CN215696180U

CN215696180U - Cleaning machine is used in polycrystalline silicon production

Info

Publication number: CN215696180U
Application number: CN202120862583.4U
Authority: CN
Inventors: 杨超; 李海林; 沙浩
Original assignee: Qujing Sunshine Energy Silicon Material Co ltd
Current assignee: Qujing Sunshine New Energy Co ltd
Priority date: 2021-04-25
Filing date: 2021-04-25
Publication date: 2022-02-01
Anticipated expiration: 2031-04-25

Abstract

The utility model discloses a cleaning machine for polycrystalline silicon production, which solves the problems of degumming and low cleaning efficiency after polycrystalline silicon slicing is finished, and the technical scheme is as follows: still include conveyer, conveyer is provided with the mount, the mount bottom is provided with the bracket, be provided with the lift cylinder between bracket and the mount, the steerable bracket of lift cylinder reciprocates, the bracket side be provided with and drive actuating cylinder, the steerable bracket horizontal migration of actuating cylinder drives, the groove of degumming be connected with the drain pump, just there are a plurality of washing heads in the groove of degumming sets up, washing head and drain pump intercommunication, the inside guide plate that is provided with of washing head, the guide plate is the heliciform and distributes in the washing head inner wall. The purposes of high-efficiency degumming and cleaning are achieved.

Description

Cleaning machine is used in polycrystalline silicon production

Technical Field

The utility model belongs to the technical field of cleaning equipment, and particularly relates to a cleaning machine for polycrystalline silicon production.

Background

In the monocrystalline silicon piece course of working, silicon rod after the rounding completion need carry out the processing of cutting into slices, before carrying out the processing of cutting into slices, need glue the silicon rod on the work piece board, later carry out the processing of cutting into slices, it still glues in the work piece board still to form the monocrystalline silicon piece after the completion of cutting into slices, need separate silicon piece and work piece board with hot water, later to remaining colloid and the piece production sweeps on the monocrystalline silicon piece clear up, however, current degumming and the bits of removing are respectively accomplished by degumming agent soaking and ultrasonic cleaning two kinds of modes, wherein, degumming agent soak time is longer, and after removing the completion of gluing, need the manual work to put into ultrasonic cleaning tank with the silicon piece and remove the bits, whole process consumption time is longer, influence production efficiency.

Disclosure of Invention

Aiming at the defects in the prior art, the utility model aims to provide a cleaning machine for producing polycrystalline silicon, which can clean the polycrystalline silicon efficiently.

The purpose of the utility model is realized as follows: the utility model provides a cleaning machine is used in polycrystalline silicon production, includes degumming tank and ultrasonic cleaning tank, still includes conveyer, conveyer is provided with the mount, the mount bottom is provided with the bracket, be provided with the lift cylinder between bracket and the mount, the steerable bracket of lift cylinder reciprocates, the bracket side be provided with and drive actuating cylinder, the steerable bracket horizontal migration of actuating cylinder drives, the degumming tank be connected with the priming pump, just the degumming tank has a plurality of washing heads in setting up, washing head and priming pump intercommunication, the inside guide plate that is provided with of washing head, the guide plate is the heliciform and distributes in washing head inner wall.

The utility model is further optimized as follows: the liquid guide pump is positioned outside the degumming tank, one end of the washing head extends out of the degumming tank, and the liquid guide pump is communicated with the washing head through a liquid guide pipe.

The utility model is further optimized as follows: and an isolation bin is arranged outside the degumming tank, and the liquid guide pump and the liquid guide pipe are arranged in the isolation bin.

The utility model is further optimized as follows: the mount bottom surface is provided with the slide, it has the slide to inlay in the slide, lift cylinder installs in the slide bottom, it is connected with the slide side to drive actuating cylinder.

The utility model is further optimized as follows: the base is arranged at the bottom of the degumming tank and the ultrasonic cleaning tank, and the fixing frame is fixedly connected with the base.

The utility model is further optimized as follows: the back flushing heads are uniformly distributed on the top of one side of the degumming tank.

Compared with the prior art, the utility model has the outstanding and beneficial technical effects that: according to the utility model, the washing head is additionally arranged in the degumming tank, so that the silicon wafer can be washed in the soaking process, the degumming efficiency is accelerated, and meanwhile, the guide plates spirally distributed in the washing head can act on the soaking liquid led out by the liquid guide pump, so that the soaking liquid forms turbulence after being led out, and the washing effect is increased;

meanwhile, the conveying device is additionally arranged between the degumming tank and the ultrasonic cleaning tank, so that the silicon wafer can be placed on the bracket, and after the degumming is completed, the conveying device can directly move the silicon wafer into the ultrasonic cleaning tank, so that the conveying efficiency is improved.

Drawings

FIG. 1 is a schematic structural view of the present invention;

FIG. 2 is a schematic view of the structure of the degumming tank according to the present invention;

fig. 3 is a schematic view of the flushing head structure of the present invention.

In the figure: 1. a degumming tank; 2. an ultrasonic cleaning tank; 3. a fixed mount; 4. a bracket; 5. a lifting cylinder; 6. a driving cylinder; 7. a liquid guiding pump; 8. a rinsing head; 9. a baffle; 10. a catheter; 11. a slideway; 12. a slide base; 13. a base; 14. and (4) isolating the bin.

Detailed Description

In order to make those skilled in the art better understand the technical solution of the present invention, the following description, with reference to the drawings in the embodiments of the present invention, clearly and completely describes the technical solution in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present invention without making any creative effort, shall fall within the protection scope of the present invention.

Referring to the attached drawings 1-3, the embodiment provides a cleaning machine for polysilicon production, which comprises a degumming tank 1 and an ultrasonic cleaning tank 2, wherein a soaking solution is arranged in the degumming tank 1 and used for removing residual colloid on the surface of a silicon wafer, the ultrasonic cleaning tank 2 is used for cleaning the degummed silicon wafer and removing residual scraps between the silicon wafers in the slicing process, the tops of the degumming tank 1 and the ultrasonic cleaning tank 2 are provided with a conveying device, the conveying device is provided with a fixing frame 3, the bottoms of the degumming tank 1 and the ultrasonic cleaning tank 2 are provided with a base 13, the fixing frame 3 is welded with the base 13, the bottom of the fixing frame 3 is provided with a bracket 4, the bracket 4 is used for placing the silicon wafer, the bottom of the fixing frame 3 is provided with a slide 11, the slide 11 is horizontally arranged, a slide 12 is embedded in the slide 11, and the slide 12 can slide in the slide 11, the utility model discloses a slide 12, including slide 12, mount 3, the steerable bracket 4 of lift cylinder 5, the side of slide 12 is provided with and drives actuating cylinder 6, drives actuating cylinder 6 and is connected with slide 12 side, drive and drive the steerable slide 12 of actuating cylinder and remove in slide 11, drive bracket 4 horizontal migration, the mount is installed in lift cylinder 5 bottom, and the steerable bracket 4 of lift cylinder 5 reciprocates, 12 sides of slide are provided with and drive actuating cylinder 6, drive actuating cylinder 6 and are connected with slide 12 side, drive and drive actuating cylinder 6 and steerable slide 12 and remove in slide 11.

The degumming tank 1 is connected with a liquid guide pump 7, the degumming tank 1 is internally provided with a plurality of flushing heads 8, the back flushing heads are uniformly distributed at the top of one side of the degumming tank 1, the flushing heads 8 are communicated with the liquid guide pump 7, a guide plate 9 is arranged inside the flushing heads 8, the guide plate 9 is spirally distributed on the inner wall of the flushing head 8, the spiral guide plate 9 can act on the soaking liquid led out by the liquid guide pump 7 to form turbulent flow after the soaking liquid is led out, the flushing effect is improved, the liquid guide pump 7 is positioned outside the degumming tank 1, one end of the flushing head 8 extends out of the degumming tank 1, the liquid guide pump 7 is communicated with the flushing head 8 through a liquid guide pipe 10, an isolation bin 14 is arranged outside the degumming tank 1, the liquid guide pump 7 and the liquid guide pipe 10 are arranged in the isolation bin 14, and an isolation cover can effectively protect the liquid guide pump 7 and the liquid guide pipe 10.

When the ultrasonic cleaning device works, a silicon wafer to be cleaned is placed in the bracket 4, the lifting cylinder 5 controls the bracket 4 to descend and dip into the degumming tank 1, then the liquid guide pump 7 guides a soaking liquid into the washing head 8 from the degumming tank 1, the silicon wafer is washed under the action of the guide plate 9 to assist the degumming of the silicon wafer, after the degumming is completed, the lifting cylinder 5 drives the bracket 4 to ascend, then the driving cylinder 6 drives the sliding seat 12 and the bracket 4 to horizontally move, and after the silicon wafer moves to the top of the ultrasonic cleaning tank 2, the lifting cylinder 5 drives the bracket 4 to descend and enter the ultrasonic cleaning tank 2 to be subjected to scrap removal treatment.

The above embodiments are only preferred embodiments of the present invention, and the protection scope of the present invention is not limited thereby, so: all equivalent changes made according to the structure, shape and principle of the utility model are covered by the protection scope of the utility model. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the utility model herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the utility model.

Claims

1. A cleaning machine for polysilicon production, which comprises a degumming tank (1) and an ultrasonic cleaning tank (2), it is characterized by also comprising a conveying device which is provided with a fixed frame (3), a bracket (4) is arranged at the bottom of the fixed frame (3), a lifting cylinder (5) is arranged between the bracket (4) and the fixed frame (3), the lifting cylinder (5) can control the bracket (4) to move up and down, a driving cylinder (6) is arranged on the side surface of the bracket (4), the driving cylinder (6) can control the bracket (4) to move horizontally, the degumming tank (1) is connected with a liquid guide pump (7), a plurality of washing heads (8) are arranged in the degumming tank (1), the flushing head (8) is communicated with the liquid guide pump (7), a guide plate (9) is arranged in the flushing head (8), the guide plates (9) are spirally distributed on the inner wall of the flushing head (8).

2. The cleaning machine for polysilicon production according to claim 1, wherein the liquid guide pump (7) is located outside the degumming tank (1), one end of the washing head (8) extends out of the degumming tank (1), and the liquid guide pump (7) is communicated with the washing head (8) through a liquid guide pipe (10).

3. The cleaning machine for polysilicon production according to claim 2, wherein a separation bin (14) is arranged outside the degumming tank (1), and the liquid guide pump (7) and the liquid guide pipe (10) are arranged in the separation bin (14).

4. The cleaning machine for polysilicon production according to claim 1, wherein a slide (11) is arranged on the bottom surface of the fixed frame (3), a slide seat (12) is embedded in the slide (11), the lifting cylinder (5) is installed at the bottom of the slide seat (12), and the driving cylinder (6) is connected with the side surface of the slide seat (12).

5. The cleaning machine for polysilicon production according to claim 1, wherein a base (13) is provided at the bottom of the degumming tank (1) and the ultrasonic cleaning tank (2), and the fixing frame (3) is fixedly connected with the base (13).

6. The cleaning machine for polysilicon production according to claim 1, wherein the backflushing heads are uniformly distributed on the top of one side of the degumming tank (1).