CN215613640U - Semiconductor wafer crystal cleaning tank - Google Patents
Semiconductor wafer crystal cleaning tank Download PDFInfo
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- CN215613640U CN215613640U CN202120641916.0U CN202120641916U CN215613640U CN 215613640 U CN215613640 U CN 215613640U CN 202120641916 U CN202120641916 U CN 202120641916U CN 215613640 U CN215613640 U CN 215613640U
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Abstract
The utility model discloses a semiconductor wafer crystal cleaning tank which comprises a supporting mechanism, a telescopic fixing mechanism, a sliding matching mechanism and a side fixing mechanism, wherein the sliding matching mechanism is arranged on the inner side of the supporting mechanism, the side fixing mechanisms are arranged on two sides of the sliding matching mechanism, the inner side of the side fixing mechanism is connected with a cleaning basket mechanism, and the telescopic fixing mechanism is arranged at the front end of the sliding matching mechanism. The utility model utilizes the matching of the sliding matching mechanism and the cleaning basket mechanism, can quickly match and connect the matching valve and the matching joint, thereby cleaning the semiconductor wafer by utilizing the cleaning basket mechanism, utilizes the side fixing mechanism to match the cleaning basket mechanism, thereby ensuring the stability when placing the cleaning basket mechanism, and then provides the transverse supporting force when utilizing the sliding matching mechanism to connect with the cleaning basket mechanism.
Description
Technical Field
The utility model relates to the field of semiconductor wafer cleaning, in particular to a semiconductor wafer cleaning tank.
Background
Semiconductor wafers need to undergo cleaning during the production process to achieve the effects of removing photoresist, removing etching solution, cleaning the surface, and the like. When semiconductor wafers are cleaned, two cleaning modes are adopted, wherein one cleaning mode is that the semiconductor wafers are cleaned by one piece, and the other cleaning mode is that the semiconductor wafers are placed in a semiconductor wafer box for transportation and cleaning.
The cassette transport and cleaning method is increasingly adopted by wafer manufacturers due to its high efficiency. However, since the wafers are placed in the wafer cassette in a row, the smaller the gap between the wafers is, the more wafers can be accommodated, but when the gap is too small, the flow of the cleaning liquid is blocked, and the cleaning becomes difficult, and thus a wafer cleaning method capable of improving the cleaning effect is required.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to a semiconductor wafer cleaning tank for solving the above problems.
The utility model realizes the purpose through the following technical scheme:
a semiconductor wafer crystal cleaning tank comprises a supporting mechanism, a telescopic fixing mechanism, a sliding fit mechanism and a side fixing mechanism, wherein the sliding fit mechanism is arranged on the inner side of the supporting mechanism, the side fixing mechanisms are arranged on two sides of the sliding fit mechanism, the inner side of the side fixing mechanism is connected with a cleaning basket mechanism, and the telescopic fixing mechanism is mounted at the front end of the sliding fit mechanism;
the supporting mechanism comprises a sealing box, a base, a bottom bushing plate and a water return pipe assembly, the lower end of the sealing box is connected with the base, the bottom bushing plate is arranged in the sealing box, the water return pipe assembly is arranged at the lower end of the bottom bushing plate, and an electric sealing cover is arranged at the upper end of the sealing box;
the telescopic fixing mechanism comprises a telescopic cylinder, a limiting rod and limiting sleeves, the telescopic cylinder is connected to the upper front end of the seal box, four limiting sleeves are uniformly arranged on the outer side of the telescopic cylinder, the limiting rod is connected to the limiting sleeves, and one ends of the telescopic cylinder and the limiting rod are connected to the sliding fit mechanism;
the sliding fit mechanism comprises a sliding water distribution seat, bottom sliding rails and a fit valve, the lower end of the sliding water distribution seat is connected with the two bottom sliding rails, and the rear end of the sliding water distribution seat is connected with the fit joint through the fit valve;
the side fixing mechanism comprises a side limiting slide rail and a side limiting groove, and the side limiting slide rail is arranged at two ends inside the sealing box.
Preferably, according to the semiconductor wafer crystal cleaning tank disclosed by the utility model, the sealing box is connected with the base through bolts, and the bottom bushing is connected with the sealing box through screws.
Preferably, according to the semiconductor wafer crystal cleaning tank disclosed by the utility model, the telescopic cylinder is connected with the seal box through a bolt, the limiting rod is connected with the limiting sleeve in a sliding manner, the other end of the limiting rod is connected with the sliding water distribution seat through a bolt, and the limiting sleeve is connected with the seal box through a bolt.
Preferably, according to the semiconductor wafer crystal cleaning tank disclosed by the utility model, the bottom slide rail is connected with the bottom bushing plate through a bolt, the sliding water distribution seat is connected with the bottom slide rail in a sliding manner, and the matching valve is connected with the sliding water distribution seat through a thread.
Preferably, the semiconductor wafer crystal cleaning tank of the utility model, the matching valve is provided with a matching groove, and a sealing ring is installed in the groove.
Preferably, according to the semiconductor wafer crystal cleaning tank disclosed by the utility model, the side limit slide rail is connected with the seal box through a bolt, and the top of the side limit groove is provided with a chamfer.
Compared with the prior art, the utility model has the following beneficial effects:
1. the sliding fit mechanism is matched with the cleaning basket mechanism, so that the matching valve and the matching connector can be quickly matched and connected, and the cleaning basket mechanism is used for cleaning the semiconductor wafer;
2. utilize side fixed establishment cooperation washing basket mechanism to guarantee stability when placing washing basket mechanism, then provide horizontal holding power when utilizing sliding fit mechanism to be connected with washing basket mechanism.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
FIG. 1 is a schematic view of a semiconductor wafer cleaning tank according to the present invention;
FIG. 2 is a schematic structural view of a retractable fixing mechanism of the semiconductor wafer cleaning tank according to the present invention;
FIG. 3 is a schematic diagram of a sliding water distribution base of the semiconductor wafer cleaning tank according to the present invention;
FIG. 4 is a schematic view of a bottom slide rail structure of the semiconductor wafer cleaning tank according to the present invention;
FIG. 5 is a schematic diagram of a matching valve structure of a semiconductor wafer cleaning tank according to the present invention.
The reference numerals are explained below:
1. a support mechanism; 2. a telescopic fixing mechanism; 3. a sliding fit mechanism; 4. a side fixing mechanism; 5. a cleaning basket mechanism; 11. a sealing box; 12. a base; 13. a bottom bushing; 14. a water return pipe assembly; 15. an electric sealing cover; 21. a telescopic cylinder; 22. a limiting rod; 23. a limiting sleeve; 31. sliding the water distribution seat; 32. a bottom slide rail; 33. a mating valve; 41. a side limit slide rail; 42. a side limit groove; 51. a basket body side plate; 52. supporting a tube; 53. a mating joint; 54. and (4) a support column.
Detailed Description
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed and operated in a particular orientation, and thus, are not to be construed as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The utility model will be further described with reference to the accompanying drawings in which:
example 1
As shown in fig. 1-5, a semiconductor wafer cleaning tank comprises a supporting mechanism 1, a telescopic fixing mechanism 2, a sliding fit mechanism 3 and a side fixing mechanism 4, wherein the inner side of the supporting mechanism 1 is provided with the sliding fit mechanism 3, the two sides of the sliding fit mechanism 3 are provided with the side fixing mechanisms 4, the inner sides of the side fixing mechanisms 4 are connected with a cleaning basket mechanism 5, and the front end of the sliding fit mechanism 3 is provided with the telescopic fixing mechanism 2;
the cleaning basket mechanism 5 comprises basket body side plates 51, support pipes 52, matched joints 53 and support columns 54, six support pipes 52 are arranged between the two basket body side plates 51, the matched joints 53 are connected to the front ends of the support pipes 52, and the support columns 54 are arranged on the inner side surfaces of the support pipes 52;
the supporting mechanism 1 comprises a sealing box 11, a base 12, a bottom bushing 13 and a water return pipe assembly 14, wherein the lower end of the sealing box 11 is connected with the base 12, the bottom bushing 13 is arranged inside the sealing box 11, the water return pipe assembly 14 is arranged at the lower end of the bottom bushing 13, and an electric sealing cover 15 is arranged at the upper end of the sealing box 11;
the telescopic fixing mechanism 2 comprises a telescopic cylinder 21, a limiting rod 22 and a limiting sleeve 23, the telescopic cylinder 21 is connected to the upper front end of the seal box 11, four limiting sleeves 23 are uniformly arranged on the outer side of the telescopic cylinder 21, the limiting rod 22 is connected to the limiting sleeve 23, and one ends of the telescopic cylinder 21 and the limiting rod 22 are connected to the sliding fit mechanism 3;
the sliding matching mechanism 3 comprises a sliding water distribution seat 31, bottom sliding rails 32 and a matching valve 33, the lower end of the sliding water distribution seat 31 is connected with the two bottom sliding rails 32, and the rear end of the sliding water distribution seat 31 is connected with a matching joint 53 through the matching valve 33;
the side fixing mechanism 4 comprises a side limiting slide rail 41 and a side limiting groove 42, the side limiting groove 42 is arranged between the side limiting slide rail 41 and the basket body side plate 51, and the side limiting slide rail 41 is installed at two ends inside the seal box 11.
Preferably: the seal box 11 is connected with the base 12 through bolts, the bottom bushing 13 is connected with the seal box 11 through bolts, the seal box 11 plays a role in sealing and supporting, and the bottom bushing 13 plays a role in filtering water; the telescopic cylinder 21 is connected with the seal box 11 through a bolt, the limiting rod 22 is connected with the limiting sleeve 23 in a sliding mode, the other end of the limiting rod 22 is connected with the sliding water distribution seat 31 through a bolt, the limiting sleeve 23 is connected with the seal box 11 through a bolt, the telescopic cylinder 21 plays a role in driving the sliding fit mechanism 3 to move, and the limiting rod 22 plays a role in ensuring the sliding fit mechanism 3 to slide stably; the bottom slide rail 32 is connected with the bottom bushing plate 13 through a bolt, the sliding water distribution seat 31 is connected with the bottom slide rail 32 in a sliding manner, the matching valve 33 is connected with the sliding water distribution seat 31 through threads, the matching valve 33 plays a role in matching, and the bottom slide rail 32 plays a role in matching with the sliding water distribution seat 31 to provide stable support for the sliding water distribution seat 31; a matching groove is arranged between the matching valve 33 and the matching joint 53, a sealing ring is arranged in the groove, and after the matching valve 33 and the matching joint 53 are matched, the supporting pipe 52 can transmit cleaning liquid so as to clean the semiconductor wafer; the side limit slide rail 41 is connected with the seal box 11 through a bolt, the top of the side limit groove 42 is provided with a chamfer, and the side limit slide rail 41 and the side limit groove 42 provide effective support and stability for the basket body side plate 51 when falling; the basket body side plate 51 is connected with the side limit sliding rail 41 in a sliding mode, the matching joint 53 is matched with the matching valve 33 in a sliding mode, and the matching joint 53 plays a role in connection and matching.
The working principle is as follows: utilize the arm to wash basket mechanism 5 integral hoisting to seal box 11 top, open electrically sealed lid 15, place wash basket mechanism 5 whole decline and place in seal box 11 inboard, when placing, utilize basket body curb plate 51 to aim at side spacing groove 42, place basket body curb plate 51 landing in side spacing groove 42, treat that wash basket mechanism 5 is whole to be placed the back, close electrically sealed lid 15, start telescopic cylinder 21, utilize telescopic cylinder 21's piston to promote cooperation valve 33 on the water diversion seat 31 of slip and move back, cooperation valve 33 connects behind the cooperation joint 53, start the valve that supplies water to the water diversion seat 31 of slip, the cleaning solution passes through cooperation valve 33 on the water diversion seat 31 of slip and then transmits inside the stay tube 52, thereby wash semiconductor wafer.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It will be understood by those skilled in the art that the present invention is not limited to the embodiments described above, which are described in the specification and illustrated only to illustrate the principle of the present invention, but that various changes and modifications may be made therein without departing from the spirit and scope of the present invention, which fall within the scope of the utility model as claimed.
Claims (6)
1. A semiconductor wafer cleaning tank is characterized in that: the cleaning device comprises a supporting mechanism (1), a telescopic fixing mechanism (2), a sliding fit mechanism (3) and a side fixing mechanism (4), wherein the sliding fit mechanism (3) is arranged on the inner side of the supporting mechanism (1), the side fixing mechanisms (4) are arranged on two sides of the sliding fit mechanism (3), a cleaning basket mechanism (5) is connected to the inner side of the side fixing mechanism (4), and the telescopic fixing mechanism (2) is installed at the front end of the sliding fit mechanism (3);
the cleaning basket mechanism (5) comprises basket body side plates (51), supporting pipes (52), matching joints (53) and supporting columns (54), wherein six supporting pipes (52) are arranged between the two basket body side plates (51), the front ends of the supporting pipes (52) are connected with the matching joints (53), and the inner side surfaces of the supporting pipes (52) are provided with the supporting columns (54);
the supporting mechanism (1) comprises a sealing box (11), a base (12), a bottom bushing plate (13) and a water return pipe assembly (14), the lower end of the sealing box (11) is connected with the base (12), the bottom bushing plate (13) is arranged inside the sealing box (11), the water return pipe assembly (14) is arranged at the lower end of the bottom bushing plate (13), and an electric sealing cover (15) is arranged at the upper end of the sealing box (11);
the telescopic fixing mechanism (2) comprises a telescopic cylinder (21), a limiting rod (22) and limiting sleeves (23), the telescopic cylinder (21) is connected to the front end of the seal box (11), four limiting sleeves (23) are uniformly arranged on the outer side of the telescopic cylinder (21), the limiting rod (22) is connected to the limiting sleeves (23), and one ends of the telescopic cylinder (21) and the limiting rod (22) are connected to the sliding fit mechanism (3);
the sliding matching mechanism (3) comprises a sliding water distribution seat (31), bottom sliding rails (32) and a matching valve (33), the lower end of the sliding water distribution seat (31) is connected with the two bottom sliding rails (32), and the rear end of the sliding water distribution seat (31) is connected with the matching joint (53) through the matching valve (33);
the side fixing mechanism (4) comprises a side limiting sliding rail (41) and a side limiting groove (42), and the side limiting sliding rail (41) is installed at two ends inside the sealing box (11).
2. A semiconductor wafer cleaning tank as defined in claim 1, wherein: the sealing box (11) is connected with the base (12) through bolts, and the bottom bushing plate (13) is connected with the sealing box (11) through screws.
3. A semiconductor wafer cleaning tank as defined in claim 1, wherein: telescopic cylinder (21) passes through bolted connection seal box (11), gag lever post (22) sliding connection spacing sleeve (23), the gag lever post (22) other end passes through bolted connection slip and divide water seat (31), spacing sleeve (23) pass through bolted connection seal box (11).
4. A semiconductor wafer cleaning tank as defined in claim 1, wherein: the bottom sliding rail (32) is connected with the bottom bushing plate (13) through a bolt, the sliding water distribution seat (31) is connected with the bottom sliding rail (32) in a sliding mode, and the matching valve (33) is connected with the sliding water distribution seat (31) through threads.
5. A semiconductor wafer cleaning tank as defined in claim 1, wherein: the matching valve (33) is provided with a matching groove, and a sealing ring is installed in the groove.
6. A semiconductor wafer cleaning tank as defined in claim 1, wherein: the side limit sliding rail (41) is connected with the sealing box (11) through a bolt, and a chamfer is arranged at the top of the side limit groove (42).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120641916.0U CN215613640U (en) | 2021-03-29 | 2021-03-29 | Semiconductor wafer crystal cleaning tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120641916.0U CN215613640U (en) | 2021-03-29 | 2021-03-29 | Semiconductor wafer crystal cleaning tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215613640U true CN215613640U (en) | 2022-01-25 |
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ID=79913931
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120641916.0U Active CN215613640U (en) | 2021-03-29 | 2021-03-29 | Semiconductor wafer crystal cleaning tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN215613640U (en) |
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2021
- 2021-03-29 CN CN202120641916.0U patent/CN215613640U/en active Active
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