CN216337939U - Chemical vapor deposition equipment with multilayer workpiece placing surface - Google Patents
Chemical vapor deposition equipment with multilayer workpiece placing surface Download PDFInfo
- Publication number
- CN216337939U CN216337939U CN202122832674.6U CN202122832674U CN216337939U CN 216337939 U CN216337939 U CN 216337939U CN 202122832674 U CN202122832674 U CN 202122832674U CN 216337939 U CN216337939 U CN 216337939U
- Authority
- CN
- China
- Prior art keywords
- workpiece
- vapor deposition
- placing
- chemical vapor
- gas supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The chemical vapor deposition equipment with the multilayer workpiece placing surfaces comprises a furnace body, a fixed seat, a workpiece placing frame, a heating device and a gas supply device, wherein a reaction chamber is arranged in the furnace body, and the workpiece placing frame, the gas supply device and the heating device are arranged in the reaction chamber; the bottom of the fixed seat is fixed on the bottom wall of the furnace body; the workpiece placing rack is detachably connected to the fixing seat, and the workpiece placing rack is provided with a plurality of layers of workpiece placing surfaces along the vertical direction. The chemical vapor deposition equipment with multilayer work piece placing surface that this application embodiment provided is equipped with the work piece rack in its reaction chamber, and the work piece rack has multilayer work piece placing surface along vertical direction, and the homoenergetic placed the work piece on every layer of work piece placing surface to can increase the area of placing the work piece, increase the quantity that holds the work piece in the vapor deposition stove, improve the production efficiency of vapor deposition stove.
Description
Technical Field
The utility model belongs to the technical field of vapor deposition furnaces, and particularly relates to chemical vapor deposition equipment with a multilayer workpiece placing surface.
Background
The carbon-carbon composite material is a high-performance composite material of a carbon fiber reinforced carbon matrix, has the characteristics of high strength, corrosion resistance, strong designability and the like, is widely applied to the fields of spaceflight, aviation, traffic and the like, and has higher requirements on the quality of carbon-carbon composite material products along with the development of society and the progress of science and technology.
Chemical vapor deposition is a process for producing solid deposits by chemical reaction of gaseous substances on a solid surface, which comprises three general steps: (1) forming a volatile substance; (2) transferring said substance to a deposition area; (3) a chemical reaction occurs on the solid and a solid mass is produced. Chemical vapor deposition is a process widely used to produce carbon-carbon composites. The existing vapor deposition furnace is generally provided with a workpiece placing table, workpieces are placed on the workpiece placing table, carbon source gas is introduced into the deposition furnace through a gas inlet pipe at the bottom of the vapor deposition furnace, the carbon source gas is directly introduced into the furnace body at a certain flow and flow rate, and matrix carbon is formed after pyrolysis and deposited in the inner part or the surface of the workpieces.
However, the workpiece placing table of the conventional vapor deposition furnace has only one layer of workpiece placing surface, and the area for placing the workpieces is small, so that the number of the workpieces contained in the vapor deposition furnace is small, and the production efficiency of the vapor deposition furnace is low.
SUMMERY OF THE UTILITY MODEL
In order to solve the problems in the prior art, the utility model provides the chemical vapor deposition equipment with the multilayer workpiece placing surfaces, which has the multilayer workpiece placing surfaces, can increase the area for placing the workpieces, increase the number of the workpieces contained in the vapor deposition furnace and improve the production efficiency of the vapor deposition furnace.
The chemical vapor deposition equipment with the multilayer workpiece placing surfaces comprises a furnace body, a fixed seat, a workpiece placing rack, a heating device and a gas supply device, wherein a reaction chamber is arranged in the furnace body, and the workpiece placing rack, the gas supply device and the heating device are arranged in the reaction chamber;
the bottom of the fixed seat is fixed on the bottom wall of the furnace body; the workpiece placing rack is detachably connected to the fixing seat, and the workpiece placing rack is provided with a plurality of layers of workpiece placing surfaces along the vertical direction.
The chemical vapor deposition equipment with multilayer work piece placing surface that this application embodiment provided is equipped with the work piece rack in its reaction chamber, and the work piece rack has multilayer work piece placing surface along vertical direction, and the homoenergetic placed the work piece on every layer of work piece placing surface to can increase the area of placing the work piece, increase the quantity that holds the work piece in the vapor deposition stove, improve the production efficiency of vapor deposition stove.
As a realizable way, the chemical vapor deposition device with the multilayer workpiece placing surface of the embodiment of the application comprises a plurality of unit brackets which are vertically arranged;
the unit bracket comprises a workpiece placing disc, a first shaft sleeve and an inserting shaft, wherein the first shaft sleeve and the inserting shaft are respectively arranged on the upper end surface and the lower end surface of the workpiece placing disc;
the insertion shafts of the unit supports positioned at the lowest side of the plurality of unit supports are inserted into the fixed seat, and the insertion shafts of the rest of the unit supports in the plurality of unit supports are sequentially inserted into the first shaft sleeves of the unit supports positioned at the lower side of the unit supports;
the upper end surfaces of the placing discs of the unit brackets respectively form the workpiece placing surfaces of all layers.
Like this, the work piece rack is formed by including the concatenation of a plurality of unit supports, can be according to the use amount of adjustment unit supports such as work piece quantity, reaction chamber capacity to rationally be used for the interior space of reaction chamber, thereby increase the quantity that holds the work piece in the vapor deposition stove, further improve the production efficiency of vapor deposition stove. And the unit supports can be placed in or taken out one by one, so that the workpieces can be conveniently taken and placed.
As a realizable manner, in the cvd apparatus having a multi-layered workpiece placement surface according to the embodiment of the present application, the upper end of the fixing base is provided with a second shaft sleeve in which the insertion shaft of the unit holder located at the lowermost side among the plurality of unit holders is inserted.
Correspondingly, the upper end of the fixing seat is provided with a second shaft sleeve, and the unit support at the lowest side is installed by inserting the insertion shaft into the second shaft sleeve so as to be convenient for installing and dismantling the workpiece placing frame.
In an implementation manner, in the cvd apparatus having a plurality of workpiece-placing surfaces according to the embodiment of the present application, the workpiece-placing tray is provided with a plurality of workpiece positioning slots on an upper end surface thereof, and the plurality of workpiece positioning slots are distributed around the first sleeve.
Like this, carry on spacingly in putting the work piece constant head tank with the work piece, prevent when putting into reaction chamber or taking out by reaction chamber with the unit support, the work piece that places on the dish is placed to the work piece slides, makes the work piece place more stably.
In a manner that can be achieved, the chemical vapor deposition apparatus having a multi-layer workpiece placing surface according to the embodiment of the present application, wherein the heating device includes a plurality of heaters provided on an inner sidewall of the furnace body, and at least one of the heaters is provided above the workpiece placing tray of each of the unit holders.
Therefore, the workpieces placed on each unit support can be uniformly heated, and the processing quality of the workpieces is guaranteed.
As an achievable mode, the chemical vapor deposition apparatus with a multilayer workpiece placing surface of the embodiment of the present application, the gas supply device includes a gas supply pipe, one end of the gas supply pipe is located in the reaction chamber, the other end of the gas supply pipe is extended from the bottom wall of the furnace body to the outside of the reaction chamber, and the gas supply pipe is vertically disposed.
The gas supply pipe is communicated with a conveying device of the carbon source gas, and the carbon source gas is conveyed into the reaction chamber.
In an implementation manner, the gas supply pipe is provided in a plurality, and the gas supply pipe is arranged around the workpiece placing table at intervals.
Thus, the gas supply pipe can uniformly release the carbon source gas in the circumferential direction of the workpiece placing table, so that the carbon source gas is more uniformly distributed.
As an achievable way, the chemical vapor deposition apparatus with multiple layers of workpiece placement surfaces according to the embodiment of the present application, the top of the furnace body is provided with a furnace opening communicated with the reaction chamber, the furnace opening is provided with a furnace cover, and the furnace cover is used for opening and closing an opening communicated with the reaction chamber.
As an achievable mode, the chemical vapor deposition apparatus with the multiple layers of workpiece placing surfaces in the embodiment of the present application is provided with the exhaust pipe on the furnace cover, the exhaust pipe is communicated with the reaction chamber, and the exhaust pipe is used for discharging waste gas or residual gas generated in the reaction chamber.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic structural diagram of a chemical vapor deposition apparatus having a multi-layer workpiece placement surface according to an embodiment of the present disclosure;
FIG. 2 is a sectional view of a unit holder in a chemical vapor deposition apparatus having a multi-layered workpiece placement surface according to an embodiment of the present application;
FIG. 3 is a top view of a unit support in a chemical vapor deposition apparatus having a multi-layered workpiece placement surface according to an embodiment of the present disclosure.
Description of reference numerals:
1-furnace body; 11-a reaction chamber; 2-furnace cover; 3-fixing the base; 31-a second bushing; 4-a heater; 5-a gas supply pipe; 6-unit scaffold; 61-workpiece placing tray; 611-workpiece positioning grooves; 62-a first sleeve; 63-inserting the shaft; 7-an exhaust pipe; 8-workpiece.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1 to 3, the chemical vapor deposition apparatus with a multilayer workpiece 8 placement surface provided in the embodiment of the present application includes a furnace body 1, a fixing seat 3, a workpiece placement rack, a heating device, and a gas supply device, wherein a reaction chamber 11 is provided in the furnace body 1, and the workpiece placement rack, the gas supply device, and the heating device are provided in the reaction chamber 11;
the bottom of the fixed seat 3 is fixed on the bottom wall of the furnace body 1; the workpiece placing rack is detachably connected to the fixing seat 3, and the workpiece placing rack is provided with a plurality of layers of workpiece 8 placing surfaces in the vertical direction.
The chemical vapor deposition equipment with multilayer work piece 8 places face that this application embodiment provided is equipped with the work piece rack in its reaction chamber 11, and the work piece rack has multilayer work piece 8 along vertical direction and places the face, and every layer of work piece 8 is placed the homoenergetic and is placed work piece 8 on the face to can increase the area of placing work piece 8, increase the quantity that holds work piece 8 in the vapor deposition stove, improve the production efficiency of vapor deposition stove.
In the embodiment of the application, the workpiece placing rack comprises a plurality of unit brackets 6 which are vertically arranged;
the unit bracket 6 comprises a workpiece placing disc 61, a first shaft sleeve 62 and an inserting shaft 63 which are respectively arranged on the upper end surface and the lower end surface of the workpiece placing disc 61;
the insertion shafts 63 of the lowermost unit brackets 6 among the plurality of unit brackets 6 are inserted into the fixed base 3, and the insertion shafts 63 of the remaining unit brackets 6 among the plurality of unit brackets 6 are sequentially inserted into the first shaft sleeves 62 of the unit brackets 6 adjacent to the lower side thereof;
the upper end faces of the placing trays of the respective unit frames 6 form placing faces for the respective layers of workpieces 8.
Like this, the work piece rack is formed by including the concatenation of a plurality of unit support 6, can be according to the use amount of adjustment unit support 6 such as 8 quantity of work pieces, 11 capacities of reaction chamber to the space in the reaction chamber 11 that rationally is used for, thereby increase the quantity that holds work piece 8 in the vapor deposition stove, further improve the production efficiency of vapor deposition stove. And the unit supports 6 can be placed in or taken out one by one, so that the workpieces 8 can be conveniently taken and placed.
In the embodiment of the present application, the upper end of the fixed base 3 is provided with the second bushing 31, and the insertion shaft 63 of the unit bracket 6 located at the lowermost side among the plurality of unit brackets 6 is inserted into the second bushing 31.
Correspondingly, the upper end of the fixed seat 3 is provided with a second shaft sleeve 31, and the unit bracket 6 at the lowest side is installed by inserting the inserting shaft 63 into the second shaft sleeve 31, so that the workpiece placing frame can be conveniently installed and dismantled.
In the embodiment of the present application, the upper end surface of the workpiece placing tray 61 is provided with a plurality of workpiece positioning grooves 611, and the plurality of workpiece positioning grooves 611 are distributed around the first shaft sleeve 62.
In this way, by placing the workpiece 8 in the workpiece positioning groove 611 for positioning, the workpiece 8 placed on the workpiece placing tray 61 is prevented from sliding when the unit bracket 6 is placed in the reaction chamber 11 or taken out from the reaction chamber 11, so that the placement of the workpiece 8 is more stable.
In the embodiment of the present application, the heating device includes a plurality of heaters 4 provided on the inner side wall of the furnace body 1, and at least one heater 4 is provided above the workpiece placing tray 61 of each unit support 6.
Therefore, the workpieces 8 placed on each unit support 6 can be uniformly heated, and the processing quality of the workpieces 8 is guaranteed.
In the embodiment of the present application, the gas supply device includes the gas supply pipe 5, one end of the gas supply pipe 5 is located in the reaction chamber 11, the other end of the gas supply pipe 5 is extended out of the reaction chamber 11 from the bottom wall of the furnace body 1, and the gas supply pipe 5 is vertically disposed.
The gas supply pipe 5 is connected to a carbon source gas supply device for supplying the carbon source gas into the reaction chamber 11.
In the embodiment of the present application, the number of the gas supply pipes 5 is plural, and the plural gas supply pipes 5 are disposed at intervals around the workpiece 8 placing table.
Thus, the gas supply pipe 5 can uniformly release the carbon source gas from the circumferential direction of the workpiece 8 placing table, making the carbon source gas distribution more uniform.
In the embodiment of the application, the top of the furnace body 1 is provided with a furnace opening communicated with the reaction chamber 11, the furnace opening is provided with a furnace cover 2, and the furnace cover 2 is used for opening and closing an opening communicated with the reaction chamber 11.
In the embodiment of the present application, an exhaust pipe 7 is disposed on the furnace cover 2, the exhaust pipe 7 is communicated with the reaction chamber 11, and the exhaust pipe 7 is used for discharging waste gas or residual gas generated in the reaction chamber 11.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the utility model has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.
Claims (9)
1. The chemical vapor deposition equipment with the multilayer workpiece placing surfaces is characterized by comprising a furnace body, a fixed seat, a workpiece placing rack, a heating device and a gas supply device, wherein a reaction chamber is arranged in the furnace body, and the workpiece placing rack, the gas supply device and the heating device are arranged in the reaction chamber;
the bottom of the fixed seat is fixed on the bottom wall of the furnace body; the workpiece placing rack is detachably connected to the fixing seat, and the workpiece placing rack is provided with a plurality of layers of workpiece placing surfaces along the vertical direction.
2. The chemical vapor deposition apparatus having a multilayer workpiece placement surface according to claim 1, wherein the workpiece placement frame comprises a plurality of unit supports arranged vertically;
the unit bracket comprises a workpiece placing disc, a first shaft sleeve and an inserting shaft, wherein the first shaft sleeve and the inserting shaft are respectively arranged on the upper end surface and the lower end surface of the workpiece placing disc;
the insertion shafts of the unit supports positioned at the lowest side of the plurality of unit supports are inserted into the fixed seat, and the insertion shafts of the rest of the unit supports in the plurality of unit supports are sequentially inserted into the first shaft sleeves of the unit supports positioned at the lower side of the unit supports;
the upper end surfaces of the placing discs of the unit brackets respectively form the workpiece placing surfaces of all layers.
3. The chemical vapor deposition apparatus having a multilayer work placing surface as claimed in claim 2, wherein the upper end of the holder is provided with a second shaft housing in which the insertion shaft of the unit bracket positioned at the lowermost side among the plurality of unit brackets is inserted.
4. The chemical vapor deposition apparatus having a plurality of layers of workpiece-placing surfaces according to claim 2, wherein the upper end surface of the workpiece-placing tray is provided with a plurality of workpiece positioning grooves distributed around the first sleeve.
5. The chemical vapor deposition apparatus having a plurality of layers of workpiece-placing surfaces according to any one of claims 2 to 4, wherein the heating means includes a plurality of heaters provided on an inner side wall of the furnace body, at least one of the heaters being provided above the workpiece-placing tray of each of the unit holders.
6. The chemical vapor deposition apparatus having a plurality of stages of workpiece-placing surfaces as claimed in any one of claims 2 to 4, wherein the gas supply means includes a gas supply tube, one end of the gas supply tube is located in the reaction chamber, the other end of the gas supply tube protrudes from the bottom wall of the furnace body to the outside of the reaction chamber, and the gas supply tube is vertically arranged.
7. The chemical vapor deposition apparatus having multiple stages of workpiece mounting surfaces as claimed in claim 6, wherein the gas supply pipe is plural in number, and the plural gas supply pipes are arranged at intervals around the workpiece mounting table.
8. A chemical vapor deposition apparatus having a plurality of stages of work placing surfaces as set forth in any one of claims 2 to 4, wherein a top of the furnace body is provided with a furnace opening communicating with the reaction chamber, and the furnace opening is provided with a furnace cover.
9. The chemical vapor deposition apparatus having a plurality of stages of workpiece placement surfaces as set forth in claim 8, wherein an exhaust pipe is provided on the furnace cover, the exhaust pipe communicating with the reaction chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122832674.6U CN216337939U (en) | 2021-11-18 | 2021-11-18 | Chemical vapor deposition equipment with multilayer workpiece placing surface |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122832674.6U CN216337939U (en) | 2021-11-18 | 2021-11-18 | Chemical vapor deposition equipment with multilayer workpiece placing surface |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216337939U true CN216337939U (en) | 2022-04-19 |
Family
ID=81149076
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122832674.6U Active CN216337939U (en) | 2021-11-18 | 2021-11-18 | Chemical vapor deposition equipment with multilayer workpiece placing surface |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216337939U (en) |
-
2021
- 2021-11-18 CN CN202122832674.6U patent/CN216337939U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1501963B1 (en) | Cvi furnace with gas preheater | |
| JP3759166B2 (en) | Equipment for use in CVI / CVD processes | |
| US7959973B2 (en) | Pressure swing CVI/CVD | |
| EP1718783B1 (en) | Pressure gradient cvi/cvd apparatus and method | |
| US9845534B2 (en) | CVI densification installation including a high capacity preheating zone | |
| CN113999033A (en) | CVD system and method for preparing large-size carbon/carbon composite material | |
| CN109503188B (en) | CVI (chemical vapor infiltration) process method for preparing carbon/carbon crucible based on flow field optimization | |
| EP1452624B1 (en) | Process and apparatus for batch and continuous densification by chemical vapor infiltration (CVI) | |
| CN1949458A (en) | Reaction chamber with opposing pockets for gas injection and exhaust | |
| MX2014003617A (en) | Loading device for densification via chemical infiltration in steam phase in directed flow of three-dimensional porous substrates. | |
| CN216337939U (en) | Chemical vapor deposition equipment with multilayer workpiece placing surface | |
| CN217127529U (en) | Chemical vapor deposition furnace, system and furnace charging structure for chemical vapor deposition | |
| US20070014990A1 (en) | Support structure for radiative heat transfer | |
| US8847128B2 (en) | Heat treatment oven with inductive heating | |
| CN102212800B (en) | Multi-stock-column type industrial furnace for chemical vapour infiltration densification | |
| CN110923671A (en) | Chemical vapor infiltration furnace material rack | |
| US6432477B1 (en) | Densification of porous bodies | |
| CN202323016U (en) | Large-scale annular vapor deposition furnace | |
| CN216337948U (en) | Vapor deposition furnace that machining efficiency is high | |
| CN220952046U (en) | Cushion block and deposition furnace with same | |
| CN215757612U (en) | Distributed heating system of vertical large-scale chemical vapor deposition furnace | |
| CN217202949U (en) | Gas distribution device for vacuum chemical vapor deposition furnace | |
| KR102063219B1 (en) | Chemical vapor infiltration device | |
| JP3917654B6 (en) | Equipment for growing thin films | |
| JP3917654B2 (en) | Equipment for growing thin films |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |