CN216248372U - Ultra-wideband antireflection film system based on PC optical product - Google Patents

Ultra-wideband antireflection film system based on PC optical product Download PDF

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Publication number
CN216248372U
CN216248372U CN202121289430.1U CN202121289430U CN216248372U CN 216248372 U CN216248372 U CN 216248372U CN 202121289430 U CN202121289430 U CN 202121289430U CN 216248372 U CN216248372 U CN 216248372U
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layer
film
ultra
optical product
layers
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Chinese (zh)
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钱会明
杨惠尹
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Wuxi Xinjuhong Intelligent Technology Co ltd
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Wuxi Xinjuhong Intelligent Technology Co ltd
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Abstract

The utility model provides an ultra-wideband antireflection film system based on a PC optical product, which consists of 10 film layers plated on the PC optical product, wherein the 10 film layers sequentially comprise: the film comprises a SiO film layer serving as a first layer and attached to the surface of a PC optical product, SiO2 film layers and TiO2 film layers serving as second to ninth layers which are alternately stacked, and a MgF2 film layer serving as a tenth layer.

Description

Ultra-wideband antireflection film system based on PC optical product
Technical Field
The utility model relates to an antireflection film system, in particular to an ultra-wideband antireflection film system based on a PC optical product.
Background
The PC optical product has the problem of low transmittance of incident light in the application field of 400nm-1000nm visible light-near infrared imaging, only about 89% of incident light is incident, and nearly 11% of light signals are reflected and lost by the optical surface of the PC optical product, so that the imaging quality of the PC optical product is reduced.
SUMMERY OF THE UTILITY MODEL
In view of the above technical problems, an object of the present invention is to provide an ultra-wideband antireflection film system based on a PC optical product, which is a 10-layer antireflection film system designed based on a PC optical product, and an average reflectance in a visible-near infrared ultra-wide band range of 400nm to 1000nm is reduced to less than 0.5%, so that an average transmittance is increased by more than 10% and reaches more than 99%, thereby effectively enhancing a transmission intensity of signal light.
The utility model provides the following technical scheme:
an ultra-wideband antireflection coating system based on a PC optical product is composed of 10 film layers plated on the PC optical product, wherein the 10 film layers sequentially comprise: the film comprises a SiO film layer which is used as a first layer and is attached to the surface of a PC optical product, a SiO2 film layer and a TiO2 film layer which are alternately stacked and are used as second to ninth layers, and a MgF2 film layer which is used as a tenth layer.
Preferably, the thickness of the SiO film layer is 0.0438 nm.
Preferably, the thicknesses of the SiO2 film layers and the TiO2 film layers alternately stacked as the second layer to the ninth layer are as follows: 1.6005nm, 0.1356nm, 0.3608nm, 0.4068nm, 0.1469nm, 0.7015nm, 0.1978nm and 0.2948 nm.
Preferably, the thickness of the MgF2 film layer is 0.7796 nm.
The utility model has the beneficial effects that:
1. the ultra-wideband antireflection film system based on the PC optical product has the effects of improving the light transmittance of the PC optical product in a 400nm-1000nm wave band, so that the signal-to-noise ratio of the whole product is enhanced;
2. the first layer is made of SiO materials, so that the adhesive force between the film system and PC materials can be effectively improved, and the reliability of the film system is enhanced;
3. by adopting MgF2 on the tenth layer, the overall transmittance performance can be effectively improved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this specification, illustrate embodiments of the utility model and together with the description serve to explain the principles of the utility model and not to limit the utility model. In the drawings:
FIG. 1 is a graph of the reflectance of a film system of the present invention (average reflectance less than 0.5%);
FIG. 2 is a schematic structural view of the present invention;
Detailed Description
As shown in fig. 1, in this embodiment, a substrate is made of a PC material, a reference wavelength is 800nm, a target waveband is in a range of 400nm to 1000nm, a first layer attached to the surface of the PC optical product is made of SiO to serve as a transition layer, SiO2 and TiO2 are alternately stacked from a second layer to a ninth layer, and a last layer is made of MgF2 having a relatively low refractive index, which is very helpful for improving the anti-reflection performance of the whole film system, and the structure of the finally optimized specific film system is listed as follows:
layer 1 2 3 4 5 6 7 8 9 10
Material SiO SiO2 TiO2 SiO2 TiO2 SiO2 TiO2 SiO2 TiO2 MgF2
QWOT 0.0438 1.6005 0.1356 0.3608 0.4068 0.1469 0.7015 0.1978 0.2948 0.7796
the table comprises the layer number, the film layer material and the optical thickness from top to bottom. Referring to fig. 2, the film layers attached to the surface of the PC optical product 11 are: a first layer 1, a second layer 2, a third layer 3, a fourth layer 4, a fifth layer 5, a sixth layer 6, a seventh layer 7, an eighth layer 8, a ninth layer 9, and a tenth layer 10.
The ultra-wideband antireflection film system based on the PC optical product comprises 10 layers in total, wherein the first layer is SiO, the optical thickness is 0.0438nm, SiO2 and TiO2 are alternately stacked from the second layer to the ninth layer, and the thicknesses are as follows: 1.6005nm, 0.1356nm, 0.3608nm, 0.4068nm, 0.1469nm, 0.7015nm, 0.1978nm and 0.2948nm, wherein the last layer is MgF2 and is 0.7796nm thick;
the obtained reflectivity curve graph is shown in the figure with the reference wavelength of 800nm and the target wave band of 400nm-1000nm, and the curve shows: the average reflectance shown on the vertical axis is less than 0.5% for the wavelength on the horizontal axis.
Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that changes may be made in the embodiments and/or equivalents thereof without departing from the spirit and scope of the utility model. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (4)

1. An ultra-wideband antireflection coating system based on a PC optical product is characterized in that the ultra-wideband antireflection coating system consists of 10 film layers plated on the PC optical product, and the 10 film layers sequentially comprise: the film comprises a SiO film layer which is used as a first layer and is attached to the surface of a PC optical product, a SiO2 film layer and a TiO2 film layer which are alternately stacked and are used as second to ninth layers, and a MgF2 film layer which is used as a tenth layer.
2. The ultra-wideband antireflection film system according to claim 1, wherein the thickness of the SiO film layer is 0.0438 nm.
3. The ultra-wideband antireflection film system based on PC optical products of claim 1, wherein the thicknesses of the SiO2 film layers and the TiO2 film layers alternately stacked as the second layer to the ninth layer are as follows: 1.6005nm, 0.1356nm, 0.3608nm, 0.4068nm, 0.1469nm, 0.7015nm, 0.1978nm and 0.2948 nm.
4. The ultra-wideband antireflection film system for PC optical products of claim 1, wherein said MgF2 film layer has a thickness of 0.7796 nm.
CN202121289430.1U 2021-06-09 2021-06-09 Ultra-wideband antireflection film system based on PC optical product Active CN216248372U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202121289430.1U CN216248372U (en) 2021-06-09 2021-06-09 Ultra-wideband antireflection film system based on PC optical product

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202121289430.1U CN216248372U (en) 2021-06-09 2021-06-09 Ultra-wideband antireflection film system based on PC optical product

Publications (1)

Publication Number Publication Date
CN216248372U true CN216248372U (en) 2022-04-08

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Country Status (1)

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CN (1) CN216248372U (en)

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Address after: No.106, Xinjin Road, Xinwu District, Wuxi City, Jiangsu Province, 214000

Patentee after: Wuxi Xinjuhong Intelligent Technology Co.,Ltd.

Country or region after: China

Address before: Landlord Kua, No. 3 Qianjin Industrial Park, Jiangxi Economic Development Park, Xinwu District, Wuxi City, Jiangsu Province (No. 101 Xinjin Road)

Patentee before: WUXI XINJUHONG INTELLIGENT TECHNOLOGY Co.,Ltd.

Country or region before: China