CN216351774U - Position detection mechanism and double-table-board exposure system thereof - Google Patents
Position detection mechanism and double-table-board exposure system thereof Download PDFInfo
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- CN216351774U CN216351774U CN202122515519.1U CN202122515519U CN216351774U CN 216351774 U CN216351774 U CN 216351774U CN 202122515519 U CN202122515519 U CN 202122515519U CN 216351774 U CN216351774 U CN 216351774U
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Abstract
The utility model discloses a position detection mechanism and a double-table exposure system, wherein the position detection mechanism comprises at least two grating rulers, reading heads respectively corresponding to the grating rulers, and grating ruler conversion units, the adjacent grating rulers are spliced, the reading heads are used for reading data corresponding to the grating rulers, and the data read by the reading heads are transmitted to the grating ruler conversion units. The double-station exposure system comprises a first table board, a second table board, a first contraposition detection mechanism, a second contraposition detection mechanism and an optical mechanism, wherein the first contraposition detection mechanism and the second contraposition detection mechanism are positioned on two sides of the optical mechanism, and position detection mechanisms are respectively arranged corresponding to the first table board and the second table board. The position detection mechanism meets the requirement of long stroke by splicing the grating ruler, and utilizes the long stroke to reasonably configure the alignment detection mechanism and the optical mechanism, so that when one table top is aligned and detected, the exposure operation of the other table top is not influenced, and the alignment detection mechanism and the optical mechanism can be carried out simultaneously without mutual interference.
Description
Technical Field
The utility model relates to an exposure system, in particular to an exposure system with double table tops and a position detection mechanism thereof.
Background
The light source direct projection type exposure equipment is also called as image direct projection equipment and can be applied to research, development and production in the fields of semiconductors, PCBs and plane imaging. The direct projection type uses a pattern generator to replace the traditional mask technology, and directly exposes the pattern data of the computer to the product, thereby saving the cost and improving the efficiency. The single-mesa mode production speed of the traditional exposure machine is developed to the limit, the production speed needs to be improved by a double-mesa design, the manufacturing cost of an optical engine is high, the utilization rate of an optical part can be improved by the double-mesa design, the cost is saved, and the cost performance of equipment is improved; there is the type of multiple double-table-board exposure machine at present, and the first kind is mutual double-table-board mode from top to bottom, adopts a set of counterpoint system and a set of optical mechanism, and two mesas carry out counterpoint exposure operation at counterpoint mechanism and exposure mechanism respectively, through the rise and the decline of mesa, avoid the interact of two mesas, but the mesa is unilateral supporting, has influenced the stability of mesa. The second type is a left-right double-table structure, the two tables are distributed and installed left and right, the alignment mechanism and the optical mechanism need to move left and right to respectively perform exposure operation on the two tables, but the optical element is very sensitive, and the exposure precision is reduced by the movable optical mechanism. The third is that the optical mechanism is arranged in the middle position, the contraposition mechanisms are positioned at two sides of the optical mechanism, the table top moves from two sides of the optical mechanism to the respective corresponding contraposition mechanisms respectively for contraposition, and then moves to the optical mechanism for exposure. For high-precision exposure equipment, because the focal depth of a lens is smaller than the flatness of a platform, the flatness needs to be measured firstly, then the focal plane of the lens needs to be automatically adjusted to enter an exposure process, the time consumption of the process of measuring the flatness is long, and an optical mechanism cannot be fully utilized.
Disclosure of Invention
The utility model aims to solve the technical problem of providing a position detection mechanism and a double-table exposure system, wherein the position detection mechanism can prolong the measurement stroke of the position detection mechanism, and the double-table exposure system reasonably configures and fully utilizes an optical mechanism by prolonging the measurement stroke.
In order to solve the above problems, the present invention provides a position detection mechanism, which includes at least two grating scales, reading heads respectively corresponding to the grating scales, and a grating scale conversion unit, wherein adjacent grating scales are spliced, the reading heads are used for reading data corresponding to the grating scales, and the data read by the reading heads are transmitted to the grating scale conversion unit.
Further, the measuring strokes of adjacent grating rulers are overlapped in the splicing area.
Further, in the splicing area of the adjacent grating scales, the reading heads corresponding to the grating scales transmit data to the grating scale conversion unit, and the grating scale conversion unit obtains the coordinate conversion relationship of the adjacent grating scales according to the data of the reading heads corresponding to the grating scales.
Further, except for the splicing area, only the reading head which reads data transmits the data to the grating ruler conversion unit.
The double-station exposure system comprises a first table board, a second table board, a first alignment detection mechanism, a second alignment detection mechanism and an optical mechanism, wherein the first alignment detection mechanism and the second alignment detection mechanism are positioned on two sides of the optical mechanism, the first table board moves to the optical mechanism through the first alignment detection mechanism, the second table board moves to the optical mechanism through the second alignment detection mechanism, and the position detection mechanisms are respectively arranged corresponding to the first table board and the second table board.
Furthermore, the station ranges corresponding to the first alignment detection mechanism, the second alignment detection mechanism and the exposure mechanism are the ranges which can be covered by the two table tops and are not overlapped with each other.
Furthermore, the position detection mechanism comprises two grating rulers, namely a first grating ruler and a second grating ruler.
Further, the first grating scale at least covers the stroke in the exposure process, and the second grating scale at least covers the stroke in the alignment detection process.
Furthermore, the splicing area of the first grating ruler and the second grating ruler of the position detection mechanism is close to the alignment detection stroke.
Further, the first grating scale and the second grating scale of the position detection mechanism are adjacent to the end point of the alignment detection stroke.
Compared with the prior art, the position detection mechanism provided by the utility model meets the requirement of long stroke by splicing the grating ruler, and the double-sided exposure system reasonably configures the alignment detection mechanism and the optical mechanism by prolonging the stroke, so that when one table top is subjected to alignment detection, the exposure operation of the other table top is not influenced, and the two table tops can be simultaneously carried out without mutual interference.
Drawings
Fig. 1 is a schematic diagram of a dual-mesa exposure system.
Fig. 2 is a schematic diagram of the position detection mechanism.
Detailed Description
In order that the objects, aspects and advantages of the utility model will become more apparent, the utility model will be described by way of example only, and in connection with the accompanying drawings.
As shown in fig. 1, a double-stage exposure system includes a first stage 1, a second stage 2, an optical mechanism 3, a first alignment detection mechanism 4, a second alignment detection mechanism 5, a position detection mechanism 6 corresponding to the first stage, and a position detection mechanism 7 corresponding to the second stage. The first alignment detection mechanism 4 and the second alignment detection mechanism 5 are located on two sides of the optical mechanism 3, the first alignment detection mechanism 4 performs alignment and flatness detection on a workpiece placed on the first table top 1, and the second alignment detection mechanism 5 performs alignment and flatness detection on a workpiece placed on the second table top 2. The first table board 1 bears the workpiece and moves to the optical mechanism 3 through the first alignment detection mechanism 4 to perform exposure operation, and the second table board 2 bears the workpiece and moves to the optical mechanism 3 through the second alignment detection mechanism 5 to perform exposure operation. The position detection means 6 corresponding to the first table top 1 are arranged to detect the position of said first table top 1 and the position detection means 7 corresponding to the second table top 2 are arranged to detect the position of said second table top 2.
Through counterpoint detection mechanism (4, 5) acquire the height data of work piece on mesa (1, 2), this in-process need carry out the height measurement of high concentration to the work piece and obtain height data, for the long time of the data of the simple acquisition work piece counterpoint position, if not adjusting the counterpoint detection station, carry out the counterpoint of work piece and the in-process of work piece height detection at first mesa, will occupy the space that the second mesa carries out the exposure operation, make the second mesa can't carry out the exposure operation, and the same reason, when the second mesa carries out counterpoint and detects, first mesa also can't carry out the exposure operation, optical mechanism is vacant, can't fully obtain utilizing.
In the double-table exposure system, the station ranges corresponding to the first alignment detection mechanism 4, the second alignment detection mechanism 5 and the optical mechanism 3 are the ranges which can be covered by the two tables and are not overlapped with each other, that is, the distance between the first alignment detection mechanism 4 and the optical mechanism 3 is the distance between the two tables, and the distance between the second alignment detection mechanism 5 and the optical mechanism 3 is the same as the distance between the two tables. When one of the table tops is used for carrying out alignment and height detection, the other table top can carry out exposure operation in a station area of the optical mechanism, and the two table tops are not interfered with each other and are synchronously carried out.
The extension of the alignment detection station and the exposure station leads to the lengthening of the measurement stroke of the position detection mechanism for detecting the positions of the first table top and the second table top, while the length of the conventional grating ruler hard ruler can not meet the stroke of the first table top and the second table top in the double-table top exposure system, if the grating ruler soft ruler can have a longer stroke, but the expansion coefficient of the grating ruler soft ruler is easily affected by the temperature, so that the measurement result has larger fluctuation, and the precision can not be ensured; the interferometer for measuring the position, although able to meet the precision requirements, is expensive and inconvenient to use and maintain.
As shown in fig. 2, the position detection mechanism (6, 7) of the dual-mesa exposure system includes a first grating ruler 10, a first reading head, a second grating ruler 11, a second reading head, and a grating ruler conversion unit, the first grating ruler 10 and the second grating ruler 11 are spliced to cover a stroke of alignment detection and exposure of the first mesa or the second mesa, the first reading head is used to read data of the first grating ruler 10, the second reading head is used to read data of the second grating ruler 11, the grating ruler conversion unit receives position data of the first reading head and the second reading head, and calculates to obtain position information, except for the grating ruler splicing area 12, the grating ruler conversion unit only receives data of the first reading head or the second reading head. The first grating scale 10 at least covers the stroke in the exposure process, and the second grating scale 11 at least covers the stroke in the alignment detection process. Preferably, the measuring strokes of the first grating ruler 10 and the second grating ruler 11 are overlapped in the splicing area 12, that is, the strokes of the first grating ruler 10 and the second grating ruler 11 both cover the splicing area 12, so as to avoid the occurrence of a gap between the first grating ruler and the second grating ruler and the introduction of an error when the first grating ruler 10 and the second grating ruler 11 are directly connected. Preferably, the splicing area 12 is close to the alignment detection stroke and is adjacent to the end point of the alignment detection stroke, so that the workpiece on the first table top 1 or the second table top 2 can be quickly moved to the splicing area of the grating ruler after the exposure operation is completed, and the grating ruler does not affect the exposure operation of the other table top completely when the splicing area 12 switches signals to cause pause.
In the splicing area 12 of the first grating scale 10 and the second grating scale 11, the first reading head reads data of the first grating scale 10, the second reading head reads data of the second grating scale 11, the data of the first reading head and the second reading head are transmitted to the grating scale conversion unit, the grating scale conversion unit obtains a coordinate conversion relation between the first grating scale 10 and the second grating scale 11 according to the data of the first grating scale 10 and the second grating scale 11, and obtains position data of the same coordinate system according to the coordinate conversion relation between the first grating scale 10 and the second grating scale 11, so that the first grating scale 10 and the second grating scale 11 are connected to measure the whole full-stroke position of the alignment detection stroke and the exposure stroke of the first table top 1 or the second table top 2.
According to the difference of the measuring strokes of the grating scales, the number of the grating scales in the position detection mechanism can be increased or decreased, and is not limited to two grating scales in the above embodiments. And measuring strokes of adjacent grating rulers are overlapped in the splicing area. In the splicing area, the reading heads corresponding to the grating scales transmit data to the grating scale conversion unit, and the grating scale conversion unit obtains the coordinate conversion relation of the adjacent grating scales according to the data of the reading heads corresponding to the grating scales. Except for the splicing area, the reading head only reading data transmits the data to the grating ruler conversion unit.
Claims (10)
1. A position detection mechanism characterized by: the grating ruler comprises at least two grating rulers, reading heads and grating ruler conversion units, wherein the reading heads respectively correspond to the grating rulers, the adjacent grating rulers are spliced, the reading heads are used for reading data of the corresponding grating rulers, and the data read by the reading heads are transmitted to the grating ruler conversion units.
2. The position detection mechanism according to claim 1, characterized in that: and measuring strokes of adjacent grating rulers are overlapped in the splicing area.
3. The position detection mechanism according to claim 1, characterized in that: in the splicing area of the adjacent grating scales, the reading heads corresponding to the grating scales transmit data to the grating scale conversion unit, and the grating scale conversion unit obtains the coordinate conversion relation of the adjacent grating scales according to the data of the reading heads corresponding to the grating scales.
4. The position detection mechanism according to claim 3, characterized in that: except for the splicing area, the reading head only reading data transmits the data to the grating ruler conversion unit.
5. A double-station exposure system using the position detecting mechanism according to any one of claims 1 to 4, characterized in that: the double-station exposure system comprises a first table board, a second table board, a first alignment detection mechanism, a second alignment detection mechanism and an optical mechanism, wherein the first alignment detection mechanism and the second alignment detection mechanism are located on two sides of the optical mechanism, the first table board moves to the optical mechanism through the first alignment detection mechanism, the second table board moves to the optical mechanism through the second alignment detection mechanism, and the position detection mechanisms are arranged on the first table board and the second table board respectively.
6. The double station exposure system of claim 5, wherein: the station ranges corresponding to the first alignment detection mechanism, the second alignment detection mechanism and the optical mechanism are the ranges which can be covered by the two table tops and are not overlapped with each other.
7. The double station exposure system of claim 5, wherein: the position detection mechanism comprises two grating rulers, namely a first grating ruler and a second grating ruler.
8. The double station exposure system of claim 7, wherein: the first grating ruler at least covers the stroke in the exposure process, and the second grating ruler at least covers the stroke in the alignment detection process.
9. The double station exposure system of claim 7, wherein: and the splicing area of the first grating ruler and the second grating ruler of the position detection mechanism is close to the alignment detection stroke.
10. The double station exposure system of claim 7, wherein: the first grating scale and the second grating scale of the position detection mechanism are adjacent to the end point of the alignment detection stroke.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202122515519.1U CN216351774U (en) | 2021-10-19 | 2021-10-19 | Position detection mechanism and double-table-board exposure system thereof |
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| CN202122515519.1U CN216351774U (en) | 2021-10-19 | 2021-10-19 | Position detection mechanism and double-table-board exposure system thereof |
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Address after: 215026 Room 102, building C5, No. 192, Tinglan lane, Suzhou Industrial Park, Jiangsu Province Patentee after: Yuanzhuo Micro Nano Technology (Suzhou) Co.,Ltd. Address before: 215026 Room 102, building C5, No. 192, Tinglan lane, Suzhou Industrial Park, Jiangsu Province Patentee before: ADVANCED MICRO OPTICS.INC |
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