CN215413603U - System for measuring displacement and deformation of object by optical method - Google Patents
System for measuring displacement and deformation of object by optical method Download PDFInfo
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- CN215413603U CN215413603U CN202120190049.3U CN202120190049U CN215413603U CN 215413603 U CN215413603 U CN 215413603U CN 202120190049 U CN202120190049 U CN 202120190049U CN 215413603 U CN215413603 U CN 215413603U
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Abstract
The utility model belongs to the technical field of metering equipment which is characterized by adopting an optical method, and particularly relates to a system for measuring the displacement and deformation of an object by utilizing the optical method. The utility model can measure the tiny displacement or deformation of the optical image by using a novel light path principle, and can accurately measure the displacement or deformation of an object by using the system.
Description
Technical Field
The utility model belongs to the technical field of metering equipment which is characterized by adopting an optical method, and particularly relates to a system for measuring displacement and deformation of an object by utilizing the optical method.
Background
The principle of the existing optical projector is basically as follows: the light emitted by the light source passes through the concave mirror and then passes through the screw lens (also called Fresnel lens), the transparent liquid crystal screen or the negative plate for projection imaging is placed at the screw lens, and then after being focused by the convex lens, the light is finally reflected by the plane mirror and then imaged on the focusing plane. When the image on the transparent liquid crystal screen or the negative moves or deforms, the image on the focusing plane also moves and deforms by a multiple amount.
In the optical projector in the prior art, the projection utilizes the convex lens imaging principle, and is limited by the focusing imaging principle, the magnification is usually about several times to dozens of times, and focusing is required, otherwise, imaging is fuzzy. When the image on the transparent liquid crystal screen or the negative film is only slightly displaced or deformed, the existing projector has great limitation in measuring the displacement and deformation of the object.
SUMMERY OF THE UTILITY MODEL
The present invention is directed to a system for measuring the displacement and deformation of an object by an optical method, so as to measure the minute displacement or deformation of the object.
In order to achieve the purpose, the scheme of the utility model is as follows: the device comprises a monochromatic light source, monochromatic light emitted by the monochromatic light source forms a focus point through a convergence light path, the monochromatic light forms a diffraction projection light path after passing through the focus point, an imaging receiving device is arranged on the diffraction projection light path, and a measured object is placed at the focus point.
The working principle and the beneficial effects of the scheme are as follows:
directly placing the object to be measured on the focusing point or placing the object to be measured on the supporting device and then placing the object to be measured on the focusing point. After entering the convergence light path, the light emitted by the monochromatic light source is focused into a tiny focus point, and the focus point can be converged into a wavelength order at the minimum because of the monochromatic light source.
Any object has light transmission or reflection, and when light passes through the object to be measured, the light enters the diffraction projection light path and forms a diffraction projection image at any position in the diffraction projection space. The diffraction projection image is imaged at any position after the diffraction spread angle, and is imaged only on a focal plane without focusing as required by a traditional focusing imaging device. When the position distance L of the imaging and receiving device is farther from the light focusing point or the diffraction diffusion angle half angle alpha is larger, the larger the imaged image is, the larger the image magnification is. The magnification of the image is (tan. alpha. L)/(a/2), and a is the length of the object to be measured. Because there is no imaging focal plane, the distance L of the diffraction projection imaging position can be any distance in the diffraction projection space, so the distance L can be the distance that monochromatic light (laser) projected by diffraction can reach, and can be very large, while the focal length S is fixed and unchanged, and the image magnification can also be very large.
Finally, the micro displacement and the deformation of the measured object are reflected on the imaged amplified image, and the larger the amplification factor is, the easier the micro displacement and the deformation of the measured object are to be accurately measured. On the contrary, the displacement and the deformation of the amplified image are measured by the measuring tool and then divided by the amplification factor, so that the displacement and the deformation of the measured object can be accurately measured.
Optionally, the monochromatic light source is a laser light source. The laser light source has good monochromaticity, strong directivity and high brightness.
Optionally, the focusing optical path includes a focusing lens, and the focusing lens is one of a convex lens, a convex lens group, a concave reflecting mirror group, a microscope objective lens focusing lens, or a microscope objective lens focusing lens group, or the focusing lens is a lens group of a divergent collimating focusing multi-stage combination.
The focusing lens is used for focusing incident light rays into a point, the incident light rays are preferably parallel light beams, if the incident light rays are not parallel enough, the divergent collimating lens group is added, and then focusing is carried out. Even a multi-stage divergent collimating and focusing lens group combination is adopted.
Optionally, the diffractive projection optical path comprises a transmissive diffractive projection optical path or a reflective diffractive projection optical path; the transmission type diffraction projection light path comprises a biconcave transmission mirror or a plano-concave transmission mirror; the reflective diffractive projection light path includes a convex mirror.
Whether the projection optical path is transmission type diffraction or reflection type diffraction optical path is selected according to whether the measured object has light transmission or light reflection. The imaging brightness of the transmission type diffraction projection light path is relatively higher, and the reflection type diffraction projection light path is beneficial to improving the magnification or saving the occupied space of the whole system. The biconcave transmission mirror, the plano-concave transmission mirror and the convex reflection mirror can increase the diffraction diffusion angle of the diffraction projection light path, and the magnification is favorably improved.
Optionally, the diffractive projection optical path comprises one of a michelson interference optical path, a mach-zehnder interference optical path, a shear interference optical path, or a fabry-perot interference optical path.
The Mach-Zehnder interference optical path is an improvement of the Michelson interference optical path, and the influence of optical path overlapping on imaging is avoided, so that diffraction projection imaging is clearer. The shearing interference light path can directly measure the local strain of the measured object. The Fabry-Perot interference optical path increases the measurement sensitivity through multiple reflections of light.
Optionally, the imaging receiving device includes a photosensitive imaging chip, and the photosensitive imaging chip includes a CCD chip or a CMOS chip.
The displacement or deformation of the amplified image of the measured object is converted into a digital signal by using a photosensitive imaging chip such as a CCD (charge coupled device) chip or a CMOS (complementary metal oxide semiconductor) chip, so that the displacement or deformation of the amplified image of the measured object can be rapidly calculated according to the pixel density and the gray scale of the chip.
Optionally, the diffractive projection light path covers the image receiving device completely or partially.
For the measurement of the displacement or deformation of the magnified image of the object to be measured, in most cases, the measurement of the entire magnified image is not required, and particularly, when the magnification is large, the measurement can be completed by receiving the partial magnified image.
Optionally, the monochromatic light source and the convergent light path are mounted together to form a light path module, the imaging receiving device is mounted on the support rack to form an imaging receiving module, and the light path module and the imaging receiving module are mounted integrally or separately.
Optionally, the object to be measured is a displacement strain mirror with light transmission or light reflection, and the displacement strain mirror is provided with a displacement strain pattern.
For a measured object with weak light transmission or with diffuse reflection (poor light reflection) on the surface, in order to increase the optical signal received by the imaging receiving device, a specially-made pattern is prefabricated on the displacement strain mirror, then the displacement strain mirror is attached or embedded on the measured object, and then the displacement strain mirror is placed on a focus point, so that the displacement or the deformation of any object can be measured through the diffraction projection image of the strain pattern on the displacement strain mirror.
Optionally, the displacement strain mirror is in the form of a flexible sheet.
The displacement or deformation of the measured object can apply deformation force to the displacement strain mirror, so that the displacement strain mirror is subjected to buckling deformation, the displacement strain pattern is subjected to buckling deformation, and the displacement or deformation of the measured object is measured.
Drawings
FIG. 1 is a schematic diagram of an optical path structure according to an embodiment of the present invention;
FIG. 2 is a schematic diagram of a second optical path structure according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a three-optical-path structure according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of a four-optical-path structure according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a five-optical-path structure according to an embodiment of the present invention;
fig. 6 is a schematic diagram of a six-optical-path structure according to an embodiment of the present invention.
Detailed Description
The following is further detailed by way of specific embodiments:
the reference numbers in the drawings of the specification include: the device comprises a laser light source 1, a focusing mirror 2, a displacement strain mirror 3, a CCD chip 4, a support rack 5, a radial force 6, a plane reflector 7, a semi-reflecting and semi-transmitting mirror light splitting system 8 and a concave reflector system 9.
Example one
This embodiment is substantially as shown in fig. 1: the system for measuring the displacement and deformation of an object by using an optical method comprises a laser light source, a converging light path adopts a convex lens, the laser light source faces the convex lens, a measured area of the measured object has light transmittance, the surface (or the inside) of the object usually has various micro structures or patterns under the microscopic condition, such as grain structures, scratches, cracks, depressions or bulges, and the like, so that the diffraction projection of the micro structure patterns can be formed when light passes through the micro structure patternsIn the image, it is assumed that a scratch, which is a microstructure pattern, exists in the measured region, and the length a thereof is 1 × 10 at 100nm2nm, the measuring area of the measured object is positioned on the focusing point of the convex lens, the diffraction diffusion angle alpha of the diffraction projection light path is 45 degrees, the imaging receiving device is IOE 3-Kaban, the imaging receiving device comprises a one hundred million pixel CCD chip, and the distance L between the CCD chip and the focusing point is 0.1m and 1 x 10 m8And the laser light source, the object to be measured and the concave lens are arranged on one supporting rack, and the CCD chip is arranged on the other supporting rack.
The magnification of the system is 1 multiplied by 108nm÷(1×102nm÷2)＝2×106The pixel density of the CCD chip is 92.16mm/10240 pixels (9.216 × 10) times, i.e. 200 ten thousand times-2m÷1.024×104Pixel ≈ 9 × 10-6m/pixel, the displacement or deformation of the magnified image of the scratch projected by diffraction can be recognized by CCD chip at each pixel level, so that the measurement accuracy is 9 × 10-6m÷2×106＝4.5×10-12m is 4.5 picometers.
The size, uniformity, and focal distance S of the focal point can be designed by a convex lens or a group of convex lenses, and the larger the curvature of the convex lens is, the shorter the focal distance S is, the larger the diffraction spread angle is, and the larger the magnification is. The convex lens can be replaced by other optical lenses capable of forming a convergent light path.
When displacement or deformation occurs, the displacement or deformation of the object can be measured by measuring the displacement of the measuring area of the measured object.
Example two
The present embodiment is substantially as shown in fig. 2, and is different from the first embodiment in that: the displacement strain mirror is a plane reflector and is attached to the surface of the object to be measured, and displacement strain patterns of an array consisting of a plurality of same pattern units are etched on the displacement strain mirror. The plane reflector and the axis of the light of the laser light source form an included angle of 45 degrees, the displacement strain mirror is positioned on a focusing point of the convex lens, the convex lens is positioned on the left side of the focusing point, and the imaging receiving device is positioned on the upper side of the focusing point.
The measurement principle is the same as that of the first embodiment, but the present embodiment reduces the size of the whole system in the optical axis. Furthermore, the accuracy of the measurement result is further improved by measuring the displacement amount or deformation amount of the amplified image of each pattern unit and then taking an average value.
EXAMPLE III
The present embodiment is substantially as shown in fig. 3, and is different from the second embodiment in that: the displacement strain mirror and the axis of the light of the laser light source form an included angle of 90 degrees, the convex lens and the image receiving device are positioned on the same side of the displacement strain mirror, and the convex lens is positioned behind the image receiving device.
Under the condition of ensuring the same magnification, the arrangement mode further reduces the size of the whole system on the optical axis and saves more space.
Example four
The present embodiment is substantially as shown in fig. 4, and is different from the second embodiment in that: two support racks are connected into a whole, and displacement strain mirror is made by PMMA organic glass of 0.5mm thick, has characteristics such as light transmissivity well concurrently, intensity is good, flexibility, and the testee receives radial pressure to make displacement strain mirror can take place warp deformation.
The displacement strain mirror can deform along with the radial buckling deformation of the measured object. After the displacement strain mirror is fixed on the object, the deformation of the object can also cause the deformation of the displacement strain mirror, so that the deformation of the object can be accurately measured.
EXAMPLE five
The present embodiment is substantially as shown in fig. 5, and is different from the third embodiment in that: the displacement strain mirror is made of PMMA organic glass with the thickness of 0.5mm, and a reflective film is plated on the surface of the displacement strain mirror.
Therefore, the reflective film is bent after the measured object is deformed, and the deformation of the measured object is accurately measured.
EXAMPLE six
The present embodiment is substantially as shown in fig. 6, and is different from the first embodiment in that: the converging light path adopts a Mach-Zehnder interference light path, and light rays of a laser light source firstly pass through a half-reflecting half-transmitting mirror light splitting system, then pass through two concave reflector systems, and finally converge to the other half-reflecting half-transmitting mirror light splitting system to form a focusing point.
The Mach-Zehnder interference light path has no influence of light path overlapping on imaging, diffraction projection imaging is cleaner, and measurement accuracy is higher.
The foregoing is merely an example of the present invention and common general knowledge of known specific structures and features of the embodiments is not described herein in any greater detail. It should be noted that, for those skilled in the art, without departing from the structure of the present invention, several changes and modifications can be made, which should also be regarded as the protection scope of the present invention, and these will not affect the effect of the implementation of the present invention and the practicability of the present invention. The descriptions in the embodiments and the like in the specification can be used to explain the contents of the claims.
Claims (10)
1. The system for measuring the displacement and deformation of the object by using the optical method is characterized in that: the device comprises a monochromatic light source, monochromatic light emitted by the monochromatic light source forms a focus point through a convergence light path, the monochromatic light forms a diffraction projection light path after passing through the focus point, an imaging receiving device is arranged on the diffraction projection light path, and a measured object is placed at the focus point.
2. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the monochromatic light source is a laser light source.
3. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the focusing light path comprises a focusing lens, wherein the focusing lens is one of a convex lens, a convex lens group, a concave reflecting lens group, a microscope objective lens focusing lens or a microscope objective lens focusing lens group, or the focusing lens is a lens group formed by multi-stage combination of divergent collimation focusing.
4. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the diffraction projection light path comprises a transmission type diffraction projection light path or a reflection type diffraction projection light path; the transmission type diffraction projection light path comprises a biconcave transmission mirror or a plano-concave transmission mirror; the reflective diffractive projection light path includes a convex mirror.
5. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the diffraction projection optical path comprises one of a Michelson interference optical path, a Mach-Zehnder interference optical path, a shearing interference optical path or a Fabry-Perot interference optical path.
6. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the imaging receiving device comprises a photosensitive imaging chip, and the photosensitive imaging chip comprises a CCD chip or a CMOS chip.
7. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the diffraction projection light path covers the imaging receiving device completely or partially.
8. The system of claim 1, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the monochromatic light source and the convergent light path are installed together to form a light path module, the imaging receiving device is installed on the supporting rack to form an imaging receiving module, and the light path module and the imaging receiving module are installed into a whole or are separated from each other.
9. The system of claim 2, wherein the system is further configured to measure the displacement and deformation of the object by an optical method, and further comprising: the measured object is a displacement strain mirror with light transmission or light reflection, and displacement strain patterns are arranged on the displacement strain mirror.
10. The system of claim 9, wherein the system is configured to measure the displacement and deformation of the object by an optical method, and further comprising: the displacement strain mirror is in a flexible sheet shape and further comprises a force application device, and the free end of the force application device is connected with the displacement strain mirror.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120190049.3U CN215413603U (en) | 2021-01-22 | 2021-01-22 | System for measuring displacement and deformation of object by optical method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202120190049.3U CN215413603U (en) | 2021-01-22 | 2021-01-22 | System for measuring displacement and deformation of object by optical method |
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| Publication Number | Publication Date |
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| CN215413603U true CN215413603U (en) | 2022-01-04 |
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| CN202120190049.3U Active CN215413603U (en) | 2021-01-22 | 2021-01-22 | System for measuring displacement and deformation of object by optical method |
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