein the magnetic field coils of the externally controlled magnetic field are rectangular magnetic field coils.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220041227.0U CN216614827U (en) | 2022-01-07 | 2022-01-07 | Plasma film plating machine |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220041227.0U CN216614827U (en) | 2022-01-07 | 2022-01-07 | Plasma film plating machine |
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| CN216614827U true CN216614827U (en) | 2022-05-27 |
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| CN202220041227.0U Active CN216614827U (en) | 2022-01-07 | 2022-01-07 | Plasma film plating machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115110048A (en) * | 2022-06-20 | 2022-09-27 | 肇庆市科润真空设备有限公司 | Magnetron sputtering-based PECVD (plasma enhanced chemical vapor deposition) film coating device and method |
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2022
- 2022-01-07 CN CN202220041227.0U patent/CN216614827U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115110048A (en) * | 2022-06-20 | 2022-09-27 | 肇庆市科润真空设备有限公司 | Magnetron sputtering-based PECVD (plasma enhanced chemical vapor deposition) film coating device and method |
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