CN215975396U - EDI system water quality circulation adjusting device - Google Patents
EDI system water quality circulation adjusting device Download PDFInfo
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- CN215975396U CN215975396U CN202122400122.8U CN202122400122U CN215975396U CN 215975396 U CN215975396 U CN 215975396U CN 202122400122 U CN202122400122 U CN 202122400122U CN 215975396 U CN215975396 U CN 215975396U
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Abstract
The utility model provides a water quality circulation adjusting device of an EDI system, which comprises a polishing circulation output unit, an EDI circulation water supply unit and a cleaning unit; the input end of the EDI unit is communicated with the output end of the EDI water feed pump; the output end of the EDI unit is connected with the input end of the polishing cycle output unit; the output end of the EDI unit is selectively communicated with the input end of the cleaning unit, and the output end of the cleaning unit is selectively communicated with the input end of the EDI unit; ultrapure water output by the polishing circulation output unit circularly flows through an ultrapure water using point and returns to the polishing circulation output unit, the output end of the polishing circulation output unit is also communicated with the input end of the EDI circulation water supply unit, and the output end of the EDI circulation water supply unit is communicated with the first water inlet end of the EDI unit; wherein, the flow of the ultrapure water sent into the EDI circulating water supply unit from the output end of the polishing circulating output unit is adjustable.
Description
Technical Field
The utility model relates to the technical field of purified water preparation equipment for photoelectric semiconductors, in particular to a water quality circulation adjusting device for an EDI system.
Background
Pure water is water prepared by reverse osmosis or distillation, and ultrapure water is prepared by a series of complicated purification technologies such as electrodeionization, photooxidation and the like on the basis of pure water. The ultrapure water almost completely removes conductive media, bacteria, viruses, organic matters and trace mineral elements in the water. Ultrapure water is commonly used in the integrated circuit industry, for cleaning optoelectronic semiconductor raw materials and utensils used, for preparing photolithographic masks, and for water vapor sources for silicon wafer oxidation. In the production of other compact electronic devices, a large amount of ultrapure water is also needed, so that the ultrapure water with stable quality is provided, and the guarantee for ensuring the normal production of the semiconductor industry is provided.
In the preparation of ultrapure water, in order to remove ions in water, an EDI device, namely a continuous electric desalting device, is generally used, and water treated by the EDI device is sent to a pressurizing and sealing device to prevent the water from contacting with air. If the water consumption of the ultrapure water consumption point is small or water is consumed intermittently, the EDI equipment may be temporarily stopped, when the EDI equipment is restarted after being stopped, a certain time is needed for establishing an electric field and activating the regeneration exchange capacity of the internal resin, the water quality of the water discharged shortly after being started is not stable, and the ultrapure water storage and output equipment is adversely affected; therefore, it is necessary to develop an EDI system which has an external circulation water supply structure and can prevent the shutdown due to less water consumption of a demand end, so as to keep the effluent quality of the EDI system stable and reliable, improve the reliability of equipment and prolong the service life of the equipment.
SUMMERY OF THE UTILITY MODEL
In view of this, the utility model provides a water quality circulation adjusting device of an EDI system, which prevents unstable water outlet quality caused by shutdown of EDI equipment and improves reliability of subsequent circulation output equipment.
The technical scheme of the utility model is realized as follows: the utility model provides a water quality circulation adjusting device of an EDI system, which comprises a reverse osmosis RO water tank for supplying water, an EDI water supply pump and an EDI unit (1), wherein the reverse osmosis RO water tank is communicated with the EDI water supply pump; the EDI water supply pump is used for pumping water to the EDI unit (1), and the EDI unit (1) adsorbs and filters ions in the water to obtain ultrapure water from which the ions are removed; the polishing device also comprises a polishing cycle output unit (2), an EDI cycle water supply unit (3) and a cleaning unit (4);
the input end of the EDI unit (1) is communicated with the output end of the EDI water feed pump; one of the output ends of the EDI unit (1) is connected with the input end of the polishing cycle output unit (2) or the input end of the cleaning unit (4), and the output end of the cleaning unit (4) is selectively communicated with the input end of the EDI unit (1);
ultrapure water at the output end of the polishing circulation output unit (2) circularly flows through an ultrapure water using point and returns to the polishing circulation output unit (2), the output end of the polishing circulation output unit (2) is also communicated with the input end of the EDI circulation water supply unit (3), and the output end of the EDI circulation water supply unit (3) is communicated with the first water inlet end (141) of the EDI unit (1);
the flow of the ultrapure water sent into the EDI circulating water supply unit (3) from the output end of the polishing circulating output unit (2) is adjustable.
In addition to the above technical means, preferably, the EDI unit (1) includes a first check valve (11), a first UV ultraviolet irradiation section (12), a first microfilter (13), and an EDI device (14); the input end of the first check valve (11) is communicated with the output end of the EDI water feeding pump; the output end of the first check valve (11) is communicated with the input end of a first UV irradiation part (12), and the output end of the first UV irradiation part (12) is communicated with the input end of a first micro filter (13); the EDI device (14) is provided with a first water inlet end (141), a first water discharge end (142), a concentrated water discharge port (143) and a cleaning port (144), and the output end of the first microfilter (13) is communicated with the first water inlet end (141) or the cleaning port (144) of the EDI device (14); the first drain end (142) of the EDI device (14) is connected with the input end of the polishing cycle output unit (2); a concentrated water discharge port (143) of the EDI device (14) is communicated with the input end of the cleaning unit (4); the output end of the cleaning unit (4) is selectively communicated with the cleaning port (144); water fed by an EDI feed water pump is irradiated by a first UV irradiation part (12) and then fed into an EDI device (14) for treatment, treated fresh water is fed into a polishing cycle output unit (2) through a first water discharge end (142), concentrated water generated by the EDI device (14) is fed into a cleaning unit (4) for treatment, and the treated water is circularly input to a cleaning port (144).
Preferably, the first drain end (142) of the EDI device (14) is also in selective communication with an input of a cleaning unit (4).
Preferably, the polishing cycle output unit (2) comprises a nitrogen sealed water tank (20), a nitrogen source (21), a pressure reducing valve (22), a nitrogen pressure gauge (23), a two-way breather valve (24), an ultrapure water output pump (25), a second check valve (26), a second UV ultraviolet irradiation part (27), a polishing mixed bed (28) and a second microfilter (29); the water inlet of the nitrogen-sealed water tank (20) is used as the input end of the polishing cycle output unit (2); the top of the nitrogen-sealed water tank (20) is communicated with a nitrogen source (21), an output pipeline of the nitrogen source (21) is provided with a pressure reducing valve (22), and the top of the nitrogen-sealed water tank (20) is also provided with a nitrogen pressure gauge (23) and a two-way breather valve (24); the nitrogen-sealed water tank (20) is also communicated with the input end of an ultrapure water outward conveying pump (25), the output end of the ultrapure water outward conveying pump (25) is respectively communicated with the EDI circulating water supply unit (3) or the input end of a second UV irradiation part (27) through a second check valve (26), the output end of the second UV irradiation part (27) is communicated with the input end of a polishing mixed bed (28), the output end of the polishing mixed bed (28) is communicated with the input end of a second micro-filter (29), and the output end of the second micro-filter (29) is respectively communicated with a water point for ultrapure water and the nitrogen-sealed water tank (20); an overflow pipe (200) is further arranged on the nitrogen-sealed water tank (20), one end of the overflow pipe (200) is communicated with the nitrogen-sealed water tank (20), the other end of the overflow pipe is inserted into the water-sealed pipe, and the liquid level in the water-sealed pipe is over the water outlet of the overflow pipe (200).
Further preferably, the EDI circulating water supply unit (3) comprises a diaphragm valve (31) and a third check valve (32), wherein an input end of the diaphragm valve (31) is communicated with an output end of the second check valve (26), an output end of the diaphragm valve (31) is communicated with an input end of the third check valve (32), and an output end of the third check valve (32) is communicated with an output end of the first check valve (11).
Further preferably, the device also comprises a flow regulating branch, wherein the flow regulating branch is arranged between the nitrogen-sealed water tank (20) and the input end of the diaphragm valve (31); the flow regulation branch comprises an EDI circulating pump (33) and a fourth check valve (34), the input end of the EDI circulating pump (33) is communicated with the nitrogen-sealed water tank (20), the output end of the EDI circulating pump (33) is communicated with the input end of the fourth check valve (34), and the output end of the fourth check valve (34) is selectively communicated with the input end of the diaphragm valve (31).
Further preferred, still include a plurality of converters and controller, EDI water-feeding pump, ultrapure water circulating pump and EDI circulating pump (33) are provided with the converter respectively, and EDI water-feeding pump, ultrapure water circulating pump, EDI circulating pump (33), a plurality of converters and nitrogen pressure gauge (23) all are connected with controller electric property.
Preferably, the washing unit (4) comprises a collection tank (41), a regeneration pump (42) and a third microfilter (43); the input end of the collecting tank (41) is respectively communicated with a first water discharging end (142) or a concentrated water discharging port (143) of the EDI device (14); a medicine feeding port is also arranged on the collecting tank (41); the output end of the collecting tank (41) is communicated with the input end of a regeneration pump (42), the output end of the regeneration pump (42) is respectively communicated with the input ends of the collecting tank (41) or a third micro-filter (43), and the output end of the third micro-filter (43) is communicated with a cleaning port (144) of the EDI device (14).
Compared with the prior art, the water circulation adjusting device for the EDI system has the following beneficial effects:
(1) according to the utility model, water in the self circulation pipeline of the polishing circulation output unit is supplemented into the EDI unit, so that the problems of intermittent operation and unstable water quality of the EDI unit caused by intermittent water use of ultrapure water points are prevented, the water quality in the nitrogen-sealed water tank is not reduced, the consumption of polishing resin in the polishing mixed bed is reduced, and the service life of equipment is prolonged; the device forms two circulation paths of ultrapure water circulation in the polishing circulation output unit and EDI circulation of ultrapure water between the EDI unit and the polishing circulation output unit;
(2) the flow of the ultrapure water sent into the EDI circulating water supply unit can be selectively intervened from the second check valve and in a mode of opening the flow regulating branch according to actual requirements;
(3) the cleaning unit regularly cleans the interior of the EDI unit to recover the reliable desalting and deionizing capacity;
(4) the polishing circulation output unit prevents impurities such as carbon dioxide in the air from being dissolved in the ultrapure water by inputting pressurized nitrogen, and keeps continuous circulation in the direction of an output pipeline thereof, thereby preventing the water quality from being degraded due to the fact that the ultrapure water is kept still in the pipeline.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a block diagram of a water quality circulation adjusting device of an EDI system according to the present invention;
FIG. 2 is a schematic pipeline diagram of an EDI unit of the water quality circulation regulating device of the EDI system;
FIG. 3 is a schematic pipeline diagram of a polishing circulation output unit and an EDI circulation water supply unit of the water circulation adjusting device of the EDI system according to the present invention;
fig. 4 is a schematic pipeline diagram of a cleaning unit of the water quality circulation adjusting device of the EDI system according to the utility model.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be obtained by a person skilled in the art without any inventive step based on the embodiments of the present invention, are within the scope of the present invention.
As shown in fig. 1, a water circulation adjusting device of an EDI system is schematically shown, which comprises a reverse osmosis RO water tank for supplying water, an EDI water supply pump, an EDI unit 1, a polishing circulation output unit 2, an EDI circulation water supply unit 3 and a cleaning unit 4; the reverse osmosis RO water tank is communicated with the EDI feed pump; the EDI water supply pump is used for pumping water to the EDI unit 1, and the EDI unit 1 adsorbs and filters ions in the water to obtain ultrapure water from which the ions are removed.
The input end of the EDI unit 1 is communicated with the output end of the EDI water feed pump; one of the output ends of the EDI unit 1 is communicated with the input end of the polishing cycle output unit 2 or the input end of the cleaning unit 4, and the output end of the cleaning unit 4 is selectively communicated with the input end of the EDI unit 1; the cleaning unit 4 can be communicated as required, and concentrated water generated by the EDI unit 1 is treated and regenerated and then is sent back to the input end of the EDI unit 1.
The ultrapure water at the output end of the polishing circulation output unit 2 circulates through the ultrapure water use point and returns to the polishing circulation output unit 2, and the circulation flow is to prevent the water quality deterioration phenomenon caused by standing. The output end of the polishing circulating output unit 2 is also communicated with the input end of the EDI circulating water supply unit 3, and the output end of the EDI circulating water supply unit 3 is communicated with the first water inlet end 141 of the EDI unit 1;
wherein, the flow of the ultrapure water sent into the EDI circulating water supply unit 3 from the output end of the polishing circulating output unit 2 is adjustable. The flow rate of the ultrapure water fed into the EDI unit 1 through the EDI circulating water supply unit 3 can be adjusted as required.
As shown in fig. 2, a specific pipeline connection diagram of an EDI unit is shown. The EDI unit 1 includes a first check valve 11, a first UV ultraviolet irradiation section 12, a first microfilter 13, and an EDI device 14; the input end of the first check valve 11 is communicated with the output end of the EDI water feeding pump; the output end of the first check valve 11 is communicated with the input end of the first UV irradiation part 12, and the output end of the first UV irradiation part 12 is communicated with the input end of the first micro-filter 13; the EDI device 14 is provided with a first water inlet end 141, a first water discharge end 142, a concentrated water discharge port 143 and a cleaning port 144, and the output end of the first micro-filter 13 is communicated with the first water inlet end 141 or the cleaning port 144 of the EDI device 14; the first drain terminal 142 of the EDI device 14 is connected to the input terminal of the polishing cycle output unit 2; the concentrate water discharge port 143 of the EDI device 14 communicates with the cleaning unit 4; the output end of the cleaning unit 4 is selectively communicated with the input end of the first UV ultraviolet irradiation part 12; water fed by the EDI water pump is irradiated by the first UV irradiation part 12 and then fed into the EDI device 14 for treatment, fresh water after treatment is fed into the polishing cycle output unit 2 through the first water discharge end 142, and concentrated water generated by the EDI device 14 is separately discharged through the concentrated water discharge end 143.
When the cleaning unit 4 is operated, the water supply from the reverse osmosis RO water tank to the EDI unit 1 is stopped, and the EDI unit 1 also stops outputting to the polishing cycle output unit 2, but starts the internal circulation. The cleaning unit 4 feeds water containing cleaning liquid into the EDI device 14 through the cleaning port 144, and after internal circulation, cleaning wastewater generated inside the EDI device 14 is discharged through the concentrated water discharge port 143 and the first water discharge port 142, respectively. The first UV ultraviolet irradiation part 12 is used for emitting ultraviolet light with the wavelength of 185nm or 254nm to reduce the content of bacteria and TOC in water. The first drain end 142 of the EDI device 14 is also in selective communication with the input of the cleaning unit 4.
As shown in fig. 3, the polishing cycle output unit 2 includes a nitrogen-sealed water tank 20, a nitrogen gas source 21, a pressure reducing valve 22, a nitrogen gas pressure gauge 23, a two-way breather valve 24, an ultrapure water outward-feeding pump 25, a second check valve 26, a second UV ultraviolet irradiation section 27, a polishing mixed bed 28, and a second micro-filter 29; the water inlet of the nitrogen-sealed water tank 20 is used as the input end of the polishing cycle output unit 2; the top of the nitrogen-sealed water tank 20 is communicated with a nitrogen source 21, an output pipeline of the nitrogen source 21 is provided with a pressure reducing valve 22, and the top of the nitrogen-sealed water tank 20 is also provided with a nitrogen pressure gauge 23 and a two-way breather valve 24; the nitrogen-sealed water tank 20 is also communicated with an input end of an ultrapure water outward conveying pump 25, an output end of the ultrapure water outward conveying pump 25 is respectively communicated with an input end of the EDI circulating water supply unit 3 or an input end of a second UV irradiation part 27 through a second check valve 26, an output end of the second UV irradiation part 27 is communicated with an input end of a polishing mixed bed 28, an output end of the polishing mixed bed 28 is communicated with an input end of a second micro-filter 29, and an output end of the second micro-filter 29 is respectively communicated with a water point for ultrapure water and the nitrogen-sealed water tank 20; the nitrogen-sealed water tank 20 is also provided with an overflow pipe 200, one end of the overflow pipe 200 is communicated with the nitrogen-sealed water tank 20, the other end of the overflow pipe is inserted into the water-sealed pipe, and the liquid level in the water-sealed pipe is over the water outlet of the overflow pipe 200. In order to maintain a relatively sealed environment in the nitrogen-sealed water tank 20, nitrogen gas is injected into the nitrogen-sealed water tank 20, and the pressure of the nitrogen gas source 21 is 0.1 to 0.2MPa, and the nitrogen gas is reduced in pressure by the pressure reducing valve 22 and then introduced into the nitrogen-sealed water tank 20. The nitrogen pressure gauge 23 is used for detecting the pressure in the nitrogen-sealed water tank and whether micro-positive pressure condition is maintained, such as an interval of 0.2-1.2 kPa, and if the air pressure is too high, the air needs to be exhausted by the two-way breather valve 24; if the pressure is too low, gas needs to be supplied to the nitrogen-sealed water tank 20. When the nitrogen source 20 can not normally supply air, the two-way breather valve 24 can be opened, so that the air can enter the nitrogen-sealed water tank 20 in an emergency manner, and the water tank is prevented from being deformed or even damaged. The second UV ultraviolet irradiation part 27 functions in the same manner as the first UV ultraviolet irradiation part 12. The polishing mixed bed 28 is provided therein with an ion exchange resin, and by reverse osmosis RO treatment and irradiation 12 by the UV ultraviolet irradiation part, EDI device 14, second UV ultraviolet irradiation part 27 and polishing mixed bed 28 step-by-step treatment, organic matter can be reduced to 30-50 ppb, and salt ions and the like in water can be removed. In order to prevent deterioration of water quality due to the standing inside of the pipe, the ultrapure water outflow pump 25 is continuously operated to keep the water inside the polishing circulation output unit 2 in a circulating flow state.
Also as shown in fig. 3, in order to prevent the problem that the service life of the polishing mixed bed 28 is affected due to unreliable water quality after the start-up of the EDI unit 1 caused by the intermittent operation of the EDI unit 1, the EDI circulating water supply unit 3 is introduced and participates in the circulation of ultrapure water, the EDI circulating water supply unit 3 includes a diaphragm valve 31 and a third check valve 32, an input end of the diaphragm valve 31 is communicated with an output end of the second check valve 26, an output end of the diaphragm valve 31 is communicated with an input end of the third check valve 32, and an output end of the third check valve 32 is communicated with an output end of the first check valve 11. As can be seen, the water is output from the second check valve 26.
In order to regulate the flow of the EDI circulating water supply unit 3 in a larger flow range, the utility model also comprises a flow regulating branch which is arranged between the nitrogen-sealed water tank 20 and the input end of the diaphragm valve 31; the flow regulation branch comprises an EDI circulating pump 33 and a fourth check valve 34, the input end of the EDI circulating pump 33 is communicated with the nitrogen-sealed water tank 20, the output end of the EDI circulating pump 33 is communicated with the input end of the fourth check valve 34, and the output end of the fourth check valve 34 is selectively communicated with the input end of the diaphragm valve 31. When the flow regulating branch is introduced, the EDI circulating pump 33 and the ultrapure water outward-conveying pump 25 work cooperatively, and the flow sent to the EDI circulating water supply unit 3 is increased by dividing into two pipelines.
As shown in fig. 4, the cleaning unit 4 includes a collection tank 41, a regeneration pump 42, and a third microfilter 43; the input end of the collecting tank 41 is respectively communicated with the first water discharging end 142 or the concentrated water discharging port 143 of the EDI device 14; the collecting tank 41 is also provided with a dosing port; the output end of the collecting tank 41 is communicated with the input end of the regeneration pump 42, the output end of the regeneration pump 42 is respectively communicated with the input end of the collecting tank 41 or the third micro-filter 43, and the output end of the third micro-filter 43 is communicated with the cleaning port 144 of the EDI device 14. The cleaning unit 4 adds a cleaning liquid to the cleaning port 144, the cleaning liquid is discharged to the collection tank 41 through the first drain port 142 or the concentrated water drain port 143 after flowing inside the EDI device 14, and after flocculation, sedimentation, and other processes are performed by adding a treatment chemical to the chemical adding port of the collection tank 41, the cleaning liquid is sent to the collection tank 41 or the third micro filter 43, and is further purified or returned to the cleaning port 144 of the EDI unit 1 until the cleaning of the EDI device 14 is completed.
In order to save energy and reduce energy consumption, the utility model can also be provided with a plurality of frequency converters and controllers, the EDI water supply pump, the ultrapure water circulating pump and the EDI circulating pump 33 are respectively provided with the frequency converters, and the EDI water supply pump, the ultrapure water circulating pump, the EDI circulating pump 33, the frequency converters and the nitrogen pressure gauge 23 are all electrically connected with the controllers.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the utility model, and any modifications, equivalents, improvements and the like that fall within the spirit and principle of the present invention are intended to be included therein.
Claims (8)
1. A water quality circulation adjusting device of an EDI system comprises a reverse osmosis RO water tank for supplying water, an EDI water supply pump and an EDI unit (1), wherein the reverse osmosis RO water tank is communicated with the EDI water supply pump; the EDI water supply pump is used for pumping water to the EDI unit (1), and the EDI unit (1) adsorbs and filters ions in the water to obtain ultrapure water from which the ions are removed; the method is characterized in that: the polishing device also comprises a polishing cycle output unit (2), an EDI cycle water supply unit (3) and a cleaning unit (4);
the input end of the EDI unit (1) is communicated with the output end of the EDI water feed pump; one of the output ends of the EDI unit (1) is connected with the input end of the polishing cycle output unit (2) or the input end of the cleaning unit (4), and the output end of the cleaning unit (4) is selectively communicated with the input end of the EDI unit (1);
ultrapure water output by the polishing cycle output unit (2) circularly flows through an ultrapure water using point and returns to the polishing cycle output unit (2), the output end of the polishing cycle output unit (2) is also communicated with the input end of the EDI cycle water supply unit (3), and the output end of the EDI cycle water supply unit (3) is communicated with the first water inlet end (141) of the EDI unit (1);
the flow of the ultrapure water sent into the EDI circulating water supply unit (3) from the output end of the polishing circulating output unit (2) is adjustable.
2. The EDI system water circulation adjusting device of claim 1, wherein: the EDI unit (1) comprises a first check valve (11), a first UV ultraviolet irradiation part (12), a first microfilter (13) and an EDI device (14); the input end of the first check valve (11) is communicated with the output end of the EDI water feeding pump; the output end of the first check valve (11) is communicated with the input end of a first UV irradiation part (12), and the output end of the first UV irradiation part (12) is communicated with the input end of a first micro filter (13); the EDI device (14) is provided with a first water inlet end (141), a first water discharge end (142), a concentrated water discharge port (143) and a cleaning port (144), and the output end of the first microfilter (13) is communicated with the first water inlet end (141) or the cleaning port (144) of the EDI device (14); the first drain end (142) of the EDI device (14) is connected with the input end of the polishing cycle output unit (2); a concentrated water discharge port (143) of the EDI device (14) is communicated with the input end of the cleaning unit (4); the output end of the cleaning unit (4) is selectively communicated with the cleaning port (144); water fed by an EDI feed water pump is irradiated by a first UV irradiation part (12) and then fed into an EDI device (14) for treatment, treated fresh water is fed into a polishing cycle output unit (2) through a first water discharge end (142), concentrated water generated by the EDI device (14) is fed into a cleaning unit (4) for treatment, and the treated water is circularly input to a cleaning port (144).
3. The EDI system water circulation adjusting device of claim 2, wherein: the first drain end (142) of the EDI device (14) is also in selective communication with the input of the cleaning unit (4).
4. The EDI system water circulation adjusting device of claim 2, wherein: the polishing circulation output unit (2) comprises a nitrogen-sealed water tank (20), a nitrogen source (21), a pressure reducing valve (22), a nitrogen pressure gauge (23), a two-way breather valve (24), an ultrapure water output pump (25), a second check valve (26), a second UV ultraviolet irradiation part (27), a polishing mixed bed (28) and a second micro-filter (29); the water inlet of the nitrogen-sealed water tank (20) is used as the input end of the polishing cycle output unit (2); the top of the nitrogen-sealed water tank (20) is communicated with a nitrogen source (21), an output pipeline of the nitrogen source (21) is provided with a pressure reducing valve (22), and the top of the nitrogen-sealed water tank (20) is also provided with a nitrogen pressure gauge (23) and a two-way breather valve (24); the nitrogen-sealed water tank (20) is also communicated with the input end of an ultrapure water outward conveying pump (25), the output end of the ultrapure water outward conveying pump (25) is respectively communicated with the EDI circulating water supply unit (3) or the input end of a second UV irradiation part (27) through a second check valve (26), the output end of the second UV irradiation part (27) is communicated with the input end of a polishing mixed bed (28), the output end of the polishing mixed bed (28) is communicated with the input end of a second micro-filter (29), and the output end of the second micro-filter (29) is respectively communicated with a water point for ultrapure water and the nitrogen-sealed water tank (20); an overflow pipe (200) is further arranged on the nitrogen-sealed water tank (20), one end of the overflow pipe (200) is communicated with the nitrogen-sealed water tank (20), the other end of the overflow pipe is inserted into the water-sealed pipe, and the liquid level in the water-sealed pipe is over the water outlet of the overflow pipe (200).
5. The EDI system water circulation adjusting device of claim 4, wherein: the EDI circulating water supply unit (3) comprises a diaphragm valve (31) and a third check valve (32), wherein the input end of the diaphragm valve (31) is communicated with the output end of the second check valve (26), the output end of the diaphragm valve (31) is communicated with the input end of the third check valve (32), and the output end of the third check valve (32) is communicated with the output end of the first check valve (11).
6. The EDI system water circulation adjusting device of claim 5, wherein: the device also comprises a flow regulating branch, wherein the flow regulating branch is arranged between the nitrogen-sealed water tank (20) and the input end of the diaphragm valve (31); the flow regulation branch comprises an EDI circulating pump (33) and a fourth check valve (34), the input end of the EDI circulating pump (33) is communicated with the nitrogen-sealed water tank (20), the output end of the EDI circulating pump (33) is communicated with the input end of the fourth check valve (34), and the output end of the fourth check valve (34) is selectively communicated with the input end of the diaphragm valve (31).
7. The EDI system water circulation adjusting device of claim 5, wherein: still include a plurality of converters and controller, EDI water-feeding pump, ultrapure water circulating pump and EDI circulating pump (33) are provided with the converter respectively, and EDI water-feeding pump, ultrapure water circulating pump, EDI circulating pump (33), a plurality of converters and nitrogen pressure table (23) all are connected with controller electric property.
8. The EDI system water circulation adjusting device of claim 3, wherein: the cleaning unit (4) comprises a collecting tank (41), a regeneration pump (42) and a third microfilter (43); the input end of the collecting tank (41) is respectively communicated with a first water discharging end (142) or a concentrated water discharging port (143) of the EDI device (14); a medicine feeding port is also arranged on the collecting tank (41); the output end of the collecting tank (41) is communicated with the input end of a regeneration pump (42), the output end of the regeneration pump (42) is respectively communicated with the input ends of the collecting tank (41) or a third micro-filter (43), and the output end of the third micro-filter (43) is communicated with a cleaning port (144) of the EDI device (14).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122400122.8U CN215975396U (en) | 2021-09-30 | 2021-09-30 | EDI system water quality circulation adjusting device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122400122.8U CN215975396U (en) | 2021-09-30 | 2021-09-30 | EDI system water quality circulation adjusting device |
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| CN215975396U true CN215975396U (en) | 2022-03-08 |
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| CN202122400122.8U Active CN215975396U (en) | 2021-09-30 | 2021-09-30 | EDI system water quality circulation adjusting device |
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2021
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