CN216584245U - Gas-liquid reaction equipment - Google Patents
Gas-liquid reaction equipment Download PDFInfo
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- CN216584245U CN216584245U CN202123115408.8U CN202123115408U CN216584245U CN 216584245 U CN216584245 U CN 216584245U CN 202123115408 U CN202123115408 U CN 202123115408U CN 216584245 U CN216584245 U CN 216584245U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
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Abstract
The present invention provides a gas-liquid reaction apparatus comprising: the cylinder body is used for carrying out gas-liquid mixing reaction; the jet device is used for mixing gas and liquid in a jet mode and jetting the gas and the liquid into the cylinder body, and comprises a jet pump, a jet device and a jet pipeline, wherein the jet device is arranged in the cylinder body, and the jet pump is communicated with the jet device through the jet pipeline; the circulating device comprises a first circulating assembly and a second circulating assembly, the first circulating assembly comprises a spray head, a first power piece and a first pipeline, the spray head is installed at one end, close to the top, of the cylinder body, a first outlet is formed at one end, close to the bottom, of the cylinder body, the first outlet is communicated with the spray head through the first pipeline, and the first power piece is installed in the first pipeline; the second circulation assembly comprises a second power piece and a second pipeline, a second outlet is formed in one end, close to the bottom, of the cylinder body, the second outlet is communicated with the ejector through the second pipeline, and the second power piece is installed in the second pipeline.
Description
Technical Field
The utility model belongs to the field of circuit board manufacturing, and particularly relates to gas-liquid reaction equipment.
Background
Acid etching is the essential key process in the printed circuit board manufacturing process, can produce a large amount of acid etching waste liquid behind the acid etching circuit board, to the recovery of metal copper in the acid etching waste liquid, at present generally adopt the electrolysis method, the positive pole can produce a large amount of strong oxidizing nature gaseous chlorine when adopting the electrolysis method to carry out copper recovery, wherein most chlorine can be retrieved to the etching process in, but still have a small amount of chlorine not retrieved, because of chlorine is a toxic gas, if handle improperly, excessive chlorine gets into and can arouse the human body poisoning in the air, or chlorine and hydrogen mix also can explode under the light, arouse dangerous accident. Therefore, it is necessary to treat the chlorine gas which is not recycled.
The existing chlorine gas treatment generally adopts ferrous chloride solution to absorb chlorine gas so as to generate byproduct ferric trichloride solution, and the quality of the byproduct is difficult to achieve flocculation; and, because the solubility of chlorine is not big, then chlorine effuses and can carry a small amount of moisture, often can be mingled with a small amount of metal copper ion in these moisture, also can cause final accessory substance quality of generating poor like this, need carry out subsequent processing in order to promote its use value, the consumptive material is big, the treatment cost is higher.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide gas-liquid reaction equipment to solve the technical problems of large material consumption and high cost in the process of recycling chlorine into etching solution in the prior art.
In order to achieve the purpose, the utility model adopts the technical scheme that: there is provided a gas-liquid reaction apparatus comprising:
the cylinder body is used for carrying out gas-liquid mixing reaction;
the jet device is used for mixing gas and liquid in a jet mode and injecting the gas and the liquid into the cylinder body, and comprises a jet pump, a jet device and a jet pipeline, wherein the jet device is installed in the cylinder body, and the jet pump is communicated with the jet device through the jet pipeline; and the number of the first and second groups,
the circulating device is used for circularly refluxing the liquid output by the jet device; the circulating device comprises a first circulating assembly and a second circulating assembly, the first circulating assembly comprises a spray head, a first power piece and a first pipeline, the spray head is installed at one end, close to the top, of the cylinder body, a first outlet is formed at one end, close to the bottom, of the cylinder body, the first outlet is communicated with the spray head through the first pipeline, and the first power piece is installed in the first pipeline; the second circulation assembly comprises a second power part and a second pipeline, a second outlet is formed in one end, close to the bottom, of the cylinder body, the second outlet is communicated with the ejector through the second pipeline, and the second power part is installed in the second pipeline.
Further, the cylinder body comprises a shell and a first partition plate, a cavity is formed in the shell, and the first partition plate divides the cavity into a first cavity and a second cavity which are left and right; the ejector is arranged in the first cavity, and the sprayer is arranged in the second cavity; the first cavity and the second cavity are communicated with one side, close to the bottom, of the cylinder body, the inlet of the ejector is located on one side, close to the top, of the cylinder body, and the outlet of the ejector is located on one side, close to the bottom, of the cylinder body.
Further, the cylinder body also comprises a second partition plate, the second partition plate divides the second cavity into a third cavity and a fourth cavity which are an upper part and a lower part of each other, the third cavity is positioned above the fourth cavity, and the first cavity is communicated with the fourth cavity; the spray head is arranged at the top of the third cavity, and a notch for the etching solution in the third cavity to flow down to the fourth cavity is formed on the second partition plate.
Further, the cylinder body also comprises a filler for increasing the contact area of gas-liquid reaction, and the filler is placed on the second partition plate and is positioned in the third cavity.
Further, the filler is a rubber ball, and a plurality of pores are formed in the rubber ball.
Furthermore, the number of the spray heads is four, and the four spray heads are installed at the top of the third cavity at equal intervals.
Furthermore, the cylinder body also comprises an overflow port for the etching liquid of the fourth cavity to flow out, and the overflow port is communicated with the fourth cavity.
Further, a pressure relief opening is formed in the cylinder body, and a pressure relief valve is mounted on the pressure relief opening.
Further, still include the air inlet pipeline, ejector includes inlet, air inlet and jet outlet, the inlet with the efflux pipeline intercommunication, the air inlet with the air inlet pipeline intercommunication.
Further, the cylinder body is characterized by further comprising a visual pipeline for displaying the liquid level inside the cylinder body, and the visual pipeline is installed on the cylinder body.
The gas-liquid reaction equipment provided by the utility model has the beneficial effects that: compared with the prior art, the gas-liquid reaction equipment has the advantages that the chlorine gas generated in the recovery and electrolysis of the etching solution copper is mixed with the etching solution through the jet device, a high-speed flowing gas-liquid mixture is formed and injected into the cylinder body to react with each other, the dissolving efficiency of the chlorine gas can be improved, and the chlorine gas is further fully dissolved through the circulating device, wherein the first power part, the first pipeline, the first opening and the spray head form a circulating flow loop in the cylinder body; the second power part, the second opening and the liquid inlet of the ejector are communicated to form the circulating jet flow of the ejector part, and the two circulating loops act together, so that the efficiency of gas-liquid reaction can be greatly improved. Therefore, chlorine is directly dissolved back into the etching solution for recycling, so that the environmental pollution is avoided, a large amount of chemicals for processing the chlorine are saved, the cost in the copper recovery process of the etching solution is effectively reduced, and the economic benefit is improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.
FIG. 1 is an overall schematic view of a gas-liquid reaction apparatus provided in an embodiment of the present invention;
FIG. 2 is a front view of the internal structure of the cylinder block according to the embodiment of the present invention;
fig. 3 is a side view of the internal structure of the cylinder according to the embodiment of the present invention.
Wherein, in the figures, the respective reference numerals:
1-a cylinder body; 11-a first outlet; 12-an overflow port; 13-a first separator; 14-a first cavity; 15-a second separator; 16-a third cavity; 17-a fourth cavity; 18-a filler; 19-a second outlet; 2-a first power member; 3-an ejector; 31-liquid inlet; 32-an air inlet; 33-an ejection port; 4-a jet line; 5-a spray head; 7-a first pipeline; 8-visual pipeline; 9-a pressure relief valve; 10-air inlet pipe.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects to be solved by the present invention more clearly apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the utility model and are not intended to limit the utility model.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.
It is to be understood that the terms "upper," "lower," "top," "bottom," "inner," "outer," and the like are used in the orientations and positional relationships indicated in the drawings for convenience in describing the present invention and simplicity in description, and do not indicate or imply that the referenced devices or elements must be in a particular orientation, constructed and operated in a particular orientation, and thus are not to be considered limiting of the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless specifically defined otherwise.
Referring to fig. 1 to 3, a gas-liquid reaction apparatus according to the present invention will now be described. A gas-liquid reaction apparatus comprising:
the cylinder body 1 is used for carrying out gas-liquid mixing reaction;
the jet device is used for mixing gas and liquid in a jet mode and jetting the gas and the liquid into the cylinder body 1, and comprises a jet pump, a jet device 3 and a jet pipeline 4, wherein the jet device 3 is arranged in the cylinder body 1, and the jet pump is communicated with the jet device 3 through the jet pipeline 4; and the number of the first and second groups,
the circulating device is used for circularly refluxing the liquid output by the jet device; the circulation device comprises a first circulation assembly and a second circulation assembly, wherein the first circulation assembly comprises: the spray head 5 is installed at one end, close to the top, of the cylinder body 1, a first outlet 11 is formed at one end, close to the bottom, of the cylinder body 1, the first outlet 11 is communicated with the spray head 5 through the first pipeline 7, and the first power part 2 is installed in the first pipeline 7. The second circulating assembly comprises a second power member (not shown) and a second pipeline (not shown), wherein a second outlet 19 is formed at one end of the cylinder body close to the bottom, the second outlet 19 is communicated with the ejector 3 through the second pipeline, and the second power member is installed in the second pipeline.
According to the gas-liquid reaction equipment, chlorine gas generated in the recovery and electrolysis of etching solution copper is mixed with the etching solution through the jet device, a high-speed flowing gas-liquid mixture is formed and injected into the cylinder body to react with each other, the dissolving efficiency of the chlorine gas can be improved, and meanwhile, the chlorine gas is fully dissolved through the circulating device, wherein the first power part, the first pipeline, the first opening and the spray head form a circulating flow loop in the cylinder body; the second power part, the second opening and the liquid inlet of the ejector form the circulating jet flow of the ejector part, and the two circulating loops act together, so that the efficiency of gas-liquid reaction can be greatly improved. Therefore, chlorine is directly dissolved back into the etching solution for recycling, so that the environmental pollution is avoided, a large amount of chemicals for processing the chlorine are saved, the cost in the copper recovery process of the etching solution is effectively reduced, and the economic benefit is improved.
Preferably, the first power part 2 and the second power part are both pump bodies, the pump bodies are adopted to drive the etching liquid to flow, and the flow rate output by the pump bodies can be adjusted according to actual use conditions so as to achieve the effects of optimizing production effects and using different production environment requirements.
Further, referring to fig. 1 to 3, as a specific embodiment of the gas-liquid reaction apparatus provided by the present invention, the cylinder 1 includes a housing and a first partition plate 13, a cavity is formed inside the housing, and the first partition plate 13 divides the cavity into a first cavity 14 and a second cavity which are left and right sides of each other; the ejector 3 is arranged in the first cavity 14, and the spray head 5 is arranged in the second cavity; the first cavity 14 and the second cavity are communicated at one side of the cylinder body 1 close to the bottom, the inlet of the ejector 3 is positioned at one side of the cylinder body 1 close to the top, and the first outlet 11 of the ejector 3 is positioned at one side of the cylinder body 1 close to the bottom. Chlorine and etching solution are mixed by the ejector 3 to form high-speed fluid which is injected into the bottom of the cylinder body 1 for mixed reaction, so that the chlorine dissolving efficiency can be greatly increased; meanwhile, the mixture returns to the second cavity at the top through the first outlet 11 and the first pipeline 7, so that a stirring effect is achieved, and the gas-liquid mixing efficiency is further increased. Specifically, the first outlet 11 may be disposed at a position of the first chamber 14 or the third chamber 16 near the bottom of the cylinder 1.
Further, referring to fig. 1 to 3, as a specific embodiment of the gas-liquid reaction apparatus provided by the present invention, the cylinder 1 further includes a second partition 15, the second partition 15 divides the second cavity into a third cavity 16 and a fourth cavity 17 which are two upper and lower parts of each other, and the third cavity 16 is located above the fourth cavity 17; a notch is formed on one side of the first partition plate 13 close to the bottom of the cylinder body 1, so that the first cavity 14 is communicated with the fourth cavity 17 at the bottom; the nozzle 5 is installed on the top of the third chamber 16, and the second partition 15 is formed with a notch for the etching solution in the third chamber 16 to flow down the fourth chamber 17. The second partition plate 15 can slow down the speed of the etching solution flowing from the third cavity 16 above the cylinder body 1 to the fourth cavity 17 below the cylinder body, so that the gas-liquid reaction time is prolonged, and the dissolution degree of chlorine in the etching solution is further improved.
Further, referring to fig. 1 to 3, as an embodiment of the gas-liquid reaction apparatus provided by the present invention, the cylinder 1 further includes a filler 18 for increasing a contact area of the gas-liquid reaction, and the filler 18 is disposed on the second partition 15 and located in the third cavity 16. The filler 18 has a larger surface area, so that the contact area of gas-liquid mixing reaction can be increased, and the efficiency of the etching solution for absorbing dissolved chlorine gas is increased.
Further, referring to fig. 1 to 3, as an embodiment of the gas-liquid reaction apparatus provided by the present invention, the filler 18 is a rubber ball, and a plurality of pores are formed on the rubber ball. The rubber ball can be suitable for an etching solution environment with corrosiveness, the plurality of holes are beneficial to forming a larger surface area, the structure is simple, the using effect is good, the cost is lower, and the effect of promoting the gas-liquid reaction degree can be well met. Of course, the filler can be other materials or shaped objects, such as pall rings, stepped rings, spherical fillers, etc., as long as it acts to increase the air-liquid contact surface, and all such objects are within the scope of the present invention.
Further, referring to fig. 1 to 3, as an embodiment of the gas-liquid reaction apparatus provided by the present invention, the number of the showerhead 5 is four, and the four showerheads 5 are installed at the top of the third chamber 16 at equal intervals. Specifically, the nozzle 5 in this embodiment adopts a lotus head structure, which can scatter and spray the gas-liquid mixture on the filler 18, and then flow down the fourth cavity 17 through the second partition 15. Of course, the structure of the nozzle 5 may be in other forms, and all of them are within the protection scope of the present invention.
Further, referring to fig. 1 to 3, as an embodiment of the gas-liquid reaction apparatus provided by the present invention, the cylinder 1 further includes an overflow port 12 for flowing out the etching solution of the fourth cavity 17, and the overflow port 12 is communicated with the fourth cavity 17. Because the exchange cylinder of the embodiment is directly arranged on the etching machine in the actual use, the liquid is discharged in an overflow mode, and the cost is reduced. The position of the overflow port 12 is at the middle position of the fourth cavity 17, and a certain distance is arranged from the bottom, and when the etching solution of the fourth cavity 17 reaches the height of the overflow port 12, the etching solution flows out through the overflow port 12.
Further, referring to fig. 1 to 3, as a specific embodiment of the gas-liquid reaction apparatus provided by the present invention, a pressure relief opening is formed on the cylinder 1, and a pressure relief valve 9 is installed on the pressure relief opening. Because the gas-liquid mixed reaction is carried out in the cylinder body 1, certain gas pressure can be generated, and the pressure release valve 9 can effectively prevent the overlarge gas pressure in the cylinder body 1 and ensure the production safety; the pressure relief opening can also be used for connecting a gas tower and used for treating residual chlorine during shutdown.
Further, referring to fig. 1 to fig. 3, as a specific embodiment of the gas-liquid reaction apparatus provided by the present invention, the gas-liquid reaction apparatus further includes a gas inlet pipeline 10, the ejector 3 includes a liquid inlet 31, a gas inlet 32 and an ejection outlet 33, the liquid inlet 31 is communicated with the jet pipeline 4, and the gas inlet 32 is communicated with the gas inlet pipeline 10. The etching solution flows into the ejector 3 from the liquid inlet 31 under the power of the ejector pump, so that negative pressure is generated at the gas inlet 32 and chlorine gas in the gas inlet pipeline 10 is sucked.
Further, referring to fig. 1 to fig. 3, as an embodiment of the gas-liquid reaction apparatus provided by the present invention, a visualization pipeline 8 for displaying the liquid level inside the cylinder 1 is further included, and the visualization pipeline 8 is installed on the cylinder 1. In this embodiment, the two ends of the visual pipeline 8 are respectively communicated with the top and bottom ends of the cylinder body 1, so as to achieve the purpose of enabling the liquid level in the pipeline and the liquid level in the cylinder body 1 to be at the same height. The visual pipeline 8 can let the user conveniently see the liquid level in the cylinder body 1 at any time, and the convenience and comfort level of the user use are increased.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. A gas-liquid reaction apparatus, comprising:
the cylinder body is used for carrying out gas-liquid mixing reaction;
the jet device is used for mixing gas and liquid in a jet mode and injecting the gas and the liquid into the cylinder body, and comprises a jet pump, a jet device and a jet pipeline, wherein the jet device is installed in the cylinder body, and the jet pump is communicated with the jet device through the jet pipeline; and the number of the first and second groups,
the circulating device is used for circularly refluxing the liquid output by the jet device; the circulating device comprises a first circulating assembly and a second circulating assembly, the first circulating assembly comprises a spray head, a first power piece and a first pipeline, the spray head is installed at one end, close to the top, of the cylinder body, a first outlet is formed at one end, close to the bottom, of the cylinder body, the first outlet is communicated with the spray head through the first pipeline, and the first power piece is installed in the first pipeline; the second circulation assembly comprises a second power part and a second pipeline, a second outlet is formed in one end, close to the bottom, of the cylinder body, the second outlet is communicated with the ejector through the second pipeline, and the second power part is installed in the second pipeline.
2. The gas-liquid reaction apparatus as recited in claim 1, wherein: the cylinder body comprises a shell and a first partition plate, a cavity is formed in the shell, and the first partition plate divides the cavity into a first cavity and a second cavity which are a left side and a right side; the ejector is arranged in the first cavity, and the sprayer is arranged in the second cavity; the first cavity and the second cavity are communicated with one side, close to the bottom, of the cylinder body, the inlet of the ejector is located on one side, close to the top, of the cylinder body, and the outlet of the ejector is located on one side, close to the bottom, of the cylinder body.
3. The gas-liquid reaction apparatus as recited in claim 2, wherein: the cylinder body further comprises a second partition plate, the second partition plate divides the second cavity into a third cavity and a fourth cavity which are an upper part and a lower part of each other, the third cavity is positioned above the fourth cavity, and the first cavity is communicated with the fourth cavity; the spray head is arranged at the top of the third cavity, and a notch for the etching solution in the third cavity to flow down to the fourth cavity is formed on the second partition plate.
4. The gas-liquid reaction apparatus as recited in claim 3, wherein: the cylinder body further comprises a filler for increasing the contact area of gas-liquid reaction, and the filler is placed on the second partition plate and located in the third cavity.
5. The gas-liquid reaction apparatus as recited in claim 4, wherein: the filler is a rubber ball, and a plurality of pores are formed on the rubber ball.
6. The gas-liquid reaction apparatus as recited in claim 3, wherein: the number of the spray heads is four, and the four spray heads are arranged at the top of the third cavity at equal intervals.
7. The gas-liquid reaction apparatus as recited in claim 3, wherein: the cylinder body further comprises an overflow port for the etching liquid of the fourth cavity to flow out, and the overflow port is communicated with the fourth cavity.
8. The gas-liquid reaction apparatus as recited in claim 1, wherein: a pressure relief opening is formed in the cylinder body, and a pressure relief valve is installed on the pressure relief opening.
9. The gas-liquid reaction apparatus as recited in claim 1, wherein: the jet device comprises a liquid inlet, a gas inlet and an ejection hole, the liquid inlet is communicated with the jet pipeline, and the gas inlet is communicated with the gas inlet pipeline.
10. The gas-liquid reaction apparatus as recited in claim 1, wherein: the cylinder body is characterized by further comprising a visual pipeline for displaying the liquid level inside the cylinder body, and the visual pipeline is installed on the cylinder body.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123115408.8U CN216584245U (en) | 2021-12-10 | 2021-12-10 | Gas-liquid reaction equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202123115408.8U CN216584245U (en) | 2021-12-10 | 2021-12-10 | Gas-liquid reaction equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216584245U true CN216584245U (en) | 2022-05-24 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202123115408.8U Active CN216584245U (en) | 2021-12-10 | 2021-12-10 | Gas-liquid reaction equipment |
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| CN (1) | CN216584245U (en) |
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2021
- 2021-12-10 CN CN202123115408.8U patent/CN216584245U/en active Active
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