CN215608862U - Charged particle beam pulse beam splitting device - Google Patents
Charged particle beam pulse beam splitting device Download PDFInfo
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- CN215608862U CN215608862U CN202121881708.4U CN202121881708U CN215608862U CN 215608862 U CN215608862 U CN 215608862U CN 202121881708 U CN202121881708 U CN 202121881708U CN 215608862 U CN215608862 U CN 215608862U
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Abstract
The utility model relates to a charged particle beam pulse beam splitting device, which belongs to the technical field of radiotherapy and comprises a beam splitting element and an alternating pulse power supply, wherein the alternating pulse power supply is used for applying pulse voltage to the beam splitting element and splitting a charged particle beam pulse into a plurality of sub-pulses with different deflection directions, the time length of the sub-pulses is the same as the top width of the pulse voltage, the number of the sub-pulses is the same as the pulse number of the pulse voltage, and the number of the beam splitting element is determined according to the number of the sub-pulses.
Description
Technical Field
The utility model belongs to the technical field of radiotherapy, and particularly relates to a charged particle beam pulse beam splitting device.
Background
At present, the incidence of tumors in China is higher and higher, the tumors become one of the biggest killers harmful to the health of the people, and the common means for anti-tumor treatment comprise operations, radiotherapy, chemotherapy and the like. The principle of radiotherapy is that the radiation with certain energy acts on the cell to destroy the double DNA chains of tumor cell and inhibit the proliferation of tumor cell and kill tumor cell directly. Under the condition of the current radiotherapy, the irradiation range of normal tissues is reduced by improving the conformity degree of the radiation field of a radiotherapy machine and finally achieving the purpose of irradiating tumor tissues as accurately as possible.
In some radiotherapy (charged particle beam irradiation, or irradiation in which a charged particle beam is targeted to generate X-rays) it is necessary to inject the radiation from multiple directions. The existing solution is to rotate the handpiece, change the injection direction of the rays by the rotation of the handpiece, and realize multi-directional injection. However, the rotation of the handpiece from one position to another necessarily requires a time interval, which results in a large time difference between the rays at different angles and fails to meet the requirements of radiotherapy.
SUMMERY OF THE UTILITY MODEL
The inventor finds in practice that: the strip kicker can change the direction of a part of the charged particle beam pulse, for example, CN202011104043.6 is a multi-treatment terminal radiotherapy device, and the strip kicker is matched with a pulse power supply to change the transmission direction of the part of the charged particle beam pulse, so that the injection of rays from different directions is realized. However, only a part of the pulse can be acted on at a single time, and the requirement that the time interval of the rays incident from different directions is short cannot be met. In order to solve the above problems, a charged particle beam pulse splitting apparatus is proposed, which splits a charged particle beam pulse into a plurality of sub-pulses with different deflection directions, and injects the sub-pulses into different heads, so as to satisfy the requirement of short time interval of the rays incident in different directions.
In order to achieve the purpose, the utility model provides the following technical scheme:
the utility model provides a charged particle beam pulse beam splitting device, includes beam splitting component and alternating pulse power supply, alternating pulse power supply is used for applying pulse voltage to beam splitting component, cuts charged particle beam pulse into a plurality of sub-pulses that the deflection direction is different, sub-pulse time length is the same with pulse voltage top width, the quantity of sub-pulse is the same with pulse voltage's pulse quantity, confirms the quantity of beam splitting component according to the quantity of sub-pulse.
Further, the electron source generates a charged particle beam pulse, and the charged particle beam pulse is subjected to energy gain by the rf superconducting linear accelerator.
Preferably, the sub-pulses are equal in length.
Preferably, the sub-pulses have different lengths.
Further, the beam splitting element is a beam kicker, the beam kicker comprises 2 polar plates which are oppositely arranged, the 2 polar plates are respectively a first polar plate and a second polar plate, and an electrostatic field exists between the first polar plate and the second polar plate to form a kicking force to change the direction of the sub-pulse.
Further, when the deflection directions of the sub-pulses are symmetrical in space, the number of the sub-pulses is 2 times the number of the kickers.
Furthermore, the polar plates are respectively positioned in the deflection direction of the sub-pulse, and 2 polar plates which are oppositely arranged form a beam kicker, namely 2 polar plates positioned in the same beam kicker are all positioned in the deflection direction of the sub-pulse.
Further, when the deflection directions of the sub-pulses are asymmetrical in space, the number of the sub-pulses is equal to the number of the kickers.
Further, 1 polar plate of the beam kicker is located in the deflection direction of the sub-pulse, and the other 1 polar plate of the beam kicker is arranged opposite to the polar plate located in the deflection direction of the sub-pulse.
Further, the polarity of the pulse voltage applied to the plate in the sub-pulse deflection direction is opposite to the charged particle beam charge polarity.
Further, the total length of time of the charged particle beam pulse is set to t0The time length of the sub-pulse is t1、t2、t3、t4......tnThen t is1+t2+t3+t4+......+tn＝t0The number of pulses of the pulse voltage is n, and the flat top widths of the n pulse voltages are t1、t2、t3、t4......tnN pulse voltages are applied to the plate in the sub-pulse deflection direction in time series, respectively.
Further, if the deflection angle of the sub-pulse is alpha, then
Wherein q is the charge amount of the charged particles in the charged particle beam pulse, Vm is the voltage between the first plate and the second plate, W is the kinetic energy of the charged particles, d is the distance between the first plate and the second plate, L1Is the effective length of the first plate and the second plate.
Further, the beam splitting element is an impact magnet, and the number of the sub-pulses is equal to that of the impact magnets.
Further, the impact magnet is located on a transmission path of the charged particle beam pulse.
Further, the total length of time of the charged particle beam pulse is set to t0The time length of the sub-pulse is t1、t2、t3、t4......tnThen t is1+t2+t3+t4+......+tn＝t0The number of pulses of the pulse voltage is n, and the flat top widths of the n pulse voltages are t1、t2、t3、t4......tnN pulse voltages are applied to the impact magnets in time series, respectively.
Further, the deflection angle of the sub-pulse is theta, then
Wherein B is the magnetic field strength of the impact magnet, L2To the transmission path length, bp is the magnetic stiffness of the charged particles.
The utility model has the beneficial effects that:
1. the beam splitting element is combined with the alternating pulse power supply to split the charged particle beam pulse into a plurality of sub-pulses and change the transmission direction, and compared with the prior art, the beam splitting device can ensure that the time interval between the ray pulses incident from different directions is short.
2. The charged particle beam pulse beam splitting can be completed in a very short time, and the requirements of radiotherapy equipment on the time intervals of sub-pulses incident in different directions are met.
3. An alternating pulse power supply is adopted to generate an alternating magnetic field, so that the transmission direction of the sub-pulse can be changed alternately.
4. The number and deflection angle of the sub-pulses are controllable, and the flexibility is high.
Drawings
FIG. 1 is an assembly schematic of 2 kickers when the beam splitting element is a kicker;
fig. 2 is a schematic diagram of the charged particle beam pulse divided into four direction sub-pulses, i.e. up, down, left and right, in the third embodiment.
In the drawings: 1-a first kicker, 2-a second kicker and 3-a vacuum box.
Detailed Description
In order to make the technical solutions of the present invention better understood, the following description of the technical solutions of the present invention with reference to the accompanying drawings of the present invention is made clearly and completely, and other similar embodiments obtained by a person of ordinary skill in the art without any creative effort based on the embodiments in the present application shall fall within the protection scope of the present application. In addition, directional terms such as "upper", "lower", "left", "right", etc. in the following embodiments are directions with reference to the drawings only, and thus, the directional terms are used for illustrating the present invention and not for limiting the present invention.
The first embodiment is as follows:
the utility model provides a charged particle beam pulse beam splitting device, includes beam splitting component and alternating pulse power supply, alternating pulse power supply is used for applying pulse voltage to beam splitting component, cuts charged particle beam pulse into a plurality of sub-pulses that the deflection direction is different, sub-pulse time length is the same with pulse voltage top width, the quantity of sub-pulse is the same with pulse voltage's pulse quantity, confirms the quantity of beam splitting component according to the quantity of sub-pulse. Preferably, the sub-pulses are equal in length. In other embodiments, the lengths of the sub-pulses may also be different.
Taking an electron beam in charged particles as an example, an electron source generates a charged particle beam pulse with a first energy, the electron source comprises a driving laser, a photocathode and an anode, the driving laser emits laser light to be incident on the photocathode to generate the electron beam, and an extraction electric field between the photocathode and the anode extracts the electron beam from the photocathode to be incident on a beam transmission line. The charged particle beam pulse is generated by a driving laser through the action of a photocathode, the charged particle beam pulse and the driving laser have the same time structure, the laser emitted by the driving laser is a laser with adjustable pulse length, so that the pulse time length of the charged particle beam pulse generated by the electron source is adjustable, and the driving laser adjusts the length of the laser pulse by adjusting the length of a voltage signal. Meanwhile, the pulse length of the charged particle beam pulse is adjustable, the adjustment range is from 10ns to 500ms, and the emittance is lower than 10mm x mrad.
The electron source is a direct-current high-voltage electron source formed by a direct-current high-voltage electron gun or a radio-frequency electron source formed by a radio-frequency electron gun, an extraction electric field formed by the direct-current high-voltage electron source is a static high-voltage electric field, and an extraction electric field formed by the radio-frequency electron source is a radio-frequency electromagnetic field.
The charged particle beam pulse is subjected to energy gain through a radio frequency superconducting linear accelerator, the radio frequency superconducting linear accelerator comprises a radio frequency resonant cavity distributed along an axis, the radio frequency resonant cavity is driven by a radio frequency power source, and the radio frequency resonant cavity is placed in a 4K or 2K low-temperature environment to ensure that the radio frequency superconducting linear accelerator operates in a superconducting state. The radio frequency resonant cavity is soaked in liquid helium with gas phase and liquid phase for cooling, and the working temperature is the boiling temperature of the liquid helium. The boiling temperature of liquid helium at one atmosphere is 4.2K and at 30mBar is 2K. Pumping helium gas through a pump set of the cryogenic system, and controlling the surface gas pressure of the liquid helium so as to control the temperature of the liquid helium. The charged particle beam pulses pass through a radio frequency superconducting linear accelerator to obtain energy gain. Meanwhile, the energy gain is determined by the scale and the performance of the radio frequency superconducting linear accelerator, and the more the number of the radio frequency resonant cavities is, the larger the field gradient is, and the larger the energy gain is. Theoretically, the energy gain can be from a few MeV to a few GeV or even infinite.
The charged particle beam pulse beam splitting device is applied to radiotherapy equipment, specifically, the number of sub-pulses and the deflection direction of the sub-pulses are determined according to the number and the position of a machine head of the radiotherapy equipment, the sub-pulses are transmitted to a ray target through a transmission beam line and bombard the ray target to generate rays, and a ray collimator adjusts the irradiation area of the rays and injects the rays into the machine head.
For radiotherapy equipment, the energy gain does not need to be particularly large, and the energy gain is in an energy interval suitable for human body radiotherapy, and is generally 4-18 MeV. Under the premise of determining the type and the number of the radio frequency resonant cavities, the energy gain can be adjusted by adjusting the intensity of a radio frequency field in the radio frequency resonant cavities so as to meet the radiation energy requirements required by different radiotherapy. The strength of the radio frequency resonant cavity is positively correlated with the feed-in power of the power source, and the field gradient of the radio frequency resonant cavity is correspondingly changed by adjusting the power of the power source.
Example two:
parts of this embodiment that are the same as those of the first embodiment are not described again, except that:
the beam splitting element is a beam kicker, the beam kicker is located in the vacuum box, and an inner cavity of the vacuum box is in a vacuum environment. The beam kicking device comprises 2 polar plates which are oppositely arranged, and the 2 polar plates are respectively connected with the anode and the cathode of the alternating pulse power supply. The 2 polar plates are respectively a first polar plate and a second polar plate, and an electrostatic field exists between the first polar plate and the second polar plate to form a kicking force to change the direction of the sub-pulse.
When the deflection directions of the sub-pulses are symmetrical in space, since the kickers include 2 plates, the number of the sub-pulses is 2 times the number of the kickers. The polar plates are respectively positioned in the deflection direction of the sub-pulse, and 2 polar plates which are oppositely arranged form a beam kicking device, namely 2 polar plates positioned in the same beam kicking device are positioned in the deflection direction of the sub-pulse. That is, 1 kicker can deflect 2 sub-pulses.
When the deflection directions of the sub-pulses are asymmetrical in space, the number of the sub-pulses is equal to the number of the kickers. 1 polar plate among them of kicking the beam ware is located the deflection direction of sub-pulse, and 1 other polar plate of kicking the beam ware sets up with being located the polar plate on the deflection direction of sub-pulse relatively. That is, 1 kicker deflects only 1 sub-pulse.
Setting the total time length of the charged particle beam pulse to t0The time length of the sub-pulse is t1、t2、t3、t4......tnThen t is1+t2+t3+t4+......+tn＝t0The number of pulses of the pulse voltage is n, and the flat top widths of the n pulse voltages are t1、t2、t3、t4......tnN pulse voltages are applied to the plate in the sub-pulse deflection direction in time series, respectively, and the polarity of the pulse voltage applied to the plate in the sub-pulse deflection direction is opposite to the charge polarity of the charged particle beam.
Specifically, if the deflection angle of the sub-pulse is α, then
Wherein q is the charge amount of the charged particles in the charged particle beam pulse, Vm is the voltage between the first plate and the second plate, W is the kinetic energy of the charged particles, d is the distance between the first plate and the second plate, L1Is the effective length of the first plate and the second plate.
Example three:
as shown in fig. 1, the same parts of this embodiment and the embodiment are not repeated, except that:
the charged particle beam pulse is divided into 4 sub-pulses, and the deflection directions of the 4 sub-pulses are up, down, left, and right, respectively (spatially symmetric). Be equipped with 2 and kick and restraint the ware in vacuum box 3, first kicking and restraint ware 1 is horizontal distribution (the polar plate that is located the top is the first polar plate of first kicking and restraint ware 1, the polar plate that is located the below is the second polar plate of first kicking and restraint ware 1), and second kicking and restraint ware 2 is vertical distribution (the polar plate that is located the left side is the first polar plate of second kicking and restraint ware 2, and the polar plate that is located the right side is the second polar plate of second kicking and restraint ware 2).
The total length of time of the charged particle beam pulses is t0The time length of the pulse is divided into 4 sub-pulses which are t1、t2、t3、t4Then t is1+t2+t3+t4＝t0The number of pulses of the pulse voltage is 4, and the flat top widths of the 4 pulse voltages are t1、t2、t3、t4. Setting time trigger, taking negatively charged electrons as an example, when the charged particle beam pulse enters the vacuum box 3, the first polar plate of the first beam kicker 1 is in positive high voltage, and the flat top width of the pulse voltage is t1，t1A sub-pulse of a length of time is deflected upwards. The second polar plate of the first beam kicker 1 is in positive high voltage, and the flat top width of the pulse voltage is t2，t2A sub-pulse of a length of time is deflected downwards. The first polar plate of the second beam kicker 2 is in positive high voltage, and the flat top width of the pulse voltage is t3，t3A sub-pulse of a length of time is deflected to the left. The second polar plate of the second beam kicker 2 is in positive high voltage, and the flat top width t of the pulse voltage4，t4A sub-pulse of a length of time is deflected to the right.
That is, the width of the plateau to which the pulse voltage is sequentially applied is t1、t2、t3、t4Positive high voltage pulse of (t)1、t2、t3、t4The sub-pulses of the temporal length are deflected up, down, left and right, respectively. As shown in fig. 2, a charged particle beam pulse incident in one direction is divided into four directional sub-pulses, i.e., up, down, left, and right.
Example four:
parts of this embodiment that are the same as the embodiment are not described again, except that:
the charged particle beam pulse is divided into 2 sub-pulses, and the deflection directions of the 2 sub-pulses are up and left, respectively (spatially asymmetric). The vacuum box is internally provided with 2 beam kickers, the first beam kickers are horizontally distributed (the polar plate positioned above is the first polar plate of the first beam kicker, the polar plate positioned below is the second polar plate of the first beam kicker), the second beam kickers are vertically distributed (the polar plate positioned on the left side is the first polar plate of the second beam kicker, and the polar plate positioned on the right side is the second polar plate of the second beam kicker).
Charged particlesTotal length of time of the beam pulse is t0The time length of the sub-pulse is divided into 2 sub-pulses1、t2Then t is1+t2＝t0The number of pulses of the pulse voltage is 2, and the flat top widths of the 2 pulse voltages are t1、t2. Setting time trigger, taking negatively charged electrons as an example, when a charged particle beam pulse enters a vacuum box, a first polar plate of a first beam kicker is in positive high voltage, and the flat top width of the pulse voltage is t1，t1A sub-pulse of a length of time is deflected upwards. The first polar plate of the second beam kicker is in positive high voltage, and the flat top width of the pulse voltage is t2，t2A sub-pulse of a length of time is deflected to the left. That is, the width of the plateau to which the pulse voltage is sequentially applied is t1、t2Positive high voltage pulse of (t)1、t2The sub-pulses of the temporal length are deflected upwards and to the left, respectively.
Example five:
parts of this embodiment that are the same as those of the first embodiment are not described again, except that:
the beam splitting element is an impact magnet, the impact magnet is positioned on a transmission path of the charged particle beam pulse, and the number of the sub-pulses is equal to that of the impact magnet.
Setting the total time length of the charged particle beam pulse to t0The time length of the sub-pulse is t1、t2、t3、t4......tnThen t is1+t2+t3+t4+......+tn＝t0The number of pulses of the pulse voltage is n, and the flat top widths of the n pulse voltages are t1、t2、t3、t4......tnN pulse voltages are applied to the impact magnets in time series, respectively.
The impact magnet provides a pulsed magnetic field to deflect the charged particle beam pulse in a particular direction. The deflection angle of the sub-pulse is theta, then
Wherein B is the magnetic field strength of the impact magnet, L2To the transmission path length, bp is the magnetic stiffness of the charged particles.
When the charged particle beam pulse passes through the impact magnet, a part of the charged particle beam pulse changes the transmission direction by the action of the impact magnet, and different parts of the charged particle beam pulse can be acted by the combination of a plurality of impact magnets, so that the beam splitting of the whole charged particle beam pulse is realized.
Example six:
parts of this embodiment that are the same as those of the fifth embodiment are not described again, except that:
the charged particle beam pulse is divided into 4 sub-pulses, and the deflection directions of the 4 sub-pulses are up, down, left and right respectively, at this time, 4 impact magnets are needed, 2 impact magnets realize beam splitting in the horizontal direction (left and right), and 2 impact magnets realize beam splitting in the vertical direction (up and down). The temporal distribution of the pulsed magnetic field is characterized by the inductance of the pulsed power supply and the magnet, and the rising and falling edges are typically on the order of microseconds, so that the rising and falling edge portions affect the adjacent charged particle beam pulses to cause interference.
The present invention has been described in detail, and it should be understood that the detailed description and specific examples, while indicating the preferred embodiment of the utility model, are intended for purposes of illustration only and are not intended to limit the scope of the utility model.
Claims (6)
1. The charged particle beam pulse beam splitting device is characterized by comprising a beam splitting element and an alternating pulse power supply, wherein the alternating pulse power supply is used for applying pulse voltage to the beam splitting element, splitting a charged particle beam pulse into a plurality of sub-pulses with different deflection directions, the time length of each sub-pulse is the same as the top width of the pulse voltage, the number of the sub-pulses is the same as the number of the pulses of the pulse voltage, and the number of the beam splitting element is determined according to the number of the sub-pulses.
2. According to claim 1The charged particle beam pulse beam splitting device is characterized in that the total time length of the charged particle beam pulse is set to t0The time length of the sub-pulse is t1、t2、t3、t4......tnThen t is1+t2+t3+t4+......+tn＝t0The number of pulses of the pulse voltage is n, and the flat top widths of the n pulse voltages are t1、t2、t3、t4......tn，n≥2。
3. The charged particle beam pulse splitting device of claim 2, wherein the beam splitting element is a kicker, the kicker comprises 2 oppositely disposed plates, and an electrostatic field exists between the 2 plates to form a kicking force to change the direction of the sub-pulse.
4. A charged particle beam pulse splitting apparatus as claimed in claim 3, wherein when the deflection directions of the sub-pulses are spatially symmetrical, the number of the sub-pulses is 2 times the number of kickers, and 2 plates located in the same kicker are located in the deflection directions of the sub-pulses.
5. A charged particle beam pulse splitting apparatus as claimed in claim 3, wherein when the deflection directions of the sub-pulses are asymmetric in space, the number of the sub-pulses is equal to the number of kickers, 1 of the plates of the kickers is located in the deflection direction of the sub-pulses, and the other 1 of the plates of the kickers is located opposite to the plate located in the deflection direction of the sub-pulses.
6. The charged particle beam splitting device of claim 2, wherein the beam splitting element is a magnet, and the number of sub-pulses is equal to the number of magnets.
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| CN202121881708.4U CN215608862U (en) | 2021-08-12 | 2021-08-12 | Charged particle beam pulse beam splitting device |
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| CN202121881708.4U CN215608862U (en) | 2021-08-12 | 2021-08-12 | Charged particle beam pulse beam splitting device |
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Effective date of registration: 20230705 Address after: 621900 No. 1, Kexue City Avenue, Youxian District, Mianyang, Sichuan Province Patentee after: Zhongjiu Flash Medical Technology Co.,Ltd. Address before: 621900 box 919-1015, 64 Mianshan Road, Youxian District, Mianyang City, Sichuan Province Patentee before: INSTITUTE OF APPLIED ELECTRONICS, CAEP |
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