CN216092917U - Coating film tail gas treatment device - Google Patents
Coating film tail gas treatment device Download PDFInfo
- Publication number
- CN216092917U CN216092917U CN202122352789.5U CN202122352789U CN216092917U CN 216092917 U CN216092917 U CN 216092917U CN 202122352789 U CN202122352789 U CN 202122352789U CN 216092917 U CN216092917 U CN 216092917U
- Authority
- CN
- China
- Prior art keywords
- tail gas
- cooling
- stagnation
- plates
- assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
The utility model discloses a coating tail gas treatment device which comprises a treatment chamber, and a heating assembly, a cooling assembly and a filtering assembly which are sequentially arranged along the flow path of tail gas, wherein the treatment chamber is provided with a tail gas inlet, a tail gas outlet and a steam inlet which are communicated with a treatment cavity, the heating assembly comprises a heating pipe and a plurality of first stagnation plates, the cooling assembly comprises a plurality of spaced cooling units, each cooling unit comprises a cooling plate and a plurality of second stagnation plates, the cooling plates are provided with air passing holes, the air passing holes of adjacent cooling plates are mutually staggered, and the filtering assembly comprises a filter element. According to the utility model, TMA in the tail gas is fully reacted in the treatment cavity, the cooling assembly cools the tail gas, dust generated by the TMA and original dust in the tail gas are condensed and precipitated by contacting with water vapor, the first stagnation plate and the second stagnation plate intercept the tail gas, the filtering assembly filters the tail gas, the content of dust entering the vacuum pump is reduced, and the service life of the vacuum pump is prolonged.
Description
Technical Field
The utility model relates to the technical field of tail gas treatment of coating equipment, in particular to a coating tail gas treatment device.
Background
In the related technology, the tail gas is introduced into a filtering device and filtered and then enters a vacuum pump, but the tail gas cannot be fully reacted in the filtering device, the dust is discharged from the filtering device and enters the vacuum pump, and the vacuum pump is blocked, so that the service life of the vacuum pump is influenced.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to solving at least one of the problems of the prior art. Therefore, the utility model provides a coating tail gas treatment device, which enables tail gas to react fully, can effectively intercept dust in the tail gas from entering a vacuum pump, and prolongs the service life of the vacuum pump.
According to the embodiment of the utility model, the coating tail gas treatment device is used for treating the coating tail gas and comprises:
the device comprises a treatment chamber, a tail gas inlet, a tail gas outlet and a steam inlet, wherein the treatment chamber is internally provided with a treatment cavity and is provided with the tail gas inlet, the tail gas outlet and the steam inlet which are communicated with the treatment cavity;
the heating assembly comprises a heating pipe and a plurality of first stagnation plates, the first stagnation plates are connected with the heating pipe, and the first stagnation plates are distributed at intervals;
the cooling assembly comprises a plurality of cooling units, the cooling units are stacked, a gap is formed between every two adjacent cooling units, each cooling unit comprises a cooling plate and a plurality of second stagnation plates, the second stagnation plates are connected to the side portions of the cooling plates, the cooling plates are provided with air passing holes, and the air passing holes of the adjacent cooling plates are staggered;
the filter assembly comprises a filter element, and the tail gas outlet faces the filter element;
the heating assembly, the cooling assembly and the filtering assembly are all contained in the treatment cavity and are sequentially arranged along the flow path of the tail gas, and the steam inlet is arranged close to the heating assembly.
The coating tail gas treatment device provided by the embodiment of the utility model at least has the following beneficial effects:
according to the film coating tail gas treatment device provided by the embodiment of the utility model, TMA in tail gas is fully reacted in the treatment cavity by heating the heating assembly, dust generated by the TMA and original dust in the tail gas are condensed and precipitated by contacting with water vapor, the cooling assembly cools the tail gas to accelerate the precipitation of the dust, the first stagnation plate and the second stagnation plate intercept the tail gas, the retention time of the tail gas in the treatment cavity is prolonged, the dust is adsorbed, the tail gas is filtered by the filtering assembly, the tail gas is further purified, the dust content entering the vacuum pump is reduced, and the service life of the vacuum pump is prolonged.
According to some embodiments of the present invention, the heating assembly, the cooling assembly and the filtering assembly are arranged in sequence from bottom to top, the exhaust gas inlet is located at a lower portion of the processing chamber and is opened at a side portion of the processing chamber, and the exhaust gas inlet faces the heating assembly.
According to some embodiments of the utility model, the heating pipes are spirally arranged and distributed in multiple layers along the vertical direction, each layer of heating pipe is connected with the first stagnation plate, and the first stagnation plates are distributed on two sides of each layer of heating pipe along the vertical direction.
According to some embodiments of the utility model, the first retardation plate is gradually inclined upward in a direction toward the exhaust gas inlet.
According to some embodiments of the utility model, the cooling assembly further comprises a cooling pipe and a plurality of third stagnation plates, the cooling pipe comprises a cooling section and a mounting section which are connected with each other, the cooling section is coiled on the surface of the cooling plate, the mounting section is arranged far away from the exhaust gas inlet, and the third stagnation plates are connected to the side portion of the mounting section at intervals.
According to some embodiments of the utility model, the mounting section is disposed on a side of the heating assembly facing away from the exhaust gas inlet, and the air passing hole of the cooling plate adjacent to the heating assembly is disposed on a side of the cooling plate adjacent to the mounting section.
According to some embodiments of the utility model, the third retardation plates are arranged in at least two rows in the vertical direction, the third retardation plates near the exhaust gas inlet are gradually inclined upwards in the direction towards the exhaust gas inlet, and the third retardation plates far away from the exhaust gas inlet are gradually inclined downwards in the direction away from the exhaust gas inlet.
According to some embodiments of the present invention, in the adjacent cooling units, the air passing holes are respectively disposed on two opposite sides of the two cooling plates, and the air passing holes of the cooling plates far away from the heating assembly are disposed in a central region of the cooling plates.
According to some embodiments of the utility model, in each cooling unit, the second retardation plate close to the air passing hole is inclined towards the air passing hole, and the second retardation plate far away from the air passing hole is inclined towards the direction away from the air passing hole.
According to some embodiments of the present invention, in the cooling unit adjacent to the filter assembly, the second stagnation plate is disposed at a side adjacent to the air passing hole in the adjacent cooling unit, and the second stagnation plate is inclined in a direction toward the air passing hole.
Additional aspects and advantages of the utility model will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the utility model.
Drawings
The utility model is further described with reference to the following figures and examples, in which:
FIG. 1 is a schematic structural view of a coating tail gas treatment device according to an embodiment of the present invention;
FIG. 2 is an exploded view of one embodiment of the coating tail gas treatment device according to the present invention;
FIG. 3 is a schematic structural view of the heating assembly and the cooling assembly of FIG. 1;
FIG. 4 is a schematic structural view of the heating assembly and the cooling assembly of FIG. 2;
fig. 5 is a schematic structural view of the filter assembly of fig. 2 after a filter element is hidden.
Reference numerals:
a processing chamber 100, a processing cavity 110, a tail gas inlet 120, a tail gas outlet 130 and a steam inlet 140; a heating assembly 200, a heating tube 210, a first hysteresis plate 220; the cooling device comprises a cooling assembly 300, a cooling unit 310, a cooling plate 311, a gas passing hole 3111, a second stagnation plate 312, a cooling pipe 320, a cooling section 321, an installation section 322 and a third stagnation plate 330; the filter assembly 400, the filter element 410, the bracket 420, the inner wall 421, the outer wall 422, and the air inlet 423; water supply assembly 500, water bottle 510, valve 520.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper, lower, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, the meaning of a plurality is one or more, the meaning of a plurality is two or more, and the above, below, exceeding, etc. are understood as excluding the present numbers, and the above, below, within, etc. are understood as including the present numbers. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless otherwise explicitly limited, terms such as arrangement, installation, connection and the like should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific contents of the technical solutions.
In the description of the present invention, reference to the description of the terms "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The embodiment of the utility model provides a coating tail gas treatment device, which is used for treating tail gas generated in a coating process. Referring to fig. 1 and 2, the coating tail gas treatment apparatus includes a treatment chamber 100, a heating assembly 200, a cooling assembly 300, and a filtering assembly 400, wherein the treatment chamber 100 has a treatment cavity 110 therein, the heating assembly 200, the cooling assembly 300, and the filtering assembly 400 are all disposed in the treatment cavity 110, the heating assembly 200 is configured to heat air near the treatment cavity 110, so that TMA in the tail gas can sufficiently react in the treatment cavity 110, the cooling assembly 300 is configured to cool dust generated after the reaction of the tail gas, so that the dust can be deposited in the treatment cavity 110, the filtering assembly 400 is configured to filter the tail gas, the heating assembly 200, the cooling assembly 300 and the filtering assembly 400 are arranged along the flow path of the tail gas, and the tail gas is sequentially heated, cooled and filtered, so that after the tail gas fully reacts, the dust is cooled and precipitated in the processing cavity 110, and is discharged after being filtered and intercepted.
Specifically, the processing chamber 100 is provided with a tail gas inlet 120, a tail gas outlet 130 and a steam inlet 140, the tail gas inlet 120, the tail gas outlet 130 and the steam inlet 140 are all communicated with the processing cavity 110, the tail gas inlet 120 is used for allowing tail gas to be processed to enter the processing cavity 110, the tail gas outlet 130 is used for allowing the tail gas after the processing is completed to be discharged from the processing cavity 110, the steam inlet 140 is used for allowing steam to enter the processing cavity 110, and water vapor is used for bonding and precipitating dust in the tail gas and powder generated by excessive TMA reaction.
Referring to fig. 3 and 4, the heating assembly 200 includes a heating pipe 210 and a plurality of first stagnation plates 220, the first stagnation plates 220 are connected to the heating pipe 210 and are distributed on the heating pipe 210 at intervals, the heating pipe 210 is used for heating the first stagnation plates 220 and air around the heating assembly 200, tail gas introduced into the processing chamber 110 is subjected to partial reaction under the heating action of the heating pipe 210, a part of generated alumina powder dust falls to the bottom of the processing chamber 110, and a part of the alumina powder dust is adhered to the surface of the first stagnation plates 220, the plurality of first stagnation plates 220 are arranged to increase the interception strength of the heating assembly 200 on the tail gas, on one hand, the retention time of the tail gas at the heating assembly 200 is increased to enable the tail gas to fully react with water vapor, on the other hand, the contact area between the plurality of first stagnation plates 220 and the tail gas is large, so that more dust is retained in the heating assembly 200, and the dust content in the discharged tail gas is reduced.
The cooling assembly 300 includes a plurality of cooling units 310, the plurality of cooling units 310 are stacked, a gap is formed between the cooling units 310 of adjacent layers, exhaust gas can flow through the gap, the cooling unit 310 includes a cooling plate 311 and a plurality of second stagnation plates 312, the second stagnation plates 312 are connected to the side portions of the cooling plate 311, the cooling plate 311 is provided with a gas passing hole 3111, and the gas passing hole 3111 is used for the exhaust gas to pass through and flow to the cooling units 310 of different layers; the cooling plate 311 cools the tail gas and the second stagnation plate 312, the cooled alumina dust is easier to precipitate, and the second stagnation plate 312 can adsorb more dust, so that the interception effect of the cooling assembly 300 on the tail gas is enhanced; in the cooling units 310 of adjacent layers, the gas passing holes 3111 on the cooling plates 311 are staggered, the flow path of the exhaust gas is lengthened, and the exhaust gas can contact with more second stagnation plates 312, so that the adsorption effect of the second stagnation plates 312 on the powder is optimized.
The filter assembly 400 includes a filter element 410, and the filter element 410 filters and purifies the exhaust gas flowing out from the cooling assembly 300, intercepts dust in the exhaust gas, and further reduces the dust content in the exhaust gas. It should be noted that, through the adsorption of the first stagnation plate 220 and the second stagnation plate 312 on the dust, the content of the dust in the exhaust gas is reduced, which can reduce the load of the filter element 410 on the exhaust gas filtration and reduce the replacement frequency of the filter element 410.
Therefore, in the coating tail gas treatment device provided in the embodiment of the present invention, TMA in the tail gas is sufficiently reacted in the treatment chamber 110 by heating the heating assembly 200, dust generated by TMA and original dust in the tail gas contact water vapor to be condensed and precipitated, the cooling assembly 300 cools the tail gas to accelerate the precipitation of the dust, the first stagnation plate 220 and the second stagnation plate 312 intercept the tail gas to increase the residence time of the tail gas in the treatment chamber 110 and adsorb the dust, and the filtering assembly 400 filters the tail gas to further purify the tail gas, reduce the dust content entering the vacuum pump, and improve the service life of the vacuum pump.
The heating pipe 210 may be heated by a thermocouple or a heating wire, and the cooling assembly 300 may be cooled by cooling with air after cooling with liquid. As shown in fig. 1 and 2, the coating tail gas treatment device further comprises a water supply assembly 500 for providing steam, the water supply assembly 500 comprises a water bottle 510 and a valve 520, the water bottle 510 is communicated with the steam inlet 140 through a pipeline, water is stored in the water bottle 510, the valve 520 is used for controlling the connection and disconnection of the pipeline between the water bottle 510 and the steam inlet 140, the vacuum pump continuously pumps the tail gas in the treatment chamber 110, the treatment chamber 110 is approximately in a vacuum state, and when the valve 520 is opened, the water entering the treatment chamber 110 is vaporized into water vapor and fully reacts with the tail gas.
The heating assembly 200, the cooling assembly 300 and the filtering assembly 400 may be arranged in a horizontal direction and a vertical direction, and in one embodiment of the present invention, the heating assembly 200, the cooling assembly 300 and the filtering assembly 400 are arranged in sequence from bottom to top, so that the exhaust gas can be deposited under the action of gravity in the flowing process, the residence time of the exhaust gas in the processing chamber 110 is increased, the exhaust gas can be fully reacted, and the exhaust gas can be easily adhered to the first stagnation plate 220 and the second stagnation plate 312.
It is contemplated that the exhaust gas inlet 120 is disposed at the lower portion or the bottom of the processing chamber 100, and the exhaust gas outlet 130 is disposed at the upper portion or the top of the processing chamber 100. in one embodiment of the present invention, the exhaust gas inlet 120 is disposed at one side of the lower portion of the processing chamber 100, and the exhaust gas inlet 120 is disposed toward the heating assembly 200, so that the exhaust gas entering the processing chamber 110 can be directly heated by the heating assembly 200, and the water vapor and the exhaust gas can be fully reacted. In addition, in this embodiment, the steam inlet 140 is disposed at the bottom of the processing chamber 100, that is, the tail gas and the steam enter the processing chamber 110 from different directions, respectively, the flow directions of the tail gas and the steam are crossed, so that the tail gas and the steam can fully contact each other, and the adsorption capacity of the first stagnation plate 220 wetted by the steam to the dust is enhanced, so as to increase the settling amount of the dust in the heating area of the processing chamber 110.
The heating assembly 200 is disposed in the bottom region of the processing chamber 110, the heater tube 210 is mounted on the bottom wall of the processing chamber 100, and a portion of the heater tube 210 may extend to the outside of the processing chamber 100 for interfacing with external heating electrical components; heating pipe 210 spirals the setting, and heating pipe 210 forms the multilayer in the bending of vertical direction, is favorable to improving heating element 200's heating efficiency, all is connected with first board 220 that stagnates on every layer of heating pipe 210 to first board 220 that stagnates distributes in the both sides of heating pipe 210 in vertical direction, makes first board 220 that stagnates distribute more densely, strengthens the first board 220 that stagnates to the interception dynamics of tail gas, and improves the dust volume of adhesion.
In order to reduce the flow speed of the exhaust gas in the processing chamber 110 and fully decompose the TMA in the exhaust gas in the heating region, the first retardation plate 220 should be arranged to extend in the vertical direction so as to intercept the exhaust gas and increase the retention time of the exhaust gas in the heating region. In one embodiment, as shown in fig. 3 and 4, the first stagnation plate 220 is gradually inclined upwards in a direction towards the exhaust gas inlet 120, so that the first stagnation plate 220 is oriented opposite to the flow direction of the exhaust gas, the exhaust gas entering from the exhaust gas inlet 120 is rapidly intercepted by the first stagnation plate 220, the flow rate is reduced, and the exhaust gas has a downward flow tendency under the intercepting action of the first stagnation plate 220, so that the retention time of the exhaust gas in the heating zone is maximally prolonged, and the exhaust gas is ensured to be fully reacted in the heating zone.
The cooling assembly 300 further includes a cooling pipe 320, the cooling pipe 320 is used for cooling the cooling plate 311, cooling water or cooling gas can be introduced into the cooling pipe 320, the cooling pipe 320 includes a cooling section 321 and an installation section 322 which are connected with each other, the cooling section 321 is coiled on the surface of the cooling plate 311, so that the cooling section 321 and the cooling plate 311 have a larger contact area, the cooling efficiency of the cooling pipe 320 on the cooling plate 311 is ensured, the installation section 322 can extend to the outside of the processing chamber 100 and is convenient for being connected with an external cold source interface, two installation sections 322 are provided, the two installation sections 322 are respectively connected to two ends of the cooling section 321, and the two installation sections 322 are respectively used for introducing a cold source and discharging the cold source; each cooling plate 311 may be provided with a cooling section 321, or the cooling plate 311 at a lower position may be selected to be provided with the cooling section 321.
It should be noted that, the mounting section 322 extends along the vertical direction, and the cooling plate 311 is located above the heating assembly 200, in order to ensure the effect of the third stagnation plate 330 on intercepting the exhaust gas, the third stagnation plate 330 should extend towards the horizontal direction, so as to reduce the upward flow of the dust. In one embodiment, the mounting section 322 is disposed on a side of the heating element 200 away from the exhaust gas inlet 120, the air passing hole 3111 of the cooling plate 311 adjacent to the heating element 200 is disposed on a side of the cooling plate 311 close to the mounting section 322, so that the exhaust gas intercepted by the third stagnation plate 330 can directly flow upwards, and the problem that the exhaust gas directly flows out from the cooling plate 311 above the heating element 200 without being cooled by the mounting section 322 or returns to the top of the heating element 200 after being cooled by the mounting section 322 to affect the settling effect of the dust is avoided.
The third stagnation plates 330 are provided with two columns in the vertical direction, so that the third stagnation plates 330 are arranged more densely, the contact area between dust and the third stagnation plates 330 is increased, and the adhesion amount of the third stagnation plates 330 to the dust is increased. In one embodiment, the third baffles 330 are arranged in two rows, the third baffles 330 of one row near the exhaust gas inlet 120 are gradually inclined upward in a direction toward the exhaust gas inlet 120 to intercept the exhaust gas, so that the dust is settled downward, and the amount of the exhaust gas flowing toward the mounting section 322 is reduced, and the third baffles 330 of one row far away from the exhaust gas inlet 120 are gradually inclined downward in a direction away from the exhaust gas inlet 120, so that most of the dust flows through a gap between two adjacent third baffles 330, and are settled downward under the blockage of the third baffles 330.
In order to further lengthen the flow path of the tail gas at the cooling assembly 300 and the residence time of the tail gas at the cooling assembly 300, the through-air holes 3111 are respectively arranged at two opposite sides of the two cooling plates 311 in the adjacent cooling units 310, when the tail gas flows in the gap between the adjacent cooling units 310, the tail gas can only enter from one end of the gap and then is discharged from the other end of the gap, so that the flow distance of the tail gas is maximally increased, the dust is conveniently adhered to the second stagnation plate 312, and the settling amount of the dust is increased.
As shown in fig. 4, the air holes 3111 in the lowermost cooling plate 311 are provided directly above the mounting section 322, and the air holes 3111 in the cooling plate 311 adjacent to the lowermost cooling plate 311 are provided on the side away from the mounting section 322 in such a manner that the air holes 3111 in the adjacent cooling units 310 are offset from each other, and so on; the uppermost cooling plate 311 is closest to the filter module 400, and the gas passing hole 3111 of the uppermost cooling plate 311 is formed in a central region of the cooling plate 311 in order to uniformly filter the exhaust gas entering the filter module 400.
It should be noted that each cooling plate 311 may be provided with a plurality of through holes 3111, and the size and distribution of the through holes 3111 may be set reasonably according to the shape and specification of the cooling plate 311; both sides of the cooling plate 311 can be connected with the second stagnation plate 312 to increase the adhesion amount of the second stagnation plate 312 to the dust, in an embodiment of the present invention, the second stagnation plate 312 is connected to the lower side of the cooling plate 311, so that the exhaust gas can flow to the upper cooling unit 310 through the air holes 3111 on the cooling plate 311 only after passing through the second stagnation plate 312 during the flowing process of the exhaust gas, and the adsorption effect of the second stagnation plate 312 to the dust is ensured.
In the cooling unit 310, the second stagnation plates 312 are symmetrically distributed with respect to the center of the cooling plate 311, and the second stagnation plate 312 close to the side of the gas passing hole 3111 of the cooling plate 311 is inclined toward the gas passing hole 3111, and the second stagnation plate 312 far from the side of the gas passing hole 3111 is inclined toward the direction far from the gas passing hole 3111, on one hand, the flow direction of the exhaust gas flowing from the cooling unit 310 at the lower layer is opposite to the direction of the second stagnation plate 312 far from the side of the gas passing hole 3111, and the second stagnation plate 312 can effectively intercept dust, on the other hand, the flow direction of the second stagnation plate 312 close to the side of the gas passing hole 3111 is the same as that of the exhaust gas, so that the exhaust gas can be guided, the gas except for the dust in the exhaust gas can be rapidly discharged through the gas passing hole 3111, thereby avoiding the exhaust gas from excessively stagnating in the cooling area of the processing chamber 100, so that the exhaust gas can be continuously discharged from the exhaust gas outlet 130, and ensuring the processing efficiency of the exhaust gas.
It should be noted that the gas passing hole 3111 is disposed at a side of the cooling plate 311 at the bottom layer near the mounting section 322, so that the second retardation plates 312 connected to the cooling plate 311 at the bottom layer may be inclined towards the exhaust gas inlet 120 to ensure that the exhaust gas is fully reacted in the heating assembly 200. In addition, the cooling plate 311 located at the topmost layer contacts the filter assembly 400 from above, so that only one side close to the air passing hole 3111 in the adjacent cooling plate 311 needs to be provided with the second stagnation plate 312, and the second stagnation plate 312 is inclined toward the air passing hole 3111 of the topmost cooling plate 311, and the second stagnation plate 312 guides the exhaust gas, so that the exhaust gas can rapidly enter the filter assembly 400 through the air passing hole 3111.
As shown in fig. 5, the filter assembly 400 includes a bracket 420 and a filter element 410, the filter element 410 is disposed inside the bracket 420 and is used for filtering the exhaust gas, the bracket 420 fixes and supports the filter element 410 to prevent the filter element 410 from shifting during the flowing process of the exhaust gas, and the filter element 410 is detachably connected to the bracket 420, so as to facilitate the replacement of the filter element 410.
The support 420 comprises an inner layer wall 421 and an outer layer wall 422, the filter element 410 is clamped between the inner layer wall 421 and the outer layer wall 422, the bottom of the support 420 is provided with an air inlet 423, the inner layer wall 421 is arranged in a hollow manner, tail gas can enter the filter element 410 through the air inlet 423 and holes in the inner layer wall 421, and the filter element 410 filters the tail gas; the filtered exhaust exits the top of the rack 420 and exits the process chamber 100 through the exhaust outlet 130.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention. Furthermore, the embodiments of the present invention and the features of the embodiments may be combined with each other without conflict.
Claims (10)
1. Coating film tail gas processing apparatus for handle coating film tail gas, its characterized in that includes:
the device comprises a treatment chamber, a tail gas inlet, a tail gas outlet and a steam inlet, wherein the treatment chamber is internally provided with a treatment cavity and is provided with the tail gas inlet, the tail gas outlet and the steam inlet which are communicated with the treatment cavity;
the heating assembly comprises a heating pipe and a plurality of first stagnation plates, the first stagnation plates are connected with the heating pipe, and the first stagnation plates are distributed at intervals;
the cooling assembly comprises a plurality of cooling units, the cooling units are stacked, a gap is formed between every two adjacent cooling units, each cooling unit comprises a cooling plate and a plurality of second stagnation plates, the second stagnation plates are connected to the side portions of the cooling plates, the cooling plates are provided with air passing holes, and the air passing holes of the adjacent cooling plates are staggered;
the filter assembly comprises a filter element, and the tail gas outlet faces the filter element;
the heating assembly, the cooling assembly and the filtering assembly are all contained in the treatment cavity and are sequentially arranged along the flow path of the tail gas, and the steam inlet is arranged close to the heating assembly.
2. The coating tail gas treatment device according to claim 1, wherein the heating assembly, the cooling assembly and the filtering assembly are arranged in sequence from bottom to top, the tail gas inlet is located at the lower part of the treatment chamber and is opened at the side part of the treatment chamber, and the tail gas inlet faces the heating assembly.
3. The coating tail gas treatment device according to claim 2, wherein the heating pipes are arranged in a spiral manner and are distributed in multiple layers in the vertical direction, each layer of heating pipe is connected with the first stagnation plate, and the first stagnation plates are distributed on two sides of each layer of heating pipe in the vertical direction.
4. The device for treating coating tail gas according to claim 3, wherein the first retardation plate is gradually inclined upward in a direction toward the tail gas inlet.
5. The coating tail gas treatment device according to claim 2, wherein the cooling assembly further comprises a cooling pipe and a plurality of third stagnation plates, the cooling pipe comprises a cooling section and a mounting section which are connected with each other, the cooling section is coiled on the surface of the cooling plate, the mounting section is arranged far away from the tail gas inlet, and the side part of the mounting section is connected with the plurality of third stagnation plates at intervals.
6. The coating tail gas treatment device according to claim 5, wherein the mounting section is disposed on a side of the heating assembly facing away from the tail gas inlet, and the air passing hole of the cooling plate adjacent to the heating assembly is disposed on a side of the cooling plate adjacent to the mounting section.
7. The coating film tail gas treatment device according to claim 6, wherein the third stagnation plates are arranged in at least two rows in the vertical direction, the third stagnation plate near the tail gas inlet is gradually inclined upwards in the direction towards the tail gas inlet, and the third stagnation plate far away from the tail gas inlet is gradually inclined downwards in the direction away from the tail gas inlet.
8. The device as claimed in any one of claims 1 to 7, wherein in adjacent cooling units, the air holes are respectively disposed on two opposite sides of the two cooling plates, and the air holes of the cooling plates far away from the heating assembly are disposed in a central region of the cooling plates.
9. The coating tail gas treatment device according to claim 8, wherein in each cooling unit, the second retardation plate close to the air passing hole is inclined towards the air passing hole, and the second retardation plate far away from the air passing hole is inclined towards the direction away from the air passing hole.
10. The device of claim 8, wherein the second retardation plate is disposed in the cooling unit adjacent to the filter assembly on a side adjacent to the air passing hole in the adjacent cooling unit, and the second retardation plate is inclined in a direction toward the air passing hole.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122352789.5U CN216092917U (en) | 2021-09-27 | 2021-09-27 | Coating film tail gas treatment device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122352789.5U CN216092917U (en) | 2021-09-27 | 2021-09-27 | Coating film tail gas treatment device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN216092917U true CN216092917U (en) | 2022-03-22 |
Family
ID=80689213
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122352789.5U Active CN216092917U (en) | 2021-09-27 | 2021-09-27 | Coating film tail gas treatment device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN216092917U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113830959A (en) * | 2021-10-28 | 2021-12-24 | 横店集团东磁股份有限公司 | Front-end filtering device of vacuum pump |
-
2021
- 2021-09-27 CN CN202122352789.5U patent/CN216092917U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113830959A (en) * | 2021-10-28 | 2021-12-24 | 横店集团东磁股份有限公司 | Front-end filtering device of vacuum pump |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN216092917U (en) | Coating film tail gas treatment device | |
| EP0274032B1 (en) | Fuel cell coolant inlet manifold and system | |
| CN106178557A (en) | A kind of vertical tube falling vaporizer | |
| KR101146105B1 (en) | Heat plate for heat exchanger | |
| CN102016107B (en) | Heat equalizer and organic film forming apparatus | |
| AU548204B2 (en) | Method for the electroless nickel plating of long bodies | |
| CN106693419A (en) | Vertical tube falling-film evaporator | |
| BRPI0614593A2 (en) | manifold for a fluid medium in a heat exchanger, and heat exchanger | |
| JP3917424B2 (en) | Polymer solution preheater and method for preheating such a solution | |
| US7850826B2 (en) | Multi-stage flash evaporator | |
| JP7446286B2 (en) | Evaporator with improved droplet separation | |
| CN218107238U (en) | Temperature-changing adsorber | |
| CN214714413U (en) | MVR falling film evaporator | |
| CN216418666U (en) | Oil smoke purifier with multiple oil smoke evolution function | |
| CN220583149U (en) | Heat recovery channel structure of heat exchanger | |
| CN111964414A (en) | Material drying equipment | |
| CN116395642A (en) | Oxygen supply device | |
| CN212320079U (en) | Gas heating device | |
| CN212954757U (en) | Integrated sewage treatment system based on ABR | |
| KR100524704B1 (en) | Apparatus for exchange of heat in heat exchanger | |
| CN218187929U (en) | Horizontal tube falling film evaporator | |
| CN216512891U (en) | Silicon core structure of polycrystalline silicon reduction furnace and polycrystalline silicon reduction furnace | |
| US20170307300A1 (en) | Re-direction of vapor flow across tubular condensers | |
| CN219079643U (en) | Evaporation device and coating equipment | |
| CN207894290U (en) | A kind of titanium tube for heat exchanger |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |