CN215871283U

CN215871283U - A monocrystalline silicon wafer with adaptive light angle

Info

Publication number: CN215871283U
Application number: CN202122245849.3U
Authority: CN
Inventors: 霍育强
Original assignee: Chizhou Shoukai New Material Co ltd
Current assignee: Chizhou Shoukai New Material Co ltd
Priority date: 2021-09-16
Filing date: 2021-09-16
Publication date: 2022-02-18
Anticipated expiration: 2031-09-16

Abstract

The utility model discloses a monocrystalline silicon piece with a self-adaptive incident angle, which relates to the technical field of monocrystalline silicon pieces and comprises a main body of the silicon piece, wherein one side of the main body is provided with a telescopic rod for rotating the angle of the main body, the telescopic rod comprises a first sleeve and a second sleeve, the interior of the second sleeve is provided with a heated expansion object, the second sleeve is sleeved and installed on the outer side wall of the first sleeve, the upper end of the first sleeve is fixedly provided with a light-gathering tube, a convex lens for gathering light is fixedly installed above the light-gathering tube, a transparent column for enabling light gathered by the convex lens to penetrate into the second sleeve is installed in the first sleeve, the sunlight is collected through the convex lens, the light is introduced into the second sleeve through the transparent column, so that the temperature in the second sleeve is raised, the heated expansion object in the second sleeve expands, the first sleeve moves upwards, and further, the angle of the main body is changed, and the problem that the conventional monocrystalline silicon wafer cannot receive illumination by changing the angle in a self-adaptive manner is solved.

Description

Monocrystalline silicon piece with self-adaptive incident angle

Technical Field

The utility model relates to the technical field of monocrystalline silicon wafers, in particular to a monocrystalline silicon wafer with a self-adaptive incident angle.

Background

Monocrystalline silicon has the highest efficiency in conversion in a solar cell, so that the monocrystalline silicon is mainly used for components of a solar photovoltaic panel, is positioned on the surface of the solar photovoltaic panel and is used for receiving sunlight irradiation for conversion, but the conventional monocrystalline silicon wafer cannot be used for receiving the sunlight irradiation by changing the angle in a self-adaptive manner, and in order to solve the problems, the monocrystalline silicon wafer with the self-adaptive incident angle is provided.

SUMMERY OF THE UTILITY MODEL

The utility model aims to provide a monocrystalline silicon piece with a self-adaptive incident angle, so as to solve the problems in the background technology.

In order to achieve the purpose, the utility model provides the following technical scheme: the utility model provides a monocrystalline silicon piece of self-adaptation incident angle, including the main part of silicon chip, one side of main part is provided with the telescopic link that is used for rotating the main part angle, the telescopic link includes first sleeve and the inside second sleeve that is equipped with the thermal expansion thing, the lateral wall at first sleeve is installed in second sleeve cup joint, first telescopic upper end fixed mounting has a spotlight section of thick bamboo, the top fixed mounting of spotlight section of thick bamboo has the convex lens that is used for the spotlight, install the transparent post that is used for in the light second sleeve with the convex lens gathering in the first sleeve, with sunshine gathering through convex lens, introduce light in the second sleeve through transparent post, make temperature rise in the second sleeve, the thermal expansion thing swell in the second sleeve, make first sleeve rebound, and then change the angle of main part.

Preferably, the lower end of the main body is provided with a frame for fixing the main body, a base for supporting the whole is arranged below the frame, the main body is fixed and protected by the frame, and the whole monocrystalline silicon wafer is supported by the base.

Preferably, a supporting plate for supporting the frame is fixedly installed in the middle of the upper end of the base, and the telescopic rod is fixedly installed on one side of the upper end of the base and is regulated through the base by supporting the frame through the supporting plate.

Preferably, both ends fixedly connected with carriage below the frame, slidable mounting has the litter that is used for the frame gliding between two carriages, and the litter rotates and installs the upper end at the backup pad, moves at the carriage through the litter, conveniently rotates the frame.

Preferably, a rotating shaft facilitating rotation of the frame is fixedly installed at a joint between the upper end of the outer side wall of the first sleeve and one side of the frame, and the main body is further conveniently rotated through the rotating shaft.

Preferably, a hinge for rotating the slide rod is fixedly arranged at the joint between the lower end of the slide rod and the upper end of the support plate, and the slide rod is convenient to rotate through the hinge.

Preferably, the lower extreme fixedly connected with of second sleeve is used for carrying out heat conduction with temperature in the second sleeve and leads the warm pole, leads the upper end fixed mounting of warm pole in the telescopic inside wall of second, makes the inside temperature of second sleeve reduce rapidly when not having the sunshine through leading the warm pole.

Compared with the prior art, the utility model has the beneficial effects that:

according to the utility model, the telescopic rod for rotating the angle of the main body is arranged on one side of the main body, the telescopic rod comprises a first sleeve and a second sleeve in which a thermal expansion object is arranged, the second sleeve is sleeved on the outer side wall of the first sleeve, the upper end of the first sleeve is fixedly provided with the light-gathering tube, the convex lens for gathering light is fixedly arranged above the light-gathering tube, the first sleeve is internally provided with the transparent column for penetrating the light gathered by the convex lens into the second sleeve, the sunlight is gathered by the convex lens, the light is introduced into the second sleeve by the transparent column, so that the temperature in the second sleeve is raised, and the thermal expansion object in the second sleeve is expanded, so that the first sleeve moves upwards, the angle of the main body is changed, and the problem that the existing monocrystalline silicon wafer cannot be self-adaptively changed to receive illumination is solved.

Drawings

FIG. 1 is an overall exploded view of the present invention;

FIG. 2 is a schematic view of the overall structure of the present invention;

FIG. 3 is a cross-sectional view of the telescoping pole of the present invention;

FIG. 4 is a schematic view of the structure of the support plate of the present invention.

In the figure: 1. a main body; 11. a base; 2. a frame; 21. a rotating shaft; 22. a carriage; 3. a telescopic rod; 31. a first sleeve; 311. a transparent column; 32. a second sleeve; 4. a support plate; 41. a slide rod; 42. a hinge; 5. a light-gathering cylinder; 51. a convex lens; 6. a temperature conducting rod.

Detailed Description

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

Example 1

Referring to fig. 1-4, the present embodiment provides a monocrystalline silicon wafer with an adaptive incident angle, which includes a main body 1 of the monocrystalline silicon wafer, and a frame 2 is fixedly mounted at a lower end of the main body 1.

Wherein, the upper end of frame 2 is seted up and is used for installing the groove of main part 1, strengthens the protection of main part 1 through frame 2, increases the bulk strength of main part 1, and frame 2 preferably adopts high temperature resistant plastics material.

One end of the frame 2 is rotatably connected with a telescopic rod 3 which can be extended by sunlight irradiation.

The telescopic rod 3 comprises a first sleeve 31 and a second sleeve 32, a hole for installing the first sleeve 31 is formed in the upper end of the second sleeve 32, and the first sleeve 31 is slidably installed in the hole.

The first sleeve 31 and the second sleeve 32 are both hollow cylinders, the transparent column 311 is fixedly mounted inside the first sleeve 31, the first sleeve 31 and the second sleeve 32 are mutually communicated, and the first sleeve 31 and the second sleeve 32 are filled with thermal expansion materials.

The upper end of the first sleeve 31 is provided with a convex lens 51, and the upper end of the first sleeve 31 is fixedly provided with a condensing cylinder 5 for fixedly supporting the convex lens 51.

Wherein, transparent post 311 is preferred to adopt transparent toughened glass material, and the resistance to compression is corrosion-resistant when the light transmissivity is good, and the thing that expands when being heated is preferred to be set up to mercury, and the expansion ratio is great when receiving high temperature.

The convex lens 51 is used for focusing sunlight, the focused sunlight irradiates the second sleeve 32 through the transparent column 311, the inside of the second sleeve 32 is heated by illumination, and the heated expansion object expands to jack the first sleeve 31 to extend out of the second sleeve 32.

For better light exposure to the heat dilatant, the inner wall of the first sleeve 31 is preferably provided as a mirror surface.

The upper end of the outer side wall of the first sleeve 31 is connected with the frame 2, and a rotating shaft 21 is arranged at the connecting part of the first sleeve 31 and the frame 2.

Make frame 2 rotate in one side of telescopic link 3 through pivot 21 convenience, telescopic link 3 extension back drives frame 2 one side and risees, and then rotates frame 2 and makes the change appear in main part 1 angle.

In order to make the frame 2 more stable in rotation, the telescopic rod 3 is provided in plurality, preferably two.

To be able to support the frame 2, a support plate 4 is mounted to the lower end of the frame 2.

Wherein, the sliding rack 22 is fixedly arranged on both sides of the lower end of the frame 2, the opposite surface of the sliding rack 22 is provided with a sliding chute, and a sliding rod 41 is arranged in the sliding chute in a sliding way.

A hinge 42 is provided at a connecting portion between the slide bar 41 and the support plate 4, and the slide bar 41 is rotatably mounted on the upper end of the support plate 4 via the hinge 42.

The base 11 is fixedly arranged at the lower ends of the supporting plate 4 and the telescopic rod 3, the base 11 supports the whole structure, and the whole structure is fixed through the installation base 11.

The angle of frame 2 under the normal atmospheric temperature state is changed to the backup pad 4 of accessible change co-altitude, and the angle when frame 2 normal atmospheric temperature is adjusted according to the installation ground illumination position.

The height of one end of the frame 2, which is far away from the telescopic rod 3, is greater than or equal to that of one end of the frame 2, which is connected with the telescopic rod 3, at normal temperature, and the inclined plane of the frame 2 preferably faces the rising direction of the sun.

When sunlight irradiates on the convex lens 51, the temperature inside the telescopic rod 3 increases, so that the telescopic rod 3 extends, the frame 2 is driven to rotate through the rotating shaft 21, the frame 2 can rotate above the supporting plate 4 through the hinge 42, and the sliding rod 41 slides towards one end far away from the telescopic rod 3 between the sliding frames 22 during rotation.

Example 2

Referring to fig. 1-3, a further improvement is made on the basis of embodiment 1:

when arriving at night, sunshine disappears the back, in order to make the inside temperature of telescopic link 3 reduce fast, the lower extreme of second sleeve 32 is provided with leads temperature pole 6.

The upper end of the temperature conducting rod 6 is of a cylindrical structure and is connected to the inner side wall of the second sleeve 32, the lower end of the temperature conducting rod 6 is preferably buried in the ground, and the lower end is further connected with a radiating fin.

The heat inside the telescopic rod 3 is conducted to the ground through the temperature conducting rod 6, so that the effect of internal heat dissipation is achieved, and the temperature conducting rod 6 is preferably made of an anti-oxidation and anti-corrosion alloy aluminum material, certainly, the material is not limited to the alloy aluminum material, and alloy copper and the like can also be adopted.

Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.

Claims

1. A monocrystalline silicon wafer with an adaptive angle of attack, comprising a main body (1) of the silicon wafer, characterized in that: one side of the main body (1) is provided with a telescopic rod (1) for rotating the angle of the main body (1). 3), the telescopic rod (3) includes a first sleeve (31) and a second sleeve (32) with a heated expansion material inside, and the second sleeve (32) is sleeved and installed on the first sleeve. The outer side wall of the tube (31), the upper end of the first sleeve (31) is fixedly installed with a condensing tube (5), and a convex lens (51) for light-condensing is fixedly installed above the light collecting tube (5) A transparent column (311) for transmitting the light collected by the convex lens (51) into the second sleeve (32) is installed in the first sleeve (31).

2 . The monocrystalline silicon wafer with adaptive light attack angle according to claim 1 , wherein a frame ( 2 ) for fixing the main body ( 1 ) is installed on the lower end of the main body ( 1 ), and the A base (11) for supporting the whole is arranged below the frame (2).

3 . The monocrystalline silicon wafer with an adaptive light angle according to claim 2 , wherein a support plate ( 4 ) for supporting the frame ( 2 ) is fixedly installed in the middle of the upper end of the base ( 11 ). 4 . , the telescopic rod (3) is fixedly installed on the upper end side of the base (11).

4 . The monocrystalline silicon wafer with adaptive light attack angle according to claim 3 , characterized in that: the lower ends of the frame ( 2 ) are fixedly connected with sliding frames ( 22 ), and the two sliding frames A sliding rod (41) for sliding the frame (2) is slidably installed between (22), and the sliding rod (41) is rotatably mounted on the upper end of the support plate (4).

5 . The monocrystalline silicon wafer with an adaptive light attack angle according to claim 4 , wherein the connection between the lower end of the sliding rod ( 41 ) and the upper end of the support plate ( 4 ) is fixedly installed with a device for rotating. 6 . The hinge (42) of the sliding rod (41).

6 . The monocrystalline silicon wafer with adaptive light attack angle according to claim 4 , wherein the upper end of the outer side wall of the first sleeve ( 31 ) is connected with one side of the frame ( 2 ). 7 . A rotating shaft (21) that facilitates the rotation of the frame (2) is fixedly installed at the position.

7. The monocrystalline silicon wafer with an adaptive light angle of attack according to claim 1, wherein the lower end of the second sleeve (32) is fixedly connected with a The temperature is conducted to conduct heat and a temperature guide rod (6), and the upper end of the temperature guide rod (6) is fixedly installed in the inner side wall of the second sleeve (32).