CN215506087U - Tail gas treatment structure for normal pressure epitaxial process - Google Patents
Tail gas treatment structure for normal pressure epitaxial process Download PDFInfo
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- CN215506087U CN215506087U CN202120861504.8U CN202120861504U CN215506087U CN 215506087 U CN215506087 U CN 215506087U CN 202120861504 U CN202120861504 U CN 202120861504U CN 215506087 U CN215506087 U CN 215506087U
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Abstract
The utility model discloses a tail gas treatment structure for a normal pressure epitaxy process, which comprises a tail gas transmission pipeline, tail gas treatment equipment and an exhaust pipeline; the tail gas transmission pipeline inputs tail gas into the tail gas treatment equipment; the exhaust pipeline discharges the tail gas treated by the tail gas treatment equipment to a main exhaust pipeline at a plant end; the exhaust pipeline comprises an air inlet section, a conveying section and an exhaust section which are communicated in sequence, wherein the air inlet end of the conveying section is higher than the air outlet end of the conveying section in the vertical direction. According to the utility model, the air inlet end of the conveying section of the exhaust pipeline is higher than the air outlet end in the vertical direction, so that suspended condensed water drops near the exhaust hole of the spray washing tower can be reduced, and the stability of the pressure in the reaction chamber can be facilitated. Through setting up flowing back structure, be favorable to the timely discharge of the interior condensate water of exhaust pipe, simultaneously, also be favorable to reducing the volume of the steam composition of discharging in the main exhaust line of factory side, reduced factory side exhaust system's processing burden.
Description
Technical Field
The utility model relates to a semiconductor preparation process, in particular to a tail gas treatment structure for a normal-pressure epitaxial process.
Background
The atmospheric pressure epitaxy process is to grow a layer of single crystal material with the same lattice arrangement as the substrate material on the substrate material by utilizing a gas phase reaction, and the pressure in a reaction chamber needs to be maintained at a certain pressure in the reaction process. During the reaction process, a large amount of reaction gas is used, and after the preparation is finished, a large amount of process tail gas is also discharged. For example, a silicon single crystal is prepared by an atmospheric pressure epitaxy process, in the preparation process, a large amount of reaction gases such as silicon source gas (generally SiH4, DCS, TCS), H2 and the like are used, and after the preparation is completed, a large amount of HCl, incompletely reacted silicon source gas, hydrogen and other process tail gas is discharged, the discharged tail gas is subjected to processes such as combustion, water washing and the like in tail gas treatment equipment (a common spray washing tower is used as the tail gas treatment equipment), is partially dissolved in water and then is discharged along with the water, and is partially discharged from an exhaust pipeline, and the tail gas discharged from the exhaust pipeline contains a large amount of water vapor components. The temperature of the tail gas treated by the spray washing tower is about 50 degrees generally, and the temperature of an exhaust pipeline connected with the spray washing tower is 24 degrees generally, so that a certain temperature difference exists, therefore, the water vapor component in the tail gas discharged from the spray washing tower can be gradually condensed in the exhaust pipeline, and the uncondensed water vapor is discharged into an exhaust system of a plant service end.
In the prior art, the reaction chamber is directly communicated with the frequency washing tower through a tail gas transmission pipeline, so that pressure fluctuation inside the spraying washing tower can influence the pressure in the reaction chamber, and therefore a pressure controller is arranged at an air inlet of the spraying washing tower to ensure that the negative pressure value of the air inlet is constant, and the pressure stability in the reaction chamber is further ensured.
However, in the existing spray washing tower, the pressure controller controls the negative pressure value of the air inlet hole by using the bernoulli principle, so that the fluctuation of the pressure at the air outlet hole of the spray washing tower can affect the negative pressure value of the air inlet hole, and further affect the pressure value in the reaction chamber. Because the tail gas treated by the spray washing tower has temperature difference with the exhaust pipeline and contains a large amount of water vapor components, condensed water drops exist at the exhaust pipeline close to the exhaust hole of the spray washing tower, the condensed water drops suspend near the exhaust hole under the combined action of positive pressure air flow of exhaust of the spray washing tower, negative pressure air flow of the exhaust pipeline and self gravity of the condensed water drops, and the suspended condensed water drops can influence the air flow at the exhaust hole, so that the pressure value in the reaction chamber is influenced; in addition, a large amount of water vapor components in the tail gas aggravate the processing burden of the plant-side exhaust system and have adverse effects on the plant-side exhaust system. Therefore, how to avoid the above-mentioned influence caused by the moisture content in the exhaust gas becomes a technical problem to be solved in the art.
SUMMERY OF THE UTILITY MODEL
The technical problem to be solved by the utility model is to provide a tail gas treatment structure for a normal-pressure epitaxial process, which can avoid the influence of the water vapor component contained in the tail gas treated by the tail gas treatment structure on the pressure value in a reaction chamber and can also avoid the adverse influence of the water vapor component on a plant-end exhaust system.
In order to solve the technical problem, the utility model provides a tail gas treatment structure for a normal pressure epitaxy process, which comprises a tail gas transmission pipeline, a tail gas treatment device and an exhaust pipeline;
the tail gas transmission pipeline is communicated with an air inlet hole in the top of the tail gas treatment equipment, and the tail gas transmission pipeline inputs the tail gas into the tail gas treatment equipment;
the exhaust pipeline is communicated with an exhaust hole in the top of the tail gas treatment equipment, and the exhaust pipeline discharges the tail gas treated by the tail gas treatment equipment to a main exhaust pipeline at a plant service end;
the exhaust pipeline comprises an air inlet section, a conveying section and an exhaust section which are sequentially communicated, the air inlet section is communicated with the exhaust hole, and the exhaust section is communicated with the main exhaust pipeline of the plant service end;
the air inlet end of the conveying section is higher than the air outlet end of the conveying section in the vertical direction.
Preferably, the tail gas treatment equipment is a spray washing tower.
Preferably, the angle between the conveying section and the horizontal direction is 5-30 degrees.
Preferably, the air inlet section is arranged in a vertical direction.
Preferably, the exhaust section is arranged in a vertical direction.
Preferably, the conveying section is provided with a liquid discharging structure.
Preferably, the liquid discharge structure is arranged at a communication position of the conveying section and the exhaust section.
Preferably, the liquid discharge structure comprises a liquid discharge pipeline and a liquid collector;
the conveying section is communicated with the liquid collector through the liquid discharge pipeline;
the liquid collector is located below the conveying section.
Preferably, the liquid collector is a buffer spray scrubber.
Preferably, the pressure inside the plant end exhaust main pipeline is lower than the pressure inside the exhaust pipeline;
the pressure inside the exhaust pipeline is lower than the pressure inside the exhaust gas treatment equipment.
According to the utility model, the air inlet end of the conveying section of the exhaust pipeline is arranged to be higher than the air outlet end in the vertical direction, so that suspended condensed water drops near the exhaust hole of the spray washing tower can be reduced, the air flow state at the exhaust hole is improved, the influence on the negative pressure value at the air inlet hole of the spray washing tower is reduced, and the stability of the pressure in the reaction chamber is further facilitated. Through setting up flowing back structure, be favorable to the timely discharge of the interior condensate water of exhaust pipe, simultaneously, also be favorable to reducing the volume of the steam composition of discharging in the main exhaust line of factory side, reduced factory side exhaust system's processing burden.
Drawings
In order to more clearly illustrate the technical solution of the present invention, the drawings needed to be used in the present invention are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a schematic structural view of an embodiment of an exhaust gas treatment structure according to the present invention;
FIG. 2 is a schematic diagram of the relationship between the conveying section and the horizontal direction of an embodiment of the structure for treating tail gas of the present invention.
In the figure, 1-a tail gas transmission pipeline; 2-tail gas treatment equipment; 3-an exhaust pipeline; 4-a plant service end exhaust main pipeline; 5-a reaction chamber; 21-an air intake; 22-vent hole; 31-an air inlet section; 32-a conveying section; 33-an exhaust section; 34-a liquid discharge structure; 321-an air inlet end; 322-an air outlet end; 341-drainage pipe; 342-a liquid collector; the angle between the gamma-conveying section and the horizontal direction.
Detailed Description
The technical solutions in the present invention will be described clearly and completely with reference to the accompanying drawings, and it should be understood that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, a tail gas treatment structure for an atmospheric pressure epitaxy process according to the present invention is shown, and includes a tail gas transmission pipeline 1, a tail gas treatment device 2, and an exhaust pipeline 3;
the tail gas transmission pipeline 1 is communicated with an air inlet 21 at the top of the tail gas treatment equipment 2, and the tail gas transmission pipeline 1 inputs the tail gas into the tail gas treatment equipment 2;
the exhaust pipeline 3 is communicated with an exhaust hole 22 at the top of the tail gas treatment equipment 2, and the exhaust pipeline 3 discharges the tail gas treated by the tail gas treatment equipment 2 to a plant-side exhaust main pipeline 4;
the exhaust pipeline 3 comprises an air inlet section 31, a conveying section 32 and an exhaust section 33 which are sequentially communicated, the air inlet section 31 is communicated with the exhaust hole 22, and the exhaust section 33 is communicated with the plant-side exhaust main pipeline 4;
the air inlet end 321 of the conveying section 32 is vertically higher than the air outlet end 322 of the conveying section 32.
Preferably, the tail gas treatment device 2 is a spray washing tower.
The tail gas treatment process of the embodiment of the utility model comprises the following steps: after the reaction gas completes the reduction reaction in the reaction chamber 5, the reaction gas is discharged from the tail gas transmission pipeline 1 to the spray washing tower, is subjected to combustion, water washing and the like in the spray washing tower, is discharged from the exhaust pipeline 3 to the main exhaust pipeline 4 of the plant end, and is subjected to centralized treatment by the plant end. In the embodiment of the present invention, the air inlet 321 of the conveying section 32 of the exhaust pipeline 3 is arranged to be higher than the air outlet 322 in the vertical direction, that is, a certain included angle exists between the conveying section 32 and the horizontal direction, so that the air flow of the conveying section 32 flows from high to low in the conveying section 32, and by the arrangement, suspended condensed water droplets near the exhaust hole 22 of the spray scrubber can be reduced, the air flow state at the exhaust hole 22 is improved, the influence on the negative pressure value at the air inlet 21 of the spray scrubber is reduced, and further, the stability of the pressure in the reaction chamber 5 is facilitated.
Referring to fig. 2, the conveying flights 32 are preferably oriented at an angle γ of 5 ° to 30 ° from horizontal, with the horizontal being represented by the dashed lines in fig. 2. In the embodiment of the utility model, when the included angle gamma between the conveying section 32 and the horizontal direction is set within the range of 5-30 degrees, the suspended condensed water drops have small influence on the pressure fluctuation range in the reaction chamber 5. Further, when the angle γ of the conveying section 32 to the horizontal is 15 °, the suspended condensed water droplets have a minimal effect on the range of pressure fluctuations within the reaction chamber 5.
Preferably, the air intake section 31 is disposed in a vertical direction.
Preferably, the exhaust section 33 is arranged in a vertical direction.
Preferably, the conveying section 32 is provided with a drainage 34.
Preferably, the drainage structure 34 is disposed at the communication position of the conveying section 32 and the exhaust section 33.
Preferably, the drainage structure 34 includes a drainage pipe 341, a liquid collector 342;
the conveying section 32 is communicated with the liquid collector 342 through the liquid discharge pipe 341;
the liquid collector 342 is located below the transport section 32.
In the embodiment of the present invention, the liquid discharge structure 34 is disposed on the conveying section 32, and particularly, the liquid discharge structure 34 is disposed at the communication position between the conveying section 32 and the exhaust section 33, so that the vapor in the conveying section 32 can flow into the liquid collector 342 after being condensed, and the vapor in the exhaust section 33 can flow into the liquid collector 342 after being condensed; meanwhile, the method also plays a certain promoting role in reducing the content of the water vapor component in the tail gas of the conveying section 32 and the exhaust section 33, so that the method is also beneficial to reducing the amount of the water vapor component discharged to the main exhaust pipeline 4 of the plant service end, and the processing burden of an exhaust system of the plant service end is reduced.
Preferably, the liquid collector 342 is a buffer spray scrubber. It should be understood that the liquid collector in the embodiment of the present invention is not limited to the buffer spray washing tower, but may be other special collectors, such as a special basin, a special bucket, etc., but it should be specifically noted that no leakage occurs during the process of collecting water by the liquid collector.
Preferably, the pressure inside the plant-side exhaust main pipeline 4 is lower than the pressure inside the exhaust pipeline 3;
the pressure inside the exhaust line 3 is lower than the pressure inside the exhaust gas treatment device 2.
Understandably, in the embodiment of the present invention, the pressure difference between the exhaust gas treatment device 2 and the exhaust pipeline 3, and between the exhaust pipeline 3 and the main plant-side exhaust pipeline 4 are respectively set, which is more beneficial to exhaust of the exhaust gas.
In conclusion, the air inlet end of the conveying section of the exhaust pipeline is arranged to be higher than the air outlet end in the vertical direction, so that suspended condensed water drops near the exhaust hole of the spray washing tower can be reduced, the air flow state at the exhaust hole is improved, the influence on the negative pressure value at the air inlet hole of the spray washing tower is reduced, and the stability of the pressure in the reaction chamber is facilitated. Through setting up flowing back structure 34, be favorable to the timely discharge of the interior condensate water of exhaust pipe, simultaneously, also be favorable to reducing the volume of the steam composition of discharging in the main exhaust pipe of factory side, reduced the processing burden of factory side exhaust system.
The above description is only for the purpose of illustrating the preferred embodiments of the present invention and is not to be construed as limiting the utility model, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the scope of the present invention.
Claims (10)
1. A tail gas treatment structure for a normal pressure epitaxial process is characterized by comprising a tail gas transmission pipeline, tail gas treatment equipment and an exhaust pipeline;
the tail gas transmission pipeline is communicated with an air inlet hole in the top of the tail gas treatment equipment, and the tail gas transmission pipeline inputs the tail gas into the tail gas treatment equipment;
the exhaust pipeline is communicated with an exhaust hole in the top of the tail gas treatment equipment, and the exhaust pipeline discharges the tail gas treated by the tail gas treatment equipment to a main exhaust pipeline at a plant service end;
the exhaust pipeline comprises an air inlet section, a conveying section and an exhaust section which are sequentially communicated, the air inlet section is communicated with the exhaust hole, and the exhaust section is communicated with the main exhaust pipeline of the plant service end;
the air inlet end of the conveying section is higher than the air outlet end of the conveying section in the vertical direction.
2. The exhaust gas treatment structure according to claim 1, wherein the exhaust gas treatment device is a spray scrubber.
3. The exhaust gas treatment structure according to claim 2, wherein the conveying section is inclined from the horizontal by an angle of 5 ° to 30 °.
4. The exhaust gas treatment structure according to claim 3, wherein the air intake section is disposed in a vertical direction.
5. The exhaust gas treatment structure of claim 4, wherein the exhaust section is disposed in a vertical direction.
6. The exhaust gas treatment structure according to claim 3, wherein the conveying section is provided with a liquid discharge structure.
7. The exhaust gas treatment structure according to claim 6, wherein the liquid discharge structure is provided at a position where the delivery section communicates with the exhaust section.
8. The exhaust gas treatment structure according to claim 7, wherein the liquid discharge structure comprises a liquid discharge line, a liquid collector;
the conveying section is communicated with the liquid collector through the liquid discharge pipeline;
the liquid collector is located below the conveying section.
9. The exhaust gas treatment structure according to claim 8, wherein the liquid collector is a buffer spray scrubber.
10. The exhaust gas treatment structure of claim 1, wherein a pressure inside the plant-side main exhaust conduit is lower than a pressure inside the exhaust conduit;
the pressure inside the exhaust pipeline is lower than the pressure inside the exhaust gas treatment equipment.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202120861504.8U CN215506087U (en) | 2021-04-25 | 2021-04-25 | Tail gas treatment structure for normal pressure epitaxial process |
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| CN202120861504.8U CN215506087U (en) | 2021-04-25 | 2021-04-25 | Tail gas treatment structure for normal pressure epitaxial process |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114733270A (en) * | 2022-05-23 | 2022-07-12 | 北京北方华创微电子装备有限公司 | Backward flow condensation water separator and semiconductor process equipment |
| CN115025594A (en) * | 2022-06-13 | 2022-09-09 | 中环领先半导体材料有限公司 | Epitaxial tail gas treatment equipment |
-
2021
- 2021-04-25 CN CN202120861504.8U patent/CN215506087U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114733270A (en) * | 2022-05-23 | 2022-07-12 | 北京北方华创微电子装备有限公司 | Backward flow condensation water separator and semiconductor process equipment |
| CN114733270B (en) * | 2022-05-23 | 2024-02-27 | 北京北方华创微电子装备有限公司 | Reverse flow condensation water separation device and semiconductor process equipment |
| CN115025594A (en) * | 2022-06-13 | 2022-09-09 | 中环领先半导体材料有限公司 | Epitaxial tail gas treatment equipment |
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