CN215466425U - Automatic cleaning device for monocrystalline silicon wafers - Google Patents
Automatic cleaning device for monocrystalline silicon wafers Download PDFInfo
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- CN215466425U CN215466425U CN202120949865.8U CN202120949865U CN215466425U CN 215466425 U CN215466425 U CN 215466425U CN 202120949865 U CN202120949865 U CN 202120949865U CN 215466425 U CN215466425 U CN 215466425U
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Abstract
The utility model discloses an automatic cleaning device for monocrystalline silicon wafers, which comprises a special-shaped conveying belt, a driving roller, a feeding frame and a material receiving frame, wherein the special-shaped conveying belt is of a hollowed-out net-shaped structure, the special-shaped conveying belt and the driving roller are obliquely arranged, the feeding frame is arranged at the front end of the special-shaped conveying belt, the material receiving frame is arranged at the rear end of the special-shaped conveying belt, a stop block vertical to the surface of the special-shaped conveying belt is arranged on one lower side of the special-shaped conveying belt, an upper spray head and an upper blowing cover are arranged above the working surface of the special-shaped conveying belt, a lower spray head and a lower blowing cover are arranged below the working surface of the special-shaped conveying belt, the upper spray head corresponds to the lower spray head in position, and the upper spray head and the lower spray head are positioned at one end, close to the feeding frame, of the special-shaped conveying belt; the special-shaped conveying belt structure with the inclined and hollow arrangement is adopted, the spray head and the blowing cover can clean and dry the monocrystalline silicon piece in the conveying process conveniently, and impurities and water after cleaning can flow into the collecting tank along the inclined monocrystalline silicon piece.
Description
Technical Field
The utility model relates to the technical field of monocrystalline silicon production, in particular to an automatic cleaning device for monocrystalline silicon slices.
Background
The monocrystalline silicon wafer is cleaned in the production process, so that the phenomenon of device failure caused by pollution is avoided. The cleaning aims at removing organic or inorganic polluted impurities on the surface, in the prior art, the surface dirt needs to be cleaned after the monocrystalline silicon piece is cut and polished, the existing cleaning equipment is simple, the monocrystalline silicon piece is put into a water tank to be washed, the monocrystalline silicon piece is overlapped, and the cleaning efficiency is low.
SUMMERY OF THE UTILITY MODEL
The utility model aims to provide an automatic cleaning device for a monocrystalline silicon wafer.
The technical purpose of the utility model is realized by the following technical scheme:
an automatic cleaning device for monocrystalline silicon wafers comprises a special-shaped conveying belt, a driving roller, a feeding frame and a material receiving frame, wherein the special-shaped conveying belt is of a hollowed-out net-shaped structure, the special-shaped conveying belt and the driving roller are obliquely arranged, the feeding frame is arranged at the front end of the special-shaped conveying belt, the material receiving frame is arranged at the rear end of the special-shaped conveying belt, a stop block vertical to the belt surface of the special-shaped conveying belt is arranged on one side of the special-shaped conveying belt, an upper spray head and an upper blowing cover are arranged above the working surface of the special-shaped conveying belt, a lower spray head and a lower blowing cover are arranged below the working surface of the special-shaped conveying belt, the upper spray head corresponds to the lower spray head in position, and the upper spray head and the lower spray head are positioned at one end, close to the feeding frame, of the special-shaped conveying belt; the upper blowing cover and the lower blowing cover correspond in position and are located at one end, close to the material collecting frame, of the special-shaped conveying belt, the upper nozzle and the lower nozzle are connected through the water connector and the water pump, and the upper blowing cover and the lower blowing cover are connected with the air pump through the air connector.
Furthermore, a rear lifting plate with the same inclination angle as the special-shaped conveying belt is installed on the material receiving frame, an installation frame is installed on the material receiving frame at the bottom of the rear lifting plate, a material receiving cylinder is installed at the bottom of the installation frame, a rear photoelectric sensor is further arranged on the material receiving frame, and the rear photoelectric sensor is installed on one side above the rear lifting plate.
Furthermore, the structure of the feeding frame is the same as that of the material receiving frame, the feeding frame is provided with a front lifting plate and a front photoelectric sensor, the front lifting plate and the front photoelectric sensor are arranged on the feeding frame at the same positions as the rear lifting plate and the rear photoelectric sensor on the material receiving frame, the feeding frame is further provided with an air cylinder, the end part of a piston rod of the air cylinder is provided with a push plate, and the push plate is positioned above the front lifting plate.
Further, a collecting tank is further arranged below the special-shaped conveying belt and used for collecting the cleaned sewage and impurities.
In conclusion, the utility model has the following beneficial effects: according to the utility model, the inclined and hollow-out special-shaped conveying belt structure is adopted, the spray head and the blowing cover can be convenient for cleaning and drying the monocrystalline silicon wafers in the conveying process, the cleaned impurities and water can flow into the collecting tank along the inclined monocrystalline silicon wafers, and the feeding frame and the receiving frame are arranged, so that the monocrystalline silicon wafers can be automatically fed and received.
Drawings
FIG. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic structural view of the profiled conveyor belt of the present invention;
fig. 3 is a schematic structural diagram of the material receiving frame of the present invention.
In the figure, 1, a special-shaped conveyor belt; 2. a drive roll; 3. a feeding frame; 4. a material receiving frame; 5. an upper spray head; 6. a lower nozzle; 7. an upper blower housing; 8. a down blowing cover; 9. a water joint; 10. a gas joint; 11. collecting tank; 12. a rear lifter plate; 13. a rear photosensor; 14. a front lifter plate; 15. a front photosensor; 16. a cylinder; 17. pushing the plate; 18. a monocrystalline silicon wafer; 19. a stopper; 20. a mounting frame; 21. receive the material cylinder.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
As shown in fig. 1-3, an automatic cleaning device for monocrystalline silicon wafers comprises a special-shaped conveyor belt 1, a driving roller 2, a feeding frame 3 and a receiving frame 4, wherein the special-shaped conveyor belt 1 is of a hollowed-out net-shaped structure, the special-shaped conveyor belt 1 and the driving roller 2 are obliquely arranged, the feeding frame 3 is arranged at the front end of the special-shaped conveyor belt 1, the receiving frame 4 is arranged at the rear end of the special-shaped conveyor belt 1, a stop block 19 vertical to the belt surface of the special-shaped conveyor belt 1 is arranged on one lower side of the special-shaped conveyor belt 1, an upper spray head 5 and an upper blowing cover 7 are arranged above the working surface of the special-shaped conveyor belt 1, a lower spray head 6 and a lower blowing cover 8 are arranged below the working surface of the special-shaped conveyor belt 1, the upper spray head 5 corresponds to the lower spray head 6, and the upper spray head 5 and the lower spray head are positioned at one end of the special-shaped conveyor belt 1 close to the feeding frame 3; the upper blowing cover 7 corresponds to the lower blowing cover 8 in position, the upper blowing cover 7 and the lower blowing cover 8 are located at one end, close to the material collecting frame 4, of the special-shaped conveying belt 1, the upper nozzle 5 and the lower nozzle 6 are connected through the water connector 9 and the water pump, and the upper blowing cover 7 and the lower blowing cover 8 are connected with the air pump through the air connector 10.
Further, receive and install the back lifter plate 12 the same with 1 inclination of special-shaped conveyer belt on the work or material rest 4, install mounting bracket 20 on the work or material rest 4 of back lifter plate 12 bottom, receive the material cylinder 21 in the bottom of mounting bracket 20 is installed, still be equipped with back photoelectric sensor 13 on receiving the work or material rest 4, back photoelectric sensor 13 installs the one side in back lifter plate 12 top.
Further, the structure of the feeding frame 3 is the same as that of the material receiving frame 4, the feeding frame 3 is provided with a front lifting plate 14 and a front photoelectric sensor 15, the front lifting plate 14 and the front photoelectric sensor 15 are arranged on the feeding frame 3 at the same positions as the rear lifting plate 12 and the rear photoelectric sensor 13 on the material receiving frame 4, the feeding frame 3 is further provided with an air cylinder 16, the end part of a piston rod of the air cylinder 16 is provided with a push plate 17, and the push plate 17 is positioned above the front lifting plate 14.
Further, a collecting tank 11 is further arranged below the special-shaped conveying belt 1 and used for collecting the cleaned sewage and impurities by the aid of the collecting tank 11.
The working process is as follows: stacking monocrystalline silicon wafers 18 to be cleaned on a front lifting plate 14 of a feeding frame 3, pushing the front lifting plate 14 to move obliquely upwards by an air cylinder at the bottom of the front lifting plate 14, after a front photoelectric sensor 15 detects the monocrystalline silicon wafers 18, stopping lifting the front lifting plate 14, controlling the air cylinder by a controller to drive a push plate 17 to drive the upper monocrystalline silicon wafers 18 to a special-shaped conveyor belt 1, conveying the monocrystalline silicon wafers 18 by the special-shaped conveyor belt 1 under the drive of a drive roller 2, washing the monocrystalline silicon wafers 18 in the conveying process by an upper spray head and a lower spray head, drying the monocrystalline silicon wafers 18 by an upper fan cover and a lower fan cover, conveying the cleaned and dried monocrystalline silicon wafers 18 to a rear lifting plate 12, after a rear photoelectric sensor 13 detects the monocrystalline silicon wafers 18, contracting a material receiving air cylinder 21 to receive the monocrystalline silicon wafers 18, when the rear photoelectric sensor 13 fails to detect the monocrystalline silicon wafers 18, stopping contraction of the air cylinder 21 to wait for the next monocrystalline silicon wafers 18 to be conveyed, at this time, the accommodated monocrystalline silicon wafers 18 are flush with the working surface of the irregular-shaped conveyor belt 1, and the cleaned sewage is collected by the collection tank 11.
The present embodiment is only for explaining the present invention, and it is not limited to the present invention, and those skilled in the art can make modifications of the present embodiment without inventive contribution as needed after reading the present specification, but all of them are protected by patent law within the scope of the claims of the present invention.
Claims (4)
1. A monocrystalline silicon piece self-cleaning device is characterized in that: comprises a special-shaped conveyor belt (1), a driving roller (2), a feeding frame (3) and a material receiving frame (4), the special-shaped conveyor belt (1) is of a hollow net-shaped structure, the special-shaped conveyor belt (1) and the driving roller (2) are obliquely arranged, the feeding frame (3) is arranged at the front end of the special-shaped conveying belt (1), the material collecting frame (4) is arranged at the rear end of the special-shaped conveying belt (1), a stop block (19) vertical to the belt surface of the special-shaped conveyor belt (1) is arranged at the lower side of the special-shaped conveyor belt (1), an upper spray head (5) and an upper air blower cover (7) are arranged above the working surface of the special-shaped conveyor belt (1), a lower spray head (6) and a lower blowing cover (8) are arranged below the working surface of the special-shaped conveyor belt (1), the upper spray head (5) corresponds to the lower spray head (6), the two are positioned at one end of the special-shaped conveyor belt (1) close to the feeding frame (3); the upper blowing cover (7) corresponds to the lower blowing cover (8) in position, the upper blowing cover and the lower blowing cover are located at one end, close to the material collecting frame (4), of the special-shaped conveying belt (1), the upper spray head (5) and the lower spray head (6) are connected with the water pump through the water connector (9), and the upper blowing cover (7) and the lower blowing cover (8) are connected with the air pump through the air connector (10).
2. The automatic cleaning device for the monocrystalline silicon wafer according to claim 1, wherein: receive and install back lifter plate (12) the same with special-shaped conveyer belt (1) inclination on work or material rest (4), install mounting bracket (20) on receiving work or material rest (4) of back lifter plate (12) bottom, receive material cylinder (21) is installed to the bottom of mounting bracket (20), still be equipped with back photoelectric sensor (13) on receiving work or material rest (4), one side in back lifter plate (12) top is installed in back photoelectric sensor (13).
3. The automatic cleaning device for the monocrystalline silicon wafer according to claim 2, wherein: the structure of the feeding frame (3) is the same as that of the material receiving frame (4), the feeding frame (3) is provided with a front lifting plate (14) and a front photoelectric sensor (15), the front lifting plate (14) and the front photoelectric sensor (15) are arranged on the feeding frame (3) at the same positions as the mounting positions of the rear lifting plate (12) and the rear photoelectric sensor (13) on the material receiving frame (4), the feeding frame (3) is further provided with an air cylinder (16), the end part of a piston rod of the air cylinder (16) is provided with a push plate (17), and the push plate (17) is positioned above the front lifting plate (14).
4. The automatic cleaning device for the monocrystalline silicon wafer according to claim 3, wherein: and a collecting groove (11) is also arranged below the special-shaped conveying belt (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120949865.8U CN215466425U (en) | 2021-05-06 | 2021-05-06 | Automatic cleaning device for monocrystalline silicon wafers |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120949865.8U CN215466425U (en) | 2021-05-06 | 2021-05-06 | Automatic cleaning device for monocrystalline silicon wafers |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN215466425U true CN215466425U (en) | 2022-01-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202120949865.8U Active CN215466425U (en) | 2021-05-06 | 2021-05-06 | Automatic cleaning device for monocrystalline silicon wafers |
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| CN (1) | CN215466425U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024041321A1 (en) * | 2022-08-23 | 2024-02-29 | Tcl Zhonghuan Renewable Energy Technology Co., Ltd. | Devices for automatic cleaning of a monocrystalline silicon bar |
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2021
- 2021-05-06 CN CN202120949865.8U patent/CN215466425U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2024041321A1 (en) * | 2022-08-23 | 2024-02-29 | Tcl Zhonghuan Renewable Energy Technology Co., Ltd. | Devices for automatic cleaning of a monocrystalline silicon bar |
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| TR01 | Transfer of patent right |
Effective date of registration: 20230324 Address after: 336000 No. 7, Chunfeng Road, Jingfa Avenue, Yichun economic and Technological Development Zone, Yichun City, Jiangxi Province Patentee after: Yichun Yuze new energy Co.,Ltd. Address before: 336000 Yichun economic and Technological Development Zone, Yichun City, Jiangxi Province Patentee before: Yuze (Jiangxi) Semiconductor Co.,Ltd. |