CN216574396U - Cleaning device for MOCVD equipment reaction chamber spray opening - Google Patents

Abstract

The utility model discloses a cleaning device of MOCVD equipment reaction chamber spray opening, cleaning device are equipped with the fan housing, be fixed with the motor on the bottom plate of fan housing, the blade holder in the output shaft fan housing of motor, be fixed with the blade on the blade holder, be equipped with the dust extraction hole on the fan housing, the dust extraction hole is connected with hose one end, dust collecting equipment is connected to the other end of hose. The utility model discloses a semi-automatization replaces manual cleanness, saves operating personnel physical power, improves work efficiency to can reduce a large amount of particulate matters that produce when manual cleanness, and then reduce the epitaxial layer defect that arouses because of the particulate matter drops to the substrate surface.

Description

Cleaning device for MOCVD equipment reaction chamber spray opening

Technical Field

The utility model relates to a clean technical field of MOCVD equipment.

Background

MOCVD (metal organic chemical vapor deposition) equipment is one of the main equipments for epitaxially growing third generation semiconductor epitaxial wafers and Light Emitting Diodes (LEDs) at present. The reaction chamber of the epitaxial equipment is mainly divided into a horizontal reaction chamber (a reaction source is horizontally sprayed out through a spraying port) and a vertical reaction chamber (a reaction source is vertically sprayed out through a spraying port).

Aiming at a vertical reaction chamber, a large amount of attachments exist at a spray nozzle of the reaction chamber after epitaxial growth, particularly when the epitaxial growth is carried out on components containing high Al. The attachments are mainly products of aluminum nitride (Al N), aluminum gallium nitride (Al GaN), gallium nitride (GaN), and the like. The attachment easily blocks a spray opening of the reaction chamber, so that the uniformity of the produced epitaxial wafer is poor, the defects are more, the yield is low, and the epitaxial cost is increased.

Therefore, the cleaning of attachments is carried out after the epitaxial growth is finished each time, so that the spraying port is clean and smooth and has no blockage phenomenon. At present, the method for cleaning the spray header of the reaction chamber of the epitaxial equipment is mainly to hold a scraper with one hand and hold a dust collector with the other hand for cleaning, but the attachment has high hardness, is attached compactly and is difficult to clean.

Disclosure of Invention

The utility model aims to solve the technical problem that realize a convenient, clean and more automatic remove the cleaning device who solves the deposit of reacting chamber shower nozzle department.

In order to realize the purpose, the utility model discloses a technical scheme be: the utility model provides a cleaning device of MOCVD equipment reaction chamber mouth that sprays, cleaning device are equipped with the fan housing, be fixed with the motor on the bottom plate of fan housing, the blade holder in the output shaft fan housing of motor, be fixed with the blade on the blade holder, be equipped with the dust extraction hole on the fan housing, the dust extraction hole is connected with hose one end, dust collecting equipment is connected to the other end of hose.

The wind cover is provided with a bottom plate and a coaming to form a barrel-shaped structure with one open end.

The cutter holder is provided with a cutter head fixing position at the opening end of the fan cover, and the cutter head fixing position contains a certain inclination angle along the rotation direction of the motor.

The blade is a strip-shaped structure protruding out of the cutter holder, and the section of the blade edge of the blade is triangular.

The outer surface of the fan housing is connected with a handle.

The utility model discloses a semi-automatization replaces manual cleanness, saves operating personnel physical power, improves work efficiency to can reduce a large amount of particulate matters that produce when manual cleanness, and then reduce the epitaxial layer defect that arouses because of the particulate matter drops to the substrate surface.

Drawings

The following brief descriptions of the contents expressed by each figure and the marks in the figures in the specification of the present invention are as follows:

FIG. 1 is a schematic structural diagram of a cleaning device for a spray port of a reaction chamber of an MOCVD apparatus;

the labels in the above figures are: 1. a motor; 2. a fan housing; 3. a tool apron; 4. a blade; 5. a handle; 6. a hose; 7. dust collecting equipment.

Detailed Description

The following description of the embodiments with reference to the drawings is intended to illustrate the present invention in further detail, such as the shapes and structures of the components, the mutual positions and connections between the components, the functions and working principles of the components, the manufacturing process, and the operation and use methods, etc., so as to help those skilled in the art understand the present invention more completely, accurately and deeply.

The cleaning device for the spray port of the reaction chamber of the MOCVD equipment comprises a fan cover 2, a motor 1, a tool apron 3, a blade 4, a handle 5, a hose 6 and dust collection equipment 7. The fan housing 2 comprises a bottom plate and a surrounding plate, the surrounding plate is arranged around the bottom plate to form a barrel-shaped structure with one end open, a motor 1 is fixed on the bottom plate, the motor 1 is fixed on the bottom plate through a bolt, a power supply end of the motor 1 is connected with a power supply through a power line, an output shaft of the motor 1 extends into the fan housing 2, an output shaft passes through a connecting piece and is fixedly connected with a cutter holder 3 in the fan housing 2, the motor 1 can drive the cutter holder 3 to rotate, and a spray opening is quickly cleaned by blades 4 on the surfaces of the cutter holder 3.

Blade 4 is high strength steel blade 4, and its whole strip structure for protrusion blade holder 3, and the cross-section of cutting edge is triangle-shaped, and blade 4 generally sets up threely, waits the contained angle to fix on blade holder 3, and blade holder 3 is located 2 open ends of fan housing and is equipped with the fixed position of tool bit, and blade 4 is fixed on blade holder 3 through countersunk screw.

Be equipped with the dust extraction hole on fan housing 2, can set up on the bottom plate, also can set up on the bounding wall, the dust extraction hole is connected with hose 6 one end, and dust collecting equipment 7 is connected to the other end of hose 6, for conveniently holding fan housing 2 and carrying out cleaning operation, the surface of fan housing 2 is connected with handle 5. And connecting the assembled device with a machine table to obtain a power supply. The operator turns on the power supply and the scraper motor 1 and the dust suction device 7 are started. An operator holds the handle 5 of the fan housing 2 by hand, the rotating blade 4 is slowly close to the spray opening of the reaction chamber to clean attachments, the attachments at the spray opening are further scraped by the high-speed rotation of the blade 4, and the scraped particle dust and the like are sucked away by the dust collection equipment 7 through the fan housing 2. Then the position is continuously moved until the attachments at the spray opening of the whole reaction chamber are completely cleaned.

The present invention has been described above with reference to the accompanying drawings, and it is to be understood that the invention is not limited to the specific embodiments described above, and that the invention is not limited to the specific embodiments described above, but rather is intended to cover various insubstantial modifications of the inventive method and solution, or its application to other applications without modification.

Claims (5)

1. The utility model provides a cleaning device of MOCVD equipment reaction chamber shower nozzle which characterized in that: cleaning device is equipped with the fan housing, be fixed with the motor on the bottom plate of fan housing, the blade holder in the output shaft of motor the fan housing, be fixed with the blade on the blade holder, be equipped with the dust extraction hole on the fan housing, the dust extraction hole is connected with hose one end, dust collecting equipment is connected to the other end of hose.

2. The cleaning device of claim 1, wherein: the fan cover is a barrel-shaped structure with one end opened and formed by a bottom plate and a coaming.

3. The cleaning device of claim 2, wherein: the cutter holder is provided with a cutter head fixing position at the opening end of the fan cover, and the cutter head fixing position contains a certain inclination angle along the rotation direction of the motor.

4. A cleaning device as claimed in claim 1, 2 or 3, characterized in that: the blade is a strip-shaped structure protruding out of the cutter holder, and the section of the blade edge of the blade is triangular.

5. The cleaning device of claim 4, wherein: the outer surface of the fan housing is connected with a handle.

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