CN215418118U

CN215418118U - Etching device for manufacturing integrated photoelectronic device

Info

Publication number: CN215418118U
Application number: CN202121744067.8U
Authority: CN
Inventors: 傅威; 靳贺迎; 胡克文; 何正洲
Original assignee: Huai'an Xinruizhi New Photoelectric Technology Partnership LP
Current assignee: Huai'an Xinruizhi New Photoelectric Technology Partnership LP
Priority date: 2021-07-28
Filing date: 2021-07-28
Publication date: 2022-01-04
Anticipated expiration: 2031-07-28

Abstract

The utility model discloses an etching device for manufacturing an integrated optoelectronic device, relates to the technical field of optoelectronic device processing devices, the technical scheme is that the device comprises an etching box, wherein a feeding pipe is fixedly arranged at the top of one side of the etching box, a first connecting pipe is fixedly arranged at the bottom of the etching box, a valve is fixedly connected onto the first connecting pipe, a fixed box is fixedly connected onto one side of the top of the etching box through a second connecting pipe, the joint of the second connecting pipe and the fixed box is positioned at the bottom of one side of the fixed box, alkaline liquid is filled in the fixed box, the effect is that the fixed box is arranged, the alkaline liquid is filled in the fixed box, etching steam in the etching box is directly introduced into the etching box, the alkaline liquid in the etching box neutralizes acidic steam, and removing acid substances in the steam, and adsorbing the neutralized gas by the activated carbon net, so that the gas filtering effect is enhanced.

Description

Etching device for manufacturing integrated photoelectronic device

Technical Field

The utility model relates to the technical field of optoelectronic device processing devices, in particular to an etching device for manufacturing an integrated optoelectronic device.

Background

Optoelectronic devices are key and core components of optoelectronic technology, are leading-edge research fields of modern optoelectronic technology and microelectronic technology, and are important components of information technology.

In the process of manufacturing the optoelectronic device, the optoelectronic device needs to be etched, in the process of etching the integrated optoelectronic device in the prior art, acid and alkali neutralization treatment cannot be performed on acid etching steam, the acid steam may cause certain damage to the health of a user, and the reliability is insufficient.

SUMMERY OF THE UTILITY MODEL

In view of the defects of the prior art, the utility model aims to provide an etching device for manufacturing an integrated optoelectronic device, which can perform neutralization treatment on acid etching steam.

In order to achieve the purpose, the utility model provides the following technical scheme: the utility model provides an integrated optoelectronic device makes and uses etching device, including the etching case, the top fixed mounting of etching case one side has the inlet pipe, the bottom fixed mounting of etching case has first connecting pipe, fixedly connected with valve on the first connecting pipe, the one side at etching roof portion is through second connecting pipe fixedly connected with fixed case, and the junction of second connecting pipe and fixed case is located the bottom of fixed case one side, alkaline liquid is equipped with to the inside of fixed case, the top that the top of fixed incasement chamber is located alkaline liquid is equipped with carries out the clearance piece of clearing up to gas.

Preferably, the inner cavity of the second connecting pipe is fixedly provided with a suction fan.

Preferably, the clearance piece includes the activated carbon net, and the standing groove has been seted up at the top of fixed case inner chamber, and the outside of fixed case is extended to the top of standing groove, and the tank bottom contact of activated carbon net and standing groove, sliding connection between activated carbon net and the standing groove.

Preferably, the top that the inner chamber of fixed case is located the active carbon net is equipped with acid-base indication layer, and the peripheral lateral wall parcel of acid-base indication layer has the rubber pad, and the rubber pad of acid-base indication layer lateral wall and the standing groove cell wall contact that fixed roof portion was seted up, and the top of fixed case is equipped with sealed lid, and the inner chamber of sealed lid is equipped with the opening, and is full of active carbon in the opening of sealed lid inner chamber, and the top fixed mounting that the periphery of fixed case is located alkaline liquid has the liquid-feeding pipe, and the bottom fixed mounting of fixed case has the fluid-discharge tube.

Preferably, the bottom of the first connecting pipe is fixedly provided with a liquid storage tank, and the bottom of one side of the liquid storage tank is fixedly provided with a discharge pipe.

Preferably, the inner cavity of the etching box is provided with a partition board, the partition board slides along the side wall of the inner cavity of the etching box, and a fixing piece for fixing the partition board is arranged inside the etching box.

Preferably, the mounting includes the kelly, and the left and right sides at baffle inner chamber top all is equipped with the gliding first spout of confession kelly, and the kelly slides along the inside of first spout, and the kelly is L type structure, and the inner chamber lateral wall of etching case is equipped with the draw-in groove that equidistant distribution's confession kelly one end was put into, and the top fixed mounting of kelly has the diaphragm, and the top of baffle is seted up and is supplied the gliding second spout of diaphragm.

Preferably, a limiting rod is fixedly installed on one side of the bottom of the inner cavity of the etching box, a gap is reserved between one end, far away from the etching box, of the limiting rod and the etching box, and a through hole for the limiting rod to penetrate through is formed in the bottom of the partition plate.

Compared with the prior art, the utility model has the following beneficial effects:

1. through setting up fixed case, alkaline liquid is equipped with in the inside of fixed case, and the inside etching steam of etching incasement portion directly lets in the inside of etching case, and the alkaline liquid of etching incasement portion neutralizes sour steam, gets rid of the acid material in the steam, and the activated carbon net adsorbs the gas after the neutralization to reinforcing gas filtration's effect.

2. Through setting up acid-base indicator layer, acid-base indicator layer detects the gas that passes active carbon net, if acid-base indicator layer takes place to discolour, needs to change the alkaline liquid of fixed incasement portion, waits to filter the completion back, changes the active carbon net of fixed incasement portion and the inside active carbon of sealed lid again, strengthens gaseous filterable effect.

Drawings

FIG. 1 is a schematic diagram of an embodiment of the present invention;

FIG. 2 is a schematic diagram of a separator according to an embodiment of the present invention;

fig. 3 is a schematic view of a partition fixing structure according to an embodiment of the present invention.

1. Etching the box; 2. an air suction fan; 3. a second connecting pipe; 4. a fixed box; 5. an activated carbon mesh; 6. a discharge pipe; 7. a liquid storage tank; 8. a valve; 9. a first connecting pipe; 10. a feed pipe; 11. a partition plate; 12. a limiting rod; 13. a transverse plate; 14. a second chute; 15. a clamping rod; 16. A first chute; 17. an acid-base indicator layer; 18. a sealing cover; 19. a liquid feeding pipe; 20. and a liquid discharge pipe.

Detailed Description

An embodiment of an etching apparatus for manufacturing an integrated optoelectronic device according to the present invention is further described with reference to fig. 1 to 3.

See fig. 1, an integrated optoelectronic device makes and uses etching device, including etching case 1, the top fixed mounting of etching case 1 one side has inlet pipe 10, the bottom fixed mounting of etching case 1 has first connecting pipe 9, fixedly connected with valve 8 on the first connecting pipe 9, one side at etching case 1 top is through the fixed case 4 of 3 fixedly connected with of second connecting pipe, and the junction of second connecting pipe 3 and fixed case 4 is located the bottom of fixed case 4 one side, the inside of fixed case 4 is equipped with alkaline liquid, the top of the inner chamber of fixed case 4 is located the top of alkaline liquid and is equipped with the clearance spare that clears up the gas. Place the photoelectronic device that needs the etching in the inside of etching case 1, let in etching liquid from inlet pipe 10 in the inside of etching case 1, at the in-process of etching, the steam that etching liquid produced lets in the inside of fixed case 4 through second connecting pipe 3, steam directly gets into in the inside alkaline liquid of fixed case 4, alkaline liquid plays the effect of neutralization to acid gas, gas after the neutralization gets into the clearance piece, the clearance piece plays the effect of clearance to the gas after the neutralization, guarantee to contain no acid substance in the last combustion gas, avoid causing the injury to the user.

Referring to fig. 1, a suction fan 2 is fixedly installed in an inner cavity of the second connection pipe 3. The suction fan 2 accelerates the gas inside the etching chamber 1 into the inside of the fixed chamber 4.

See figure 1, the clearance piece includes activated carbon net 5, and the standing groove has been seted up at the top of 4 inner chambers of fixed case, and the outside of fixed case 4 is extended to the top of standing groove, and activated carbon net 5 contacts with the tank bottom of standing groove, sliding connection between activated carbon net 5 and the standing groove. The activated carbon has good adsorbability, and the neutralized gas is adsorbed by the activated carbon, so that the finally discharged gas does not contain harmful substances.

See fig. 1, the top that the inner chamber of fixed box 4 is located activated carbon net 5 is equipped with acid-base indicating layer 17, the peripheral lateral wall parcel of acid-base indicating layer 17 has the rubber pad, and the rubber pad of acid-base indicating layer 17 lateral wall and the standing groove cell wall contact that fixed box 4 top was seted up, the top of fixed box 4 is equipped with sealed lid 18, the inner chamber of sealed lid 18 is equipped with the opening, and be full of activated carbon in the opening of sealed lid 18 inner chamber, the top fixed mounting that the periphery of fixed box 4 is located alkaline liquid has last liquid pipe 19, the bottom fixed mounting of fixed box 4 has fluid-discharge tube 20. The inside of sealed lid 18 is equipped with the active carbon, and the active carbon filters the liquid that leaves the inside of fixed case 4, and the gas after carrying out acidity neutralization gets into acid-base indicator 17, if acid-base indicator 17 takes place to discolour, shows that the inside alkaline liquid of fixed case 4 needs to be changed, can add alkaline liquid to the up-flow pipe 19, discharges the inside liquid of fixed case 4 from fluid-discharge tube 20, need not to suspend the etching operation, and the etching operation finishes this moment, changes the active carbon in active carbon net 5 and the inside sealed lid 18 again.

Referring to fig. 1, a liquid storage tank 7 is fixedly mounted at the bottom of the first connecting pipe 9, and a discharge pipe 6 is fixedly mounted at the bottom of one side of the liquid storage tank 7. After the etching operation is finished, the valve 8 is opened, the liquid in the etching box 1 is put into the liquid storage box 7, and at the moment, the photoelectronic device in the etching box 1 is drained, so that people can take the photoelectronic device out conveniently.

Referring to fig. 1 and 2, the inner cavity of the etching chamber 1 is provided with a partition 11, the partition 11 slides along the side wall of the inner cavity of the etching chamber 1, and the inside of the etching chamber 1 is provided with a fixing member for fixing the partition 11. The partition plate 11 separates different photoelectronic devices in the etching box 1, avoids the photoelectronic devices from being superposed together, so that the etching can not well soak the photoelectronic devices easily, the etching precision is ensured, the distance between the partition plates 11 is adjustable, and people can adjust the distance between different partition plates 11 according to the size of the photoelectronic devices.

See fig. 2 and 3, the mounting includes kelly 15, and the left and right sides at 11 inner chambers of baffle top all is equipped with the gliding first spout 16 of confession kelly 15, and kelly 15 slides along the inside of first spout 16, and kelly 15 is L type structure, and the inner chamber lateral wall of etching case 1 is equipped with the draw-in groove that the 15 one end of confession kelly of equidistant distribution was put into, and the top fixed mounting of kelly 15 has diaphragm 13, and the gliding second spout 14 of confession diaphragm 13 has been seted up at the top of baffle 11. When needs slide baffle 11, slide the diaphragm 13 at kelly 15 top in opposite directions, kelly 15 leaves the draw-in groove that etching case 1 inner chamber was seted up like this, when baffle 11 slides to suitable position, slide diaphragm 13 to one side at draw-in groove place, kelly 15 slides along the inner chamber of first spout 16 like this, and kelly 15 inserts in the draw-in groove that etching case 1 inner chamber was seted up, and then baffle 11 is fixed firm.

Referring to fig. 2 and 3, a limiting rod 12 is fixedly installed on one side of the bottom of the inner cavity of the etching box 1, a gap is reserved between one end, far away from the etching box 1, of the limiting rod 12 and the etching box 1, and a through hole for the limiting rod 12 to pass through is formed in the bottom of the partition plate 11. Can take out baffle 11 from one side that gag lever post 12 and etching case 1 have the interval, also can install baffle 11 from here, people can select the quantity of baffle 11 as required, and is very convenient, and the back is accomplished in the installation of baffle 11, leaves the clearance between the bottom of baffle 11 and the etching case 1 interior bottom of the case portion, and baffle 11 can not block etching liquid like this. The etching liquid may be sufficiently immersed in the optoelectronic device.

The working principle is as follows: firstly, optoelectronic devices to be etched are placed in an etching box 1, the number of partition plates 11 is selected according to the size of the devices, then the distance between the partition plates 11 is adjusted, the partition plates 11 are taken out from one side of a spacing between a limiting rod 12 and the etching box 1, the partition plates 11 can also be installed from the side, when the partition plates 11 need to slide, transverse plates 13 at the tops of clamping rods 15 slide oppositely, so that the clamping rods 15 leave clamping grooves formed in an inner cavity of the etching box 1, when the partition plates 11 slide to a proper position, the transverse plates 13 slide towards one side where the clamping grooves are formed, so that the clamping rods 15 slide along an inner cavity of a first sliding groove 16, the clamping rods 15 are inserted into the clamping grooves formed in the inner cavity of the etching box 1, the partition plates 11 are firmly fixed, etching liquid is placed in the etching box 1 from a feeding pipe 10, and then the devices in the etching box 1 are etched, after the processing finishes, open valve 8, liquid gets into the inside of liquid reserve tank 7 along first connecting pipe 9, at the in-process of etching, open suction fan 2, acid steam gets into the inside of fixed case 4, the inside alkaline liquid of fixed case 4 plays the effect of neutralization to acid steam, and the activated carbon net 5 of fixed case 4 top and the inside active carbon of sealed lid 18 all play filterable effect to gas, acid-base indicator layer 17 detects the liquid of going out, detect whether contain acid material in the gas, can.

The above description is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments, and all technical solutions belonging to the idea of the present invention belong to the protection scope of the present invention. It should be noted that modifications and embellishments within the scope of the utility model may occur to those skilled in the art without departing from the principle of the utility model, and are considered to be within the scope of the utility model.

Claims

1. An etching device for manufacturing an integrated optoelectronic device comprises an etching box (1), and is characterized in that: etching case (1) one side's top fixed mounting has inlet pipe (10), etching case (1)'s bottom fixed mounting has first connecting pipe (9), fixedly connected with valve (8) on first connecting pipe (9), etching case (1) one side at top is through second connecting pipe (3) fixedly connected with fixed box (4), and second connecting pipe (3) and the junction of fixed box (4) are located the bottom of fixed box (4) one side, the inside of fixed box (4) is equipped with alkaline liquid, the top that the top of fixed box (4) inner chamber is located alkaline liquid is equipped with the clearance piece that carries out the clearance to gas.

2. The etching apparatus for manufacturing an integrated optoelectronic device according to claim 1, wherein: an air suction fan (2) is fixedly arranged in the inner cavity of the second connecting pipe (3).

3. The etching apparatus for manufacturing an integrated optoelectronic device according to claim 1, wherein: the clearance spare includes activated carbon net (5), and the standing groove has been seted up at the top of fixed case (4) inner chamber, and the outside of fixed case (4) is extended at the top of standing groove, and activated carbon net (5) and the tank bottom contact of standing groove, sliding connection between activated carbon net (5) and the standing groove.

4. An etching apparatus for use in the fabrication of integrated optoelectronic devices according to claim 3, wherein: the top that the inner chamber of fixed case (4) is located activated carbon net (5) is equipped with acid-base and indicates layer (17), acid-base indicates that the peripheral lateral wall parcel of layer (17) has the rubber pad, and the rubber pad of acid-base indication layer (17) lateral wall and the standing groove cell wall contact of seting up at fixed case (4) top, the top of fixed case (4) is equipped with sealed lid (18), the inner chamber of sealed lid (18) is equipped with the opening, and be full of activated carbon in the opening of sealed lid (18) inner chamber, the top fixed mounting that the periphery of fixed case (4) is located alkaline liquid has last liquid pipe (19), the bottom fixed mounting of fixed case (4) has fluid-discharge tube (20).

5. The etching apparatus for manufacturing an integrated optoelectronic device according to claim 1, wherein: the bottom of the first connecting pipe (9) is fixedly provided with a liquid storage tank (7), and the bottom of one side of the liquid storage tank (7) is fixedly provided with a discharge pipe (6).

6. The etching apparatus for manufacturing an integrated optoelectronic device according to claim 1, wherein: a partition plate (11) is arranged in the inner cavity of the etching box (1), the partition plate (11) slides along the side wall of the inner cavity of the etching box (1), and a fixing piece for fixing the partition plate (11) is arranged in the etching box (1).

7. An etching apparatus for use in the fabrication of integrated optoelectronic devices according to claim 6, further comprising: the mounting includes kelly (15), the left and right sides at baffle (11) inner chamber top all is equipped with supplies kelly (15) gliding first spout (16), kelly (15) slide along the inside of first spout (16), and kelly (15) are L type structure, the inner chamber lateral wall of etching case (1) is equipped with the draw-in groove that equidistant distribution's confession kelly (15) one end was put into, the top fixed mounting of kelly (15) has diaphragm (13), and the top of baffle (11) is seted up and is supplied gliding second spout (14) of diaphragm (13).

8. An etching apparatus for use in the fabrication of integrated optoelectronic devices according to claim 6, further comprising: a limiting rod (12) is fixedly installed on one side of the bottom of an inner cavity of the etching box (1), a gap is reserved between one end, far away from the etching box (1), of the limiting rod (12) and the etching box (1), and a through hole for the limiting rod (12) to penetrate is formed in the bottom of the partition plate (11).