CN216484499U - Wafer box cleanliness detection system - Google Patents
Wafer box cleanliness detection system Download PDFInfo
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- CN216484499U CN216484499U CN202122606524.3U CN202122606524U CN216484499U CN 216484499 U CN216484499 U CN 216484499U CN 202122606524 U CN202122606524 U CN 202122606524U CN 216484499 U CN216484499 U CN 216484499U
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- 238000001514 detection method Methods 0.000 title claims abstract description 40
- 230000003749 cleanliness Effects 0.000 title claims abstract description 26
- 239000002351 wastewater Substances 0.000 claims abstract description 169
- 239000007788 liquid Substances 0.000 claims abstract description 53
- 238000004140 cleaning Methods 0.000 claims abstract description 48
- 239000002245 particle Substances 0.000 claims abstract description 43
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 41
- 238000005070 sampling Methods 0.000 claims abstract description 19
- 239000012530 fluid Substances 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 9
- 238000007689 inspection Methods 0.000 abstract description 6
- 235000012431 wafers Nutrition 0.000 description 61
- 238000005259 measurement Methods 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 238000010586 diagram Methods 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 239000008187 granular material Substances 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000010355 oscillation Effects 0.000 description 4
- 239000000284 extract Substances 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000008054 signal transmission Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 230000003466 anti-cipated effect Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
The utility model discloses a wafer box cleanliness detection system which comprises a wafer box cleaning machine table, a waste water tank, a liquid particle detector, a controller and a terminal machine, wherein the wafer box cleaning machine table is connected with the waste water tank; a wastewater discharge port of the wafer box cleaning machine platform is communicated with the interior of the wastewater tank through a wastewater discharge pipeline; the interior of the waste water tank is connected with an inlet of the liquid particle detector through a sampling pipeline, a water suction pump is connected to the sampling pipeline, and an outlet end of the liquid particle detector is connected with a waste water discharge system through a waste water discharge pipeline; a liquid level sensor is arranged in the wastewater tank and used for detecting water level information in the wastewater tank; the water outlet of the waste water tank is connected with a waste water discharge system through a waste water discharge pipeline, and a drain valve is connected on the waste water discharge pipeline between the waste water tank and the waste water discharge system; and the wafer box cleaning machine platform, the liquid level sensor, the drain valve, the water suction pump, the liquid particle detector and the terminal are respectively connected with the controller. The utility model can shorten the process flow, reduce the workload, realize the nondestructive and full inspection of the wafer box and has high detection accuracy.
Description
Technical Field
The utility model relates to a detection system, in particular to a wafer box cleanliness detection system, and belongs to the technical field of wafer box detection.
Background
With the continuous development of the domestic semiconductor industry, the demand of the current market for chips is continuously increased, and the development of the silicon chip serving as a raw material for manufacturing the chips is more rapid under the support of the nation in recent years. The processing flow of the silicon wafer generally comprises the main steps of crystal growth, rounding, line cutting, double-face thinning, edge chamfering, surface corrosion, heat treatment, polishing, cleaning, epitaxy, detection, packaging and the like. After the silicon wafers are qualified, the silicon wafers are loaded into corresponding wafer boxes and are sent to clients, so that the wafer boxes can directly influence the surface quality of the silicon wafers, and the control of the cleanliness of the silicon wafers is important.
The current wafer box cleaning and detecting process is as follows: put into the spool box and correspond the cleaning machine and wash, extract partial spool box after the washing and inject water to inside, stop the water injection after reaching the anticipated water yield to vibrate the spool box and make water and spool box inner wall fully contact, use the granule to measure the board and measure the aquatic granule situation, in order to reach the purpose that detects the inside cleanliness factor of spool box. However, the above solution has the following drawbacks:
1. the existing film box needs to purchase related film box vibration equipment additionally due to the detection mode of water injection vibration, and equipment cost is increased.
2. After the wafer box is cleaned, the wafer box needs to be extracted for special measurement, so that the process flow and the complexity are increased.
3. The existing wafer box after detection cannot be used continuously due to the fact that water drops exist in the wafer box, the wafer box needs to be cleaned again, productivity waste is caused, cleaning cost is increased, and workload is increased.
4. Due to the destructive measurement mode, 100% measurement cannot be achieved, and the potential individual difference of the sampling inspection film box increases the risk of leakage to a certain degree. Similarly, because of the detection mode that its water injection was vibrate, there is the inside dead angle risk that rivers can't fully contact the inside and cause of spool box, can't measure the spool box outside and the relatively poor risk of spool box outside cleanliness factor that probably leads to.
5. The water filling oscillation measurement of the conventional wafer box is easy to interfere with the measurement result because the water filling, oscillation and measurement processes are complicated.
Disclosure of Invention
Aiming at the problems in the prior art, the utility model provides a wafer box cleanliness detection system which can shorten the process flow, reduce the workload, realize the nondestructive and full detection of a wafer box and has high detection accuracy.
The utility model relates to a wafer box cleanliness detection system which comprises a wafer box cleaning machine, a waste water tank, a liquid particle detector, a controller and a terminal machine, wherein the wafer box cleaning machine comprises a wafer box cleaning machine table, a waste water tank, a liquid particle detector, a controller and a terminal machine; a wastewater discharge port of the wafer box cleaning machine platform is communicated with the interior of the wastewater tank through a wastewater discharge pipeline; the interior of the waste water tank is connected with an inlet of the liquid particle detector through a sampling pipeline, a water suction pump is connected to the sampling pipeline, and an outlet end of the liquid particle detector is connected with a waste water discharge system through a waste water discharge pipeline;
a liquid level sensor is arranged in the wastewater tank and used for detecting water level information in the wastewater tank; the water outlet of the waste water tank is connected with a waste water discharge system through a waste water discharge pipeline, and a drain valve is connected on the waste water discharge pipeline between the waste water tank and the waste water discharge system; and the wafer box cleaning machine table, the liquid level sensor, the drain valve, the water suction pump, the liquid particle detector and the terminal are respectively connected with the controller.
And the flow control valve is connected to a sampling pipeline between the water suction pump and the liquid particle detector and used for controlling water flow entering the liquid particle detector.
Preferably, the wastewater tank includes inside groove and water jacket, and the inside groove sets up in the water jacket, and the inside groove prescribes a limit to an overflow space with the water jacket jointly, and level sensor arranges in the inside groove, and the wastewater discharge port of spool box cleaning machine platform passes through waste water pipeline and inside groove intercommunication, and the inside groove bottom outlet passes through the pipeline and links to each other with wastewater discharge system, and the drain valve is connected on the wastewater discharge pipeline between inside groove and wastewater discharge system, and the outlet of overflow space bottom passes through wastewater discharge pipeline and links to each other with wastewater discharge system.
Preferably, the upper part of the side wall of the wastewater tank is provided with an overflow hole, and the overflow hole is connected with a wastewater discharge system through an overflow pipeline.
The two schemes of the wastewater overflow treatment in the wastewater tank effectively prevent wastewater in the wastewater tank from directly overflowing to the outside of the wastewater tank, thereby polluting the environment around the wastewater tank and better protecting the environment.
Preferably, the waste water tank upper portion opens the setting, is convenient for observe the inside condition of waste water tank, is convenient for wash the waste water tank simultaneously, the import of selective examination pipeline is located waste water tank bottom position, and the suction pump of being convenient for extracts abundant waste water and send to liquid particle detector and carry out the granule and detect.
Further, the terminal comprises a signal receiving module connected with the terminal, a signal sending module connected with the controller, an electronic tag installed on the chip box and a scanner used for collecting ID numbers in the electronic tag, wherein the signal sending module is connected with the signal receiving module through wireless or wired signals. The signal receiving module and the signal sending module are additionally arranged, so that the ID number of the wafer box and the corresponding detection result are remotely transmitted to the terminal, and the condition of the cleanliness of the cleaned wafer box can be checked through data transmitted to the terminal even if a worker is not in an operation workshop.
Preferably, the electronic tag is an RFID radio frequency tag and the scanner is an RFID reader, or the electronic tag is a barcode and the scanner is a barcode scanner.
Preferably, the terminal is a tablet computer, a notebook computer, a desktop computer or a mobile phone.
Preferably, the controller is an STM32 series single chip microcomputer.
Compared with the prior art, the utility model has the following advantages:
1) the cleanliness of the wafer box is detected by detecting the particles in the wastewater of the last few minutes after the wafer box is cleaned, and the wafer box is not required to be measured by specially purchasing a wafer box oscillator, so that the purchase of related measuring equipment is reduced, the equipment cost is saved, and the production cost of enterprises is reduced.
2) The utility model measures the cleanliness of the wafer box after the cleaning in the prior art, and changes the cleanliness into the waste water of the last few minutes of a wafer box cleaning machine table during the cleaning, thereby reducing the process steps and shortening the process flow, thereby saving the labor cost and reducing the production cost of enterprises.
3) The utility model changes the prior art that part of the wafer box is required to be extracted for measurement after cleaning into the last few minutes of waste water of the wafer box cleaning machine during cleaning, thereby reducing the loss of the wafer box, increasing the productivity, reducing the workload and improving the working efficiency.
4) The utility model improves the detection rate of the wafer boxes, changes the conventional sampling part of the wafer box measurement into the measurement of the waste water of each group of cleaning wafer boxes, namely, changes the sampling detection into the full detection, improves the detection rate and reduces the abnormal wafer box post-flow caused by lower detection rate. On the other hand, only the inside of the conventional wafer box is measured, so that the waste water generated by cleaning the wafer box is measured, the purpose of detecting the whole inside and outside of the wafer box is realized, and the abnormal detection rate of the cleanliness of the outside of the wafer box is improved.
5) The utility model improves the stability of the manufacturing process, changes the existing water injection and oscillation measurement mode of the wafer box into the measurement machine wastewater during cleaning, avoids the interference of the water injection and oscillation processes on the measurement result, increases the stability of the detection result and ensures that the detection result is more accurate.
Drawings
FIG. 1 is a schematic structural diagram of an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of an embodiment of the present invention;
FIG. 5 is an electrical schematic block diagram of one embodiment of the present invention;
fig. 6 is an electrical schematic block diagram of an embodiment of the present invention.
In the figure: 1. the box cleaning machine comprises a box cleaning machine table, 2, a waste water discharge pipeline, 3, a waste water tank, 31, an outer tank, 32, an inner tank, 33, an overflow space, 4, a drain valve, 5, a waste water discharge system, 6, a liquid level sensor, 7, a water pump, 8, a sampling and inspection pipeline, 9, a flow control valve, 10, a liquid particle detector and 12, an overflow pipeline.
Detailed Description
The utility model will be further explained with reference to the drawings.
As shown in FIGS. 1 and 5, a system for inspecting cleanliness of a sheet cassette according to the present invention comprises
The wafer box cleaning machine table 1 is used for cleaning a wafer box;
the waste water tank 3 is used for containing waste water discharged by the wafer box cleaning machine table 1, and a waste water discharge port of the wafer box cleaning machine table 1 is communicated with the interior of the waste water tank 3 through a waste water discharge pipeline 2; a liquid level sensor 6 is arranged in the wastewater tank 3 and used for detecting water level information in the wastewater tank 3; a water outlet at the bottom of the waste water tank 3 is connected with an inlet of a waste water discharge system 5 through a waste water discharge pipeline 2, and a drain valve 4 is connected on the waste water discharge pipeline 2 between the waste water tank 3 and the waste water discharge system 5;
the liquid particle detector 10 is used for detecting the particle content in the liquid, the inlet of the liquid particle detector is communicated with the interior of the wastewater tank 3 through the sampling pipeline 8, and the outlet of the liquid particle detector is connected with the wastewater discharge system 5 through the wastewater discharge pipeline 2;
the water pump 7 is connected to the sampling inspection pipeline 8 and used for pumping the wastewater in the wastewater tank 3 and sending the wastewater to the liquid particle detector 10 for particle content detection;
a terminal for displaying the detection result of the liquid particle detector 10;
the wafer box cleaning machine table 1, the liquid level sensor 6, the drain valve 4, the water pump 7, the liquid particle detector 10 and the terminal are respectively connected with the controller.
As shown in fig. 2, as an embodiment of the present invention, the present invention further includes a flow control valve 9, the flow control valve 9 is connected to the sampling line 8 between the suction pump 7 and the liquid particle detector 10, and during operation, the flow control valve 9 is used to control the flow rate of the liquid in the sampling line 8 entering the liquid particle detector 10, so as to avoid that too much or too little waste water enters the liquid particle detector 10 to affect the detection result. The flow control valve 9 of this embodiment is a digital display flow control valve, which mainly comprises an automatic valve core, a manual valve core and a display part, and the flow of water flowing through the digital display flow control valve is adjusted by the manual valve core, so as to control the flow of wastewater in the sampling inspection pipeline 8 entering the liquid particle detector 10.
As shown in FIG. 3, as an embodiment of the present invention, the wastewater tank 3 includes an inner tank 32 and an outer tank 31, the inner tank 32 is disposed in the outer tank 31, and the inner tank 32 and the outer tank 31 together define an overflow space 33, the liquid level sensor 6 is disposed in the inner tank 32, the wastewater discharge port of the cartridge cleaning machine 1 is communicated with the inner tank 32 through the wastewater discharge pipe 2, the bottom water discharge port of the inner tank 32 is connected with the wastewater discharge system 5 through the wastewater discharge pipe 2, the discharge valve 4 is connected to the wastewater discharge pipe 2 between the inner tank 32 and the wastewater discharge system 5, and the water discharge port at the bottom of the overflow space 33 is connected with the wastewater discharge system 5 through the wastewater discharge pipe 2. The advantage of this embodiment setting up wastewater tank 3 as a double tank structure is: when the waste water in the inner tank 32 is excessive, the waste water overflows to the overflow space 33 and is discharged to the waste water discharge system 5 through the overflow space 33, so that the pollution to the environment around the waste water tank 3 is effectively avoided.
As shown in fig. 4, of course, the wastewater tank 3 may be a single tank, but considering that the amount of wastewater discharged may exceed the capacity of the wastewater tank 3, if the wastewater tank 3 is a single tank, an overflow hole may be formed in the upper portion of the sidewall of the wastewater tank 3, the overflow hole is connected to the inlet of the wastewater discharge system 5 through an overflow pipeline 12, and when the wastewater inside the wastewater tank 3 reaches the interface where the overflow hole is located, the excess wastewater is discharged to the wastewater discharge system 5 through the overflow hole and the overflow pipeline 12, so as to prevent the wastewater in the wastewater tank 3 from directly overflowing to the outside of the wastewater tank 3, thereby polluting the surrounding environment of the wastewater tank 3.
As a preferred embodiment, the upper part of the wastewater tank 3 is arranged in an open way, but the upper part of the wastewater tank 3 can also be arranged in a closed way. The inlet of the sampling inspection pipeline 8 is positioned at the bottom in the wastewater tank 3, so that the water suction pump 7 can conveniently extract sufficient wastewater to be used for the liquid particle detector 10 to detect the particle content in the wastewater.
As shown in fig. 6, in other embodiments of the present invention, the present invention may further include a signal sending module, a signal receiving module, an electronic tag, and a scanner; electronic tags installs on the spool box outer wall, and the scanner is used for scanning the ID serial number in the electronic tags, and signal transmission module links to each other with the controller, and signal reception module links to each other with the terminating machine, and signal transmission module and signal reception module pass through the wifi signal and link to each other, and of course, also can link to each other through other wireless mode, or link to each other through wired cable. A worker scans an electronic tag on a current to-be-cleaned wafer box through a scanner to obtain an ID number in the electronic tag, and the scanner transmits the obtained ID number to the controller. After the liquid particle detector 10 finishes detection, a detection result is transmitted to the controller, the controller binds the detection result of the liquid particle detector 10 with the current cleaned cartridge ID (namely, the ID of the cartridge to be cleaned) information, the bound information is transmitted to the signal receiving module through the signal transmitting module, the signal receiving module transmits the received information to the terminal and displays the information on the terminal, and a worker can see a particle measurement value, namely, a detection result, corresponding to each cartridge through the terminal, so that the cleanliness of each cleaned cartridge is known. The staff can set up the granule content in the waste water that detects and is less than the setting value according to the actual work needs, then think the spool box cleanliness is qualified, if set for the granule content of more than 0.2um in the waste water and be less than 10ea/ml, then think the spool box cleanliness is qualified.
In some embodiments, the electronic tag of the present invention is an RFID radio frequency tag and the scanner is an RFID reader, or the electronic tag is a barcode and the scanner is a barcode scanner. Of course, other electronic tags and their associated scanners may also be used. In this embodiment, the electronic tag is selected as the RFID radio frequency tag, and the scanner is an RFID reader.
In some embodiments, the terminal of the present invention may be a tablet computer, a notebook computer, a desktop computer or a mobile phone, and the notebook computer is used as the terminal of this embodiment.
As a preferred embodiment, the controller of the utility model is an STM32 series single chip microcomputer, the occupied space is small, and the data processing time is faster. Of course, other types of controllers can be selected as desired.
When the washing machine works, a worker reads the RFID radio frequency tag on the wafer box to be washed by the RFID reader, obtains the ID number (the number of the wafer box) in the RFID radio frequency tag, and the RFID reader reads the read ID number, transmits the read ID number to the controller and temporarily stores the read ID number in the controller.
Then the wafer box to be cleaned is put into the wafer box cleaning machine table 1, the wafer box cleaning machine table 1 is started through the controller, the waste water generated in the cleaning stage is discharged to the inner groove 32 of the waste water tank 3, and the waste water is directly discharged to the waste water discharge system 5 through the opened drain valve 4. When the cassette cleaning time is accumulated to the set time in the controller, i.e. the last few minutes of the cleaning stage, for example, the last 5 minutes, the controller controls the drain valve 4 to close, and the wastewater is stored in the inner tank 32 of the wastewater tank 3. The liquid level sensor 6 collects liquid level information in the groove 32 in the wastewater tank 3 in real time and transmits the liquid level information to the controller, when the liquid level information received by the controller is consistent with the liquid level information stored in the controller, the controller controls the water suction pump 7 and the liquid particle detector 10 to work, the wastewater pumped by the water suction pump 7 from the groove 32 in the wastewater tank 3 is controlled to be stable in flow through the flow control valve 9, enters the liquid particle detector 10 to measure related particles, and enters the wastewater discharge system 5 after measurement.
The set time inside the controller is set by the following method: setting the total time consumption of the cleaning stage of the wafer box cleaning machine 1 as T; if waste water of the last T minutes of the cleaning stage of the wafer box cleaning machine 1 needs to be collected, setting the time to be T-T;
when the liquid particle measurement is performed, as shown in fig. 3, when the wastewater tank 3 has a double-tank structure, if the wastewater in the tank 32 of the wastewater tank 3 reaches the top, the wastewater automatically overflows to the overflow space 33 and is discharged to the wastewater discharge through the overflow space 33; as shown in fig. 4, when the wastewater tank 3 is a single tank structure, if wastewater in the wastewater tank 3 reaches the interface where the overflow hole is located, the wastewater flows into the overflow pipeline 12 through the overflow hole, and is discharged to wastewater discharge through the overflow pipeline 12;
the measured value of the particles detected by the liquid particle detector 10, that is, the detection result, is transmitted to the controller, the controller binds the received detection result with the current cleaned cartridge ID (that is, the ID to be cleaned), and transmits the current cleaned cartridge and the corresponding detection result to the signal receiving module through the signal transmitting unit, the signal receiving module transmits the received data to the notebook computer for storage and display on the notebook computer, and the later-stage worker can directly fetch the data stored in the later-stage worker through the notebook computer if looking over the previous detection data.
Meanwhile, the controller controls the water suction pump 7 and the liquid particle detector 10 to be closed, controls the water discharge valve 4 to be opened, and directly discharges the wastewater in the groove 32 in the wastewater tank 3 into the wastewater discharge system 5 through the wastewater discharge pipeline 2 to finish all detection steps.
And when the wafer box cleaning machine table 1 finishes the cleaning and drying task, the wafer box cleaning machine table automatically stops working, and the wafer box cleaning work is finished.
Claims (9)
1. A wafer box cleanliness detection system is characterized by comprising a wafer box cleaning machine table, a waste water tank, a liquid particle detector, a controller and a terminal machine; a wastewater discharge port of the wafer box cleaning machine platform is communicated with the interior of the wastewater tank through a wastewater discharge pipeline; the interior of the waste water tank is connected with an inlet of the liquid particle detector through a sampling pipeline, a water suction pump is connected to the sampling pipeline, and an outlet end of the liquid particle detector is connected with a waste water discharge system through a waste water discharge pipeline;
a liquid level sensor is arranged in the wastewater tank, a water outlet of the wastewater tank is connected with a wastewater discharge system through a wastewater discharge pipeline, and a drain valve is connected on the wastewater discharge pipeline between the wastewater tank and the wastewater discharge system; and the wafer box cleaning machine table, the liquid level sensor, the drain valve, the water suction pump, the liquid particle detector and the terminal are respectively connected with the controller.
2. The system of claim 1, further comprising a flow control valve connected to the sampling line between the suction pump and the fluid particle detector.
3. The system for inspecting cleanliness of a wafer cassette according to claim 2, wherein the waste water tank includes an inner tank and an outer tank, the inner tank is disposed in the outer tank, and the inner tank and the outer tank together define an overflow space, the liquid level sensor is disposed in the inner tank, the waste water discharge port of the wafer cassette cleaning machine is connected to the inner tank through a waste water pipe, the inner tank bottom water discharge port is connected to the waste water discharge system through a pipe, the drain valve is connected to the waste water discharge pipe between the inner tank and the waste water discharge system, and the drain port at the bottom of the overflow space is connected to the waste water discharge system through a waste water discharge pipe.
4. The system for testing the cleanliness of a chip box according to claim 2, wherein an overflow hole is formed in an upper portion of a side wall of the waste water tank, and the overflow hole is connected to a waste water discharge system through an overflow line.
5. The wafer cassette cleanliness detection system according to any one of claims 3 and 4, wherein the upper portion of the waste water tank is open, and the inlet of the sampling pipeline is located at the bottom position in the waste water tank.
6. A wafer cassette cleanliness detection system according to any one of claims 1 to 4, further comprising a signal receiving module connected to the terminal, a signal transmitting module connected to the controller, an electronic tag mounted on the wafer cassette, and a scanner for collecting ID numbers in the electronic tag, wherein the signal transmitting module and the signal receiving module are connected by wireless or wired signals.
7. The cassette cleanliness detection system of claim 6, wherein the electronic tag is an RFID tag and the scanner is an RFID reader, or the electronic tag is a barcode and the scanner is a barcode scanner.
8. The system for inspecting cleanliness of a tablet box according to claim 5, wherein the terminal is a tablet computer, a notebook computer, a desktop computer or a mobile phone.
9. The system for detecting cleanliness of a sheet cassette according to claim 5, wherein the controller is an STM32 series single chip microcomputer.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122606524.3U CN216484499U (en) | 2021-10-28 | 2021-10-28 | Wafer box cleanliness detection system |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202122606524.3U CN216484499U (en) | 2021-10-28 | 2021-10-28 | Wafer box cleanliness detection system |
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| CN216484499U true CN216484499U (en) | 2022-05-10 |
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| CN202122606524.3U Active CN216484499U (en) | 2021-10-28 | 2021-10-28 | Wafer box cleanliness detection system |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115502159A (en) * | 2022-08-24 | 2022-12-23 | 杭州中欣晶圆半导体股份有限公司 | Cleaning process applied to 12-inch recovery wafer box |
-
2021
- 2021-10-28 CN CN202122606524.3U patent/CN216484499U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115502159A (en) * | 2022-08-24 | 2022-12-23 | 杭州中欣晶圆半导体股份有限公司 | Cleaning process applied to 12-inch recovery wafer box |
| CN115502159B (en) * | 2022-08-24 | 2023-09-08 | 杭州中欣晶圆半导体股份有限公司 | Cleaning process applied to 12-inch recycling box |
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Address after: 222100 No. 1, Xinxin Road, Jinshanqiao Development Zone, Xuzhou City, Jiangsu Province Patentee after: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Address before: 222100 No. 1, Xinxin Road, Jinshanqiao Development Zone, Xuzhou City, Jiangsu Province Patentee before: XUZHOU XINJING SEMICONDUCTOR TECHNOLOGY Co.,Ltd. |
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Effective date of registration: 20230628 Address after: 221004 No.1 Xinxin Road, Xuzhou Economic and Technological Development Zone, Jiangsu Province Patentee after: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Patentee after: Zhonghuan leading semiconductor materials Co.,Ltd. Address before: 222100 No. 1, Xinxin Road, Jinshanqiao Development Zone, Xuzhou City, Jiangsu Province Patentee before: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. |
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| CP03 | Change of name, title or address |
Address after: 221004 No.1 Xinxin Road, Xuzhou Economic and Technological Development Zone, Jiangsu Province Patentee after: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Country or region after: China Patentee after: Zhonghuan Leading Semiconductor Technology Co.,Ltd. Address before: 221004 No.1 Xinxin Road, Xuzhou Economic and Technological Development Zone, Jiangsu Province Patentee before: Zhonghuan Leading (Xuzhou) Semiconductor Materials Co.,Ltd. Country or region before: China Patentee before: Zhonghuan leading semiconductor materials Co.,Ltd. |