CN216285088U - Analysis device for impurities in high-purity fluorine gas - Google Patents
Analysis device for impurities in high-purity fluorine gas Download PDFInfo
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Abstract
The utility model provides an analysis device for impurities in high-purity fluorine gas, which comprises a sample injection unit, an adsorption unit, a valve switching unit, a chromatographic column, a detector and carrier gas, wherein the valve switching unit comprises a first switching valve, a second switching valve, a third switching valve, a fourth switching valve, a fifth switching valve and a sixth switching valve, and a plurality of connecting ports are arranged on the six switching valves; the adsorption unit comprises four adsorption columns, an adsorption column and a chromatographic column are arranged between connectors of the switching valve, and carrier gas is introduced into the switching valve; the detector is arranged on a connecting port of the sixth switching valve, and the first switching valve is also provided with a sample inlet and a sample outlet. The utility model has simple structure and simple and convenient operation, and reduces the corrosion of fluorine gas to the pipeline by adopting the nickel pipeline; the chromatographic system adopts a high-sensitivity pulse helium ionization detector, so that the detection precision is higher.
Description
Technical Field
The utility model belongs to the technical field of analysis of trace inorganic impurities in high-purity fluorine, and particularly relates to an analysis device for impurities in high-purity fluorine gas.
Background
High-purity fluorine gas is a gas with very active properties, has strong oxidizing property, can react with most inorganic or organic substances at room temperature or below, releases more heat, and often causes combustion and explosion. High-purity fluorine gas is an important raw material in the field of fine chemical engineering, and is widely applied to the fields of electronics, laser technology, medical plastics and the like; because of its strong oxidizing property, it can be used for glass etching, surface passivation treatment of metal material and pipeline, and can be used for making rocket propellant in national defence; the high-purity fluorine gas is also used in the fields of electronics, medicine, health, scientific research and the like; sulfur hexafluoride and carbon tetrafluoride, which are generated by the reaction of fluorine gas with sulfur and carbon, are good electrical insulation and arc extinguishing materials. Numerous scholars propose and utilize F2As cleaning agent for CVD reaction chamber, with NF3In contrast, F2Has stronger reactivity and does not cause greenhouse effect, and has great market potential in the field of semiconductors. Synthesis of fluorine and chlorineThe fluorinated chlorine can be used as a strong pilot agent, can also be used as a rocket propellant, and can also be used as a catalyst for manufacturing aviation gasoline.
With the development of semiconductors, the purity of fluorine gas is required to be higher and higher. However, the relevant standard of high-purity fluorine gas is not established in China, the concentration of each component of the lowest detection concentration of the existing fluorine gas detection method is only 10ppm, and the quality of the fluorine gas is unstable due to the defect of the detection method for impurities with lower concentration, so that the requirement cannot be met. Therefore, it is significant to design an apparatus capable of realizing the complete analysis of the impurities in the fluorine gas.
SUMMERY OF THE UTILITY MODEL
The technical problem to be solved by the present invention is to provide an analysis device for impurities in high purity fluorine gas, which can accurately analyze the impurities in the high purity fluorine gas, and at the same time, adopts a high-sensitivity pulse helium ionization detector, so that the detection precision is higher.
In order to solve the technical problems, the utility model adopts the technical scheme that: an analysis device for impurities in high-purity fluorine gas comprises a sample introduction unit, an adsorption unit, a valve switching unit, a chromatographic column, a detector and a carrier gas, the valve switching unit includes a first switching valve, a second switching valve, a third switching valve, a fourth switching valve, a fifth switching valve, and a sixth switching valve, the first switching valve, the second switching valve and the third switching valve are all provided with 10 connecting ports, the fourth switching valve and the fifth switching valve are all provided with 8 connecting ports, the sixth switching valve is provided with 6 connecting ports, the 10 connecting ports are respectively marked as a first port, a second port, a third port, a fourth port, a fifth port, a sixth port, a seventh port, a ninth port and a tenth port, the 8 connectors are marked as a first opening, a second opening-a eighth opening respectively, and the 6 connectors are marked as a first opening, a second opening-a sixth opening respectively; the adsorption unit comprises a first adsorption column, a second adsorption column, a third adsorption column and a fourth adsorption column, the first adsorption column is connected between a No. port and a No. port of the second switching valve, the second adsorption column is connected between a No. port and a No. port of the second switching valve, the third adsorption column is connected between a No. port and a No. port of the third switching valve, and the fourth adsorption column is connected between a No. port and a No. port of the third switching valve; the chromatographic column comprises a first chromatographic column, a second chromatographic column, a third chromatographic column and a fourth chromatographic column, the first chromatographic column is connected between a port IV and a port IV of the fourth switching valve, the port III of the fourth switching valve is connected with a port IV of the sixth switching valve through the second chromatographic column, the third chromatographic column is connected between the port IV and the port IV of the fifth switching valve, and the port III of the fifth switching valve is connected with the port IV of the sixth switching valve through the fourth chromatographic column; the detector is arranged on the sixth switching valve, and carrier gas is introduced into the first switching valve, the second switching valve, the third switching valve, the fourth switching valve and the fifth switching valve; the sample introduction unit comprises a sample inlet, and the first switching valve is provided with the sample inlet.
Preferably, the detector is a pulse helium ionization detector, and a sample outlet is also connected to the first switching valve.
Preferably, the carrier gas includes a first carrier gas, a second carrier gas, a third carrier gas, a fourth carrier gas, a fifth carrier gas, a sixth carrier gas, a seventh carrier gas, a ninth carrier gas, and a tenth carrier gas.
Preferably, the second carrier gas path is connected with a ninu port of the first switching valve, the third carrier gas path is connected with a fifu port of the first switching valve, a first quantitative pipe is connected between an r port and a c port of the first switching valve, a second quantitative pipe is connected between the c port and the c port of the first switching valve, the sample inlet is connected with the c port of the first switching valve, the sample outlet is connected with the c port of the first switching valve, the c port of the first switching valve is connected with the c port of the second switching valve through a pipeline, and the c port of the first switching valve is connected with the c port of the third switching valve through a pipeline.
Preferably, the first carrier gas path is connected to an aperture r of the second switching valve, the fourth carrier gas path is connected to an aperture c of the second switching valve, both the aperture c and the aperture c of the second switching valve are connected to a vent pipe, and the aperture c of the second switching valve is connected to the aperture c of the fourth switching valve through a pipe.
Preferably, the fifth carrier gas is connected with a port # of the third switching valve, the sixth carrier gas path is connected with a port # of the third switching valve, the port # and the port # of the third switching valve are connected with a vent pipe, and the port # of the third switching valve is connected with the port # of the fifth switching valve through a pipe.
Preferably, the seventh carrier gas path is connected with the port # fifthly of the fourth switching valve, the eighth carrier gas path is connected with the port # ② of the fourth switching valve, and the port # sixthly of the fourth switching valve are connected with a vent pipe.
Preferably, the ninth carrier gas path is connected with the second port of the fifth switching valve, the tenth carrier gas path is connected with the fifth port of the fifth switching valve, and the first port and the sixth port of the fifth switching valve are connected with a vent pipe; the interface of the sixth switching valve is connected with a pulse helium ionization detector, the port of the sixth switching valve, the port of the third switching valve, the port of the fifth switching valve are connected with a vent pipeline, and the port of the sixth switching valve, the port of the fourth switching valve is vented.
Preferably, the pipeline is a nickel pipe subjected to fluorine gas passivation treatment; the first and third chromatographic columns were 5m 10% keloil10# chromosorb T chromatographic column, the second chromatographic column was 4m Haysep DB chromatographic column and the fourth chromatographic column was 2m 5A molecular sieve chromatographic column.
Compared with the prior art, the utility model has the following advantages:
1. the utility model analyzes the impurities in the high-purity fluorine gas by the arranged sample injection unit, the adsorption unit, the valve switching unit, the chromatographic column, the detector and the carrier gas, wherein the valve switching unit comprises a first switching valve, a second switching valve, a third switching valve, a fourth switching valve, a fifth switching valve and a sixth switching valve, the adsorption unit comprises a first adsorption column, a second adsorption column, a third adsorption column and a fourth adsorption column, the chromatographic column comprises a first chromatographic column, a second chromatographic column, a third chromatographic column and a fourth chromatographic column, and the impurities in the high-purity fluorine gas can be comprehensively analyzed and detected by the six switching valves, the four adsorption columns and the four chromatographic columns, so that the total analysis of the impurities in the fluorine gas is basically realized.
2. The utility model reduces the corrosion of fluorine gas to the pipeline by adopting the nickel pipeline; the chromatographic system adopts a high-sensitivity pulse helium ionization detector, so that the detection precision is higher.
3. Reversible composite adsorbents KF and KNiF are adopted in the adsorption column in the utility model, and HF and F are adsorbed at 50 DEG C2After the adsorbent is saturated, the desorption can be carried out by heating to separate HF and F2Releasing the adsorbent and realizing long-term use of detection.
4. The utility model can prolong the service life of the instrument, improve the detection limit and accuracy of low-concentration impurities and improve the analysis precision by the anti-corrosion nickel pipeline and the anti-adsorption system.
The present invention will be described in further detail with reference to the accompanying drawings and examples.
Drawings
Fig. 1 is a schematic structural view of the present invention.
Description of reference numerals:
101 — a first switching valve; 102-a first dosing tube; 103-a second dosing tube; 104 — sample inlet; 105 — a sample outlet; 201-second switching valve; 202-first adsorption column; 203-a second adsorption column; 301-third switching valve; 302-third adsorption column; 303-fourth adsorption column; 401 — fourth switching valve; 402 — a second chromatography column; 403 — a first chromatography column; 501-a fifth switching valve; 502 — a third chromatography column; 503 — a fourth chromatography column; 601-sixth switching valve; 702-a helium ionization detector; 801 — a first carrier gas; 802 — a second carrier gas; 803 — third carrier gas; 804 — a fourth carrier gas; 805-fifth carrier gas; 806 — a sixth carrier gas; 807-a seventh carrier gas; 808-an eighth carrier gas; 809 — a ninth carrier gas; 810 — tenth carrier gas.
Detailed Description
As shown in figure 1, the utility model comprises a sample introduction unit, an adsorption unit, a valve switching unit, a chromatographic column, a detector and a carrier gas, wherein the valve switching unit is used for switching the valveThe switching unit comprises a first switching valve V1101, a second switching valve V2201, a third switching valve V3301, a fourth switching valve V4401, a fifth switching valve V5501 and a sixth switching valve V6601, wherein the first switching valve V1101, the second switching valve V2201 and the third switching valve V3301 are respectively provided with 10 connecting ports, the fourth switching valve V4401 and the fifth switching valve V5501 are respectively provided with 8 connecting ports, the sixth switching valve V6601 is provided with 6 connecting ports, the 10 connecting ports are respectively marked as ports (i), (ii), third (iii), 3, 5, 9, 2, 7 and (0), the 8 connecting ports are respectively marked as ports (ii 0, connecting ports (1-iii) 2, and the 6 connecting ports are respectively marked as ports (ii 3, 4-iii) 7; the adsorption unit comprises a first adsorption column 202, a second adsorption column 203, a third adsorption column 302 and a fourth adsorption column 303, the first adsorption column 202 is connected between a port No. 6 and a port No. 5 of the second switching valve V2201, the second adsorption column 203 is connected between a port No. 4 and a port No. 5 of the second switching valve V2201, the third adsorption column 302 is connected between a port No. c and a port No. 1 of the third switching valve V3301, and the fourth adsorption column 303 is connected between a port No. b and a port No. c of the third switching valve V3301; the chromatographic column comprises a first chromatographic column 403, a second chromatographic column 402, a third chromatographic column 502 and a fourth chromatographic column 503, the first chromatographic column 403 is connected between a port No. 8 and a port No. 9 of the fourth switching valve V4401, a port No. 6 of the fourth switching valve V4401 is connected with a port No. sixty (sixth) of the sixth switching valve V6601 through the second chromatographic column 402, the third chromatographic column 502 is connected between a port No. 4 and a port No. seventy (seventh) of the fifth switching valve V5501, and a port No. 0 of the fifth switching valve V5501 is connected with a port No. 1 of the sixth switching valve V6601 through the fourth chromatographic column 503; the detector is arranged on the sixth switching valve V6601, and carrier gas is introduced into the first switching valve V1101, the second switching valve V2201, the third switching valve V3301, the fourth switching valve V4401 and the fifth switching valve V5501; the sample introduction unit comprises a sample inlet 104, and the first switching valve V1101 is provided with the sample inlet 104. The sample can enter the first switching valve V1101 from the sample inlet 104, and the first adsorption column 202 and the third adsorption column 302 can absorb HF and F in the sample2Adsorption, non-adsorption to remove HF and F2Other impurity gases than the gas mixture of the gas mixture,passing the contaminant gas into a chromatographic column; the first chromatographic column 403 can pre-separate H from inorganic components in the sample2、O2、N2CO and CH4The gas is first passed into the second chromatography column 402; the third chromatographic column 502 can pre-separate H from inorganic components in the sample2、O2、N2、CO、CH4、CO2、N2O and SF6The gas is first introduced into the fourth column 503. The carrier gas can carry the sample into the chromatographic column and the pulsed helium ionization detector 702 for separation and detection; at the same time, it also has the function of protecting the chromatographic column and the pulsed helium ionization detector 702.
In this embodiment, the detector is a pulsed helium ionization detector 702, and the first switching valve V1101 is also connected to the sample outlet 105.
In the present embodiment, the carrier gases include a first carrier gas 801, a second carrier gas 802, a third carrier gas 803, a fourth carrier gas 804, a fifth carrier gas 805, a sixth carrier gas 806, a seventh carrier gas 807, a ninth carrier gas 809, and a tenth carrier gas 810.
In this embodiment, the second carrier gas 802 is connected to a ninthly port of the first switching valve V1101, the third carrier gas 803 is connected to a fifthly port of the first switching valve V1101, a first quantitative tube 102 is connected between an r port and an r port of the first switching valve V1101, a second quantitative tube 103 is connected between a c port and an h port of the first switching valve V1101, the sample inlet 104 is connected to a c port of the first switching valve V1101, the sample outlet 105 is connected to a c port of the first switching valve V1101, the d port of the first switching valve V1101 is connected to a ninthly port of the second switching valve V2201 through a pipe, and the r port of the first switching valve V1101 is connected to a ninthly port of the third switching valve V3301 through a pipe.
In this embodiment, the first carrier gas 801 gas path is connected to an aperture r of the second switching valve V2201, the fourth carrier gas 804 gas path is connected to an aperture # of the second switching valve V2201, both the first and fifth apertures of the second switching valve V2201 are connected to a vent pipe, and the third aperture of the second switching valve V2201 is connected to the eighth aperture of the fourth switching valve V4401 through a pipe.
In this embodiment, the fifth carrier gas 805 is connected to a port # of the third switching valve V3301, the sixth carrier gas 806 gas path is connected to a port # of the third switching valve V3301, the port # and the port # of the third switching valve V3301 are connected to a vent pipe, and the port # of the third switching valve V3301 is connected to the port # of the fifth switching valve V5501 through a pipe.
In this embodiment, the seventh carrier gas 807 gas path is connected to the port # c of the fourth switching valve V4401, the eighth carrier gas 808 gas path is connected to the port # c of the fourth switching valve V4401, and the port # c of the fourth switching valve V4401 are connected to the vent pipe.
In this embodiment, the ninth carrier gas 809 gas path is connected to the No. two ports of the fifth switching valve V5501, the tenth carrier gas 810 gas path is connected to the No. five port of the fifth switching valve V5501, and the No. two ports of the fifth switching valve V5501 are connected to a vent pipe; the interface of the sixth switching valve V6601 is connected with a pulse helium ionization detector 702, the ports III and IV of the sixth switching valve V6601 are connected with a vent pipeline, and the port IV of the sixth switching valve V6601 is vented.
In this embodiment, the pipeline is a nickel pipe passivated by a fluorine gas, the first chromatographic column 403 and the third chromatographic column 502 are 5m 10% keloil10# chromosorb T chromatographic columns, the second chromatographic column 402 is a 4m Haysep DB chromatographic column, the fourth chromatographic column 503 is a 2m 5A molecular sieve chromatographic column, and the adsorbent filled in the first adsorption column 202, the second adsorption column 203, the third adsorption column 302 and the fourth adsorption column 303 is KNiF.
In this example, the sample was high purity fluorine gas.
The process of using the apparatus for analyzing impurities in high-purity fluorine gas of the present embodiment includes the steps of:
a high-purity fluorine gas sample enters a first switching valve V1101 through a sample inlet 104, the first switching valve V1101 is switched, the high-purity fluorine gas sample enters a first quantitative pipe 102 and a second quantitative pipe 103, and if the introduced high-purity fluorine gas sample is excessive, the high-purity fluorine gas sample can be discharged from a sample outlet 105;
the third carrier gas 803 carries the high purity fluorine gas sample in the second quantitative tube 103 through the port # r of the first switching valve V1101, enters the second switching valve V2201 through the port # r of the second switching valve V2201, then enters the first adsorption column 202 through the port # r to the port # nint of the second switching valve V2201, passes through the first adsorption column 202, then enters the port # b to the port # iii of the second switching valve V2201, then enters the port # viii of the fourth switching valve V4401, then switches the fourth switching valve V4401, so that the high purity fluorine gas sample enters the port # b from the port # nint of the fourth switching valve V4401, then enters the first chromatographic column 403, and the inorganic component in the high purity fluorine gas sample is separated into H in the first chromatographic column 4032、O2、N2CO and CH4A gas, such that said gas first enters the second chromatography column (402); the second carrier gas 802 carries the high purity fluorine gas sample in the first quantitative tube 102 through the thirteen port of the first switching valve V1101, enters the thirteen port of the third switching valve V3301, enters the third switching valve V3301, switches the third switching valve V3301, causes the high purity fluorine gas sample to enter the thirteen port of the third switching valve V3301 from the ninthl port of the third switching valve V3301, further passes through the third adsorption column 302, then enters the thirteen port of the third switching valve V3301, further enters the thirteen port of the fifth switching valve V5501 from the fourteen port of the third switching valve V3301, further switches the fifth switching valve V5501, causes the high purity fluorine gas sample to enter the thirteen port of the fifth switching valve V5501 from the thirteen port of the fifth switching valve V5501, further passes through the third chromatography column 502, and the inorganic components in the high purity fluorine gas sample are separated in the tristimulus column 502 to obtain H2、O2、N2、CO、CH4、CO2、N2O and SF6The gas is introduced into the fourth column 503. After the sample injection, the first switching valve V1101 is returned to the initial position.
H in the second column 4022、O2、N2CO and CH4Gas, switching the fourth switch valve V4401, and back-blowing H2、O2、N2CO and CH4Gas, H2、O2、N2CO and CH4The gas is separated into the pulsed helium ion detector 702 by the second chromatography column 402; h in the fourth column 5032、O2、N2、CO、CH4、CF4、CO2、N2O and SF6Impurity gas, switch over the fifth diverter valve V5501, blow back the above-mentioned impurity gas, the above-mentioned impurity gas enters the No. two ports of the sixth diverter valve V6601 through the fourth chromatographic column 503;
after the gas in the second column 402 enters the pulsed helium ion detector 702, the sixth switching valve V6601 is switched, and after the gas in the fourth column 503 enters the pulsed helium ion detector 702, the sixth switching valve V6601 is reset, and the analysis is completed.
If the first adsorption column 202 is saturated, the second switching valve V2201 can be switched to adsorb HF and F by using the second adsorption column 2032And simultaneously, the desorption of the first adsorption column 202 can be heated, and the desorption is completed and the temperature is reduced for standby.
Similarly, if the third adsorption column 302 is saturated, the third switching valve V3201 may be switched to adsorb HF and F using the fourth adsorption column 3032And simultaneously heating and desorbing the third adsorption column 302, and cooling after the desorption is completed for standby.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the present invention in any way. Any simple modifications, alterations and equivalent changes made to the above embodiments according to the technical essence of the present invention are still within the scope of the technical solution of the present invention.
Claims (9)
1. The device for analyzing the impurities in the high-purity fluorine gas is characterized by comprising a sample injection unit, an adsorption unit, a valve switching unit, a chromatographic column, a detector and a carrier gas, wherein the valve switching unit comprises a first switching valve (101), a second switching valve (201), a third switching valve (301), a fourth switching valve (401), a fifth switching valve (501) and a sixth switching valve (601), the first switching valve (101), the second switching valve (201) and the third switching valve (301) are respectively provided with 10 connecting ports, the fourth switching valve (401) and the fifth switching valve (501) are respectively provided with 8 connecting ports, the sixth switching valve (601) is provided with 6 connecting ports, the 10 connecting ports are respectively marked as a (first) port, a (second) port, a (third) port, a (fourth) port, a (fifth) port, a (sixth) port, a seventh port, a ninth port and a ninth port, and the 8 connecting ports are respectively marked as a (first) port, a third port, a ninth port, a seventh port, a sixth port, a third port, a fourth port, a third port, a fourth port, a sixth port, a fourth port, a third port, a fourth port, a sixth port, a third port, a fourth port, a third port, a fourth port, a third port, a fourth port, a third port, a fourth port, a third port, a fourth port, A first opening, a second opening, a sixth opening and a fourth opening, wherein the 6 connecting openings are respectively marked as the first opening, the second opening and the sixth opening; the adsorption unit comprises a first adsorption column (202), a second adsorption column (203), a third adsorption column (302) and a fourth adsorption column (303), the first adsorption column (202) is connected between a No. port and a No. min port of the second switching valve (201), the second adsorption column (203) is connected between a No. port and a No. min port of the second switching valve (201), the third adsorption column (302) is connected between a No. port and a No. min port of the third switching valve (301), and the fourth adsorption column (303) is connected between a No. port and a No. min port of the third switching valve (301); the chromatographic column comprises a first chromatographic column (403), a second chromatographic column (402), a third chromatographic column (502) and a fourth chromatographic column (503), the first chromatographic column (403) is connected between a port iv and a port iv of the fourth switching valve (401), the port iv of the fourth switching valve (401) is connected with a port iv of the sixth switching valve (601) through the second chromatographic column (402), the third chromatographic column (502) is connected between the port iv and the port iv of the fifth switching valve (501), and the port iii of the fifth switching valve (501) is connected with the port iv of the sixth switching valve (601) through the fourth chromatographic column (503); the detector is arranged on the sixth switching valve (601), and carrier gas is introduced into the first switching valve (101), the second switching valve (201), the third switching valve (301), the fourth switching valve (401) and the fifth switching valve (501); the sample introduction unit comprises a sample inlet (104), and the first switching valve (101) is provided with the sample inlet (104).
2. An apparatus for the analysis of impurities in fluorine gas of high purity according to claim 1 wherein the detector is a pulsed helium ionization detector (702) and the first switching valve (101) is further connected to a sample outlet (105).
3. The apparatus for analyzing an impurity in a high purity fluorine gas according to claim 2, wherein the carrier gas comprises a first carrier gas (801), a second carrier gas (802), a third carrier gas (803), a fourth carrier gas (804), a fifth carrier gas (805), a sixth carrier gas (806), a seventh carrier gas (807), a ninth carrier gas (809) and a tenth carrier gas (810).
4. The apparatus for analyzing an impurity in a high-purity fluorine gas according to claim 3, the gas path of the second carrier gas (802) is connected with the ninu port of the first switching valve (101), the gas path of the third carrier gas (803) is connected with the number five port of the first switching valve (101), a first quantitative pipe (102) is connected between the openings of the first switching valve (101), a second quantitative pipe (103) is connected between the third opening and the sixth opening of the first switching valve (101), the sample inlet (104) is connected with a port (r) of the first switching valve (101), the sample outlet (105) is connected with a No. II port of the first switching valve (101), the port (r) of the first switching valve (101) is connected with the port (b) of the second switching valve (201) through a pipeline, the # opening of the first switching valve (101) is connected with the # opening of the third switching valve (301) through a pipeline.
5. The apparatus for analyzing impurities in a high purity fluorine gas according to claim 3, wherein the first carrier gas (801) passage is connected to port (r) of the second switching valve (201), the fourth carrier gas (804) passage is connected to port (c) of the second switching valve (201), port (r) and port (r) of the second switching valve (201) are connected to a vent pipe, and port (c) of the second switching valve (201) is connected to port (r) of the fourth switching valve (401) through a pipe.
6. The apparatus for analyzing impurities in high purity fluorine gas according to claim 3, wherein the fifth carrier gas (805) is connected to a port [ ] of the third switching valve (301), the sixth carrier gas (806) gas circuit is connected to a port [ ] of the third switching valve (301), vent pipes are connected to the ports [ ] and [ ] of the third switching valve (301), and port [ ] of the third switching valve (301) is connected to the port [ ] of the fifth switching valve (501) through a pipe.
7. The apparatus for analyzing impurities in a high-purity fluorine gas according to claim 3, wherein the seventh carrier gas (807) gas path is connected to the port # v of the fourth switching valve (401), the port # ii of the fourth switching valve (401) is connected to the eighth carrier gas (808) gas path, and the port # i and the port # ii of the fourth switching valve (401) are connected to a vent line.
8. The apparatus for analyzing impurities in a high-purity fluorine gas according to claim 3, wherein the ninth carrier gas (809) gas path is connected to the No. two port of the fifth switching valve (501), the tenth carrier gas (810) gas path is connected to the No. five port of the fifth switching valve (501), and the No. two ports of the fifth switching valve (501) are connected to a vent pipe; a first interface of the sixth switching valve (601) is connected with a pulse helium ionization detector (702), and a third port and a fifth port of the sixth switching valve (601) are connected with vent pipelines.
9. The apparatus for analyzing an impurity in a high-purity fluorine gas according to any one of claims 1 to 8, wherein the second column (402) is a 4m Haysep DB column, and the fourth column (503) is a 2m 5A molecular sieve column.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114814039A (en) * | 2022-05-24 | 2022-07-29 | 福建德尔科技股份有限公司 | Method for analyzing content of impurities in fluorine gas |
| CN115308321A (en) * | 2022-07-04 | 2022-11-08 | 浙江赛鹭鑫仪器有限公司 | Fluorine gas and fluoride analysis system and method |
-
2021
- 2021-08-27 CN CN202122040633.3U patent/CN216285088U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114814039A (en) * | 2022-05-24 | 2022-07-29 | 福建德尔科技股份有限公司 | Method for analyzing content of impurities in fluorine gas |
| CN114814039B (en) * | 2022-05-24 | 2022-11-11 | 福建德尔科技股份有限公司 | Method for analyzing content of impurities in fluorine gas |
| CN115308321A (en) * | 2022-07-04 | 2022-11-08 | 浙江赛鹭鑫仪器有限公司 | Fluorine gas and fluoride analysis system and method |
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