CN216387739U - Pneumatic adjusting device of exposure machine, substrate bracket and exposure machine - Google Patents
Pneumatic adjusting device of exposure machine, substrate bracket and exposure machine Download PDFInfo
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- CN216387739U CN216387739U CN202122948092.4U CN202122948092U CN216387739U CN 216387739 U CN216387739 U CN 216387739U CN 202122948092 U CN202122948092 U CN 202122948092U CN 216387739 U CN216387739 U CN 216387739U
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Abstract
The utility model discloses a pneumatic adjusting device of an exposure machine, a substrate bracket and the exposure machine, wherein the substrate bracket of the exposure machine comprises a bearing device, at least two groups of thimbles and a pneumatic adjusting device of the exposure machine corresponding to the number of the thimbles, the pneumatic adjusting device of the exposure machine comprises a gas supply unit, an adjusting valve, a cylinder, a sensor and a control unit, wherein the gas quantity of each cylinder has a preset upper limit and a preset lower limit, whether the gas quantity of the cylinder is in a normal working range is detected by the sensor, when the gas quantity of the cylinder is detected to be smaller than the preset lower limit or higher than the preset upper limit, the sensor provides a feedback signal to the control unit, the gas supply unit adjusts the flow speed of the supplied gas according to an adjusting signal provided by the control unit, and the real-time automatic adjustment of the gas quantity is realized so as to ensure that the thimbles coupled with the pneumatic device can ascend or descend at a preset speed, the frequency of damage to the exposure stage is reduced.
Description
Technical Field
The utility model relates to the field of liquid crystal display, in particular to a pneumatic adjusting device of an exposure machine, a substrate bracket and the exposure machine.
Background
In a photolithography process for a semiconductor device or a liquid crystal display device, a pattern of a mask or a grating is exposed on a glass substrate or a wafer (hereinafter, collectively referred to as a substrate) coated with a photosensitive material such as a photoresist by an exposure machine through a projection system.
Before the substrate enters the exposure machine, the plurality of ejector pins on the substrate bracket of the exposure machine need to be lifted to the same height at the same speed to pick up and deliver the substrate, and then the exposure process is carried out. Each thimble of the substrate bracket of the exposure machine is controlled by an independent pneumatic adjusting device of the exposure machine, after the exposure machine runs for a long time, the quantity of gas provided by the pneumatic adjusting device of each exposure machine is different, so that the ascending/descending speed of each thimble is different, the height of the contact end of each thimble and the substrate is different when the exposure machine stops, and the problems can be caused by the air tightness and abnormal actions of the pneumatic adjusting device of the exposure machine.
In order to prevent the substrate from displacing relative to a substrate bracket of an exposure machine in the process of taking and delivering, the contact end of the ejector pins and the substrate is adopted to adsorb the substrate, however, the different lifting speeds of the ejector pins can cause the substrate to have cracks, fragments, vacuum suction of the machine and other alarms, which result in abnormal products and breakdown of the exposure machine. In the prior art, the problem is solved by adopting a method of regularly observing and adjusting, however, the error of observation by naked eyes of an observer is large, and the actual speed of each pin after adjustment still has difference. Further, because of the long consuming time of the observation adjustment, most manufacturers observe the adjustment every month, but the period is long, if the pneumatic adjusting device of the exposure machine is abnormal, the abnormality cannot be found in time, the product abnormality or the yield is easy to cause, the exposure machine is down when the abnormality occurs, and the production efficiency is reduced.
SUMMERY OF THE UTILITY MODEL
In view of the above problems, an object of the present invention is to provide a pneumatic adjustment device for an exposure machine, a substrate holder and an exposure machine, which can automatically adjust the lifting speed and height of each thimble in real time.
According to an aspect of the present invention, there is provided a pneumatic adjustment device of an exposure tool, the pneumatic adjustment device comprising: a gas supply unit for supplying gas having a set flow rate; the regulating valve is connected with the gas supply unit and used for controlling the flowing direction of the gas; the cylinder is connected with the regulating valve and generates different actions according to the flowing direction of the gas so as to drive the thimble to ascend or descend; a sensor to detect a flow rate and/or a pressure of the gas to generate a feedback signal related to an amount of gas in the cylinder; the control unit is connected with the sensor, receives the feedback signal, and provides an adjusting signal for the gas supply unit to change the flow rate or the flow of the gas when the gas amount is higher than a preset upper limit or lower than a preset lower limit; wherein the ascending speed or the descending speed of the thimble is related to the gas quantity in the cylinder.
Optionally, the regulating valve is selected from a two-position five-way solenoid valve comprising: the valve body, the valve core, the first working port, the second working port and the air inlet are connected with the air supply unit; and the electromagnetic adjusting mechanism is used for adjusting the valve core and communicating any one end of the first working port and the second working port with the air inlet.
Optionally, the cylinder is selected from a double acting cylinder comprising: the cylinder body, the piston and the first air port are positioned at one end of the cylinder body and are communicated with the first working port; the second air port is positioned at the other end of the cylinder body and is communicated with the second working port; and one end of the piston rod is sleeved by the piston, and the other end of the piston rod moves in a direction far away from or close to the cylinder body at a set speed according to the flow speed and the flow direction of the gas.
Optionally, the sensor is coupled to one or both of the first and second ports.
Optionally, the coupling of the sensor to the first and/or second ports is sealed with a diaphragm gasket.
According to another aspect of the present invention, there is provided a substrate holder of an exposure tool, the substrate holder comprising: the bearing device is used for bearing a substrate and can adsorb the substrate; at least two groups of thimbles used for fetching and delivering the substrate; the pneumatic adjusting devices of the exposure machine station, which correspond to the number of the thimbles, are respectively coupled with the corresponding thimbles to drive the thimbles to ascend or descend at a preset speed; the bearing device further comprises an opening, and the ejector pin penetrates through the bearing device through the opening.
According to still another aspect of the present invention, an exposure tool is provided, which includes: a mask carrier for carrying a mask having a selected pattern; an illumination system positioned above the mask holder providing a light source to illuminate the mask; a projection system located below the mask holder, for projecting the pattern of the mask irradiated by the irradiation system onto a substrate; the substrate bracket of the exposure machine is positioned below the projection system and used for taking, delivering and bearing the substrate.
Optionally, the exposure tool further comprises: and the display unit is connected with the control unit and is used for displaying the gas amount in the cylinder.
Optionally, the exposure tool further comprises: and the alarm unit is connected with the control unit and generates an alarm signal when the gas amount in the cylinder is higher than a preset upper limit or lower than a preset lower limit.
Optionally, the substrate bracket of the exposure machine comprises four sets of lift pins and four sets of pneumatic adjustment devices of the exposure machine respectively coupled to the four sets of lift pins.
The utility model provides a pneumatic adjusting device of an exposure machine, a substrate bracket and the exposure machine, which is combined with a control unit, a sensor, a gas supply unit, an adjusting valve and cylinders to form a closed loop system and has the function of automatic gas supply, the gas quantity of each cylinder has a preset upper limit and a preset lower limit, the sensor is used for detecting whether the gas quantity of the cylinder is in a normal working range, when the gas quantity of the cylinder is detected to be smaller than the preset lower limit or higher than the preset upper limit, the sensor provides a feedback signal to the control unit, the gas supply unit adjusts the flow rate of the supplied gas according to the adjusting signal provided by the control unit, the real-time automatic gas quantity adjustment is realized, so that a thimble coupled with the pneumatic adjusting device of the exposure machine can be ensured to be ascended or descended at the preset speed, the product quality and the yield are ensured, meanwhile, the downtime of the exposure machine is effectively avoided, and the frequency of the damage of the exposure machine is reduced, meanwhile, the labor is saved.
Optionally, when the pneumatic adjusting device of the exposure machine leaks air seriously or does not act in place, the normal operation of the exposure machine is maintained temporarily by adjusting the flow rate of the gas provided by the gas supply unit, and the machine is stopped for maintenance and repair after the exposure process of the current substrate or the current batch of substrates is completed, so that the yield and the production efficiency of products are effectively improved.
Drawings
The above and other objects, features and advantages of the present invention will become more apparent from the following description of the embodiments of the present invention with reference to the accompanying drawings, in which:
FIG. 1 illustrates an exposure tool according to an embodiment of the present invention;
FIG. 2a is a front view of a substrate holder of the exposure tool of FIG. 1;
FIG. 2b is a top view of the substrate holder of the exposure tool of FIG. 1;
FIG. 3 is a schematic structural diagram of a pneumatic adjustment device and its peripheral components of an exposure tool according to an embodiment of the present invention;
fig. 4 is a schematic structural view showing the regulating valve, the cylinder and the connection relationship thereof in fig. 3.
Detailed Description
Various embodiments of the present invention will be described in more detail below with reference to the accompanying drawings. In the various figures, the same elements or modules are denoted by the same or similar reference numerals. For purposes of clarity, the various features in the drawings are not necessarily drawn to scale.
Also, certain terms are used throughout the description and claims to refer to particular components. As one of ordinary skill in the art will appreciate, manufacturers may refer to a component by different names. This patent specification and claims do not intend to distinguish between components that differ in name but not function.
Moreover, it is further noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
FIG. 1 shows an exposure tool according to an embodiment of the present invention. The exposure tool comprises, from top to bottom, an illumination system 600, a mask holder 400 for holding a mask 500 having a selected pattern, a projection system 300, and a substrate holder 100 of the exposure tool for picking up and holding a substrate 200. The illumination system 600 provides a light source to illuminate the mask 500, and the projection system 300 projects a selected pattern on the mask 500 illuminated by the illumination system 600 onto the substrate 200, wherein the substrate 200 is carried by the substrate holder 100 of the exposure machine, and the substrate 200 is coated with a photosensitive material such as photoresist, so that the pattern on the mask 500 is transferred to the substrate 200 according to a preset ratio.
The exposure tool may be selected from a stepper exposure tool or a scanning exposure tool, and the mask holder 400 and the substrate holder 100 of the exposure tool are moved in the same two-dimensional dimension at a first speed and a second speed, respectively, to complete the exposure of the entire substrate 200. Wherein the first speed and the second speed are related to a magnification of the projection system 300.
Referring to fig. 1 to 3, the exposure tool further includes a display unit 160 and an alarm unit 170, which are located outside a base (not shown) of the substrate holder 100 of the exposure tool. The display unit 160 is connected to the control unit 150 and is used for displaying the gas amount in the pneumatic adjustment device 102 of the exposure tool of the substrate holder 100 of the exposure tool. The alarm unit 170 is connected to the control unit 150, and generates an alarm signal when the amount of gas in the cylinder is higher than a preset upper limit or lower than a preset lower limit.
In a possible embodiment, the display unit 160 and the alarm unit 170 may also be located at other positions of the exposure tool, such as near the operation panel or the display panel of the exposure tool.
Fig. 2a and 2b illustrate a front view and a top view of a substrate holder of the exposure tool of fig. 1, respectively. As shown in fig. 2a and 2b, the substrate holder 100 of the exposure apparatus according to the embodiment of the present invention includes, for example, four sets of lift pins 101, a pneumatic adjustment device 102 of the four sets of exposure apparatus respectively coupled to the four sets of lift pins 101, and a carrier (chunk) 103.
The carrying device 103 is used for carrying the substrate 200 during the exposure process, and has a certain absorption capability to prevent the substrate 200 and the substrate holder 100 of the exposure machine from generating relative displacement, thereby preventing the pattern deviation from causing product abnormality and yield reduction during the exposure process. Illustratively, the carrier 103 absorbs the substrate 200 by vacuum absorption.
Further, the carrying device 103 further includes a plurality of openings. The thimble 101 passes through the carrying device 103 through an opening on the carrying device 103, and ascends or descends at a preset speed under the driving of the pneumatic adjusting device 102 of the exposure machine.
In the process of transporting the substrate 200 into or out of the exposure stations, the pneumatic adjustment devices 103 of each group of exposure stations respectively drive the corresponding ejector pins 101 to be lifted to the same height at a preset speed, so as to pick up and deliver the substrate 200. One end of each thimble 101, which is in contact with the substrate 200, can adsorb the substrate 200, and the substrate 200 is prevented from being displaced relative to the thimble 101.
It should be understood that the number of the ejector pins 101 of the substrate holder 100 of the exposure stage is not limited to four groups according to actual situations. And the pneumatic adjusting devices 102 of the exposure machines corresponding to the thimbles 101 can also be arranged in a centralized manner and coupled to the corresponding thimbles 101 through connecting pipelines.
Further, the base of the substrate holder 100 of the exposure machine is located below the carrying device 103, and can accommodate the pneumatic adjustment device 102 of the exposure machine, components for realizing the vacuum suction function of the carrying device 103, gas pipelines, electronic circuits, and other components.
In the substrate bracket 100 of the exposure machine of the embodiment of the utility model, the pneumatic adjusting devices 102 of a plurality of groups of exposure machines can automatically adjust the air flow in real time, so that the plurality of ejector pins 101 can respectively ascend or descend at the same preset speed, and when the ascending or descending of the ejector pins stops, the heights of the ends, in contact with the substrate 200, of the ejector pins 101 are also the same, thereby avoiding the phenomena of substrate cracks, fragments and machine vacuum suction, simultaneously reducing the downtime probability of the exposure machine, and effectively improving the yield and the production efficiency of products.
Further, the substrate bracket 100 of the exposure machine according to the embodiment of the present invention further includes a display unit 160 and an alarm unit 170, which can not only display the real-time air volume of the pneumatic adjustment devices of each exposure machine group, but also give an alarm when the air volume is higher than a preset upper limit or lower than a preset lower limit, thereby facilitating the maintenance personnel to perform maintenance and repair.
Fig. 3 is a schematic structural diagram of a pneumatic adjustment device of an exposure tool and peripheral components thereof according to an embodiment of the utility model. Each group of the ejector pins 101 on the substrate bracket 100 of the exposure machine is respectively coupled with the pneumatic adjusting device 102 of one group of the exposure machine, and the pneumatic adjusting device 102 of each group of the exposure machine independently controls the ascending and descending actions of the ejector pins 101 coupled with the pneumatic adjusting device. The pneumatic adjustment device 102 of the exposure machine includes an air supply unit 110, an adjustment valve 120, an air cylinder 130, a sensor 140, and a control unit 150.
The gas supply unit 110 supplies gas having a set flow rate, and the regulating valve 120 is selected from, for example, a two-position five-way solenoid valve, connected to the gas supply unit 110, and is capable of controlling the flow direction of the gas supplied from the gas supply unit 110. The cylinder 130 is connected to the regulating valve 120, and the cylinder 130 is selected from, for example, double acting cylinders, and can perform different actions according to the flow direction of the gas, thereby driving the thimble 101 coupled to the cylinder 130 to ascend or descend.
Wherein the sensor 140 is selected from a wind pressure sensor, for example, and is capable of detecting a physical quantity related to the gas quantity in the cylinder 130 and generating a feedback signal Vfb.
The control unit 150 is connected to the sensor 140, receives the feedback signal Vfb, and determines whether the amount of gas in the cylinder 130 is within a normal working range according to the feedback signal Vfb, and if the amount of gas in the cylinder 130 is higher than a preset upper limit or lower than a preset lower limit, provides an adjustment signal Vcp to the gas supply unit 110 to change the flow rate of gas provided by the gas supply unit 110, and adjusts the amount of gas entering the cylinder 130, so as to change the rising speed or the falling speed of the thimble 101 coupled to the cylinder 130.
It should be understood that the pneumatic adjustment devices of multiple exposure stations can share the same control unit.
The display unit 160 and the alarm unit 170 are respectively connected to the control unit 150, the display unit 160 can display the gas amount in the cylinder 130 calculated by the control unit 150 according to the feedback signal Vfb in real time, and the alarm unit 170 can send out an alarm signal when the gas amount in the cylinder 130 is higher than a preset upper limit or lower than a preset lower limit.
The pneumatic adjusting device for the exposure machine, provided by the utility model, is combined with the control unit 150, the sensor 140, the air supply unit 110, the adjusting valve 120 and the air cylinder 130 to form a closed-loop system, has the functions of air leakage alarm and automatic air supply, and can be used for observing that maintenance personnel can maintain the exposure machine in time according to the amount of air displayed by the display unit 160 and the alarm signal sent by the alarm unit 170, so that the downtime probability is effectively reduced, and the quality, the yield and the production efficiency of products are improved.
Fig. 4 is a schematic structural diagram illustrating the regulating valve, the cylinder and the connection relationship thereof in fig. 3, and the pneumatic regulating device of the exposure machine provided by the present invention is further described with reference to fig. 3 and 4.
The regulator valve 120 is selected from a two-position five-way solenoid valve, and includes a valve body 121, a valve element 122, an electromagnetic regulating mechanism 123, an intake port P, a first working port a, a second working port B, a first exhaust port R, and a second exhaust port S.
The cylinder 130 is selected from a double acting cylinder, comprising a cylinder 131, a piston rod 132, a piston 133 sleeved with the piston rod 132, a first air port C and a second air port D, wherein the interior of the cylinder 131 is divided into two chambers by the piston 133: a first chamber including piston rod 132 and a second chamber not including piston rod 132. Wherein the first air port C is communicated with the first working port A of the regulating valve, and the second air port D is communicated with the second working port B of the regulating valve.
The present invention is provided with a sensor 140 mounted on either or both of the first port C and the second port D of the cylinder 130, in this embodiment, the sensor 140 is selected from a wind pressure sensor, and is located at the second port D of the cylinder 130, and the junction of the sensor 140 and the cylinder 130 is sealed by a diaphragm gasket, and a lead wire is welded to the bottom of the diaphragm gasket to complete the connection of the sensor 140.
The gas inlet P is connected to the gas supply unit 110 and receives the gas supplied from the gas supply unit 110. The electromagnetic adjustment mechanism 123 changes the operating position of the spool 122 under the control of the control unit 150 so that the adjustment valve 120 is in the first operating state or the second operating state, thereby changing the flow direction of the gas.
In the first operating state, the spool 122 is in the first operating position, the gas flow direction is as shown in fig. 4, the gas inlet P is communicated with the second working port B, the first gas outlet R is communicated with the first working port a, the gas enters the regulating valve 120 from the gas inlet P, the gas is provided to the second gas outlet D of the cylinder 130 from the second working port B, the gas amount in the second chamber is increased, the pressure is increased, the volume of the second chamber is increased, the piston 133 and the piston rod 132 are pushed to move along the x direction, and the thimble 101 coupled to the piston rod 132 is lifted.
When the piston 133 moves in the x direction, the volume of the first chamber decreases, and the gas in the first chamber is discharged from the first gas port C to the first working port a, and further from the first exhaust port R of the regulator valve.
Further, the flow rate/quantity of the gas is different, the amount of the gas entering the second chamber per unit time is different, the moving speed of the piston 133 and the piston rod 132 is different, and the rising speed of the thimble 101 coupled to the piston rod 132 is also different.
The sensor 140 located at the second port D of the cylinder 130 detects the flow rate and/or pressure of the gas therein to generate a feedback signal Vfb, and the control unit 150 determines whether the amount of the gas in the cylinder 130 is within a preset range according to the feedback signal Vfb.
If the gas amount is within the predetermined range, the pneumatic adjustment device 102 of the exposure tool normally operates, and the raising speed of the thimble 101 is within the normal range, without adjusting the gas supply unit 110.
If the amount of gas in the cylinder 130 is lower than the preset lower limit, the control unit 150 provides the adjustment signal Vcp to the gas supply unit 110, the gas supply unit 110 increases the flow rate of the gas to replenish the gas into the cylinder 130, the amount of gas entering the cylinder 130 in a unit time increases, the movement speed of the piston 133 and the piston rod 132 along the x direction increases, and the rising speed of the thimble 101 is not too slow, and can still be kept within the normal range.
If the amount of gas in the cylinder 130 is higher than the preset upper limit, the control unit 150 provides the adjustment signal Vcp to the gas supply unit 110, and the gas supply unit 110 reduces the gas flow rate, so that the amount of gas entering the cylinder 130 per unit time is reduced, the movement speed of the piston 133 and the piston rod 132 along the x direction is reduced, the rising speed of the thimble 101 is not too fast, and the thimble can still be kept within the normal range.
The pneumatic adjustment device 102 of the exposure machine of the embodiment of the utility model detects whether the air cylinder 130 leaks air through the sensor 140, when the amount of the gas detected by the sensor 140 is smaller than the preset lower limit, the sensor 140 provides a feedback signal Vfb to the control unit 150, and the gas supply unit 110 adjusts the flow rate of the supplied gas according to the adjustment signal Vcp provided by the control unit 150, so as to realize real-time automatic adjustment of the amount of the gas, thereby ensuring that the thimble 101 can ascend or descend at the preset speed, and effectively avoiding the downtime of the exposure machine while ensuring the product quality and the yield.
Optionally, when the pneumatic adjustment device 102 of the exposure machine leaks air seriously or does not operate properly, the normal operation of the exposure machine is temporarily maintained by adjusting the flow rate of the gas provided by the gas supply unit 110, and after the exposure process of the current substrate or the batch of substrates is completed, the machine is stopped for maintenance and repair, thereby effectively improving the yield and the production efficiency of the products.
In the second working state, the valve core 122 is in the second working position, the air inlet P is communicated with the first working port a, the second air outlet S is communicated with the second working port B, the air flowing direction is opposite to that shown in fig. 4, the moving direction of the piston rod 132 and the piston 133 is opposite to the x direction, the ejector pin coupled with the piston rod 132 descends at a preset speed, and the rest parts are similar to the first working state and are not described again.
The utility model provides a pneumatic adjusting device of an exposure machine, a substrate bracket and the exposure machine, which is combined with a control unit 150, a sensor 140, a gas supply unit 110, an adjusting valve 120 and a cylinder 130 to form a closed loop system, and has the function of automatic gas supply, the gas quantity of each cylinder has a preset upper limit and a preset lower limit, whether the gas quantity of the cylinder 130 is in a normal working range is detected by the sensor 140, when the gas quantity of the cylinder 130 is detected to be smaller than the preset lower limit or higher than the preset upper limit, the sensor 140 provides a feedback signal Vfb to the control unit 150, the gas supply unit 110 adjusts the flow rate of the supplied gas according to an adjusting signal Vcp provided by the control unit 150, so as to realize real-time automatic gas quantity adjustment, ensure that a thimble 101 coupled with the pneumatic adjusting device 102 of the exposure machine can ascend or descend at a preset speed, and ensure the product quality and the yield, effectively avoid the exposure machine to shut down, reduced the frequency of exposure machine platform damage, also practiced thrift the manpower simultaneously.
Optionally, when the pneumatic adjustment device 102 of the exposure tool leaks air seriously or does not operate properly, the normal operation of the exposure tool is temporarily maintained by adjusting the flow rate of the gas provided by the gas supply unit 110, and the exposure tool is stopped for maintenance and repair after the exposure process of the current substrate or the current batch of substrates is completed, thereby effectively improving the yield and production efficiency of the products.
In accordance with the present invention, as described above, these embodiments do not set forth all of the details or limit the utility model to only the specific embodiments described. Obviously, many modifications and variations are possible in light of the above teaching. The embodiments were chosen and described in order to best explain the principles of the utility model and the practical application, to thereby enable others skilled in the art to best utilize the utility model and various embodiments with various modifications as are suited to the particular use contemplated. The scope of the utility model should be determined with reference to the appended claims and their equivalents.
Claims (10)
1. The utility model provides a pneumatic adjusting device of exposure board which characterized in that, the pneumatic adjusting device of exposure board includes:
a gas supply unit for supplying gas having a set flow rate;
the regulating valve is connected with the gas supply unit and used for controlling the flowing direction of the gas;
the cylinder is connected with the regulating valve and generates different actions according to the flowing direction of the gas;
a sensor to detect a flow rate and/or a pressure of the gas to generate a feedback signal related to an amount of gas in the cylinder;
the control unit is connected with the sensor, receives the feedback signal, and provides an adjusting signal for the gas supply unit to adjust the flow rate or flow rate of the gas in a feedback mode when the gas amount is higher than a preset upper limit or lower than a preset lower limit; wherein the content of the first and second substances,
the speed of motion of the cylinder is related to the amount of gas in the cylinder.
2. The pneumatic adjusting device of exposure tool of claim 1, wherein the adjusting valve is selected from two-position five-way solenoid valves, comprising: valve body, valve core, first working port, second working port, and
the air inlet is connected with the air supply unit;
and the electromagnetic adjusting mechanism is used for adjusting the valve core and communicating any one end of the first working port and the second working port with the air inlet.
3. The pneumatic adjusting device of the exposure machine of claim 2, wherein the cylinder is selected from a double acting cylinder comprising: a cylinder, a piston, and
the first air port is positioned at one end of the cylinder body and is communicated with the first working port;
the second air port is positioned at the other end of the cylinder body and is communicated with the second working port;
and one end of the piston rod is sleeved by the piston, and the other end of the piston rod moves in a direction far away from or close to the cylinder body at a set speed according to the flow speed and the flow direction of the gas.
4. The pneumatic adjustment device of exposure tool of claim 3, wherein the sensor is coupled to one or both of the first and second gas ports.
5. The pneumatic adjustment device of exposure tool of claim 3, wherein the coupling of the sensor and the first and/or second air port is sealed with a diaphragm gasket.
6. The utility model provides a base plate bracket of exposure machine, its characterized in that, the base plate bracket of exposure machine includes:
the bearing device is used for bearing a substrate and can adsorb the substrate;
at least two groups of thimbles used for fetching and delivering the substrate;
the pneumatic adjusting device of the exposure machine according to any one of claims 1 to 5, corresponding to the number of the pins, coupled to the corresponding pins respectively for driving the pins to ascend or descend at a predetermined speed; wherein
The bearing device further comprises an opening, and the ejector pin penetrates through the bearing device through the opening.
7. An exposure tool, comprising:
a mask carrier for carrying a mask having a selected pattern;
an illumination system positioned above the mask holder providing a light source to illuminate the mask;
a projection system located below the mask holder, for projecting the pattern of the mask irradiated by the irradiation system onto a substrate;
the substrate holder of claim 6, being under the projection system, for transferring and supporting the substrate.
8. The exposure tool of claim 7, further comprising:
and the display unit is connected with the control unit and used for displaying the gas amount in the pneumatic adjusting device of the exposure machine.
9. The exposure tool of claim 7, further comprising:
and the alarm unit is connected with the control unit and generates an alarm signal when the gas amount in the cylinder is higher than a preset upper limit or lower than a preset lower limit.
10. The exposure tool of claim 7, wherein the substrate holder of the exposure tool comprises four sets of lift pins and four sets of pneumatic adjustment devices of the exposure tool respectively coupled to the four sets of lift pins.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122948092.4U CN216387739U (en) | 2021-11-29 | 2021-11-29 | Pneumatic adjusting device of exposure machine, substrate bracket and exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122948092.4U CN216387739U (en) | 2021-11-29 | 2021-11-29 | Pneumatic adjusting device of exposure machine, substrate bracket and exposure machine |
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| Publication Number | Publication Date |
|---|---|
| CN216387739U true CN216387739U (en) | 2022-04-26 |
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|---|---|---|---|
| CN202122948092.4U Active CN216387739U (en) | 2021-11-29 | 2021-11-29 | Pneumatic adjusting device of exposure machine, substrate bracket and exposure machine |
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| CN (1) | CN216387739U (en) |
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2021
- 2021-11-29 CN CN202122948092.4U patent/CN216387739U/en active Active
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