CN215305591U - Cleaning base station and cleaning device - Google Patents

Abstract

The application provides a cleaning base station (100) and a cleaning device. The cleaning base station (100) comprises a base (110) and a cleaning assembly (120), wherein a cleaning groove (111) is formed in the base (110), and the cleaning assembly (120) is located in the cleaning groove (111); the cleaning component (120) comprises a cleaning disc (121) and a filtering disc (122) which are stacked up and down, wherein the cleaning disc (121) is provided with a first filtering hole (131) which can filter sewage in the cleaning disc (121); a first filtering piece (132) capable of filtering sewage in the filtering disc (122) is arranged at the bottom of the filtering disc (122), and second filtering holes are formed in the first filtering piece (132); the bottom of the cleaning tank (111) is provided with a sewage draining channel. The application provides a clean basic station (100), can keep the pipeline smooth and easy in sewage collection process.

Description

Cleaning base station and cleaning device

Technical Field

The application relates to the technical field of furniture cleaning, and particularly provides a cleaning base station and a cleaning device.

Background

At present, with the improvement of life quality, the requirement of people on ground cleaning is more and more extensive, and ground cleaning equipment is more and more widely applied because of releasing physical labor. At present, various cleaning devices, such as intelligent products of sweeping robots, mopping machines and the like, have been developed aiming at various demands of users in the market.

The common floor cleaning equipment can only automatically mop the floor but cannot automatically clean the mop on the floor, and the mop cleaning needs to be manually washed after being disassembled by a user, so that the floor cleaning equipment is inconvenient to use and is not clean and sanitary enough. In order to make intelligent cleaning devices easy to clean, improved cleaning devices are known, which are equipped with a cleaning base station for the cleaning device, which cleaning base station comprises a waste water tank and a waste water recovery pipe, which cleaning base station is used for automatically cleaning the mop and automatically collecting waste water.

But because can contain foreign matter such as more silt in the sewage, the sewage recovery pipeline of current clean basic station is blockked up by the foreign matter easily and leads to unable collection sewage, causes the use inconvenient.

SUMMERY OF THE UTILITY MODEL

The application provides a clean basic station and cleaning device can keep the pipeline smooth and easy in sewage collection process.

The application provides a cleaning base station for self-cleaning of cleaning equipment, which comprises a base and a cleaning assembly, wherein the base is provided with a cleaning tank, and the cleaning assembly is positioned in the cleaning tank; the cleaning assembly comprises a cleaning disc and a filtering disc which are stacked up and down, the cleaning disc is used for placing a ground brush of the cleaning device, and a first filtering hole capable of filtering sewage in the cleaning disc is formed in the cleaning disc; the bottom of the filter disc is provided with a first filter piece capable of filtering sewage in the filter disc, the first filter piece is provided with a second filter hole, and the filter aperture of the first filter hole is larger than that of the second filter hole; the cleaning tank bottom has the blowdown passageway, and the blowdown passageway sets up with first filtering piece relatively to supply to be discharged the cleaning tank by the filterable sewage of first filtering piece. Through set up first filtration hole on wasing the dish to set up the second filtration hole on the first filtration piece in the filter dish, can avoid the foreign matter in the sewage to block up sewage pipes, at sewage discharge or collect the smooth and easy of in-process maintenance sewage pipes.

As an optional implementation mode, a second filter piece is arranged in the sewage draining channel, and the filter pore size of the second filter piece is smaller than that of the second filter pores. So after first filtration hole, first filtration piece and second filtration piece, realize the three-layer of sewage and filter, can comparatively fully filter the foreign matter in the sewage, avoid the foreign matter in the sewage to block up the sewage pipes.

As an alternative embodiment, the second filter element is a sponge element. Because the sponge is comparatively fine and smooth, the filtering pore diameter on the sponge is smaller, and the sponge can block more tiny foreign matters in the sewage and can realize better filtering effect.

As an optional implementation mode, the position that corresponds first filtration piece on the diapire of washing tank is provided with the holding tank, and holding tank and blowdown passageway intercommunication, the second filtration piece sets up in the holding tank. Filter the piece setting with the second in the holding tank, can avoid the second to filter and to be washed away by sewage and leave sewage pipes for filter more stable of piece position.

As an optional implementation manner, the height of the holding tank is lower than the height of the bottom wall of the cleaning tank, a drain hole is formed in the wall of the holding tank, and the drain hole is communicated with the sewage draining channel. The arrangement positions of the drain holes can be flexibly selected according to the arrangement direction of the pipelines, the pipelines are prevented from being bent around, and the pipelines and the water outlet are conveniently communicated and arranged.

As an optional embodiment, the device further comprises a blocking cover, wherein the blocking cover is used for blocking the notch of the accommodating groove; the blanking cover is provided with a plurality of through holes. The main effect of this blanking cover is that the protection second filters to further consolidate the second and filter the piece, avoid the second to filter and break away from the holding tank under the impact of sewage.

As an alternative embodiment, the bottom wall of the filter disc is provided with a water outlet groove, the bottom of the water outlet groove is provided with a hollow structure, and the first filter element covers the hollow structure. The arrangement of the water outlet groove is also convenient for fixing the first filter piece.

As an alternative embodiment, the first filter element is a filter screen. The meshes of the filter screen are used as second filtering holes for secondary filtering of sewage.

As an optional embodiment, a first water chute is arranged on the bottom wall of the filter disc, and the end part of the first water chute is communicated with the water outlet groove. The first water guide groove is used for guiding sewage in the filter disc to flow into the water outlet groove quickly.

As an alternative embodiment, the width of the first water chute is gradually widened along the extending direction of the water outlet chute, so that the sewage can smoothly flow in the first water chute.

As an optional implementation mode, the notch of the first water guiding groove is flush with the bottom wall of the filtering disc, and the groove depth of the first water guiding groove is gradually increased along the extending direction towards the water outlet groove, so that the sewage can be guided to rapidly converge into the water outlet groove.

As an optional implementation manner, a second water chute is arranged on the bottom wall of the cleaning tank corresponding to the first water chute, and one end of the second water chute is communicated with the accommodating tank. The second water chute is used for guiding the sewage in the cleaning tank to flow into the holding tank,

as an optional implementation manner, the cleaning base station further includes a liquid supply assembly, the liquid supply assembly is disposed on the base and communicated with the cleaning tray, and the liquid supply assembly is used for supplying cleaning liquid to the cleaning tray. The liquid supply assembly can automatically supply water to the floor brush in the cleaning disc without manual operation.

As an optional implementation manner, the cleaning base station further includes a sewage recovery assembly, the sewage recovery assembly is disposed on the base, and the sewage recovery assembly is communicated with the drainage hole. The sewage recovery assembly is used for automatically recovering sewage discharged from the drainage hole.

As an optional implementation mode, the sewage recovery assembly comprises a sewage tank, a water pump and a liquid inlet pipe, the liquid inlet pipe is communicated between the sewage tank and the drain hole, and the water pump is connected to the liquid inlet pipe and used for driving sewage in the cleaning tank to flow to the sewage tank through the liquid inlet pipe, so that automatic recovery of the sewage is realized. Sewage is filtered through above-mentioned first filtration hole, first filtration piece and second and is filtered the back and by the wash port feed liquor pipe of discharging into, because the foreign matter in the sewage is less this moment, has avoided the foreign matter to block up the pipeline on the one hand, and on the other hand has also avoided the foreign matter to get into the water pump and has leaded to the water pump to damage, plays the effect of protection water pump, has prolonged the life of water pump.

As an alternative embodiment, part of the liquid inlet pipe is fixed at the bottom of the cleaning tank. And part of the liquid inlet pipe is distributed at the bottom of the cleaning tank and is more conveniently communicated with the water outlet.

As an alternative embodiment, the filter disc and the cleaning disc are detachably connected, so that the filter disc or the cleaning disc can be conveniently detached separately for cleaning.

On the other hand, the application also provides a cleaning device, which comprises a cleaning device and the cleaning base station, wherein the cleaning base station is used for cleaning the cleaning device. Through setting up clean basic station, make this cleaning device realize the self-cleaning function, it is more convenient to use.

As an optional embodiment, the cleaning device further comprises a floor brush, wherein the floor brush comprises a shell, a mop cloth component, a water supply component and a rolling brush capable of rotating around a horizontal axis, and the rolling brush and the mop cloth component are sequentially arranged at the bottom of the shell along the length direction of the floor brush; the extending direction of round brush is along the width direction of casing, and the mop subassembly includes two rotatory mop units that can wind vertical axis pivoted, and two rotatory mop units are arranged side by side along the width direction of casing, and the bottom of rotatory mop unit forms the cleaning surface, and the water supply subassembly is configured as to the rotatory mop unit water supply. Through setting up above-mentioned each part, the cleaning equipment that this application provided can realize the automation of scrubbing brush and drag ground function, and round brush and rotatory mop unit cooperation promote the cleaning ability of scrubbing brush.

The application provides a clean basic station and cleaning device. The cleaning base station is used for self-cleaning of cleaning equipment and comprises a base and a cleaning assembly, wherein a cleaning groove is formed in the base, and the cleaning assembly is located in the cleaning groove; the cleaning assembly comprises a cleaning disc and a filtering disc which are stacked up and down, the cleaning disc is used for placing a ground brush of the cleaning device, and a first filtering hole capable of filtering sewage in the cleaning disc is formed in the cleaning disc; the bottom of the filter disc is provided with a first filter piece capable of filtering sewage in the filter disc, the first filter piece is provided with a second filter hole, and the filter aperture of the first filter hole is larger than that of the second filter hole; the cleaning tank bottom has the blowdown passageway, and the blowdown passageway sets up with first filtering piece relatively to supply to be discharged the cleaning tank by the filterable sewage of first filtering piece. The application provides a clean basic station can keep the pipeline smooth and easy in sewage collection process.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly introduced below, and it is obvious that the drawings in the following description are some embodiments of the present application, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive exercise.

Fig. 1 is a schematic overall structure diagram of a clean base station according to an embodiment of the present disclosure;

FIG. 2 is an exploded view of the clean base station of FIG. 1;

fig. 3 is a partial cross-sectional view of a cleaning base station provided in an embodiment of the present application;

fig. 4 is an exploded view of another cleaning base station provided in an embodiment of the present application;

FIG. 5 is a schematic structural diagram of a cleaning apparatus according to an embodiment of the present disclosure;

fig. 6 is a schematic view of a mop assembly of a cleaning device according to an embodiment of the present application.

Description of reference numerals:

100-a clean base station; 110-a base; 111-a cleaning tank; 120-a cleaning assembly; 121-a washing disc; 122-a filter tray; 131-a first filtering hole; 132-a first filter element; 133-water outlet groove; 134-a first flume; 135-notch; 141-a second filter element; 142-a receiving groove; 152-a drain hole; 143-blocking cover; 144-a second flume; 161-a liquid supply assembly; 171-a wastewater recovery assembly; 181-a sewage tank; 182-a water pump; 183-liquid inlet pipe; 190-a base;

200-a cleaning device; 210-a floor brush; 211-a housing; 212-mop assembly; 222-rotating the mop unit; 213-rolling brush.

Detailed Description

In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some embodiments of the present invention, but not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.

The existing various cleaning devices can only automatically mop the floor, but the mop is cleaned manually, and general users need to wash the floor by hand after the mop is detached from the cleaning devices, but the mop is not clean and sanitary enough and brings bad use experience to the users. In order to be more convenient to use, the existing improved cleaning device comprises a cleaning device and a cleaning base station, wherein the cleaning base station can automatically clean mop cloth on the cleaning device and automatically collect sewage. However, the sewage contains a lot of foreign matters, and the foreign matters easily block the pipeline in the sewage collecting process, so that the use is inconvenient.

The following describes the technical solution of the present invention and how to solve the above technical problems with specific examples. It should be noted that the following specific embodiments may be combined with each other, and the same or similar concepts or processes may not be described in detail in some embodiments. Embodiments of the present invention will be described below with reference to the accompanying drawings.

Fig. 1 is a schematic overall structure diagram of a clean base station according to an embodiment of the present disclosure; FIG. 2 is an exploded view of the clean base station of FIG. 1; fig. 3 is a partial cross-sectional view of a cleaning base station provided in an embodiment of the present application; fig. 4 is an exploded view of another cleaning base station provided in an embodiment of the present application; FIG. 5 is a schematic structural diagram of a cleaning apparatus according to an embodiment of the present disclosure; fig. 6 is a schematic view of a mop assembly of a cleaning device according to an embodiment of the present application.

In view of the above problems, as shown in fig. 1-2, the present application provides a cleaning base station 100 for self-cleaning of a cleaning apparatus 200, the cleaning base station 100 including a base 110 and a cleaning assembly 120, the base 110 having a cleaning tank 111 disposed thereon, the cleaning assembly 120 being located within the cleaning tank 111.

The cleaning assembly 120 comprises a cleaning disc 121 and a filter disc 122 which are stacked up and down, the cleaning disc 121 is used for placing a ground brush of the cleaning device, and the cleaning disc 121 is provided with a first filter hole 131 capable of filtering sewage in the cleaning disc 121; the bottom of the filter disc 122 is provided with a first filter member 132 capable of filtering the sewage in the filter disc 122, the first filter member 132 is provided with a second filter hole, and the filter pore size of the first filter hole 131 is larger than that of the second filter hole.

It should be noted that, the cleaning tray 121 is provided with a first filtering hole 131 capable of filtering the sewage, and the filtering hole is a first filtering structure of the cleaning base station 100, and in the process that the sewage flows into the filtering tray 122 from the cleaning tray 121, a part of the foreign matters with larger sizes will be filtered by the first filtering hole 131 and stay in the cleaning tray 121. The bottom of the filter disc 122 below the cleaning disc 121 is provided with a first filter member 132, which is provided with a second filter hole for further filtering the sewage passing through the first filter hole 131, so that the filter hole diameter of the second filter hole is smaller than that of the first filter hole 131, and at this time, when the sewage passes through the second filter hole, the foreign matters with smaller volume are filtered and stay in the filter disc 122.

The bottom of the cleaning tank 111 has a sewage draining passage, and the sewage draining passage is opposite to the first filtering member 132 for draining the sewage filtered by the first filtering member 132 out of the cleaning tank 111. After the sewage enters the sewage draining channel through the filtering of the first filtering holes 131 and the second filtering holes, the foreign matters in the sewage are greatly reduced, and the blockage of the sewage draining channel by the foreign matters in the sewage is avoided.

Through set up first filtration hole 131 on wasing dish 121 to set up the second filtration hole on first filtration piece 132 in filter dish 122, can avoid the foreign matter in the sewage to block up the trapway, keep the smooth and easy of trapway in sewage discharge or collection process.

In one embodiment, as shown in fig. 2 to 3, a second filter member 141 is disposed in the trapway, and the filter pore size of the second filter member 141 is smaller than the filter pore size of the second filter pores.

It can be understood that the second filter member 141 is used to filter the contaminated water passing through the second filtering holes, and the size of the second filter member 141 is set smaller than that of the second filtering holes, thereby filtering foreign matters having a smaller volume. So after first filtration hole 131, first filtration piece 132 and second filtration piece 141, realize the three-layer of sewage and filter, can comparatively fully filter the foreign matter in the sewage, avoid the foreign matter in the sewage to block up sewage pipes.

Optionally, the second filter 141 is a sponge. Because the sponge is comparatively fine and smooth, the filtering pore diameter on the sponge is smaller, and the sponge can block more tiny foreign matters in the sewage and can realize better filtering effect.

In order to facilitate fixing of the second filter member 141, as shown in fig. 2 to 3, a receiving groove 142 is formed on the bottom wall of the washing tub 111 at a position corresponding to the first filter member 132, the receiving groove 142 communicates with the drain passage, and the second filter member 141 is disposed in the receiving groove 142. With the second filter member 141 disposed in the accommodating groove 142, the second filter member 141 can be prevented from being washed away by the sewage to leave the sewage draining passage, so that the position of the filter member is more stable.

Optionally, as shown in fig. 4, the height of the accommodating groove 142 is lower than the height of the bottom wall of the cleaning groove 111, a drain hole 152 is formed on the groove wall of the accommodating groove 142, and the drain hole 152 is communicated with the drainage channel. It can be understood that, the height that holding tank 142 is less than the height at which the diapire of washing tank 111 is located, then holding tank 142 not only has the diapire, its periphery also has the lateral wall, at this moment, wash port 152 both can set up on the lateral wall of holding tank 142, also can set up on the diapire of holding tank 142, when sewage pipes set up the pipeline, can be according to the nimble position of seting up of choosing wash port 152 of the orientation of arranging of pipeline, avoid the pipeline to encircle the bending etc., be convenient for the pipeline with the intercommunication of outlet and arranging of pipeline.

In an alternative embodiment, as shown in fig. 2-3, the cleaning tank 111 further includes a cap 143, and the cap 143 covers the notch 135 of the receiving groove 142; the cap 143 is provided with a plurality of through holes. The through hole provided on the blocking cover 143 is for passing the contaminated water, and the main function of the blocking cover 143 is to protect the second filter 141 and further reinforce the second filter 141, preventing the second filter 141 from being separated from the receiving groove 142 by the impact of the contaminated water.

In other embodiments, as shown in fig. 2-3, the bottom wall of the filter plate 122 is provided with a water outlet groove 133, the bottom of the water outlet groove 133 has a hollow structure, and the first filter member 132 covers the hollow structure. Similarly, the outlet channel 133 is also provided to fix the first filter 132, and the bottom of the outlet channel 133 is provided with a hollow structure for passing the sewage.

Illustratively, as shown in fig. 2-3, the first filter element 132 is a filter screen. The meshes of the filter screen are used as second filtering holes for secondary filtering of sewage.

In another alternative embodiment, as shown in fig. 2-3, a first water guiding groove 134 is provided on the bottom wall of the filtering tray 122, and the end of the first water guiding groove 134 is communicated with the water outlet groove 133. The first water guiding groove 134 is used for guiding the sewage in the filtering tray 122 to rapidly flow into the water outlet groove 133, and the sewage flows into the cleaning groove 111 after being filtered by the first filtering member 132 of the water outlet groove 133.

In order to make the flow of the polluted water in the first water chute 134 smoother, optionally, as shown in fig. 2, the width of the first water chute 134 is gradually widened toward the extending direction of the water outlet channel 133.

Specifically, as shown in fig. 2, for example, the notch 135 of the first water chute 134 may be flush with the bottom wall of the filter plate 122, and the depth of the first water chute 134 gradually increases in the extending direction toward the water outlet groove 133. It can be understood that the bottom wall of the first water chute 134 is inclined, the bottom wall of the notch 135 is located at a higher position, and the position where the tail part of the first water chute communicates with the water outlet groove 133 is located at a lower height, which is beneficial for guiding the sewage to rapidly merge into the water outlet groove 133.

In yet another alternative embodiment, as shown in fig. 2, a second water chute 144 is disposed at a position corresponding to the first water chute 134 on the bottom wall of the cleaning tank 111, and one end of the second water chute 144 communicates with the receiving groove 142. Similarly, the second water chute 144 is used for guiding the sewage in the cleaning tank 111 to flow into the accommodating tank 142, and the sewage flows into the sewage draining passage after being filtered by the second filter 141 in the accommodating tank 142.

Further, as shown in fig. 4, the cleaning base station 100 may further include a liquid supply assembly 161, the liquid supply assembly 161 is disposed on the base 110 and is communicated with the cleaning tray 121, and the liquid supply assembly 161 is used for supplying cleaning liquid to the cleaning tray 121. After the liquid supply assembly 161 is arranged, the liquid supply assembly 161 can automatically supply water to the floor brush in the cleaning disc 121 without manual operation.

Further, as shown in fig. 4, the cleaning base station 100 may further include a sewage recovery unit 171, the sewage recovery unit 171 is disposed on the base 110, and the sewage recovery unit 171 is communicated with the drainage hole 152. The sewage recovery unit 171 is used to automatically recover the sewage discharged from the drain hole 152. It can be understood that the sewage entering the sewage recovery module 171 is the sewage filtered by the three-layer filtering structure of the first filtering hole 131, the first filtering member 132 and the second filtering member 141, and thus the sewage in the sewage recovery module 171 has a large volume and a small impurity content.

Optionally, as shown in fig. 4, the sewage recovery assembly 171 includes a sewage tank 181, a water pump 182, and a liquid inlet pipe 183, the liquid inlet pipe 183 is connected between the sewage tank 181 and the water outlet 152, and the water pump 182 is connected to the liquid inlet pipe 183 and is configured to drive the sewage in the cleaning tank 111 to flow to the sewage tank 181 through the liquid inlet pipe 183, so as to achieve automatic recovery of the sewage. It can be understood that, sewage is filtered by the three-layer filtering structure of the first filtering hole 131, the first filtering member 132 and the second filtering member 141 and then is discharged into the liquid inlet pipe 183 through the water outlet hole 152, and foreign matters in the sewage are less at this time, so that the pipeline blockage by the foreign matters is avoided, and the damage of the water pump 182 caused by the foreign matters entering the water pump 182 is also avoided, so that the effect of protecting the water pump 182 is achieved, and the service life of the water pump 182 is prolonged.

In one possible embodiment, a part of the liquid inlet pipe 183 is fixed to the bottom of the cleaning bath 111. It can be understood that, since one end of the liquid inlet pipe 183 is communicated with the water outlet formed on the accommodating groove 142 at the bottom of the cleaning tank 111, a portion of the liquid inlet pipe 183 disposed at the bottom of the cleaning tank 111 is more conveniently communicated with the water outlet.

It is possible that the filter tray 122 is removably attached to the cleaning tray 121 as shown in fig. 2-4, which facilitates the removal of either the filter tray 122 or the cleaning tray 121 separately for cleaning.

In other possible embodiments, as shown in fig. 4, in order to protect the structure of the bottom of the installation groove and prevent the structure from being damaged by friction with the ground, a base 190 may be disposed at the bottom of the installation groove, and the base 190 covers the bottom of the cleaning groove 111. The base 190 can also hide the structure of the bottom of the mounting groove inside the base 190, so that the bottom of the mounting groove is more attractive.

On the other hand, as shown in fig. 5, the present application also provides a cleaning apparatus including a cleaning device 200 and the above-described cleaning base station 100. The structure of the clean base station 100 is the same as described above and will not be described herein. By arranging the cleaning base station 100, the cleaning device 200 can realize an automatic cleaning function, and is more convenient to use.

In one possible embodiment, as shown in fig. 6, the cleaning device 200 further includes a floor brush 210, the floor brush 210 including a housing 211, a mop cloth assembly 212, a water supply assembly (not shown in the drawings), and a rolling brush 213 rotatable about a horizontal axis, the rolling brush 213 and the mop cloth assembly 212 being sequentially disposed at the bottom of the housing 211 along the length of the floor brush 210.

The rolling brush 213 extends in the width direction of the housing 211, the mop assembly 212 includes two rotating mop units 222 rotatable about a vertical axis, the two rotating mop units 222 are arranged side by side in the width direction of the housing 211, the bottom of the rotating mop unit 222 forms a cleaning surface, and the water supply assembly is configured to supply water to the rotating mop unit 222.

It should be noted that the water supply assembly is disposed on the floor brush 210, and the water supply assembly can supply water to the mop unit during the use of the floor brush 210, which is different from the aforementioned liquid supply assembly 161 disposed on the cleaning base station 100, and the liquid supply assembly 161 of the cleaning base station 100 is used for supplying cleaning liquid for self-cleaning of the floor brush 210 after the use of the floor brush 210.

By arranging the above components, the cleaning device 200 provided by the present application can realize the automatic floor mopping function of the floor brush 210, and the rolling brush 213 cooperates with the rotary mop unit 222 to improve the cleaning capability of the floor brush 210.

The application provides a cleaning base station 100 and a cleaning device. The cleaning base station 100 provided by the application is used for self-cleaning of the cleaning device 200, the cleaning base station 100 comprises a base 110 and a cleaning assembly 120, a cleaning groove 111 is arranged on the base 110, and the cleaning assembly 120 is located in the cleaning groove 111; the cleaning assembly 120 comprises a cleaning disc 121 and a filter disc 122 which are stacked up and down, the cleaning disc 121 is used for placing a floor brush 210 of the cleaning device 200, and the cleaning disc 121 is provided with a first filter hole 131 which can filter sewage in the cleaning disc 121; the bottom of the filter disc 122 is provided with a first filter member 132 capable of filtering the sewage in the filter disc 122, the first filter member 132 is provided with a second filter hole, and the filter aperture of the first filter hole 131 is larger than that of the second filter hole; the bottom of the cleaning tank 111 has a sewage draining passage, and the sewage draining passage is opposite to the first filtering member 132 for draining the sewage filtered by the first filtering member 132 out of the cleaning tank 111. The application provides a clean basic station 100 can keep the pipeline smooth and easy in sewage collection process.

The terms "upper" and "lower" are used for describing relative positions of the structures in the drawings, and are only for the sake of clarity, but not for limiting the scope of the present invention, and the relative relationship changes or adjustments are also considered to be within the scope of the present invention without substantial technical changes.

It should be noted that: in the present invention, unless otherwise expressly stated or limited, the first feature "on" or "under" the second feature may be directly contacting the first and second features or indirectly contacting the first and second features through an intermediate. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.

In addition, in the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," "fixed," and the like are to be construed broadly, e.g., as being fixedly connected, detachably connected, or integrated; either directly or indirectly through intervening media, either internally or in any other relationship. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.

In the description herein, reference to the description of the terms "one embodiment," "some embodiments," "an illustrative embodiment," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present disclosure. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; while the utility model has been described in detail and with reference to the foregoing embodiments, it will be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; and the modifications or the substitutions do not make the essence of the corresponding technical solutions depart from the scope of the technical solutions of the embodiments of the present invention.

Claims (19)

1. A cleaning base station, characterized by being used for self-cleaning of a cleaning device (200), the cleaning base station (100) comprising a base (110) and a cleaning assembly (120), a cleaning tank (111) being arranged on the base (110), the cleaning assembly (120) being located within the cleaning tank (111);

the cleaning assembly (120) comprises a cleaning disc (121) and a filtering disc (122) which are stacked up and down, the cleaning disc (121) is used for placing a floor brush (210) of the cleaning device (200), and a first filtering hole (131) capable of filtering sewage in the cleaning disc (121) is formed in the cleaning disc (121); a first filtering piece (132) capable of filtering sewage in the filtering disc (122) is arranged at the bottom of the filtering disc (122), a second filtering hole is formed in the first filtering piece (132), and the filtering pore diameter of the first filtering hole (131) is larger than that of the second filtering hole;

the bottom of the cleaning tank (111) is provided with a sewage draining channel, and the sewage draining channel and the first filtering piece (132) are oppositely arranged so that sewage filtered by the first filtering piece (132) can be discharged out of the cleaning tank (111).

2. The cleaning base station according to claim 1, characterized in that a second filter element (141) is arranged in the trapway, the second filter element (141) having a filter pore size smaller than the filter pore size of the second filter pores.

3. The cleaning base according to claim 2, characterized in that the second filter (141) is a sponge.

4. The cleaning base station according to claim 3, characterized in that a receiving groove (142) is provided on the bottom wall of the cleaning tank (111) at a position corresponding to the first filter member (132), the receiving groove (142) communicating with the trapway, the second filter member (141) being disposed within the receiving groove (142).

5. The cleaning base station as claimed in claim 4, wherein the height of the accommodating groove (142) is lower than the height of the bottom wall of the cleaning groove (111), a drain hole (152) is formed on the wall of the accommodating groove (142), and the drain hole (152) is communicated with the sewage draining passage.

6. The clean base station of claim 5, further comprising a cap (143), the cap (143) covering the slot (135) of the receiving groove (142); the blocking cover (143) is provided with a plurality of through holes.

7. The cleaning base according to claim 1, characterized in that the bottom wall of the filter disc (122) is provided with an outlet channel (133), the bottom of the outlet channel (133) has a hollow structure, and the first filter element (132) covers the hollow structure.

8. The cleaning base station according to claim 1, characterized in that the first filter (132) is a filter screen.

9. The cleaning base station according to claim 7, characterized in that a first water chute (134) is arranged on the bottom wall of the filter disc (122), and the end of the first water chute (134) is communicated with the water outlet groove (133).

10. The cleaning base station according to claim 9, characterized in that the width of the first water chute (134) gradually widens in the direction of extension towards the water outlet channel (133).

11. The cleaning base station according to claim 10, characterized in that the notches (135) of the first water chute (134) are flush with the bottom wall of the filter tray (122) and the groove depth of the first water chute (134) increases gradually in the direction of extension towards the water outlet groove (133).

12. The cleaning base station according to any one of claims 4 to 6, wherein a second water chute (144) is provided at a position of the bottom wall of the cleaning tank (111) corresponding to the first water chute (134), and one end of the second water chute (144) is communicated with the receiving groove (142).

13. The cleaning base station according to any one of claims 1 to 8, wherein the cleaning base station (100) further comprises a liquid supply assembly (161), the liquid supply assembly (161) is disposed on the base (110) and communicated with the cleaning tray (121), and the liquid supply assembly (161) is used for supplying cleaning liquid to the cleaning tray (121).

14. The cleaning base station according to claim 5 or 6, characterized in that the cleaning base station (100) further comprises a sewage recovery assembly (171), the sewage recovery assembly (171) is arranged on the base (110), and the sewage recovery assembly (171) is communicated with the drainage hole (152).

15. The cleaning base station as claimed in claim 14, wherein the sewage recovery assembly (171) comprises a sewage tank (181), a water pump (182) and a liquid inlet pipe (183), the liquid inlet pipe (183) is communicated between the sewage tank (181) and the drain hole (152), and the water pump (182) is connected to the liquid inlet pipe (183) and is used for driving the sewage in the cleaning tank (111) to flow to the sewage tank (181) through the liquid inlet pipe (183).

16. The cleaning base station according to claim 15, characterized in that part of the liquid inlet pipe (183) is fixed to the bottom of the cleaning tank (111).

17. The cleaning base station according to any of claims 1 to 8, characterized in that the filter disc (122) is detachably connected to the washing disc (121).

18. A cleaning apparatus, characterized in that it comprises a cleaning device (200) and a cleaning base station (100) according to any of claims 1-17, said cleaning base station (100) being adapted to clean said cleaning device (200).

19. The cleaning device according to claim 18, characterized in that the cleaning apparatus (200) further comprises a floor brush (210), the floor brush (210) comprises a housing (211), a mop assembly (212), a water supply assembly and a rolling brush (213) rotatable about a horizontal axis, the rolling brush (213) and the mop assembly (212) being arranged in sequence at the bottom of the housing (211) along the length direction of the floor brush (210);

the rolling brush (213) extends in a width direction of the housing (211), the mop assembly (212) includes two rotating mop units (222) rotatable about a vertical axis, the two rotating mop units (222) are arranged side by side in the width direction of the housing (211), a bottom of the rotating mop unit (222) forms a cleaning surface, and the water supply assembly is configured to supply water to the rotating mop unit (222).

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