CN215965242U - Solar-grade silicon wafer purification system and mobile device - Google Patents
Solar-grade silicon wafer purification system and mobile device Download PDFInfo
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- CN215965242U CN215965242U CN202122302525.9U CN202122302525U CN215965242U CN 215965242 U CN215965242 U CN 215965242U CN 202122302525 U CN202122302525 U CN 202122302525U CN 215965242 U CN215965242 U CN 215965242U
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
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Abstract
A solar grade silicon wafer purification system comprising: a body; the body is provided with a containing cavity for placing a silicon wafer; a cleaning unit and an exhaust unit are arranged in the body; the cleaning unit, the containing cavity and the exhaust unit form an airflow channel; the cleaning unit is at least two-stage filtration; the exhaust unit comprises a plurality of exhaust holes, the exhaust holes are provided with closed spaces which can enable the containing cavity to be closed, air flow flowing through the containing cavity when the silicon wafer is placed in the containing cavity can be exhausted firstly, and the containing cavity is closed and the silicon wafer is continuously purified after the cleanliness of the air in the containing cavity is qualified. The utility model also provides a mobile device provided with the purification system. The silicon wafer storage device is simple in structural design, can enable the silicon wafer to be stored in a thousand-level purification environment for a long time, and can automatically judge the air cleanliness in the cavity so as to adjust the cleaning unit to obtain an effective environment suitable for storing the silicon wafer. And a navigation unit and a touch screen control unit are also arranged, so that the intellectualization of the system can be further improved.
Description
Technical Field
The utility model belongs to the technical field of photovoltaic cell production, and particularly relates to a solar-grade silicon wafer purification system and a mobile device provided with the same.
Background
In the existing battery production process, silicon wafer circulation is still manually transferred in an open manner among different processes, and in a texturing process, a diffusion process and a coating process which have higher requirements on the surface of a silicon wafer, the open and bare silicon wafer is easy to cause particle dust to adhere to the surface of the silicon wafer, so that texturing, diffusion or coating of the silicon wafer are not facilitated, small black spots are easy to form due to contamination on the surface, and the conversion efficiency of the battery is directly influenced subsequently.
SUMMERY OF THE UTILITY MODEL
The utility model provides a solar-grade silicon wafer purification system and a mobile device provided with the same, which can solve the technical problem that silicon wafers are easy to be polluted or oxidized in the circulation process in the existing production process.
In order to solve the technical problems, the utility model adopts the technical scheme that:
a solar grade silicon wafer purification system comprising:
a body;
the body is provided with a containing cavity for placing a silicon wafer;
a cleaning unit and an exhaust unit are arranged in the body;
the cleaning unit, the accommodating cavity and the exhaust unit form an airflow channel;
the clean unit is at least two-stage filtration;
the exhaust unit comprises a plurality of exhaust holes, the exhaust holes are provided with closed spaces, the air flow flowing through the containing cavity is exhausted firstly when the silicon wafer is arranged in the containing cavity, and the containing cavity is closed and the silicon wafer is continuously purified after the cleanliness of the gas in the containing cavity is qualified.
Furthermore, the cleaning unit at least comprises a filter screen and a cleaner arranged below the filter screen, and air entering the cleaning unit is filtered by the filter screen, purified by the cleaner and then enters the containing cavity.
Furthermore, the filter screen is of a conical surface structure with a high middle part and a concave periphery, and the included angle of a bus of the filter screen is not less than 120 degrees;
a collecting tank is also arranged at the peripheral edge of the filter screen;
the height of the filter screen is not more than half of the minimum width in the projection graph;
and the filter screen is arranged at the upper section of the body.
Further, the cleaner is a fan filter.
Further, the exhaust holes are all arranged at the lower end part of the body; air exhaust pieces are arranged in at least two of the air exhaust holes, and the number of the air exhaust holes is larger than that of the air exhaust pieces.
Furthermore, a one-way control valve is arranged in each exhaust hole; and the exhaust holes are at least provided with one row and are uniformly arranged along the periphery of the outer wall of the body.
Furthermore, an automatic rolling door is arranged on the body in an aligned mode, and the silicon wafer enters the containing cavity from the rolling door at one end and then is moved out of the rolling door at the other end.
Further, the inside of holding the chamber still is equipped with:
a particle detector for monitoring cleanliness in the cavity;
the temperature and humidity detector is used for monitoring the humidity in the containing cavity; and
and the pressure sensor is used for measuring the air pressure in the cavity.
Further, still be equipped with on the body outer wall:
a control unit for monitoring the cleaning unit and the exhaust unit; and
the navigation unit is used for positioning and identifying the body position in real time;
the control unit is a touch screen control structure;
the navigation unit is a laser SLAM navigation structure;
the control unit is respectively connected with the cleaning unit, the exhaust unit, the rolling door and the navigation unit.
A mobile device is provided with the solar-grade silicon wafer purification system.
The solar-grade silicon wafer purification system designed by the utility model has simple and reasonable structural design, can keep the silicon wafers stored in a thousand-level purification environment for a long time, and can automatically judge the air cleanliness in the cavity so as to adjust the cleaning unit to obtain an effective environment suitable for storing the silicon wafers. In addition, the navigation unit for laser recognition is further arranged, so that the mobile position can be accurately positioned; the touch screen control unit can further improve the intellectualization of the system. The utility model also provides a mobile device provided with the purification system.
Drawings
FIG. 1 is a schematic diagram of a solar grade silicon wafer cleaning system according to one embodiment;
FIG. 2 is a schematic structural diagram of a filter screen according to an embodiment;
FIG. 3 is a circuit diagram of a solar grade silicon wafer cleaning system according to one embodiment.
In the figure:
10. body 20, chamber 30, clean unit
31. A filter screen 32, a cleaner 33, and a collecting tank
40. Exhaust unit 41, exhaust hole 42, and air exhaust member
50. Rolling door 60, control unit 70 and navigation unit
80. Particle detector 90, temperature and humidity detector 100 and pressure sensor
Detailed Description
The utility model is described in detail below with reference to the figures and specific embodiments.
The embodiment provides a solar-grade silicon wafer purification system, as shown in fig. 1, which comprises a body 10, wherein a cavity 20 for placing a silicon wafer is arranged in the body 10, and a cleaning unit 30 and an exhaust unit 40 are also arranged on the body 10. Wherein, the cleaning unit 30, the cavity 20 and the exhaust unit 40 form a circular airflow channel; the cleaning unit 30 is at least two-stage filtration; the exhaust unit 40 comprises a plurality of exhaust holes 41 and exhaust pieces 42, and the number of the exhaust holes 41 is greater than that of the exhaust pieces 42; the exhaust hole 41 is provided to make the cavity 20 a closed space, and to exhaust the gas flow flowing through the cavity 20 when the silicon wafer is placed in the cavity 20, and to close the cavity 20 and continuously purify the silicon wafer after the cleanliness of the gas in the cavity 20 is qualified.
In this embodiment, the body 10 may be a cuboid structure, and certainly may also be a cylindrical structure, as long as the body has a cavity 20 for bearing silicon wafers, wherein at least one layer of silicon wafer baskets may be carried in the cavity 20, and the number of the baskets may be determined according to the size of the cavity 20, which is not specifically limited herein.
The cleaning unit 30 is mainly used for controlling the cleanliness of air entering the cavity 20, and is disposed at the upper end of the body 10, and may be disposed on the upper end surface of the body 10 or on the side wall surface of the body 10. The air cleaner at least comprises a filter screen 31 and a cleaner 32 arranged below the filter screen 31, wherein a placing hole matched with the filter screen 31 is formed in the body 10, and air entering the cleaning unit 30 is firstly filtered by the filter screen 31 and then purified again by the cleaner 32, and then enters the accommodating cavity 20.
As shown in fig. 2, the filter screen 31 is a conical structure with a high middle part and a concave periphery, the outer edge structure of the filter screen 31 is matched with the structure of the fixed placing hole, and can be a square structure or a circular structure, the included angle θ of the bus of the filter screen 31 is not less than 120 °, the height H of the filter screen 31 is not more than half of the minimum width D of the projection area of the filter screen 31, and the purpose is to increase the conical surface area of the filter screen 31 so as to increase the contact area of the filter screen 31 and air; meanwhile, the height of the filter screen 31 is limited to be smaller than the diameter of the end face of the filter screen, so that the path through which air flows can be shortened, the angle of air flow entering the surface of the filter screen 31 from two sides can be dispersed, the resistance of the air flow entering the cavity 20 can be reduced, and the flowing speed of the air flow can be increased.
In order to prevent large particle dust in the air entering the filter screen 31 from accumulating on the surface of the filter screen 31, a collecting groove 33 is further provided at the peripheral edge of the filter screen 31 to collect the particle dust; preferably, the collecting tank 33 is detachably connected to the filter screen 31. Meanwhile, the arrangement of the inclined plane is more beneficial to the particles to roll down along the conical surface, and the effect of passing the air flow can be further improved. The collection at the uniform position is more convenient for collection and treatment, does not influence the whole service performance of the filter screen 31, and can prolong the service life of the filter screen.
In order to improve the cleaning level of air particles entering the cavity 20, a cleaner 32 is further arranged below the filter screen 31, wherein the cleaner 32 is a fan filter, preferably an FFU fan filter, and can automatically suck air and further purify the air filtered by the filter screen 31, so as to improve the cleanliness of the air entering the cavity 20, and the cleanliness of the air entering the cavity 20 reaches over thousands of levels, so as to ensure the cleanliness of silicon wafer transportation and improve the silicon wafer transportation quality.
The exhaust holes 41 are all arranged at the lower end of the body 10, and at least two of the exhaust holes 41 are provided with exhaust members 42, the exhaust members 42 are exhaust fans, preferably, the number of the exhaust holes 41 is larger than that of the exhaust members 42, so that the exhaust unit 40 not only has the function of active exhaust, but also can automatically open more exhaust holes 41 according to the pressure condition in the cavity 20 to complete the exhaust of the airflow in the container 20. That is, when the air pressure in the cavity 20 is large, all the air needs to be exhausted within a set time, and based on the pressure difference and the time, the system can automatically calculate the ventilation area to be opened, so that several exhaust holes 41 can be calculated, and several exhaust holes 41 are randomly selected from the exhaust holes 41 to exhaust the airflow; the redundant vent holes 41 may also be used as an alternative hole for emergency assistance.
In order to ensure the air tightness of the cavity 20, a one-way control valve is arranged in each vent hole 41, so that the whole cavity 20 can form a micro-positive pressure state, even if a drying air pressure difference slightly higher than the atmospheric pressure outside the body 10 is generated inside the cavity 20, moisture, dust and the like in the external environment cannot invade into the cavity 20, the environment in the cavity 20 for storing the silicon wafer is always kept in a clean and dry state, the phenomenon of air leakage is avoided, the surface quality of the silicon wafer is protected, and the sealing performance and the safety of the silicon wafer storage are ensured.
In this embodiment, at least one row of the exhaust holes 41 is provided, and all the exhaust holes 41 are uniformly arranged along the circumference of the outer wall of the body 10. Of course, in order to further improve the exhaust efficiency, two rows of exhaust holes 41 may be provided, and all the exhaust holes 41 may be arranged in parallel or in a staggered manner.
An automatic rolling door 50 which is arranged in an aligned mode is further arranged on the body 10, and the rolling door 50 is of a sealed design structure; preferably, one of the rolling doors 50 is connected with the feed opening in the previous process, the other rolling door 50 is connected with the feed opening in the next process, and the two rolling doors 50 are arranged to enable the silicon wafers to enter the accommodating cavity from the rolling door 50 at one end and then to be moved out from the rolling door 50 at the other end, so that all the silicon wafers are ensured to be in first-out and have traceability.
In order to monitor the cleanliness and the air pressure inside the cavity 20 in real time, a particle detector 80 for monitoring the cleanliness inside the cavity 20, a temperature and humidity detector 90 for monitoring the humidity inside the cavity 20, and a pressure sensor 100 for measuring the air pressure inside the cavity 20 are respectively and sequentially arranged inside the cavity 20, wherein the type of the particle detector 80 can be MET onehpc 2+, which is a thousand-level air particle counter; the temperature and humidity detector 90 and the pressure sensor 100 are conventional components, and are not particularly limited herein.
Further, a touch screen control unit 60 for monitoring the cleaning unit 30 and the exhaust unit 40 and a navigation unit 70 for real-time positioning and identifying the position of the body 10 are further disposed on the outer wall of the body 10, the control unit 60 is disposed on the side wall surface of the body 10, and the navigation unit 70 includes laser SLAM navigations disposed on four side surfaces of the body 10. The control unit 60 is configured as a touch screen, the control unit 60 is connected to the cleaning unit 30, the exhaust unit 40, the shutter 50, the navigation unit 70, the particle detector 80, the temperature and humidity detector 90, and the pressure sensor 100, and accordingly, the circuit connection structure is as shown in fig. 3. The navigation unit 70 can further determine the accurate position of the storage silicon chip device, can flexibly and quickly plan a path autonomously, avoid obstacles autonomously and detour autonomously, and can perform one-time positioning without mechanical secondary positioning. The touch screen control unit can further improve the intellectualization of the system.
In actual operation, before the silicon wafer is placed, filtered air may be introduced into the cavity 20 through the cleaning unit 30 to make the internal air pressure greater than the external atmospheric pressure, and at this time, the exhaust unit 40 is in a closed state. When the rolling door 50 is opened to place the silicon wafer into the cavity 20, the air pressure in the cavity 20 is instantly reduced, and a certain amount of air enters the cavity 20, so that the clean air in the cavity is mixed into the common air; firstly, opening the air exhaust member 42 to exhaust the mixed gas in the cavity 20, and continuously monitoring the cleanliness and the air pressure in the cavity 20 by the particle detector 80, the temperature and humidity detector 90 and the pressure sensor 100 in the cavity 20; when the cleanliness in the cavity 20 reaches the standard requirement, the control unit 60 controls the air exhaust member 42 to stop exhausting air; when the air pressure in the cavity 20 is within the preset air pressure range, the safety of the rectification and purification system can be indicated when the air pressure is qualified, and the silicon wafer is continuously kept in the cavity 20. When the air pressure in the cavity 20 exceeds the upper pre-warning air pressure limit, the control unit 60 controls the air outlet 41 to open, and the air is discharged outwards until the air pressure in the cavity 20 is within the preset air pressure range.
A mobile device is provided with the purification system.
The solar-grade silicon wafer purification system designed by the utility model has simple and reasonable structural design, can keep the silicon wafers stored in a thousand-level purification environment for a long time, and can automatically judge the air cleanliness in the cavity so as to adjust the cleaning unit to obtain an effective environment suitable for storing the silicon wafers. In addition, the navigation unit for laser recognition is further arranged, so that the mobile position can be accurately positioned; the touch screen control unit can further improve the intellectualization of the system.
The embodiments of the present invention have been described in detail, and the description is only for the preferred embodiments of the present invention and should not be construed as limiting the scope of the present invention. All equivalent changes and modifications made within the scope of the present invention shall fall within the scope of the present invention.
Claims (10)
1. A solar grade silicon wafer purification system, comprising:
a body;
the body is provided with a containing cavity for placing a silicon wafer;
a cleaning unit and an exhaust unit are arranged in the body;
the cleaning unit, the accommodating cavity and the exhaust unit form an airflow channel;
the clean unit is at least two-stage filtration;
the exhaust unit comprises a plurality of exhaust holes, the exhaust holes are provided with closed spaces, the air flow flowing through the containing cavity is exhausted firstly when the silicon wafer is arranged in the containing cavity, and the containing cavity is closed and the silicon wafer is continuously purified after the cleanliness of the gas in the containing cavity is qualified.
2. The system of claim 1, wherein the cleaning unit comprises at least a filter screen and a cleaner disposed under the filter screen, and the air entering the cleaning unit is filtered by the filter screen, then purified by the cleaner, and then enters the chamber.
3. The system for purifying the solar-grade silicon wafer according to claim 2, wherein the filter screen is of a conical surface structure with a high middle part and a concave periphery, and the included angle of a bus of the filter screen is not less than 120 degrees;
a collecting tank is also arranged at the peripheral edge of the filter screen;
the height of the filter screen is not more than half of the minimum width in the projection graph;
and the filter screen is arranged at the upper section of the body.
4. The system of claim 2, wherein the cleaning device is a fan filter.
5. The system for purifying a solar-grade silicon wafer as claimed in any one of claims 1 to 4, wherein the exhaust holes are all disposed at the lower end portion of the body; air exhaust pieces are arranged in at least two of the air exhaust holes, and the number of the air exhaust holes is larger than that of the air exhaust pieces.
6. The system for purifying a solar-grade silicon wafer as claimed in claim 5, wherein each exhaust hole is provided with a one-way control valve; and the exhaust holes are at least provided with one row and are uniformly arranged along the periphery of the outer wall of the body.
7. The system as claimed in any one of claims 1 to 4 and 6, wherein an automatic roller shutter is provided on the body, and the silicon wafer is inserted into the cavity from one end and then removed from the roller shutter from the other end.
8. The system for purifying a solar-grade silicon wafer as claimed in claim 7, wherein the inside of the cavity is further provided with:
a particle detector for monitoring cleanliness in the cavity;
the temperature and humidity detector is used for monitoring the humidity in the containing cavity; and
and the pressure sensor is used for measuring the air pressure in the cavity.
9. The system for purifying the solar-grade silicon wafer as claimed in claim 8, wherein the outer wall of the body is further provided with:
a control unit for monitoring the cleaning unit and the exhaust unit; and
the navigation unit is used for positioning and identifying the body position in real time;
the control unit is a touch screen control structure;
the navigation unit is a laser SLAM navigation structure;
the control unit is respectively connected with the cleaning unit, the exhaust unit, the rolling door and the navigation unit.
10. A mobile device equipped with a solar-grade silicon wafer cleaning system as claimed in any one of claims 1 to 9.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122302525.9U CN215965242U (en) | 2021-09-23 | 2021-09-23 | Solar-grade silicon wafer purification system and mobile device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202122302525.9U CN215965242U (en) | 2021-09-23 | 2021-09-23 | Solar-grade silicon wafer purification system and mobile device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215965242U true CN215965242U (en) | 2022-03-08 |
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ID=80464541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202122302525.9U Active CN215965242U (en) | 2021-09-23 | 2021-09-23 | Solar-grade silicon wafer purification system and mobile device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215965242U (en) |
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2021
- 2021-09-23 CN CN202122302525.9U patent/CN215965242U/en active Active
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