CN215301001U - High-power plasma generating device of multichannel microwave source - Google Patents
High-power plasma generating device of multichannel microwave source Download PDFInfo
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- CN215301001U CN215301001U CN202121934993.1U CN202121934993U CN215301001U CN 215301001 U CN215301001 U CN 215301001U CN 202121934993 U CN202121934993 U CN 202121934993U CN 215301001 U CN215301001 U CN 215301001U
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Abstract
The utility model relates to a plasma equipment field indicates a high-power plasma generating device of multichannel microwave source, has solved the problem that plasma size is little, power is low among the prior art. The utility model comprises a plasma ignition device, a microwave generating device, a waveguide, a reaction cavity, an air inlet and a microwave cavity; the axis position of the microwave cavity is superposed with the axis of the reaction cavity; the microwave generating device is arranged around the microwave cavity; the number of the microwave generating devices is not less than three; the microwave cavity is a hollow cylindrical multi-cavity; the utility model discloses a high-power plasma generating device of a multipath microwave source, which arranges a plurality of microwave generating devices in different distances and staggered heights, and evenly and intensively binds electromagnetic waves at the central position of a quartz tube, thereby realizing the excitation of high-power and large-size plasma; the utility model has simple structure, high excitation efficiency and low cost, and meets the large-scale requirement of industrialization; the utility model discloses can cascade, realize the effective stack of power.
Description
Technical Field
The utility model relates to a plasma equipment field especially indicates a high-power plasma generating device of multichannel microwave source.
Background
The plasma is also called plasma, is an ionized gaseous substance consisting of positive and negative ions generated after atoms and atomic groups after partial electrons are deprived are ionized, and the movement of the macroscopic electroneutral ionized gas with the dimension larger than the Debye length is mainly governed by electromagnetic force and shows remarkable collective behavior, so that the plasma can be used in various fields such as cutting, welding, spraying and the like. Compared with other traditional plasmas, the microwave plasma has the advantages of low substrate temperature, stable and easily-controlled microwave generator, high microwave discharge efficiency, high safety, quiet plasma and the like.
In recent years, the research of microwave plasma sources has attracted attention of many scholars, and the application of the microwave plasma sources is wide, such as pollutant treatment, crude oil composition determination, preparation of graphene by chemical vapor deposition and the like.
However, it has the following disadvantages:
1. most microwave plasmas realize plasmas in a waveguide compression or waveguide mode, the diameter of the plasmas is small, the diameter of the plasmas is only 3-4cm under 2450MHz, the microwave action area is short, and the maximum diameter of the plasmas is 5cm under the action of microwaves;
2. the microwave plasma generator forms plasma under a single mold cavity, so that the area of a plasma region is small, and the energy utilization rate is low;
3. the microwave plasma generator cannot radiate heat to the reaction cavity through self airflow due to low ventilation volume, so that high external heat radiation capacity is required. The device cannot realize large-scale gas treatment or large-scale plasma treatment application.
A new type of plasma generating apparatus that can solve the above problems is desired.
SUMMERY OF THE UTILITY MODEL
The utility model provides a high-power plasma generating device of multichannel microwave source has solved the problem that plasma size is little, power is low among the prior art.
The technical scheme of the utility model is realized like this: a high-power plasma generating device of a multipath microwave source comprises a plasma ignition device, a microwave generating device, a waveguide and a reaction cavity for exciting gas into plasma, wherein the reaction cavity is used for introducing the gas to be treated into an air inlet of the reaction cavity; the microwave cavity is sleeved outside the reaction cavity; the axis position of the microwave cavity is superposed with the axis of the reaction cavity; the microwave generating device is arranged around the microwave cavity in a staggered manner at different distances through the waveguide; the number of the microwave generating devices is not less than three; the microwave cavity is a hollow cylindrical multi-cavity; the ignition device and the air inlet are arranged at the lower end of the reaction cavity.
Furthermore, the electromagnetic waves at the center of the reaction cavity are uniformly and intensively distributed; the microwave cavity and the waveguide positions are simulated and optimized by a finite element method.
Further, the microwave cavity is a metallic microwave cavity for concentrating microwave energy.
Furthermore, the reaction cavity is made of a material with small electromagnetic loss and high temperature resistance.
Further, the reaction chamber is a quartz tube, a cylindrical metal tube is further sleeved outside the quartz tube, the diameter of the metal tube is larger than that of the quartz tube, and the height of the metal tube is consistent with that of the quartz tube.
Preferably, the reaction chambers may be cascaded, in particular with the upper end of a quartz tube being coupled to the lower end of another quartz tube.
Further, the microwave generators are uniformly distributed at the longitudinal section of the quartz tube.
Further, the microwave generating device and the waveguide can be three groups, four groups or five groups.
The utility model discloses a high-power plasma generating device of a multipath microwave source, which arranges a plurality of microwave generating devices in different distances and staggered heights, and evenly and intensively binds electromagnetic waves at the central position of a quartz tube, thereby realizing the excitation of high-power and large-size plasma; the utility model has simple structure, high excitation efficiency and low cost, and meets the large-scale requirement of industrialization; the utility model discloses can cascade, realize the effective stack of power.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without inventive exercise.
FIG. 1: the structure of the utility model is shown schematically;
FIG. 2: a simulation schematic diagram of four paths of microwave sources;
FIG. 3: a simulation schematic diagram of three paths of microwave sources;
FIG. 4: a simulation schematic diagram of five paths of microwave sources;
FIG. 5: the utility model discloses a cascade schematic diagram;
wherein: 41. a microwave cavity; 42. a waveguide; 43. a microwave generating device; 44. an air inlet; 45. a reaction chamber; 46. a circular metal tube.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative efforts belong to the protection scope of the present invention.
As shown in fig. 1, the present invention discloses a high power plasma generator with multiple microwave sources, which comprises a plasma ignition device, a microwave generator 43, a waveguide 42, a reaction chamber 45 for exciting gas into plasma, and an inlet 44 for introducing gas to be treated into the reaction chamber 45; also comprises a microwave cavity 41 sleeved outside the reaction cavity 45; the axis position of the microwave cavity 41 is superposed with the axis of the reaction cavity 45; the microwave generating devices 43 are arranged around the microwave cavity 41 in a staggered manner at different distances through the waveguide 42; the number of the microwave generating devices 43 is not less than three; the microwave cavity 41 is a hollow cylindrical multi-cavity; the ignition device and the gas inlet 44 are arranged at the lower end of the reaction chamber 45.
Further, the electromagnetic waves at the center of the reaction cavity 45 are uniformly and intensively distributed; the microwave cavity 41 and waveguide 42 positions are simulated and optimized by a finite element method.
And (3) simulation process:
a. variables in the optimization process, such as the Z-axis coordinates of the four waveguides 42 and the radius of the metal cylindrical cavity, are defined, and the electric field distribution can be optimized by changing the numerical values;
b. constructing a geometric model: four metal rectangular BJ26 waveguides 42, metal cylindrical cavities, metal tubes and quartz tubes;
c. creating a definition: assigning actual meaning to each domain and boundary;
d. adding materials: giving each cavity and boundary different material properties;
e. defining physical field, adding four microwave source feed-in ports;
f. setting a parametric scan: writing the variation range of the optimizable variable, calculating all permutation and combination through comsol, and selecting the parameter value when the electric field distribution is optimized;
g. and (4) dividing a grid, running analysis, and obtaining an optimal result according to the electric field distribution diagram and the S11 value.
Further, the microwave cavity 41 is a metallic microwave cavity 41 for concentrating microwave energy. Further, the reaction chamber 45 is made of a material with low electromagnetic loss and high temperature resistance. Further, the reaction chamber 45 is a quartz tube, a cylindrical metal tube is further sleeved outside the quartz tube, the diameter of the metal tube is larger than that of the quartz tube, and the height of the metal tube is consistent with that of the quartz tube.
Preferably, the reaction chambers 45 may be cascaded, in particular, the upper end of a quartz tube is coupled with the lower end of another quartz tube. The plasma generating device consists of a plurality of cavities, microwaves are input into the microwave cavity 41 by the rectangular waveguide 42, and plasmas are confined in the quartz tube reaction cavity 45 and are isolated from the microwave cavity 41 by the quartz tube; the circular metal tube 46 inhibits the electromagnetic waves from radiating outwards from the quartz tube, prevents the microwave energy from diffusing, forms a high-power plasma torch, concentrates the microwave energy, is beneficial to the stability of the plasma torch, can realize the high-efficiency conversion of the microwave energy into the microwave plasma by the structural design of a multi-die cavity, realizes the cascade connection of the device, and realizes the effective superposition of the power by utilizing the mode that the quartz tube is connected with the two devices in the cascade connection.
Further, the microwave generators are uniformly distributed at the longitudinal section of the quartz tube.
Further, the microwave generating device 43 and the waveguide 42 may be three, four or five groups.
Four microwave sources:
the utility model discloses constitute by four BJ26 waveguides 42, a metal cylinder cavity, a tubular metal resonator and a quartz capsule. The four rectangular waveguides 42 are embedded on the wall of the metal cylinder, the quartz tube penetrates through the center of the cylinder cavity, and the metal tube covers the outer layer of the quartz tube to separate the cylinder cavity from the quartz tube; the method adopts the finite element method-based multi-physical field simulation software COMSOL5.4 to carry out geometric modeling and creation definition, endows each domain and boundary with actual significance, sets material properties, defines related physical fields and divides grids, and carries out simulation and numerical analysis.
The four-way plasma structure is designed, microwaves are input by the four waveguide 42 ports with certain power, the microwave power is effectively increased, the electron density, the electron temperature and the gas temperature of the plasma are increased along with the increase of the microwave input power, and meanwhile, the collision reaction in the plasma is accelerated, so that the electron density generation speed is accelerated, and more heat sources are provided for heating the gas.
After microwave is input by four waveguide 42 ports with certain power, electric field distribution in the cylindrical cavity is observed, and the geometric dimension of the cylindrical cavity and the corresponding positions of the four waveguides 42 and the bottom of the cylindrical cavity are continuously changed: specifically, the method comprises the following steps:
when the coordinates z of the four microwave sources are 0, that is, four microwave sources are parallel, the four microwave sources are located in the middle of the microwave cavity 41 to feed microwaves, and at this time, the electric field distribution in the microwave cavity 41 cannot be concentrated in the quartz tube in the microwave cavity 41, so that the four microwave sources are distributed in a staggered manner, and the purpose of concentrating the electric field at the center of the circle is achieved.
When three microwave sources are located on the same Z plane, two microwave sources are located on the same Z plane, and none of the microwave sources are located on the same Z plane, the Z-axis coordinates of the four microwave sources are respectively set as Z1, Z2, Z3 and Z4, a parameterized scanning list is added, a Z coordinate dislocation range is given, the optimal electric field distribution is selected through different arrangement combinations, and when none of the four microwave sources is parallel, the electric field is favorably concentrated at the circle center.
Increasing power, and determining the optimal electric field distribution by simulating different staggered distances of the four microwave sources; furthermore, when the z-axis coordinate of each microwave source is fixed, the maximum electric field intensity and the best focusing effect which can be achieved by simulating electric fields under different metal cylindrical cavity radiuses can be obtained.
And then constantly optimize electric field focusing effect, form powerful microwave plasma torch, finally confirm that cylinder cavity radius is 115mm, four metal rectangle BJ26 wave guides 42 are wide for 84.6mm, high for 43.2mm, the depth is 205mm apart from cylinder cavity outer most ring distance, four metal rectangle wave guides 42 rotate 90 degrees and distribute in proper order in the cylinder cavity wall, its distance apart from the top is respectively: 18.4mm, 33.4mm, 28.4mm and 23.4mm, and the heights are staggered.
Three and five microwave sources:
on the basis of four microwave sources, the structures of the plasma generators of three microwave sources and five microwave sources are respectively, and the design and the size of the rest parts of the device are not changed except the number and the positions of the waveguides 42; plasma of simulation optimization process and four-way microwave sourceThe daughter generator has the same steps, the plasma generators of the three-path microwave source and the five-path microwave source are subjected to optimization simulation analysis by comsol, and the optimal electric field distribution is obtained after the optimal optimization parameters are respectively determined; the maximum electric field of the plasma generator of the three-way microwave source is 2.12 x 103V/m, the plasma generator of five microwave sources is difficult to focus the highest electric field energy at the center of a circle, while the plasma generator of four microwave sources has the maximum electric field of 2.49-103V/m, and perfectly concentrates electric field energy in a certain range.
Plasma electron density, electron temperature and gas temperature all increase with increasing microwave input power. The increase of the microwave power can accelerate the collision reaction in the plasma, thereby leading the electron density generation speed to be accelerated, simultaneously providing more heat sources for heating the gas, and greatly improving the quality of the plasma torch in the reaction cavity 45 by multi-path input.
The utility model discloses a high-power plasma generating device of a multipath microwave source, which arranges a plurality of microwave generating devices 43 through different distances and staggered heights, and evenly and intensively restricts electromagnetic waves at the central position of a quartz tube, thereby realizing the excitation of high-power and large-size plasma; the utility model has simple structure, high excitation efficiency and low cost, and meets the large-scale requirement of industrialization; the utility model discloses can cascade, realize the effective stack of power.
Of course, without departing from the spirit and essence of the present invention, those skilled in the art should be able to make various corresponding changes and modifications according to the present invention, and these corresponding changes and modifications should fall within the scope of the appended claims.
Claims (8)
1. A high-power plasma generating device of a multipath microwave source comprises a plasma ignition device, a microwave generating device, a waveguide and a reaction cavity for exciting gas into plasma, wherein the reaction cavity is used for introducing the gas to be treated into an air inlet of the reaction cavity; the method is characterized in that:
the microwave cavity is sleeved outside the reaction cavity; the axis position of the microwave cavity is superposed with the axis of the reaction cavity; the microwave generating device is arranged around the microwave cavity in a staggered manner at different distances through the waveguide;
the number of the microwave generating devices is not less than three;
the microwave cavity is a hollow cylindrical multi-cavity;
the ignition device and the air inlet are arranged at the lower end of the reaction cavity.
2. The high-power plasma generating device with multiple microwave sources as claimed in claim 1, wherein: the electromagnetic waves at the center of the reaction cavity are uniformly and intensively distributed.
3. The high-power plasma generating device with multiple microwave sources as claimed in claim 2, wherein: the microwave cavity is a metallic microwave cavity for concentrating microwave energy.
4. The high-power plasma generating device with multiple microwave sources as claimed in claim 3, wherein: the reaction cavity is a quartz reaction cavity which is small in electromagnetic loss and made of high-temperature-resistant materials.
5. The high-power plasma generating device with multiple microwave sources as claimed in claim 4, wherein: the reaction chamber is a quartz tube, a cylindrical metal tube is further sleeved outside the quartz tube, the diameter of the metal tube is larger than that of the quartz tube, and the height of the metal tube is consistent with that of the quartz tube.
6. The high-power plasma generating device with multiple microwave sources as claimed in claim 5, wherein: the reaction chambers can be cascaded, and the upper end of one quartz tube is connected with the lower end of the other quartz tube.
7. The high-power plasma generating device with multiple microwave sources as claimed in any one of claims 1 to 6, wherein: the microwave generating devices are uniformly distributed at the longitudinal section of the quartz tube.
8. The high-power plasma generating device with multiple microwave sources as claimed in claim 7, wherein: the microwave generating devices and the waveguides can be three groups, four groups or five groups.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112074071A (en) * | 2020-10-05 | 2020-12-11 | 四川大学 | High-power plasma generating device of multichannel microwave source |
| CN112383997A (en) * | 2020-10-05 | 2021-02-19 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
| CN112383997B (en) * | 2020-10-05 | 2024-10-25 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
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2021
- 2021-08-17 CN CN202121934993.1U patent/CN215301001U/en active Active
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112074071A (en) * | 2020-10-05 | 2020-12-11 | 四川大学 | High-power plasma generating device of multichannel microwave source |
| CN112383997A (en) * | 2020-10-05 | 2021-02-19 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
| CN112074071B (en) * | 2020-10-05 | 2024-06-18 | 四川大学 | High-power plasma generating device of multipath microwave source |
| CN112383997B (en) * | 2020-10-05 | 2024-10-25 | 四川大学 | High-power microwave plasma pulverized coal cracking device |
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