CN216282854U - Device for removing hydrogen fluoride in fluorine gas - Google Patents
Device for removing hydrogen fluoride in fluorine gas Download PDFInfo
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- CN216282854U CN216282854U CN202122638757.1U CN202122638757U CN216282854U CN 216282854 U CN216282854 U CN 216282854U CN 202122638757 U CN202122638757 U CN 202122638757U CN 216282854 U CN216282854 U CN 216282854U
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Abstract
The utility model relates to the technical field of fluorine chemical industry, and discloses a device for removing hydrogen fluoride in fluorine gas2Inlet duct and F2An air outlet pipe; a cooling coil is arranged in the hydrogen fluoride condensation tower, an inlet of the cooling coil is connected with a cryogenic pump through a refrigerating fluid inlet pipe, and the cryogenic pump is connected with a refrigerating fluid heat exchanger; the freezing is performedThe liquid heat exchanger is connected with the outlet of the cooling coil through a refrigerating fluid return pipe, and the refrigerating fluid heat exchanger is also connected with a liquid nitrogen inlet pipe and a cold nitrogen outlet pipe. The utility model can realize the stable control of the temperature in the hydrogen fluoride condensing tower, can effectively reduce the hydrogen fluoride content in the fluorine gas produced by electrolysis to below 1 percent, avoids the problems that the temperature of the condensing tower is difficult to be stably controlled by directly using liquid nitrogen as a cold source and the safety problem caused by the local liquefaction of the fluorine gas, and has simple integral structure, reliable work and easy realization.
Description
Technical Field
The utility model relates to the technical field of fluorine chemical industry, in particular to a device for removing hydrogen fluoride in fluorine gas.
Background
High purity fluorine gas (F)2) Is a gas with very active properties, has strong oxidizing property, and is used as an etching gas or cleaning gas in the semiconductor industry for manufacturing photocells and TFTs (thin film transistors) of liquid crystal displays due to the reaction characteristic of the gas. Meanwhile, as a gas of an excimer laser, a fluorine laser is also widely used in the semiconductor industry. While utilizing F2As a cleaning agent for Chemical Vapor Deposition (CVD) reaction chambers with nitrogen trifluoride NF3In contrast, F2Has stronger reactivity and does not cause greenhouse effect. The demand for fluorine gas for this purpose is also increasing greatly with the explosive development of the semiconductor industry in China. In order to meet the needs of the electronics and photovoltaic industries, a high purity fluorine gas is needed. For example, in the semiconductor industry, high purity fluorine gas having a purity of 99.9% or more, or even 99.99% is required. Specifically, there is an increasing demand for impurities such as hydrogen fluoride HF, and among them, the HF content in 99.9% fluorine gas is required to be at least 200ppm, and further, the removal of HF is proposedHigh requirements are required.
Industrially, the method for producing fluorine gas by electrolysis comprises: the KF.2 HF (a mixture of potassium hydroxide and hydrogen fluoride) is electrolyzed by using compacted graphite as an anode, a steel electrolytic cell body as a cathode (or the anode adopts a carbon plate or a nickel plate, and the cathode adopts carbon steel), potassium hydrogen fluoride as electrolyte, anhydrous hydrofluoric acid is electrolyzed, and the anhydrous hydrofluoric acid is purified to obtain the KF.2 HF.
Preparing KHF in electrolytic bath2And HF, heating to melt; HF is continuously or discontinuously added into the electrolytic cell, the mass fraction of HF in the electrolyte is kept between 38 and 42 percent, and the temperature of the electrolytic cell is controlled between 70 and 100 ℃. At present, the purity of fluorine gas produced by the industrial preparation method of fluorine gas by medium-temperature electrolysis method is low, wherein HF and CF are4And the like, has high impurity content and cannot be directly applied to high-end electronic industry. In the existing method for producing fluorine gas by electrolysis, fluorine gas generated by electrolysis contains a large amount of HF with the content of about 6 percent, and the method for removing HF commonly used in industry is to adopt spherical sodium fluoride after activation for adsorption and purification, wherein the content of hydrogen fluoride in the fluorine gas after adsorption is more than 1 percent, and meanwhile, the spherical sodium fluoride can be dissolved and pulverized to block pipelines after adsorbing hydrogen fluoride, and even cause the explosion of an electrolytic cell seriously.
Disclosure of Invention
The utility model aims to solve the technical problems in the prior art, and provides a device for removing hydrogen fluoride in fluorine gas, which can realize stable control of the temperature in a hydrogen fluoride condensation tower, can effectively reduce the content of the hydrogen fluoride in the fluorine gas produced by electrolysis to below 1 percent, has simple integral structure and reliable operation, and is easy to realize.
In order to solve the problems proposed above, the technical scheme adopted by the utility model is as follows:
the utility model provides a device for removing hydrogen fluoride in fluorine gas, which comprises a hydrogen fluoride condensing tower, a cryogenic pump and a refrigerating fluid heat exchanger, wherein the hydrogen fluoride condensing tower is provided with F2Inlet duct and F2An air outlet pipe;
a cooling coil is arranged in the hydrogen fluoride condensation tower, an inlet of the cooling coil is connected with a cryogenic pump through a refrigerating fluid inlet pipe, and the cryogenic pump is connected with a refrigerating fluid heat exchanger; the refrigerating fluid heat exchanger is connected with the outlet of the cooling coil through a refrigerating fluid return pipe, and the refrigerating fluid heat exchanger is further connected with a liquid nitrogen liquid inlet pipe and a cold nitrogen gas outlet pipe.
Further, said F2The gas inlet pipeline is divided into two branches, wherein one branch is used for introducing fluorine gas to be treated, and the other branch is connected with the nitrogen gas outlet pipeline; said F2The gas outlet pipeline is also divided into two branches, wherein one branch is used for discharging the processed fluorine gas, and the other branch is connected with the nitrogen back-blowing gas inlet pipeline.
Further, the bottom of the hydrogen fluoride condensation tower is connected with a sewage pipeline.
Further, a pressure gauge and a thermometer are arranged on the hydrogen fluoride condensation tower and used for measuring the pressure and the temperature in the hydrogen fluoride condensation tower.
Furthermore, a thermometer is arranged on the refrigerating fluid heat exchanger and used for measuring the temperature in the refrigerating fluid heat exchanger.
Further, said F2Air inlet duct, F2Valves are arranged on the air outlet pipeline, the sewage discharge pipeline, the refrigerating fluid inlet pipe, the refrigerating fluid return pipe, the liquid nitrogen inlet pipe and the cold nitrogen outlet pipe.
Furthermore, valves are also arranged on the nitrogen back-blowing air inlet pipeline and the nitrogen outlet pipeline.
Compared with the prior art, the utility model has the beneficial effects that:
according to the utility model, the cooling coil is arranged in the hydrogen fluoride condensing tower, the cooling liquid flows in the cooling coil, the cooling liquid is controlled to have a temperature of between 50 ℃ below zero and 100 ℃ below zero by using the cooling liquid heat exchanger through liquid nitrogen as a cold source, then the cooling liquid is pumped into the cooling coil of the hydrogen fluoride condensing tower through the cryogenic pump, and the condensed hydrogen fluoride is discharged through the sewage discharge pipeline, so that the stable control of the temperature in the hydrogen fluoride condensing tower can be realized, the content of the hydrogen fluoride in the fluorine gas produced by electrolysis can be effectively reduced to be below 1%, meanwhile, the problem that the temperature of the condensing tower is difficult to stably control due to the direct use of liquid nitrogen as the cold source and the safety problem of the fluorine gas caused by local liquefaction are avoided.
Drawings
In order to illustrate the solution of the utility model more clearly, the drawings that are needed in the description of the embodiments will be briefly described below, it being obvious that the drawings in the following description are some embodiments of the utility model, and that other drawings may be derived from these drawings by a person skilled in the art without inventive effort. Wherein:
FIG. 1 is a schematic view showing the structure of an apparatus for removing hydrogen fluoride from fluorine gas according to the present invention.
The system comprises a 1-hydrogen fluoride condensation tower, a 2-F2 air inlet pipeline, a 3-F2 air outlet pipeline, a 4-nitrogen back-blowing air inlet pipeline, a 5-nitrogen air outlet pipeline, a 6-sewage discharge pipeline, a 7-cryogenic pump, an 8-refrigerating fluid heat exchanger, a 9-refrigerating fluid inlet pipe, a 10-refrigerating fluid return pipe, a 11-liquid nitrogen inlet pipe and a 12-cold nitrogen outlet pipe.
Detailed Description
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs; the terminology used in the description presented herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the utility model, e.g., the terms "length," "width," "upper," "lower," "left," "right," "front," "rear," "vertical," "horizontal," "top," "bottom," "inner," "outer," etc., refer to an orientation or position based on that shown in the drawings, are for convenience of description only and are not to be construed as limiting of the present disclosure.
The terms "including" and "having," and any variations thereof, in the description and claims of this invention and the description of the above figures are intended to cover non-exclusive inclusions; the terms "first," "second," and the like in the description and in the claims, or in the drawings, are used for distinguishing between different objects and not necessarily for describing a particular sequential order. In the description and claims of the present invention and in the description of the above figures, when an element is referred to as being "fixed" or "mounted" or "disposed" or "connected" to another element, it may be directly or indirectly located on the other element. For example, when an element is referred to as being "connected to" another element, it can be directly or indirectly connected to the other element.
Furthermore, reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment can be included in at least one embodiment of the utility model. The appearances of the phrase in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. It is explicitly and implicitly understood by one skilled in the art that the embodiments described herein can be combined with other embodiments.
Referring to fig. 1, the present invention provides an apparatus for removing hydrogen fluoride from fluorine gas, the apparatus comprises a hydrogen fluoride condensation tower 1, a cryogenic pump 7 and a refrigerating fluid heat exchanger 8, wherein the hydrogen fluoride condensation tower 1 is provided with F2 Air inlet ducts 2 and F2An air outlet pipe 3;
a cooling coil is arranged in the hydrogen fluoride condensation tower 1, the inlet of the cooling coil is connected with a cryogenic pump 7 through a refrigerating fluid inlet pipe 9, and the cryogenic pump 7 is connected with a refrigerating fluid heat exchanger 8; the refrigerating fluid heat exchanger 8 is connected with the outlet of the cooling coil through a refrigerating fluid return pipe 10, and the refrigerating fluid heat exchanger 8 is further connected with a liquid nitrogen inlet pipe 11 and a cold nitrogen outlet pipe 12.
Further, said F2The gas inlet pipeline 2 is divided into two branches, wherein one branch is used for introducing fluorine gas to be treated, and the other branch is connected with a nitrogen gas outlet pipeline 5. Said F2The gas outlet pipeline 3 is also divided into two branches, wherein one branch is used for discharging the processed fluorine gas, and the other branch is connected with the nitrogen back-blowing gas inlet pipeline 4.
In this example, F2 Gas inlet line 2 for fluorine gas F to be treated2Enter the hydrogen fluoride condensation tower 1, the nitrogen gas outlet pipeline 5 is used for supplying nitrogen gas to discharge and then enters an external waste gas treatment device, and the nitrogen gas back-blowing inlet pipeline 4 is used for supplying nitrogen gas to enter the hydrogen fluoride condensation tower 1 for back blowing, F2An outlet pipe 3 for discharging the treated fluorine gas F2The cryogenic pump 7 is used for conveying refrigerating fluid to the hydrogen fluoride condensing tower 1, the refrigerating fluid heat exchanger 8 is used for controlling the temperature of the refrigerating fluid, and the liquid nitrogen liquid inlet pipe 11 is used for cooling the refrigerating fluid to provide a cold source.
Specifically, said F2Pipeline 3, nitrogen gas blowback admission line 4 and the setting of cryogenic liquid feed liquor pipe 9 of giving vent to anger are in the upper portion of hydrogen fluoride condensing tower 1, F2 admission line 2 with pipeline 3 is given vent to anger in F2 is located the both sides of 1 axis of hydrogen fluoride condensing tower to give vent to anger pipeline 5 with nitrogen gas and the setting of cryogenic liquid backflow pipeline 10 and be in the lower part of hydrogen fluoride condensing tower 1 is guaranteeing under the condition of whole device work efficiency for the compact structure of whole device.
Further, the hydrogen fluoride condensation tower 1 is also connected with a sewage pipeline 6 for discharging liquid hydrogen fluoride HF. Specifically, the sewage discharge pipeline 6 is positioned at the bottom of the hydrogen fluoride condensation tower 1, so that sewage can be discharged conveniently.
Further, a pressure gauge and a thermometer are connected to the hydrogen fluoride condensation tower 1 and are used for measuring the pressure and the temperature in the hydrogen fluoride condensation tower 1.
Further, a thermometer is arranged on the refrigerating fluid heat exchanger 8 and used for measuring the temperature in the refrigerating fluid heat exchanger 8.
Further, said F2Air inlet ducts 2, F2All set up the valve on pipeline 3 of giving vent to anger, sewage pipes 6, cryogenic fluid feed liquor pipe 9, cryogenic fluid back flow pipe 10, liquid nitrogen feed liquor pipe 11 and the cold nitrogen outlet duct 12, make things convenient for the circulation of control duct, guarantee the reliability of device work.
Furthermore, valves are also arranged on the nitrogen back-blowing air inlet pipeline 4 and the nitrogen outlet pipeline 5, so that the circulation of pipelines is conveniently controlled, and the working reliability of the device is ensured.
Further, the hydrogen fluoride condensation column 1, F2 Air inlet ducts 2, F2The gas outlet pipeline 3, the nitrogen back-blowing gas inlet pipeline 4, the nitrogen gas outlet pipeline 5 and the sewage discharge pipeline 6 are all made of carbon steel, stainless steel or Monel material, so that the device can resist Hydrogen Fluoride (HF) corrosion and ensure the work of the deviceAnd (6) reliability.
Furthermore, the refrigerating fluid inlet pipe 9, the refrigerating fluid return pipe 10 and the refrigerating fluid heat exchanger 8 are all made of stainless steel or other low-temperature resistant materials.
In this embodiment, the gas to be treated enters the hydrogen fluoride condensation tower 1 through the F2 gas inlet pipe 2, the refrigerating fluid is pumped into the cooling coil in the hydrogen fluoride condensation tower 1 through the cryogenic pump 7 and the refrigerating fluid inlet pipe 9, the low-temperature refrigerating fluid flows in the cooling coil, and the fluorine gas F to be treated is removed by low-temperature condensation2To obtain purified fluorine gas F2And from F2The air outlet pipeline 3 is used for discharging, and refrigerating fluid flows back to the refrigerating fluid heat exchanger 8 through the refrigerating fluid backflow pipeline 10.
The working process of the apparatus for removing hydrogen fluoride from fluorine gas provided by the present invention is illustrated by the following specific examples, which specifically include the following:
the temperature of the refrigerating fluid in the refrigerating fluid heat exchanger 8 is controlled between minus 50 ℃ and minus 100 ℃, the temperature of the hydrogen fluoride condensing tower 1 is controlled between minus 60 ℃ and minus 90 ℃, and the gas to be treated passes through F2The flow of the gas inlet pipeline 2 entering the hydrogen fluoride condensation tower 1 from the lower part of the tower is 0.2-4 m3/h。
The first embodiment is as follows:
(1) liquid nitrogen flows into a refrigerating fluid heat exchanger 8 through a liquid nitrogen inlet pipe 11, the temperature of the refrigerating fluid is controlled to be-60 to-100 ℃, and vaporized cold nitrogen is discharged through a cold nitrogen outlet pipe 12;
(2) pumping the low-temperature refrigerating fluid into a coil pipe of the hydrogen fluoride condensing tower 1 through a low-temperature pump 7, and controlling the temperature of the low-temperature hydrogen fluoride condensing tower 1 to be about-65 ℃;
(3) fluorine gas having an HF content of 6% generated by electrolysis was supplied at a rate of 1.5m3Flow of/h through F2The gas inlet pipeline 2 enters from the lower part of the hydrogen fluoride condensation tower 1;
(4) after low temperature condensation to remove HF, the gas is removed from F2The gas outlet pipeline 3 enters a subsequent pipeline to obtain the purified fluorine gas F2Detecting that the content of hydrogen fluoride in the fluorine gas is 0.8% by infrared spectroscopy, and after the fluorine gas is condensed by a condenser, reducing the content of hydrogen fluoride in the fluorine gas by 87%;
(5) residual fluorine gas in the hydrogen fluoride condensation tower 1 is blown into nitrogen gas through a nitrogen gas blowback pipeline 4, the fluorine gas condensation tower 1 is discharged through a nitrogen gas outlet pipeline 5, and a small amount of residual liquid HF in the hydrogen fluoride condensation tower 1 is discharged through a sewage discharge pipeline 6, namely flows out of the hydrogen fluoride condensation tower 1.
Example two:
(1) liquid nitrogen flows into a refrigerating fluid heat exchanger 8 through a liquid nitrogen inlet pipe 11, the temperature of the refrigerating fluid is controlled to be-50 to-100 ℃, and vaporized cold nitrogen is discharged through a cold nitrogen outlet pipe 12;
(2) pumping the low-temperature refrigerating fluid into a coil pipe of a hydrogen fluoride condensing tower 1 through a low-temperature pump 7, and controlling the temperature of a low-temperature condenser to be about-75 ℃;
(3) fluorine gas with HF content of 6% generated by electrolysis is added in 2m3Flow of/h through F2The gas inlet pipeline 2 enters from the lower part of the hydrogen fluoride condensation tower 1;
(4) after low temperature condensation to remove HF, the gas is removed from F2The gas outlet pipeline 3 enters a subsequent pipeline to obtain the purified fluorine gas F2Detection of fluorine gas F by infrared spectroscopy2The content of the hydrogen fluoride is 0.5%, and after the hydrogen fluoride is condensed by a condenser, the content of the hydrogen fluoride in the fluorine gas is reduced by 91%;
(5) residual fluorine gas in the hydrogen fluoride condensation tower 1 is blown into nitrogen gas through a nitrogen gas blowback pipeline 4, the fluorine gas condensation tower 1 is discharged through a nitrogen gas outlet pipeline 5, and a small amount of liquid HF in the hydrogen fluoride condensation tower 1 is discharged through a sewage discharge pipeline 6, namely flows out of the hydrogen fluoride condensation tower 1.
Example three:
(1) liquid nitrogen flows into a refrigerating fluid heat exchanger 8 through a liquid nitrogen inlet pipe 11, the temperature of the refrigerating fluid is controlled to be-50 to-100 ℃, and vaporized cold nitrogen is discharged through a cold nitrogen outlet pipe 12;
(2) pumping the low-temperature refrigerating fluid into a coil pipe of a hydrogen fluoride condensing tower 1 through a low-temperature pump 7, and controlling the temperature of a low-temperature condenser to be about-85 ℃;
(3) fluorine gas having an HF content of 4% generated by electrolysis was supplied at a rate of 2.5m3Flow of/h through F2The gas inlet pipeline 2 enters from the lower part of the hydrogen fluoride condensation tower 1;
(4) menstruation lowerAfter warm condensation and HF removal, the gas is removed from F2The gas outlet pipeline 3 enters a subsequent pipeline to obtain the purified fluorine gas F2Detection of fluorine gas F by infrared spectroscopy2The content of the hydrogen fluoride is 0.3%, and after the hydrogen fluoride is condensed by a condenser, the content of the hydrogen fluoride in the fluorine gas is reduced by 95%;
(5) residual fluorine gas in the hydrogen fluoride condensation tower 1 is blown into nitrogen gas through a nitrogen gas blowback pipeline 4, the fluorine gas condensation tower 1 is discharged through a nitrogen gas outlet pipeline 5, and a small amount of liquid HF in the hydrogen fluoride condensation tower 1 is discharged through a sewage discharge pipeline 6, namely flows out of the hydrogen fluoride condensation tower 1.
Example four:
(1) liquid nitrogen flows into a refrigerating fluid heat exchanger 8 through a liquid nitrogen inlet pipe 11, the temperature of the refrigerating fluid is controlled to be-50 to-100 ℃, and vaporized cold nitrogen is discharged through a cold nitrogen outlet pipe 12;
(2) pumping the low-temperature refrigerating fluid into a coil pipe of a hydrogen fluoride condensing tower 1 through a low-temperature pump 7, and controlling the temperature of a low-temperature condenser to be about-90 ℃;
(3) fluorine gas with HF content of 6% generated by electrolysis is mixed with 4m3Flow of/h through F2The gas inlet pipeline 2 enters from the lower part of the hydrogen fluoride condensation tower 1;
(4) after low temperature condensation to remove HF, the gas is removed from F2The gas outlet pipeline 3 enters a subsequent pipeline to obtain the purified fluorine gas F2Detection of fluorine gas F by infrared spectroscopy2The content of the hydrogen fluoride is 0.1 percent, and the content of the hydrogen fluoride in the fluorine gas is reduced by 98 percent after the hydrogen fluoride is condensed by a condenser;
(5) residual fluorine gas in the hydrogen fluoride condensation tower 1 is blown into nitrogen gas through a nitrogen gas blowback pipeline 4, the fluorine gas condensation tower 1 is discharged through a nitrogen gas outlet pipeline 5, and a small amount of liquid HF in the hydrogen fluoride condensation tower 1 is discharged through a sewage discharge pipeline 6, namely flows out of the hydrogen fluoride condensation tower 1.
As can be seen from the first to fourth embodiments, the apparatus provided by the present invention achieves the purpose of reducing the proportion of hydrogen fluoride in fluorine gas by controlling the temperature of the refrigerant and the temperature of the low-temperature condenser and setting the flow rate of fluorine gas entering the apparatus.
The utility model can purify the fluorine gas generated by electrolysis, the hydrogen fluoride condensing tower 1 with a cooling coil pipe arranged inside is adopted to condense the hydrogen fluoride, the temperature of the hydrogen fluoride condensing tower 1 is controlled to be between minus 60 ℃ and minus 90 ℃ through low-temperature refrigerating fluid, the temperature is stably controlled, and meanwhile, the temperature of each step is far higher than the boiling point of the fluorine gas to minus 188 ℃, so that the problems that the temperature is unstable due to direct condensation by using liquid nitrogen and the fluorine gas is liquefied due to too low local temperature in the prior art are solved, the safety accident is not easy to cause, and the safety of the device is ensured.
The above embodiments are preferred embodiments of the present invention, but the present invention is not limited to the above embodiments, and any other changes, modifications, substitutions, combinations, and simplifications which do not depart from the spirit and principle of the present invention should be construed as equivalents thereof, and all such changes, modifications, substitutions, combinations, and simplifications are intended to be included in the scope of the present invention.
Claims (7)
1. An apparatus for removing hydrogen fluoride from a fluorine gas, characterized in that: the device comprises a hydrogen fluoride condensing tower, a cryogenic pump and a refrigerating fluid heat exchanger, wherein the hydrogen fluoride condensing tower is provided with F2Inlet duct and F2An air outlet pipe;
a cooling coil is arranged in the hydrogen fluoride condensation tower, an inlet of the cooling coil is connected with a cryogenic pump through a refrigerating fluid inlet pipe, and the cryogenic pump is connected with a refrigerating fluid heat exchanger; the refrigerating fluid heat exchanger is connected with the outlet of the cooling coil through a refrigerating fluid return pipe, and the refrigerating fluid heat exchanger is further connected with a liquid nitrogen liquid inlet pipe and a cold nitrogen gas outlet pipe.
2. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 1, characterized in that: said F2The gas inlet pipeline is divided into two branches, wherein one branch is used for introducing fluorine gas to be treated, and the other branch is connected with the nitrogen gas outlet pipeline; said F2The gas outlet pipeline is also divided into two branches, wherein one branch is used for discharging the processed fluorine gas, and the other branch is connected with the nitrogen back-blowing gas inlet pipeline.
3. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 1, characterized in that: and the bottom of the hydrogen fluoride condensation tower is connected with a sewage pipeline.
4. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 1, characterized in that: and the hydrogen fluoride condensation tower is provided with a pressure gauge and a thermometer and is used for measuring the pressure and the temperature in the hydrogen fluoride condensation tower.
5. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 1, characterized in that: and the refrigerating fluid heat exchanger is provided with a thermometer for measuring the temperature in the refrigerating fluid heat exchanger.
6. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 1, characterized in that: said F2Air inlet duct, F2Valves are arranged on the air outlet pipeline, the sewage discharge pipeline, the refrigerating fluid inlet pipe, the refrigerating fluid return pipe, the liquid nitrogen inlet pipe and the cold nitrogen outlet pipe.
7. The apparatus for removing hydrogen fluoride from a fluorine gas according to claim 2, characterized in that: and valves are also arranged on the nitrogen back-blowing gas inlet pipeline and the nitrogen gas outlet pipeline.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115571859A (en) * | 2022-11-10 | 2023-01-06 | 中核四0四有限公司 | Method and device for reducing content of hydrogen fluoride in fluorine gas |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN115571859A (en) * | 2022-11-10 | 2023-01-06 | 中核四0四有限公司 | Method and device for reducing content of hydrogen fluoride in fluorine gas |
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